ATE502323T1 - Beleuchtungssystem für die mikrolithographie - Google Patents

Beleuchtungssystem für die mikrolithographie

Info

Publication number
ATE502323T1
ATE502323T1 AT04726980T AT04726980T ATE502323T1 AT E502323 T1 ATE502323 T1 AT E502323T1 AT 04726980 T AT04726980 T AT 04726980T AT 04726980 T AT04726980 T AT 04726980T AT E502323 T1 ATE502323 T1 AT E502323T1
Authority
AT
Austria
Prior art keywords
light
filter
microlithography
illumination system
field
Prior art date
Application number
AT04726980T
Other languages
English (en)
Inventor
Wolfgang Singer
Joachim Wietzorrek
Joachim Hainz
Gabriele Weirauch
Manfred Maul
Original Assignee
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Application granted granted Critical
Publication of ATE502323T1 publication Critical patent/ATE502323T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lighting Device Outwards From Vehicle And Optical Signal (AREA)
AT04726980T 2003-07-30 2004-04-13 Beleuchtungssystem für die mikrolithographie ATE502323T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10334722 2003-07-30
PCT/EP2004/003854 WO2005015314A2 (en) 2003-07-30 2004-04-13 An illumination system for microlithography

Publications (1)

Publication Number Publication Date
ATE502323T1 true ATE502323T1 (de) 2011-04-15

Family

ID=34129472

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04726980T ATE502323T1 (de) 2003-07-30 2004-04-13 Beleuchtungssystem für die mikrolithographie

Country Status (7)

Country Link
US (1) US7911584B2 (de)
EP (1) EP1649324B1 (de)
JP (1) JP5026788B2 (de)
KR (1) KR101144458B1 (de)
AT (1) ATE502323T1 (de)
DE (1) DE602004031844D1 (de)
WO (1) WO2005015314A2 (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003293308A1 (en) 2003-09-17 2005-04-27 Carl Zeiss Smt Ag Masks, lithography device and semiconductor component
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
EP1894063A1 (de) * 2005-06-21 2008-03-05 Carl Zeiss SMT AG Doppelt facettiertes beleuchtungssystem mit abschwächungselementen am pupillenfacettenspiegel
JP2007150295A (ja) 2005-11-10 2007-06-14 Carl Zeiss Smt Ag ラスタ要素を有する光学装置、及びこの光学装置を有する照射システム
WO2007093433A1 (de) 2006-02-17 2007-08-23 Carl Zeiss Smt Ag Beleuchtungssystem für die mikro-lithographie, projektionsbelichtungsanlage mit einem derartigen beleuchtungssystem
DE102006020734A1 (de) 2006-05-04 2007-11-15 Carl Zeiss Smt Ag Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem
DE102006059024A1 (de) 2006-12-14 2008-06-19 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
DE102007023411A1 (de) 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
WO2008101664A1 (en) * 2007-02-20 2008-08-28 Carl Zeiss Smt Ag Optical element with multiple primary light sources
US7843549B2 (en) * 2007-05-23 2010-11-30 Asml Holding N.V. Light attenuating filter for correcting field dependent ellipticity and uniformity
WO2008145364A2 (de) * 2007-05-31 2008-12-04 Carl Zeiss Smt Ag Verfahren zur herstellung eines optischen elementes mit hilfe von abformung, optisches element hergestellt nach diesem verfahren, kollektor und beleuchtungssystem
DE102007041004A1 (de) 2007-08-29 2009-03-05 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Mikrolithografie
US8908151B2 (en) * 2008-02-14 2014-12-09 Nikon Corporation Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system
DE102008001511A1 (de) * 2008-04-30 2009-11-05 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
DE102008002749A1 (de) * 2008-06-27 2009-12-31 Carl Zeiss Smt Ag Beleuchtungsoptik für die Mikrolithografie
NL2003449A (en) * 2008-10-28 2010-04-29 Asml Netherlands Bv Fly's eye integrator, illuminator, lithographic apparatus and method.
DE102009014701A1 (de) 2009-03-27 2010-09-30 Carl Zeiss Smt Ag Optische Baugruppe
WO2010108516A1 (en) 2009-03-27 2010-09-30 Carl Zeiss Smt Ag Illumination optical system for euv microlithography and euv attenuator for an illumination optical system of this kind, illumination system and projection exposure installation having an illumination optical system of this kind
JP5070242B2 (ja) * 2009-05-27 2012-11-07 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ装置
DE102009045491A1 (de) 2009-10-08 2010-11-25 Carl Zeiss Smt Ag Beleuchtungsoptik
KR101505256B1 (ko) * 2010-04-23 2015-03-30 칼 짜이스 에스엠티 게엠베하 리소그래픽 시스템의 광학 소자의 조작을 포함하는 리소그래픽 시스템의 작동 방법
WO2012041697A1 (en) 2010-09-27 2012-04-05 Carl Zeiss Smt Gmbh Mirror, projection objective comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
DE102011085132A1 (de) 2010-11-24 2012-05-24 Carl Zeiss Smt Gmbh Optische Baugruppe für die Projektionslithografie
DE102010062720B4 (de) 2010-12-09 2012-07-12 Carl Zeiss Smt Gmbh EUV-Lithographiesystem
NL2008009A (en) * 2011-02-02 2012-08-06 Asml Netherlands Bv Illumination system, lithographic apparatus and method.
DE102011004326A1 (de) 2011-02-17 2012-08-23 Carl Zeiss Smt Gmbh Optische Baugruppe für eine Beleuchtungsoptik für die Projektionslithographie
JP2013072845A (ja) * 2011-09-29 2013-04-22 Nuflare Technology Inc パターン検査装置及びパターン検査方法
WO2013143594A1 (en) * 2012-03-29 2013-10-03 Carl Zeiss Smt Gmbh Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system
DE102012210174A1 (de) * 2012-06-18 2013-06-06 Carl Zeiss Smt Gmbh Optisches Bauelement
DE102012218221A1 (de) * 2012-10-05 2014-04-10 Carl Zeiss Smt Gmbh Monitorsystem zum Bestimmen von Orientierungen von Spiegelelementen und EUV-Lithographiesystem
DE102014203187A1 (de) 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
DE102014217612A1 (de) 2014-09-03 2016-03-03 Carl Zeiss Smt Gmbh Beleuchtungoptik für die Projektonslithograpfie
US11175487B2 (en) * 2017-06-19 2021-11-16 Suss Microtec Photonic Systems Inc. Optical distortion reduction in projection systems
JP2019028392A (ja) * 2017-08-03 2019-02-21 セイコーエプソン株式会社 光源装置、照明装置及びプロジェクター
DE102021120952B3 (de) * 2021-08-11 2022-11-10 Carl Zeiss Smt Gmbh Verfahren zur Korrektur eines Telezentriefehlers einer Abbildungsvorrichtung und Maskeninspektionsmikroskop

Family Cites Families (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE561573C (de) 1928-04-05 1932-10-15 Aeg Beleuchtungseinrichtung fuer Bildwerfer
US1880414A (en) * 1930-01-03 1932-10-04 Eastman Kodak Co Illuminating system for photographic apparatus
US2186123A (en) * 1937-01-27 1940-01-09 Zeiss Ikon Ag Illuminating system
US2183249A (en) * 1937-11-06 1939-12-12 Zeiss Ikon Ag Illuminating device for projectors
US3541323A (en) * 1968-05-16 1970-11-17 Eg & G Inc Laser beam projector
US3988066A (en) * 1974-01-12 1976-10-26 Canon Kabushiki Kaisha Light exposure apparatus for printing
US3941475A (en) * 1974-07-01 1976-03-02 Tamarack Scientific Co., Inc. Optical microcircuit printing system
US4109304A (en) * 1976-02-23 1978-08-22 Khvalovsky Vladimir Vasilievic Device for coherent lighting of objects
US4155630A (en) * 1977-11-17 1979-05-22 University Of Delaware Speckle elimination by random spatial phase modulation
DE2803277A1 (de) 1978-01-26 1979-08-02 Bosch Gmbh Robert Vorrichtung zur belichtung einer auf eine oberflaeche eines substrats aufgebrachten fotolackschicht
US4241389A (en) * 1979-04-25 1980-12-23 Kasper Instruments, Inc. Multiple apparent source optical imaging system
US4444456A (en) * 1982-06-23 1984-04-24 International Business Machines Corporation Holographic method and apparatus for transformation of a light beam into a line source of required curvature and finite numerical aperture
JPS597359A (ja) * 1982-07-02 1984-01-14 Canon Inc 照明装置
US4521087A (en) * 1983-05-23 1985-06-04 International Business Machines Corporation Optical system with diffuser for transformation of a collimated beam into a self-luminous arc with required curvature and numerical aperture
JPS60218635A (ja) * 1984-04-13 1985-11-01 Canon Inc 照明装置
US4936665A (en) * 1987-10-25 1990-06-26 Whitney Theodore R High resolution imagery systems and methods
US4918583A (en) * 1988-04-25 1990-04-17 Nikon Corporation Illuminating optical device
NL8901077A (nl) * 1989-04-28 1990-11-16 Koninkl Philips Electronics Nv Optische belichtingsstelsel en projectie-apparaat voorzien van een dergelijk stelsel.
JP3360686B2 (ja) * 1990-12-27 2002-12-24 株式会社ニコン 照明光学装置および投影露光装置並びに露光方法および素子製造方法
US5335044A (en) * 1992-02-26 1994-08-02 Nikon Corporation Projection type exposure apparatus and method of exposure
US5333166A (en) * 1992-08-28 1994-07-26 Intel Corporation Self-apodizing collimator for x-ray lithography
US5677939A (en) * 1994-02-23 1997-10-14 Nikon Corporation Illuminating apparatus
JP3633002B2 (ja) * 1994-05-09 2005-03-30 株式会社ニコン 照明光学装置、露光装置及び露光方法
JP3458549B2 (ja) 1994-08-26 2003-10-20 ソニー株式会社 パターン形成方法および該方法を用いた半導体デバイス製造方法と装置
KR100377206B1 (ko) * 1994-08-26 2003-06-09 소니 가부시끼 가이샤 패턴형성방법및이방법을이용한반도체디바이스제조방법
JP3521506B2 (ja) 1994-11-24 2004-04-19 株式会社ニコン 照明装置及び露光装置
JP3608580B2 (ja) * 1995-03-22 2005-01-12 株式会社ニコン 照明光学装置、露光装置、露光方法、及びフライアイレンズ
JP4310816B2 (ja) * 1997-03-14 2009-08-12 株式会社ニコン 照明装置、投影露光装置、デバイスの製造方法、及び投影露光装置の調整方法
AU9095798A (en) * 1997-09-19 1999-04-12 Nikon Corporation Stage device, a scanning aligner and a scanning exposure method, and a device manufactured thereby
JP3101613B2 (ja) 1998-01-30 2000-10-23 キヤノン株式会社 照明光学装置及び投影露光装置
JP4238390B2 (ja) * 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
JP3817365B2 (ja) * 1998-04-30 2006-09-06 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US6438199B1 (en) 1998-05-05 2002-08-20 Carl-Zeiss-Stiftung Illumination system particularly for microlithography
EP0955641B1 (de) * 1998-05-05 2004-04-28 Carl Zeiss Beleuchtungssystem insbesondere für die EUV-Lithographie
DE10053587A1 (de) * 2000-10-27 2002-05-02 Zeiss Carl Beleuchtungssystem mit variabler Einstellung der Ausleuchtung
DE10100265A1 (de) * 2001-01-08 2002-07-11 Zeiss Carl Beleuchtungssystem mit Rasterelementen unterschiedlicher Größe
JP2000162415A (ja) 1998-09-22 2000-06-16 Nikon Corp 反射鏡の製造方法又は反射型照明装置又は半導体露光装置
JP2000162414A (ja) 1998-09-22 2000-06-16 Nikon Corp 反射鏡の製造方法又は反射型照明装置又は半導体露光装置
US6573978B1 (en) * 1999-01-26 2003-06-03 Mcguire, Jr. James P. EUV condenser with non-imaging optics
US6195201B1 (en) * 1999-01-27 2001-02-27 Svg Lithography Systems, Inc. Reflective fly's eye condenser for EUV lithography
JP2000269114A (ja) 1999-03-16 2000-09-29 Nikon Corp 照明装置、露光装置及び露光方法
US6281967B1 (en) * 2000-03-15 2001-08-28 Nikon Corporation Illumination apparatus, exposure apparatus and exposure method
AU2940600A (en) 1999-03-24 2000-10-09 Nikon Corporation Exposure method and apparatus
US20040032576A1 (en) * 1999-03-26 2004-02-19 Nikon Corporation Exposure method and apparatus
DE19935568A1 (de) 1999-07-30 2001-02-15 Zeiss Carl Fa Steuerung der Beleuchtungsverteilung in der Austrittspupille eines EUV-Beleuchtungssystems
WO2001009684A1 (de) 1999-07-30 2001-02-08 Carl Zeiss Steuerung der beleuchtungsverteilung in der austrittspupille eines euv-beleuchtungssystems
KR100662756B1 (ko) * 2000-01-07 2007-01-02 주식회사 엘지이아이 디지털 티브이의 채널 등화기
EP1280008B2 (de) * 2001-07-27 2011-09-14 Canon Kabushiki Kaisha Belichtungssystem, Projektionsbelichtungsapparat und Verfahren zur Herstellung eines Artikels
TW554411B (en) * 2001-08-23 2003-09-21 Nikon Corp Exposure apparatus
JP2003185798A (ja) * 2001-12-13 2003-07-03 Nikon Corp 軟ｘ線光源装置およびｅｕｖ露光装置ならびに照明方法
JP4099423B2 (ja) * 2002-03-18 2008-06-11 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイス製造法
EP1349009B1 (de) 2002-03-18 2009-02-04 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
JP2004343082A (ja) * 2003-04-17 2004-12-02 Asml Netherlands Bv 凹面および凸面を含む集光器を備えたリトグラフ投影装置
WO2004100236A1 (ja) 2003-05-09 2004-11-18 Nikon Corporation 照明光学系、投影露光装置、マイクロデバイスの製造方法、照明装置の製造方法、投影露光装置の調整方法、及び投影露光装置の製造方法

Also Published As

Publication number Publication date
EP1649324B1 (de) 2011-03-16
WO2005015314A3 (en) 2005-11-24
DE602004031844D1 (de) 2011-04-28
KR20060039876A (ko) 2006-05-09
WO2005015314A2 (en) 2005-02-17
US7911584B2 (en) 2011-03-22
KR101144458B1 (ko) 2012-05-14
US20070058274A1 (en) 2007-03-15
JP2007500432A (ja) 2007-01-11
EP1649324A2 (de) 2006-04-26
JP5026788B2 (ja) 2012-09-19

Similar Documents

Publication Publication Date Title
ATE502323T1 (de) Beleuchtungssystem für die mikrolithographie
WO2006066638A8 (en) A filter device for the compensation of an asymmetric pupil illumination
ATE532105T1 (de) Beleuchtungsmethode
TW200627638A (en) LED light system
JO3220B1 (ar) طريقة ونظام وجهاز لتوزيع الضوء بشكل عالي التحكم من تركيبة ضوء تستخدم مصادر ضوء متعددة (اجهزة دايود باعثه للضوء)
DE60305832D1 (de) Lichthärtgerät mit ausgewähltem Spektrum
TW200732702A (en) Illumination system for a microlithographic projection exposure apparatus
DE102005054184A1 (de) Multispektrale Beleuchtungsvorrichtung
TW200630179A (en) Optical illumination system for creating a line beam
JP2007537487A5 (de)
DE602008002911D1 (de) Lichtstrahlenformer
EP1357426A3 (de) Methode zum Anordnen von Mustern auf einer Maske sowie zur Bestimmung der Belichtungsparameter
ATE525679T1 (de) Optischer integrator für eine beleuchtungssystem einer mikrolithographie-projektions- belichtungsvorrichtung
ATE527580T1 (de) Projektionsbelichtungsanlage
TW200740249A (en) Projection apparatus provided with an adjustable filtration system and method thereof for adjusting the colour components of a light beam
DE502005005925D1 (de) Beleuchtungseinrichtung mit Linse und Herstellverfahren für eine solche
EP1793278A3 (de) Beleuchtungssystem
ATE516521T1 (de) Vorrichtung zur holografischen rekonstruktion dreidimensionaler szenen
ATE543337T1 (de) Flacher projektor
ATE552525T1 (de) Projektionsbelichtungsanlage für die mikrolithographie
KR970062818A (ko) 펄스폭 신장광학계 및 이러한 광학계를 갖춘 노광장치
ATE534938T1 (de) Optische beleuchtungseinheit für die euv- mikrolithografie
TW200730876A (en) Optical integrator, illuminating system, exposure system, and manufacturing method of the device
JP2012174936A5 (de)
WO2007076184A3 (en) Method and apparatus for intensity control of multiple light sources

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties