SG10201709310WA - Plasma source - Google Patents
Plasma sourceInfo
- Publication number
- SG10201709310WA SG10201709310WA SG10201709310WA SG10201709310WA SG10201709310WA SG 10201709310W A SG10201709310W A SG 10201709310WA SG 10201709310W A SG10201709310W A SG 10201709310WA SG 10201709310W A SG10201709310W A SG 10201709310WA SG 10201709310W A SG10201709310W A SG 10201709310WA
- Authority
- SG
- Singapore
- Prior art keywords
- plasma source
- plasma
- source
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32321—Discharge generated by other radiation
- H01J37/3233—Discharge generated by other radiation using charged particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32596—Hollow cathodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
- H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
- H01J2237/3321—CVD [Chemical Vapor Deposition]
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012024340.5A DE102012024340A1 (en) | 2012-12-13 | 2012-12-13 | plasma source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201709310WA true SG10201709310WA (en) | 2018-01-30 |
Family
ID=49753120
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201709310WA SG10201709310WA (en) | 2012-12-13 | 2013-12-09 | Plasma source |
| SG11201504651QA SG11201504651QA (en) | 2012-12-13 | 2013-12-09 | Plasma source |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201504651QA SG11201504651QA (en) | 2012-12-13 | 2013-12-09 | Plasma source |
Country Status (18)
| Country | Link |
|---|---|
| US (1) | US10032610B2 (en) |
| EP (1) | EP2932523B1 (en) |
| JP (1) | JP6362615B2 (en) |
| KR (1) | KR102106133B1 (en) |
| CN (1) | CN105144338B (en) |
| AR (1) | AR093991A1 (en) |
| BR (1) | BR112015013749B1 (en) |
| CA (1) | CA2894942C (en) |
| DE (1) | DE102012024340A1 (en) |
| ES (1) | ES2625301T3 (en) |
| HU (1) | HUE033157T2 (en) |
| MX (1) | MX346874B (en) |
| MY (1) | MY174916A (en) |
| PL (1) | PL2932523T3 (en) |
| PT (1) | PT2932523T (en) |
| RU (1) | RU2643508C2 (en) |
| SG (2) | SG10201709310WA (en) |
| WO (1) | WO2014090389A1 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102015101294A1 (en) * | 2015-01-29 | 2016-08-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Apparatus for generating a hollow cathode arc discharge plasma |
| DE102016213830B3 (en) * | 2016-07-27 | 2017-12-07 | Carl Zeiss Smt Gmbh | Source hollow body and EUV plasma light source with such a hollow source body |
| CA3103016C (en) * | 2018-06-20 | 2024-01-16 | Board Of Trustees Of Michigan State University | Single beam plasma source |
| CH715878A1 (en) | 2019-02-26 | 2020-08-31 | Oerlikon Surface Solutions Ag Pfaeffikon | Magnet arrangement for a plasma source for performing plasma treatments. |
| CN112899662A (en) * | 2019-12-04 | 2021-06-04 | 江苏菲沃泰纳米科技股份有限公司 | DLC production apparatus and production method |
| US20230407723A1 (en) | 2020-11-23 | 2023-12-21 | Schlumberger Technology Corporation | Inflatable packer system for submersible well pump |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3961103A (en) * | 1972-07-12 | 1976-06-01 | Space Sciences, Inc. | Film deposition |
| JPS6011417B2 (en) | 1979-10-23 | 1985-03-26 | 株式会社東芝 | Hollow cathode discharge device |
| DE3039850A1 (en) * | 1979-10-23 | 1981-05-07 | Tokyo Shibaura Denki K.K., Kawasaki, Kanagawa | DISCHARGE DEVICE WITH HOLLOW CATHODE |
| US4684848A (en) * | 1983-09-26 | 1987-08-04 | Kaufman & Robinson, Inc. | Broad-beam electron source |
| DE3615361C2 (en) * | 1986-05-06 | 1994-09-01 | Santos Pereira Ribeiro Car Dos | Device for the surface treatment of workpieces |
| JPH01252781A (en) * | 1988-03-31 | 1989-10-09 | Joshin Uramoto | Plasma cvd device utilizing pressure gradient type discharge |
| DE4029270C1 (en) | 1990-09-14 | 1992-04-09 | Balzers Ag, Balzers, Li | |
| CA2052080C (en) * | 1990-10-10 | 1997-01-14 | Jesse N. Matossian | Plasma source arrangement for ion implantation |
| DE4216330A1 (en) * | 1991-05-18 | 1992-11-19 | Groza Igor | Ion plasma processing of products - using plasma stream in vacuum chamber with arc discharges and with an electric field directed inwards from the edge of the plasma reservoir |
| JPH05251391A (en) * | 1992-03-04 | 1993-09-28 | Tokyo Electron Tohoku Kk | Plasma processing device for semiconductor wafer |
| CH687111A5 (en) * | 1992-05-26 | 1996-09-13 | Balzers Hochvakuum | A method for generating a low voltage discharge, vacuum treatment system here, as well as for application of the method. |
| US5358596A (en) * | 1992-07-02 | 1994-10-25 | The Board Of Trustees Of The Leland Stanford Junior University | Method and apparatus for growing diamond films |
| JP3365643B2 (en) * | 1992-07-06 | 2003-01-14 | 株式会社神戸製鋼所 | Ion implanter |
| DE4425221C1 (en) * | 1994-07-16 | 1995-08-24 | Dresden Vakuumtech Gmbh | Plasma-aided coating of substrates in reactive atmos. |
| JP3140636B2 (en) * | 1994-07-26 | 2001-03-05 | 日本電子株式会社 | Plasma generator |
| JPH09251935A (en) * | 1996-03-18 | 1997-09-22 | Applied Materials Inc | Plasma igniter, semiconductor producing apparatus using plasma and plasma igniting method for semiconductor device |
| DE29608484U1 (en) * | 1996-05-10 | 1996-09-19 | Dresden Vakuumtech Gmbh | Plasma generating device with a hollow cathode |
| RU2116707C1 (en) * | 1997-01-06 | 1998-07-27 | Институт сильноточной электроники СО РАН | Device for generation of low-temperature gas- discharge plasma |
| GB9722650D0 (en) * | 1997-10-24 | 1997-12-24 | Univ Nanyang | Cathode ARC source with target feeding apparatus |
| KR19990041210A (en) | 1997-11-21 | 1999-06-15 | 박원훈 | Polymer synthesis method of various properties on material surface using plasma |
| US6101972A (en) * | 1998-05-13 | 2000-08-15 | Intevac, Inc. | Plasma processing system and method |
| DE19902146C2 (en) * | 1999-01-20 | 2003-07-31 | Fraunhofer Ges Forschung | Method and device for pulsed plasma activation |
| JP4806146B2 (en) * | 1999-07-13 | 2011-11-02 | エリコン・トレーディング・アクチェンゲゼルシャフト，トリュープバッハ | Apparatus and method for vacuum processing or powder production |
| US6432260B1 (en) * | 1999-08-06 | 2002-08-13 | Advanced Energy Industries, Inc. | Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
| DE19951017A1 (en) * | 1999-10-22 | 2001-05-03 | Bosch Gmbh Robert | Method and device for plasma treatment of surfaces |
| CH696179A5 (en) | 2000-06-08 | 2007-01-31 | Satis Vacuum Ind Vertriebs Ag | Plasma evaporation source for a vacuum coating arrangement for applying coating layers on optical substrates. |
| JP3957549B2 (en) * | 2002-04-05 | 2007-08-15 | 株式会社日立国際電気 | Substrate processing equipment |
| US6902774B2 (en) | 2002-07-25 | 2005-06-07 | Inficon Gmbh | Method of manufacturing a device |
| JP4329403B2 (en) * | 2003-05-19 | 2009-09-09 | 東京エレクトロン株式会社 | Plasma processing equipment |
| US7381311B2 (en) * | 2003-10-21 | 2008-06-03 | The United States Of America As Represented By The Secretary Of The Air Force | Filtered cathodic-arc plasma source |
| DE102004010261A1 (en) * | 2004-03-03 | 2005-09-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Plasma generator for vacuum coating processes uses arc generation controlled by anode current measurement |
| US7557511B2 (en) * | 2005-08-01 | 2009-07-07 | Neocera, Llc | Apparatus and method utilizing high power density electron beam for generating pulsed stream of ablation plasma |
| EP2038911A4 (en) * | 2006-07-06 | 2010-07-07 | Univ Ramot | Device and method for thin film deposition using a vacuum arc in an enclosed cathode-anode assembly |
| JP4859720B2 (en) * | 2007-03-16 | 2012-01-25 | スタンレー電気株式会社 | Plasma deposition system |
| WO2009004762A1 (en) * | 2007-07-02 | 2009-01-08 | Shinmaywa Industries, Ltd. | Filming apparatus, and its running method |
| US20130098872A1 (en) | 2011-10-20 | 2013-04-25 | Applied Materials, Inc. | Switched electron beam plasma source array for uniform plasma production |
| JP5689051B2 (en) * | 2011-11-25 | 2015-03-25 | 株式会社神戸製鋼所 | Ion bombardment equipment |
-
2012
- 2012-12-13 DE DE102012024340.5A patent/DE102012024340A1/en not_active Withdrawn
-
2013
- 2013-12-09 ES ES13802538.2T patent/ES2625301T3/en active Active
- 2013-12-09 MX MX2015007567A patent/MX346874B/en active IP Right Grant
- 2013-12-09 HU HUE13802538A patent/HUE033157T2/en unknown
- 2013-12-09 US US14/651,278 patent/US10032610B2/en active Active
- 2013-12-09 PL PL13802538T patent/PL2932523T3/en unknown
- 2013-12-09 KR KR1020157016889A patent/KR102106133B1/en active IP Right Grant
- 2013-12-09 BR BR112015013749-0A patent/BR112015013749B1/en active IP Right Grant
- 2013-12-09 JP JP2015546892A patent/JP6362615B2/en active Active
- 2013-12-09 MY MYPI2015701962A patent/MY174916A/en unknown
- 2013-12-09 PT PT138025382T patent/PT2932523T/en unknown
- 2013-12-09 CA CA2894942A patent/CA2894942C/en active Active
- 2013-12-09 RU RU2015128048A patent/RU2643508C2/en active
- 2013-12-09 EP EP13802538.2A patent/EP2932523B1/en active Active
- 2013-12-09 CN CN201380065446.6A patent/CN105144338B/en active Active
- 2013-12-09 WO PCT/EP2013/003704 patent/WO2014090389A1/en active Application Filing
- 2013-12-09 SG SG10201709310WA patent/SG10201709310WA/en unknown
- 2013-12-09 SG SG11201504651QA patent/SG11201504651QA/en unknown
- 2013-12-13 AR ARP130104709A patent/AR093991A1/en active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016509333A (en) | 2016-03-24 |
| EP2932523B1 (en) | 2017-02-15 |
| US20150318151A1 (en) | 2015-11-05 |
| KR20150093713A (en) | 2015-08-18 |
| CN105144338B (en) | 2017-07-14 |
| SG11201504651QA (en) | 2015-07-30 |
| US10032610B2 (en) | 2018-07-24 |
| JP6362615B2 (en) | 2018-07-25 |
| WO2014090389A1 (en) | 2014-06-19 |
| EP2932523A1 (en) | 2015-10-21 |
| CA2894942C (en) | 2021-01-05 |
| PT2932523T (en) | 2017-04-21 |
| DE102012024340A1 (en) | 2014-06-18 |
| CN105144338A (en) | 2015-12-09 |
| MX2015007567A (en) | 2016-04-15 |
| CA2894942A1 (en) | 2014-06-19 |
| BR112015013749A2 (en) | 2017-07-11 |
| MY174916A (en) | 2020-05-21 |
| RU2643508C2 (en) | 2018-02-02 |
| AR093991A1 (en) | 2015-07-01 |
| PL2932523T3 (en) | 2017-08-31 |
| BR112015013749B1 (en) | 2021-02-02 |
| RU2015128048A (en) | 2017-01-17 |
| KR102106133B1 (en) | 2020-05-04 |
| HUE033157T2 (en) | 2017-11-28 |
| ES2625301T3 (en) | 2017-07-19 |
| MX346874B (en) | 2017-03-31 |
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