ATE498859T1 - Wasserfreie photolackätzlösung, welche die galvanische korrosion verhindert - Google Patents

Wasserfreie photolackätzlösung, welche die galvanische korrosion verhindert

Info

Publication number
ATE498859T1
ATE498859T1 AT06738451T AT06738451T ATE498859T1 AT E498859 T1 ATE498859 T1 AT E498859T1 AT 06738451 T AT06738451 T AT 06738451T AT 06738451 T AT06738451 T AT 06738451T AT E498859 T1 ATE498859 T1 AT E498859T1
Authority
AT
Austria
Prior art keywords
sub
cleaning compositions
amine group
galvanic corrosion
independently
Prior art date
Application number
AT06738451T
Other languages
English (en)
Inventor
Seiji Inaoka
Original Assignee
Avantor Performance Mat Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Avantor Performance Mat Inc filed Critical Avantor Performance Mat Inc
Application granted granted Critical
Publication of ATE498859T1 publication Critical patent/ATE498859T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/37—Polymers
    • C11D3/3703—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • C11D3/3723—Polyamines or polyalkyleneimines
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
  • Pens And Brushes (AREA)
  • Golf Clubs (AREA)
AT06738451T 2005-04-19 2006-03-16 Wasserfreie photolackätzlösung, welche die galvanische korrosion verhindert ATE498859T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US67292305P 2005-04-19 2005-04-19
PCT/US2006/009389 WO2006112994A1 (en) 2005-04-19 2006-03-16 Non-aqueous photoresist stripper that inhibits galvanic corrosion

Publications (1)

Publication Number Publication Date
ATE498859T1 true ATE498859T1 (de) 2011-03-15

Family

ID=36754183

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06738451T ATE498859T1 (de) 2005-04-19 2006-03-16 Wasserfreie photolackätzlösung, welche die galvanische korrosion verhindert

Country Status (20)

Country Link
US (1) US20080280235A1 (de)
EP (1) EP1877870B1 (de)
JP (1) JP4677030B2 (de)
KR (1) KR101088568B1 (de)
CN (1) CN101164016B (de)
AT (1) ATE498859T1 (de)
BR (1) BRPI0610852A2 (de)
CA (1) CA2605236A1 (de)
DE (1) DE602006020125D1 (de)
DK (1) DK1877870T3 (de)
ES (1) ES2361271T3 (de)
IL (1) IL186565A0 (de)
MY (1) MY145299A (de)
NO (1) NO20075935L (de)
PL (1) PL1877870T3 (de)
PT (1) PT1877870E (de)
SG (1) SG161273A1 (de)
TW (1) TW200700549A (de)
WO (1) WO2006112994A1 (de)
ZA (1) ZA200706296B (de)

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TWI591158B (zh) * 2008-03-07 2017-07-11 恩特葛瑞斯股份有限公司 非選擇性氧化物蝕刻濕清潔組合物及使用方法
JP4903242B2 (ja) * 2008-10-28 2012-03-28 アバントール パフォーマンス マテリアルズ， インコーポレイテッド 多金属デバイス処理のためのグルコン酸含有フォトレジスト洗浄組成物
US8110535B2 (en) * 2009-08-05 2012-02-07 Air Products And Chemicals, Inc. Semi-aqueous stripping and cleaning formulation for metal substrate and methods for using same
US8518865B2 (en) * 2009-08-31 2013-08-27 Air Products And Chemicals, Inc. Water-rich stripping and cleaning formulation and method for using same
WO2013118013A1 (en) * 2012-02-06 2013-08-15 Basf Se A post chemical-mechanical-polishing (post-cmp) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid
CN103389627A (zh) * 2012-05-11 2013-11-13 安集微电子科技(上海)有限公司 一种光刻胶清洗液
KR102349076B1 (ko) * 2018-02-14 2022-01-10 메르크 파텐트 게엠베하 포토레지스트 제거제 조성물
CN112424327A (zh) * 2018-07-20 2021-02-26 恩特格里斯公司 含腐蚀抑制剂的清洗组合物
CN109557774A (zh) * 2019-01-22 2019-04-02 上海华虹宏力半导体制造有限公司 光刻胶去除方法及铝制程工艺方法
CN110967946A (zh) * 2019-12-04 2020-04-07 苏州博洋化学股份有限公司 一种高效碱性光刻胶剥离液

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US4671251A (en) * 1984-09-24 1987-06-09 Ohio State University Fluidized bed combustor
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US5166039A (en) * 1988-02-25 1992-11-24 Hoya Corporation Peeling solution for photo- or electron beam-sensitive resin and process for peeling off said resin
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US4921571A (en) * 1989-07-28 1990-05-01 Macdermid, Incorporated Inhibited composition and method for stripping tin, lead or tin-lead alloy from copper surfaces
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Also Published As

Publication number Publication date
DK1877870T3 (da) 2011-05-02
PT1877870E (pt) 2011-05-24
KR20060110712A (ko) 2006-10-25
CN101164016A (zh) 2008-04-16
KR101088568B1 (ko) 2011-12-05
EP1877870B1 (de) 2011-02-16
CN101164016B (zh) 2010-12-01
NO20075935L (no) 2008-01-18
TW200700549A (en) 2007-01-01
WO2006112994A1 (en) 2006-10-26
JP2008537182A (ja) 2008-09-11
PL1877870T3 (pl) 2011-07-29
SG161273A1 (en) 2010-05-27
IL186565A0 (en) 2008-01-20
EP1877870A1 (de) 2008-01-16
BRPI0610852A2 (pt) 2010-08-03
DE602006020125D1 (de) 2011-03-31
JP4677030B2 (ja) 2011-04-27
ZA200706296B (en) 2008-09-25
US20080280235A1 (en) 2008-11-13
CA2605236A1 (en) 2006-10-26
ES2361271T3 (es) 2011-06-15
MY145299A (en) 2012-01-13

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