ATE534938T1 - Optische beleuchtungseinheit für die euv- mikrolithografie - Google Patents
Optische beleuchtungseinheit für die euv- mikrolithografieInfo
- Publication number
- ATE534938T1 ATE534938T1 AT10191631T AT10191631T ATE534938T1 AT E534938 T1 ATE534938 T1 AT E534938T1 AT 10191631 T AT10191631 T AT 10191631T AT 10191631 T AT10191631 T AT 10191631T AT E534938 T1 ATE534938 T1 AT E534938T1
- Authority
- AT
- Austria
- Prior art keywords
- facet
- facet elements
- reflective
- elements
- reflective facet
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102009054540A DE102009054540B4 (de) | 2009-12-11 | 2009-12-11 | Beleuchtungsoptik für die EUV-Mikrolithographie |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE534938T1 true ATE534938T1 (de) | 2011-12-15 |
Family
ID=43425885
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT10191631T ATE534938T1 (de) | 2009-12-11 | 2010-11-18 | Optische beleuchtungseinheit für die euv- mikrolithografie |
Country Status (7)
Country | Link |
---|---|
US (1) | US8395754B2 (de) |
EP (1) | EP2333611B8 (de) |
JP (2) | JP5759174B2 (de) |
KR (1) | KR101681785B1 (de) |
AT (1) | ATE534938T1 (de) |
DE (1) | DE102009054540B4 (de) |
TW (1) | TWI509365B (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009045135A1 (de) * | 2009-09-30 | 2011-03-31 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Mikrolithographie |
DE102010062720B4 (de) | 2010-12-09 | 2012-07-12 | Carl Zeiss Smt Gmbh | EUV-Lithographiesystem |
DE102011076460A1 (de) * | 2011-05-25 | 2012-11-29 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik |
WO2013013947A2 (en) | 2011-07-26 | 2013-01-31 | Carl Zeiss Smt Gmbh | Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure method |
DE102011088152A1 (de) | 2011-12-09 | 2013-06-13 | Carl Zeiss Smt Gmbh | EUV-Lithographiesystem |
DE102012207377A1 (de) | 2012-05-03 | 2013-11-07 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik sowie optisches System für die EUV-Projektionslithographie |
DE102012213368A1 (de) | 2012-07-30 | 2013-12-05 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithographie |
DE102012218221A1 (de) | 2012-10-05 | 2014-04-10 | Carl Zeiss Smt Gmbh | Monitorsystem zum Bestimmen von Orientierungen von Spiegelelementen und EUV-Lithographiesystem |
DE102012220597A1 (de) | 2012-11-13 | 2014-05-28 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithographie |
EP2876499B1 (de) | 2013-11-22 | 2017-05-24 | Carl Zeiss SMT GmbH | Beleuchtungssystem eines mikrolithografischen Projektionsbelichtungsgerätes |
KR102605161B1 (ko) * | 2015-02-11 | 2023-11-23 | 칼 짜이스 에스엠티 게엠베하 | Euv 투영 리소그라피를 위한 조명 광학기기 |
KR20230167934A (ko) | 2022-06-03 | 2023-12-12 | 삼성전자주식회사 | 극자외선 노광 장치 및 그것의 동작 방법 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5233456A (en) * | 1991-12-20 | 1993-08-03 | Texas Instruments Incorporated | Resonant mirror and method of manufacture |
DE10053587A1 (de) * | 2000-10-27 | 2002-05-02 | Zeiss Carl | Beleuchtungssystem mit variabler Einstellung der Ausleuchtung |
KR100576746B1 (ko) * | 2001-06-01 | 2006-05-03 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피장치, 디바이스제조방법, 그 디바이스,제어시스템, 컴퓨터프로그램, 및 컴퓨터프로그램물 |
US7015491B2 (en) * | 2001-06-01 | 2006-03-21 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby, control system |
US7170587B2 (en) * | 2002-03-18 | 2007-01-30 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE10219514A1 (de) * | 2002-04-30 | 2003-11-13 | Zeiss Carl Smt Ag | Beleuchtungssystem, insbesondere für die EUV-Lithographie |
US6700644B2 (en) * | 2002-06-05 | 2004-03-02 | Euv Llc | Condenser for photolithography system |
US6870554B2 (en) * | 2003-01-07 | 2005-03-22 | Anvik Corporation | Maskless lithography with multiplexed spatial light modulators |
DE10317667A1 (de) * | 2003-04-17 | 2004-11-18 | Carl Zeiss Smt Ag | Optisches Element für ein Beleuchtungssystem |
US20050017465A1 (en) * | 2003-07-24 | 2005-01-27 | Bergstrom Skegs, Inc. | Wear rod for a snowmobile ski |
EP1668421A2 (de) * | 2003-09-12 | 2006-06-14 | Carl Zeiss SMT AG | Beleuchtungssystem für eine projektions-belichtungsinstallation der mikrolithographie |
US7973908B2 (en) | 2005-05-13 | 2011-07-05 | Carl Zeiss Smt Gmbh | Six-mirror EUV projection system with low incidence angles |
WO2007045434A2 (de) | 2005-10-18 | 2007-04-26 | Carl Zeiss Smt Ag | Kollektor für beleuchtungssysteme mit einer wellenlänge ≤ 193 nm |
DE102006020734A1 (de) | 2006-05-04 | 2007-11-15 | Carl Zeiss Smt Ag | Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem |
JP5262063B2 (ja) * | 2007-10-23 | 2013-08-14 | 株式会社ニコン | 空間光変調ユニット、照明装置、露光装置、及びデバイスの製造方法 |
WO2009100856A1 (en) * | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facet mirror for use in a projection exposure apparatus for microlithography |
DE102008009600A1 (de) * | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
DE102008001511A1 (de) | 2008-04-30 | 2009-11-05 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
JP5657000B2 (ja) * | 2009-08-25 | 2015-01-21 | エーエスエムエル ネザーランズ ビー.ブイ. | 照明システム、リソグラフィ装置、及び照明モード調整方法 |
JP6103467B2 (ja) * | 2011-10-06 | 2017-03-29 | 株式会社ニコン | 照明光学系、照明方法、露光装置、露光方法、およびデバイス製造方法 |
-
2009
- 2009-12-11 DE DE102009054540A patent/DE102009054540B4/de active Active
-
2010
- 2010-11-18 AT AT10191631T patent/ATE534938T1/de active
- 2010-11-18 EP EP10191631A patent/EP2333611B8/de active Active
- 2010-11-18 US US12/949,478 patent/US8395754B2/en active Active
- 2010-12-09 KR KR1020100125681A patent/KR101681785B1/ko active IP Right Grant
- 2010-12-10 JP JP2010294661A patent/JP5759174B2/ja active Active
- 2010-12-10 TW TW099143173A patent/TWI509365B/zh active
-
2015
- 2015-06-05 JP JP2015114572A patent/JP6089375B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
TW201126282A (en) | 2011-08-01 |
KR101681785B1 (ko) | 2016-12-12 |
JP2015163994A (ja) | 2015-09-10 |
DE102009054540B4 (de) | 2011-11-10 |
JP6089375B2 (ja) | 2017-03-08 |
DE102009054540A1 (de) | 2011-06-16 |
US20110141445A1 (en) | 2011-06-16 |
JP5759174B2 (ja) | 2015-08-05 |
EP2333611B1 (de) | 2011-11-23 |
EP2333611A1 (de) | 2011-06-15 |
JP2011124584A (ja) | 2011-06-23 |
EP2333611B8 (de) | 2012-03-07 |
TWI509365B (zh) | 2015-11-21 |
KR20110066868A (ko) | 2011-06-17 |
US8395754B2 (en) | 2013-03-12 |
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