KR950009901A - 투영 노광 장치 - Google Patents

투영 노광 장치

Info

Publication number
KR950009901A
KR950009901A KR1019940023578A KR19940023578A KR950009901A KR 950009901 A KR950009901 A KR 950009901A KR 1019940023578 A KR1019940023578 A KR 1019940023578A KR 19940023578 A KR19940023578 A KR 19940023578A KR 950009901 A KR950009901 A KR 950009901A
Authority
KR
South Korea
Prior art keywords
projection
adjustment
optical system
exposure apparatus
mirror
Prior art date
Application number
KR1019940023578A
Other languages
English (en)
Other versions
KR100368192B1 (ko
Inventor
마사토시 이께다
Original Assignee
오노 시게오
가부시끼 가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 오노 시게오, 가부시끼 가이샤 니콘 filed Critical 오노 시게오
Publication of KR950009901A publication Critical patent/KR950009901A/ko
Application granted granted Critical
Publication of KR100368192B1 publication Critical patent/KR100368192B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/021—Mountings, adjusting means, or light-tight connections, for optical elements for lenses for more than one lens
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)
  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Projection-Type Copiers In General (AREA)
  • Lenses (AREA)

Abstract

패턴이 형성된 마스를 소정 파장 영역의 조명광으로 조명하고, 패턴의 상을 투영 광학계를 통하여 피투영 기판상에 결상시키는 투영 노광 장치에 관한 것으로서 투영 광학계는 각각 1매 이상의 광학 소자를 수용한 복수개의 거울통 유닛을 구비하며, 거울통 유닛의 각각은 투영 광학계에 착탈 가능하게 설치되도록 구성된 투영 노광 장치이다.

Description

투영 노광 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 제1실시예에 따른 굴절식 투영광학계의 개략적인 구성을 도시한 도면,
제2도는 제1실시예의 각 거울통 유닛사이의 연결구조를 도시한 상세 도면도.

Claims (4)

  1. 패턴이 형성된 마스크를 소정 파장 영역의 조명광으로 조명하고, 상기 패턴의 상을 투영 광학계를 통하여 피투영 기판상에 결상시키는 투영 노광 장치에 있어서, 상기 투영 광학계는 각각 1매 이상의 광학 소자를 수용한 복수개의 거울통 유닛을 구비하며, 상기 거울통 유닛의 각각은 상기 투영 광학계에 착탈 가능하게 설치되도록 구성되는 것을 특징으로 하는 투영 노광 장치.
  2. 제1항에 있어서, 상기 거울통 유닛의 각각은 상기 투영 광학계의 소정 위치에 각 거울통 유닛을 위치 결정하기 위한 위치 결정 조정 수단을 구비하는 것을 특징으로 하는 투영 노광 장치.
  3. 제1항에 있어서, 상기 투영 광학계는 굴절식의 투영 광학계이고, 각 거울통 유닛의 광축을 따라 이동 조정, 각 거울통 유닛의 광축에 대한 경사 조정 및 상기 광학 소자의 광축에 대한 편심조정중에 적어도 한 번의 조정을 하기 위한 조정 수단을 구비하는 것을 특징으로 하는 투영 노광 장치.
  4. 제1항에 있어서, 상기 투영 광학계는 반사 굴절식의 투영 광학계이고, 각 거울통 유닛의 광축을 따라 이동조정, 각 거울통 유닛의 광축에 대한 경사 조정 및 각 거울통 유닛의 광축과 직교하는 방향의 위치 결정 조정중에 적어도 한 번의 조정을 하기 위한 조정 수단을 구비하는 것을 특징으로 하는 투영 노광 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940023578A 1993-09-14 1994-09-13 투영노광장치 KR100368192B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5252387A JPH0786152A (ja) 1993-09-14 1993-09-14 投影露光装置
JP93-252387 1993-09-14

Publications (2)

Publication Number Publication Date
KR950009901A true KR950009901A (ko) 1995-04-26
KR100368192B1 KR100368192B1 (ko) 2003-03-31

Family

ID=17236620

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940023578A KR100368192B1 (ko) 1993-09-14 1994-09-13 투영노광장치

Country Status (3)

Country Link
US (1) US5638223A (ko)
JP (1) JPH0786152A (ko)
KR (1) KR100368192B1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
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KR100486871B1 (ko) * 1996-06-20 2005-08-31 가부시키가이샤 니콘 투영노광장치

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JPH1054932A (ja) * 1996-08-08 1998-02-24 Nikon Corp 投影光学装置及びそれを装着した投影露光装置
IL133422A0 (en) * 1997-06-10 2001-04-30 Nikon Corp Optical device, method of cleaning the same, projection aligner, and method of producing the same
JP3956454B2 (ja) * 1997-11-18 2007-08-08 株式会社ニコン レンズ支持装置、支持方法および投影露光装置
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JP4945845B2 (ja) * 2000-03-31 2012-06-06 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。
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EP1952188A1 (en) * 2005-11-04 2008-08-06 Bookham Technology plc Housing with a removable sealed module comprising a tilt stage for an optic element
CN101479667B (zh) * 2006-07-03 2011-12-07 卡尔蔡司Smt有限责任公司 修正/修复光刻投影物镜的方法
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JP6084290B2 (ja) * 2012-08-13 2017-02-22 トルンプフ レーザーシステムズ フォー セミコンダクター マニュファクチャリング ゲゼルシャフト ミット ベシュレンクテル ハフツングＴＲＵＭＰＦ Ｌａｓｅｒｓｙｓｔｅｍｓ ｆｏｒ Ｓｅｍｉｃｏｎｄｕｃｔｏｒ Ｍａｎｕｆａｃｔｕｒｉｎｇ ＧｍｂＨ 光学アッセンブリ、光学モジュール及びハウジング内で光学モジュールを正しい位置に位置決めする方法
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Also Published As

Publication number Publication date
JPH0786152A (ja) 1995-03-31
US5638223A (en) 1997-06-10
KR100368192B1 (ko) 2003-03-31

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