IT1272249B - Procedimento ed apparecchiatura per il deposito di strati sottili elettrocromici formati da materiali a composizione stechiometrica - Google Patents

Procedimento ed apparecchiatura per il deposito di strati sottili elettrocromici formati da materiali a composizione stechiometrica

Info

Publication number
IT1272249B
IT1272249B ITRM940295A ITRM940295A IT1272249B IT 1272249 B IT1272249 B IT 1272249B IT RM940295 A ITRM940295 A IT RM940295A IT RM940295 A ITRM940295 A IT RM940295A IT 1272249 B IT1272249 B IT 1272249B
Authority
IT
Italy
Prior art keywords
thin layers
equipment
stechiometric
procedure
storage
Prior art date
Application number
ITRM940295A
Other languages
English (en)
Inventor
Mino Green
Original Assignee
Siv Soc Italiana Vetro
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siv Soc Italiana Vetro filed Critical Siv Soc Italiana Vetro
Priority to ITRM940295A priority Critical patent/IT1272249B/it
Publication of ITRM940295A0 publication Critical patent/ITRM940295A0/it
Priority to AT95830119T priority patent/ATE171224T1/de
Priority to EP95830119A priority patent/EP0682124B1/en
Priority to DE69504748T priority patent/DE69504748D1/de
Priority to US08/431,960 priority patent/US5584935A/en
Priority to CA002148411A priority patent/CA2148411A1/en
Priority to JP7114149A priority patent/JP2848795B2/ja
Publication of ITRM940295A1 publication Critical patent/ITRM940295A1/it
Application granted granted Critical
Publication of IT1272249B publication Critical patent/IT1272249B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
  • Control Of Indicators Other Than Cathode Ray Tubes (AREA)
  • Glass Compositions (AREA)

Abstract

Strati sottili per formare un elettrodo attivo di colorazione in una cella elettrocromica, particolarmente in vetri elettrocromici per edilizia e autoveicoli, vengono prodotti mediante evaporazione sotto vuoto di ossidi metallici in una apparecchiatura in cui il percorso del vapore verso il substrato da rivestire evita ogni contatto con le resistenze elettriche che forniscono il calore dell'evaporazione, così da ottenere detti strati sottili in una composizione stechiometrica rispetto alla formula ideale dell'ossido fatto evaporare; ciò conferisce la massima efficienza di colorazione nella cella.
ITRM940295A 1994-05-13 1994-05-13 Procedimento ed apparecchiatura per il deposito di strati sottili elettrocromici formati da materiali a composizione stechiometrica IT1272249B (it)

Priority Applications (7)

Application Number Priority Date Filing Date Title
ITRM940295A IT1272249B (it) 1994-05-13 1994-05-13 Procedimento ed apparecchiatura per il deposito di strati sottili elettrocromici formati da materiali a composizione stechiometrica
AT95830119T ATE171224T1 (de) 1994-05-13 1995-03-30 Verfahren und vorrichtung zum abscheiden dünner elektrochromer schichten
EP95830119A EP0682124B1 (en) 1994-05-13 1995-03-30 Process and apparatus for the deposition of thin electrochromic layers
DE69504748T DE69504748D1 (de) 1994-05-13 1995-03-30 Verfahren und Vorrichtung zum Abscheiden dünner elektrochromer Schichten
US08/431,960 US5584935A (en) 1994-05-13 1995-05-01 Process and apparatus for the deposition of thin electrochromic layers formed of materials with a stoichiometric composition
CA002148411A CA2148411A1 (en) 1994-05-13 1995-05-02 Process and apparatus for the deposition of thin electrochromic layers formed of materials with a stoichiometric composition
JP7114149A JP2848795B2 (ja) 1994-05-13 1995-05-12 金属酸化物薄層の付着方法及び付着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITRM940295A IT1272249B (it) 1994-05-13 1994-05-13 Procedimento ed apparecchiatura per il deposito di strati sottili elettrocromici formati da materiali a composizione stechiometrica

Publications (3)

Publication Number Publication Date
ITRM940295A0 ITRM940295A0 (it) 1994-05-13
ITRM940295A1 ITRM940295A1 (it) 1995-11-13
IT1272249B true IT1272249B (it) 1997-06-16

Family

ID=11402529

Family Applications (1)

Application Number Title Priority Date Filing Date
ITRM940295A IT1272249B (it) 1994-05-13 1994-05-13 Procedimento ed apparecchiatura per il deposito di strati sottili elettrocromici formati da materiali a composizione stechiometrica

Country Status (7)

Country Link
US (1) US5584935A (it)
EP (1) EP0682124B1 (it)
JP (1) JP2848795B2 (it)
AT (1) ATE171224T1 (it)
CA (1) CA2148411A1 (it)
DE (1) DE69504748D1 (it)
IT (1) IT1272249B (it)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040007183A1 (en) * 2002-07-11 2004-01-15 Ulvac, Inc. Apparatus and method for the formation of thin films
KR100907134B1 (ko) 2003-01-30 2009-07-09 오리온오엘이디 주식회사 유기 el용 증착장치
JP2006225757A (ja) * 2005-01-21 2006-08-31 Mitsubishi Heavy Ind Ltd 真空蒸着装置
KR100645689B1 (ko) 2005-08-31 2006-11-14 삼성에스디아이 주식회사 선형 증착원
KR100711885B1 (ko) 2005-08-31 2007-04-25 삼성에스디아이 주식회사 유기 증착원 및 이의 가열원 제어방법
DE102007035166B4 (de) * 2007-07-27 2010-07-29 Createc Fischer & Co. Gmbh Hochtemperatur-Verdampferzelle mit parallel geschalteten Heizbereichen, Verfahren zu deren Betrieb und deren Verwendung in Beschichtungsanlagen
KR20140013471A (ko) * 2012-07-24 2014-02-05 주식회사 쎄코 진공증착용 발열조립체 및 이를 구비하는 진공증착장치
US11242595B1 (en) * 2021-04-03 2022-02-08 King Faisal University Method of making metal nanostructures using low temperature deposition

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3142907A1 (de) * 1981-10-29 1983-05-11 Fa. Carl Zeiss, 7920 Heidenheim Optische regelschaltung fuer elektrochrome schichten
JPS59100269A (ja) * 1982-12-01 1984-06-09 Tokyo Kasoode Kenkyusho:Kk 真空蒸着用素子
JPS60152670A (ja) * 1984-01-20 1985-08-10 Ulvac Corp 高周波誘導加熱蒸発源
FR2582319B1 (fr) * 1985-05-22 1992-10-23 Barbier Benard & Turenne Installation de depot de nickel par evaporation sous vide, notamment pour la preparation de guides a neutrons
FR2649691B1 (fr) * 1989-07-11 1992-10-30 Saint Gobain Vitrage Int Vitrage electrochrome
US5051274A (en) * 1989-09-11 1991-09-24 Tufts University Ion-beam based deposition of coatings for electrochromic devices
JP2506312Y2 (ja) * 1989-10-31 1996-08-07 豊田合成株式会社 エレクトロクロミック素子
FR2690763B1 (fr) * 1992-04-30 1995-06-09 Saint Gobain Vitrage Int Procede et dispositif d'alimentation d'un systeme electrochrome.

Also Published As

Publication number Publication date
CA2148411A1 (en) 1995-11-14
ATE171224T1 (de) 1998-10-15
JPH0892733A (ja) 1996-04-09
ITRM940295A1 (it) 1995-11-13
EP0682124A1 (en) 1995-11-15
DE69504748D1 (de) 1998-10-22
EP0682124B1 (en) 1998-09-16
US5584935A (en) 1996-12-17
ITRM940295A0 (it) 1994-05-13
JP2848795B2 (ja) 1999-01-20

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970521