KR950009901A - 투영 노광 장치 - Google Patents
투영 노광 장치Info
- Publication number
- KR950009901A KR950009901A KR1019940023578A KR19940023578A KR950009901A KR 950009901 A KR950009901 A KR 950009901A KR 1019940023578 A KR1019940023578 A KR 1019940023578A KR 19940023578 A KR19940023578 A KR 19940023578A KR 950009901 A KR950009901 A KR 950009901A
- Authority
- KR
- South Korea
- Prior art keywords
- projection
- adjustment
- optical system
- exposure apparatus
- mirror
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 24
- 238000005286 illumination Methods 0.000 claims abstract 2
- 239000000758 substrate Substances 0.000 claims abstract 2
- 238000010586 diagram Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/021—Mountings, adjusting means, or light-tight connections, for optical elements for lenses for more than one lens
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Toxicology (AREA)
- Atmospheric Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Lens Barrels (AREA)
- Exposure Or Original Feeding In Electrophotography (AREA)
- Projection-Type Copiers In General (AREA)
Abstract
패턴이 형성된 마스를 소정 파장 영역의 조명광으로 조명하고, 패턴의 상을 투영 광학계를 통하여 피투영 기판상에 결상시키는 투영 노광 장치에 관한 것으로서 투영 광학계는 각각 1매 이상의 광학 소자를 수용한 복수개의 거울통 유닛을 구비하며, 거울통 유닛의 각각은 투영 광학계에 착탈 가능하게 설치되도록 구성된 투영 노광 장치이다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 제1실시예에 따른 굴절식 투영광학계의 개략적인 구성을 도시한 도면,
제2도는 제1실시예의 각 거울통 유닛사이의 연결구조를 도시한 상세 도면도.
Claims (4)
- 패턴이 형성된 마스크를 소정 파장 영역의 조명광으로 조명하고, 상기 패턴의 상을 투영 광학계를 통하여 피투영 기판상에 결상시키는 투영 노광 장치에 있어서, 상기 투영 광학계는 각각 1매 이상의 광학 소자를 수용한 복수개의 거울통 유닛을 구비하며, 상기 거울통 유닛의 각각은 상기 투영 광학계에 착탈 가능하게 설치되도록 구성되는 것을 특징으로 하는 투영 노광 장치.
- 제1항에 있어서, 상기 거울통 유닛의 각각은 상기 투영 광학계의 소정 위치에 각 거울통 유닛을 위치 결정하기 위한 위치 결정 조정 수단을 구비하는 것을 특징으로 하는 투영 노광 장치.
- 제1항에 있어서, 상기 투영 광학계는 굴절식의 투영 광학계이고, 각 거울통 유닛의 광축을 따라 이동 조정, 각 거울통 유닛의 광축에 대한 경사 조정 및 상기 광학 소자의 광축에 대한 편심조정중에 적어도 한 번의 조정을 하기 위한 조정 수단을 구비하는 것을 특징으로 하는 투영 노광 장치.
- 제1항에 있어서, 상기 투영 광학계는 반사 굴절식의 투영 광학계이고, 각 거울통 유닛의 광축을 따라 이동조정, 각 거울통 유닛의 광축에 대한 경사 조정 및 각 거울통 유닛의 광축과 직교하는 방향의 위치 결정 조정중에 적어도 한 번의 조정을 하기 위한 조정 수단을 구비하는 것을 특징으로 하는 투영 노광 장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5252387A JPH0786152A (ja) | 1993-09-14 | 1993-09-14 | 投影露光装置 |
JP93-252387 | 1993-09-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR950009901A true KR950009901A (ko) | 1995-04-26 |
KR100368192B1 KR100368192B1 (ko) | 2003-03-31 |
Family
ID=17236620
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940023578A KR100368192B1 (ko) | 1993-09-14 | 1994-09-13 | 투영노광장치 |
Country Status (3)
Country | Link |
---|---|
US (1) | US5638223A (ko) |
JP (1) | JPH0786152A (ko) |
KR (1) | KR100368192B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100486871B1 (ko) * | 1996-06-20 | 2005-08-31 | 가부시키가이샤 니콘 | 투영노광장치 |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09102454A (ja) * | 1995-10-03 | 1997-04-15 | Nikon Corp | 投影露光装置 |
JPH1054932A (ja) * | 1996-08-08 | 1998-02-24 | Nikon Corp | 投影光学装置及びそれを装着した投影露光装置 |
AU7552498A (en) * | 1997-06-10 | 1998-12-30 | Nikon Corporation | Optical device, method of cleaning the same, projection aligner, and method of producing the same |
JP3956454B2 (ja) * | 1997-11-18 | 2007-08-08 | 株式会社ニコン | レンズ支持装置、支持方法および投影露光装置 |
EP1293831A1 (en) * | 1998-06-08 | 2003-03-19 | Nikon Corporation | Projection exposure apparatus and method |
KR20000034896A (ko) * | 1998-11-27 | 2000-06-26 | 오노 시게오 | 노광 장치용 광학계와 노광 장치 및 그 조립 방법 |
DE19859634A1 (de) * | 1998-12-23 | 2000-06-29 | Zeiss Carl Fa | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie |
DE19901295A1 (de) * | 1999-01-15 | 2000-07-20 | Zeiss Carl Fa | Optische Abbildungsvorrichtung, insbesondere Objektiv, mit wenigstens einem optischen Element |
US7301605B2 (en) | 2000-03-03 | 2007-11-27 | Nikon Corporation | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
JP4945845B2 (ja) * | 2000-03-31 | 2012-06-06 | 株式会社ニコン | 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。 |
JP2002083766A (ja) * | 2000-06-19 | 2002-03-22 | Nikon Corp | 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置 |
US6449106B1 (en) * | 2000-08-10 | 2002-09-10 | Nikon Corporation | Catadioptric lens barrel structure having a support structure to maintain alignment of a plurality of sub-barrels |
US6574053B1 (en) | 2000-08-10 | 2003-06-03 | Nikon Corporation | Kinematic alignment structure for placement between components axially aligned in a cylindrical body |
JP4945864B2 (ja) * | 2000-08-18 | 2012-06-06 | 株式会社ニコン | 保持装置、光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法 |
KR100775796B1 (ko) * | 2000-08-18 | 2007-11-12 | 가부시키가이샤 니콘 | 광학소자 유지장치 |
JP3710724B2 (ja) * | 2001-05-14 | 2005-10-26 | 大日本スクリーン製造株式会社 | 結像光学装置 |
DE10239344A1 (de) | 2002-08-28 | 2004-03-11 | Carl Zeiss Smt Ag | Vorrichtung zum Abdichten einer Projektionsbelichtungsanlage |
DE10246828A1 (de) * | 2002-10-08 | 2004-04-22 | Carl Zeiss Smt Ag | Objektiv, insbesondere Projektionsobjektiv in der Mikrolithographie |
US7265917B2 (en) * | 2003-12-23 | 2007-09-04 | Carl Zeiss Smt Ag | Replacement apparatus for an optical element |
JP2005283638A (ja) * | 2004-03-26 | 2005-10-13 | Fujinon Corp | 光学部品の位置調整具 |
CN102207600B (zh) * | 2004-10-08 | 2015-11-18 | 卡尔蔡司Smt有限责任公司 | 光学投影系统 |
WO2006069785A1 (en) * | 2004-12-28 | 2006-07-06 | Carl Zeiss Smt Ag | Apparatus for mounting two or more optical elements and method for processing the surface of an optical element |
JP4771520B2 (ja) * | 2005-05-25 | 2011-09-14 | キヤノン株式会社 | レンズ鏡筒及び光学機器 |
CN101300516A (zh) * | 2005-11-04 | 2008-11-05 | 波科海姆技术公共有限公司 | 用于光学元件的带有包括倾斜台的可移除的密封模块的壳体 |
EP2035897B1 (en) | 2006-07-03 | 2015-10-28 | Carl Zeiss SMT GmbH | Method for revising or repairing a lithographic projection objective |
WO2008064859A2 (en) | 2006-12-01 | 2008-06-05 | Carl Zeiss Smt Ag | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations |
DE102007009867A1 (de) * | 2007-02-28 | 2008-09-11 | Carl Zeiss Smt Ag | Abbildungsvorrichtung mit auswechselbaren Blenden sowie Verfahren hierzu |
US20110001945A1 (en) * | 2009-07-01 | 2011-01-06 | Masayuki Shiraishi | Projection optical system, exposure apparatus, and assembly method thereof |
DE102009045223A1 (de) | 2009-09-30 | 2011-03-31 | Carl Zeiss Smt Gmbh | Optische Anordnung in einer Projektionsbelichtungsanlage für die EUV-Lithographie |
KR101737241B1 (ko) * | 2012-08-13 | 2017-05-17 | 트럼프 레이저시스템즈 포 세미컨덕터 매뉴팩처링 게엠베하 | 광학 장치, 광학 모듈, 및 하우징에 광학 모듈을 정확하게 위치 결정시키기 위한 방법 |
CN103713370B (zh) * | 2012-10-09 | 2015-11-11 | 南京理工大学 | 一种使用三坐标测量仪装调近红外大型长焦距镜头的方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2794360A (en) * | 1953-11-12 | 1957-06-04 | Eastman Kodak Co | Combination lens attachment |
US4690528A (en) * | 1983-10-05 | 1987-09-01 | Nippon Kogaku K. K. | Projection exposure apparatus |
US4666273A (en) * | 1983-10-05 | 1987-05-19 | Nippon Kogaku K. K. | Automatic magnification correcting system in a projection optical apparatus |
US5077569A (en) * | 1988-08-11 | 1991-12-31 | Canon Kabushiki Kaisha | Close-up photography device |
US5117255A (en) * | 1990-09-19 | 1992-05-26 | Nikon Corporation | Projection exposure apparatus |
GB9110156D0 (en) * | 1991-05-10 | 1991-07-03 | Lee Filters Limited | Optical element support |
US5500772A (en) * | 1993-07-09 | 1996-03-19 | Asahi Seimitsu Kabushiki Kaisha | Lens barrel for different kinds of TV cameras |
-
1993
- 1993-09-14 JP JP5252387A patent/JPH0786152A/ja active Pending
-
1994
- 1994-09-13 KR KR1019940023578A patent/KR100368192B1/ko not_active IP Right Cessation
-
1995
- 1995-11-03 US US08/553,086 patent/US5638223A/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100486871B1 (ko) * | 1996-06-20 | 2005-08-31 | 가부시키가이샤 니콘 | 투영노광장치 |
Also Published As
Publication number | Publication date |
---|---|
US5638223A (en) | 1997-06-10 |
KR100368192B1 (ko) | 2003-03-31 |
JPH0786152A (ja) | 1995-03-31 |
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
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