ATE525679T1 - Optischer integrator für eine beleuchtungssystem einer mikrolithographie-projektions- belichtungsvorrichtung - Google Patents

Optischer integrator für eine beleuchtungssystem einer mikrolithographie-projektions- belichtungsvorrichtung

Info

Publication number
ATE525679T1
ATE525679T1 AT07703501T AT07703501T ATE525679T1 AT E525679 T1 ATE525679 T1 AT E525679T1 AT 07703501 T AT07703501 T AT 07703501T AT 07703501 T AT07703501 T AT 07703501T AT E525679 T1 ATE525679 T1 AT E525679T1
Authority
AT
Austria
Prior art keywords
illumination system
projection exposure
optical integrator
exposure device
microlithography projection
Prior art date
Application number
AT07703501T
Other languages
English (en)
Inventor
Oliver Wolf
Heiko Siekmann
Eva Kalchbrenner
Siegfried Rennon
Johannes Wangler
Andre Bresan
Michael Gerhard
Nils Haverkamp
Axel Scholz
Ralf Scharnweber
Michael Layh
Stefan Burkart
Original Assignee
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Application granted granted Critical
Publication of ATE525679T1 publication Critical patent/ATE525679T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T83/00—Cutting
    • Y10T83/02—Other than completely through work thickness
    • Y10T83/0304—Grooving
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T83/00—Cutting
    • Y10T83/04—Processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AT07703501T 2006-02-17 2007-02-16 Optischer integrator für eine beleuchtungssystem einer mikrolithographie-projektions- belichtungsvorrichtung ATE525679T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US77485006P 2006-02-17 2006-02-17
US80436906P 2006-06-09 2006-06-09
PCT/EP2007/001370 WO2007093436A1 (en) 2006-02-17 2007-02-16 Optical integrator for an illumination system of a microlithographic projection exposure apparatus

Publications (1)

Publication Number Publication Date
ATE525679T1 true ATE525679T1 (de) 2011-10-15

Family

ID=38017163

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07703501T ATE525679T1 (de) 2006-02-17 2007-02-16 Optischer integrator für eine beleuchtungssystem einer mikrolithographie-projektions- belichtungsvorrichtung

Country Status (7)

Country Link
US (2) US7880969B2 (de)
EP (1) EP1984788B1 (de)
JP (2) JP5036732B2 (de)
KR (2) KR101306503B1 (de)
CN (1) CN102314096B (de)
AT (1) ATE525679T1 (de)
WO (1) WO2007093436A1 (de)

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CN108873117B (zh) * 2017-05-16 2020-04-21 昇印光电（昆山）股份有限公司 光学元件、手机盖板及制备光学元件的模具
WO2019232812A1 (zh) * 2018-06-05 2019-12-12 中南大学湘雅三医院 一种基于图像识别定位的组织芯片制芯系统及制芯方法
DE102019128362B3 (de) * 2019-10-21 2021-02-18 Trumpf Laser- Und Systemtechnik Gmbh Segmentiertes Strahlformungselement und Laserbearbeitungsanlage
US11702923B2 (en) 2020-08-24 2023-07-18 Helmerich & Payne Technologies, Llc Methods and systems for drilling
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CN112207292B (zh) * 2020-09-30 2021-10-19 上海交通大学 棱边毛刺去除的金刚石刀具刃口优化实现方法
CN115229317B (zh) * 2022-09-21 2022-12-23 贝光科技(苏州)有限公司 多轴离子切割装样装置
CN121340024B (zh) * 2025-12-19 2026-03-10 宁波锦辉光学科技股份有限公司 基于主轴同步旋转的微透镜阵列成形方法及装置

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Also Published As

Publication number Publication date
KR20120003016A (ko) 2012-01-09
JP2009527114A (ja) 2009-07-23
KR20090004877A (ko) 2009-01-12
CN102314096B (zh) 2014-05-21
KR101254843B1 (ko) 2013-04-15
WO2007093436A1 (en) 2007-08-23
US20110083542A1 (en) 2011-04-14
JP5640037B2 (ja) 2014-12-10
US8520307B2 (en) 2013-08-27
EP1984788B1 (de) 2011-09-21
US20090021839A1 (en) 2009-01-22
CN102314096A (zh) 2012-01-11
US7880969B2 (en) 2011-02-01
EP1984788A1 (de) 2008-10-29
JP5036732B2 (ja) 2012-09-26
JP2012156552A (ja) 2012-08-16
KR101306503B1 (ko) 2013-09-09

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