ATE171224T1 - Verfahren und vorrichtung zum abscheiden dünner elektrochromer schichten - Google Patents
Verfahren und vorrichtung zum abscheiden dünner elektrochromer schichtenInfo
- Publication number
- ATE171224T1 ATE171224T1 AT95830119T AT95830119T ATE171224T1 AT E171224 T1 ATE171224 T1 AT E171224T1 AT 95830119 T AT95830119 T AT 95830119T AT 95830119 T AT95830119 T AT 95830119T AT E171224 T1 ATE171224 T1 AT E171224T1
- Authority
- AT
- Austria
- Prior art keywords
- thin
- electrochrome
- deposing
- layers
- thin layers
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
- Physical Vapour Deposition (AREA)
- Control Of Indicators Other Than Cathode Ray Tubes (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITRM940295A IT1272249B (it) | 1994-05-13 | 1994-05-13 | Procedimento ed apparecchiatura per il deposito di strati sottili elettrocromici formati da materiali a composizione stechiometrica |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE171224T1 true ATE171224T1 (de) | 1998-10-15 |
Family
ID=11402529
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT95830119T ATE171224T1 (de) | 1994-05-13 | 1995-03-30 | Verfahren und vorrichtung zum abscheiden dünner elektrochromer schichten |
Country Status (7)
Country | Link |
---|---|
US (1) | US5584935A (de) |
EP (1) | EP0682124B1 (de) |
JP (1) | JP2848795B2 (de) |
AT (1) | ATE171224T1 (de) |
CA (1) | CA2148411A1 (de) |
DE (1) | DE69504748D1 (de) |
IT (1) | IT1272249B (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040007183A1 (en) * | 2002-07-11 | 2004-01-15 | Ulvac, Inc. | Apparatus and method for the formation of thin films |
KR100907134B1 (ko) | 2003-01-30 | 2009-07-09 | 오리온오엘이디 주식회사 | 유기 el용 증착장치 |
JP2006225757A (ja) * | 2005-01-21 | 2006-08-31 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
KR100711885B1 (ko) | 2005-08-31 | 2007-04-25 | 삼성에스디아이 주식회사 | 유기 증착원 및 이의 가열원 제어방법 |
KR100645689B1 (ko) | 2005-08-31 | 2006-11-14 | 삼성에스디아이 주식회사 | 선형 증착원 |
DE102007035166B4 (de) * | 2007-07-27 | 2010-07-29 | Createc Fischer & Co. Gmbh | Hochtemperatur-Verdampferzelle mit parallel geschalteten Heizbereichen, Verfahren zu deren Betrieb und deren Verwendung in Beschichtungsanlagen |
KR20140013471A (ko) * | 2012-07-24 | 2014-02-05 | 주식회사 쎄코 | 진공증착용 발열조립체 및 이를 구비하는 진공증착장치 |
US11242595B1 (en) * | 2021-04-03 | 2022-02-08 | King Faisal University | Method of making metal nanostructures using low temperature deposition |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3142907A1 (de) * | 1981-10-29 | 1983-05-11 | Fa. Carl Zeiss, 7920 Heidenheim | Optische regelschaltung fuer elektrochrome schichten |
JPS59100269A (ja) * | 1982-12-01 | 1984-06-09 | Tokyo Kasoode Kenkyusho:Kk | 真空蒸着用素子 |
JPS60152670A (ja) * | 1984-01-20 | 1985-08-10 | Ulvac Corp | 高周波誘導加熱蒸発源 |
FR2582319B1 (fr) * | 1985-05-22 | 1992-10-23 | Barbier Benard & Turenne | Installation de depot de nickel par evaporation sous vide, notamment pour la preparation de guides a neutrons |
FR2649691B1 (fr) * | 1989-07-11 | 1992-10-30 | Saint Gobain Vitrage Int | Vitrage electrochrome |
US5051274A (en) * | 1989-09-11 | 1991-09-24 | Tufts University | Ion-beam based deposition of coatings for electrochromic devices |
JP2506312Y2 (ja) * | 1989-10-31 | 1996-08-07 | 豊田合成株式会社 | エレクトロクロミック素子 |
FR2690763B1 (fr) * | 1992-04-30 | 1995-06-09 | Saint Gobain Vitrage Int | Procede et dispositif d'alimentation d'un systeme electrochrome. |
-
1994
- 1994-05-13 IT ITRM940295A patent/IT1272249B/it active IP Right Grant
-
1995
- 1995-03-30 AT AT95830119T patent/ATE171224T1/de not_active IP Right Cessation
- 1995-03-30 EP EP95830119A patent/EP0682124B1/de not_active Expired - Lifetime
- 1995-03-30 DE DE69504748T patent/DE69504748D1/de not_active Expired - Lifetime
- 1995-05-01 US US08/431,960 patent/US5584935A/en not_active Expired - Fee Related
- 1995-05-02 CA CA002148411A patent/CA2148411A1/en not_active Abandoned
- 1995-05-12 JP JP7114149A patent/JP2848795B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
ITRM940295A1 (it) | 1995-11-13 |
JPH0892733A (ja) | 1996-04-09 |
CA2148411A1 (en) | 1995-11-14 |
JP2848795B2 (ja) | 1999-01-20 |
IT1272249B (it) | 1997-06-16 |
US5584935A (en) | 1996-12-17 |
ITRM940295A0 (it) | 1994-05-13 |
DE69504748D1 (de) | 1998-10-22 |
EP0682124A1 (de) | 1995-11-15 |
EP0682124B1 (de) | 1998-09-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
REN | Ceased due to non-payment of the annual fee |