BR8304635A - Dispositivo e processo de deposicao de vapor quimico - Google Patents

Dispositivo e processo de deposicao de vapor quimico

Info

Publication number
BR8304635A
BR8304635A BR8304635A BR8304635A BR8304635A BR 8304635 A BR8304635 A BR 8304635A BR 8304635 A BR8304635 A BR 8304635A BR 8304635 A BR8304635 A BR 8304635A BR 8304635 A BR8304635 A BR 8304635A
Authority
BR
Brazil
Prior art keywords
reaction chamber
steam device
vacuum chamber
chemical steam
chamber
Prior art date
Application number
BR8304635A
Other languages
English (en)
Inventor
Bryant A Campbell
Nicholas E Miller
Original Assignee
Anicon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anicon Inc filed Critical Anicon Inc
Publication of BR8304635A publication Critical patent/BR8304635A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/80—Material per se process of making same
    • Y10S505/815—Process of making per se
    • Y10S505/818—Coating
    • Y10S505/819—Vapor deposition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/825—Apparatus per se, device per se, or process of making or operating same
    • Y10S505/826—Coating
BR8304635A 1982-08-27 1983-08-26 Dispositivo e processo de deposicao de vapor quimico BR8304635A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/412,237 US4545327A (en) 1982-08-27 1982-08-27 Chemical vapor deposition apparatus

Publications (1)

Publication Number Publication Date
BR8304635A true BR8304635A (pt) 1984-04-10

Family

ID=23632185

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8304635A BR8304635A (pt) 1982-08-27 1983-08-26 Dispositivo e processo de deposicao de vapor quimico

Country Status (17)

Country Link
US (1) US4545327A (pt)
EP (1) EP0104764B1 (pt)
JP (1) JPS5959878A (pt)
KR (1) KR880000472B1 (pt)
AT (1) ATE47894T1 (pt)
AU (1) AU538152B2 (pt)
BR (1) BR8304635A (pt)
CA (1) CA1196777A (pt)
DE (1) DE3380823D1 (pt)
DK (1) DK383683A (pt)
ES (2) ES8600086A1 (pt)
IL (1) IL69170A (pt)
IN (1) IN159736B (pt)
NO (1) NO832366L (pt)
PT (1) PT77245B (pt)
YU (1) YU175883A (pt)
ZA (1) ZA835184B (pt)

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Also Published As

Publication number Publication date
YU175883A (en) 1986-04-30
JPS6256232B2 (pt) 1987-11-25
KR840005751A (ko) 1984-11-15
ES540894A0 (es) 1986-06-01
ZA835184B (en) 1984-03-28
ES525174A0 (es) 1985-10-01
ES8607761A1 (es) 1986-06-01
EP0104764B1 (en) 1989-11-08
DK383683D0 (da) 1983-08-22
CA1196777A (en) 1985-11-19
PT77245A (en) 1983-09-01
IL69170A0 (en) 1983-11-30
NO832366L (no) 1984-02-28
US4545327A (en) 1985-10-08
ATE47894T1 (de) 1989-11-15
KR880000472B1 (ko) 1988-04-07
EP0104764A2 (en) 1984-04-04
DE3380823D1 (en) 1989-12-14
IL69170A (en) 1987-03-31
EP0104764A3 (en) 1984-05-16
JPS5959878A (ja) 1984-04-05
AU538152B2 (en) 1984-08-02
DK383683A (da) 1984-02-28
ES8600086A1 (es) 1985-10-01
IN159736B (pt) 1987-06-06
PT77245B (en) 1986-02-12
AU1848083A (en) 1984-03-01

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