WO2018218741A1 - Oled显示面板的制作方法及oled显示面板 - Google Patents

Oled显示面板的制作方法及oled显示面板 Download PDF

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Publication number
WO2018218741A1
WO2018218741A1 PCT/CN2017/092681 CN2017092681W WO2018218741A1 WO 2018218741 A1 WO2018218741 A1 WO 2018218741A1 CN 2017092681 W CN2017092681 W CN 2017092681W WO 2018218741 A1 WO2018218741 A1 WO 2018218741A1
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layer
interface
nanoparticles
display panel
metal
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PCT/CN2017/092681
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English (en)
French (fr)
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张育楠
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深圳市华星光电技术有限公司
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Priority to US15/557,130 priority Critical patent/US10355248B2/en
Publication of WO2018218741A1 publication Critical patent/WO2018218741A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H10K71/611—Forming conductive regions or layers, e.g. electrodes using printing deposition, e.g. ink jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H10K30/865—Intermediate layers comprising a mixture of materials of the adjoining active layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/17—Carrier injection layers
    • H10K50/171—Electron injection layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/321—Inverted OLED, i.e. having cathode between substrate and anode
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/331—Nanoparticles used in non-emissive layers, e.g. in packaging layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/82—Cathodes
    • H10K50/828—Transparent cathodes, e.g. comprising thin metal layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/805—Electrodes
    • H10K59/8052—Cathodes
    • H10K59/80524—Transparent cathodes, e.g. comprising thin metal layers

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a method for fabricating an OLED display panel and an OLED display panel.
  • OLED Organic Light Emitting Display
  • OLED has self-illumination, low driving voltage, high luminous efficiency, short response time, high definition and contrast ratio, near 180° viewing angle, wide temperature range, and flexible display.
  • a large-area full-color display and many other advantages have been recognized by the industry as the most promising display device.
  • the OLED device generally includes a substrate, an anode disposed on the substrate, a hole injection layer disposed on the anode, a hole transport layer disposed on the hole injection layer, and a light-emitting layer disposed on the hole transport layer.
  • the principle of illumination of OLED devices is that semiconductor materials and organic luminescent materials are driven by electric fields, causing luminescence by carrier injection and recombination.
  • an OLED device generally uses an ITO pixel electrode and a metal electrode as anodes and cathodes of the device, respectively.
  • electrons and holes are injected from the cathode and the anode to the electron transport layer and the hole transport layer, respectively, and electrons and holes.
  • the holes migrate to the light-emitting layer through the electron transport layer and the hole transport layer, respectively, and meet in the light-emitting layer to form excitons and excite the light-emitting molecules, and the latter emits visible light through radiation relaxation.
  • a thin film transistor (TFT) for controlling an OLED device is usually fabricated on the anode side, which requires the TFT to be p-type, and conventional non- The n-type mobility of crystalline silicon TFTs and polycrystalline silicon TFTs is significantly greater than their p-type mobility. If the inverted OLED device structure is adopted, the n-type thin film transistor with superior performance can be applied to the pixel circuit of the AMOLED display device, and the design of the driving circuit design of the AMOLED display device is increased.
  • IJP Ink-jet printing
  • IJP technology has the advantages of high material utilization rate and is the key technology to solve the cost problem of large-size OLED display.
  • IJP technology is compared with traditional vacuum evaporation in the preparation of OLED device luminescent layer.
  • the process has many advantages such as saving materials, mild process conditions, and more uniform film formation, so it has more application potential.
  • a plurality of nozzles are used to drop the functional material ink into a predetermined pixel area, and the solvent is evaporated to form a desired pattern.
  • Metal nanoparticles provide a number of excellent optical and electrical properties with their special volumetric effects, quantum size effects, surface effects, and macroscopic quantum tunneling.
  • An object of the present invention is to provide a method for fabricating an OLED display panel.
  • the OLED device adopts an inverted structure, and an interface modification layer containing an electron transport material and metal nanoparticles is disposed between the cathode and the light-emitting layer, thereby effectively improving the OLED device.
  • the object of the present invention is to provide an OLED display panel.
  • the OLED device adopts an inverted structure, and an interface modification layer containing an electron transport material and metal nanoparticles is disposed between the cathode and the light-emitting layer, which can effectively improve the overall performance of the OLED device. And the production method is simple.
  • the present invention provides a method for fabricating an OLED display panel, the OLED display panel comprising a substrate substrate, and a plurality of OLED devices disposed on the substrate substrate, wherein the OLED device is an inverted type
  • the OLED device includes a cathode, a light-emitting layer, and an anode disposed in order from bottom to top, and an interface modification layer is disposed between the cathode and the light-emitting layer;
  • the interface modification layer is prepared by:
  • the interface modifying printing liquid comprising an electron transporting material, a metal nano particle, a surface tension adjusting agent, and a viscosity modifier, wherein the metal nanoparticle is a surface modified metal nanoparticle to inhibit metal
  • the interface-modified printing liquid is coated on the cathode by inkjet printing to form an interface modifying layer comprising the electron transporting material and the metal nanoparticles.
  • the metal nanoparticles are gold nanoparticles, silver nanoparticles, or copper nanoparticles;
  • the metal nanoparticles are organic amine-modified metal nanoparticles
  • the electron transporting material is zinc oxide or titanium oxide.
  • the surface tension adjusting agent is a combination of a cosolvent, a surfactant, imidazole and a derivative thereof, phenol, hydroquinone or a combination thereof;
  • the viscosity modifier is one or a combination of an alcohol, an ether, an ester, a phenol, an amine.
  • At least one of a hole injection layer and a hole transport layer is disposed between the anode and the light-emitting layer;
  • the material of the anode includes at least one of gold and silver.
  • the method for fabricating the OLED display panel specifically includes the following steps:
  • Step S1 providing a substrate substrate, forming a pixel defining layer on the substrate substrate, wherein the pixel defining layer is provided with a plurality of through holes spaced apart; and forming a plurality of cathodes in the plurality of through holes ;
  • Step S2 providing an interface-modified printing liquid, coating the interface-modified printing liquid on the plurality of cathodes by inkjet printing, and respectively obtaining a plurality of interface modifying layers;
  • Step S3 forming a plurality of light-emitting layers on the plurality of interface modification layers; forming a plurality of hole transport layers on the plurality of light-emitting layers; forming a plurality of holes on the plurality of hole transport layers An anode; thereby forming a plurality of OLED devices in a plurality of via holes on the pixel defining layer.
  • the cathode is formed by magnetron sputtering, and the material of the cathode is a transparent conductive metal oxide;
  • the electron transporting material in the interface-modified printing liquid is zinc oxide, and the metal nanoparticles are gold nanoparticles;
  • the light-emitting layer is formed by inkjet printing; the material of the light-emitting layer comprises poly(9,9-dioctylfluorene-2,7-diyl);
  • the hole transport layer and the anode are formed by vacuum evaporation; the material of the hole transport layer is molybdenum oxide; and the material of the anode is silver.
  • the present invention also provides an OLED display panel comprising a base substrate and a plurality of OLED devices disposed on the base substrate, the OLED device being an inverted OLED device, including a cathode arranged in order from bottom to top, and illuminating a layer and an anode, and an interface modification layer is disposed between the cathode and the light-emitting layer;
  • the interface modifying layer is formed by an inkjet printing method, and the interface modifying printing liquid comprises an electron transporting material, a metal nano particle, a surface tension adjusting agent, and a viscosity modifier, wherein the metal nanometer
  • the particles are surface-modified metal nanoparticles to inhibit agglomeration between the metal nanoparticles and enhance the solubility of the metal nanoparticles, that is, the interface modification layer comprises an electron transport material and metal nanoparticles.
  • the metal nanoparticles are gold nanoparticles, silver nanoparticles, or copper nanoparticles;
  • the metal nanoparticles are organic amine-modified metal nanoparticles
  • the electron transporting material is zinc oxide or titanium oxide
  • the surface tension adjusting agent is a combination of a cosolvent, a surfactant, imidazole and a derivative thereof, phenol, hydroquinone or a combination thereof;
  • the viscosity modifier is one or a combination of an alcohol, an ether, an ester, a phenol, and an amine;
  • the material of the anode includes at least one of gold and silver.
  • the OLED display panel further includes a pixel defining layer disposed on the substrate, wherein the pixel defining layer is provided with a plurality of via holes spaced apart, and the plurality of OLED devices are respectively disposed on the number Inside the through hole.
  • the OLED device specifically includes a cathode, an interface modification layer, and a hair set from bottom to top. Light layer, hole transport layer, and anode.
  • the material of the cathode is a transparent conductive metal oxide; in the interface modification layer, the electron transporting material is zinc oxide, the metal nanoparticle is gold nanoparticle; and the material of the light emitting layer comprises poly(9,9-dioctyl) ⁇ -2,7-diyl); the material of the hole transport layer is molybdenum oxide; the material of the anode is silver.
  • the present invention also provides a method for fabricating an OLED display panel, the OLED display panel comprising a substrate substrate, and a plurality of OLED devices disposed on the substrate substrate, wherein the OLED device is an inverted OLED device, including a cathode, a light-emitting layer, and an anode disposed in sequence from bottom to top, wherein an interface modification layer is disposed between the cathode and the light-emitting layer;
  • the interface modification layer is prepared by:
  • the interface modifying printing liquid comprising an electron transporting material, a metal nano particle, a surface tension adjusting agent, and a viscosity modifier, wherein the metal nanoparticle is a surface modified metal nanoparticle to inhibit metal Agglomerating between the nanoparticles and enhancing the solubility of the metal nanoparticles, coating the interface-modified printing liquid on the cathode by inkjet printing to form an interface modifying layer comprising the electron transporting material and the metal nanoparticles;
  • metal nanoparticles are gold nanoparticles, silver nanoparticles, or copper nanoparticles;
  • the metal nanoparticles are organic amine-modified metal nanoparticles
  • the electron transporting material is zinc oxide or titanium oxide
  • the surface tension adjusting agent is a combination of a cosolvent, a surfactant, imidazole and a derivative thereof, phenol, hydroquinone or a combination thereof;
  • the viscosity modifier is one or a combination of an alcohol, an ether, an ester, a phenol, and an amine;
  • At least one of a hole injection layer and a hole transport layer is disposed between the anode and the light-emitting layer;
  • the material of the anode includes at least one of gold and silver
  • the specific steps include the following steps:
  • Step S1 providing a substrate substrate, forming a pixel defining layer on the substrate substrate, wherein the pixel defining layer is provided with a plurality of through holes spaced apart; and forming a plurality of cathodes in the plurality of through holes ;
  • Step S2 providing an interface-modified printing liquid, coating the interface-modified printing liquid on the plurality of cathodes by inkjet printing, and respectively obtaining a plurality of interface modifying layers;
  • Step S3 forming a plurality of light-emitting layers on the plurality of interface modification layers; forming a plurality of hole transport layers on the plurality of light-emitting layers; forming a plurality of holes on the plurality of hole transport layers An anode; thereby forming a plurality of OLED devices in a plurality of via holes on the pixel defining layer.
  • the invention provides an OLED display panel manufacturing method, which adopts an inverted structure OLED device, and adopts an inkjet printing technology to fabricate an interface between the cathode of the OLED device and the luminescent layer by the interface-modified printing liquid.
  • a finishing layer the interface modifying printing liquid comprising an electron transporting material, a metal nanoparticle, a surface tension adjusting agent, and a viscosity modifier, wherein the metal nanoparticle is a surface modified metal nanoparticle, which can inhibit metal nanoparticle
  • the interface modification layer is a material layer containing an electron transport material and metal nanoparticles
  • the electron transport material can enhance the injection and transport of carriers from the cathode
  • the metal nanoparticles pass The strong local electric field generated by the surface plasmon resonance can enhance the electron injection efficiency.
  • the OLED device is an inverted OLED device, and an interface modification layer is further disposed between the cathode and the luminescent layer, and the interface modification layer is formed by an interface modification printing liquid by inkjet printing.
  • the interface modification printing liquid comprises an electron transporting material, a surface modified metal nano particle, a surface tension adjusting agent, and a viscosity modifier.
  • FIG. 1 is a flow chart of a preferred embodiment of a method of fabricating an OLED display panel of the present invention
  • step S1 is a schematic diagram of step S1 of a preferred embodiment of a method for fabricating an OLED display panel of the present invention
  • step S2 of a preferred embodiment of a method for fabricating an OLED display panel of the present invention
  • FIG. 4 is a schematic view showing a step S3 of a preferred embodiment of the method for fabricating an OLED display panel of the present invention and a schematic structural view of a preferred embodiment of the OLED display panel of the present invention.
  • the present invention firstly provides a method for fabricating an OLED display panel.
  • the OLED display panel includes a substrate substrate 10 and a plurality of OLED devices 30 disposed on the substrate substrate 10.
  • the OLED device 30 is an inverted OLED.
  • the device includes a cathode 31, an illuminating layer 32, and an anode 33 disposed in this order from bottom to top, and an interface modifying layer 34 is disposed between the cathode 31 and the luminescent layer 32;
  • the interface modification layer 34 is manufactured by:
  • the interface modifying printing liquid comprising an electron transporting material, a metal nano particle, a surface tension adjusting agent, and a viscosity modifier, wherein the metal nanoparticle is a surface modified metal nanoparticle to inhibit metal Agglomeration between the nanoparticles and enhancing the solubility of the metal nanoparticles, and then coating the interface-modified printing liquid on the cathode 31 by inkjet printing, thereby forming an interface modification layer containing the electron transporting material and the metal nanoparticles.
  • the electron transporting material in the interface modifying layer 34 is mainly used to enhance the injection and transport of carriers from the cathode 31, which may be zinc oxide (ZnO) or titanium oxide (TiOx).
  • the present invention provides an interface modification layer 34 containing metal nanoparticles between the cathode 31 and the light-emitting layer 32, mainly by utilizing a strong local electric field generated by plasmon resonance of the surface of the metal nanoparticles, thereby enhancing electron injection efficiency.
  • the OLED device 30 which is preferably a nanoparticle of a highly conductive inert metal such as gold, silver or copper.
  • the surface of the metal nanoparticle has an organic amine ligand, that is, the metal nano-particle is an organic amine-modified metal nano-particle, and the long-chain organic amine ligand can be effective on the one hand.
  • the solubility of the particles in common organic solvents makes the prepared metal nanoparticles better suited for solution processing.
  • the organic amine is a long chain alkylamine having a carbon chain length of greater than or equal to 16.
  • the surface tension adjusting agent is a combination of a cosolvent, a surfactant, imidazole and a derivative thereof, phenol, hydroquinone, or a combination thereof;
  • the viscosity modifier is one or a combination of an alcohol, an ether, an ester, a phenol, and an amine.
  • the viscosity modifier is a polyhydric alcohol or a glycol ether.
  • At least one of a hole injection layer and a hole transport layer is provided between the anode 33 and the light-emitting layer 32.
  • the material of the anode 33 is a high work function metal, including at least one of gold and silver.
  • a preferred embodiment of a method for fabricating an OLED display panel of the present invention includes the following steps:
  • Step S1 as shown in FIG. 2, a substrate substrate 10 is provided, and a pixel defining layer 20 is formed on the substrate substrate 10, and the pixel defining layer 20 is provided with a plurality of through holes 21 disposed at intervals; A plurality of cathodes 31 are formed in the plurality of through holes 21, respectively.
  • the base substrate 10 is a substrate with a TFT array, and the TFTs in the TFT array are n-type TFTs.
  • the cathode 31 is formed by magnetron sputtering.
  • the material of the cathode 31 is a transparent conductive metal oxide, preferably Indium Tin Oxide (ITO).
  • the cathode 31 has a thickness of 20 nm to 200 nm.
  • Step S2 as shown in FIG. 3, an interface-modified printing liquid is provided, and the interface-modified printing liquid is applied by inkjet printing on the plurality of cathodes 31 to obtain a plurality of interface-modifying layers 34, respectively.
  • the interface modification layer 34 has a thickness of 1 nm to 200 nm.
  • the electron transporting material in the interface modifying layer 34 in the step S2 is zinc oxide, and the metal nanoparticles are gold nanoparticles.
  • the specific preparation process of the interface modified printing liquid is:
  • Step S3 as shown in FIG. 4, a plurality of light emitting layers 32 are respectively formed on the plurality of interface modifying layers 34; and a plurality of hole transporting layers 35 are formed on the plurality of light emitting layers 32; A plurality of anodes 33 are formed on each of the hole transporting layers 35; thus, a plurality of OLED devices 30 are formed in the plurality of through holes 21 on the pixel defining layer 20, respectively.
  • the light emitting layer 32 is formed by a method of inkjet printing;
  • the material of the luminescent layer 32 includes poly(9,9-di-ictylfluorenyl-2,7-diyl), PFO; (9,9-Dioctylindole-2,7-diyl) is a blue luminescent material.
  • the light-emitting layer 32 has a thickness of 1 nm to 100 nm.
  • the hole transport layer 35 and the anode 33 are formed by vacuum evaporation; the material of the hole transport layer 35 is molybdenum oxide (MoO 3 ); the material of the anode 33 It is silver.
  • the hole transport layer 35 has a thickness of 0.5 nm to 50 nm, and the anode 33 has a thickness of 10 nm to 2000 nm.
  • the OLED device adopts an inverted structure, and an interface modification layer 34 is formed between the cathode 31 and the luminescent layer 32 by an interface-modified printing liquid by using an inkjet printing technique, and the interface-modified printing liquid includes An electron transporting material, a metal nanoparticle, a surface tension adjusting agent, and a viscosity modifier, wherein the metal nanoparticle is a surface-modified metal nanoparticle, which can inhibit agglomeration between metal nanoparticles and enhance metal nanoparticle Solubility, that is, the interface modifying layer 34 is a material layer containing an electron transporting material and metal nanoparticles, the electron transporting material of which can enhance the injection and transport of carriers from the cathode 31, and the strong generation of the metal nanoparticles by their surface plasmon resonance The local electric field can enhance the electron injection efficiency.
  • the present invention further provides an OLED display panel, which is manufactured by the method for fabricating an OLED display panel as described above, and includes a substrate substrate 10 and a substrate substrate 10 disposed thereon. a plurality of OLED devices 30, wherein the OLED device 30 is an inverted OLED device, including a cathode 31, an illuminating layer 32, and an anode 33 disposed in order from bottom to top, and an interface modification layer is disposed between the cathode 31 and the luminescent layer 32. 34;
  • the interface modifying layer 34 is formed by an inkjet printing method of an interface-modified printing liquid comprising an electron transporting material, surface-modified metal nanoparticles, a surface tension adjusting agent, and a viscosity modifier.
  • the electron transporting material in the interface modifying layer 34 is zinc oxide or titanium oxide.
  • the metal in the metal nanoparticle is gold, silver, or copper, that is, the metal nanoparticle is a gold nanoparticle, a silver nanoparticle, or a copper nanoparticle.
  • the surface of the metal nanoparticle has an organic amine ligand, that is, the metal nanoparticle is an organic amine-modified metal nanoparticle to inhibit agglomeration between metal nanoparticles, and The solubility of the metal nanoparticles is enhanced; preferably, the organic amine is a long chain alkylamine having a carbon chain length of greater than or equal to 16.
  • the surface tension adjusting agent is a combination of a cosolvent, a surfactant, imidazole and a derivative thereof, phenol, hydroquinone, or a combination thereof;
  • the viscosity modifier is one or a combination of an alcohol, an ether, an ester, a phenol, and an amine.
  • the viscosity modifier is a polyhydric alcohol or a glycol ether.
  • At least one of a hole injection layer and a hole transport layer is provided between the anode 33 and the light-emitting layer 32.
  • the material of the anode 33 is a high work function metal, including at least one of gold and silver, which can effectively improve the stability of the electrode of the OLED device 30, thereby further improving the stability and life of the device.
  • a preferred embodiment of the OLED display panel of the present invention includes a substrate substrate 10, a plurality of OLED devices 30 disposed on the substrate substrate 10, and a substrate disposed on the substrate.
  • the OLED device 30 specifically includes a cathode 31, an interface modification layer 34, a light-emitting layer 32, a hole transport layer 35, and an anode 33 which are disposed in this order from bottom to top.
  • the material of the cathode 31 is a transparent conductive metal oxide; in the interface modification layer 34, the electron transporting material is zinc oxide, the metal nanoparticles are gold nanoparticles; and the material of the light emitting layer 32 includes poly (9). , 9-dioctylfluorene-2,7-diyl); the material of the hole transport layer 35 is molybdenum oxide; the material of the anode 33 is silver.
  • the OLED device 30 adopts an inverted structure, and an interface modification layer 34 is disposed between the cathode 31 of the OLED device 30 and the light-emitting layer 32, and the interface modification layer 34 is printed by inkjet printing by the interface-modified printing liquid.
  • the method comprises the steps of: forming an electron transporting material, surface-modified metal nanoparticles, a surface tension adjusting agent, and a viscosity modifier.
  • the OLED device adopts an inverted structure, and an interface modification layer is formed between the cathode and the luminescent layer by the interface-modified printing liquid by using an inkjet printing technique, and the interface is decorated and printed.
  • the liquid includes an electron transporting material, a metal nanoparticle, a surface tension adjusting agent, and a viscosity modifier, wherein the metal nanoparticle is a surface modified metal nanoparticle, which can inhibit agglomeration between the metal nanoparticle and enhance the metal nanometer.
  • the solubility of the particles that is, the interface modification layer is a material layer containing an electron transport material and metal nanoparticles
  • the electron transport material can enhance the injection and transport of carriers from the cathode, and the strong generation of metal nanoparticles through its surface plasmon resonance a local electric field, which can enhance the injection efficiency of electrons, by introducing the interface modification layer between the cathode of the OLED device and the light-emitting layer, Effectively improve the overall performance of OLED devices, and the production method is simple.
  • the OLED device is an inverted OLED device, and an interface modification layer is further disposed between the cathode and the luminescent layer, and the interface modification layer is formed by an interface modification printing liquid by inkjet printing.
  • the interface modification printing liquid comprises an electron transporting material, a surface modified metal nano particle, a surface tension adjusting agent, and a viscosity modifier.

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Abstract

一种OLED显示面板的制作方法及OLED显示面板。OLED显示面板的制作方法，采用倒置型结构的OLED器件（30），并采用喷墨打印技术由界面修饰打印液在OLED器件（30）的阴极（31）与发光层（32）之间制作界面修饰层（34），界面修饰打印液包括电子传输材料、表面经过修饰的金属纳米粒子、表面张力调节剂、及粘度调节剂，即界面修饰层（34）为包含电子传输材料与金属纳米粒子的材料层，其电子传输材料可以增强载流子从阴极的注入和传输，金属纳米粒子通过其表面等离子共振所产生的强大的局部电场，可以增强电子的注入效率，通过将界面修饰层（34）引入到OLED器件（30）的阴极（31）与发光层（32）之间，可以有效提升OLED器件（30）的综合性能，制作方法简单。

Description

OLED显示面板的制作方法及OLED显示面板 技术领域
本发明涉及显示技术领域，尤其涉及一种OLED显示面板的制作方法及OLED显示面板。
背景技术
有机发光二极管显示装置(Organic Light Emitting Display，OLED)具有自发光、驱动电压低、发光效率高、响应时间短、清晰度与对比度高、近180°视角、使用温度范围宽，可实现柔性显示与大面积全色显示等诸多优点，被业界公认为是最有发展潜力的显示装置。
OLED器件通常包括：基板、设于基板上的阳极、设于阳极上的空穴注入层、设于空穴注入层上的空穴传输层、设于空穴传输层上的发光层、设于发光层上的电子传输层、设于电子传输层上的电子注入层、及设于电子注入层上的阴极。OLED器件的发光原理为半导体材料和有机发光材料在电场驱动下，通过载流子注入和复合导致发光。具体的，OLED器件通常采用ITO像素电极和金属电极分别作为器件的阳极和阴极，在一定电压驱动下，电子和空穴分别从阴极和阳极注入到电子传输层和空穴传输层，电子和空穴分别经过电子传输层和空穴传输层迁移到发光层，并在发光层中相遇，形成激子并使发光分子激发，后者经过辐射弛豫而发出可见光。
在有源矩阵(Active Matrix，AM)有机发光二极管显示装置中,控制OLED器件的薄膜晶体管(Thin film transistor，TFT)通常制作于阳极一侧，这就要求TFT必须是p型，而常规的非晶硅TFT和多晶硅TFT的n型迁移率明显大于其p型迁移率。若采用倒置型OLED器件结构便能够使性能优越的n型薄膜晶体管应用于AMOLED显示装置的像素电路中，增加了AMOLED显示装置驱动电路设计的选择。
喷墨打印(Ink-jet Printing，IJP)技术具有材料利用率高等优点，是解决大尺寸OLED显示器成本问题的关键技术，IJP技术在OLED器件发光层的制备中，相比于传统的真空蒸镀工艺，具有节省材料、制程条件温和、成膜更均匀等诸多优点，所以更具应用潜力。此方法是利用多个喷嘴将功能材料墨水滴入预定的像素区域，待溶剂挥发后形成所需图案。
金属纳米粒子以其特殊的体积效应、量子尺寸效应、表面效应和宏观量子隧道效应提供了诸多优异的光学和电学性能。
发明内容
本发明的目的在于提供一种OLED显示面板的制作方法，OLED器件采用倒置型结构，且阴极与发光层之间设有包含电子传输材料和金属纳米粒子的界面修饰层，可以有效提升OLED器件的综合性能，且制作方法简单。
本发明的目的还在于提供一种OLED显示面板，OLED器件采用倒置型结构，且阴极与发光层之间设有包含电子传输材料和金属纳米粒子的界面修饰层，可以有效提升OLED器件的综合性能，且制作方法简单。
为实现上述目的，本发明提供了一种OLED显示面板的制作方法，所述OLED显示面板包括衬底基板、及设于所述衬底基板上的数个OLED器件，所述OLED器件为倒置型OLED器件，包括由下至上依次设置的阴极、发光层、及阳极，所述阴极与发光层之间设有界面修饰层；
所述界面修饰层的制作方法为：
提供界面修饰打印液，所述界面修饰打印液包括电子传输材料、金属纳米粒子、表面张力调节剂、及粘度调节剂，其中，所述金属纳米粒子为表面经过修饰的金属纳米粒子，以抑制金属纳米粒子之间的团聚，并增强金属纳米粒子的溶解度，采用喷墨打印的方式将所述界面修饰打印液涂布在阴极上，形成包含电子传输材料与金属纳米粒子的界面修饰层。
所述金属纳米粒子为金纳米粒子、银纳米粒子、或铜纳米粒子；
所述界面修饰打印液中，所述金属纳米粒子为有机胺修饰的金属纳米粒子；
所述电子传输材料为氧化锌、或氧化钛。
所述表面张力调节剂为共溶剂、表面活性剂、咪唑及其衍生物、苯酚、对苯二酚中的一种或几种的组合；
所述粘度调节剂为醇、醚、酯、酚、胺中的一种或几种的组合。
所述OLED器件中，所述阳极与发光层之间设有空穴注入层、及空穴传输层中的至少一种；
所述阳极的材料包括金、及银中的至少一种。
本发明一优选实施例中，所述的OLED显示面板的制作方法，具体包括如下步骤：
步骤S1、提供一衬底基板，在所述衬底基板上形成像素定义层，所述像素定义层上设有间隔设置的数个通孔；在所述数个通孔中分别形成数个阴极；
步骤S2、提供界面修饰打印液，在所述数个阴极上采用喷墨打印的方式涂布所述界面修饰打印液，分别得到数个界面修饰层；
步骤S3、在所述数个界面修饰层上分别形成数个发光层；在所述数个发光层上分别形成数个空穴传输层；在所述数个空穴传输层上分别形成数个阳极；从而在所述像素定义层上的数个通孔内分别形成数个OLED器件。
所述步骤S1中，采用磁控溅射的方法形成所述阴极，所述阴极的材料为透明导电金属氧化物；
所述步骤S2中，所述界面修饰打印液中的电子传输材料为氧化锌，所述金属纳米粒子为金纳米粒子；
所述步骤S3中，采用喷墨打印的方法形成所述发光层；所述发光层的材料包括聚(9,9-二辛基芴-2,7-二基)；
所述步骤S3中，采用真空蒸镀的方法形成所述空穴传输层与阳极；所述空穴传输层的材料为氧化钼；所述阳极的材料为银。
本发明还提供一种OLED显示面板，包括衬底基板、及设于所述衬底基板上的数个OLED器件，所述OLED器件为倒置型OLED器件，包括由下至上依次设置的阴极、发光层、及阳极，所述阴极与发光层之间设有界面修饰层；
所述界面修饰层由界面修饰打印液通过喷墨打印的方法制作形成，所述界面修饰打印液包括电子传输材料、金属纳米粒子、表面张力调节剂、及粘度调节剂，其中，所述金属纳米粒子为表面经过修饰的金属纳米粒子，以抑制金属纳米粒子之间的团聚，并增强金属纳米粒子的溶解度，即所述界面修饰层包含电子传输材料与金属纳米粒子。
所述金属纳米粒子为金纳米粒子、银纳米粒子、或铜纳米粒子；
所述界面修饰打印液中，所述金属纳米粒子为有机胺修饰的金属纳米粒子；
所述电子传输材料为氧化锌、或氧化钛；
所述表面张力调节剂为共溶剂、表面活性剂、咪唑及其衍生物、苯酚、对苯二酚中的一种或几种的组合；
所述粘度调节剂为醇、醚、酯、酚、胺中的一种或几种的组合；
所述阳极的材料包括金、及银中的至少一种。
所述的OLED显示面板，还包括设于所述衬底基板上的像素定义层，所述像素定义层上设有间隔设置的数个通孔，所述数个OLED器件分别设于所述数个通孔内。
所述OLED器件具体包括由下至上依次设置的阴极、界面修饰层、发 光层、空穴传输层、及阳极。
所述阴极的材料为透明导电金属氧化物；所述界面修饰层中，电子传输材料为氧化锌，金属纳米粒子为金纳米粒子；所述发光层的材料包括聚(9,9-二辛基芴-2,7-二基)；所述空穴传输层的材料为氧化钼；所述阳极的材料为银。
本发明还提供一种OLED显示面板的制作方法，所述OLED显示面板包括衬底基板、及设于所述衬底基板上的数个OLED器件，所述OLED器件为倒置型OLED器件，包括由下至上依次设置的阴极、发光层、及阳极，所述阴极与发光层之间设有界面修饰层；
所述界面修饰层的制作方法为：
提供界面修饰打印液，所述界面修饰打印液包括电子传输材料、金属纳米粒子、表面张力调节剂、及粘度调节剂，其中，所述金属纳米粒子为表面经过修饰的金属纳米粒子，以抑制金属纳米粒子之间的团聚，并增强金属纳米粒子的溶解度，采用喷墨打印的方式将所述界面修饰打印液涂布在阴极上，形成包含电子传输材料与金属纳米粒子的界面修饰层；
其中，所述金属纳米粒子为金纳米粒子、银纳米粒子、或铜纳米粒子；
所述界面修饰打印液中，所述金属纳米粒子为有机胺修饰的金属纳米粒子；
所述电子传输材料为氧化锌、或氧化钛；
其中，所述表面张力调节剂为共溶剂、表面活性剂、咪唑及其衍生物、苯酚、对苯二酚中的一种或几种的组合；
所述粘度调节剂为醇、醚、酯、酚、胺中的一种或几种的组合；
其中，所述OLED器件中，所述阳极与发光层之间设有空穴注入层、及空穴传输层中的至少一种；
所述阳极的材料包括金、及银中的至少一种；
其中，具体包括如下步骤：
步骤S1、提供一衬底基板，在所述衬底基板上形成像素定义层，所述像素定义层上设有间隔设置的数个通孔；在所述数个通孔中分别形成数个阴极；
步骤S2、提供界面修饰打印液，在所述数个阴极上采用喷墨打印的方式涂布所述界面修饰打印液，分别得到数个界面修饰层；
步骤S3、在所述数个界面修饰层上分别形成数个发光层；在所述数个发光层上分别形成数个空穴传输层；在所述数个空穴传输层上分别形成数个阳极；从而在所述像素定义层上的数个通孔内分别形成数个OLED器件。
本发明的有益效果：本发明提供的一种OLED显示面板的制作方法，采用倒置型结构的OLED器件，并采用喷墨打印技术由界面修饰打印液在OLED器件的阴极与发光层之间制作界面修饰层，所述界面修饰打印液包括电子传输材料、金属纳米粒子、表面张力调节剂、及粘度调节剂，其中，所述金属纳米粒子为表面经过修饰的金属纳米粒子，可以抑制金属纳米粒子之间的团聚，并增强金属纳米粒子的溶解度，即该界面修饰层为包含电子传输材料与金属纳米粒子的材料层，其电子传输材料可以增强载流子从阴极的注入和传输，金属纳米粒子通过其表面等离子共振所产生的强大的局部电场，可以增强电子的注入效率，通过将该界面修饰层引入到OLED器件的阴极与发光层之间，可以有效提升OLED器件的综合性能，制作方法简单。本发明的OLED显示面板，OLED器件为倒置型OLED器件，且阴极与发光层之间还设有界面修饰层，所述界面修饰层由界面修饰打印液通过喷墨打印的方法制作形成，所述界面修饰打印液包括电子传输材料、表面修饰的金属纳米粒子、表面张力调节剂、及粘度调节剂，通过将界面修饰层应用到OLED器件当中，可以有效提升OLED器件的综合性能，且制作方法简单。
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其它有益效果显而易见。
附图中，
图1为本发明的OLED显示面板的制作方法的优选实施例的流程图；
图2为本发明的OLED显示面板的制作方法的优选实施例的步骤S1的示意图；
图3为本发明的OLED显示面板的制作方法的优选实施例的步骤S2的示意图；
图4为本发明的OLED显示面板的制作方法的优选实施例的步骤S3的示意图暨本发明的OLED显示面板的优选实施例的结构示意图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明 的优选实施例及其附图进行详细描述。
本发明首先提供一种OLED显示面板的制作方法，所述OLED显示面板包括衬底基板10、及设于所述衬底基板10上的数个OLED器件30，所述OLED器件30为倒置型OLED器件，包括由下至上依次设置的阴极31、发光层32、及阳极33，所述阴极31与发光层32之间设有界面修饰层34；
所述界面修饰层34的制作方法为：
提供界面修饰打印液，所述界面修饰打印液包括电子传输材料、金属纳米粒子、表面张力调节剂、及粘度调节剂，其中，所述金属纳米粒子为表面经过修饰的金属纳米粒子，以抑制金属纳米粒子之间的团聚，并增强金属纳米粒子的溶解度，然后采用喷墨打印的方式将所述界面修饰打印液涂布在阴极31上，从而形成包含电子传输材料与金属纳米粒子的界面修饰层34。
具体地，界面修饰层34中的电子传输材料，主要用来增强载流子从阴极31的注入和传输，其可以采用氧化锌(ZnO)、或氧化钛(TiOx)。
具体地，本发明将包含金属纳米粒子的界面修饰层34设置在阴极31与发光层32之间，主要在于利用金属纳米粒子表面等离子共振所产生的强大的局部电场，可以增强电子的注入效率，从而改善OLED器件30的性能，所述金属纳米粒优选为金、银、铜等高导电性惰性金属的纳米粒子。
具体地，所述界面修饰打印液中，所述金属纳米粒子的表面具有有机胺配体，即所述金属纳米粒子为有机胺修饰的金属纳米粒子，一方面长链的有机胺配体可以有效地抑制金属纳米粒子之间的团聚，从而减少金属纳米粒子上的载流子陷阱，同时减弱激子在金属纳米粒子上的解离；另一方面，有机胺配体的引入，能够增强金属纳米粒子在常见有机溶剂中的溶解度，使得制备的金属纳米粒子能够更好的应用于溶液加工制程当中。优选地，所述有机胺为长链烷基胺，其碳链长度大于等于16。
具体地，所述表面张力调节剂为共溶剂、表面活性剂、咪唑及其衍生物、苯酚、对苯二酚中的一种或几种的组合；
所述粘度调节剂为醇、醚、酯、酚、胺中的一种或几种的组合，例如，所述粘度调节剂为多羟基醇、或二醇醚。
具体地，所述OLED器件30中，所述阳极33与发光层32之间设有空穴注入层、及空穴传输层中的至少一种。
现有OLED器件一般采用低功函数的金属，如镁(Mg)、钙(Ca)、锂(Li)、铯(Cs)作为电极，然而这些金属的化学活泼性较高，容易使得器件性能退化，同时也增加了OLED器件量产时的工艺控制难度。而本发明 采用倒置型结构的OLED器件30，并同时选择高功函数的金属，如金(Au)、银(Ag)等作为阳极33，则可有效提高OLED器件30电极的稳定性，从而有利于进一步提高器件的稳定性和寿命。
具体地，所述阳极33的材料为高功函数的金属，包括金、及银中的至少一种。
具体地，如图1所示，为本发明的OLED显示面板的制作方法的优选实施例，包括如下步骤：
步骤S1、如图2所示，提供一衬底基板10，在所述衬底基板10上形成像素定义层20，所述像素定义层20上设有间隔设置的数个通孔21；在所述数个通孔21中分别形成数个阴极31。
具体地，所述衬底基板10为带有TFT阵列的基板，且TFT阵列中的TFT为n型TFT。
所述步骤S1中，采用磁控溅射的方法形成所述阴极31，所述阴极31的材料为透明导电金属氧化物，优选为氧化铟锡(Indium Tin Oxide，ITO)。
具体地，所述阴极31的厚度为20nm-200nm。
步骤S2、如图3所示，提供界面修饰打印液，在所述数个阴极31上采用喷墨打印的方式涂布所述界面修饰打印液，分别得到数个界面修饰层34。
具体地，所述界面修饰层34的厚度为1nm-200nm。
具体地，所述步骤S2中界面修饰层34中的电子传输材料为氧化锌，金属纳米粒子为金纳米粒子。所述界面修饰打印液的具体制备过程为：
1、有机胺修饰的金纳米粒子及其溶液的制备：
1.1、将氯化金(AuCl3)溶解在烷基胺的溶剂中。
1.2、对体系先抽真空然后通氮气，反复操作三次，除掉体系中的水和氧气。
1.3、升温至体系回流，加热搅拌至反应完全，冷却至室温，即得到有机胺修饰的金纳米粒子及其溶液。
2、制备ZnO纳米粒子溶液，将ZnO纳米粒子溶液与上述制得的金纳米粒子溶液混合，在该混合液中加入表面张力调节剂、及粘度调节剂，调节其物理性质使其适用于喷墨打印，得到界面修饰打印液。
步骤S3、如图4所示，在所述数个界面修饰层34上分别形成数个发光层32；在所述数个发光层32上分别形成数个空穴传输层35；在所述数个空穴传输层35上分别形成数个阳极33；从而在所述像素定义层20上的数个通孔21内分别形成数个OLED器件30。
具体地，所述步骤S3中，采用喷墨打印的方法形成所述发光层32；所 述发光层32的材料包括聚(9,9-二辛基芴-2,7-二基)(Poly(9,9-d i-noctylfluorenyl-2,7-diyl)，PFO)；所述聚(9,9-二辛基芴-2,7-二基)为蓝色发光材料。
具体地，所述发光层32的厚度为1nm-100nm。
具体地，所述步骤S3中，采用真空蒸镀的方法形成所述空穴传输层35与阳极33；所述空穴传输层35的材料为氧化钼(MoO3)；所述阳极33的材料为银。
具体地，所述空穴传输层35的厚度为0.5nm-50nm，所述阳极33的厚度为10nm-2000nm。
本发明的OLED显示面板的制作方法，OLED器件采用倒置型结构，并采用喷墨打印技术由界面修饰打印液在阴极31与发光层32之间制作界面修饰层34，所述界面修饰打印液包括电子传输材料、金属纳米粒子、表面张力调节剂、及粘度调节剂，其中，所述金属纳米粒子为表面经过修饰的金属纳米粒子，可以抑制金属纳米粒子之间的团聚，并增强金属纳米粒子的溶解度，即该界面修饰层34为包含电子传输材料与金属纳米粒子的材料层，其电子传输材料可以增强载流子从阴极31的注入和传输，金属纳米粒子通过其表面等离子共振所产生的强大的局部电场，可以增强电子的注入效率，通过将界面修饰层34引入到OLED器件30的阴极31与发光层32之间，可以有效提升OLED器件的综合性能，制作方法简单。
基于上述的OLED显示面板的制作方法，本发明还提供一种OLED显示面板，采用如上所述的OLED显示面板的制作方法制得，包括衬底基板10及设于所述衬底基板10上的数个OLED器件30，所述OLED器件30为倒置型OLED器件，包括由下至上依次设置的阴极31、发光层32、及阳极33，所述阴极31与发光层32之间设有界面修饰层34；
所述界面修饰层34由界面修饰打印液通过喷墨打印的方法制作形成，所述界面修饰打印液包括电子传输材料、表面修饰的金属纳米粒子、表面张力调节剂、及粘度调节剂。
具体地，界面修饰层34中的电子传输材料为氧化锌、或氧化钛。
具体地，所述金属纳米粒子中的金属为金、银、或铜，即所述金属纳米粒子为金纳米粒子、银纳米粒子、或铜纳米粒子。
具体地，所述界面修饰打印液中，所述金属纳米粒子的表面具有有机胺配体，即所述金属纳米粒子为有机胺修饰的金属纳米粒子，以抑制金属纳米粒子之间的团聚，并增强金属纳米粒子的溶解度；优选地，所述有机胺为长链烷基胺，其碳链长度大于等于16。
具体地，所述表面张力调节剂为共溶剂、表面活性剂、咪唑及其衍生物、苯酚、对苯二酚中的一种或几种的组合；
所述粘度调节剂为醇、醚、酯、酚、胺中的一种或几种的组合，例如，所述粘度调节剂为多羟基醇、或二醇醚。
具体地，所述OLED器件30中，所述阳极33与发光层32之间设有空穴注入层、及空穴传输层中的至少一种。
具体地，所述阳极33的材料为高功函数的金属，包括金、及银中的至少一种，可有效提高OLED器件30电极的稳定性，从而有利于进一步提高器件的稳定性和寿命。
具体地，如图4所示，为本发明的OLED显示面板的优选实施例，包括衬底基板10、设于所述衬底基板10上的数个OLED器件30、及设于所述衬底基板10上的像素定义层20，所述像素定义层20上设有间隔设置的数个通孔21，所述数个OLED器件30分别设于所述数个通孔21内；所述OLED器件30具体包括由下至上依次设置的阴极31、界面修饰层34、发光层32、空穴传输层35、及阳极33。
具体地，所述阴极31的材料为透明导电金属氧化物；所述界面修饰层34中，电子传输材料为氧化锌，金属纳米粒子为金纳米粒子；所述发光层32的材料包括聚(9,9-二辛基芴-2,7-二基)；所述空穴传输层35的材料为氧化钼；所述阳极33的材料为银。
本发明的OLED显示面板，OLED器件30采用倒置型结构，OLED器件30的阴极31与发光层32之间设有界面修饰层34，所述界面修饰层34由界面修饰打印液通过喷墨打印的方法制作形成，所述界面修饰打印液包括电子传输材料、表面修饰的金属纳米粒子、表面张力调节剂、及粘度调节剂，通过将界面修饰层34应用到OLED器件30当中，可以有效提升OLED器件30的综合性能，且制作方法简单。
综上所述，本发明的OLED显示面板的制作方法，OLED器件采用倒置型结构，并采用喷墨打印技术由界面修饰打印液在阴极与发光层之间制作界面修饰层，所述界面修饰打印液包括电子传输材料、金属纳米粒子、表面张力调节剂、及粘度调节剂，其中，所述金属纳米粒子为表面经过修饰的金属纳米粒子，可以抑制金属纳米粒子之间的团聚，并增强金属纳米粒子的溶解度，即该界面修饰层为包含电子传输材料与金属纳米粒子的材料层，其电子传输材料可以增强载流子从阴极的注入和传输，金属纳米粒子通过其表面等离子共振所产生的强大的局部电场，可以增强电子的注入效率，通过将该界面修饰层引入到OLED器件的阴极与发光层之间，可以 有效提升OLED器件的综合性能，制作方法简单。本发明的OLED显示面板，OLED器件为倒置型OLED器件，且阴极与发光层之间还设有界面修饰层，所述界面修饰层由界面修饰打印液通过喷墨打印的方法制作形成，所述界面修饰打印液包括电子传输材料、表面修饰的金属纳米粒子、表面张力调节剂、及粘度调节剂，通过将界面修饰层应用到OLED器件当中，可以有效提升OLED器件的综合性能，且制作方法简单。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (12)

  1. 一种OLED显示面板的制作方法，所述OLED显示面板包括衬底基板、及设于所述衬底基板上的数个OLED器件，所述OLED器件为倒置型OLED器件，包括由下至上依次设置的阴极、发光层、及阳极，所述阴极与发光层之间设有界面修饰层；
    所述界面修饰层的制作方法为：
    提供界面修饰打印液，所述界面修饰打印液包括电子传输材料、金属纳米粒子、表面张力调节剂、及粘度调节剂，其中，所述金属纳米粒子为表面经过修饰的金属纳米粒子，以抑制金属纳米粒子之间的团聚，并增强金属纳米粒子的溶解度，采用喷墨打印的方式将所述界面修饰打印液涂布在阴极上，形成包含电子传输材料与金属纳米粒子的界面修饰层。
  2. 如权利要求1所述的OLED显示面板的制作方法，其中，所述金属纳米粒子为金纳米粒子、银纳米粒子、或铜纳米粒子；
    所述界面修饰打印液中，所述金属纳米粒子为有机胺修饰的金属纳米粒子；
    所述电子传输材料为氧化锌、或氧化钛。
  3. 如权利要求1所述的OLED显示面板的制作方法，其中，所述表面张力调节剂为共溶剂、表面活性剂、咪唑及其衍生物、苯酚、对苯二酚中的一种或几种的组合；
    所述粘度调节剂为醇、醚、酯、酚、胺中的一种或几种的组合。
  4. 如权利要求1所述的OLED显示面板的制作方法，其中，所述OLED器件中，所述阳极与发光层之间设有空穴注入层、及空穴传输层中的至少一种；
    所述阳极的材料包括金、及银中的至少一种。
  5. 如权利要求1所述的OLED显示面板的制作方法，其中，具体包括如下步骤：
    步骤S1、提供一衬底基板，在所述衬底基板上形成像素定义层，所述像素定义层上设有间隔设置的数个通孔；在所述数个通孔中分别形成数个阴极；
    步骤S2、提供界面修饰打印液，在所述数个阴极上采用喷墨打印的方式涂布所述界面修饰打印液，分别得到数个界面修饰层；
    步骤S3、在所述数个界面修饰层上分别形成数个发光层；在所述数个 发光层上分别形成数个空穴传输层；在所述数个空穴传输层上分别形成数个阳极；从而在所述像素定义层上的数个通孔内分别形成数个OLED器件。
  6. 如权利要求5所述的OLED显示面板的制作方法，其中，所述步骤S1中，采用磁控溅射的方法形成所述阴极，所述阴极的材料为透明导电金属氧化物；
    所述步骤S2中，所述界面修饰打印液中的电子传输材料为氧化锌，所述金属纳米粒子为金纳米粒子；
    所述步骤S3中，采用喷墨打印的方法形成所述发光层；所述发光层的材料包括聚(9,9-二辛基芴-2,7-二基)；
    所述步骤S3中，采用真空蒸镀的方法形成所述空穴传输层与阳极；所述空穴传输层的材料为氧化钼；所述阳极的材料为银。
  7. 一种OLED显示面板，包括衬底基板、及设于所述衬底基板上的数个OLED器件，所述OLED器件为倒置型OLED器件，包括由下至上依次设置的阴极、发光层、及阳极，所述阴极与发光层之间设有界面修饰层；
    所述界面修饰层由界面修饰打印液通过喷墨打印的方法制作形成，所述界面修饰打印液包括电子传输材料、金属纳米粒子、表面张力调节剂、及粘度调节剂，其中，所述金属纳米粒子为表面经过修饰的金属纳米粒子，以抑制金属纳米粒子之间的团聚，并增强金属纳米粒子的溶解度，即所述界面修饰层包含电子传输材料与金属纳米粒子。
  8. 如权利要求7所述的OLED显示面板，其中，所述金属纳米粒子为金纳米粒子、银纳米粒子、或铜纳米粒子；
    所述界面修饰打印液中，所述金属纳米粒子为有机胺修饰的金属纳米粒子；
    所述电子传输材料为氧化锌、或氧化钛；
    所述表面张力调节剂为共溶剂、表面活性剂、咪唑及其衍生物、苯酚、对苯二酚中的一种或几种的组合；
    所述粘度调节剂为醇、醚、酯、酚、胺中的一种或几种的组合；
    所述阳极的材料包括金、及银中的至少一种。
  9. 如权利要求7所述的OLED显示面板，还包括设于所述衬底基板上的像素定义层，所述像素定义层上设有间隔设置的数个通孔，所述数个OLED器件分别设于所述数个通孔内；
    所述OLED器件具体包括由下至上依次设置的阴极、界面修饰层、发光层、空穴传输层、及阳极。
  10. 如权利要求9所述的OLED显示面板，其中，所述阴极的材料为 透明导电金属氧化物；所述界面修饰层中，电子传输材料为氧化锌，金属纳米粒子为金纳米粒子；所述发光层的材料包括聚(9,9-二辛基芴-2,7-二基)；所述空穴传输层的材料为氧化钼；所述阳极的材料为银。
  11. 一种OLED显示面板的制作方法，所述OLED显示面板包括衬底基板、及设于所述衬底基板上的数个OLED器件，所述OLED器件为倒置型OLED器件，包括由下至上依次设置的阴极、发光层、及阳极，所述阴极与发光层之间设有界面修饰层；
    所述界面修饰层的制作方法为：
    提供界面修饰打印液，所述界面修饰打印液包括电子传输材料、金属纳米粒子、表面张力调节剂、及粘度调节剂，其中，所述金属纳米粒子为表面经过修饰的金属纳米粒子，以抑制金属纳米粒子之间的团聚，并增强金属纳米粒子的溶解度，采用喷墨打印的方式将所述界面修饰打印液涂布在阴极上，形成包含电子传输材料与金属纳米粒子的界面修饰层；
    其中，所述金属纳米粒子为金纳米粒子、银纳米粒子、或铜纳米粒子；
    所述界面修饰打印液中，所述金属纳米粒子为有机胺修饰的金属纳米粒子；
    所述电子传输材料为氧化锌、或氧化钛；
    其中，所述表面张力调节剂为共溶剂、表面活性剂、咪唑及其衍生物、苯酚、对苯二酚中的一种或几种的组合；
    所述粘度调节剂为醇、醚、酯、酚、胺中的一种或几种的组合；
    其中，所述OLED器件中，所述阳极与发光层之间设有空穴注入层、及空穴传输层中的至少一种；
    所述阳极的材料包括金、及银中的至少一种；
    其中，具体包括如下步骤：
    步骤S1、提供一衬底基板，在所述衬底基板上形成像素定义层，所述像素定义层上设有间隔设置的数个通孔；在所述数个通孔中分别形成数个阴极；
    步骤S2、提供界面修饰打印液，在所述数个阴极上采用喷墨打印的方式涂布所述界面修饰打印液，分别得到数个界面修饰层；
    步骤S3、在所述数个界面修饰层上分别形成数个发光层；在所述数个发光层上分别形成数个空穴传输层；在所述数个空穴传输层上分别形成数个阳极；从而在所述像素定义层上的数个通孔内分别形成数个OLED器件。
  12. 如权利要求11所述的OLED显示面板的制作方法，其中，所述步骤S1中，采用磁控溅射的方法形成所述阴极，所述阴极的材料为透明导电 金属氧化物；
    所述步骤S2中，所述界面修饰打印液中的电子传输材料为氧化锌，所述金属纳米粒子为金纳米粒子；
    所述步骤S3中，采用喷墨打印的方法形成所述发光层；所述发光层的材料包括聚(9,9-二辛基芴-2,7-二基)；
    所述步骤S3中，采用真空蒸镀的方法形成所述空穴传输层与阳极；所述空穴传输层的材料为氧化钼；所述阳极的材料为银。
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