WO2009004762A1 - 成膜装置及びその運転方法 - Google Patents

成膜装置及びその運転方法 Download PDF

Info

Publication number
WO2009004762A1
WO2009004762A1 PCT/JP2008/001517 JP2008001517W WO2009004762A1 WO 2009004762 A1 WO2009004762 A1 WO 2009004762A1 JP 2008001517 W JP2008001517 W JP 2008001517W WO 2009004762 A1 WO2009004762 A1 WO 2009004762A1
Authority
WO
WIPO (PCT)
Prior art keywords
cathode
plasma
exit port
power source
filming apparatus
Prior art date
Application number
PCT/JP2008/001517
Other languages
English (en)
French (fr)
Inventor
Motoi Okada
Kenji Yamakawa
Takeshi Furutsuka
Yoshiro Murashita
Original Assignee
Shinmaywa Industries, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinmaywa Industries, Ltd. filed Critical Shinmaywa Industries, Ltd.
Priority to JP2008554954A priority Critical patent/JP5175229B2/ja
Publication of WO2009004762A1 publication Critical patent/WO2009004762A1/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

本発明の成膜装置は、プラズマ流出口（９１）を有する容器（２５）と、カソード（１５）と、を有するプラズマガン（１）と、成膜室（３）と、プラズマ流出口（９１）を閉鎖又は開放するシャッタ装置（３０）と、成膜室（３）の内部に配設されたアノード（７４）と、直流電源（２７）と、制御装置（１０２）と、を備え、制御装置（１０２）は、シャッタ装置（３０）がプラズマ流出口（９１）を閉鎖し、直流電源（２７）がカソード（１５）に電圧を印加し、カソード（１５）でグロー放電を発生させ、シャッタ装置（３０）がプラズマ流出口（９１）を開放し、直流電源（２７）がカソード（１５）に印加する電圧を変更してカソード（１５）でアーク放電を発生させることによりプラズマが生成されるように制御する。
PCT/JP2008/001517 2007-07-02 2008-06-13 成膜装置及びその運転方法 WO2009004762A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008554954A JP5175229B2 (ja) 2007-07-02 2008-06-13 成膜装置及びその運転方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-173667 2007-07-02
JP2007173667 2007-07-02

Publications (1)

Publication Number Publication Date
WO2009004762A1 true WO2009004762A1 (ja) 2009-01-08

Family

ID=40225829

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/001517 WO2009004762A1 (ja) 2007-07-02 2008-06-13 成膜装置及びその運転方法

Country Status (3)

Country Link
JP (1) JP5175229B2 (ja)
TW (1) TW200912020A (ja)
WO (1) WO2009004762A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150093713A (ko) * 2012-12-13 2015-08-18 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 트뤼프바흐 플라즈마 공급원

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05202467A (ja) * 1992-01-28 1993-08-10 Stanley Electric Co Ltd 真空蒸着装置
JPH07233475A (ja) * 1994-02-21 1995-09-05 Asahi Glass Co Ltd ダイアモンド状薄膜の形成方法
JP2005146382A (ja) * 2003-11-18 2005-06-09 Stanley Electric Co Ltd アーク放電型真空成膜装置および成膜方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05202467A (ja) * 1992-01-28 1993-08-10 Stanley Electric Co Ltd 真空蒸着装置
JPH07233475A (ja) * 1994-02-21 1995-09-05 Asahi Glass Co Ltd ダイアモンド状薄膜の形成方法
JP2005146382A (ja) * 2003-11-18 2005-06-09 Stanley Electric Co Ltd アーク放電型真空成膜装置および成膜方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150093713A (ko) * 2012-12-13 2015-08-18 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 트뤼프바흐 플라즈마 공급원
JP2016509333A (ja) * 2012-12-13 2016-03-24 エーリコン・サーフェス・ソリューションズ・アーゲー・トリューバッハ プラズマ源
US10032610B2 (en) 2012-12-13 2018-07-24 Oberlikon Surface Solutions Ag, Pfäffikon Plasma source
KR102106133B1 (ko) * 2012-12-13 2020-05-04 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 플라즈마 공급원

Also Published As

Publication number Publication date
TW200912020A (en) 2009-03-16
JP5175229B2 (ja) 2013-04-03
JPWO2009004762A1 (ja) 2010-08-26

Similar Documents

Publication Publication Date Title
TW200708209A (en) Plasma processing apparatus and plasma processing method
NL1033983A1 (nl) Inrichting voor het opwekken van extreem ultraviolette straling door middel van elektrische ontlading aan regenereerbare elektroden.
EP2405721A3 (en) Pulsed Plasma Device and Method for Generating Pulsed Plasma
WO2008106448A3 (en) Ion sources and methods of operating an electromagnet of an ion source
WO2006019565A3 (en) Method and system for coating internal surfaces of prefabricated process piping in the field
WO2007127896A3 (en) Method and system for conditioning a vapor deposition target
WO2009065039A3 (en) Methods and apparatus for sputtering deposition using direct current
TW200644117A (en) Plasma processing apparatus and plasma processing method
EP1676666A3 (en) Method and system of conserving plasma torch consumable
WO2006031251A3 (en) A portable arc-seeded microwave plasma torch
WO2007059432A3 (en) Non-linear controller for switching power supply
JP2011117854A5 (ja)
WO2009042079A3 (en) Non-radioactive ion sources with ion flow control
TW200701361A (en) Plasma processing apparatus
PL2157205T3 (pl) Proces impulsowego rozpylania magnetronowego o dużej mocy oraz źródło energii elektrycznej o dużej mocy
SG137731A1 (en) Process apparatuses
EP1526191A4 (en) ELECTRODE FOR THE TREATMENT OF SURFACES WITH ELECTRICAL DISCHARGES, METHOD FOR THE TREATMENT OF SURFACES WITH ELECTRICAL DISCHARGES AND DEVICE FOR TREATING SURFACES WITH ELECTRICAL DISCHARGES
WO2007018575A3 (en) Ion generation by the temporal control of gaseous dielectric breakdown
WO2007124879A3 (de) Vorrichtung und verfahren zur homogenen pvd-beschichtung
GB0423502D0 (en) Sputtering system
TW200726526A (en) High voltage module with gas dielectric medium or vacuum
WO2007017271A3 (de) Plasmaerzeugungsvorrichtung und plasmaerzeugungsverfahren
CL2008003606A1 (es) Dispositivo para sellar un horno para coque, que se carga a traves de una abertura horizontalmente dirigida, desde el lado frontal al lado posterior, donde dicha abertura se sella con una combinacion de una pared rigida de la camara y un cuerpo de puerta movil o removible, en que la puerta ajusta exactamente al cerrarla en la abertura.
WO2009004762A1 (ja) 成膜装置及びその運転方法
WO2008064021A3 (en) Method and apparatus for selectively performing chemical ionization or electron ionization

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 2008554954

Country of ref document: JP

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08764112

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08764112

Country of ref document: EP

Kind code of ref document: A1