TW200912020A - Filming apparatus, and its running method - Google Patents

Filming apparatus, and its running method Download PDF

Info

Publication number
TW200912020A
TW200912020A TW097122657A TW97122657A TW200912020A TW 200912020 A TW200912020 A TW 200912020A TW 097122657 A TW097122657 A TW 097122657A TW 97122657 A TW97122657 A TW 97122657A TW 200912020 A TW200912020 A TW 200912020A
Authority
TW
Taiwan
Prior art keywords
plasma
cathode
film forming
container
power source
Prior art date
Application number
TW097122657A
Other languages
English (en)
Chinese (zh)
Inventor
Motoi Okada
Kenji Yamakawa
Takeshi Furutsuka
Yoshiro Murashita
Original Assignee
Shinmaywa Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinmaywa Ind Ltd filed Critical Shinmaywa Ind Ltd
Publication of TW200912020A publication Critical patent/TW200912020A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
TW097122657A 2007-07-02 2008-06-18 Filming apparatus, and its running method TW200912020A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007173667 2007-07-02

Publications (1)

Publication Number Publication Date
TW200912020A true TW200912020A (en) 2009-03-16

Family

ID=40225829

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097122657A TW200912020A (en) 2007-07-02 2008-06-18 Filming apparatus, and its running method

Country Status (3)

Country Link
JP (1) JP5175229B2 (ja)
TW (1) TW200912020A (ja)
WO (1) WO2009004762A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012024340A1 (de) * 2012-12-13 2014-06-18 Oerlikon Trading Ag, Trübbach Plasmaquelle

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0772340B2 (ja) * 1992-01-28 1995-08-02 スタンレー電気株式会社 真空蒸着装置
JPH07233475A (ja) * 1994-02-21 1995-09-05 Asahi Glass Co Ltd ダイアモンド状薄膜の形成方法
JP4038473B2 (ja) * 2003-11-18 2008-01-23 スタンレー電気株式会社 アーク放電型真空成膜装置および成膜方法

Also Published As

Publication number Publication date
WO2009004762A1 (ja) 2009-01-08
JP5175229B2 (ja) 2013-04-03
JPWO2009004762A1 (ja) 2010-08-26

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