TWI421924B - Apparatus for treating substrates - Google Patents

Apparatus for treating substrates Download PDF

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Publication number
TWI421924B
TWI421924B TW094136304A TW94136304A TWI421924B TW I421924 B TWI421924 B TW I421924B TW 094136304 A TW094136304 A TW 094136304A TW 94136304 A TW94136304 A TW 94136304A TW I421924 B TWI421924 B TW I421924B
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TW
Taiwan
Prior art keywords
mounting portion
pair
brush
rotating shaft
substrate
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TW094136304A
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Chinese (zh)
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TW200631083A (en
Inventor
Hideki Sueyoshi
Akinori Iso
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Shibaura Mechatronics Corp
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Publication of TW200631083A publication Critical patent/TW200631083A/en
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Publication of TWI421924B publication Critical patent/TWI421924B/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes

Description

基板之處理裝置Substrate processing device 發明領域Field of invention

本發明係有關於一種藉設置於處理槽內之刷具單元處理基板之基板處理裝置。The present invention relates to a substrate processing apparatus for processing a substrate by a brush unit disposed in a processing tank.

發明背景Background of the invention

使用於液晶顯示裝置之玻璃製基板形成有電路圖案。要於基板形成電路圖案係採用平版印刷製程。眾所皆知,平版印刷製程係於前述基板塗布光阻劑,並隔著形成有電路圖案之光罩將光照射於該光阻劑。A circuit board formed on a glass substrate used in a liquid crystal display device is formed. A lithographic process is used to form a circuit pattern on the substrate. It is known that a lithographic process is to apply a photoresist to the substrate, and to illuminate the photoresist through a photomask formed with a circuit pattern.

其次,去除光阻劑之未照射到光的部分或照射到光的部分,並對除去光阻劑之部分進行蝕刻。接著,蝕刻後,反覆進行數次由基板除去光阻劑之一連串的工程,藉此於前述基板形成電路圖案。Next, the portion of the photoresist that is not irradiated with light or the portion that is irradiated with light is removed, and the portion from which the photoresist is removed is etched. Next, after the etching, a series of processes of removing the photoresist from the substrate are repeated several times to form a circuit pattern on the substrate.

該等平版印刷製程中,前述基板需要藉由顯像液、蝕刻液或用以在蝕刻後除去光阻劑之剝離液等處理液來處理基板之工程、及在使用處理液處理之後使用洗淨液洗淨之工程。In the lithographic printing process, the substrate needs to be processed by a developing solution such as a developing solution, an etching solution, or a stripping liquid for removing a photoresist after etching, and after the processing liquid is used, the cleaning is performed. Liquid washing works.

用以洗淨基板之洗淨工程中,例如在洗淨除去附著於基板之處理液時,係使用噴嘴對運送到處理槽內之基板噴射洗淨液,藉此可由基板洗淨除去處理液。In the cleaning process for cleaning the substrate, for example, when the treatment liquid adhering to the substrate is washed and removed, the cleaning liquid is sprayed onto the substrate conveyed into the treatment tank by using a nozzle, whereby the treatment liquid can be removed by washing the substrate.

然而,當微粒等污垢頑強地附著於基板時,僅藉對基板噴射洗淨液無法確實地洗淨且除去污垢。因此,在此種情況下,要藉由刷具單元洗淨運送到處理槽內之基板。However, when dirt such as fine particles adheres to the substrate tenacously, it is impossible to reliably wash and remove the dirt by merely spraying the cleaning liquid onto the substrate. Therefore, in this case, the substrate transported into the processing tank is washed by the brush unit.

前述刷具單元具有用以刷洗搬運之基板的上面之上部刷具、及用以刷洗下面之下部刷具。各刷具之軸向兩端係可旋轉且分別由轉軸支持。且,設置於各刷具之軸向一端部之轉軸、及設置於他端部之轉軸係分別安裝且固定於左右一對托架。左右一對之托架係配置於與基板之運送方向直交之寬度方向上,並且下端係固定且直立設置於構成處理裝置之架台上。The brush unit has an upper upper brush for brushing the transported substrate, and a brush for washing the lower lower brush. The axial ends of each brush are rotatable and respectively supported by the rotating shaft. Further, the rotating shafts provided at one end portion of the axial direction of each brush and the rotating shafts provided at the other end portions are attached and fixed to the pair of right and left brackets. The pair of right and left brackets are disposed in the width direction orthogonal to the conveyance direction of the substrate, and the lower ends are fixed and erected on the gantry constituting the processing apparatus.

發明概要Summary of invention

然而,當在與基板之搬運方向直交之寬度方向上直立設置左右一對之托架,並將設置於上下一對刷具之軸向一端部與他端部之轉軸安裝固定於該等托架時,難以將左右一對刷具精密地決定且固定在與基板之搬運方向直交之方向的同一直線上,也就是說難以將一對刷具定位且固定於與基板之搬運方向直交的方向上而不偏芯。However, a pair of left and right brackets are erected in a width direction orthogonal to the conveyance direction of the substrate, and the one end portion of the upper and lower pair of brushes and the rotation shaft of the other end portion are attached and fixed to the brackets. In this case, it is difficult to precisely determine the left and right pair of brushes and fix them on the same straight line in the direction orthogonal to the conveyance direction of the substrate, that is, it is difficult to position and fix the pair of brushes in a direction orthogonal to the conveyance direction of the substrate. Not eccentric.

當左右一對托架產生偏芯時,安裝於各托架且可旋轉地支持刷具之軸向一端部與他端部之左右一對轉軸之軸線也會產生偏芯。在轉軸之軸線產生偏離之狀態下旋轉驅動刷具的話,由於轉軸或刷具之軸會產生應力,因此會導致轉軸的損傷或刷具軸的損傷。When the pair of left and right brackets are eccentric, the axes of the pair of shafts that are attached to the brackets and rotatably support the axial ends of the brush and the pair of right and left shafts of the other end portions are also eccentric. When the brush is rotationally driven in a state where the axis of the rotating shaft is deviated, the shaft of the rotating shaft or the brush generates stress, which may cause damage to the rotating shaft or damage to the brush shaft.

進一步,由於必須進行在處理槽內之狹小空間內將左右一對托架安裝固定於架台,並且將設置於刷具之兩端部 之轉軸安裝固定於該等托架等之作業,因此作業性差。Further, since it is necessary to mount and fix a pair of left and right brackets in the narrow space in the processing tank, and to be disposed at both ends of the brush Since the rotating shaft is attached and fixed to the work such as the brackets, the workability is poor.

本發明即係提供一種基板之處理裝置,該基板之處理裝置係可將可旋轉支持於上下刷具之軸向兩端之左右一對轉軸不偏芯且精密地定位設置於與基板之搬運方向直交之方向。The present invention provides a processing device for a substrate, wherein the processing device of the substrate can rotatably support a pair of left and right rotating shafts of the upper and lower ends of the upper and lower brushes without being biased and precisely positioned to be orthogonal to the conveying direction of the substrate. The direction.

本發明之處理裝置係可藉由設置於處理槽之刷具單元處理運送於該處理槽內之基板者,而前述刷具單元包含:框架,係具有在同一垂直面上於水平方向以預定間隔分開之第1安裝部與第2安裝部者;第1上部刷具及第1下部刷具,係軸線平行地配置於上下方向者;一對第1轉軸,係安裝於前述第1安裝部與第2安裝部,並且支持前述第1上部刷具之軸向兩端部,使其可旋轉者;及一對第2轉軸,係安裝於前述第1安裝部與第2安裝部,並且支持前述第2下部刷具之軸向兩端部,使其可旋轉者。The processing device of the present invention can process a substrate conveyed in the processing tank by a brush unit disposed in the processing tank, and the brush unit includes a frame having a predetermined interval in a horizontal direction on the same vertical plane. The first upper brush and the second lower brush are separated from each other; the first upper brush and the first lower brush are arranged in the vertical direction in parallel with the axis; and the pair of first rotating shafts are attached to the first mounting portion and The second mounting portion supports the axial end portions of the first upper brush and is rotatable; and the pair of second rotating shafts are attached to the first mounting portion and the second mounting portion, and support the aforementioned The axial ends of the second lower brush are rotatable.

根據本發明,係於框架上形成在同一垂直面上於水平方向以預定間隔分開之一對安裝部,並在該等安裝部於上下方向對應設置可旋轉且分別支持上部刷具之軸向兩端部與下部刷具之軸向兩端部之各一對之轉軸。According to the present invention, one pair of mounting portions are formed on the frame at a predetermined interval in the horizontal direction on the same vertical plane, and the mounting portions are rotatably disposed in the up and down direction and respectively support the axial directions of the upper brush respectively. a pair of shafts of the pair of axial ends of the end and the lower brush.

因此,由於可不偏芯地設置各一對轉軸,因此可防止該等轉軸或支持於轉軸之上下一對刷具軸產生應力而損傷。Therefore, since each pair of rotating shafts can be provided without eccentricity, it is possible to prevent the rotating shafts or the pair of brush shafts supported on the rotating shaft from being damaged by stress.

較佳實施例之詳細說明Detailed description of the preferred embodiment

以下,參照圖式並說明本發明之一實施型態。Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

第1圖係本發明之處理裝置之縱截面圖,該處理裝置具有處理槽1。如第3圖所示,該處理槽1內係設有由複數之搬運輥子2構成之搬運機構3。該等搬運輥子2係朝預定方向旋轉驅動。前述處理槽1之一端形成搬入口4,由該搬入口4搬入到處理槽1內且例如使用於液晶顯示面板等之玻璃製之基板W係由前述搬運輥子2搬運,並由形成於前述處理槽1之另一端之搬出口5搬出。Fig. 1 is a longitudinal sectional view showing a processing apparatus of the present invention, which has a processing tank 1. As shown in Fig. 3, a transport mechanism 3 composed of a plurality of transport rollers 2 is provided in the treatment tank 1. These conveyance rollers 2 are rotationally driven in a predetermined direction. The one end of the processing tank 1 is formed with a loading port 4, and the substrate W made of glass, for example, used in a liquid crystal display panel, is transported by the transporting roller 2, and is formed by the above-described processing. The other end of the tank 1 is carried out by the outlet 5.

如第1圖所示,前述處理槽1係為一形成於上面之開口部7可利用蓋體6進行開關之構成。用以刷洗由前述搬運輥子2搬運到該處理槽1內之基板W(如第3圖所示)之刷具單元11係如後述般設置於前述處理槽1內。又,處理槽1之底部係經由排液管8而連接到廢液槽9。As shown in Fig. 1, the processing tank 1 is configured such that the opening portion 7 formed on the upper surface can be opened and closed by the lid body 6. The brush unit 11 for brushing the substrate W (shown in FIG. 3) conveyed by the conveyance roller 2 into the processing tank 1 is provided in the processing tank 1 as will be described later. Further, the bottom of the treatment tank 1 is connected to the waste liquid tank 9 via the drain pipe 8.

如第2、4及5圖所示,前述刷具單元11係具有框架12。該框架12係藉由連結部13及一體形成於該連結部13之兩端之一對腳部14而側面形狀形成為門形。連結部13及腳部14之截面形狀係呈上方及外側開放之U字狀。As shown in the second, fourth and fifth figures, the brush unit 11 has a frame 12. The frame 12 is formed in a gate shape by a joint portion 13 and one of the both ends of the joint portion 13 integrally formed with the leg portion 14. The cross-sectional shape of the connecting portion 13 and the leg portion 14 is U-shaped in which the upper portion and the outer portion are open.

連結板15係安裝固定於一對腳部14之下端,且如第1圖所示,前述連結部13之長向中途部設有懸掛具16,該懸掛具係當以鏈滑車等搬運機構吊掛框架12時所使用者。The connecting plate 15 is attached and fixed to the lower end of the pair of leg portions 14, and as shown in Fig. 1, a suspension member 16 is provided in the middle of the connecting portion 13 in the longitudinal direction, and the hanging device is suspended by a transport mechanism such as a chain block. The user who hangs the frame 12.

如第5圖所示,其中一方之前述腳部14之一側面形成於第1安裝部17,另一方之前述腳部14之一側面係形成於第2安裝部18。第1安裝部17與第2安裝部18係如後所述位於同一垂直面上,且於水平方向上以一定間隔,也就是大於前述基板W之寬度尺寸的間隔分離。As shown in FIG. 5, one of the side surfaces of the leg portion 14 is formed on the first attachment portion 17, and the other side surface of the leg portion 14 is formed on the second attachment portion 18. The first mounting portion 17 and the second mounting portion 18 are located on the same vertical plane as will be described later, and are separated at a constant interval in the horizontal direction, that is, at a distance larger than the width dimension of the substrate W.

進一步,其中一方之前述腳部14之另一側面形成有與前述第1安裝部17平行之第3安裝部19,另一方之前述腳部14之另一側面形成有與前述第2安裝部18平行之第4安裝部20。因此,第3安裝部19與第4安裝部20與第1、第2安裝部17,18同樣位於同一垂直面上,並於水平方向上以預定間隔分離。Further, the other side surface of the leg portion 14 is formed with a third mounting portion 19 parallel to the first mounting portion 17, and the other side surface of the other leg portion 14 is formed with the second mounting portion 18 The fourth mounting portion 20 is parallel. Therefore, the third attachment portion 19 and the fourth attachment portion 20 are located on the same vertical plane as the first and second attachment portions 17, 18, and are separated at a predetermined interval in the horizontal direction.

如第4、5圖所示,在位於形成第1至第4安裝部17~20之一對腳部14的兩側之同一垂直面上之基準面21上,沿著平行且上下方向分別設置有一對線性導引部22。As shown in FIGS. 4 and 5, the reference plane 21 on the same vertical plane on both sides of the pair of the first to fourth mounting portions 17 to 20 is formed in parallel and in the up and down direction. There is a pair of linear guides 22.

上部可動板23與下部可動板24係分別可滑動地與固定於其等內面且以2個成對之各一對滑塊25卡合且設置於各一對之線性導引部22,。也就是說,上部可動板23與下部可動板24係沿著前述線性導引部22而上下移動。The upper movable plate 23 and the lower movable plate 24 are slidably engaged with the inner surfaces of the movable plate 23 and the lower movable plate 24, and are respectively engaged with the pair of the pair of sliders 25, and are provided in the pair of linear guide portions 22. That is, the upper movable plate 23 and the lower movable plate 24 are moved up and down along the linear guide portion 22.

藉此,設置於第1安裝部17與第2安裝部18之各一對上部可動板23與下部可動板24之間的板面係以前述基準面24為準而位於同一垂直面上。又,設置於第3安裝部19與第4安裝部20之各一對上部可動板23與下部可動板24之間的板面係同樣以前述基準面21為準而位於同一垂直面上。Thereby, the plate surface between the pair of upper movable plates 23 and the lower movable plate 24 provided in the first mounting portion 17 and the second mounting portion 18 is located on the same vertical plane with respect to the reference surface 24 . Moreover, the plate surface between the pair of upper movable plates 23 and the lower movable plate 24 provided in the third mounting portion 19 and the fourth mounting portion 20 is also located on the same vertical plane with respect to the reference surface 21 as well.

在設置於一對腳部14之第1、第2安裝部17,18之2片上部可動板23,各有第1轉軸27固定設置於其一側面,同樣地,在2片下部可動板各有第2轉軸28固定設置於一側面。The two upper movable plates 23 provided in the first and second mounting portions 17 and 18 of the pair of leg portions 14 are fixed to one side surface of each of the first rotating shafts 27, and similarly, the two lower movable plates are respectively provided. A second rotating shaft 28 is fixedly disposed on one side.

在設置於一對腳部14之第3、第4安裝部19,20之2片上部可動板23,各有第3軸29固定設置於其一側面,同樣地,2片下部可動板各有第4軸30固定設置於一側面。The two upper movable plates 23 are provided on the third and fourth mounting portions 19 and 20 of the pair of leg portions 14, and the third shafts 29 are fixedly disposed on one side surface thereof. Similarly, the two lower movable plates have their own The fourth shaft 30 is fixedly disposed on one side.

第1上部刷具32之軸向兩端部係可旋轉地支持於一對第1轉軸27,並且第1下部刷具33之軸向兩端部係可旋轉地支持於一對第2轉軸28。The axial ends of the first upper brush 32 are rotatably supported by the pair of first rotating shafts 27, and the axial ends of the first lower brush 33 are rotatably supported by the pair of second rotating shafts 28 .

又,第2上部刷具34之軸向兩端部可旋轉地支持於一對第3轉軸29,並且第2下部刷具35之軸向兩端部可旋轉地支持於一對第4轉軸30。Further, both axial end portions of the second upper brush 34 are rotatably supported by the pair of third rotating shafts 29, and both axial end portions of the second lower brushing member 35 are rotatably supported by the pair of fourth rotating shafts 30. .

如第5圖所示,前述各刷具32~35於中空軸36之外周面設有刷毛37,並且支軸39連結於前述中空軸36之兩端,而前述支軸39可旋轉地支持於各轉軸27~30。As shown in FIG. 5, each of the brushes 32 to 35 is provided with bristles 37 on the outer peripheral surface of the hollow shaft 36, and the support shaft 39 is coupled to both ends of the hollow shaft 36, and the support shaft 39 is rotatably supported by the support shaft 39. Each axis is 27~30.

可旋轉地支持各刷具32~35之軸向兩端部之各一對第1至第4轉軸27~30之其中一軸向之一端面分別設有驅動源40。各驅動源40係連結於各刷具32~35之支軸39,並朝預定方向旋轉驅動該等刷具32~35。One of the axial end faces of each of the pair of first to fourth rotating shafts 27 to 30 that rotatably support the axial end portions of the respective brush members 32 to 35 is provided with a drive source 40, respectively. Each of the driving sources 40 is coupled to the support shafts 39 of the respective brush holders 32 to 35, and rotationally drives the brushes 32 to 35 in a predetermined direction.

也就是說,各一對之上部刷具32,34與下部刷具33,35係朝逆向旋轉驅動。各一對之刷具的旋轉方向一般係與基板W之搬運方向逆向旋動驅動,但若刷具之周速度與基板W之搬運速度不同,則各刷具之旋轉方向亦可與基板W之搬運方向相同。又,亦可為其中一對之上下刷具32,33與另一對之上下刷具34,35其中一方係與基板W之搬運方向同向,另一方為逆向。That is, each of the pair of upper brushes 32, 34 and the lower brushes 33, 35 are driven to rotate in the reverse direction. The rotation direction of each pair of brushes is generally reversely driven in the direction in which the substrate W is conveyed. However, if the peripheral speed of the brush is different from the conveyance speed of the substrate W, the rotation direction of each brush may be the same as the substrate W. The handling direction is the same. Further, one of the pair of upper and lower brushes 32, 33 and the other pair of upper and lower brushes 34, 35 may be in the same direction as the conveyance direction of the substrate W, and the other may be reversed.

前述第1上部刷具32與第1下部刷具33係藉第1上下驅動機構41而分別朝上下方向驅動且可調整位置,前述第2上部刷具34與第2下部刷具35可藉由與前述第1上下驅動機構41相同構成之第2上下驅動機構42而分別朝上下方向驅動且調整位置。The first upper brush 32 and the first lower brush 33 are driven in the vertical direction by the first vertical drive mechanism 41, and the positions can be adjusted, and the second upper brush 34 and the second lower brush 35 can be used. The second vertical drive mechanism 42 having the same configuration as the first vertical drive mechanism 41 is driven in the vertical direction and adjusted in position.

前述第1、第2定位機構41,42係具有軸線為水平且安裝於前述框架12之一對腳部14之上端之一對第1支持體44。第4圖所示,可動塊45係可滑動地支持於一對第1支持體44(圖示其中一個)。驅動軸46之上端部係可滑動地支持於該可動塊45。The first and second positioning mechanisms 41, 42 have a pair of first support bodies 44 that are horizontally attached to one of the upper ends of the pair of legs 14 and are attached to the upper end of the leg portion 14. As shown in Fig. 4, the movable block 45 is slidably supported by a pair of first support bodies 44 (one of which is shown). The upper end of the drive shaft 46 is slidably supported by the movable block 45.

各驅動軸46之下端係連結固定於一對之第1轉軸27及第3轉軸29所設之前述上部可動板23之上端。驅動軸46之上端部設有輥子47,該輥子47係與沿上下方向傾斜形成於前述可動塊45之傾斜溝48卡合。藉此,若前述可動塊45朝軸向滑動,輥子47會沿著前述傾斜溝48而上下動,由於驅動軸46會隨其上下動而連動,因此連結於該驅動軸46之上部可動板23會沿著線性導引部22而上下驅動。The lower end of each of the drive shafts 46 is coupled and fixed to the upper ends of the pair of first rotating shafts 27 and the third movable shaft 23 provided at the upper movable shaft 23. A roller 47 is provided at an upper end portion of the drive shaft 46, and the roller 47 is engaged with an inclined groove 48 formed in the movable block 45 so as to be inclined in the vertical direction. Accordingly, when the movable block 45 slides in the axial direction, the roller 47 moves up and down along the inclined groove 48, and the drive shaft 46 moves in conjunction with the vertical movement, so that the movable plate 23 is coupled to the upper portion of the drive shaft 46. It will be driven up and down along the linear guide 22.

左右一對之上部可動板23係介由一對第1轉軸27再介由第1上部刷具32及一對第3轉軸29而可旋轉地支持第2上部刷具34。因此,若上下驅動上部可動板23,可使前述第1、第2上部刷具32,34上下動作且定位。The pair of right and left movable plates 23 rotatably support the second upper brush 34 via the pair of first rotating shafts 27 via the first upper brush 32 and the pair of third rotating shafts 29, respectively. Therefore, when the upper movable plate 23 is driven up and down, the first and second upper brushes 32, 34 can be moved up and down and positioned.

左右一對之可動塊45之一端係由連動軸51而連結。其中一可動塊45之另一端係與滑動軸52(第4圖所示)之一端連結。該滑動軸52係可滑動地支持於藉托架50安裝於其中一腳部14之第2支持體53。One end of the pair of right and left movable blocks 45 is coupled by the interlocking shaft 51. The other end of one of the movable blocks 45 is coupled to one end of the slide shaft 52 (shown in FIG. 4). The slide shaft 52 is slidably supported by the second support body 53 attached to one of the leg portions 14 by the bracket 50.

第1操作軸54之上端部係可旋轉地支持於第2支持體53。該第1操作軸54之上端部設有與設置於前述滑動軸52之從動齒輪咬合之驅動齒輪(皆未圖示)。且,當藉設置於第1操作軸54下端之操作把手55使該第1操作軸54旋轉時,可藉由該旋轉使前述滑動軸52朝軸向驅動。The upper end portion of the first operation shaft 54 is rotatably supported by the second support body 53. A drive gear (not shown) that engages with a driven gear provided on the slide shaft 52 is provided at an upper end portion of the first operation shaft 54. Further, when the first operation shaft 54 is rotated by the operation knob 55 provided at the lower end of the first operation shaft 54, the slide shaft 52 can be driven in the axial direction by the rotation.

當前述滑動軸52朝軸向驅動時,第1滑塊45會隨之連動而滑動,因此如前所述,可調整第1上部刷具32與第2上部刷具34之上下方向的位置。When the slide shaft 52 is driven in the axial direction, the first slider 45 is slid in conjunction with each other. Therefore, as described above, the position of the first upper brush 32 and the second upper brush 34 in the vertical direction can be adjusted.

如第4圖所示,上昇用桿56係藉銷56a而使中途部可旋動地連結設置於前述第2支持體53。該操作桿56之上端係藉銷56b而可旋動且可相對地在上下方向滑動地連結於支持於前述滑動軸52之前述第2支持體53之部分。As shown in FIG. 4, the raising lever 56 is connected to the second support body 53 so as to be pivotably coupled to the middle support portion by the pin 56a. The upper end of the operating lever 56 is pivotably coupled to the portion of the second support body 53 supported by the slide shaft 52 so as to be rotatable in the vertical direction.

因此,若使前述操作桿56朝第4圖之箭頭所示之逆時針方向、上端後退之方向旋動的話,可藉該操作桿56而強制滑動軸52朝後退方向驅動。藉此,可使第1、第2上部刷具32,34迅速地以大於前述第1操作軸54之尺寸上昇。Therefore, when the operation lever 56 is rotated in the counterclockwise direction and the upper end retreating direction indicated by the arrow in FIG. 4, the slide lever 52 can be forcibly driven in the backward direction by the operation lever 56. Thereby, the first and second upper brushes 32, 34 can be rapidly increased in size larger than the size of the first operation shaft 54.

前述第1、第2之上下驅動機構41,42進行之第1、第2之下部刷具33,35之上下驅動係藉與第1、第2之上部刷具32,34大略相同之構成的機構進行。即,雖然沒有詳細地圖示,但如第2圖所示,係具有安裝於框架12之一對腳部14之上端之一隊第1支持體44A,且第1滑塊(未圖示)可滑動地設置於其中一支持體44A。The upper and lower lower brush units 33 and 35 of the first and second upper and lower driving mechanisms 41 and 42 are configured to have substantially the same configuration as the first and second upper brush units 32 and 34. Institutional. That is, although not shown in detail, as shown in FIG. 2, the first support body 44A is attached to one of the upper ends of the leg portion 14 of the frame 12, and the first slider (not shown) It is slidably disposed on one of the supports 44A.

前述第1滑塊係與可滑動地設置於第2支持體53A之滑動軸(未圖示)連結。第2操作軸54A之上端係可旋轉地支持於第2支持體53A,並藉操作把手55A使該第2操作軸54A旋轉,可介由前述滑動軸而使前述第1滑塊54A滑動。The first slider is coupled to a slide shaft (not shown) slidably provided on the second support 53A. The upper end of the second operation shaft 54A is rotatably supported by the second support body 53A, and the second operation shaft 54A is rotated by the operation handle 55A, and the first slider 54A can be slid via the slide shaft.

左右一對之第1滑塊54A係由連動軸51A而連結。驅動軸(皆未圖示)係介由輥子可上下移動地設置於設於各第1滑塊之傾斜溝(未圖示)。一對驅動軸係與前述下部可動板24連結,且前述下部可動板分別設置於框架4之一對腳部14之一側面與另一側面且可朝上下方向移動。The pair of left and right first sliders 54A are coupled by the interlocking shaft 51A. The drive shafts (all not shown) are provided on the inclined grooves (not shown) provided in the respective first sliders by the rollers being vertically movable. A pair of drive shafts are coupled to the lower movable plate 24, and the lower movable plates are respectively disposed on one side surface and the other side surface of one of the frame portions 14 of the frame 4 and are movable in the vertical direction.

藉此,若使前述第2操作軸54A旋轉,可介由與其旋轉連動而上下移動之驅動軸及安裝於下部可動板24之各一對第2、第4轉軸28,30,而使第1下部刷具33與第2下部刷具35上下移動。As a result, when the second operation shaft 54A is rotated, the drive shaft that moves up and down in conjunction with the rotation and the pair of second and fourth rotation shafts 28 and 30 attached to the lower movable plate 24 can be used to make the first The lower brush 33 and the second lower brush 35 move up and down.

也就是說,藉由第1上下驅動機構41與第2驅動機構42,可調整第1、第2上部刷具32,34及第1、第2之下部刷具33,35之上下方向之位置、也就是刷具的間隔。藉此,可調整刷毛37對於送入上下一對之刷具之間之基板W之上下面的接觸強度。In other words, the first upper and lower driving mechanisms 41 and the second driving mechanism 42 can adjust the position of the first and second upper brushes 32, 34 and the first and second lower brush members 33, 35 in the up-down direction. That is, the interval between the brushes. Thereby, the contact strength of the bristles 37 with respect to the upper and lower surfaces of the substrate W between the upper and lower pair of brushes can be adjusted.

且,如此構成之刷具單元11係如第1圖所示,將設置於框架12之一對腳部14下端之連結板15可裝卸地安裝並且固定設置於設於前述處理槽1之寬度方向兩側之架台57之上面。As shown in FIG. 1, the brush unit 11 configured as described above is detachably attached to the connecting plate 15 provided at the lower end of the leg portion 14 of the frame 12 and fixedly disposed in the width direction of the processing tank 1. Above the gantry 57 on both sides.

也就是說,刷具單元11係將框架12設置於與為處理槽1之寬度方向之基板W之搬運方向直交之方向,而如第3圖所示,使設置於該框架12之第1、第2安裝部17,18之第1上部刷具32與第1下部刷具33位於同圖之箭頭所示之基板W之搬運方向上游側,並使設置於第3、第4安裝部19,20之第2上部刷具34與第2下部刷具35設置位於基板W之搬運方向下游側。That is, the brush unit 11 sets the frame 12 in a direction orthogonal to the conveyance direction of the substrate W in the width direction of the processing tank 1, and as shown in FIG. 3, is provided in the first frame of the frame 12. The first upper brush 32 and the first lower brush 33 of the second mounting portions 17 and 18 are located on the upstream side in the conveyance direction of the substrate W indicated by the arrow in the figure, and are provided in the third and fourth mounting portions 19, The second upper brush 34 and the second lower brush 35 of 20 are disposed on the downstream side in the conveyance direction of the substrate W.

第6圖係顯示設置於處理槽1內之刷具單元11之部分之用以供給洗淨液之噴嘴之配置狀態。即,由第1噴嘴61朝第1上部刷具32噴射供給洗淨液,由第2噴嘴62朝第2上部刷具34噴射供給洗淨液。進一步,位於基板W之各一對上下刷具間之部分的上面係由2組第3噴嘴63噴射供給洗淨液。又,第1至第3噴嘴61~63係沿刷具之軸向以預定間隔複數配置。Fig. 6 is a view showing an arrangement state of a nozzle for supplying a washing liquid which is provided in a portion of the brush unit 11 provided in the processing tank 1. In other words, the first nozzle 61 supplies the cleaning liquid to the first upper brush 32, and the second nozzle 62 supplies the cleaning liquid to the second upper brush 34. Further, the upper surface of the portion between the pair of upper and lower brushes of the substrate W is ejected by the two sets of third nozzles 63 to supply the cleaning liquid. Further, the first to third nozzles 61 to 63 are disposed at a predetermined interval in the axial direction of the brush.

如第1圖所示,前述第1、第2之上下驅動機構41,42之第1、第2操作軸54,54A及操作桿56係朝處理槽1之外部突出。藉此,可由外部進行上部刷具32,34與下部刷具33,35之上下位置的調整。As shown in Fig. 1, the first and second operating shafts 54, 54A and the operating lever 56 of the first and second upper and lower lower driving mechanisms 41, 42 project toward the outside of the processing tank 1. Thereby, the upper and lower positions of the upper brush 32, 34 and the lower brush 33, 35 can be adjusted externally.

如第1圖所示,前述處理槽1之一側外方立設有起重機71之支柱72。橫構件73之一端部係固定於該支柱72上端。該橫構件73係沿該處理槽1之寬度方向水平設置於前述處理槽1之上方。As shown in Fig. 1, a pillar 72 of a crane 71 is erected on the outer side of one side of the treatment tank 1. One end of the cross member 73 is fixed to the upper end of the post 72. The horizontal member 73 is horizontally disposed above the processing tank 1 in the width direction of the processing tank 1.

前述支柱72之高度方向中途部設有由操作部74a操作之絞車74。滑車75係可旋轉地分別設置於前述橫構件73之一端與另一端。由前述滑車75捲曲或放出之線材76係卡合於一對絞車75。線材76的前端設有鉤部77。A winch 74 operated by the operation portion 74a is provided at a midway portion of the pillar 72 in the height direction. The trolley 75 is rotatably provided at one end and the other end of the horizontal member 73, respectively. The wire 76 that is curled or discharged by the aforementioned carriage 75 is engaged with a pair of winches 75. A hook portion 77 is provided at the front end of the wire 76.

前述鉤部77係可與形成於前述刷具單元11之懸掛具16之卡合孔16a卡合。使鉤部77卡合於懸掛部16。而且,若在解除刷具單元11對於前述架台57之固定狀態,並由處理槽1取下蓋體6之狀態下,藉絞車74捲取前述線材76的話,可由第1圖之實線所表示之安裝位置,將前述刷具單元11如虛線所示般懸掛於處理槽1上方。因此,可輕易進行前述刷具單元11之維修等。The hook portion 77 is engageable with the engaging hole 16a of the hanger 16 formed in the brush unit 11. The hook portion 77 is engaged with the hanging portion 16. When the brush body unit 11 is detached from the gantry 57 and the cover body 6 is removed by the processing tank 1, the wire 76 is taken up by the winch 74, which can be represented by the solid line in FIG. In the mounting position, the brush unit 11 is suspended above the processing tank 1 as indicated by a broken line. Therefore, the maintenance of the aforementioned brush unit 11 and the like can be easily performed.

若根據如此所構成之處理裝置,一對上部刷具32,34及一對下部刷具33,35可藉由框架12而一體化。因此,若在組裝於處理槽1之前成一體化,處理槽1內只要藉將設置於框架12之腳部14之下端之連結板15安裝固定於架台57之作業即完成。因此,可輕易且迅速地進行將刷具單元11組裝於處理槽1內之作業。According to the processing apparatus thus constituted, the pair of upper brushes 32, 34 and the pair of lower brushes 33, 35 can be integrated by the frame 12. Therefore, if it is integrated before being assembled in the processing tank 1, the inside of the processing tank 1 is completed by attaching and fixing the connecting plate 15 provided at the lower end of the leg portion 14 of the frame 12 to the gantry 57. Therefore, the work of assembling the brush unit 11 in the processing tank 1 can be performed easily and quickly.

於前述框架12之一對腳部14之一側面,第1安裝部17與第2安裝部18係設置於同一垂直面上,於另一側面,第3安裝部19與第4安裝部20可同樣設置於同一垂直面上。具體而言,以形成於構成第1、第2安裝部17,18與第3、第4安裝部19,20之框架12之腳部14之側面之基準面21為準,使一對之上部可動板23與下部可動板24之板面分別位於同一垂直面上。The first mounting portion 17 and the second mounting portion 18 are disposed on the same vertical surface on one side of the leg portion 14 of the frame 12, and the third mounting portion 19 and the fourth mounting portion 20 are provided on the other side surface. Also set on the same vertical plane. Specifically, the pair of upper portions are formed on the reference surface 21 formed on the side surface of the leg portion 14 of the frame 12 of the first and second mounting portions 17, 18 and the third and fourth mounting portions 19 and 20, respectively. The plate faces of the movable plate 23 and the lower movable plate 24 are respectively located on the same vertical plane.

因此,若以上部可動板23與下部可動板24之間的板面為基準而分別安裝固定一對第1轉軸27與第2轉軸28及第3轉軸29與第4轉軸30的話,可將一對之轉軸27~30分別安裝於前述框架12而不會偏離軸芯。Therefore, when the pair of first rotating shaft 27, second rotating shaft 28, third rotating shaft 29, and fourth rotating shaft 30 are respectively attached and fixed with reference to the surface between the upper movable plate 23 and the lower movable plate 24, one can be used. The shafts 27 to 30 are attached to the frame 12, respectively, without deviating from the shaft core.

若一對之轉軸27~30可分別安裝到前述框架12而不偏離軸芯的話,即使藉驅動源40旋轉驅動兩端可旋轉地支持於該等轉軸27~30之刷具32~35,亦可防止各轉軸27~30或刷具32~35產生應力而損傷。If a pair of rotating shafts 27 to 30 can be respectively attached to the frame 12 without deviating from the axial core, even if the driving source 40 is rotationally driven to support the brush 32 to 35 which are rotatably supported by the rotating shafts 27 to 30, It can prevent stress and damage of each of the rotating shafts 27 to 30 or the brushes 32 to 35.

又,設置於框架12之一對腳部14之一側面之各一對之第1、第2轉軸27,28可藉第1上下驅動機構41經由連動軸51而一體地上下驅動。Further, the first and second rotating shafts 27, 28 provided on one side of one of the side surfaces of the frame 12 and the leg portion 14 can be integrally driven up and down via the interlocking shaft 51 by the first vertical drive mechanism 41.

又,設置於框架12之一對腳部14之另一側面之各一對之第3、第4轉軸29,30可藉第2驅動機構42經由連動軸51A而一體地上下驅動。Further, the third and fourth rotating shafts 29, 30 provided on each of the other side faces of the pair of the leg portions 14 of the frame 12 can be integrally driven up and down via the interlocking shaft 51A by the second drive mechanism 42.

因此,設置於一對腳部14之一側面與另一側面之各一對之第1至第4轉軸27~30不但不會產生偏芯,於上下方向也不會偏離位置,因而藉此亦可防止因使刷具32~35旋轉而於該刷具之軸或各轉軸27~30產生應力。Therefore, the first to fourth rotating shafts 27 to 30 provided on each of the pair of side faces and the other side of the pair of leg portions 14 are not eccentric, and do not deviate from the position in the vertical direction. It is possible to prevent stress from being generated on the shaft or the respective shafts 27 to 30 of the brush by rotating the brushes 32 to 35.

前述一實施型態中,係就框架之一側面與另一側面分別設有上下一對刷具之刷具單元進行說明,但本發明亦可為僅於框架之一側面設置上下一對之刷具之構成之刷具單元。In the above embodiment, the brush unit is provided with one pair of upper and lower brushes on one side and the other side of the frame. However, the present invention may also be provided with a pair of upper and lower brushes only on one side of the frame. A brush unit having a composition.

1...處理槽1. . . Processing tank

2...搬運輥子2. . . Handling roller

3...搬運機構3. . . Transport mechanism

4...搬入口4. . . Move in

5...搬出口5. . . Move out

6...蓋體6. . . Cover

7...開口部7. . . Opening

8...排液管8. . . Drain tube

9...廢液槽9. . . Waste tank

11...刷具單元11. . . Brush unit

12...框架12. . . frame

13...連結部13. . . Linkage

14...腳部14. . . Foot

15...連結板15. . . Link board

16...懸掛工具16. . . Hanging tool

17...第1安裝部17. . . First installation department

18...第2安裝部18. . . Second installation department

19...第3安裝部19. . . Third installation department

20...第4安裝部20. . . 4th installation department

21...基準面twenty one. . . Datum

22...線性導引部twenty two. . . Linear guide

23...上部可動板twenty three. . . Upper movable plate

24...下部可動板twenty four. . . Lower movable plate

25...滑塊25. . . Slider

27...第1轉軸27. . . 1st shaft

28...第2轉軸28. . . 2nd shaft

29...第3轉軸29. . . Third axis

30...第4轉軸30. . . 4th axis

32...第1上部刷具32. . . 1st upper brush

33...第1下部刷具33. . . First lower brush

34...第2上部刷具34. . . 2nd upper brush

35...第2下部刷具35. . . Second lower brush

36...中空軸36. . . Hollow shaft

37...刷毛37. . . Brushing

39...支軸39. . . Support shaft

40...驅動源40. . . Drive source

41...第1定位機構41. . . First positioning mechanism

42...第2定位機構42. . . Second positioning mechanism

44,44A...第1支持體44,44A. . . First support

45...可動滑塊45. . . Movable slider

45A...第1滑塊45A. . . 1st slider

46...驅動軸46. . . Drive shaft

47...輥子47. . . Roller

48...傾斜溝48. . . Inclined ditch

50...托架50. . . bracket

51,51A...連動軸51, 51A. . . Linking axis

52...滑動軸52. . . Sliding shaft

53,53A...第2支持體53,53A. . . Second support

54...第1操作軸54. . . First operating axis

54A...第2操作軸54A. . . Second operating axis

55,55A...操作把手55,55A. . . Operating handle

56...上昇操作桿56. . . Rising lever

56a,56b...銷56a, 56b. . . pin

57...架台57. . . shelf

61...第1噴嘴61. . . First nozzle

62...第2噴嘴62. . . Second nozzle

63...第3噴嘴63. . . Third nozzle

71...起重機裝置71. . . Crane device

72...支柱72. . . pillar

73...橫構件73. . . Cross member

74...絞車74. . . winch

74a...操作部74a. . . Operation department

75...滑車75. . . pulley

76...線材76. . . Wire

77...鉤部77. . . Hook

W...基板W. . . Substrate

第1圖係顯示本發明之一實施型態之縱截面圖。Fig. 1 is a longitudinal sectional view showing an embodiment of the present invention.

第2圖係刷具單元之分解透視圖。Figure 2 is an exploded perspective view of the brush unit.

第3圖係在處理槽內用以將基板朝預定方向搬運之搬運機構與刷具單元之間的配置關係說明圖。Fig. 3 is an explanatory view showing an arrangement relationship between a transport mechanism for transporting a substrate in a predetermined direction in the processing tank and a brush unit.

第4圖係放大顯示刷具單元之長向一端部之正面圖。Fig. 4 is a front elevational view showing the longitudinal end of the brush unit in an enlarged manner.

第5圖係除去刷具單元之上下驅動機構之平面圖。Figure 5 is a plan view of the lower drive mechanism of the upper brush unit.

第6圖係顯示刷具單元之各刷具與用以噴射供給洗淨液之噴嘴之間的配置關係說明圖。Fig. 6 is an explanatory view showing the arrangement relationship between each of the brush members of the brush unit and the nozzle for ejecting the cleaning liquid.

11...刷具單元11. . . Brush unit

12...框架12. . . frame

13...連結部13. . . Linkage

14...腳部14. . . Foot

15...連結板15. . . Link board

17...第1安裝部17. . . First installation department

18...第2安裝部18. . . Second installation department

19...第3安裝部19. . . Third installation department

27...第1轉軸27. . . 1st shaft

28...第2轉軸28. . . 2nd shaft

29...第3轉軸29. . . Third axis

30...第4轉軸30. . . 4th axis

32...第1上部刷具32. . . 1st upper brush

34...第2上部刷具34. . . 2nd upper brush

40...驅動源40. . . Drive source

41...第1定位機構41. . . First positioning mechanism

42...第2定位機構42. . . Second positioning mechanism

44,44A...第1支持體44,44A. . . First support

51,51A...連動軸51, 51A. . . Linking axis

53,53A...第2支持體53,53A. . . Second support

54...第1操作軸54. . . First operating axis

54A...第2操作軸54A. . . Second operating axis

55,55A...操作把手55,55A. . . Operating handle

56...上昇操作桿56. . . Rising lever

Claims (5)

一種基板處理裝置,係可藉由設置於處理槽之刷具單元處理運送於該處理槽內之基板者,而前述刷具單元包含:框架,係由連結部及設於該連結部兩端之一對腳部形成門形,且在同一垂直面上於水平方向以預定間隔分開之前述一對腳部之一側面形成有第1安裝部與第2安裝部者;第1上部刷具及第1下部刷具,係軸線平行地配置於上下方向者;一對第1轉軸,係安裝於前述第1安裝部與第2安裝部,並且支持前述第1上部刷具之軸向兩端部,使其可旋轉者;及一對第2轉軸,係安裝於前述第1安裝部與第2安裝部,並且支持前述第1下部刷具之軸向兩端部,使其可旋轉者,前述處理槽之寬方向兩側設有架台,前述刷具單元之前述框架係設置為一對腳部可裝卸地安裝固定於前述架台。 A substrate processing apparatus capable of processing a substrate conveyed in the processing tank by a brush unit provided in a processing tank, wherein the brush unit includes a frame connected by a connecting portion and two ends of the connecting portion The pair of leg portions are formed in a gate shape, and the first mounting portion and the second mounting portion are formed on one side surface of the pair of leg portions which are separated by a predetermined interval in the horizontal direction on the same vertical surface; the first upper brush and the first (1) The lower brush is disposed in the vertical direction in parallel with the axis; the pair of first rotating shafts are attached to the first mounting portion and the second mounting portion, and support the axial end portions of the first upper brush, And a pair of second rotating shafts attached to the first mounting portion and the second mounting portion, and supporting the axially opposite end portions of the first lower brush to be rotatable, the foregoing processing A gantry is provided on both sides in the width direction of the groove, and the frame of the brush unit is provided such that a pair of leg portions are detachably attached and fixed to the gantry. 如申請專利範圍第1項之基板處理裝置,其中前述第1轉軸與第2轉軸分別安裝於前述第1安裝部與第2安裝部並可上下移動,且第1、第2轉軸係設置成可藉由第1上下驅動機構分別於前述各安裝部進行上下方向之定位調整。 The substrate processing apparatus according to claim 1, wherein the first rotating shaft and the second rotating shaft are attached to the first mounting portion and the second mounting portion, respectively, and are movable up and down, and the first and second rotating shafts are provided to be movable. The positioning adjustment in the vertical direction is performed by each of the first mounting units by the first vertical drive mechanism. 如申請專利範圍第1項之基板處理裝置,其中前述框架之一對腳部之另一側面形成有與前述第1安裝部平行之第3安裝部、及與前述第2安裝部平行且與前述第3安裝部以預定間隔分開之第4安裝部,而第3轉軸與第4轉軸分別於上下方向對應設置於前述第3安裝部與第4安裝部,又,設置於前述第3安裝部與第4安裝部之一對第3轉軸可旋轉地支持有第2上部刷具的軸向兩端部,且一對前述第4轉軸可旋轉地支持有第2下部刷具的軸向兩端部。 The substrate processing apparatus according to claim 1, wherein one of the frames forms a third mounting portion parallel to the first mounting portion on the other side surface of the leg portion, and the second mounting portion is parallel to the second mounting portion The third mounting portion is separated from the fourth mounting portion at a predetermined interval, and the third rotating shaft and the fourth rotating shaft are respectively provided in the third mounting portion and the fourth mounting portion in the vertical direction, and are provided in the third mounting portion and One of the fourth mounting portions rotatably supports the axial ends of the second upper brush to the third rotating shaft, and the pair of the fourth rotating shaft rotatably supports the axially opposite ends of the second lower brush . 如申請專利範圍第3項之基板處理裝置,前述第3轉軸與第4轉軸係分別設置於前述第3安裝部與第4安裝部並可上下移動,且第3、第4轉軸係設置成可藉第2上下驅動機構分別於前述各安裝部進行上下方向之定位調整。 In the substrate processing apparatus of the third aspect of the invention, the third rotating shaft and the fourth rotating shaft are respectively disposed on the third mounting portion and the fourth mounting portion, and are movable up and down, and the third and fourth rotating shafts are provided to be movable. The second vertical drive mechanism adjusts the vertical direction of each of the mounting portions. 如申請專利範圍第3項之基板處理裝置,其中前述第1安裝部與第2安裝部係形成於前述一對腳部之一側面,並且前述第3安裝部與第4安裝部係形成於與前述一對腳部之前述一側面平行之另一側面。 The substrate processing apparatus according to claim 3, wherein the first mounting portion and the second mounting portion are formed on one side surface of the pair of leg portions, and the third mounting portion and the fourth mounting portion are formed in a The other side of the pair of legs is parallel to the other side.
TW094136304A 2004-10-22 2005-10-18 Apparatus for treating substrates TWI421924B (en)

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CN1778478B (en) 2010-11-03
JP4537826B2 (en) 2010-09-08
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KR101116713B1 (en) 2012-02-22
KR20060049096A (en) 2006-05-18

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