ATE196018T1 - Vorrichtung zur senkrechten oder schrägeinfallenden beleuchtung einer maske - Google Patents

Vorrichtung zur senkrechten oder schrägeinfallenden beleuchtung einer maske

Info

Publication number
ATE196018T1
ATE196018T1 AT93304986T AT93304986T ATE196018T1 AT E196018 T1 ATE196018 T1 AT E196018T1 AT 93304986 T AT93304986 T AT 93304986T AT 93304986 T AT93304986 T AT 93304986T AT E196018 T1 ATE196018 T1 AT E196018T1
Authority
AT
Austria
Prior art keywords
optical
optical axis
direction intersecting
indictively
illuminating
Prior art date
Application number
AT93304986T
Other languages
English (en)
Inventor
Takahisa Shiozawa
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Application granted granted Critical
Publication of ATE196018T1 publication Critical patent/ATE196018T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
AT93304986T 1992-06-25 1993-06-25 Vorrichtung zur senkrechten oder schrägeinfallenden beleuchtung einer maske ATE196018T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4193123A JP2946950B2 (ja) 1992-06-25 1992-06-25 照明装置及びそれを用いた露光装置

Publications (1)

Publication Number Publication Date
ATE196018T1 true ATE196018T1 (de) 2000-09-15

Family

ID=16302648

Family Applications (1)

Application Number Title Priority Date Filing Date
AT93304986T ATE196018T1 (de) 1992-06-25 1993-06-25 Vorrichtung zur senkrechten oder schrägeinfallenden beleuchtung einer maske

Country Status (5)

Country Link
US (2) US5459547A (de)
EP (1) EP0576297B1 (de)
JP (1) JP2946950B2 (de)
AT (1) ATE196018T1 (de)
DE (1) DE69329317D1 (de)

Families Citing this family (80)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5636003A (en) * 1992-11-05 1997-06-03 Nikon Corporation Illumination optical apparatus and scanning exposure apparatus
JP3316937B2 (ja) * 1992-11-24 2002-08-19 株式会社ニコン 照明光学装置、露光装置、及び該露光装置を用いた転写方法
WO1994020883A1 (en) * 1993-03-01 1994-09-15 General Signal Corporation Variable annular illuminator for photolithographic projection imager
US6753948B2 (en) * 1993-04-27 2004-06-22 Nikon Corporation Scanning exposure method and apparatus
JP3440458B2 (ja) * 1993-06-18 2003-08-25 株式会社ニコン 照明装置、パターン投影方法及び半導体素子の製造方法
JPH07122478A (ja) * 1993-10-27 1995-05-12 Sony Corp パターン投影方法
JPH07211620A (ja) * 1994-01-25 1995-08-11 Sony Corp 半導体露光装置
EP0687956B2 (de) † 1994-06-17 2005-11-23 Carl Zeiss SMT AG Beleuchtungseinrichtung
JP3060357B2 (ja) * 1994-06-22 2000-07-10 キヤノン株式会社 走査型露光装置及び該走査型露光装置を用いてデバイスを製造する方法
JPH0837139A (ja) * 1994-07-21 1996-02-06 Sony Corp 露光照明装置
JP3458549B2 (ja) 1994-08-26 2003-10-20 ソニー株式会社 パターン形成方法および該方法を用いた半導体デバイス製造方法と装置
JPH08179237A (ja) * 1994-12-26 1996-07-12 Nikon Corp 照明光学装置
US5684566A (en) * 1995-05-24 1997-11-04 Svg Lithography Systems, Inc. Illumination system and method employing a deformable mirror and diffractive optical elements
KR0147665B1 (ko) * 1995-09-13 1998-10-01 김광호 변형조명방법, 이에 사용되는 반사경 및 그 제조방법
KR100210569B1 (ko) * 1995-09-29 1999-07-15 미따라이 하지메 노광방법 및 노광장치, 그리고 이를 이용한 디바이스제조방법
WO1997031298A1 (en) * 1996-02-23 1997-08-28 Asm Lithography B.V. Illumination unit for an optical apparatus
KR980005334A (ko) 1996-06-04 1998-03-30 고노 시게오 노광 방법 및 노광 장치
US5963305A (en) * 1996-09-12 1999-10-05 Canon Kabushiki Kaisha Illumination system and exposure apparatus
JP3610175B2 (ja) * 1996-10-29 2005-01-12 キヤノン株式会社 投影露光装置及びそれを用いた半導体デバイスの製造方法
JP3728613B2 (ja) * 1996-12-06 2005-12-21 株式会社ニコン 走査型露光装置の調整方法及び該方法を使用する走査型露光装置
JP3259657B2 (ja) * 1997-04-30 2002-02-25 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
JP3264224B2 (ja) * 1997-08-04 2002-03-11 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
JP3559694B2 (ja) * 1997-10-14 2004-09-02 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
TW358889B (en) * 1997-10-20 1999-05-21 Ind Tech Res Inst High-efficiency light source polarizing converter
JPH11176742A (ja) * 1997-12-12 1999-07-02 Nikon Corp 照明光学系と露光装置及び半導体デバイスの製造方法
JP4238390B2 (ja) * 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
KR20010042098A (ko) * 1998-03-24 2001-05-25 오노 시게오 조명 장치, 노광 방법 및 장치와 디바이스 제조 방법
EP0949541B1 (de) * 1998-04-08 2006-06-07 ASML Netherlands B.V. Lithographischer Apparat
US6238063B1 (en) * 1998-04-27 2001-05-29 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
JP3937580B2 (ja) 1998-04-30 2007-06-27 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
US7126137B2 (en) 1998-05-05 2006-10-24 Carl Zeiss Smt Ag Illumination system with field mirrors for producing uniform scanning energy
US7186983B2 (en) * 1998-05-05 2007-03-06 Carl Zeiss Smt Ag Illumination system particularly for microlithography
USRE41667E1 (en) * 1998-05-05 2010-09-14 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US7006595B2 (en) 1998-05-05 2006-02-28 Carl Zeiss Semiconductor Manufacturing Technologies Ag Illumination system particularly for microlithography
US6947120B2 (en) * 1998-05-05 2005-09-20 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US6858853B2 (en) * 1998-05-05 2005-02-22 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US7109497B2 (en) * 1998-05-05 2006-09-19 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US7142285B2 (en) * 1998-05-05 2006-11-28 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US6947124B2 (en) 1998-05-05 2005-09-20 Carl Zeiss Smt Ag Illumination system particularly for microlithography
DE19935404A1 (de) 1999-07-30 2001-02-01 Zeiss Carl Fa Beleuchtungssystem mit mehreren Lichtquellen
USRE42065E1 (en) 1998-05-05 2011-01-25 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US20050002090A1 (en) * 1998-05-05 2005-01-06 Carl Zeiss Smt Ag EUV illumination system having a folding geometry
US20070030948A1 (en) * 1998-05-05 2007-02-08 Carl Zeiss Smt Ag Illumination system with field mirrors for producing uniform scanning energy
US7329886B2 (en) * 1998-05-05 2008-02-12 Carl Zeiss Smt Ag EUV illumination system having a plurality of light sources for illuminating an optical element
DE19903807A1 (de) * 1998-05-05 1999-11-11 Zeiss Carl Fa Beleuchtungssystem insbesondere für die EUV-Lithographie
US6215578B1 (en) 1998-09-17 2001-04-10 Vanguard International Semiconductor Corporation Electronically switchable off-axis illumination blade for stepper illumination system
US6563567B1 (en) * 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
KR20000048227A (ko) * 1998-12-17 2000-07-25 오노 시게오 이미지 투사 장치를 이용한 표면 조명 방법 및 조명 광학시스템
US6282027B1 (en) * 1999-03-26 2001-08-28 Vari-Lite, Inc. Zoomable beamspreader with matched optical surfaces for non-imaging illumination applications
US6768812B1 (en) * 1999-05-27 2004-07-27 Cognex Corporation Method for locating features on an object using varied illumination
US6398389B1 (en) * 1999-12-03 2002-06-04 Texas Instruments Incorporated Solid state light source augmentation for SLM display systems
JP3919419B2 (ja) * 2000-03-30 2007-05-23 キヤノン株式会社 照明装置及びそれを有する露光装置
JP3927753B2 (ja) 2000-03-31 2007-06-13 キヤノン株式会社 露光装置及びデバイス製造方法
JP3599648B2 (ja) * 2000-08-03 2004-12-08 キヤノン株式会社 照明装置、投影露光装置並びにそれを用いたデバイス製造方法
US6868223B2 (en) * 2001-05-11 2005-03-15 Canon Kabushiki Kaisha Illumination apparatus, exposure apparatus using the same and device fabrication method
DE10144243A1 (de) 2001-09-05 2003-03-20 Zeiss Carl Zoom-System für eine Beleuchtungseinrichtung
JP3634782B2 (ja) 2001-09-14 2005-03-30 キヤノン株式会社 照明装置、それを用いた露光装置及びデバイス製造方法
KR100431883B1 (ko) * 2001-11-05 2004-05-17 삼성전자주식회사 노광방법 및 투영 노광 장치
US6809869B2 (en) 2002-08-28 2004-10-26 Genlyte Thomas Group Llc Zoomable beamspreader for non-imaging illumination applications
EP1426826A3 (de) 2002-12-02 2006-12-20 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
EP1426823A1 (de) * 2002-12-02 2004-06-09 ASML Netherlands B.V. Lithgraphischer Apparat, Verfahren zur Herstellung eines Artikel und damit erzeugter Artikel
US6958806B2 (en) * 2002-12-02 2005-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TW200412617A (en) * 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
EP3226073A3 (de) 2003-04-09 2017-10-11 Nikon Corporation Belichtungsverfahren und -vorrichtung sowie verfahren zur herstellung der vorrichtung
TWI511179B (zh) 2003-10-28 2015-12-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI511182B (zh) 2004-02-06 2015-12-01 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
JP2006303196A (ja) * 2005-04-20 2006-11-02 Canon Inc 測定装置及びそれを有する露光装置
TWI545352B (zh) 2006-02-17 2016-08-11 卡爾蔡司Ｓｍｔ有限公司 用於微影投射曝光設備之照明系統
EP1984788B1 (de) 2006-02-17 2011-09-21 Carl Zeiss SMT GmbH Optischer integrator für eine beleuchtungssystem einer mikrolithographie-projektions-belichtungsvorrichtung
US7532259B2 (en) * 2006-08-22 2009-05-12 Texas Instruments Incorporated Dynamic aperture for a light processing system
US20080225257A1 (en) * 2007-03-13 2008-09-18 Nikon Corporation Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
US8587764B2 (en) * 2007-03-13 2013-11-19 Nikon Corporation Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
JP5142892B2 (ja) * 2008-09-03 2013-02-13 キヤノン株式会社 照明光学系及び露光装置
US20100079503A1 (en) * 2008-09-30 2010-04-01 Texas Instruments Incorporated Color Correction Based on Light Intensity in Imaging Systems
JP5453804B2 (ja) * 2008-12-25 2014-03-26 株式会社ニコン 照明光学系、露光装置及びデバイスの製造方法
JP2011077142A (ja) * 2009-09-29 2011-04-14 Nikon Corp 照明光学装置、露光装置及びデバイス製造方法
CN103299243B (zh) * 2010-11-19 2016-03-16 恩斯克科技有限公司 接近式曝光装置以及接近式曝光方法
US9760012B2 (en) 2011-08-04 2017-09-12 Nikon Corporation Illumination device
WO2019059315A1 (ja) * 2017-09-22 2019-03-28 株式会社ブイ・テクノロジー 露光用照明装置、露光装置及び露光方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54111832A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Exposure device
US4498742A (en) * 1981-09-10 1985-02-12 Nippon Kogaku K.K. Illumination optical arrangement
JPS58147708A (ja) * 1982-02-26 1983-09-02 Nippon Kogaku Kk <Nikon> 照明用光学装置
JPS597359A (ja) * 1982-07-02 1984-01-14 Canon Inc 照明装置
DE3750174T2 (de) * 1986-10-30 1994-11-17 Canon K.K., Tokio/Tokyo Belichtungseinrichtung.
JPS6461716A (en) * 1987-08-31 1989-03-08 Canon Kk Illuminator
JP2536023B2 (ja) * 1988-02-29 1996-09-18 株式会社ニコン 露光装置、及び露光方法
JP2732498B2 (ja) * 1988-11-24 1998-03-30 株式会社日立製作所 縮小投影式露光方法及びその装置
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
DE69132120T2 (de) * 1990-11-15 2000-09-21 Nikon Corp., Tokio/Tokyo Verfahren und Vorrichtung zur Projektionsbelichtung
US5305054A (en) * 1991-02-22 1994-04-19 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices
JPH0567558A (ja) * 1991-09-06 1993-03-19 Nikon Corp 露光方法

Also Published As

Publication number Publication date
EP0576297A1 (de) 1993-12-29
US5459547A (en) 1995-10-17
JP2946950B2 (ja) 1999-09-13
US5684567A (en) 1997-11-04
JPH0613289A (ja) 1994-01-21
EP0576297B1 (de) 2000-08-30
DE69329317D1 (de) 2000-10-05

Similar Documents

Publication Publication Date Title
ATE196018T1 (de) Vorrichtung zur senkrechten oder schrägeinfallenden beleuchtung einer maske
EP0811881A3 (de) Belichtungsapparat und -verfahren
DE69326630D1 (de) Beleuchtungsvorrichtung für einen Projektionsbelichtungsapparat
DE69233508D1 (de) Bilderzeugungsgerät und -Verfahren zur Herstellung von Mikrovorrichtungen
EP0488033A3 (en) Laser process apparatus
EP1091230A3 (de) Optisches Projektionssystem zur Projektion eines Musters einer Photomaske auf ein Substrat
EP1128219A3 (de) Belichtungsverfahren und -apparat
KR950033695A (ko) 광학 인테그레이터 및 이를 사용한 투영 노광 장치
EP0292976A3 (de) Belichtungssystem vom Abtastungstyp
EP0851304A3 (de) Projektionsbelichtungsapparat und Verfahren zur Herstellung einer Vorrichtung
KR970060356A (ko) 패턴형성방법, 투영노출장치 및 반도체장치의 제조방법
EP1079253A4 (de) Vorrichtung und verfahren zur projektionsbelichtung, und optisches system mit reflektion und brechung
GB2375392A (en) Phase profilometry system with telecentric projector
EP0964282A3 (de) Projektionsbelichtungsvorrichtung mit katadioptrischem Projektionssystem
JPH0817223A (ja) 照明光学装置
WO1998050757A3 (en) Three dimensional inspection system
JPS56165111A (en) Telecentric illuminating system
JPS56142509A (en) Lighting device of microscope
EP0863440A3 (de) Apparat zur Projektionsbelichtung und Verfahren zur Herstellung einer Vorrichtung
GB9515230D0 (en) Method of manufacturing a photo mask for manufacturing a semiconductor device
JPS6435912A (en) Projection aligner
EP0354148A3 (de) Vorrichtung zur Projektion einer Bildserie auf die Elemente einer Halbleiterplatte
JP2000056219A5 (ja) 投影光学系、投影露光装置及び方法
TW257876B (en) Focusing method of photoengraving
JPS6437837A (en) Semiconductor exposure device

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties