WO2017154505A8 - 多元素同時型蛍光ｘ線分析装置および多元素同時蛍光ｘ線分析方法 - Google Patents

多元素同時型蛍光ｘ線分析装置および多元素同時蛍光ｘ線分析方法 Download PDF

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WO2017154505A8
WO2017154505A8 PCT/JP2017/005678 JP2017005678W WO2017154505A8 WO 2017154505 A8 WO2017154505 A8 WO 2017154505A8 JP 2017005678 W JP2017005678 W JP 2017005678W WO 2017154505 A8 WO2017154505 A8 WO 2017154505A8
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Prior art keywords
ray fluorescence
measurement point
elements
simultaneous multi
sample
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PCT/JP2017/005678
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English (en)
French (fr)
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WO2017154505A1 (ja
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聖史 藤村
青木　悠
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株式会社リガク
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Priority to KR1020187023570A priority Critical patent/KR101968458B1/ko
Priority to US16/076,112 priority patent/US10883945B2/en
Priority to CN201780016018.2A priority patent/CN108713138B/zh
Priority to EP17762848.4A priority patent/EP3428630B1/en
Publication of WO2017154505A1 publication Critical patent/WO2017154505A1/ja
Publication of WO2017154505A8 publication Critical patent/WO2017154505A8/ja

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/33—Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts
    • G01N2223/3307—Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts source and detector fixed; object moves
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/611—Specific applications or type of materials patterned objects; electronic devices
    • G01N2223/6116—Specific applications or type of materials patterned objects; electronic devices semiconductor wafer

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

本発明の多元素同時型蛍光Ｘ線分析装置は、試料（１）が載置される試料台（２）と、試料（１）の搬送アーム（２２）と、試料台（２）を移動させるステージ（１１）と、１次Ｘ線（７）を照射するＸ線源（８）とを備え、試料台（２）に、搬送アーム（２２）が鉛直方向に通過するための切り欠き部（２ｅ）が形成されており、バックグラウンド補正手段（２１）が、ブランクウエハ（１ｂ）における各測定点（Ｐｎ）について、測定点（Ｐｎ）の測定強度から切り欠き部（２ｅ）上にある基準測定点（Ｐ０）の測定強度を差し引いた強度を、測定点（Ｐｎ）のバックグラウンド強度としてあらかじめ記憶し、分析対象試料（１ａ）における各測定点（Ｐｎ）について、測定点（Ｐｎ）の測定強度から測定点（Ｐｎ）のバックグラウンド強度を差し引いて補正する。
PCT/JP2017/005678 2016-03-08 2017-02-16 多元素同時型蛍光ｘ線分析装置および多元素同時蛍光ｘ線分析方法 WO2017154505A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020187023570A KR101968458B1 (ko) 2016-03-08 2017-02-16 다원소 동시형 형광 x선 분석 장치 및 다원소 동시 형광 x선 분석 방법
US16/076,112 US10883945B2 (en) 2016-03-08 2017-02-16 Simultaneous multi-elements analysis type X-ray fluorescence spectrometer, and simultaneous multi-elements X-ray fluorescence analyzing method
CN201780016018.2A CN108713138B (zh) 2016-03-08 2017-02-16 多元素同时型荧光x射线分析装置和多元素同时荧光x射线分析方法
EP17762848.4A EP3428630B1 (en) 2016-03-08 2017-02-16 Simultaneous multi-element analysis x-ray fluorescence spectrometer, and simultaneous multi-element x-ray fluorescence analyzing method

Applications Claiming Priority (2)

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JP2016-044179 2016-03-08
JP2016044179A JP6501230B2 (ja) 2016-03-08 2016-03-08 多元素同時型蛍光ｘ線分析装置および多元素同時蛍光ｘ線分析方法

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WO2017154505A1 WO2017154505A1 (ja) 2017-09-14
WO2017154505A8 true WO2017154505A8 (ja) 2018-06-28

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US (1) US10883945B2 (ja)
EP (1) EP3428630B1 (ja)
JP (1) JP6501230B2 (ja)
KR (1) KR101968458B1 (ja)
CN (1) CN108713138B (ja)
WO (1) WO2017154505A1 (ja)

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JP6810001B2 (ja) 2017-08-24 2021-01-06 株式会社Ｓｏｋｅｎ 高周波伝送線路
US10845491B2 (en) 2018-06-04 2020-11-24 Sigray, Inc. Energy-resolving x-ray detection system
GB2591630B (en) 2018-07-26 2023-05-24 Sigray Inc High brightness x-ray reflection source
CN112823280A (zh) 2018-09-07 2021-05-18 斯格瑞公司 用于深度可选x射线分析的系统和方法
CN110146026A (zh) * 2019-05-15 2019-08-20 深圳市兆驰节能照明股份有限公司 荧光膜片夹持装置及荧光膜片测试系统
WO2021046059A1 (en) 2019-09-03 2021-03-11 Sigray, Inc. System and method for computed laminography x-ray fluorescence imaging
US11175243B1 (en) 2020-02-06 2021-11-16 Sigray, Inc. X-ray dark-field in-line inspection for semiconductor samples
JP7395775B2 (ja) 2020-05-18 2023-12-11 シグレイ、インコーポレイテッド 結晶解析装置及び複数の検出器素子を使用するｘ線吸収分光法のためのシステム及び方法
CN111551579B (zh) * 2020-06-03 2021-02-12 中国地质大学（武汉） 一种利用空白校正确定x射线背景强度的方法
JP2023542674A (ja) 2020-09-17 2023-10-11 シグレイ、インコーポレイテッド Ｘ線を用いた深さ分解計測および分析のためのシステムおよび方法
WO2022126071A1 (en) 2020-12-07 2022-06-16 Sigray, Inc. High throughput 3d x-ray imaging system using a transmission x-ray source
US11885755B2 (en) 2022-05-02 2024-01-30 Sigray, Inc. X-ray sequential array wavelength dispersive spectrometer
JP7458658B2 (ja) 2022-06-13 2024-04-01 株式会社リガク 蛍光ｘ線分析装置

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Also Published As

Publication number Publication date
EP3428630A1 (en) 2019-01-16
CN108713138B (zh) 2019-09-06
WO2017154505A1 (ja) 2017-09-14
JP2017161276A (ja) 2017-09-14
JP6501230B2 (ja) 2019-04-17
CN108713138A (zh) 2018-10-26
EP3428630B1 (en) 2021-03-31
KR20180104016A (ko) 2018-09-19
US20200378908A1 (en) 2020-12-03
US10883945B2 (en) 2021-01-05
KR101968458B1 (ko) 2019-04-11
EP3428630A4 (en) 2019-12-04

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