CA2438207A1 - Bath for the galvanic deposition of gold and gold alloys, and the use thereof - Google Patents
Bath for the galvanic deposition of gold and gold alloys, and the use thereof Download PDFInfo
- Publication number
- CA2438207A1 CA2438207A1 CA002438207A CA2438207A CA2438207A1 CA 2438207 A1 CA2438207 A1 CA 2438207A1 CA 002438207 A CA002438207 A CA 002438207A CA 2438207 A CA2438207 A CA 2438207A CA 2438207 A1 CA2438207 A1 CA 2438207A1
- Authority
- CA
- Canada
- Prior art keywords
- bath
- gold
- compound
- bismuth
- compounds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/48—Electroplating: Baths therefor from solutions of gold
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Dental Preparations (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10110743.9 | 2001-02-28 | ||
DE2001110743 DE10110743A1 (de) | 2001-02-28 | 2001-02-28 | Bad zur galvanischen Abscheidung von Gold und Goldlegierungen sowie dessen Verwendung |
EP01108448.0 | 2001-04-04 | ||
EP01108448A EP1236814A1 (de) | 2001-02-28 | 2001-04-04 | Bad zur galvanischen Abscheidung von Gold und Goldlegierungen sowie dessen Verwendung |
PCT/EP2002/002128 WO2002068728A1 (de) | 2001-02-28 | 2002-02-28 | Bad zur galvanischen abscheidung von gold und goldlegierungen sowie dessen verwendung |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2438207A1 true CA2438207A1 (en) | 2002-09-06 |
Family
ID=26008695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002438207A Abandoned CA2438207A1 (en) | 2001-02-28 | 2002-02-28 | Bath for the galvanic deposition of gold and gold alloys, and the use thereof |
Country Status (8)
Country | Link |
---|---|
US (1) | US20040065225A1 (ja) |
EP (1) | EP1366219B1 (ja) |
JP (1) | JP4183240B2 (ja) |
CN (1) | CN100392155C (ja) |
AU (1) | AU2002308221A1 (ja) |
BR (1) | BR0207724A (ja) |
CA (1) | CA2438207A1 (ja) |
WO (1) | WO2002068728A1 (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1378590A1 (fr) * | 2002-07-04 | 2004-01-07 | Metalor Technologies International S.A. | Bain pour dépôts electrolytiques d'or |
CN1942162A (zh) * | 2004-02-18 | 2007-04-04 | 玛丽安娜·库利 | 抗微生物制剂及其使用方法 |
CN1308493C (zh) * | 2004-07-27 | 2007-04-04 | 滕先弟 | 硫代硫酸金铵络合物及其制备方法 |
JP5442400B2 (ja) * | 2009-11-13 | 2014-03-12 | ルネサスエレクトロニクス株式会社 | 半導体集積回路装置の製造方法 |
CN101781758B (zh) * | 2010-04-09 | 2011-12-07 | 厦门华弘昌科技有限公司 | 化学镀镍稳定剂、化学镀镍溶液及化学镀镍工艺 |
US10889908B2 (en) * | 2012-09-17 | 2021-01-12 | Government Of The United States Of America, As Represented By The Secretary Of Commerce | Superconformal filling composition and superconformally filling a recessed feature of an article |
US11579344B2 (en) | 2012-09-17 | 2023-02-14 | Government Of The United States Of America, As Represented By The Secretary Of Commerce | Metallic grating |
ITFI20120208A1 (it) * | 2012-10-12 | 2014-04-13 | Bluclad S R L | Soluzione per l'elettrodeposizione di una lega di oro e la lega da essa derivante. |
ITFI20130057A1 (it) * | 2013-03-18 | 2014-09-19 | Bluclad S R L | Soluzione per l¿elettrodeposizione di una lega di oro e la lega da essa derivante. |
CN103938232B (zh) * | 2014-03-04 | 2015-04-01 | 深圳市联合蓝海新技术有限公司 | 一种无氰电镀液及其应用 |
CN103938231B (zh) * | 2014-03-04 | 2015-04-01 | 深圳市联合蓝海科技开发有限公司 | 一种电镀黄金的方法和硬质黄金的制备方法 |
CN104047037B (zh) * | 2014-06-16 | 2015-06-03 | 深圳市联合蓝海科技开发有限公司 | 一种硬化剂 |
CN104862752B (zh) * | 2015-06-12 | 2016-02-17 | 深圳市联合蓝海投资控股集团有限公司 | 改性无氰镀金液及其应用和硬质黄金的制备方法 |
KR20240033116A (ko) * | 2021-09-16 | 2024-03-12 | 피 앤 에스, 갈바솔스 | 고속 순금 전기주조/전기도금 욕 |
JP7219847B1 (ja) * | 2022-09-26 | 2023-02-08 | Eeja株式会社 | 金電気めっき液および金電気めっき方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE754151A (fr) * | 1969-08-08 | 1970-12-31 | Sel Rex Corp | Bain aqueux pour le placage electrolytique d'or ou d'alliage d'or sur un article conducteur, procede de fabrication dudit bain aqueux et utilisation de celui-ci |
CH622829A5 (ja) * | 1977-08-29 | 1981-04-30 | Systemes Traitements Surfaces | |
JP2592246B2 (ja) * | 1987-04-10 | 1997-03-19 | 株式会社ジーシー | 歯冠修復用複合冠の内側冠の作製方法及び装置 |
DE3805627A1 (de) * | 1988-02-24 | 1989-09-07 | Wieland Edelmetalle | Goldbad |
US5277790A (en) * | 1992-07-10 | 1994-01-11 | Technic Incorporated | Non-cyanide electroplating solution for gold or alloys thereof |
DE19629658C2 (de) * | 1996-07-23 | 1999-01-14 | Degussa | Cyanidfreies galvanisches Bad zur Abscheidung von Gold und Goldlegierungen |
DE19845506A1 (de) * | 1998-10-02 | 2000-04-06 | Wieland Edelmetalle | Verfahren zur Herstellung von prothetischen Formteilen für den Dentalbereich und prothetisches Formteil |
-
2002
- 2002-02-28 US US10/469,146 patent/US20040065225A1/en not_active Abandoned
- 2002-02-28 WO PCT/EP2002/002128 patent/WO2002068728A1/de active Application Filing
- 2002-02-28 BR BR0207724-8A patent/BR0207724A/pt not_active Application Discontinuation
- 2002-02-28 EP EP02744906.5A patent/EP1366219B1/de not_active Expired - Lifetime
- 2002-02-28 AU AU2002308221A patent/AU2002308221A1/en not_active Abandoned
- 2002-02-28 CN CNB028056736A patent/CN100392155C/zh not_active Expired - Lifetime
- 2002-02-28 CA CA002438207A patent/CA2438207A1/en not_active Abandoned
- 2002-02-28 JP JP2002568818A patent/JP4183240B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1366219A2 (de) | 2003-12-03 |
US20040065225A1 (en) | 2004-04-08 |
BR0207724A (pt) | 2004-03-23 |
JP2004527653A (ja) | 2004-09-09 |
WO2002068728A1 (de) | 2002-09-06 |
CN100392155C (zh) | 2008-06-04 |
CN1494606A (zh) | 2004-05-05 |
EP1366219B1 (de) | 2014-09-03 |
JP4183240B2 (ja) | 2008-11-19 |
WO2002068728A8 (de) | 2003-09-18 |
AU2002308221A1 (en) | 2002-09-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FZDE | Discontinued |