DE69418131D1 - Vorrichtung zur erzeugung einer einstellbaren ringförmigen beleuchtung für einen photolithograpischen projektionsapparat - Google Patents

Vorrichtung zur erzeugung einer einstellbaren ringförmigen beleuchtung für einen photolithograpischen projektionsapparat

Info

Publication number
DE69418131D1
DE69418131D1 DE69418131T DE69418131T DE69418131D1 DE 69418131 D1 DE69418131 D1 DE 69418131D1 DE 69418131 T DE69418131 T DE 69418131T DE 69418131 T DE69418131 T DE 69418131T DE 69418131 D1 DE69418131 D1 DE 69418131D1
Authority
DE
Germany
Prior art keywords
generating
projection apparatus
adjustable ring
shaped lighting
photolithographic projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69418131T
Other languages
English (en)
Inventor
Paul Dewa
Paul Michaloski
Paul Tompkins
William Partlo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SPX Corp
Original Assignee
General Signal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Signal Corp filed Critical General Signal Corp
Application granted granted Critical
Publication of DE69418131D1 publication Critical patent/DE69418131D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
DE69418131T 1993-03-01 1994-02-25 Vorrichtung zur erzeugung einer einstellbaren ringförmigen beleuchtung für einen photolithograpischen projektionsapparat Expired - Lifetime DE69418131D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US2465193A 1993-03-01 1993-03-01
PCT/US1994/001970 WO1994020883A1 (en) 1993-03-01 1994-02-25 Variable annular illuminator for photolithographic projection imager

Publications (1)

Publication Number Publication Date
DE69418131D1 true DE69418131D1 (de) 1999-06-02

Family

ID=21821698

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69418131T Expired - Lifetime DE69418131D1 (de) 1993-03-01 1994-02-25 Vorrichtung zur erzeugung einer einstellbaren ringförmigen beleuchtung für einen photolithograpischen projektionsapparat

Country Status (4)

Country Link
US (2) US5452054A (de)
EP (1) EP0648348B1 (de)
DE (1) DE69418131D1 (de)
WO (1) WO1994020883A1 (de)

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BRPI0115791B1 (pt) 2000-11-29 2020-05-05 Colorado State Univ sistema para fertilização in vitro com espematozóides separados em populações portadoras de cromossoma x e cromossoma y
US7713687B2 (en) 2000-11-29 2010-05-11 Xy, Inc. System to separate frozen-thawed spermatozoa into x-chromosome bearing and y-chromosome bearing populations
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EP1395374B1 (de) 2001-05-17 2013-04-17 Beckman Coulter, Inc. Durchflusszytometer mit aktivem automatisiertem optischem ausrichtungssystem
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JP3950732B2 (ja) * 2002-04-23 2007-08-01 キヤノン株式会社 照明光学系、照明方法及び露光装置
US8486618B2 (en) 2002-08-01 2013-07-16 Xy, Llc Heterogeneous inseminate system
DK2283724T3 (en) 2002-08-01 2016-04-04 Xy Llc Heterospermic insemination to assess sperm function
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US7169548B2 (en) 2002-09-13 2007-01-30 Xy, Inc. Sperm cell processing and preservation systems
DK2305172T3 (en) 2003-03-28 2016-08-22 Inguran Llc DEVICE AND PROCEDURES TO PROVIDE SEXUAL ANIMAL SEED
ES2541121T3 (es) 2003-05-15 2015-07-16 Xy, Llc Clasificación eficiente de células haploides por sistemas de citometría de flujo
US7542217B2 (en) * 2003-12-19 2009-06-02 Carl Zeiss Smt Ag Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus
EP1730266A2 (de) 2004-03-29 2006-12-13 Monsanto Technology, LLC Spermasuspensionen zur sortierung in angereicherte x- oder y-chromosomen tragende populationen
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CN102736427B (zh) * 2011-04-07 2014-11-12 上海微电子装备有限公司 一种曝光装置及其方法
DE102011078928A1 (de) 2011-07-11 2013-01-17 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
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Also Published As

Publication number Publication date
EP0648348B1 (de) 1999-04-28
WO1994020883A1 (en) 1994-09-15
US5452054A (en) 1995-09-19
US5757470A (en) 1998-05-26
EP0648348A1 (de) 1995-04-19
EP0648348A4 (de) 1995-07-05

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Legal Events

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8332 No legal effect for de