WO2023120351A1 - 水系の微生物汚染抑制方法 - Google Patents

水系の微生物汚染抑制方法 Download PDF

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Publication number
WO2023120351A1
WO2023120351A1 PCT/JP2022/046154 JP2022046154W WO2023120351A1 WO 2023120351 A1 WO2023120351 A1 WO 2023120351A1 JP 2022046154 W JP2022046154 W JP 2022046154W WO 2023120351 A1 WO2023120351 A1 WO 2023120351A1
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WO
WIPO (PCT)
Prior art keywords
oxidizing agent
chlorine
based oxidizing
stabilized
bromine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
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PCT/JP2022/046154
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English (en)
French (fr)
Japanese (ja)
Inventor
雄太 大塚
淳一 高橋
邦洋 早川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kurita Water Industries Ltd
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Kurita Water Industries Ltd
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Filing date
Publication date
Application filed by Kurita Water Industries Ltd filed Critical Kurita Water Industries Ltd
Priority to JP2023569361A priority Critical patent/JP7552938B2/ja
Priority to EP22911059.8A priority patent/EP4455096A4/en
Priority to CN202280079724.2A priority patent/CN118339112A/zh
Publication of WO2023120351A1 publication Critical patent/WO2023120351A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/76—Treatment of water, waste water, or sewage by oxidation with halogens or compounds of halogens
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/008—Control or steering systems not provided for elsewhere in subclass C02F
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/50—Treatment of water, waste water, or sewage by addition or application of a germicide or by oligodynamic treatment
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/76—Treatment of water, waste water, or sewage by oxidation with halogens or compounds of halogens
    • C02F1/766—Treatment of water, waste water, or sewage by oxidation with halogens or compounds of halogens by means of halogens other than chlorine or of halogenated compounds containing halogen other than chlorine
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/04—Disinfection
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/20—Prevention of biofouling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A20/00—Water conservation; Efficient water supply; Efficient water use
    • Y02A20/124—Water desalination
    • Y02A20/131—Reverse-osmosis

Definitions

  • the present invention relates to a method for suppressing microbial contamination of water systems.
  • INDUSTRIAL APPLICABILITY The method for suppressing microbial contamination of a water system of the present invention is useful, for example, as a method for suppressing slime in a reverse osmosis (RO) membrane water supply system and preventing fouling of the reverse osmosis membrane.
  • RO reverse osmosis
  • RO membrane devices that can efficiently remove electrolytes and medium- and low-molecular-weight organic components are widely used.
  • pretreatment such as pressure filtration equipment, gravity filtration equipment, coagulation sedimentation treatment equipment, pressure flotation filtration equipment, immersion membrane equipment, membrane pretreatment equipment, etc. is usually performed before the RO membrane equipment.
  • a device is provided. After being pretreated by these pretreatment devices, the water to be treated is supplied to the RO membrane device and subjected to RO membrane separation treatment.
  • microorganisms contained in the water to be treated proliferate in the pipes of the equipment and on the membrane surface to form slime. can cause
  • a disinfectant In order to prevent contamination by microorganisms, it is common to add a disinfectant to the water to be treated constantly or intermittently to sterilize the water to be treated or the inside of the device while treating.
  • a disinfectant a chlorine-based oxidizing agent such as sodium hypochlorite is used because it is inexpensive and relatively easy to handle.
  • RO membranes generally do not have chlorine resistance like polyamide polymer membranes, when a chlorine-based oxidizing agent is added, free chlorine derived from the chlorine-based oxidizing agent causes oxidative deterioration and removal. rate will decline.
  • a chlorine-based oxidizing agent is added on the upstream side of the water treatment device, and a reducing agent such as sodium bisulfite (SBS) is added on the inlet side of the RO membrane device to reduce and remove the remaining free chlorine.
  • a reducing agent such as sodium bisulfite (SBS)
  • SBS sodium bisulfite
  • stabilized chlorine-based oxidizing agents such as chloramine and sodium chlorosulfamate, and stabilized bromine are added to suppress microbial contamination of the piping from the point of addition of the reducing agent to the inlet of the RO membrane device and the surface of the RO membrane.
  • a slime control agent that suppresses the growth of microorganisms such as an oxidizing agent or an isothiazolone compound.
  • stabilized chlorine-based oxidants and stabilized bromine-based oxidants have been widely used because they can suppress microbial contamination.
  • stabilized chlorine-based oxidizing agents and the stabilized bromine-based oxidizing agents there were some water systems where the suppression effect was more likely to appear and less.
  • Non-Patent Document 1 the reducing agent sodium bisulfite (SBS), which is generally added to reduce free chlorine in the preceding stage of the RO membrane, is usually added in an excessive amount to reliably prevent membrane deterioration.
  • a reducing agent such as sodium bisulfite is added and a stabilized chlorine-based oxidizing agent and/or a bromine-based oxidizing agent comprising a chlorine-based oxidizing agent and a sulfamic acid compound are used in an aqueous system containing a residual reducing agent.
  • An object of the present invention is to provide a method for suppressing microbial contamination of water systems, which can stably and effectively obtain the effect of suppressing microbial contamination by adding a stabilized brominated oxidizing agent comprising a sulfamic acid compound.
  • the present inventor found that the above problems can be solved by intermittently adding a stabilized chlorine-based oxidant and/or a stabilized bromine-based oxidant.
  • the gist of the present invention is as follows.
  • a stabilized chlorine-based oxidant consisting of a chlorine-based oxidant and a sulfamic acid compound and/or a bromine-based oxidant and a sulfamic acid compound is intermittently added to the water system such that the ratio of the addition pause time to the addition time of the stabilized chlorine oxidant and/or the stabilized bromine oxidant is 0.1 or more.
  • a water-system microbial contamination suppression method characterized by:
  • the ratio of the addition pause time to the addition time of the stabilized chlorine-based oxidizing agent and/or the stabilized bromine-based oxidizing agent is 1.0.
  • the method for suppressing microbial contamination of a water system according to any one of [1] to [4], characterized in that it is intermittently added to the water system so that the concentration becomes 100 or less.
  • the stabilized chlorine-based oxidizing agent is a stabilized chlorine-based oxidizing agent in which the ratio of the sulfamic acid compound to 1 mol of available chlorine in the chlorine-based oxidizing agent is 0.5 to 5.0 mol
  • the stabilized bromine-based oxidizing agent is a stabilized bromine-based oxidizing agent having a ratio of 0.5 to 5.0 mol of the sulfamic acid compound per 1 mol of the effective chlorine equivalent of the bromine-based oxidizing agent.
  • the amount of the stabilized chlorine-based oxidant and/or the stabilized bromine-based oxidant added to the water system during the addition time is 0.1 to 100 mg/L-Cl 2 in terms of available chlorine.
  • a reducing agent such as sodium bisulfite is added to an aqueous system containing a residual reducing agent, and the addition of a stabilized chlorine-based oxidant and/or a stabilized bromine-based oxidant stably and effectively causes microbial contamination. can be suppressed.
  • FIG. 1 is a graph showing the results of Example 1 and Comparative Example 1.
  • FIG. FIG. 2 shows the relationship between the oxidizing agent concentration and the reducing agent concentration due to intermittent addition of the oxidizing agent (stabilized chlorine-based oxidizing agent and/or stabilized bromine-based oxidizing agent) according to the present invention, and the difference between continuous addition and continuous addition. It is an explanatory diagram showing.
  • a method for suppressing microbial contamination of an aqueous system is a method for suppressing microbial contamination in an aqueous system containing a reducing agent, comprising a stable A chlorine-based oxidizing agent and/or a stabilized bromine-based oxidizing agent is added so that the ratio of the addition pause time to the addition time of the stabilized chlorine-based oxidizing agent and/or the stabilized bromine-based oxidizing agent is 0.1 or more. It is characterized by intermittent addition to the aqueous system.
  • a reducing agent such as sodium bisulfite (SBS) in water also reduces the stabilized chlorine-based oxidant and the stabilized bromine-based oxidant added later.
  • SBS sodium bisulfite
  • the stabilized chlorine-based oxidant consisting of the chlorine-based oxidant and the sulfamic acid compound and/or the stabilized bromine-based oxidant consisting of the bromine-based oxidant and the sulfamic acid compound release sulfamic acid.
  • the higher the residual reducing agent concentration the higher the ratio of sulfamic acid to available chlorine in the system. As the ratio of sulfamic acid increases, the reactivity as a component decreases due to the equilibrium relationship.
  • the rate of decrease due to a reducing agent such as sodium bisulfite can be made smaller compared to continuous addition of the same amount of oxidizing agent. For this reason, the reactivity is unlikely to decrease, and the integrated amount of the stabilized chlorine-based oxidizing agent and/or the stabilized bromine-based oxidizing agent by a reducing agent such as sodium bisulfite over the entire addition time and rest time of intermittent addition is the same oxidation.
  • the amount of agent used can be reduced compared to continuous addition. As a result, the effect of preventing microbial contamination can be effectively exhibited.
  • the water system to be treated in the present invention is not particularly limited as long as it contains a reducing agent.
  • a reducing agent such as sodium bisulfite (SBS) is added excessively to the chlorine-based oxidizing agent, so that the reducing agent remains (including the reducing agent). and is effectively applied to a water system to which a stabilized chlorine-based oxidant and/or a stabilized bromine-based oxidant is added in order to suppress microbial contamination of the pipes and RO membranes thereafter, that is, to an RO membrane water supply system.
  • sodium bisulfite As a reducing agent contained in the water system, sodium bisulfite (SBS) is typical, but sodium thiosulfate and the like may also be used.
  • the reducing agent concentration in the aqueous system containing this residual reducing agent is preferably 0.01 mg/L-Cl 2 or more in order to effectively obtain the effects of the present invention, and this concentration is more preferably 0.1 mg. /L-Cl 2 or more.
  • the concentration of the reducing agent is excessively high, the stabilized chlorine-based oxidizing agent and/or the stabilized bromine-based oxidizing agent that are added later are reduced accordingly, resulting in a higher required addition amount and an increase in treatment cost. Therefore, the reducing agent concentration in the water system to be treated is preferably 5 mg/L-Cl 2 or less, particularly 2 mg/L-Cl 2 or less.
  • the concentration of the reducing agent is expressed in terms of free chlorine, that is, the concentration of free chlorine (mg/L-Cl 2 ) that can be reduced by the reducing agent at that concentration.
  • the stabilized chlorine-based oxidizing agent used in the present invention comprises a chlorine-based oxidizing agent and a sulfamic acid compound.
  • the stabilized brominated oxidant used in the present invention comprises a brominated oxidant and a sulfamic acid compound.
  • chlorine-based oxidizing agent used in the stabilized chlorine-based oxidizing agent, and examples include chlorine gas, chlorine dioxide, hypochlorous acid or its salts, chlorous acid or its salts, chloric acid or its salts, and perchloric acid. or a salt thereof, chlorinated isocyanuric acid or a salt thereof.
  • salt forms include alkali metal hypochlorites such as sodium hypochlorite and potassium hypochlorite; hypochlorites such as calcium hypochlorite and barium hypochlorite; acid alkaline earth metal salts; alkali metal chlorite salts such as sodium chlorite, potassium chlorite; alkaline earth metal chlorite salts such as barium chlorite; other chlorite salts such as nickel chlorite. acid metal salts; ammonium chlorate; alkali metal chlorates such as sodium chlorate and potassium chlorate; alkaline earth metal chlorates such as calcium chlorate and barium chlorate.
  • hypochlorite can be preferably used because it is easy to handle.
  • the brominated oxidizing agent used in the present invention is not particularly limited, and examples include liquid bromine, bromine chloride, bromic acid or salts thereof, hypobromous acid or salts thereof. These brominated oxidizing agents may be used alone or in combination of two or more.
  • sulfamic acid compounds include compounds represented by the following general formula [1] or salts thereof.
  • R 1 and R 2 are each independently a hydrogen atom or a hydrocarbon group having 1 to 8 carbon atoms.
  • sulfamic acid compounds include sulfamic acid in which both R 1 and R 2 are hydrogen atoms, as well as N-methylsulfamic acid, N,N-dimethylsulfamic acid, and N-phenylsulfamic acid. be able to.
  • the salts of the compounds include, for example, alkali metal salts such as sodium salts and potassium salts; alkaline earth metal salts such as calcium salts, strontium salts and barium salts; manganese salts and copper salts; salts, zinc salts, iron salts, cobalt salts, nickel salts and other metal salts; ammonium salts; and guanidine salts, specifically sodium sulfamate, potassium sulfamate, calcium sulfamate, Strontium sulfamate, barium sulfamate, iron sulfamate, zinc sulfamate and the like can be mentioned. Sulfamic acid and these sulfamates can be used singly or in combination of two or more.
  • a chlorine-based oxidizing agent such as hypochlorite and/or a bromine-based oxidizing agent
  • a sulfamic acid compound such as sulfamate
  • these compounds combine to form chlorosulfamate and stabilize it. It is possible to maintain a stable concentration of free chlorine and/or free bromine in water without causing a difference in dissociation due to pH as with chloramine and resulting fluctuations in the concentration of free chlorine and/or free bromine.
  • the ratio of the chlorine-based oxidizing agent and/or the bromine-based oxidizing agent to the sulfamic acid compound is sulfamine per 1 mol of the effective chlorine amount in terms of available chlorine of the chlorine-based oxidizing agent and/or the bromine-based oxidizing agent.
  • the acid compound is preferably 0.5 to 5.0 mol, more preferably 1.0 to 2.5 mol. If the sulfamic acid ratio exceeds the above upper limit, the microbial contamination inhibiting effect of the present invention cannot be sufficiently obtained. If the sulfamic acid ratio is less than 1 mol, decomposition of sulfamic acid will occur during production.
  • the chlorine-based oxidizing agent and/or the bromine-based oxidizing agent and the sulfamic acid compound may be added as a mixed aqueous solution or may be added separately.
  • the stabilized chlorine-based oxidizing agent and/or the stabilized bromine-based oxidizing agent according to the present invention can be used in addition to the chlorine-based oxidizing agent and/or the bromine-based oxidizing agent and the sulfamic acid compound within a range that does not impair the effects thereof. It may contain ingredients. Other components include alkaline agents, azoles, anionic polymers, phosphonic acids and the like.
  • the alkaline agent is used to stabilize the chlorine-based oxidizing agent and/or the bromine-based oxidizing agent in the stabilized chlorine-based oxidizing agent and/or the stabilized bromine-based oxidizing agent.
  • Sodium hydroxide, potassium hydroxide and the like are usually used as the alkaline agent.
  • the above-mentioned sulfamic acid ratio is preferably about 1.0 to 2.5 mol of the stabilized chlorine-based oxidizing agent and/or Alternatively, the stabilized brominated oxidizing agent is added to the aqueous system by intermittent addition such that the ratio of the addition pause time to the addition time (addition pause time/addition time) is 0.1 or more.
  • the addition pause time/addition time ratio may be 0.1 or more, but from the viewpoint of the effect of suppressing microbial contamination, the addition pause time/addition time ratio is preferably 1.0 or more. On the other hand, if the addition pause time/addition time ratio is excessively large, there is a risk that microbial contamination will progress during the pause time.
  • the stabilized chlorine-based oxidizing agent and/or the stabilized chlorine-based oxidizing agent during the addition period of the stabilized chlorine-based oxidizing agent and/or the stabilized bromine-based oxidizing agent in the present invention in which the stabilized chlorine-based oxidizing agent and/or the stabilized bromine-based oxidizing agent are intermittently added.
  • the amount of the stabilized brominated oxidant to be added varies depending on the addition pause time/addition time ratio and the microbial contamination load of the raw water, but it is 0.1 mg/ L-Cl 2 or more, particularly 0.5 mg/L-Cl 2 or more, and preferably 100 mg/L-Cl 2 or less, particularly 50 mg/L-Cl 2 or less. If the amount of the stabilized chlorine-based oxidizing agent and/or the stabilized bromine-based oxidizing agent to be added is within the above range, it is possible to obtain a good effect of suppressing microbial contamination while suppressing chemical costs.
  • the compounding composition of the chemical 1 used below is as shown in Table 1 below.
  • Example 1 An experiment was conducted to examine the effect of intermittent addition of a stabilized chlorine-based oxidizing agent on the suppression of microbial contamination.
  • the effect of suppressing microbial contamination was evaluated using the membrane fouling simulator described in Non-Patent Document 1, based on the degree of increase in differential pressure (pressure loss in the flow path).
  • a substrate was added to raw water (water to be treated) to promote the biofouling effect of microorganisms.
  • the raw water contains citric acid: 1.2 mg/L as C, ammonium chloride: 0.6 mg/L as N, and sodium dihydrogen phosphate: 0.2 mg/L as P as substrates.
  • the added water was used as the water to be treated.
  • the pH of raw water was 7-8.5.
  • Example 1 the stabilized chlorine-based oxidizing agent (Chemical 1) was added for 1 hour (addition amount: 3.0 mg/L-Cl 2 ) and stopped for 5 hours.
  • Comparative Example 1 it was added to raw water so that the amount added was always 0.6 mg/L-Cl 2 .
  • SBS sodium bisulfite

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  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
PCT/JP2022/046154 2021-12-20 2022-12-15 水系の微生物汚染抑制方法 Ceased WO2023120351A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2023569361A JP7552938B2 (ja) 2021-12-20 2022-12-15 水系の微生物汚染抑制方法
EP22911059.8A EP4455096A4 (en) 2021-12-20 2022-12-15 METHOD FOR REMOVING MICROORGANISM CONTAMINATION IN A WATER SUPPLY SYSTEM
CN202280079724.2A CN118339112A (zh) 2021-12-20 2022-12-15 水系统的微生物污染抑制方法

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JP2021205985 2021-12-20
JP2021-205985 2021-12-20

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JP7495017B2 (ja) * 2021-12-20 2024-06-04 栗田工業株式会社 水系の微生物汚染抑制方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01104310A (ja) 1987-10-14 1989-04-21 Kurita Water Ind Ltd 膜分離方法
JPH01135506A (ja) 1987-11-20 1989-05-29 Toray Ind Inc 精製水の製造方法
JP2006263510A (ja) 2005-03-22 2006-10-05 Kurita Water Ind Ltd 膜分離用スライム防止剤及び膜分離方法
WO2013005787A1 (ja) * 2011-07-06 2013-01-10 栗田工業株式会社 膜分離方法
JP2014176799A (ja) * 2013-03-14 2014-09-25 Kurita Water Ind Ltd 逆浸透膜分離方法

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WO2016104356A1 (ja) * 2014-12-25 2016-06-30 オルガノ株式会社 分離膜のスライム抑制方法
WO2016158633A1 (ja) * 2015-03-31 2016-10-06 栗田工業株式会社 逆浸透膜処理システムの運転方法及び逆浸透膜処理システム
JP6649697B2 (ja) * 2015-05-12 2020-02-19 オルガノ株式会社 水の殺菌方法
JP6934295B2 (ja) * 2016-12-01 2021-09-15 オルガノ株式会社 水処理剤組成物、水処理方法、および水処理剤組成物の保管または使用方法
JPWO2019031430A1 (ja) 2017-08-10 2019-11-07 栗田工業株式会社 逆浸透膜処理方法及び水処理装置
JP7220112B2 (ja) * 2019-03-29 2023-02-09 栗田工業株式会社 膜分離方法
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JPH01104310A (ja) 1987-10-14 1989-04-21 Kurita Water Ind Ltd 膜分離方法
JPH01135506A (ja) 1987-11-20 1989-05-29 Toray Ind Inc 精製水の製造方法
JP2006263510A (ja) 2005-03-22 2006-10-05 Kurita Water Ind Ltd 膜分離用スライム防止剤及び膜分離方法
WO2013005787A1 (ja) * 2011-07-06 2013-01-10 栗田工業株式会社 膜分離方法
JP2014176799A (ja) * 2013-03-14 2014-09-25 Kurita Water Ind Ltd 逆浸透膜分離方法

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Title
See also references of EP4455096A4
WATER SOLUTIONS, FILMTECTM REVERSE OSMOSIS MEMBRANES TECHNICAL MANUAL, 7 February 2021 (2021-02-07), Retrieved from the Internet <URL:https://www.dupont.com/content/dam/dupont/amer/us/en/water-solutions/public/documents/en/45-D01504-en.pdf#page64>69>

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JPWO2023120351A1 (https=) 2023-06-29
TW202333807A (zh) 2023-09-01
JP7552938B2 (ja) 2024-09-18
EP4455096A1 (en) 2024-10-30
CN118339112A (zh) 2024-07-12

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