CH499793A - Fotopolymerisierbarer Lack - Google Patents
Fotopolymerisierbarer LackInfo
- Publication number
- CH499793A CH499793A CH505367A CH505367A CH499793A CH 499793 A CH499793 A CH 499793A CH 505367 A CH505367 A CH 505367A CH 505367 A CH505367 A CH 505367A CH 499793 A CH499793 A CH 499793A
- Authority
- CH
- Switzerland
- Prior art keywords
- esterified
- polyvinyl alcohol
- acid
- hydroxyl groups
- vinyl
- Prior art date
Links
- 229920002451 polyvinyl alcohol Polymers 0.000 title claims abstract description 15
- 239000004372 Polyvinyl alcohol Substances 0.000 title claims abstract description 14
- 239000002966 varnish Substances 0.000 title claims abstract description 7
- 150000002148 esters Chemical class 0.000 title claims description 13
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 12
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims abstract description 9
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 claims abstract description 7
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 claims abstract description 7
- 229930016911 cinnamic acid Natural products 0.000 claims abstract description 7
- 235000013985 cinnamic acid Nutrition 0.000 claims abstract description 7
- 229920001577 copolymer Polymers 0.000 claims abstract description 7
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 claims abstract description 7
- OTLNPYWUJOZPPA-UHFFFAOYSA-N 4-nitrobenzoic acid Chemical compound OC(=O)C1=CC=C([N+]([O-])=O)C=C1 OTLNPYWUJOZPPA-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000004922 lacquer Substances 0.000 claims description 6
- 229920002554 vinyl polymer Polymers 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 2
- 150000007513 acids Chemical class 0.000 claims description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 2
- 239000000203 mixture Substances 0.000 abstract description 5
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 abstract 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 229920006163 vinyl copolymer Polymers 0.000 abstract 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 11
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- WOGITNXCNOTRLK-VOTSOKGWSA-N (e)-3-phenylprop-2-enoyl chloride Chemical compound ClC(=O)\C=C\C1=CC=CC=C1 WOGITNXCNOTRLK-VOTSOKGWSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 206010034972 Photosensitivity reaction Diseases 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000036211 photosensitivity Effects 0.000 description 4
- SKDHHIUENRGTHK-UHFFFAOYSA-N 4-nitrobenzoyl chloride Chemical compound [O-][N+](=O)C1=CC=C(C(Cl)=O)C=C1 SKDHHIUENRGTHK-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- BWWHTIHDQBHTHP-UHFFFAOYSA-N 2-nitrobenzoyl chloride Chemical compound [O-][N+](=O)C1=CC=CC=C1C(Cl)=O BWWHTIHDQBHTHP-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 206010034960 Photophobia Diseases 0.000 description 1
- 229920001756 Polyvinyl chloride acetate Polymers 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- -1 aromatic nitro compounds Chemical class 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001851 cinnamic acid derivatives Chemical class 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD11958966 | 1966-09-01 | ||
| DEV0032544 | 1966-12-12 | ||
| FR96077A FR1524175A (fr) | 1967-02-22 | 1967-02-22 | Vernis photopolymérisable à base d'esters d'alcool polyvinilique |
| GB970867A GB1152097A (en) | 1966-09-01 | 1967-03-01 | Photopolymerisable Lacquer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH499793A true CH499793A (de) | 1970-11-30 |
Family
ID=27430178
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH505367A CH499793A (de) | 1966-09-01 | 1967-04-10 | Fotopolymerisierbarer Lack |
Country Status (3)
| Country | Link |
|---|---|
| BE (1) | BE695988A (pm) |
| CH (1) | CH499793A (pm) |
| GB (1) | GB1152097A (pm) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0079514A3 (en) * | 1981-11-12 | 1983-06-22 | Basf Aktiengesellschaft | Light-sensitive recording material useful in the production of printing and relief forms, and process for the production of printing and relief forms by means of this recording material |
| EP0231922A3 (en) * | 1986-02-07 | 1987-11-11 | American Cyanamid Company | Electron beam and x-ray resists |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3560465A (en) * | 1969-04-01 | 1971-02-02 | Eastman Kodak Co | Preparation of soluble poly(vinyl esters) from high molecular weight acid chlorides |
-
1967
- 1967-03-01 GB GB970867A patent/GB1152097A/en not_active Expired
- 1967-03-23 BE BE695988D patent/BE695988A/xx unknown
- 1967-04-10 CH CH505367A patent/CH499793A/de not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0079514A3 (en) * | 1981-11-12 | 1983-06-22 | Basf Aktiengesellschaft | Light-sensitive recording material useful in the production of printing and relief forms, and process for the production of printing and relief forms by means of this recording material |
| EP0231922A3 (en) * | 1986-02-07 | 1987-11-11 | American Cyanamid Company | Electron beam and x-ray resists |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1152097A (en) | 1969-05-14 |
| DE1522535A1 (de) | 1970-03-05 |
| DE1522535B2 (de) | 1975-10-09 |
| BE695988A (pm) | 1967-09-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE2453428C3 (de) | Photopolymerisierbare Masse | |
| DE2559879C2 (de) | Aromatische Jodoniumsalze | |
| EP0570795A1 (de) | Antistatische Kunststoffteile | |
| DE2207209A1 (de) | Lichtempfindliche Massen für die Herstellung von Reliefbildern und ihre polymerisierten Reliefstrukturen | |
| DE2519401A1 (de) | Durch aktinische strahlung polymerisierbare, vernetzbare beschichtungsmasse | |
| DE2918686A1 (de) | Uv-haertbare druckfarben | |
| EP0050224B1 (de) | Fotopolymere Reliefformen und Verfahren zu deren Herstellung | |
| DE1793179A1 (de) | Verfahren zur Herstellung von lager- und feuchtigkeitsbestaendigen lichtempfindlichen Diazoniumverbindungen | |
| DE2429251A1 (de) | Lichtempfindliche organophile massen und flachdruckform | |
| DE2124047A1 (de) | Photosensitive Polymere, Verfahren zur Herstellung derselben und diese Polymeren enthaltende Zusammensetzungen | |
| CH499793A (de) | Fotopolymerisierbarer Lack | |
| EP0471151A2 (de) | Durch Strahlung vernetzbare Bindemittelgemische | |
| AT287486B (de) | Photopolymerisierbarer Lack | |
| DE1522535C3 (de) | Fotopolymerisierbarer Lack | |
| DE1447024C3 (de) | Verfahren zur Herstellung eines lichtempfindlichen Aufzeichnungsmaterials und dessen Verwendung | |
| DE1106181B (de) | Verfahren zur Herstellung einer Kopierschicht fuer Flachdruckplatten aus Epoxyharzen | |
| EP0010225B1 (de) | Negativ arbeitende mit wässrigen Alkalilösungen entwickelbare lichtvernetzbare Schichten | |
| EP0125587B2 (de) | Phlegmatisierte Formen explosionsgefährlicher, organischer Diazo- bzw. Azidoverbindungen für strahlungsempfindliche Zusammensetzungen | |
| DE672928C (de) | Verfahren zum Polymerisieren von Derivaten ungesaettigter Saeuren | |
| DE1268765B (de) | Fotopolymerisierbarer Lack | |
| AT286780B (de) | Photopolymerisierbarer Lack | |
| DE1669238C3 (de) | Lichtempfindlicher Lack | |
| DE2111415A1 (de) | Lichtvernetzbare Lackharze | |
| DE1108078B (de) | Verfahren zur Herstellung einer Kopierschicht fuer Flachdruckplatten aus Epoxyharzen | |
| DE621189C (de) | Verfahren zur Verbesserung der mechanischen Eigenschaften von flaechigen Gebilden aus Cellulosederivaten |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |