EP3428630A4 - Multi-element simultaneous x-ray fluorescence analysis device and multi-element simultaneous x-ray fluorescence analysis method - Google Patents

Multi-element simultaneous x-ray fluorescence analysis device and multi-element simultaneous x-ray fluorescence analysis method Download PDF

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Publication number
EP3428630A4
EP3428630A4 EP17762848.4A EP17762848A EP3428630A4 EP 3428630 A4 EP3428630 A4 EP 3428630A4 EP 17762848 A EP17762848 A EP 17762848A EP 3428630 A4 EP3428630 A4 EP 3428630A4
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EP
European Patent Office
Prior art keywords
ray fluorescence
fluorescence analysis
element simultaneous
analysis method
analysis device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
EP17762848.4A
Other languages
German (de)
French (fr)
Other versions
EP3428630A1 (en
EP3428630B1 (en
Inventor
Seiji FUJIMURA
Yu Aoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rigaku Denki Co Ltd
Rigaku Corp
Original Assignee
Rigaku Denki Co Ltd
Rigaku Corp
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Publication date
Application filed by Rigaku Denki Co Ltd, Rigaku Corp filed Critical Rigaku Denki Co Ltd
Publication of EP3428630A1 publication Critical patent/EP3428630A1/en
Publication of EP3428630A4 publication Critical patent/EP3428630A4/en
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/33—Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts
    • G01N2223/3307—Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts source and detector fixed; object moves
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/611—Specific applications or type of materials patterned objects; electronic devices
    • G01N2223/6116—Specific applications or type of materials patterned objects; electronic devices semiconductor wafer

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
EP17762848.4A 2016-03-08 2017-02-16 Simultaneous multi-element analysis x-ray fluorescence spectrometer, and simultaneous multi-element x-ray fluorescence analyzing method Active EP3428630B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016044179A JP6501230B2 (en) 2016-03-08 2016-03-08 Multi-element simultaneous fluorescent X-ray analyzer and multi-element simultaneous fluorescent X-ray analysis method
PCT/JP2017/005678 WO2017154505A1 (en) 2016-03-08 2017-02-16 Multi-element simultaneous x-ray fluorescence analysis device and multi-element simultaneous x-ray fluorescence analysis method

Publications (3)

Publication Number Publication Date
EP3428630A1 EP3428630A1 (en) 2019-01-16
EP3428630A4 true EP3428630A4 (en) 2019-12-04
EP3428630B1 EP3428630B1 (en) 2021-03-31

Family

ID=59790521

Family Applications (1)

Application Number Title Priority Date Filing Date
EP17762848.4A Active EP3428630B1 (en) 2016-03-08 2017-02-16 Simultaneous multi-element analysis x-ray fluorescence spectrometer, and simultaneous multi-element x-ray fluorescence analyzing method

Country Status (6)

Country Link
US (1) US10883945B2 (en)
EP (1) EP3428630B1 (en)
JP (1) JP6501230B2 (en)
KR (1) KR101968458B1 (en)
CN (1) CN108713138B (en)
WO (1) WO2017154505A1 (en)

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JP6810001B2 (en) 2017-08-24 2021-01-06 株式会社Ｓｏｋｅｎ High frequency transmission line
US10845491B2 (en) 2018-06-04 2020-11-24 Sigray, Inc. Energy-resolving x-ray detection system
JP7117452B2 (en) 2018-07-26 2022-08-12 シグレイ、インコーポレイテッド High brightness reflection type X-ray source
CN112823280A (en) 2018-09-07 2021-05-18 斯格瑞公司 System and method for depth-selectable X-ray analysis
CN110146026B (en) * 2019-05-15 2024-07-05 江西兆驰光元科技股份有限公司 Fluorescent membrane clamping device and fluorescent membrane testing system
CN114729907B (en) 2019-09-03 2023-05-23 斯格瑞公司 System and method for computed tomography
US11175243B1 (en) 2020-02-06 2021-11-16 Sigray, Inc. X-ray dark-field in-line inspection for semiconductor samples
WO2021237237A1 (en) 2020-05-18 2021-11-25 Sigray, Inc. System and method for x-ray absorption spectroscopy using a crystal analyzer and a plurality of detector elements
CN111551579B (en) * 2020-06-03 2021-02-12 中国地质大学（武汉） Method for determining X-ray background intensity by blank correction
WO2022061347A1 (en) 2020-09-17 2022-03-24 Sigray, Inc. System and method using x-rays for depth-resolving metrology and analysis
JP2024501623A (en) 2020-12-07 2024-01-15 シグレイ、インコーポレイテッド High-throughput 3D X-ray imaging system using transmission X-ray source
WO2023177981A1 (en) 2022-03-15 2023-09-21 Sigray, Inc. System and method for compact laminography utilizing microfocus transmission x-ray source and variable magnification x-ray detector
CN114894828A (en) * 2022-03-23 2022-08-12 广西南南铝加工有限公司 Method for rapidly detecting contents of titanium and zirconium in aluminum alloy passivation film
WO2023215204A1 (en) 2022-05-02 2023-11-09 Sigray, Inc. X-ray sequential array wavelength dispersive spectrometer
JP7458658B2 (en) * 2022-06-13 2024-04-01 株式会社リガク X-ray fluorescence analyzer

Citations (1)

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JP2000074859A (en) * 1998-06-19 2000-03-14 Rigaku Industrial Co Sample stage and fluorescent x-ray analyzing device using it

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JPH06174663A (en) 1992-12-01 1994-06-24 Toshiba Corp Analyzing method of contaminant element
GB9519771D0 (en) * 1995-09-28 1995-11-29 Oxford Analytical Instr Ltd X-ray fluorescence inspection apparatus and method
JP3127875B2 (en) * 1998-02-27 2001-01-29 日本電気株式会社 Total reflection X-ray fluorescence analysis method and apparatus
JP3410366B2 (en) * 1998-06-19 2003-05-26 理学電機工業株式会社 X-ray fluorescence sample holder
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Non-Patent Citations (3)

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ALAN P. QUINN: "A General Method of Blank Subtraction for Quantitative X-Ray Fluorescence Intensity Measurements", ADVANCES IN X-RAY ANALYSIS, vol. 24, 1 January 1980 (1980-01-01), US, pages 401 - 406, XP055634110, ISSN: 0376-0308, DOI: 10.1154/S0376030800007643 *
ANDREA MCWILLIAMS: "Standard Operating Procedure for the X-Ray Fluorescence Analysis of PM2.5 Deposits on Teflon Filters", 20 January 2004 (2004-01-20), XP055634185, Retrieved from the Internet <URL:https://www3.epa.gov/ttnamti1/archive/files/ambient/pm25/spec/xrfsop.pdf> [retrieved on 20191021] *
See also references of WO2017154505A1 *

Also Published As

Publication number Publication date
EP3428630A1 (en) 2019-01-16
JP6501230B2 (en) 2019-04-17
CN108713138B (en) 2019-09-06
JP2017161276A (en) 2017-09-14
US10883945B2 (en) 2021-01-05
KR101968458B1 (en) 2019-04-11
WO2017154505A1 (en) 2017-09-14
US20200378908A1 (en) 2020-12-03
KR20180104016A (en) 2018-09-19
WO2017154505A8 (en) 2018-06-28
CN108713138A (en) 2018-10-26
EP3428630B1 (en) 2021-03-31

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