ATE537604T1 - Oberflächenwellenbauelement - Google Patents

Oberflächenwellenbauelement

Info

Publication number
ATE537604T1
ATE537604T1 AT04725791T AT04725791T ATE537604T1 AT E537604 T1 ATE537604 T1 AT E537604T1 AT 04725791 T AT04725791 T AT 04725791T AT 04725791 T AT04725791 T AT 04725791T AT E537604 T1 ATE537604 T1 AT E537604T1
Authority
AT
Austria
Prior art keywords
interdigital electrodes
surface wave
wave component
acoustic wave
surface acoustic
Prior art date
Application number
AT04725791T
Other languages
English (en)
Inventor
Takuo Hada
Takeshi Nakao
Michio Kadota
Osamu Nakagawara
Original Assignee
Murata Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co filed Critical Murata Manufacturing Co
Application granted granted Critical
Publication of ATE537604T1 publication Critical patent/ATE537604T1/de

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/25—Constructional features of resonators using surface acoustic waves
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/0023—Balance-unbalance or balance-balance networks
    • H03H9/0028—Balance-unbalance or balance-balance networks using surface acoustic wave devices
    • H03H9/0085—Balance-unbalance or balance-balance networks using surface acoustic wave devices having four acoustic tracks
    • H03H9/009—Lattice filters
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02086—Means for compensation or elimination of undesirable effects
    • H03H9/02094—Means for compensation or elimination of undesirable effects of adherence
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02818—Means for compensation or elimination of undesirable effects
    • H03H9/02944—Means for compensation or elimination of undesirable effects of ohmic loss
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/125—Driving means, e.g. electrodes, coils
    • H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
    • H03H9/14538—Formation
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/64—Filters using surface acoustic waves
    • H03H9/6423—Means for obtaining a particular transfer characteristic
    • H03H9/6433—Coupled resonator filters
    • H03H9/6483—Ladder SAW filters
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02818—Means for compensation or elimination of undesirable effects
    • H03H9/02897—Means for compensation or elimination of undesirable effects of strain or mechanical damage, e.g. strain due to bending influence
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02818—Means for compensation or elimination of undesirable effects
    • H03H9/02929—Means for compensation or elimination of undesirable effects of ageing changes of characteristics, e.g. electro-acousto-migration

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
  • Electrophonic Musical Instruments (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
AT04725791T 2003-06-17 2004-04-05 Oberflächenwellenbauelement ATE537604T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003171671 2003-06-17
PCT/JP2004/004896 WO2004114521A1 (ja) 2003-06-17 2004-04-05 弾性表面波装置

Publications (1)

Publication Number Publication Date
ATE537604T1 true ATE537604T1 (de) 2011-12-15

Family

ID=33516117

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04725791T ATE537604T1 (de) 2003-06-17 2004-04-05 Oberflächenwellenbauelement

Country Status (6)

Country Link
US (1) US20040256949A1 (de)
EP (1) EP1635458B1 (de)
JP (1) JPWO2004114521A1 (de)
AT (1) ATE537604T1 (de)
TW (1) TWI286882B (de)
WO (1) WO2004114521A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4973732B2 (ja) * 2007-07-30 2012-07-11 株式会社村田製作所 弾性波装置
US7783145B2 (en) * 2007-10-15 2010-08-24 Hewlett-Packard Development Company, L.P. Electrode having nanofilaments
JP2011182117A (ja) * 2010-02-26 2011-09-15 Taiyo Yuden Co Ltd 弾性波デバイスおよびその製造方法
US8552819B2 (en) * 2011-10-26 2013-10-08 Triquint Semiconductor, Inc. High coupling, low loss saw filter and associated method
US9331667B2 (en) * 2014-07-21 2016-05-03 Triquint Semiconductor, Inc. Methods, systems, and apparatuses for temperature compensated surface acoustic wave device
JP6904719B2 (ja) * 2017-02-13 2021-07-21 京セラ株式会社 弾性波素子、フィルタ素子および通信装置
JP6991763B2 (ja) * 2017-07-18 2022-01-13 太陽誘電株式会社 弾性波デバイスおよびその製造方法
CN109672420B (zh) * 2018-12-18 2023-03-31 北方民族大学 设置镁铝合金膜的多层压电基片及其制备方法
CN111641399A (zh) * 2020-06-01 2020-09-08 中国电子科技集团公司第二十六研究所 一种设置有SiO2钝化层的RF滤波器

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS521040U (de) * 1975-06-20 1977-01-06
JPS54132187A (en) * 1978-04-06 1979-10-13 Seiko Instr & Electronics Ltd Crystal oscillator
US4243960A (en) * 1978-08-14 1981-01-06 The United States Of America As Represented By The Secretary Of The Navy Method and materials for tuning the center frequency of narrow-band surface-acoustic-wave (SAW) devices by means of dielectric overlays
JPH0522067A (ja) * 1991-07-15 1993-01-29 Oki Electric Ind Co Ltd 弾性表面波フイルタ
JP3379049B2 (ja) * 1993-10-27 2003-02-17 富士通株式会社 表面弾性波素子とその製造方法
JP3524188B2 (ja) * 1995-01-23 2004-05-10 沖電気工業株式会社 弾性表面波装置
JPH08222402A (ja) * 1995-02-14 1996-08-30 Murata Mfg Co Ltd 電子部品の電極構造及び圧電共振素子の振動電極構造
JPH08227656A (ja) * 1995-02-20 1996-09-03 Merutetsukusu Kk プラズマディスプレイの導電パターン形成方法
JPH0969748A (ja) * 1995-09-01 1997-03-11 Matsushita Electric Ind Co Ltd Ｓａｗデバイスおよびその製造方法
JPH0998043A (ja) * 1995-09-29 1997-04-08 Toshiba Corp 弾性表面波デバイスおよびその製造方法
JPH09199976A (ja) * 1996-01-18 1997-07-31 Hitachi Ltd 弾性表面波素子電極
US6297580B1 (en) * 1998-04-21 2001-10-02 Matsushita Electric Industrial Co., Ltd. Surface acoustic wave device and production method thereof and mobile communication equipment using it
JP2002026685A (ja) * 2000-07-07 2002-01-25 Murata Mfg Co Ltd 弾性表面波素子
JP3414371B2 (ja) * 2000-07-31 2003-06-09 株式会社村田製作所 弾性表面波装置及びその製造方法
JP3445971B2 (ja) * 2000-12-14 2003-09-16 富士通株式会社 弾性表面波素子
GB2381976B (en) * 2000-12-26 2003-12-24 Murata Manufacturing Co Surface acoustic wave apparatus and manufacturing method therefor
JP3870947B2 (ja) * 2001-07-02 2007-01-24 松下電器産業株式会社 弾性表面波装置の製造方法
JP4019693B2 (ja) * 2001-11-09 2007-12-12 株式会社村田製作所 弾性表面波素子
JP4060090B2 (ja) * 2002-02-15 2008-03-12 沖電気工業株式会社 弾性表面波素子

Also Published As

Publication number Publication date
EP1635458B1 (de) 2011-12-14
EP1635458A4 (de) 2008-04-30
TWI286882B (en) 2007-09-11
EP1635458A1 (de) 2006-03-15
JPWO2004114521A1 (ja) 2006-07-27
TW200501573A (en) 2005-01-01
US20040256949A1 (en) 2004-12-23
WO2004114521A1 (ja) 2004-12-29

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