ATE379836T1 - Halbreflektierende und reflektierende schicht für ein optisches informationsaufzeichnungsmedium, informationsaufzeichnungsmedium, und sputter target - Google Patents
Halbreflektierende und reflektierende schicht für ein optisches informationsaufzeichnungsmedium, informationsaufzeichnungsmedium, und sputter targetInfo
- Publication number
- ATE379836T1 ATE379836T1 AT05013364T AT05013364T ATE379836T1 AT E379836 T1 ATE379836 T1 AT E379836T1 AT 05013364 T AT05013364 T AT 05013364T AT 05013364 T AT05013364 T AT 05013364T AT E379836 T1 ATE379836 T1 AT E379836T1
- Authority
- AT
- Austria
- Prior art keywords
- recording medium
- information recording
- semi
- reflective film
- based alloy
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
- G11B7/259—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/06—Alloys based on silver
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
- C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/2403—Layers; Shape, structure or physical properties thereof
- G11B7/24035—Recording layers
- G11B7/24038—Multiple laminated recording layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/266—Sputtering or spin-coating layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/21—Circular sheet or circular blank
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Optical Record Carriers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004190704 | 2004-06-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE379836T1 true ATE379836T1 (de) | 2007-12-15 |
Family
ID=34937582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT05013364T ATE379836T1 (de) | 2004-06-29 | 2005-06-21 | Halbreflektierende und reflektierende schicht für ein optisches informationsaufzeichnungsmedium, informationsaufzeichnungsmedium, und sputter target |
Country Status (8)
Country | Link |
---|---|
US (1) | US7507458B2 (de) |
EP (1) | EP1612784B1 (de) |
KR (1) | KR100789059B1 (de) |
CN (1) | CN100416681C (de) |
AT (1) | ATE379836T1 (de) |
DE (1) | DE602005003508T2 (de) |
SG (1) | SG118417A1 (de) |
TW (1) | TW200614187A (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100568392B1 (ko) * | 2002-06-24 | 2006-04-05 | 가부시키가이샤 코베루코 카겐 | 은 합금 스퍼터링 타겟 및 그의 제조 방법 |
US7514037B2 (en) * | 2002-08-08 | 2009-04-07 | Kobe Steel, Ltd. | AG base alloy thin film and sputtering target for forming AG base alloy thin film |
JP3993530B2 (ja) * | 2003-05-16 | 2007-10-17 | 株式会社神戸製鋼所 | Ag−Bi系合金スパッタリングターゲットおよびその製造方法 |
EP1612784B1 (de) | 2004-06-29 | 2007-11-28 | Kabushiki Kaisha Kobe Seiko Sho | Halbreflektierende und reflektierende Schicht für ein optisches Informationsaufzeichnungsmedium, Informationsaufzeichnungsmedium, und Sputter Target |
JP2006240289A (ja) * | 2005-02-07 | 2006-09-14 | Kobe Steel Ltd | 光情報記録媒体用記録膜および光情報記録媒体ならびにスパッタリングターゲット |
JP2006294195A (ja) * | 2005-04-14 | 2006-10-26 | Kobe Steel Ltd | 光情報記録用Ag合金反射膜、光情報記録媒体および光情報記録用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
JP4527624B2 (ja) * | 2005-07-22 | 2010-08-18 | 株式会社神戸製鋼所 | Ag合金反射膜を有する光情報媒体 |
JP4377861B2 (ja) * | 2005-07-22 | 2009-12-02 | 株式会社神戸製鋼所 | 光情報記録媒体用Ag合金反射膜、光情報記録媒体および光情報記録媒体用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
JP2007035104A (ja) * | 2005-07-22 | 2007-02-08 | Kobe Steel Ltd | 光情報記録媒体用Ag合金反射膜、光情報記録媒体および光情報記録媒体用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
EP1791151A1 (de) * | 2005-11-29 | 2007-05-30 | Nanoshell Materials Research & Development GmbH | Metallische Gassorptionsmitteln auf Lithiumlegierungsbasis |
JP4377877B2 (ja) | 2005-12-21 | 2009-12-02 | ソニー株式会社 | 光情報記録媒体用Ag合金反射膜、光情報記録媒体および光情報記録媒体用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
CN101942644B (zh) * | 2005-12-29 | 2013-01-02 | 三菱麻铁里亚尔株式会社 | 光记录介质用半透明反射膜和反射膜、以及用于形成这些半透明反射膜和反射膜的Ag合金溅射靶 |
JP4864538B2 (ja) * | 2006-05-19 | 2012-02-01 | 三菱マテリアル株式会社 | 光記録媒体用半透明反射膜およびこの半透明反射膜を形成するためのAg合金スパッタリングターゲット |
JP2007335061A (ja) * | 2006-05-16 | 2007-12-27 | Sony Corp | 光情報記録媒体とそのBCA(BurstCuttingArea)マーキング方法 |
JP2007323776A (ja) * | 2006-06-02 | 2007-12-13 | Toshiba Corp | 光記録媒体、情報記録方法、情報再生方法 |
US8092889B2 (en) * | 2006-08-28 | 2012-01-10 | Kobe Steel, Ltd. | Silver alloy reflective film for optical information storage media, optical information storage medium, and sputtering target for the deposition of silver alloy reflective film for optical information storage media |
JP2008117470A (ja) * | 2006-11-02 | 2008-05-22 | Sony Corp | 光情報記録媒体および光情報記録媒体の製造方法、BCA(BurstCuttingArea)マーキング方法 |
EP2048664A1 (de) * | 2006-11-17 | 2009-04-15 | Tanaka Kikinzoku Kogyo K.K. | Dünnfilm für einen reflektionsfilm oder halbtransparenten reflektionsfilm, sputter-target und optisches aufzeichnungsmedium |
JP4540687B2 (ja) * | 2007-04-13 | 2010-09-08 | 株式会社ソニー・ディスクアンドデジタルソリューションズ | 読み出し専用の光情報記録媒体 |
JP4694543B2 (ja) * | 2007-08-29 | 2011-06-08 | 株式会社コベルコ科研 | Ag基合金スパッタリングターゲット、およびその製造方法 |
JP4833942B2 (ja) * | 2007-08-29 | 2011-12-07 | 株式会社コベルコ科研 | Ag基合金スパッタリングターゲット |
JP2009076129A (ja) * | 2007-09-19 | 2009-04-09 | Kobe Steel Ltd | 読み出し専用の光情報記録媒体 |
JP5046890B2 (ja) * | 2007-11-29 | 2012-10-10 | 株式会社コベルコ科研 | Ag系スパッタリングターゲット |
JP5331420B2 (ja) | 2008-09-11 | 2013-10-30 | 株式会社神戸製鋼所 | 読み出し専用の光情報記録媒体および該光情報記録媒体の半透過反射膜形成用スパッタリングターゲット |
JP2010225572A (ja) * | 2008-11-10 | 2010-10-07 | Kobe Steel Ltd | 有機elディスプレイ用の反射アノード電極および配線膜 |
CN102369571A (zh) | 2009-04-14 | 2012-03-07 | 株式会社神户制钢所 | 光信息记录媒体、形成光信息记录媒体的反射膜用的溅射靶 |
JP5103462B2 (ja) * | 2009-11-18 | 2012-12-19 | 株式会社神戸製鋼所 | Ag合金熱拡散制御膜およびこれを備えた熱アシスト記録用磁気記録媒体 |
JP5682165B2 (ja) * | 2010-07-23 | 2015-03-11 | セイコーエプソン株式会社 | 干渉フィルター、光モジュール、及び分析装置 |
JP2012042651A (ja) * | 2010-08-18 | 2012-03-01 | Seiko Epson Corp | 干渉フィルター、光モジュール、及び分析装置 |
CN102851525B (zh) * | 2011-06-28 | 2015-07-22 | 比亚迪股份有限公司 | 一种银合金反射膜及具有该反射膜的电致变色器 |
JP5910099B2 (ja) * | 2012-01-18 | 2016-04-27 | セイコーエプソン株式会社 | 干渉フィルター、光学モジュールおよび電子機器 |
WO2013138472A1 (en) * | 2012-03-16 | 2013-09-19 | The Trustees Of The University Of Pennsylvania | Method and material for protecting magnetic information storage media |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US293072A (en) * | 1884-02-05 | Fire-escape | ||
US273794A (en) * | 1883-03-13 | Franz a | ||
US292651A (en) * | 1884-01-29 | Refuse attachment for table-plates | ||
US292662A (en) * | 1884-01-29 | Centrifugal creamer | ||
US4810308A (en) * | 1987-04-13 | 1989-03-07 | Leach & Garner Company | Silver alloys of exceptional and reversible hardness |
JPH0428032A (ja) | 1990-05-24 | 1992-01-30 | Daicel Chem Ind Ltd | 光情報記録媒体 |
US5637411A (en) | 1991-07-29 | 1997-06-10 | Hitachi Maxell, Ltd. | Magneto-optical recording medium and process for producing the same |
JP2004006051A (ja) | 1991-07-29 | 2004-01-08 | Hitachi Maxell Ltd | 情報の記録方法 |
JPH05258363A (ja) | 1992-03-10 | 1993-10-08 | Sumitomo Metal Mining Co Ltd | 光磁気記録媒体 |
US5948497A (en) | 1992-10-19 | 1999-09-07 | Eastman Kodak Company | High stability silver based alloy reflectors for use in a writable compact disk |
JPH06328854A (ja) * | 1993-05-18 | 1994-11-29 | Mitsubishi Plastics Ind Ltd | 光記録媒体 |
JPH0711426A (ja) * | 1993-06-23 | 1995-01-13 | Kobe Steel Ltd | Al合金薄膜 |
JPH10162435A (ja) * | 1996-11-26 | 1998-06-19 | Asahi Chem Ind Co Ltd | 光情報記録媒体 |
US6007889A (en) | 1998-06-22 | 1999-12-28 | Target Technology, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US6544616B2 (en) * | 2000-07-21 | 2003-04-08 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
JP3365762B2 (ja) * | 2000-04-28 | 2003-01-14 | 株式会社神戸製鋼所 | 光情報記録媒体用の反射層または半透明反射層、光情報記録媒体及び光情報記録媒体用スパッタリングターゲット |
SG116432A1 (en) * | 2000-12-26 | 2005-11-28 | Kobe Steel Ltd | Reflective layer or semi-transparent reflective layer for use in optical information recording media, optical information recording media and sputtering target for use in the optical information recording media. |
US7022384B2 (en) | 2002-01-25 | 2006-04-04 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Reflective film, reflection type liquid crystal display, and sputtering target for forming the reflective film |
CN1665678A (zh) * | 2002-05-08 | 2005-09-07 | 目标技术有限公司 | 银合金薄膜反射器和透明导电体 |
KR100568392B1 (ko) | 2002-06-24 | 2006-04-05 | 가부시키가이샤 코베루코 카겐 | 은 합금 스퍼터링 타겟 및 그의 제조 방법 |
US7514037B2 (en) | 2002-08-08 | 2009-04-07 | Kobe Steel, Ltd. | AG base alloy thin film and sputtering target for forming AG base alloy thin film |
TWI368819B (en) * | 2003-04-18 | 2012-07-21 | Target Technology Co Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
JP3993530B2 (ja) | 2003-05-16 | 2007-10-17 | 株式会社神戸製鋼所 | Ag−Bi系合金スパッタリングターゲットおよびその製造方法 |
JP4009564B2 (ja) | 2003-06-27 | 2007-11-14 | 株式会社神戸製鋼所 | リフレクター用Ag合金反射膜、及び、このAg合金反射膜を用いたリフレクター、並びに、このAg合金反射膜のAg合金薄膜の形成用のAg合金スパッタリングターゲット |
JP2005029849A (ja) | 2003-07-07 | 2005-02-03 | Kobe Steel Ltd | リフレクター用Ag合金反射膜、及び、このAg合金反射膜を用いたリフレクター、並びに、このAg合金反射膜の形成用のAg合金スパッタリングターゲット |
WO2005035237A1 (en) * | 2003-10-09 | 2005-04-21 | Target Technology Company, Llc | Multi-layer optical information storage medium and method of making the same |
US20050112019A1 (en) | 2003-10-30 | 2005-05-26 | Kabushiki Kaisha Kobe Seiko Sho(Kobe Steel, Ltd.) | Aluminum-alloy reflection film for optical information-recording, optical information-recording medium, and aluminum-alloy sputtering target for formation of the aluminum-alloy reflection film for optical information-recording |
EP1612784B1 (de) | 2004-06-29 | 2007-11-28 | Kabushiki Kaisha Kobe Seiko Sho | Halbreflektierende und reflektierende Schicht für ein optisches Informationsaufzeichnungsmedium, Informationsaufzeichnungsmedium, und Sputter Target |
-
2005
- 2005-06-21 EP EP05013364A patent/EP1612784B1/de not_active Not-in-force
- 2005-06-21 AT AT05013364T patent/ATE379836T1/de not_active IP Right Cessation
- 2005-06-21 DE DE602005003508T patent/DE602005003508T2/de active Active
- 2005-06-23 TW TW094121035A patent/TW200614187A/zh unknown
- 2005-06-28 KR KR1020050056366A patent/KR100789059B1/ko not_active IP Right Cessation
- 2005-06-28 SG SG200504118A patent/SG118417A1/en unknown
- 2005-06-28 CN CNB2005100791738A patent/CN100416681C/zh not_active Expired - Fee Related
- 2005-06-29 US US11/168,497 patent/US7507458B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7507458B2 (en) | 2009-03-24 |
CN100416681C (zh) | 2008-09-03 |
CN1725334A (zh) | 2006-01-25 |
DE602005003508T2 (de) | 2008-10-23 |
EP1612784B1 (de) | 2007-11-28 |
TW200614187A (en) | 2006-05-01 |
DE602005003508D1 (de) | 2008-01-10 |
KR20060048628A (ko) | 2006-05-18 |
SG118417A1 (en) | 2006-01-27 |
KR100789059B1 (ko) | 2007-12-26 |
US20050287333A1 (en) | 2005-12-29 |
EP1612784A1 (de) | 2006-01-04 |
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