ATE463763T1 - Wasserfreie nicht korrosive mikroelektronische reinigungsverbindungen mit polymerischen corrosionsinhibitoren - Google Patents

Wasserfreie nicht korrosive mikroelektronische reinigungsverbindungen mit polymerischen corrosionsinhibitoren

Info

Publication number
ATE463763T1
ATE463763T1 AT05712395T AT05712395T ATE463763T1 AT E463763 T1 ATE463763 T1 AT E463763T1 AT 05712395 T AT05712395 T AT 05712395T AT 05712395 T AT05712395 T AT 05712395T AT E463763 T1 ATE463763 T1 AT E463763T1
Authority
AT
Austria
Prior art keywords
water
corrosion inhibitors
free non
cleaning compounds
microelectronic cleaning
Prior art date
Application number
AT05712395T
Other languages
English (en)
Inventor
Seiji Inaoka
Original Assignee
Mallinckrodt Baker Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mallinckrodt Baker Inc filed Critical Mallinckrodt Baker Inc
Application granted granted Critical
Publication of ATE463763T1 publication Critical patent/ATE463763T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/30—Amines; Substituted amines ; Quaternized amines
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/0005—Other compounding ingredients characterised by their effect
    • C11D3/0073—Anticorrosion compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/37—Polymers
    • C11D3/3703—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • C11D3/3723—Polyamines or polyalkyleneimines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/37—Polymers
    • C11D3/3746—Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C11D3/3753—Polyvinylalcohol; Ethers or esters thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/43—Solvents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • C11D2111/22—
AT05712395T 2004-12-10 2005-02-01 Wasserfreie nicht korrosive mikroelektronische reinigungsverbindungen mit polymerischen corrosionsinhibitoren ATE463763T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US63494504P 2004-12-10 2004-12-10
PCT/US2005/002940 WO2006065256A1 (en) 2004-12-10 2005-02-01 Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors

Publications (1)

Publication Number Publication Date
ATE463763T1 true ATE463763T1 (de) 2010-04-15

Family

ID=34960534

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05712395T ATE463763T1 (de) 2004-12-10 2005-02-01 Wasserfreie nicht korrosive mikroelektronische reinigungsverbindungen mit polymerischen corrosionsinhibitoren

Country Status (17)

Country Link
US (2) US7947639B2 (de)
EP (1) EP1828848B1 (de)
JP (1) JP4272677B2 (de)
KR (1) KR100744223B1 (de)
CN (1) CN101076760B (de)
AT (1) ATE463763T1 (de)
BR (1) BRPI0518420A2 (de)
CA (1) CA2591477A1 (de)
DE (1) DE602005020499D1 (de)
IL (1) IL183699A (de)
MY (1) MY143658A (de)
NO (1) NO20073497L (de)
PL (1) PL1828848T3 (de)
PT (1) PT1828848E (de)
TW (1) TWI353380B (de)
WO (1) WO2006065256A1 (de)
ZA (1) ZA200704704B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060064441A (ko) * 2004-12-08 2006-06-13 말린크로트 베이커, 인코포레이티드 비수성 비부식성 마이크로전자 세정 조성물
CN101076760B (zh) * 2004-12-10 2010-12-22 马林克罗特贝克公司 含有聚合物腐蚀抑制剂的非水的、无腐蚀性的微电子清洁组合物
KR101088568B1 (ko) * 2005-04-19 2011-12-05 아반토르 퍼포먼스 머티리얼스, 인크. 갈바닉 부식을 억제하는 비수성 포토레지스트 스트립퍼
CN101126053A (zh) * 2006-08-17 2008-02-20 安集微电子（上海）有限公司 用于半导体工业中等离子刻蚀残留物的清洗液组合物
BRPI0908905A2 (pt) * 2008-02-29 2015-09-22 Mallinckrodt Baker Inc composições para limpeza de substrato microeletrônico
SG188848A1 (en) * 2008-03-07 2013-04-30 Advanced Tech Materials Non-selective oxide etch wet clean composition and method of use
JP5305803B2 (ja) * 2008-09-19 2013-10-02 株式会社カネカ ポリエーテル類の製造方法
KR101579846B1 (ko) * 2008-12-24 2015-12-24 주식회사 이엔에프테크놀로지 포토레지스트 패턴 제거용 조성물 및 이를 이용한 금속 패턴의 형성 방법
BRPI1007989A2 (pt) * 2009-02-25 2016-03-01 Avantor Performance Mat Inc composição multiuso de limpeza de microeletrônicos á base de solvente orgânico ácido
WO2013052809A1 (en) 2011-10-05 2013-04-11 Avantor Performance Materials, Inc. Microelectronic substrate cleaning compositions having copper/azole polymer inhibition
CN102618900B (zh) * 2012-04-14 2016-12-14 烟台恒迪克能源科技有限公司 一种三极管表面处理液及其制备方法
CN109971565B (zh) * 2017-12-27 2021-10-22 安集微电子（上海）有限公司 一种含氟清洗液
JP2020094152A (ja) * 2018-12-14 2020-06-18 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ 基板洗浄液、これを用いる洗浄された基板の製造方法およびデバイスの製造方法
WO2022093807A1 (en) * 2020-10-26 2022-05-05 Advanced & Innovative Multifunctional Materials, Llc Oxygenated hierarchically porous carbon compounds as scaffolds for metal nanoparticles
CN113201743B (zh) * 2021-04-08 2022-06-21 浙江工业大学 一种适用于电子器件的除锈剂及其制备方法
CN113921383B (zh) 2021-09-14 2022-06-03 浙江奥首材料科技有限公司 一种铜表面钝化组合物、其用途及包含其的光刻胶剥离液

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60208752A (ja) * 1984-04-03 1985-10-21 Asahi Glass Co Ltd ホトレジスト剥離用組成物
IE59971B1 (en) * 1986-11-10 1994-05-04 Baker J T Inc Stripping compositions and their use for stripping resists from substrates
CA2059867A1 (en) 1991-02-13 1992-08-14 Miles Inc. Binder and vehicle for inks and other color formulations
US5561105A (en) 1995-05-08 1996-10-01 Ocg Microelectronic Materials, Inc. Chelating reagent containing photoresist stripper composition
JPH08311492A (ja) * 1995-05-19 1996-11-26 Yushiro Chem Ind Co Ltd 水系洗浄剤組成物
JPH0934117A (ja) * 1995-07-21 1997-02-07 Fuji Photo Film Co Ltd 光重合性平版印刷版
US6268323B1 (en) * 1997-05-05 2001-07-31 Arch Specialty Chemicals, Inc. Non-corrosive stripping and cleaning composition
US6136714A (en) 1998-12-17 2000-10-24 Siemens Aktiengesellschaft Methods for enhancing the metal removal rate during the chemical-mechanical polishing process of a semiconductor
JP3891768B2 (ja) 1999-12-28 2007-03-14 株式会社トクヤマ 残さ洗浄液
TW594444B (en) 2000-09-01 2004-06-21 Tokuyama Corp Residue cleaning solution
US6599370B2 (en) * 2000-10-16 2003-07-29 Mallinckrodt Inc. Stabilized alkaline compositions for cleaning microelectronic substrates
KR200241834Y1 (ko) * 2001-05-14 2001-10-15 김경철 농업용 열풍보일러
KR20040032855A (ko) * 2001-07-13 2004-04-17 이케이씨 테크놀로지, 인코포레이티드 술폭시드 피롤리드(인)온 알칸올아민 박리 및 세정 조성물
JP4639567B2 (ja) * 2001-09-28 2011-02-23 三菱瓦斯化学株式会社 フォトレジスト剥離液組成物
JP2004101849A (ja) 2002-09-09 2004-04-02 Mitsubishi Gas Chem Co Inc 洗浄剤組成物
CN101076760B (zh) * 2004-12-10 2010-12-22 马林克罗特贝克公司 含有聚合物腐蚀抑制剂的非水的、无腐蚀性的微电子清洁组合物

Also Published As

Publication number Publication date
CN101076760B (zh) 2010-12-22
US7947639B2 (en) 2011-05-24
EP1828848A1 (de) 2007-09-05
IL183699A (en) 2012-10-31
DE602005020499D1 (de) 2010-05-20
MY143658A (en) 2011-06-30
BRPI0518420A2 (pt) 2008-11-25
US20090156453A1 (en) 2009-06-18
CA2591477A1 (en) 2006-06-22
ZA200704704B (en) 2008-09-25
NO20073497L (no) 2007-07-06
KR20060065412A (ko) 2006-06-14
IL183699A0 (en) 2007-09-20
PT1828848E (pt) 2010-05-21
US20110207645A1 (en) 2011-08-25
KR100744223B1 (ko) 2007-07-30
TWI353380B (en) 2011-12-01
JP4272677B2 (ja) 2009-06-03
CN101076760A (zh) 2007-11-21
TW200619379A (en) 2006-06-16
JP2007514984A (ja) 2007-06-07
EP1828848B1 (de) 2010-04-07
WO2006065256A1 (en) 2006-06-22
PL1828848T3 (pl) 2010-09-30

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