ATE288088T1 - Projektionsbelichtungsvorrichtung mit katadioptrischem projektionssystem - Google Patents

Projektionsbelichtungsvorrichtung mit katadioptrischem projektionssystem

Info

Publication number
ATE288088T1
ATE288088T1 AT99111428T AT99111428T ATE288088T1 AT E288088 T1 ATE288088 T1 AT E288088T1 AT 99111428 T AT99111428 T AT 99111428T AT 99111428 T AT99111428 T AT 99111428T AT E288088 T1 ATE288088 T1 AT E288088T1
Authority
AT
Austria
Prior art keywords
reticle
optical system
image
catadioptric
exposure device
Prior art date
Application number
AT99111428T
Other languages
English (en)
Inventor
Yasuhiro Omura
Toshihiko Ozawa
Takashi Mori
Hideki Komatsuda
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE288088T1 publication Critical patent/ATE288088T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Liquid Crystal (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
AT99111428T 1998-06-12 1999-06-11 Projektionsbelichtungsvorrichtung mit katadioptrischem projektionssystem ATE288088T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18149898A JP3985346B2 (ja) 1998-06-12 1998-06-12 投影露光装置、投影露光装置の調整方法、及び投影露光方法

Publications (1)

Publication Number Publication Date
ATE288088T1 true ATE288088T1 (de) 2005-02-15

Family

ID=16101820

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99111428T ATE288088T1 (de) 1998-06-12 1999-06-11 Projektionsbelichtungsvorrichtung mit katadioptrischem projektionssystem

Country Status (5)

Country Link
US (2) US6466303B1 (de)
EP (1) EP0964282B1 (de)
JP (1) JP3985346B2 (de)
AT (1) ATE288088T1 (de)
DE (1) DE69923376T2 (de)

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DE10124474A1 (de) 2001-05-19 2002-11-21 Zeiss Carl Mikrolithographisches Belichtungsverfahren sowie Projektionsobjektiv zur Durchführung des Verfahrens
US7031069B2 (en) 2001-05-19 2006-04-18 Carl Zeiss Smt Ag Microlithographic illumination method and a projection lens for carrying out the method
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JP4776891B2 (ja) 2004-04-23 2011-09-21 キヤノン株式会社 照明光学系、露光装置、及びデバイス製造方法
US7242456B2 (en) * 2004-05-26 2007-07-10 Asml Holdings N.V. System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions
JP2006173305A (ja) * 2004-12-15 2006-06-29 Canon Inc 露光装置及び方法、並びに、デバイス製造方法
US7349068B2 (en) * 2004-12-17 2008-03-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20080192224A1 (en) * 2005-02-12 2008-08-14 Carl Zeiss Smt Ag Microlithographic Projection Exposure Apparatus
DE102005031084A1 (de) * 2005-06-28 2007-01-04 Carl Zeiss Smt Ag Mikrolithografisches Belichtungsverfahren sowie Projektionsbelichtungsanlage zur Durchführung des Verfahrens
DE102006031807A1 (de) * 2005-07-12 2007-01-18 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie Depolarisator
WO2007020004A1 (de) 2005-08-17 2007-02-22 Carl Zeiss Smt Ag Projektionsobjektiv und verfahren zur optimierung einer systemblende eines projektionsobjektivs
US20070091452A1 (en) * 2005-10-25 2007-04-26 Scott Lerner Projection system and method
US7649676B2 (en) * 2006-06-14 2010-01-19 Asml Netherlands B.V. System and method to form unpolarized light
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DE102008041179B4 (de) 2008-08-12 2010-11-04 Carl Zeiss Smt Ag Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage
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Also Published As

Publication number Publication date
US6466303B1 (en) 2002-10-15
JP3985346B2 (ja) 2007-10-03
US6661499B2 (en) 2003-12-09
EP0964282A3 (de) 2000-05-10
DE69923376T2 (de) 2006-03-30
EP0964282A2 (de) 1999-12-15
DE69923376D1 (de) 2005-03-03
US20030011756A1 (en) 2003-01-16
EP0964282B1 (de) 2005-01-26
JP2000003852A (ja) 2000-01-07

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