WO2019021859A1 - 塗布処理装置、塗布処理方法及びコンピュータ記憶媒体 - Google Patents

塗布処理装置、塗布処理方法及びコンピュータ記憶媒体 Download PDF

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Publication number
WO2019021859A1
WO2019021859A1 PCT/JP2018/026496 JP2018026496W WO2019021859A1 WO 2019021859 A1 WO2019021859 A1 WO 2019021859A1 JP 2018026496 W JP2018026496 W JP 2018026496W WO 2019021859 A1 WO2019021859 A1 WO 2019021859A1
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WIPO (PCT)
Prior art keywords
coating
liquid
nozzle
substrate
glass substrate
Prior art date
Application number
PCT/JP2018/026496
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English (en)
French (fr)
Japanese (ja)
Inventor
徳彦 西村
Original Assignee
東京エレクトロン株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東京エレクトロン株式会社 filed Critical 東京エレクトロン株式会社
Priority to JP2019532511A priority Critical patent/JP6909854B2/ja
Priority to CN201880047157.6A priority patent/CN110891697B/zh
Priority to KR1020207004602A priority patent/KR102492389B1/ko
Publication of WO2019021859A1 publication Critical patent/WO2019021859A1/ja

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C13/00—Means for manipulating or holding work, e.g. for separate articles
    • B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
    • B05C13/025—Means for manipulating or holding work, e.g. for separate articles for particular articles relatively small cylindrical objects, e.g. cans, bottles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254—Coating heads with slot-shaped outlet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements

Definitions

  • the present invention relates to a coating treatment apparatus for applying a coating liquid containing an optical material to a substrate, a coating treatment method using the coating treatment apparatus, and a computer storage medium.
  • a circularly polarizing plate is used to prevent reflection of external light.
  • the circularly polarizing plate is manufactured by laminating a linear polarizing plate and a wavelength plate (retardation plate) so that their polarization axes intersect at 45 degrees.
  • wavelength plate retardation plate
  • these linear polarizing plates and wavelength plates are used.
  • the wave plate may be formed such that its polarization axis is inclined at 15 degrees or 75 degrees. Therefore, it is necessary to form a polarizing plate or a wavelength plate at an arbitrary angle. Furthermore, in order to make the polarization axes of the polarizing plate and the wave plate intersect at an arbitrary angle, it is also necessary to form the polarizing plate and the wave plate separately.
  • such a polarizing plate or a wavelength plate is produced using, for example, a stretched film.
  • the stretched film is obtained by orienting molecules in the material in one direction by stretching the film in one direction and attaching it.
  • a thin film is realized by applying a coating solution having a predetermined material on a substrate to form a polarizing plate or a wave plate having a required film thickness.
  • a coating liquid having liquid crystallinity is applied to a substrate as a predetermined material, and cast and oriented.
  • the liquid crystal compound forms a supramolecular association in the coating solution, and when the coating solution is caused to flow while applying shear stress, the long axis direction of the supramolecular association is aligned in the flowing direction.
  • a polarizing film printing apparatus described in Patent Document 1 includes a table for holding a substrate and a slot die for discharging an ink liquid onto the substrate.
  • the table has a configuration in which the surface plate is fitted into a frame plate in which a portion of the surface plate has been cut out, so that the height of the peripheral portion of the surface plate is made the same height as the surface of the substrate fixed to the surface plate.
  • the slot die extends at least to cover the platen. Then, the substrate is fixed with the platen arranged in the printing direction, and the platen is further rotated to tilt the substrate at a predetermined angle with respect to the printing direction, and then the slot die is moved in the printing direction. Apply the ink solution to the
  • the platen on which the substrate is fixed is rotated, but the rotation of the platen causes the substrate to be at a predetermined position (a position parallel to the printing direction). It is for receiving, not controlling the application direction. In other words, the application direction of the ink liquid to the substrate is fixed, and the application direction can not be freely controlled.
  • the present invention has been made in view of such points, and it is an object of the present invention to apply a coating liquid containing an optical material appropriately and efficiently at an arbitrary angle with respect to a substrate.
  • One aspect of the present invention which solves the above-mentioned subject is a coating treatment device which applies a coating liquid containing an optical material to a substrate, and the holding part which holds a substrate, and the coating liquid to the substrate held by the holding part And a moving mechanism for moving the holding unit and the coating nozzle relative to each other in a direction perpendicular to each other, and a discharge mechanism provided on both sides of the substrate held by the holding unit in plan view. And a liquid receiver for receiving the coating liquid.
  • the substrate is coated on the substrate by controlling the relative moving speed of the holding unit and the coating nozzle.
  • the application direction of the coating solution can be arbitrarily controlled.
  • the coating liquid can be applied to the substrate at any angle with such a simple configuration and simple control. Further, since the coating liquid is received by the liquid receiving part on both sides outside the plan view of the substrate held by the holding part, the coating liquid can be prevented from dripping and adhering to the holding part, and the sheet can be prevented as in the prior art. There is no need to wash the holding part with leaves. Therefore, the coating liquid can be applied to the substrate appropriately and efficiently.
  • One embodiment of the present invention is a coating treatment method of coating a substrate with a coating solution containing an optical material, and while relatively moving a holding unit holding a substrate and a coating nozzle in the orthogonal direction, The coating liquid is discharged from the coating nozzle, and the liquid receiving portion receives the coating liquid on both sides outside the substrate in a plan view, and applies the coating liquid to the substrate.
  • a readable computer storage medium storing a program operating on a computer of a control unit that controls the coating processing apparatus to cause the coating processing apparatus to execute the coating processing method. It is.
  • a coating liquid containing an optical material can be applied appropriately and efficiently at any angle with respect to a substrate.
  • FIG. 7 is an explanatory view showing operations of a glass substrate and a coating nozzle when forming a ⁇ / 4 wavelength film in the first embodiment. It is a side view which shows the outline of a structure of the coating processing apparatus which concerns on 2nd Embodiment. It is a side view which shows the outline of a structure of the coating processing apparatus which concerns on 2nd Embodiment. It is explanatory drawing which shows a mode that a coating liquid is received in the liquid receiving part which concerns on 2nd Embodiment.
  • a linear polarizing film (linearly polarizing plate) and a ⁇ / 4 wavelength film ( ⁇ / 4 wavelength plate), which are optical films, have their polarization axes
  • the glass substrate is formed to cross at 45 degrees.
  • a linear polarizing film is formed on a glass substrate.
  • a coating solution (a coating solution for polarizing film) is coated on the entire surface of the glass substrate.
  • molecules are oriented in one direction.
  • the solvent in the film is removed by drying the linearly polarized film under reduced pressure, and the alignment state of the molecules in the film is appropriately maintained.
  • the heat treatment the solvent remaining in the film is completely removed by heating the linear polarizing film to a predetermined temperature.
  • a fixing material is applied to the pixel area of the glass substrate to inactivate (insolubilize) the linearly polarizing film, and the inactivated linear polarizing film is fixed to the glass substrate.
  • the cleaning liquid is supplied to the glass substrate to selectively remove the linearly polarized film not fixed in the film fixing process.
  • a ⁇ / 4 wavelength film is further formed on the glass substrate.
  • a coating solution coating solution for wavelength film
  • a shear stress in a direction (45 ° direction in a 45 ° direction) inclined from one direction in the linearly polarizing film to the coating solution the molecules are oriented in a 45 ° direction in a ⁇ direction.
  • the subsequent reduced-pressure drying treatment, heat treatment, film fixing treatment, and film removal treatment are respectively the same as the respective treatments for forming the linear polarizing film.
  • the linear polarizing film and the ⁇ / 4 wavelength film are formed on the glass substrate such that their polarization axes intersect at 45 degrees.
  • a coating treatment apparatus and a coating treatment method for coating a coating liquid at an arbitrary angle with respect to a glass substrate will be described.
  • FIG. 1 is a plan view showing an outline of the configuration of a coating treatment apparatus 1 according to the first embodiment.
  • FIG.2 and FIG.3 is a side view which shows the outline of a structure of the coating processing apparatus 1 which concerns on 1st Embodiment.
  • the X-axis direction, the Y-axis direction, and the Z-axis direction orthogonal to one another are defined, and the positive Z-axis direction is the vertically upward direction.
  • the coating processing apparatus 1 receives a stage 10 as a holding unit for holding a glass substrate G, a coating nozzle 20 that discharges the coating liquid onto the glass substrate G, and a liquid receiver that receives the coating liquid discharged from the end of the coating nozzle 20 And a unit 30.
  • the stage 10 adsorbs and holds the back surface of the glass substrate G such that the surface on which the coating liquid is applied is directed upward.
  • the stage 10 has a smaller shape than the glass substrate G in plan view, or the same shape as the glass substrate G.
  • the stage 10 is configured to be movable in the Y-axis direction by a movement mechanism (not shown).
  • the movable range of the stage 10 is at least a length of two or more in the Y-axis direction of the glass substrate G, and the glass substrate G when the stage 10 is positioned at the end in the negative Y-axis direction (FIG.
  • the solid line of the substrate position A1) and the glass substrate G (dotted line in FIG. 1, substrate position A2) when the stage 10 is positioned at the end in the positive direction of the Y-axis direction do not overlap in plan view.
  • the coating nozzle 20 is provided above the stage 10 and discharges the coating liquid onto the glass substrate G held by the stage 10.
  • the coating nozzle 20 is a long slit nozzle extending in a direction (X-axis direction) orthogonal to the moving direction (Y-axis direction) of the glass substrate G held by the stage 10.
  • a discharge port 21 for discharging the coating liquid onto the glass substrate G is formed at the lower end surface of the coating nozzle 20, a discharge port 21 for discharging the coating liquid onto the glass substrate G is formed.
  • the discharge port 21 is a slit-like discharge port which extends longer than the length of the glass substrate G in the X-axis direction along the longitudinal direction (X-axis direction) of the coating nozzle 20.
  • the coating nozzle 20 is supported by a support beam 22 extending in the X-axis direction.
  • the coating nozzle 20 is configured to be movable along the support beam 22 by a moving mechanism (not shown).
  • the application nozzle 20 is the X axis direction negative direction side of the glass substrate G (solid line in FIG. 1, nozzle position B1) and the X axis direction positive direction side of the glass substrate G (dotted line in FIG. 1 nozzle position B2) Move between Then, at any position between the nozzle position B1 and the nozzle position B2, the coating nozzle 20 discharges the coating liquid from the discharge port 21 so as to cover the X axis direction of the glass substrate G.
  • the stage 10 and the coating nozzle 20 move in the orthogonal direction. Then, the coating nozzle 20 can apply the coating liquid to the glass substrate G held by the stage 10. Further, by controlling the moving speed of the stage 10 and the moving speed of the coating nozzle 20, it is possible to arbitrarily control the coating direction of the coating liquid to be coated on the glass substrate G.
  • the coating liquid discharged from the coating nozzle 20 is a coating liquid containing an optical material.
  • a coating solution for a polarizing film for forming a linear polarizing film and a coating solution for a wavelength film for forming a ⁇ / 4 wavelength film and for example, a lyotropic liquid crystal compound or a thermotropic liquid crystal as an optical material, respectively Included are any liquid crystal compounds, such as compounds.
  • Each liquid receiving unit 30 includes a roller 31 as a winding material for winding the coating liquid discharged from the end of the coating nozzle 20, a collection tank 32 for collecting the coating liquid wound around the roller 31, and a roller 31. And a support frame 33 as a support structure for supporting the recovery tank 32.
  • the roller 31 is provided so as to extend in the X-axis direction.
  • the end portion of the roller 31 on the glass substrate G side is positioned close to the glass substrate G so as not to contact the glass substrate G.
  • the end of the roller 31 opposite to the glass substrate G is located outside the coating nozzle 20 at each of the nozzle positions B1 and B2. Then, when the coating liquid P is discharged from the coating nozzle 20 to the glass substrate G as shown in FIG. 5, the coating liquid P discharged from the end of the coating nozzle 20 rotates in the same direction as the moving direction of the glass substrate G. It is taken up by a roller 31 and collected.
  • the roller 31 rolls up the coating solution P in a state where a predetermined gap from the discharge port 21 of the coating nozzle 20 is formed. Then, the bead of the coating liquid P discharged from the coating nozzle 20 when the coating liquid P is applied to the glass substrate G is not disturbed. Furthermore, in the present embodiment, the roller 31 is disposed such that the upper surface of the roller 31 and the upper surface of the glass substrate G held by the stage 10 have the same height. In other words, the roller 31 plays the role of extending the glass substrate G (simulated substrate).
  • the distance between the roller 31 and the application nozzle 20 is the same as the distance between the glass substrate G and the application nozzle 20, and the state of the application liquid P in these gaps, for example, the amount of the application liquid P is Since the same, the bead of the coating liquid P from the coating nozzle 20 can be stabilized more appropriately.
  • the surface tension of the coating fluid P does not cause the coating fluid P to drop from this gap.
  • the gap may be wide, but when the viscosity of the coating liquid P is low, it is preferable that the gap be narrow.
  • the size of the gap between the roller 31 and the glass substrate G is made different between the left and right of the glass substrate G (both sides in the moving direction of the coating nozzle 20). It is also good.
  • the recovery tank 32 is provided below the roller 31 so as to cover the roller 31.
  • the upper surface of the recovery tank 32 is open, and the coating liquid P taken up by the roller 31 is recovered and temporarily stored.
  • the lower part of the roller 31 in the recovery tank 32 is immersed in the coating solution P.
  • Water may be supplied to the application liquid P temporarily stored in the recovery tank 32, and the application liquid P may be dissolved in water.
  • the bottom surface of the recovery tank 32 is inclined downward toward the central portion, and a drain pipe 34 of the coating liquid P is connected to the central portion. Further, an overflow pipe (not shown) for preventing an overflow of the coating liquid P is connected to the side surface of the recovery tank 32. Then, the coating liquid P stored in the recovery tank 32 is drained from the drain pipe 34 and the overflow pipe. The coating liquid P discharged from the drainage pipe 34 in this manner may be reused for the glass substrate G to be processed subsequently.
  • the support frame 33 supports the roller 31 and the recovery tank 32 from below.
  • the roller 31 and the collection tank 32 can be easily replaced together with the support frame 33.
  • the support frame 33 does not interfere with the coating nozzle 20, the coating nozzle 20 can be easily replaced at the time of maintenance of the coating nozzle 20.
  • a control unit 40 is provided in the coating treatment apparatus 1 described above.
  • the control unit 40 is, for example, a computer and has a program storage unit (not shown).
  • the program storage unit stores a program for controlling the coating process in the coating treatment apparatus 1.
  • This program is recorded on a computer readable storage medium H such as a computer readable hard disk (HD), flexible disk (FD), compact disk (CD), magnet optical desk (MO), memory card, etc. It may be one that is installed in the control unit 40 from the storage medium H.
  • a linear polarization film is formed on a glass substrate G.
  • the coating solution P1 is applied to the entire surface of the glass substrate G in the coating treatment apparatus 1.
  • the coating liquid P1 in this case is a coating liquid for polarizing film for forming a linear polarizing film.
  • the glass substrate G is moved from the substrate position A1 to the substrate position A2 without moving the coating nozzle 20 from the nozzle position B1.
  • the position of the application nozzle 20 is not limited to the nozzle position B1, and may be any position between the nozzle position B1 and the nozzle position B2.
  • the glass substrate G is held by the stage 10 at the substrate position A1. Subsequently, as shown in FIG. 7B, while the coating liquid P1 is discharged from the coating nozzle 20, the glass substrate G is moved in the Y-axis direction positive direction, and the coating liquid P1 is coated on the glass substrate G. Then, as shown in FIG. 7C, the glass substrate G moves to the substrate position A2, and the coating liquid P1 is applied to the entire surface of the glass substrate G.
  • the coating liquid P1 discharged from the end of the coating nozzle 20, that is, the coating liquid P1 discharged to the outside of the glass substrate G is wound around the roller 31 and collected. Therefore, the coating liquid P1 does not drip down.
  • the coating solution P1 is applied while applying a shear stress (block arrow in FIG. 7). Since the coating nozzle 20 does not move and the glass substrate G moves in the Y-axis direction positive direction, shear stress is applied in the Y-axis direction positive direction.
  • the shear stress is a value obtained by dividing the coating speed (moving speed of the coating nozzle 20 with respect to the glass substrate G) by the distance (gap) between the glass substrate G and the discharge port 21 of the coating nozzle 20. Since a slit nozzle is used for the coating nozzle 20, the coating nozzle 20 can sufficiently approach the glass substrate G without damaging the glass substrate G. Thus, the gap can be reduced. Then, by controlling the moving speed of the coating nozzle 20, a sufficient shear stress can be applied to the coating solution P1. As a result, molecules in the coating liquid P1 can be oriented in one direction (Y-axis direction).
  • a slit nozzle is suitable from a viewpoint that gap can be made as small as mentioned above.
  • coated to the glass substrate G is small, and a slit nozzle is suitable also from this viewpoint.
  • a ⁇ / 4 wavelength film is formed on the glass substrate G.
  • the coating solution P2 is applied to the entire surface of the glass substrate G in the coating treatment apparatus 1.
  • the coating liquid P2 in this case is a coating for a wavelength film for forming a ⁇ / 4 wavelength film.
  • the glass substrate G is moved from the substrate position A1 to the substrate position A2, and the coating nozzle 20 is moved from the nozzle position B1 to the nozzle position B2. At this time, the moving speed of the glass substrate G and the moving speed of the coating nozzle 20 are the same.
  • the glass substrate G is held by the stage 10 at the substrate position A1. Subsequently, as shown in FIG. 8B, the glass substrate G is moved in the positive direction along the Y-axis, and the application nozzle 20 is moved along the positive direction along the X-axis while discharging the coating liquid P2 from the application nozzle 20. The coating liquid P2 is applied to the glass substrate G. Then, as shown in FIG. 8C, the glass substrate G moves to the substrate position A2, and the coating nozzle 20 moves to the nozzle position B2, and the coating liquid P2 is coated on the entire surface of the glass substrate G.
  • the coating liquid P2 discharged from the end of the coating nozzle 20, that is, the coating liquid P2 discharged to the outside of the glass substrate G Is wound around the roller 31 and collected. Therefore, the coating liquid P1 does not drip down.
  • the coating solution P2 is applied while applying a shear stress (block arrow in FIG. 8). That is, since the moving speed of the glass substrate G and the moving speed of the coating nozzle 20 are the same, the shear stress is applied in the oblique direction of 45 degrees in the positive direction along the Y axis and the positive direction along the X axis.
  • the molecules in the coating solution P2 can be oriented in one direction (45-degree oblique direction).
  • the glass substrate G held by the stage 10 and the coating nozzle 20 move in the orthogonal direction, so the moving speed of the glass substrate G and the movement of the coating nozzle 20 By controlling the speed, it is possible to control the application direction of the coating liquid applied to the glass substrate G.
  • the coating liquid can be applied to the glass substrate G at an arbitrary angle with such a simple configuration and simple control. Then, the application direction of the application liquid P1 and the application direction of the application liquid P2 can be crossed at 45 degrees, and a linear polarization film and a ⁇ / 4 wavelength film can be formed so that the polarization axes thereof intersect at 45 degrees.
  • the coating liquid P is wound up and collected by the liquid receiving portion 30 (roller 31) on both sides outside the glass substrate G, it is possible to suppress the coating liquid P from falling down. As a result, the coating liquid P can be prevented from dripping and adhering to the stage 10, and there is no need to wash the single-wafer stage 10 as in the prior art. Furthermore, when the coating liquid P collected in the collection tank 32 is reused, it is possible to reduce the amount of the coating liquid P used.
  • FIG.9 and FIG.10 is a side view which shows the outline of a structure of the coating processing apparatus 1 which concerns on 2nd Embodiment.
  • the second embodiment and the first embodiment are different in the configuration of the liquid receiver in the coating treatment apparatus 1. That is, in the coating treatment apparatus 1 of the second embodiment, the liquid receiving unit 100 is provided instead of the liquid receiving unit 30 of the first embodiment.
  • the liquid receiving portions 100 are provided on both sides of the glass substrate G held by the stage 10 on the outer side in the X-axis direction.
  • Each liquid receiving portion 100 has a deckle 101 as a sealing material for sealing the discharge port at the end of the coating nozzle 20, and a support frame 102 as a support structure for supporting the deckle 101 from below. There is.
  • the deckle 101 is provided so as to extend in the X-axis direction.
  • the end portion of the glass substrate G side of the deckle 101 is positioned close to the glass substrate G so as not to contact the glass substrate G.
  • the end of the deckle 101 opposite to the glass substrate G is located outside the coating nozzle 20 at each of the nozzle positions B1 and B2. Then, as shown in FIG. 11, the end of the application nozzle 20 (discharge port 21) is sealed by bringing the deckle 101 into close contact with the end of the application nozzle 20. As a result, the coating liquid P at the end of the coating nozzle 20 is also sealed and is not discharged.
  • the cross-sectional shape of the deckle 101 is not limited as long as it can be sealed in close contact with the end of the coating nozzle 20.
  • the upper surface may be a flat rectangular shape, or may be a V shape described in, for example, Japanese Patent Application Laid-Open No. 2013-165137.
  • a material that suppresses the generation of particles when in close contact with the coating nozzle 20 such as silicone rubber and fluororubber.
  • the end of the coating nozzle 20 is sealed with the deckle 101 and the coating liquid P is not discharged from the end of the coating nozzle 20, it is possible to suppress the amount of the coating liquid P used. Further, since the deckle 101 is in close contact with the coating nozzle 20, the coating liquid P adhering to the discharge port 21 can be wiped off, and the discharge port 21 can be always kept clean.
  • FIG. 12 is an explanatory view showing a state in which the coating liquid P is received by the liquid receiver 110 according to the third embodiment.
  • the third embodiment and the first embodiment differ in the configuration of the liquid receiving portion in the coating treatment apparatus 1. That is, in the coating treatment apparatus 1 of the third embodiment, the liquid receiving unit 110 is provided instead of the liquid receiving unit 30 of the first embodiment.
  • the liquid receiving portions 110 are provided on both sides of the glass substrate G held by the stage 10 on the outer side in the X-axis direction.
  • Each liquid receiving unit 110 includes a pan 111 as a collection container for collecting the coating liquid P discharged from the end of the coating nozzle 20, and a support frame (not shown) as a support structure for supporting the pan 111 from below.
  • the structure of a support frame is the same as that of the structure of the support frame 33 of 1st Embodiment, for example.
  • the pan 111 is provided so as to extend in the X-axis direction. An end portion of the pan 111 on the glass substrate G side is positioned close to the glass substrate G so as not to contact the glass substrate G. The end of the pan 111 opposite to the glass substrate G is located outside the coating nozzle 20 at each of the nozzle positions B1 and B2. Further, the upper surface of the pan 111 is open, and the coating liquid P discharged from the end of the coating nozzle 20 is collected and temporarily stored. Then, the coating liquid P stored in the pan 111 is drained from a drain pipe (not shown) connected to the pan 111.
  • the pan 111 of the present embodiment directly recovers the coating liquid P discharged from the end of the application nozzle 20.
  • FIG. 13 is an explanatory view showing a state in which the coating liquid P is received by the liquid receiver 120 according to the fourth embodiment.
  • the fourth embodiment and the first embodiment are different in the configuration of the liquid receiving portion in the coating treatment apparatus 1. That is, in the coating treatment apparatus 1 of the fourth embodiment, the liquid receiving unit 120 is provided instead of the liquid receiving unit 30 of the first embodiment.
  • the liquid receiving portions 120 are provided on both sides of the glass substrate G held by the stage 10 on the outer side in the X-axis direction.
  • Each liquid receiving section 120 includes an absorbent 121 for absorbing the coating liquid P discharged from the end of the coating nozzle 20, and a support frame (not shown) as a support structure for supporting the absorbent 121 from below.
  • a support frame is the same as that of the structure of the support frame 33 of 1st Embodiment, for example.
  • the absorbent material 121 is provided so as to extend in the X-axis direction. An end portion of the absorbing material 121 on the glass substrate G side is positioned close to the glass substrate G so as not to be in contact with the glass substrate G. The end of the absorbing material 121 opposite to the glass substrate G is located outside the coating nozzle 20 at each of the nozzle positions B1 and B2. Then, in a state where the absorbing material 121 is disposed with a predetermined gap from the end of the application nozzle 20, the absorbing liquid 121 absorbs the application liquid P discharged from the end of the application nozzle 20 (ejection port 21). Be done. Further, the coating solution P absorbed by the absorbing material 121 is recovered by a recovery mechanism (not shown). The absorbing material 121 may be in close contact with the end of the coating nozzle 20.
  • the absorbent material 121 is not particularly limited as long as it can absorb the coating liquid P.
  • a porous body in which a plurality of holes are formed is used.
  • the absorbent material 121 it is preferable to use a material that suppresses generation of particles when in close contact with the coating nozzle 20, for example, polyethylene.
  • FIG. 14 is an explanatory view showing a state in which the coating liquid P is received by the liquid receiver 130 according to the fifth embodiment.
  • the configuration of the liquid receiving portion in the coating treatment apparatus 1 is different. That is, in the coating treatment apparatus 1 of the fifth embodiment, a liquid receiving unit 130 is provided instead of the liquid receiving unit 30 of the first embodiment.
  • the liquid receiving portions 130 are provided on both sides of the glass substrate G held by the stage 10 on the outer side in the X-axis direction.
  • Each liquid receiving portion 130 includes a composite material 131 in which a roller 131a as a winding-up material and a deckle 131b as a sealing material are integrally connected, and a support frame as a support structure for supporting the composite material 131 from below. Not shown).
  • the structure of a support frame is the same as that of the structure of the support frame 33 of 1st Embodiment, for example.
  • the roller 131a is provided on the side close to the glass substrate G in the X-axis direction, and the end of the roller 131a on the glass substrate G side approaches the glass substrate G so as not to contact the glass substrate G. Is located.
  • the roller 131 a takes up the coating liquid P discharged from the end of the coating nozzle 20.
  • the configuration of the roller 131a is the same as the configuration of the roller 31 of the first embodiment.
  • a recovery tank (not shown) for recovering the coating liquid P wound around the roller 131a is provided as in the recovery tank 32 of the first embodiment.
  • the deckel 131b is provided on the side far from the glass substrate G in the X-axis direction, and the end of the deckle 131b opposite to the glass substrate G is at the nozzle position B1 or B2 of the application nozzle 20. It is located outside.
  • the deckle 131 b seals the end of the application nozzle 20 (discharge port 21).
  • the configuration of the deckle 131 b is the same as the configuration of the deckle 101 of the second embodiment.
  • the application liquid P can be suppressed from dropping to the outside of the glass substrate G by the roller 131a and the deckle 131b.
  • the bead of the coating liquid P from the coating nozzle 20 can be stabilized further appropriately by the roller 131a.
  • the amount of use of the coating solution P can be suppressed by the deckle 131 b.
  • FIG. 15 is an explanatory view showing a state in which the coating liquid P is received by the liquid receiver 140 according to the sixth embodiment.
  • the sixth embodiment and the first embodiment are different in the configuration of the liquid receiving portion in the coating treatment apparatus 1. That is, in the coating treatment apparatus 1 of the sixth embodiment, a liquid receiving unit 140 is provided instead of the liquid receiving unit 30 of the first embodiment.
  • the liquid receiving portions 140 are provided on both sides of the glass substrate G held by the stage 10 on the outer side in the X-axis direction.
  • Each liquid receiving portion 140 is a support structure that supports the pair of rollers 141 and 141 extending in the Y-axis direction, the belt 142 wound around the pair of rollers 141 and 141, and the roller 141 and the belt 142 from below.
  • a support frame (not shown).
  • the structure of a support frame is the same as that of the structure of the support frame 33 of 1st Embodiment, for example.
  • the end portion of the belt 142 on the glass substrate G side is positioned close to the glass substrate G so as not to contact the glass substrate G.
  • the end of the belt 142 opposite to the glass substrate G is located outside the coating nozzle 20 at each of the nozzle positions B1 and B2. Then, the coating liquid P discharged from the end of the coating nozzle 20 is wound around the belt 142 and collected. Further, the coating liquid P wound up on the belt 142 is collected by a collection tank (not shown).
  • FIG. 16 is a side view showing the outline of the configuration of the coating treatment apparatus 1 according to the seventh embodiment.
  • the seventh embodiment is different from the above embodiment in the configuration of the liquid receiver in the coating treatment apparatus 1. That is, in the coating treatment apparatus 1 of the seventh embodiment, the liquid receiving unit 30 in the first embodiment and the liquid receiving unit 100 in the second embodiment are provided.
  • the liquid receiver 30 is provided on the negative side of the glass substrate G held by the stage 10 in the negative X-axis direction, and rolls up and collects the coating liquid P discharged from the end of the coating nozzle 20.
  • the liquid receiving portion 100 is provided on the positive direction side in the X-axis direction of the glass substrate G, and seals the end portion of the application nozzle 20 (discharge port 21).
  • the application liquid P can be suppressed from dripping to the outside of the glass substrate G by the roller 31 of the liquid receiving unit 30 and the deckle 101 of the liquid receiving unit 110. Further, the bead of the coating liquid P from the coating nozzle 20 can be stabilized more appropriately by the roller 31. Furthermore, the amount of use of the coating solution P can be suppressed by the deckle 101.
  • the roller 31 and the collection tank 32 are supported by the support frame 33, and the deckle 101 is supported by the support frame 102. Therefore, the liquid receiver 30 and the liquid receiver 100 The exchange of can be easily done.
  • liquid receiving unit 30 and the liquid receiving unit 110 are used in combination, but the liquid receiving units 30, 110, 120, 130, and 140 of the above embodiments may be combined arbitrarily. Moreover, when each liquid receiving part 30, 110, 120, 130, 140 has a support frame, these combinations can also be changed easily.
  • FIG.17 and FIG.18 is a side view which shows the outline of a structure of the coating processing apparatus 1 which concerns on 8th Embodiment.
  • the configuration of the liquid receiving portion in the coating treatment apparatus 1 is different, and more specifically, a member for receiving the coating liquid P discharged from the end of the glass substrate G (for example, roller 31) And the configuration for supporting the deckel 101 etc. is different.
  • liquid receiving parts 150 and 160 are provided.
  • the liquid receiving portion 150 is provided on the X axis direction negative direction side of the glass substrate G held by the stage 10.
  • the liquid receiving unit 150 includes a roller 151 for winding the application liquid P discharged from the end of the application nozzle 20, a recovery tank 152 for recovering the application liquid P wound around the roller 151, a roller 151, and a recovery tank 152.
  • a support bracket 153 for supporting the The roller 151 and the recovery tank 152 respectively have the same configuration as the roller 31 and the recovery tank 32 of the first embodiment. Further, the roller 151 and the recovery tank 152 are suspended and supported by the support beam 22 via the support bracket 153.
  • the liquid receiver 160 is provided on the positive side in the X-axis direction of the glass substrate G held by the stage 10.
  • the liquid receiver 160 has a deckle 161 for sealing the discharge port at the end of the application nozzle 20 and a support bracket 162 for supporting the deckle 161.
  • the deckle 161 has the same configuration as the deckle 101 of the second embodiment. Further, the deckle 161 is suspended and supported by the support beam 22 via the support bracket 162.
  • the roller 151 and the recovery tank 152 are suspended and supported by the support beam 22 via the support bracket 153 in the liquid receiving portion 150, the space S is formed below the roller 151 and the recovery tank 152. . Maintenance of the roller 151 and the collection tank 152 can be easily performed by the space S. Further, since the space S is also formed below the deckle 161 in the liquid receiving portion 160, maintenance of the deckle 161 can be easily performed.
  • the same roller 151 as the roller 31 of the first embodiment and the same deckle 161 as the second embodiment of the second embodiment 101 are used in combination, but the combination is arbitrary.
  • the pan 111 of the third embodiment, the absorbent material 121 of the fourth embodiment, the composite material 131 of the fifth embodiment, the roller 141 and the belt 142 of the sixth embodiment may be used.
  • FIG. 19 is a plan view showing an outline of a configuration of a coating treatment apparatus 1 according to a ninth embodiment.
  • the coating treatment apparatus 1 of the ninth embodiment further includes an end removing unit 170 for removing the coating liquid P at the end of the glass substrate G in the coating treatment apparatus 1 of the above embodiment.
  • the edge removing portions 170 are provided on both sides of the glass substrate G in the X axis direction at the substrate position A2.
  • the edge removing unit 170 has a solvent nozzle (not shown) that supplies the solvent of the coating solution P. Then, a solvent is supplied to the coating solution P applied to the end of the glass substrate G in the X-axis direction, and the coating solution P is removed.
  • a known configuration can be used for the end removing unit 170, and for example, a solvent supply unit described in Japanese Patent Laid-Open No. 2013-58567 can be used.
  • the optical film may not be required at the end of the glass substrate G.
  • the coating liquid P after the coating liquid P is applied to the entire surface of the glass substrate G by the coating nozzle 20, the coating liquid P on the edge of the glass substrate G can be removed by the edge removing portion 170.
  • the film thickness of the coating liquid P at the end of the glass substrate G is different from the film thickness of the coating liquid P at the portion other than the end. Film thickness may become uneven.
  • the film thickness of the coating solution P is adjusted by removing the coating solution P at the edge of the glass substrate G by the desired film thickness using the edge removal unit 170 of the present embodiment.
  • the film thickness can also be made uniform within the substrate surface. In order to make the film thickness uniform in the substrate plane, the temperature of the end portion of the glass substrate G may be adjusted.
  • FIG. 20 is a plan view showing an outline of a configuration of a coating treatment apparatus 1 according to a tenth embodiment.
  • the coating treatment apparatus 1 of the tenth embodiment further includes a priming roller 180 in the coating treatment apparatus 1 of the above embodiment.
  • the priming roller 180 is provided at the tip of the stage 10 on the positive side in the Y-axis direction.
  • the priming roller 180 Prior to discharging the application liquid P from the application nozzle 20 to the glass substrate G, the priming roller 180 performs a priming process to make the application liquid P attached to the tip of the application nozzle 20 uniform. Specifically, the discharge port 21 of the coating nozzle 20 is made to face directly above the priming roller 180, and the coating liquid P is discharged from the discharge port 21 to the priming roller 180. Then, the priming roller 180 is rotated to wind up the coating liquid P, whereby the adhesion state of the coating liquid P at the ejection port 21 is adjusted, and the ejection state of the coating liquid P at the ejection port 21 can be stabilized.
  • the glass substrate G is moved by moving the stage 10 holding the glass substrate G in the Y-axis direction, but the method of moving the glass substrate G is not limited to this.
  • the glass substrate G may be moved by a so-called floating conveyance method. Specifically, for example, a floating stage (not shown) extending in the Y-axis direction from the substrate position A1 to the substrate position A2 is provided, and a high pressure gas (usually air) is jetted vertically upward from the upper surface of the floating stage The substrate is floated horizontally by the pressure of high pressure air. Then, the glass substrate G can be moved in a state where the glass substrate G is floated in the air on the floating stage.
  • a floating conveyance method Specifically, for example, a floating stage (not shown) extending in the Y-axis direction from the substrate position A1 to the substrate position A2 is provided, and a high pressure gas (usually air) is jetted vertically upward from the upper surface of the floating stage The substrate is floated horizontally by the pressure of high pressure air.
  • maintained at the stage 10 was moved to Y-axis direction
  • the coating nozzle 20 was moved to X-axis direction
  • the glass substrate G and the coating nozzle 20 Relative to each other in the orthogonal direction.
  • the glass substrate G may move in the Y axis direction and the X axis direction
  • the coating nozzle 20 may move in the Y axis direction and the X axis direction.
  • a linear polarizing film (linearly polarizing plate) and a ⁇ / 4 wavelength film ( ⁇ / 4 wavelength plate) are formed as an optical film on a glass substrate
  • the present invention can be applied to others.
  • the present invention can be applied to a polarizing plate or a wave plate used in an LCD.
  • the wavelength plate is not limited to the ⁇ / 4 wavelength film, and the present invention can be applied to other wavelength plates such as, for example, a ⁇ / 2 wavelength film.

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  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing Optical Record Carriers (AREA)
PCT/JP2018/026496 2017-07-27 2018-07-13 塗布処理装置、塗布処理方法及びコンピュータ記憶媒体 WO2019021859A1 (ja)

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JP2019532511A JP6909854B2 (ja) 2017-07-27 2018-07-13 塗布処理装置、塗布処理方法及びコンピュータ記憶媒体
CN201880047157.6A CN110891697B (zh) 2017-07-27 2018-07-13 涂敷处理装置、涂敷处理方法和计算机存储介质
KR1020207004602A KR102492389B1 (ko) 2017-07-27 2018-07-13 도포 처리 장치, 도포 처리 방법 및 컴퓨터 기억 매체

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07232120A (ja) * 1994-02-24 1995-09-05 Konica Corp 塗布方法及び塗布装置
JPH1099764A (ja) * 1996-08-07 1998-04-21 Matsushita Electric Ind Co Ltd 塗布装置及び方法
WO2012140905A1 (ja) * 2011-04-15 2012-10-18 パナソニック株式会社 基板塗布方法及び基板塗布装置並びに同方法を用いた有機エレクトロルミネッセント素子の製造方法
JP2013184126A (ja) * 2012-03-08 2013-09-19 Dainippon Printing Co Ltd 塗工装置
JP2013202489A (ja) * 2012-03-28 2013-10-07 Dainippon Screen Mfg Co Ltd 塗布装置
JP2014147857A (ja) * 2013-01-31 2014-08-21 Hitachi Vehicle Energy Ltd ダイコータ装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5360516A (en) * 1992-11-12 1994-11-01 Philip Morris Incorporated Application of fluidized material to a substrate using intermittent charges of compressed air
CN2279961Y (zh) * 1996-12-31 1998-04-29 中国科学院感光化学研究所 去除涂布厚边的装置
JP3940054B2 (ja) * 2002-10-07 2007-07-04 大日本スクリーン製造株式会社 ノズル清掃装置およびこのノズル清掃装置を備えた基板処理装置
JP2005062502A (ja) 2003-08-13 2005-03-10 Nakan Corp 偏光膜印刷装置
CN101855593B (zh) * 2007-11-08 2011-12-21 芝浦机械电子装置股份有限公司 液滴涂敷装置、液滴涂敷方法、液晶显示面板的制造装置及液晶显示面板的制造方法
JP5919113B2 (ja) * 2012-07-04 2016-05-18 東京エレクトロン株式会社 塗布処理装置、塗布処理方法、プログラム及びコンピュータ記憶媒体
AT515608B1 (de) * 2014-04-03 2016-06-15 Worff Herwig Dipl Ing Vorrichtung zum Verschließen von Säcken aus Gewebe

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07232120A (ja) * 1994-02-24 1995-09-05 Konica Corp 塗布方法及び塗布装置
JPH1099764A (ja) * 1996-08-07 1998-04-21 Matsushita Electric Ind Co Ltd 塗布装置及び方法
WO2012140905A1 (ja) * 2011-04-15 2012-10-18 パナソニック株式会社 基板塗布方法及び基板塗布装置並びに同方法を用いた有機エレクトロルミネッセント素子の製造方法
JP2013184126A (ja) * 2012-03-08 2013-09-19 Dainippon Printing Co Ltd 塗工装置
JP2013202489A (ja) * 2012-03-28 2013-10-07 Dainippon Screen Mfg Co Ltd 塗布装置
JP2014147857A (ja) * 2013-01-31 2014-08-21 Hitachi Vehicle Energy Ltd ダイコータ装置

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TWI790255B (zh) 2023-01-21
KR20200035974A (ko) 2020-04-06
TW201919768A (zh) 2019-06-01
KR102492389B1 (ko) 2023-01-26
CN110891697B (zh) 2022-02-25
CN110891697A (zh) 2020-03-17
JPWO2019021859A1 (ja) 2020-07-02

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