CA2340192A1 - Micromachined members coupled for relative rotation by torsional flexure hinges - Google Patents
Micromachined members coupled for relative rotation by torsional flexure hinges Download PDFInfo
- Publication number
- CA2340192A1 CA2340192A1 CA002340192A CA2340192A CA2340192A1 CA 2340192 A1 CA2340192 A1 CA 2340192A1 CA 002340192 A CA002340192 A CA 002340192A CA 2340192 A CA2340192 A CA 2340192A CA 2340192 A1 CA2340192 A1 CA 2340192A1
- Authority
- CA
- Canada
- Prior art keywords
- torsional flexure
- pair
- reference member
- dynamic
- flexure hinges
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
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Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04Q—SELECTING
- H04Q11/00—Selecting arrangements for multiplex systems
- H04Q11/0001—Selecting arrangements for multiplex systems using optical switching
- H04Q11/0005—Switch and router aspects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
- B81B3/0051—For defining the movement, i.e. structures that guide or limit the movement of an element
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/085—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by electromagnetic means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/32—Optical coupling means having lens focusing means positioned between opposed fibre ends
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/32—Optical coupling means having lens focusing means positioned between opposed fibre ends
- G02B6/327—Optical coupling means having lens focusing means positioned between opposed fibre ends with angled interfaces to reduce reflections
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/04—Optical MEMS
- B81B2201/042—Micromirrors, not used as optical switches
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/04—Optical MEMS
- B81B2201/045—Optical switches
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/05—Type of movement
- B81B2203/058—Rotation out of a plane parallel to the substrate
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/35—Optical coupling means having switching means
- G02B6/351—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements
- G02B6/3512—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements the optical element being reflective, e.g. mirror
- G02B6/3518—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements the optical element being reflective, e.g. mirror the reflective optical element being an intrinsic part of a MEMS device, i.e. fabricated together with the MEMS device
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/35—Optical coupling means having switching means
- G02B6/3564—Mechanical details of the actuation mechanism associated with the moving element or mounting mechanism details
- G02B6/3568—Mechanical details of the actuation mechanism associated with the moving element or mounting mechanism details characterised by the actuating force
- G02B6/357—Electrostatic force
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/35—Optical coupling means having switching means
- G02B6/3564—Mechanical details of the actuation mechanism associated with the moving element or mounting mechanism details
- G02B6/3584—Mechanical details of the actuation mechanism associated with the moving element or mounting mechanism details constructional details of an associated actuator having a MEMS construction, i.e. constructed using semiconductor technology such as etching
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04Q—SELECTING
- H04Q11/00—Selecting arrangements for multiplex systems
- H04Q11/0001—Selecting arrangements for multiplex systems using optical switching
- H04Q11/0005—Switch and router aspects
- H04Q2011/0007—Construction
- H04Q2011/0026—Construction using free space propagation (e.g. lenses, mirrors)
- H04Q2011/003—Construction using free space propagation (e.g. lenses, mirrors) using switches based on microelectro-mechanical systems [MEMS]
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04Q—SELECTING
- H04Q11/00—Selecting arrangements for multiplex systems
- H04Q11/0001—Selecting arrangements for multiplex systems using optical switching
- H04Q11/0005—Switch and router aspects
- H04Q2011/0037—Operation
- H04Q2011/0039—Electrical control
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04Q—SELECTING
- H04Q11/00—Selecting arrangements for multiplex systems
- H04Q11/0001—Selecting arrangements for multiplex systems using optical switching
- H04Q11/0005—Switch and router aspects
- H04Q2011/0037—Operation
- H04Q2011/0043—Fault tolerance
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Computer Networks & Wireless Communication (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Micromachines (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Gyroscopes (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US9888198P | 1998-09-02 | 1998-09-02 | |
| US14495399P | 1999-07-21 | 1999-07-21 | |
| US60/144,953 | 1999-07-21 | ||
| US60/098,881 | 1999-07-21 | ||
| PCT/US1999/020218 WO2000013210A2 (en) | 1998-09-02 | 1999-09-02 | Micromachined members coupled for relative rotation by torsional flexure hinges |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2340192A1 true CA2340192A1 (en) | 2000-03-09 |
Family
ID=26795224
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002340192A Abandoned CA2340192A1 (en) | 1998-09-02 | 1999-09-02 | Micromachined members coupled for relative rotation by torsional flexure hinges |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6392220B1 (enExample) |
| EP (1) | EP1119792A2 (enExample) |
| JP (4) | JP4776779B2 (enExample) |
| KR (1) | KR100620341B1 (enExample) |
| CA (1) | CA2340192A1 (enExample) |
| WO (1) | WO2000013210A2 (enExample) |
Families Citing this family (124)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU6254999A (en) * | 1998-09-18 | 2000-04-10 | Seagate Technology Llc | Micromachined mirror with stretchable restoring force member |
| US6803755B2 (en) | 1999-09-21 | 2004-10-12 | Rockwell Automation Technologies, Inc. | Microelectromechanical system (MEMS) with improved beam suspension |
| US6636819B1 (en) * | 1999-10-05 | 2003-10-21 | L-3 Communications Corporation | Method for improving the performance of micromachined devices |
| US6545809B1 (en) | 1999-10-20 | 2003-04-08 | Flex Products, Inc. | Color shifting carbon-containing interference pigments |
| US6650803B1 (en) | 1999-11-02 | 2003-11-18 | Xros, Inc. | Method and apparatus for optical to electrical to optical conversion in an optical cross-connect switch |
| US6571030B1 (en) | 1999-11-02 | 2003-05-27 | Xros, Inc. | Optical cross-connect switching system |
| US6792174B1 (en) | 1999-11-02 | 2004-09-14 | Nortel Networks Limited | Method and apparatus for signaling between an optical cross-connect switch and attached network equipment |
| US6597826B1 (en) | 1999-11-02 | 2003-07-22 | Xros, Inc. | Optical cross-connect switching system with bridging, test access and redundancy |
| US6882765B1 (en) | 1999-11-02 | 2005-04-19 | Xros, Inc. | Connection protection between clients and optical cross-connect switches |
| US6356689B1 (en) * | 2000-03-25 | 2002-03-12 | Lucent Technologies, Inc. | Article comprising an optical cavity |
| US6647164B1 (en) | 2000-10-31 | 2003-11-11 | 3M Innovative Properties Company | Gimbaled micro-mirror positionable by thermal actuators |
| US6711318B2 (en) | 2001-01-29 | 2004-03-23 | 3M Innovative Properties Company | Optical switch based on rotating vertical micro-mirror |
| US6527965B1 (en) | 2001-02-09 | 2003-03-04 | Nayna Networks, Inc. | Method for fabricating improved mirror arrays for physical separation |
| US6577427B1 (en) * | 2001-02-20 | 2003-06-10 | Nayna Networks, Inc. | Process for manufacturing mirror devices using semiconductor technology |
| JP2002258174A (ja) * | 2001-03-02 | 2002-09-11 | Seiko Epson Corp | 光変調装置及びそれを有する電子機器 |
| US6618184B2 (en) * | 2001-04-03 | 2003-09-09 | Agere Systems Inc. | Device for use with a micro-electro-mechanical system (MEMS) optical device and a method of manufacture therefor |
| US6704475B2 (en) * | 2001-04-03 | 2004-03-09 | Agere Systems Inc. | Mirror for use with a micro-electro-mechanical system (MEMS) optical device and a method of manufacture therefor |
| JP4102037B2 (ja) * | 2001-04-26 | 2008-06-18 | 富士通株式会社 | マイクロミラー素子およびその製造方法 |
| US6529654B1 (en) | 2001-05-02 | 2003-03-04 | Nayna Networks, Inc. | Method for transparent switching and controlling optical signals using mirror designs |
| US6771851B1 (en) * | 2001-06-19 | 2004-08-03 | Nayna Networks | Fast switching method for a micro-mirror device for optical switching applications |
| US20040171226A1 (en) * | 2001-07-05 | 2004-09-02 | Burden Stephen J. | Isotopically pure silicon-on-insulator wafers and method of making same |
| US6867459B2 (en) * | 2001-07-05 | 2005-03-15 | Isonics Corporation | Isotopically pure silicon-on-insulator wafers and method of making same |
| US7119400B2 (en) * | 2001-07-05 | 2006-10-10 | Isonics Corporation | Isotopically pure silicon-on-insulator wafers and method of making same |
| US6477291B1 (en) | 2001-09-13 | 2002-11-05 | Nayna Networks, Inc. | Method and system for in-band connectivity for optical switching applications |
| US6813057B2 (en) | 2001-09-27 | 2004-11-02 | Memx, Inc. | Configurations for an optical crossconnect switch |
| US7088492B2 (en) * | 2001-10-11 | 2006-08-08 | Denso Corporation | Micro movable mechanism system and control method for the same |
| US6836353B1 (en) | 2001-11-20 | 2004-12-28 | Nayna Networks, Inc. | Redundant switch fabric methods and system for switching of telecommunication signals |
| US20040240034A1 (en) * | 2001-11-30 | 2004-12-02 | Scharf Bruce R. | Diffraction compensation using a patterned reflector |
| US7813634B2 (en) | 2005-02-28 | 2010-10-12 | Tessera MEMS Technologies, Inc. | Autofocus camera |
| US6935759B1 (en) * | 2002-02-19 | 2005-08-30 | Glimmerglass Networks, Inc. | Folded longitudinal torsional hinge for gimbaled MEMS mirror |
| US20030234994A1 (en) * | 2002-06-19 | 2003-12-25 | Pan Shaoher X. | Reflective spatial light modulator |
| US20040069742A1 (en) * | 2002-06-19 | 2004-04-15 | Pan Shaoher X. | Fabrication of a reflective spatial light modulator |
| JP4038208B2 (ja) * | 2002-06-21 | 2008-01-23 | 富士通株式会社 | マイクロミラーユニット及びその製造方法並びに該マイクロミラーユニットを用いた光スイッチ |
| JP2004039735A (ja) * | 2002-07-01 | 2004-02-05 | Fujitsu Ltd | 半導体基板及びその製造方法 |
| JP4307171B2 (ja) * | 2002-07-19 | 2009-08-05 | キヤノン株式会社 | マイクロ可動体 |
| JP2006515953A (ja) * | 2002-08-03 | 2006-06-08 | シヴァータ・インコーポレーテッド | 密閉された集積memsスイッチ |
| JP4003063B2 (ja) * | 2002-09-04 | 2007-11-07 | セイコーエプソン株式会社 | ミラーデバイス、光スイッチ、電子機器およびミラーデバイス駆動方法 |
| JP4025990B2 (ja) * | 2002-09-26 | 2007-12-26 | セイコーエプソン株式会社 | ミラーデバイス、光スイッチ、電子機器およびミラーデバイス駆動方法 |
| WO2004051761A2 (en) * | 2002-12-02 | 2004-06-17 | Institute For Scientific Research, Inc. | Isotopically enriched piezoelectric devices and method for making the same |
| JP4042551B2 (ja) * | 2002-12-02 | 2008-02-06 | 株式会社ニコン | マイクロアクチュエータ装置及び光スイッチシステム |
| US6844951B2 (en) * | 2002-12-23 | 2005-01-18 | Lexmark International, Inc. | Stationary coil oscillator scanning system |
| US6760145B1 (en) * | 2003-01-23 | 2004-07-06 | Corning Incorporated | Actuator for dual-axis rotation micromirror |
| JP3828501B2 (ja) * | 2003-03-18 | 2006-10-04 | 日本電信電話株式会社 | 光スイッチ装置 |
| US7095546B2 (en) * | 2003-04-24 | 2006-08-22 | Metconnex Canada Inc. | Micro-electro-mechanical-system two dimensional mirror with articulated suspension structures for high fill factor arrays |
| JP3906825B2 (ja) | 2003-06-17 | 2007-04-18 | 日本電気株式会社 | 計算機システム、計算機システム起動方法およびプログラム |
| CN1871497A (zh) * | 2003-10-21 | 2006-11-29 | 皇家飞利浦电子股份有限公司 | 带有至少一个弹性铰链的单块结构 |
| JP4396299B2 (ja) * | 2004-02-09 | 2010-01-13 | 日立金属株式会社 | ミラーシステム及び光スイッチ |
| US7485485B2 (en) * | 2004-02-09 | 2009-02-03 | Microvision, Inc. | Method and apparatus for making a MEMS scanner |
| WO2005099410A2 (en) * | 2004-04-12 | 2005-10-27 | Siverta, Inc. | Single-pole, double-throw mems switch |
| US7442918B2 (en) * | 2004-05-14 | 2008-10-28 | Microvision, Inc. | MEMS device having simplified drive |
| TWI247148B (en) * | 2004-05-28 | 2006-01-11 | Ind Tech Res Inst | Electrostatic movable micro-mirror chip |
| TWI235735B (en) * | 2004-06-18 | 2005-07-11 | Walsin Lihwa Corp | Two-axis element and manufacturing method thereof |
| US7623142B2 (en) * | 2004-09-14 | 2009-11-24 | Hewlett-Packard Development Company, L.P. | Flexure |
| JP4694196B2 (ja) * | 2004-12-28 | 2011-06-08 | オリンパス株式会社 | 光偏向器 |
| JP2006195083A (ja) | 2005-01-12 | 2006-07-27 | Sharp Corp | 光走査装置 |
| JP2006214743A (ja) * | 2005-02-01 | 2006-08-17 | Matsushita Electric Works Ltd | 半導体加速度センサ |
| US7636101B2 (en) | 2005-02-09 | 2009-12-22 | Microvision, Inc. | MEMS scanner adapted to a laser printer |
| CA2536722A1 (en) * | 2005-02-16 | 2006-08-16 | Jds Uniphase Inc. | Articulated mems structures |
| US7359131B1 (en) * | 2005-02-28 | 2008-04-15 | Siimpel Corporation | Lens positioning systems and methods |
| US20070014512A1 (en) * | 2005-07-05 | 2007-01-18 | Texas Instruments Incorporated | Torsional hinged MEMS device |
| US7472596B1 (en) * | 2005-07-26 | 2009-01-06 | Donato Cardarelli | GRA MEMS accelerometer |
| US7528933B2 (en) * | 2006-04-06 | 2009-05-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a MEMS mirror with large deflection using a non-linear spring arrangement |
| US8726730B1 (en) * | 2011-12-14 | 2014-05-20 | Sandia Corporation | Optically transduced MEMS gyro device |
| US8117915B1 (en) * | 2006-07-26 | 2012-02-21 | Milli Sensor Systems + Actuators, Inc. | GRA MEMS accelerometer |
| US9079762B2 (en) | 2006-09-22 | 2015-07-14 | Ethicon Endo-Surgery, Inc. | Micro-electromechanical device |
| US7561317B2 (en) | 2006-11-03 | 2009-07-14 | Ethicon Endo-Surgery, Inc. | Resonant Fourier scanning |
| US7713265B2 (en) | 2006-12-22 | 2010-05-11 | Ethicon Endo-Surgery, Inc. | Apparatus and method for medically treating a tattoo |
| US8801606B2 (en) | 2007-01-09 | 2014-08-12 | Ethicon Endo-Surgery, Inc. | Method of in vivo monitoring using an imaging system including scanned beam imaging unit |
| US8273015B2 (en) | 2007-01-09 | 2012-09-25 | Ethicon Endo-Surgery, Inc. | Methods for imaging the anatomy with an anatomically secured scanner assembly |
| US7589316B2 (en) | 2007-01-18 | 2009-09-15 | Ethicon Endo-Surgery, Inc. | Scanning beam imaging with adjustable detector sensitivity or gain |
| KR100868759B1 (ko) * | 2007-01-25 | 2008-11-17 | 삼성전기주식회사 | 멤스 디바이스 및 이의 제조방법 |
| JP4873560B2 (ja) * | 2007-02-08 | 2012-02-08 | 株式会社リコー | 光走査装置 |
| US8216214B2 (en) | 2007-03-12 | 2012-07-10 | Ethicon Endo-Surgery, Inc. | Power modulation of a scanning beam for imaging, therapy, and/or diagnosis |
| EP1972909A1 (en) * | 2007-03-23 | 2008-09-24 | Koninklijke Philips Electronics N.V. | Luminescence sensor |
| US8626271B2 (en) | 2007-04-13 | 2014-01-07 | Ethicon Endo-Surgery, Inc. | System and method using fluorescence to examine within a patient's anatomy |
| US7995045B2 (en) | 2007-04-13 | 2011-08-09 | Ethicon Endo-Surgery, Inc. | Combined SBI and conventional image processor |
| US8160678B2 (en) | 2007-06-18 | 2012-04-17 | Ethicon Endo-Surgery, Inc. | Methods and devices for repairing damaged or diseased tissue using a scanning beam assembly |
| US7558455B2 (en) | 2007-06-29 | 2009-07-07 | Ethicon Endo-Surgery, Inc | Receiver aperture broadening for scanned beam imaging |
| US7982776B2 (en) | 2007-07-13 | 2011-07-19 | Ethicon Endo-Surgery, Inc. | SBI motion artifact removal apparatus and method |
| US9125552B2 (en) | 2007-07-31 | 2015-09-08 | Ethicon Endo-Surgery, Inc. | Optical scanning module and means for attaching the module to medical instruments for introducing the module into the anatomy |
| US7983739B2 (en) | 2007-08-27 | 2011-07-19 | Ethicon Endo-Surgery, Inc. | Position tracking and control for a scanning assembly |
| US7925333B2 (en) | 2007-08-28 | 2011-04-12 | Ethicon Endo-Surgery, Inc. | Medical device including scanned beam unit with operational control features |
| US8050520B2 (en) | 2008-03-27 | 2011-11-01 | Ethicon Endo-Surgery, Inc. | Method for creating a pixel image from sampled data of a scanned beam imager |
| JP5082983B2 (ja) * | 2008-03-28 | 2012-11-28 | 富士通株式会社 | 光スイッチ及び光スイッチの制御方法、memsデバイスの制御方法 |
| US8332014B2 (en) | 2008-04-25 | 2012-12-11 | Ethicon Endo-Surgery, Inc. | Scanned beam device and method using same which measures the reflectance of patient tissue |
| US8499629B2 (en) * | 2008-10-10 | 2013-08-06 | Honeywell International Inc. | Mounting system for torsional suspension of a MEMS device |
| US8418556B2 (en) * | 2010-02-10 | 2013-04-16 | Robert Bosch Gmbh | Micro electrical mechanical magnetic field sensor utilizing modified inertial elements |
| US8018229B1 (en) | 2010-04-22 | 2011-09-13 | Honeywell International Inc. | Structure and method for flex circuit on a chip |
| KR101239218B1 (ko) | 2010-05-13 | 2013-03-05 | 서울대학교산학협력단 | 양방향 안정성을 가지는 능동지능형 구조체 |
| DE102010029074B4 (de) * | 2010-05-18 | 2018-03-08 | Robert Bosch Gmbh | Anbindungsstruktur für Mikroschwingeneinrichtungen |
| JP5842467B2 (ja) * | 2010-11-16 | 2016-01-13 | 株式会社リコー | アクチュエータ装置、このアクチュエータ装置用の保護カバー、このアクチュエータの製造方法、このアクチュエータ装置を用いた光偏向装置、二次元光走査装置及びこれを用いた画像投影装置 |
| JP2012247372A (ja) * | 2011-05-30 | 2012-12-13 | Nippon Mektron Ltd | 圧力センサ及びその製造方法並びに圧力検出モジュール |
| WO2012170850A2 (en) * | 2011-06-09 | 2012-12-13 | Cymatics Laboratories Corp. | Mems devices made with isotopic materials |
| NL2007554C2 (en) * | 2011-10-10 | 2013-04-11 | Innoluce B V | Mems scanning micromirror. |
| FR2983844B1 (fr) * | 2011-12-12 | 2014-08-08 | Commissariat Energie Atomique | Liaison mecanique formant pivot pour structures mecaniques mems et nems |
| US8783106B1 (en) | 2011-12-13 | 2014-07-22 | Sandia Corporation | Micromachined force-balance feedback accelerometer with optical displacement detection |
| US10730742B2 (en) | 2012-01-24 | 2020-08-04 | Pioneer Corporation | Actuator with plurality of torsion bars having varying spring constant |
| US9819253B2 (en) | 2012-10-25 | 2017-11-14 | Intel Corporation | MEMS device |
| KR102029783B1 (ko) * | 2012-12-06 | 2019-10-08 | 엘지이노텍 주식회사 | 멤스 소자 및 흔들림 보정 장치 |
| TWI497079B (zh) * | 2013-09-10 | 2015-08-21 | Globalmems Co Ltd | 具有耐摔保護功能的可動裝置 |
| TWI580632B (zh) * | 2014-03-14 | 2017-05-01 | 財團法人工業技術研究院 | 具用於旋轉元件之摺疊彈簧的微機電裝置 |
| DE102015103164B4 (de) | 2015-03-04 | 2022-10-20 | Carl Zeiss Microscopy Gmbh | Scanvorrichtung mit wenigstens einer eindimensional scannenden Scaneinheit |
| DE102015209030B4 (de) * | 2015-05-18 | 2023-06-07 | Robert Bosch Gmbh | Mikromechanische Vorrichtung und Verfahren zum Herstellen einer mikromechanischen Vorrichtung |
| JP2017040700A (ja) * | 2015-08-18 | 2017-02-23 | セイコーエプソン株式会社 | 光スキャナー、画像表示装置およびヘッドマウントディスプレイ |
| JP6834201B2 (ja) * | 2016-07-06 | 2021-02-24 | 住友電気工業株式会社 | Memsミラー駆動回路 |
| US10268037B2 (en) * | 2017-04-27 | 2019-04-23 | Google Llc | Interdigitating vertical dampers for MEMS-based actuators |
| JP7112876B2 (ja) | 2017-07-06 | 2022-08-04 | 浜松ホトニクス株式会社 | 光学デバイス |
| JP6514804B1 (ja) | 2017-07-06 | 2019-05-15 | 浜松ホトニクス株式会社 | 光学デバイス |
| EP3650919B1 (en) * | 2017-07-06 | 2023-11-29 | Hamamatsu Photonics K.K. | Optical device |
| US11187872B2 (en) | 2017-07-06 | 2021-11-30 | Hamamatsu Photonics K.K. | Optical device |
| WO2019009393A1 (ja) | 2017-07-06 | 2019-01-10 | 浜松ホトニクス株式会社 | 光学デバイス及びその製造方法 |
| US12031863B2 (en) | 2017-07-06 | 2024-07-09 | Hamamatsu Photonics K.K. | Optical device including movable mirror and first light passage |
| EP3650911B1 (en) | 2017-07-06 | 2023-08-30 | Hamamatsu Photonics K.K. | Optical device |
| CN115657296A (zh) | 2017-11-15 | 2023-01-31 | 浜松光子学株式会社 | 光学器件的制造方法 |
| CN111417884B (zh) * | 2017-12-01 | 2022-07-29 | 浜松光子学株式会社 | 致动器装置 |
| JP6585147B2 (ja) | 2017-12-01 | 2019-10-02 | 浜松ホトニクス株式会社 | アクチュエータ装置 |
| JP7181448B2 (ja) * | 2018-03-30 | 2022-12-01 | ミツミ電機株式会社 | アクチュエータ及び光走査装置 |
| JP6633734B2 (ja) * | 2018-12-27 | 2020-01-22 | パイオニア株式会社 | アクチュエータ |
| FR3094709B1 (fr) * | 2019-04-08 | 2022-10-07 | Commissariat Energie Atomique | Charniere offrant une sensibilite aux contraintes internes reduite |
| FR3094708B1 (fr) * | 2019-04-08 | 2022-12-02 | Commissariat Energie Atomique | Charniere hors-plan pour structure micromecanique et/ou nanomecanique a sensibilite aux contraintes internes reduite |
| US11408911B2 (en) * | 2019-07-17 | 2022-08-09 | Honeywell International Inc. | Optomechanical structure with corrugated edge |
| JP2020046682A (ja) * | 2019-12-12 | 2020-03-26 | パイオニア株式会社 | アクチュエータ |
| JP7587994B2 (ja) * | 2021-01-28 | 2024-11-21 | 浜松ホトニクス株式会社 | アクチュエータデバイスの製造方法 |
| US20240027746A1 (en) * | 2022-07-25 | 2024-01-25 | Ricoh Company, Ltd. | Movable device, projection apparatus, head-up display, laser headlamp, head-mounted display, and object recognition apparatus |
Family Cites Families (63)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4317611A (en) | 1980-05-19 | 1982-03-02 | International Business Machines Corporation | Optical ray deflection apparatus |
| JPS57183515A (en) * | 1981-05-07 | 1982-11-11 | Nissan Motor Co Ltd | Fuel-injected engine |
| JPS644091Y2 (enExample) * | 1981-05-18 | 1989-02-02 | ||
| US4468282A (en) | 1982-11-22 | 1984-08-28 | Hewlett-Packard Company | Method of making an electron beam window |
| US4598585A (en) | 1984-03-19 | 1986-07-08 | The Charles Stark Draper Laboratory, Inc. | Planar inertial sensor |
| US4699006A (en) | 1984-03-19 | 1987-10-13 | The Charles Stark Draper Laboratory, Inc. | Vibratory digital integrating accelerometer |
| US4732440A (en) | 1985-10-22 | 1988-03-22 | Gadhok Jagmohan S | Self resonant scanning device |
| US4670092A (en) | 1986-04-18 | 1987-06-02 | Rockwell International Corporation | Method of fabricating a cantilever beam for a monolithic accelerometer |
| JPS6341080A (ja) | 1986-08-06 | 1988-02-22 | Nissan Motor Co Ltd | 半導体加速度センサ |
| GB8707854D0 (en) * | 1987-04-02 | 1987-05-07 | British Telecomm | Radiation deflector assembly |
| US5016072A (en) | 1988-01-13 | 1991-05-14 | The Charles Stark Draper Laboratory, Inc. | Semiconductor chip gyroscopic transducer |
| US5111693A (en) | 1988-01-13 | 1992-05-12 | The Charles Stark Draper Laboratory, Inc. | Motion restraints for micromechanical devices |
| GB2215840B (en) | 1988-03-26 | 1992-01-08 | Stc Plc | Transducer |
| JP2924200B2 (ja) * | 1990-01-18 | 1999-07-26 | 富士電機株式会社 | ねじり振動子およびその応用素子 |
| US5473945A (en) * | 1990-02-14 | 1995-12-12 | The Charles Stark Draper Laboratory, Inc. | Micromechanical angular accelerometer with auxiliary linear accelerometer |
| JPH04211217A (ja) * | 1990-02-19 | 1992-08-03 | Fuji Electric Co Ltd | 光偏向子 |
| JPH0413975A (ja) | 1990-05-07 | 1992-01-17 | Nec Corp | 半導体加速度センサ |
| US5605598A (en) * | 1990-10-17 | 1997-02-25 | The Charles Stark Draper Laboratory Inc. | Monolithic micromechanical vibrating beam accelerometer with trimmable resonant frequency |
| JP2852368B2 (ja) * | 1991-02-05 | 1999-02-03 | キヤノン株式会社 | トラッキング用回動ミラー装置 |
| JPH04287475A (ja) * | 1991-03-18 | 1992-10-13 | Fujitsu Ltd | 共振型スキャナ |
| US5203208A (en) | 1991-04-29 | 1993-04-20 | The Charles Stark Draper Laboratory | Symmetrical micromechanical gyroscope |
| US5635639A (en) * | 1991-09-11 | 1997-06-03 | The Charles Stark Draper Laboratory, Inc. | Micromechanical tuning fork angular rate sensor |
| US5331852A (en) | 1991-09-11 | 1994-07-26 | The Charles Stark Draper Laboratory, Inc. | Electromagnetic rebalanced micromechanical transducer |
| US5220835A (en) | 1991-09-12 | 1993-06-22 | Ford Motor Company | Torsion beam accelerometer |
| EP0539889A3 (en) * | 1991-10-30 | 1993-07-28 | Steinbichler, Hans, Dr. | Micromechanical actuator |
| US5202785A (en) | 1991-12-20 | 1993-04-13 | Texas Instruments Incorporated | Method and device for steering light |
| JPH0660788A (ja) * | 1992-08-04 | 1994-03-04 | Sharp Corp | 圧電式リレー |
| JPH06103597A (ja) * | 1992-09-16 | 1994-04-15 | Olympus Optical Co Ltd | 集積化光ピックアップ |
| JP3270141B2 (ja) * | 1992-09-29 | 2002-04-02 | 株式会社リコー | 力検出装置 |
| JP3003429B2 (ja) * | 1992-10-08 | 2000-01-31 | 富士電機株式会社 | ねじり振動子および光偏向子 |
| JPH06131960A (ja) * | 1992-10-19 | 1994-05-13 | Sharp Corp | マイクロアクチュエータ、マイクロアクチュエータの製造方法、電気リレーおよび電磁リレー |
| JP2579111B2 (ja) * | 1992-12-15 | 1997-02-05 | 松下電器産業株式会社 | 静電力駆動小型光スキャナ |
| US5650568A (en) * | 1993-02-10 | 1997-07-22 | The Charles Stark Draper Laboratory, Inc. | Gimballed vibrating wheel gyroscope having strain relief features |
| US5416324A (en) | 1993-06-11 | 1995-05-16 | Chun; Cornell S. L. | Optical imaging device with integrated polarizer |
| US5673139A (en) | 1993-07-19 | 1997-09-30 | Medcom, Inc. | Microelectromechanical television scanning device and method for making the same |
| JP2773604B2 (ja) * | 1993-09-02 | 1998-07-09 | 松下電器産業株式会社 | 静電力駆動光走査装置とその製造方法 |
| EP0657760A1 (en) | 1993-09-15 | 1995-06-14 | Texas Instruments Incorporated | Image simulation and projection system |
| US5629790A (en) | 1993-10-18 | 1997-05-13 | Neukermans; Armand P. | Micromachined torsional scanner |
| US5488862A (en) | 1993-10-18 | 1996-02-06 | Armand P. Neukermans | Monolithic silicon rate-gyro with integrated sensors |
| US6044705A (en) * | 1993-10-18 | 2000-04-04 | Xros, Inc. | Micromachined members coupled for relative rotation by torsion bars |
| JP3219123B2 (ja) | 1993-11-29 | 2001-10-15 | 株式会社デンソー | 2次元光走査装置及びそれを用いたバーコード読取装置 |
| JPH07322649A (ja) * | 1994-05-24 | 1995-12-08 | Matsushita Electric Ind Co Ltd | マイクロアクチュエータ装置及びその製造方法 |
| US6000280A (en) | 1995-07-20 | 1999-12-14 | Cornell Research Foundation, Inc. | Drive electrodes for microfabricated torsional cantilevers |
| JP2924738B2 (ja) * | 1995-09-29 | 1999-07-26 | オムロン株式会社 | 光偏向装置 |
| JPH09105634A (ja) * | 1995-10-12 | 1997-04-22 | Nippon Soken Inc | 角速度センサ |
| JPH09159938A (ja) * | 1995-12-11 | 1997-06-20 | Fuji Electric Co Ltd | マイクロミラー装置 |
| US5861549A (en) | 1996-12-10 | 1999-01-19 | Xros, Inc. | Integrated Silicon profilometer and AFM head |
| WO1997023800A1 (en) | 1995-12-26 | 1997-07-03 | Xros, Inc. | Compact document scanner or printer engine |
| US5895866A (en) | 1996-01-22 | 1999-04-20 | Neukermans; Armand P. | Micromachined silicon micro-flow meter |
| JPH1068896A (ja) * | 1996-07-19 | 1998-03-10 | Texas Instr Inc <Ti> | マイクロ・メカニカル・デバイスのためのノン・リニア・ヒンジ |
| US5850375A (en) | 1996-07-30 | 1998-12-15 | Seagate Technology, Inc. | System and method using optical fibers in a data storage and retrieval system |
| US6061323A (en) | 1996-07-30 | 2000-05-09 | Seagate Technology, Inc. | Data storage system having an improved surface micro-machined mirror |
| US6226233B1 (en) | 1996-07-30 | 2001-05-01 | Seagate Technology, Inc. | Magneto-optical system utilizing MSR media |
| US6044056A (en) | 1996-07-30 | 2000-03-28 | Seagate Technology, Inc. | Flying optical head with dynamic mirror |
| US5940549A (en) | 1996-07-30 | 1999-08-17 | Seagate Technology, Incorporated | Optical system and method using optical fibers for storage and retrieval of information |
| US6178150B1 (en) | 1996-07-30 | 2001-01-23 | Seagate Technology Inc. | Offset optics for use with optical heads |
| US6034938A (en) | 1996-07-30 | 2000-03-07 | Seagate Technology, Inc. | Data storage system having an optical processing flying head |
| JP2001525972A (ja) | 1996-08-27 | 2001-12-11 | クインタ・コーポレイション | 微細加工を使用した光学ヘッド |
| WO1998009280A1 (en) | 1996-08-27 | 1998-03-05 | Quinta Corporation | Single-frequency laser source for optical data storage system |
| US5974019A (en) | 1997-05-05 | 1999-10-26 | Seagate Technology, Inc. | Optical system for two-dimensional positioning of light beams |
| WO1998052193A1 (en) | 1997-05-15 | 1998-11-19 | Seagate Technology, Inc. | Optical disc data storage system using optical waveguide |
| US6246657B1 (en) | 1997-09-22 | 2001-06-12 | Iolon, Inc. | Fiber bundle switch |
| US5905201A (en) * | 1997-10-28 | 1999-05-18 | Alliedsignal Inc. | Micromachined rate and acceleration sensor and method |
-
1999
- 1999-09-02 CA CA002340192A patent/CA2340192A1/en not_active Abandoned
- 1999-09-02 KR KR1020017002445A patent/KR100620341B1/ko not_active Expired - Fee Related
- 1999-09-02 WO PCT/US1999/020218 patent/WO2000013210A2/en not_active Ceased
- 1999-09-02 US US09/388,772 patent/US6392220B1/en not_active Expired - Lifetime
- 1999-09-02 JP JP2000568104A patent/JP4776779B2/ja not_active Expired - Fee Related
- 1999-09-02 EP EP99945469A patent/EP1119792A2/en not_active Withdrawn
-
2010
- 2010-11-30 JP JP2010267138A patent/JP5343062B2/ja not_active Expired - Fee Related
-
2013
- 2013-01-21 JP JP2013008267A patent/JP2013099843A/ja not_active Ceased
-
2014
- 2014-04-18 JP JP2014086619A patent/JP2014176964A/ja active Pending
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|---|---|
| EP1119792A2 (en) | 2001-08-01 |
| WO2000013210A9 (en) | 2000-08-31 |
| KR100620341B1 (ko) | 2006-09-13 |
| JP4776779B2 (ja) | 2011-09-21 |
| KR20010085627A (ko) | 2001-09-07 |
| WO2000013210A2 (en) | 2000-03-09 |
| JP2011104768A (ja) | 2011-06-02 |
| JP2013099843A (ja) | 2013-05-23 |
| JP5343062B2 (ja) | 2013-11-13 |
| WO2000013210A3 (en) | 2000-06-15 |
| JP2014176964A (ja) | 2014-09-25 |
| US6392220B1 (en) | 2002-05-21 |
| JP2002524271A (ja) | 2002-08-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| FZDE | Discontinued |