BR112015013749A2 - fonte de plasma - Google Patents

fonte de plasma

Info

Publication number
BR112015013749A2
BR112015013749A2 BR112015013749A BR112015013749A BR112015013749A2 BR 112015013749 A2 BR112015013749 A2 BR 112015013749A2 BR 112015013749 A BR112015013749 A BR 112015013749A BR 112015013749 A BR112015013749 A BR 112015013749A BR 112015013749 A2 BR112015013749 A2 BR 112015013749A2
Authority
BR
Brazil
Prior art keywords
plasma source
anode
hollow
opening
source
Prior art date
Application number
BR112015013749A
Other languages
English (en)
Other versions
BR112015013749B1 (pt
Inventor
Hagmann Juerg
Krassnitzer Siegfried
Original Assignee
Oerlikon Surface Solutions Ag Truebbach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Surface Solutions Ag Truebbach filed Critical Oerlikon Surface Solutions Ag Truebbach
Publication of BR112015013749A2 publication Critical patent/BR112015013749A2/pt
Publication of BR112015013749B1 publication Critical patent/BR112015013749B1/pt

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321—Discharge generated by other radiation
    • H01J37/3233—Discharge generated by other radiation using charged particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32596—Hollow cathodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

resumo patente de invenção: "fonte de plasma". a presente invenção se refere a um dispositivo gerador de plasma, abrangendo - uma fonte de plasma com corpo oco de fonte de plasma (1) e uma unidade emissora de elétrons (5), possibilitando emitir elétrons livres para o corpo oco de fonte de plasma, apresentando o corpo oco de fonte de plasma (1) uma primeira entrada de gás (7a) e uma abertura de fonte de plasma (10), a qual forma uma abertura na direção de uma câmara de vácuo, - bem como um anodo com corpo oco de anodo (2), sendo que o corpo oco do anodo (2) apresenta uma segunda entrada de gás (7b) e uma abertura de anodo (11), que forma uma abertura na direção da câmara de vácuo - bem como uma fonte de tensão (8), cujo polo negativo está ligado com a unidade emissora de elétrons (5) e cujo polo positivo está ligado com o corpo oco de anodo (2), sendo que polo positivo da fonte de tensão 8 está unido, adicionalmente, com o corpo oco da fonte de plasma, em forma energizada, através de uma primeira resistência derivada (6a).
BR112015013749-0A 2012-12-13 2013-12-09 dispositivo gerador de plasma e método para o revestimento de substratos BR112015013749B1 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102012024340.5A DE102012024340A1 (de) 2012-12-13 2012-12-13 Plasmaquelle
DE102012024340.5 2012-12-13
PCT/EP2013/003704 WO2014090389A1 (de) 2012-12-13 2013-12-09 Plasmaquelle

Publications (2)

Publication Number Publication Date
BR112015013749A2 true BR112015013749A2 (pt) 2017-07-11
BR112015013749B1 BR112015013749B1 (pt) 2021-02-02

Family

ID=49753120

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112015013749-0A BR112015013749B1 (pt) 2012-12-13 2013-12-09 dispositivo gerador de plasma e método para o revestimento de substratos

Country Status (18)

Country Link
US (1) US10032610B2 (pt)
EP (1) EP2932523B1 (pt)
JP (1) JP6362615B2 (pt)
KR (1) KR102106133B1 (pt)
CN (1) CN105144338B (pt)
AR (1) AR093991A1 (pt)
BR (1) BR112015013749B1 (pt)
CA (1) CA2894942C (pt)
DE (1) DE102012024340A1 (pt)
ES (1) ES2625301T3 (pt)
HU (1) HUE033157T2 (pt)
MX (1) MX346874B (pt)
MY (1) MY174916A (pt)
PL (1) PL2932523T3 (pt)
PT (1) PT2932523T (pt)
RU (1) RU2643508C2 (pt)
SG (2) SG10201709310WA (pt)
WO (1) WO2014090389A1 (pt)

Families Citing this family (6)

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DE102015101294A1 (de) * 2015-01-29 2016-08-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zum Erzeugen eines Hohlkathodenbogenentladungsplasmas
DE102016213830B3 (de) * 2016-07-27 2017-12-07 Carl Zeiss Smt Gmbh Quell-Hohlkörper sowie EUV-Plasma-Lichtquelle mit einem derartigen Quell-Hohlkörper
WO2019246296A1 (en) * 2018-06-20 2019-12-26 Board Of Trustees Of Michigan State University Single beam plasma source
CH715878A1 (de) 2019-02-26 2020-08-31 Oerlikon Surface Solutions Ag Pfaeffikon Magnetanordnung für eine Plasmaquelle zur Durchführung von Plasmabehandlungen.
CN112899662A (zh) * 2019-12-04 2021-06-04 江苏菲沃泰纳米科技股份有限公司 Dlc制备装置和制备方法
US20230407723A1 (en) 2020-11-23 2023-12-21 Schlumberger Technology Corporation Inflatable packer system for submersible well pump

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Also Published As

Publication number Publication date
MX346874B (es) 2017-03-31
JP6362615B2 (ja) 2018-07-25
KR102106133B1 (ko) 2020-05-04
CA2894942C (en) 2021-01-05
CA2894942A1 (en) 2014-06-19
JP2016509333A (ja) 2016-03-24
AR093991A1 (es) 2015-07-01
SG10201709310WA (en) 2018-01-30
US10032610B2 (en) 2018-07-24
KR20150093713A (ko) 2015-08-18
US20150318151A1 (en) 2015-11-05
MX2015007567A (es) 2016-04-15
EP2932523B1 (de) 2017-02-15
CN105144338B (zh) 2017-07-14
PL2932523T3 (pl) 2017-08-31
HUE033157T2 (en) 2017-11-28
RU2015128048A (ru) 2017-01-17
BR112015013749B1 (pt) 2021-02-02
SG11201504651QA (en) 2015-07-30
CN105144338A (zh) 2015-12-09
WO2014090389A1 (de) 2014-06-19
DE102012024340A1 (de) 2014-06-18
ES2625301T3 (es) 2017-07-19
PT2932523T (pt) 2017-04-21
EP2932523A1 (de) 2015-10-21
RU2643508C2 (ru) 2018-02-02
MY174916A (en) 2020-05-21

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Legal Events

Date Code Title Description
B25D Requested change of name of applicant approved

Owner name: OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKON (CH)

B25G Requested change of headquarter approved

Owner name: OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKON (CH)

B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 09/12/2013, OBSERVADAS AS CONDICOES LEGAIS.