WO2017096710A1 - 量子点彩膜基板的制作方法 - Google Patents

量子点彩膜基板的制作方法 Download PDF

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Publication number
WO2017096710A1
WO2017096710A1 PCT/CN2016/072877 CN2016072877W WO2017096710A1 WO 2017096710 A1 WO2017096710 A1 WO 2017096710A1 CN 2016072877 W CN2016072877 W CN 2016072877W WO 2017096710 A1 WO2017096710 A1 WO 2017096710A1
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quantum dot
red
pigments
green
ink
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English (en)
French (fr)
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张霞
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US15/023,691 priority Critical patent/US10120232B2/en
Publication of WO2017096710A1 publication Critical patent/WO2017096710A1/zh
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    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
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    • G02F1/133516Methods for their manufacture, e.g. printing, electro-deposition or photolithography
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    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • B29D11/00865Applying coatings; tinting; colouring
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00Printing processes to produce particular kinds of printed work, e.g. patterns
    • B41M3/003Printing processes to produce particular kinds of printed work, e.g. patterns on optical devices, e.g. lens elements; for the production of optical devices
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/182Graphene
    • C01B32/184Preparation
    • C01B32/186Preparation by chemical vapour deposition [CVD]
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    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/182Graphene
    • C01B32/194After-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125Process of deposition of the inorganic material
    • C23C18/1295Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
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    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
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    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
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    • G02F1/133617Illumination with ultraviolet light; Luminescent elements or materials associated to the cell
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/14Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
    • H10F77/143Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies comprising quantum structures
    • H10F77/1433Quantum dots
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/811Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
    • H10H20/812Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H10K50/115OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising active inorganic nanostructures, e.g. luminescent quantum dots
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
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    • B29D11/0074Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B29D11/00788Producing optical films
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
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    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
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    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/015Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
    • G02F1/017Structures with periodic or quasi periodic potential variation, e.g. superlattices, quantum wells
    • G02F1/01791Quantum boxes or quantum dots
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    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
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    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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Definitions

  • the present invention relates to the field of display technologies, and in particular, to a method for fabricating a quantum dot color film substrate.
  • TFT-LCD Thin Film Transistor Liquid Crystal Display
  • the color filter is mainly realized by the filtering of the RGB color layer.
  • the RGB color layer of the conventional TFT-LCD mainly adopts the yellow light process, and is formed by exposure and development, which has the problems of complicated process and long time consumption; and the color resist layer has low utilization rate of the backlight, and due to the limitation of the material itself, The brightness and color saturation of the display are hard to be greatly improved.
  • Quantum Dots refer to semiconductor grains having a particle size of 1-100 nm. Since the particle size of the QDs is small, the quantum Boolean effect is smaller or closer to the exciton Bohr radius of the corresponding bulk material, and the continuous energy band structure of the bulk material is transformed into a discrete energy level structure, which is excited by the external light source. The electrons will transition and emit fluorescence.
  • the special discrete level structure of QDs makes its half-wave width narrower, so it can emit high-purity monochromatic light, which has higher luminous efficiency than traditional displays.
  • the size of the QDs is greatly affected by the size of the QDs or the QDs of different compositions can be used to excite different wavelengths of light.
  • it is an effective choice for major display manufacturers by adding photoluminescent quantum dot devices to the backlight structure.
  • ITO indium tin oxide
  • Graphene is a new type of carbon nanomaterial. It is a single-layer network structure composed of carbon atoms. It has the characteristics of good electronic conductivity, low impedance, high light transmittance, good chemical stability and excellent mechanical properties.
  • the raw material for preparing graphene is widely available and inexpensive, and graphene can withstand simple screen deflection or curved surface design. These excellent characteristics make graphene a mainstream material for replacing ITO.
  • the object of the present invention is to provide a method for fabricating a quantum dot color film substrate, which adjusts quantum dots Formulated into a quantum dot ink and formed by inkjet printing to obtain a color filter layer, wherein at least one of the quantum dot inks is an epoxy glue system ink, before the ink of the epoxy glue system is completely cured, A layer of graphene conductive layer is formed as an electrode, so that the adhesion between the graphene conductive layer and the color filter layer is greatly improved.
  • the present invention provides a method of fabricating a color filter substrate, comprising the steps of:
  • Step 1 Providing a transparent substrate
  • Step 2 forming a patterned organic transparent photoresist layer corresponding to the transparent pixel region on the transparent substrate;
  • Step 3 providing a red quantum dot ink and a green quantum dot ink; at least one of the red quantum dot ink and the green quantum dot ink is an ink of an epoxy resin system, and the ink of the epoxy resin system is formulated as follows :
  • Epoxy resin 40 ⁇ 65wt%
  • Step 4 When the ink of the epoxy resin system is not cured, a conductive layer of graphene is formed on the color filter layer to improve the adhesion between the conductive layer of the graphene and the color filter layer; Fully curing the ink of the epoxy resin system on the transparent substrate in one or two ways of curing, and heat curing;
  • Step 5 forming a black photoresist layer on the graphene conductive layer, the black photoresist layer comprising a black matrix, and a plurality of main spacers and a plurality of auxiliary spacers on the black matrix.
  • the red quantum dot ink and the green quantum dot ink have a viscosity of 1 to 40 cp and a surface tension of 30 to 70 dy/cm.
  • the epoxy resin is a bisphenol A epoxy resin E44, bisphenol A epoxy resin E51, bisphenol A epoxy resin E54, bisphenol A epoxy resin EPON826 or bisphenol A epoxy resin EPON828;
  • the curing agent is hexahydrophthalic anhydride, tetrahydrophthalic anhydride, succinic acid hydrazide, adipic acid hydrazide, dicyandiamide or p-phenylenediamine;
  • the promoter is di-ethyl-tetramethylimidazole, imidazole, dimethylimidazole or triethylamine;
  • the diluent is isopropanol, acetone, n-butanol, glycol ether, ethyl acetate, methyl ethyl ketone, methyl isobutyl ketone, monomethyl ether glycol ester, propylene glycol monomethyl ether, propylene glycol a combination of one or more of ether acetate, propylene glycol monomethyl ether acetate;
  • the pigment is a combination of one or more of red, green, and yellow pigments according to display requirements, and the red, green, and yellow pigments are monoazo yellow and orange pigments, disazo pigments, naphthol, respectively.
  • Series pigments phenolic AS series pigments, azo lake pigments, azo condensation pigments, benzimidazolone pigments, phthalocyanine pigments, thioindigo pigments, quinacridone pigments, quinophthalone pigments, hydrazine a combination of one or more of an anthraquinone pigment, a dioxazine pigment, a triarylmethane pigment, and a pyrrolopyrroledione pigment;
  • the quantum dots corresponding to the red and green quantum dot inks are red and green light quantum dots, and the quantum dot materials include II-VI quantum dot materials and I-III-VI quantum dot materials.
  • the quantum dots have a spherical shape, a core-shell shape, a convex spheroidal shape, or an irregular shape.
  • the red pigment is a combination of one or more of PR264, PR254, PR224, PR190, PR179, PR177, PR123, PR122;
  • the green pigment is one or more of PG58, PG37, PG36, PG7 Combining;
  • the yellow pigment is a combination of one or more of PY180, PY174, PY150, PY139, PY138, PY126, PY109, PY95, PY93, PY83, PY13, PY12, PY1;
  • the material of the quantum dot includes one or more of CdSe, CdS, CdTe, ZnS, ZnSe, CuInS, and ZnCuInS.
  • One of the red quantum dot ink and the green quantum dot ink is an ink of a photosensitive resin system, and the ink of the photosensitive resin system is formulated as follows:
  • the dispersion resin is 1,6-hexanediol diacrylate, dipropylene glycol diacrylic acid Ester, tripropylene glycol diacrylate, trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, pentaerythritol tetraacrylate, trimethylolpropane tetraacrylate, and dipentaerythritol a combination of one or more of pentaacrylates;
  • the monomers are methacrylic acid, acrylic acid, crotonic acid, maleic acid, maleic anhydride, styrene, methoxystyrene, methyl acrylate, methyl methacrylate, glycidyl acrylate, propylene. a combination of one or more of the nitriles;
  • the photoinitiator is benzophenone, 4-phenylbenzophenone, benzoyl, methyl o-benzoylcarboxylate, benzoyl tosylate, ethyl p-dimethylaminobenzoate, Benzoyl methyl ether, benzoyl ether, benzoyl isopropyl ether, benzoyl isobutyl ether, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,2'-di-ortho Chlorophenyl-4,4',5,5'-tetraphenyl-1,2'-diimidazole, 2-ethyl hydrazine, hydrazine, diphenylyl, 4-hydroxybenzyldimethylhydrazine p- Tosylate, triphenylsulfonium hexafluoroantimonate, diphenyliodonium hexafluoroantimonate, 2-
  • the solvent is cyclohexane, xylene, isopropanol, n-butanol, ⁇ -butyrolactone, acetone, methyl ethyl ketone, methyl ethyl ketone, methyl isobutyl ketone, fatty alcohol, ethylene glycol monomethyl ether, Glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propionic acid-3-ethyl ether ethyl ester, monomethyl ether ethylene glycol ester, diethylene glycol diethyl ether ethyl acetate, butyl card a combination of one or more of benzal alcohol, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate;
  • the pigment is a combination of one or more of red, green, and yellow pigments according to display requirements, and the red, green, and yellow pigments are monoazo yellow and orange pigments, disazo pigments, naphthol, respectively.
  • Series pigments phenolic AS series pigments, azo lake pigments, azo condensation pigments, benzimidazolone pigments, phthalocyanine pigments, thioindigo pigments, quinacridone pigments, quinophthalone pigments, hydrazine a combination of one or more of an anthraquinone pigment, a dioxazine pigment, a triarylmethane pigment, and a pyrrolopyrroledione pigment;
  • the quantum dots corresponding to the red and green quantum dot inks are red and green light quantum dots, and the quantum dot materials include II-VI quantum dot materials and I-III-VI quantum dot materials.
  • the structure of the quantum dot is spherical, core-shell-shaped, convex-like spherical or irregular shape.
  • a graphene conductive layer is formed by transfer, inkjet printing, spray coating, slit coating, or spin coating.
  • the red pixel area and the green pixel area are separated by the transparent pixel area, each red pixel area is located between two transparent pixel areas, and each green pixel area is located between two transparent pixel areas.
  • the red and green quantum dot inks are applied by inkjet printing on the corresponding red and green pixel regions on the transparent substrate by using the organic transparent photoresist layer as a retaining wall.
  • the sprayed film thickness of the red quantum dot layer and the green quantum dot layer is set to be 0.01-2 ⁇ m lower than the film thickness of the organic transparent photoresist layer;
  • the black matrix includes a plurality of longitudinal light shielding strips and a plurality of horizontal light shielding strips; the main spacers are disposed above the lateral light shielding strips corresponding to the organic transparent photoresist layer, the auxiliary spacers It is disposed above the lateral light shielding strip corresponding to the red quantum dot layer and the green quantum dot layer.
  • the material of the organic transparent photoresist layer is a transparent photoresist material having UV curing properties, a transparent photoresist material having thermal curing properties, or a transparent photoresist material having both heat curing and photocuring properties;
  • the organic transparent photoresist layer is produced by a yellow light process.
  • An area ratio of an area AT of the transparent pixel area to an area AR of the red pixel area is 0.05 ⁇ AT / AR ⁇ 0.5, and an area ratio of an area AR of the red pixel area to an area AG of the green pixel area The range is 0.3 ⁇ AR / AG ⁇ 1.
  • the invention also provides a method for manufacturing a quantum dot color film substrate, comprising the following steps:
  • Step 1 Providing a transparent substrate
  • Step 2 forming a patterned organic transparent photoresist layer corresponding to the transparent pixel region on the transparent substrate;
  • Step 3 providing a red quantum dot ink and a green quantum dot ink; at least one of the red quantum dot ink and the green quantum dot ink is an ink of an epoxy resin system, and the ink of the epoxy resin system is formulated as follows :
  • Epoxy resin 40 ⁇ 65wt%
  • the red quantum dot ink is coated on the corresponding red pixel region on the transparent substrate by inkjet printing to form a patterned red quantum dot layer, and the green quantum dot ink is inkjet.
  • Printing is applied to a corresponding green pixel region on the transparent substrate to form a patterned green quantum dot layer; and a color filter layer including an organic transparent photoresist layer, a red quantum dot layer, and a green quantum dot layer is obtained;
  • Step 4 When the ink of the epoxy resin system is not cured, a conductive layer of graphene is formed on the color filter layer to improve the adhesion between the conductive layer of the graphene and the color filter layer; Fully curing the ink of the epoxy resin system on the transparent substrate in one or two ways of curing, and heat curing;
  • Step 5 forming a black photoresist layer on the graphene conductive layer, the black photoresist layer comprising a black matrix, and a plurality of main spacers and a plurality of auxiliary spacers on the black matrix;
  • the graphene conductive layer is formed by transfer, inkjet printing, spraying, slit coating, or spin coating;
  • the red pixel area and the green pixel area are separated by the transparent pixel area, each red pixel area is located between two transparent pixel areas, and each green pixel area is located in two transparent pixel areas.
  • the red and green quantum dot inks are applied to the corresponding red and green pixel regions on the transparent substrate by inkjet printing with the organic transparent photoresist layer as a retaining wall;
  • the sprayed film thickness of the red quantum dot layer and the green quantum dot layer is set to be 0.01-2 ⁇ m lower than the film thickness of the organic transparent photoresist layer;
  • the black matrix includes a plurality of longitudinal light shielding strips and a plurality of horizontal light shielding strips; the main spacers are disposed above the lateral light shielding strips corresponding to the organic transparent photoresist layer, the auxiliary spacers Provided above the lateral light shielding strip corresponding to the red quantum dot layer and the green quantum dot layer;
  • the material of the organic transparent photoresist layer is a transparent photoresist material having UV curing property, a transparent photoresist material having thermal curing property, or a transparent photoresist having both heat curing and photocuring properties.
  • Material; the organic transparent photoresist layer is produced by a yellow light process.
  • the present invention provides a method for fabricating a quantum dot color film substrate, wherein red and green quantum dots are respectively formulated into red and green quantum dot inks, and are formed by inkjet printing to obtain color filter.
  • the layer can improve the brightness and color saturation of the display; at the same time, at least one of the red and green quantum dot inks is an epoxy glue system, and a layer of graphite is formed thereon before the ink of the epoxy glue system is completely cured.
  • the conductive layer of the ene can greatly improve the adhesion between the conductive layer of the graphene and the color filter layer.
  • the use of graphene instead of ITO as the conductive layer can alleviate the current problem of low ITO resources and high price, and graphene.
  • the high conductivity and transmittance make the TFT-LCD screen high-quality display guaranteed, and the panel is thinner and lighter. This design helps to improve conductivity and integration benefits, and is also very large in the curved surface market. Application prospects.
  • 1 is a flow chart showing a method of fabricating a quantum dot color film substrate of the present invention
  • FIG. 2 is a schematic view showing an organic transparent photoresist layer formed on a substrate in step 2 of the method for fabricating a quantum dot color film substrate of the present invention
  • FIG. 3 is a cross-sectional view of the organic transparent photoresist layer formed on the substrate in step 2 of the method for fabricating a quantum dot color film substrate of the present invention taken along line A-A of FIG. 2;
  • FIG. 4 is a schematic view showing a step 5 of a method for fabricating a quantum dot color film substrate of the present invention
  • FIG. 5 is a schematic structural view of a quantum dot color film substrate prepared by the present invention.
  • Fig. 6 is a schematic view showing the color display of the quantum dot color film substrate produced by the present invention in a liquid crystal display device.
  • the present invention first provides a method for fabricating a quantum dot color film substrate, comprising the following steps:
  • Step 1 providing a transparent substrate 11;
  • the red pixel area and the green pixel area are separated by the transparent pixel area, each red pixel area is located between two transparent pixel areas, and each green pixel area is located in two transparent Between pixel regions;
  • the white point color coordinates are adjusted to a target range (0.25 ⁇ x ⁇ 0.35, 0.24 ⁇ y ⁇ 0.35), and the transparent pixel area is controlled.
  • the area ratio of the area AT to the area AR of the red pixel area ranges from 0.05 ⁇ AT / AR ⁇ 0.5, the area AR of the red pixel area and the area of the green pixel area
  • the area ratio of the AG is in the range of 0.3 ⁇ AR / AG ⁇ 1;
  • Step 2 as shown in Figure 2-3, forming a patterned organic transparent photoresist layer 121 on the transparent substrate 11 corresponding to the transparent pixel region;
  • the material of the organic transparent photoresist layer 121 is a transparent photoresist material having UV curing property, a transparent photoresist material having thermal curing property, or a transparent film having both heat curing and photocuring properties.
  • a photoresist material; the organic transparent photoresist layer 121 is formed by a yellow light process.
  • Step 3 providing a red quantum dot ink and a green quantum dot ink; at least one of the red quantum dot ink and the green quantum dot ink is an ink of an epoxy resin system, and the ink of the epoxy resin system is formulated as follows :
  • Epoxy resin 40 ⁇ 65wt%; curing agent 1 ⁇ 15wt%; accelerator 0.3 ⁇ 8wt%; thinner 10 ⁇ 20wt%; pigment 3 ⁇ 12wt%; quantum dots 1 ⁇ 10wt%;
  • the red quantum dot ink is applied to the corresponding red pixel region on the transparent substrate 11 by inkjet printing to form a patterned red quantum dot layer 122, which will be green quantum.
  • the dot ink is applied to the corresponding green pixel region on the transparent substrate 11 by inkjet printing to form a patterned green quantum dot layer 123; and the organic transparent photoresist layer 121, the red quantum dot layer 122, and the green layer are obtained.
  • the red pixel region and the green pixel region are located between the barrier walls formed by the two organic transparent photoresist layers 121, and the organic transparent photoresist layer 121 is used as the retaining wall.
  • the precision of spraying can be greatly improved, and the quantum dot layer is formed by inkjet printing, the process is simple, the time is short, and the equipment cost is relatively low; at the same time, the organic transparent photoresist layer 121 itself can be Directly through the blue light of the backlight, the aperture ratio of the display can be improved, the utilization rate of the light source can be improved, and the quantum dot material can be used instead of the traditional red filter layer and the green filter layer to improve the utilization rate of the light source, and at the same time, the half-wave width of the quantum dot is utilized. Narrow, high-purity light is obtained, thereby achieving high color gamut and low power consumption of the display;
  • the epoxy resin may be bisphenol A epoxy resin E44, bisphenol A epoxy resin E51, bisphenol A epoxy resin E54, bisphenol A ring Oxygen resin EPON826 or bisphenol A type epoxy resin EPON828;
  • curing agent may be hexahydrophthalic anhydride, tetrahydrophthalic anhydride, succinic acid hydrazide, adipic acid hydrazide, dicyandiamide or Phenylenediamine;
  • the accelerator may be di-ethyl-tetramethylimidazole, imidazole, dimethylimidazole or triethylamine;
  • the diluent may be isopropanol, acetone, n-butanol, glycol ether, acetic acid
  • ester methyl ethyl ketone, methyl isobutyl ketone, monomethyl ether glycol ester, propylene glycol monomethyl ether,
  • the pigment is selected from one or more of PG58, PG37, PG36, PG7, and if the pigment is a mixture of a red pigment and a yellow pigment, the yellow pigment may be selected from the group consisting of PY180, PY174, PY150, PY139, PY138, PY126, One or more of PY109, PY95, PY93, PY83, PY13, PY12, PY1; the material of the quantum dot may be selected from a group II-VI quantum dot material, and a group I-III-VI quantum dot material, further preferably CdSe, CdS, CdTe, ZnS, ZnSe, One or more of quantum dot materials such as CuInS, ZnCuInS, etc., the structure may be spherical, core-shell-shaped, spheroidal or irregular shape with protrusions, etc.; specifically, the quantum dots correspond to red and green quantum dot inks The quantum dots that emit red and
  • one of the red quantum dot ink and the green quantum dot ink may be an ink of a photosensitive resin system, and the formulation thereof is as follows:
  • the dispersion resin is selected from the group consisting of 1,6-hexanediol diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, trimethylolpropane triacrylate, ethoxylated trimethylolpropane three One or more of acrylate, pentaerythritol tetraacrylate, ditrimethylolpropane tetraacrylate, and dipentaerythritol pentaacrylate;
  • the monomer is selected from the group consisting of methacrylic acid, acrylic acid, crotonic acid, maleic acid, One or more of maleic anhydride, styrene, methoxystyrene, methyl acrylate, methyl methacrylate, glycidyl acrylate, acrylonitrile; photoinitiator selected from benzophenone , 4-phenylbenzophenone, benzoyl, methyl o-benzoylcarboxy
  • the composition of the pigments is not particularly limited, and existing organic pigments are available for the above pigments: monoazo yellow and orange.
  • the red pigment is selected from one or more of PR264, PR254, PR224, PR190, PR179, PR177, PR123, PR122
  • the green pigment is selected from one or more of PG58, PG37, PG36, PG7, if The pigment is a mixture of a red pigment and a yellow pigment, wherein the yellow pigment may be selected from one of: PY180, PY174, PY150, PY139, PY138, PY126, PY109, PY95, PY93, PY83, PY13, PY12, PY1 or a plurality of materials of the quantum dots, which may select a group II-VI quantum dot material and a group I-III-VI quantum dot material, and further preferably a quantum dot material such as CdSe, CdS, CdTe, ZnS, ZnSe, CuInS, ZnCuInS or the like.
  • One or more of the structures may be spherical, core-shell-shaped, spheroidal or irregularly shaped with protrusions, etc.; specifically, the quantum dots correspond to red and green quantum dot inks respectively emitting red light and green light
  • the quantum dot adjusts the wavelength of the quantum dot after excitation by controlling the particle size of the quantum dot.
  • the red and green quantum dot inks have a viscosity ranging from 1 to 40 cp and a surface tension ranging from 30 to 70 dy/cm.
  • step 3 if one of the red and green quantum dot inks is a non-epoxy resin ink, the ink is sprayed first, and after the spraying is completed, a UV curing and/or heat curing step is further included. In order to cure it; then spray the ink of the epoxy system.
  • the sprayed film thickness of the red quantum dot layer 122 and the green quantum dot layer 123 is set to be 0.01-2 ⁇ m lower than the film thickness of the organic transparent photoresist layer 121.
  • Step 4 When the ink of the epoxy resin system is not cured, the color filter is applied by transfer, inkjet printing (Inkjet), spray coating, slit coating (Slit) or spin coating. A layer of graphene conductive layer 13 is formed on the layer 12 to enhance the adhesion of the graphene conductive layer 13 and the color filter layer 12; then the transparent substrate is applied by one or two of UV curing and heat curing. The ink of the epoxy resin system on the 11 is completely cured; before the ink of the epoxy resin system is cured, the graphene layer is formed thereon, and the adhesion of the graphene to the color filter layer 12 can be larger.
  • Inkjet inkjet
  • Slit slit coating
  • Step 5 as shown in FIG. 4, a black photoresist layer 14 is formed on the graphene conductive layer 13, to obtain a quantum dot color film substrate 10 as shown in FIG. 5; the black photoresist layer 14 includes a black matrix 141. And a plurality of main spacers 142 and a plurality of auxiliary spacers 143 on the black matrix 141.
  • the black matrix 141 includes a plurality of longitudinal light-shielding strips 1411 and a plurality of horizontal light-shielding strips 1412 for blocking overlapping areas between the pixel areas to prevent color mixing;
  • the strip 1412 is for dividing the red quantum dot layer 122, the green quantum dot layer 123, and the organic transparent photoresist layer 121 into a plurality of sub-pixel regions, respectively.
  • the main spacer 142 and the auxiliary spacer 143 are used to control the thickness and uniformity between the upper and lower substrates in the liquid crystal display panel.
  • the main spacer 142 is disposed in a lateral direction corresponding to the organic transparent photoresist layer 121 by using the organic transparent photoresist layer 121 higher than the red quantum dot layer 122 and the green quantum dot layer 123.
  • the auxiliary spacer 143 is disposed above the lateral light-shielding strip 1412 corresponding to the red quantum dot layer 122 and the green quantum dot layer 123, and can be disposed at the main spacer 142 and the auxiliary spacer without other special design.
  • a large step difference is formed between the objects 143 to satisfy the LC Margin requirement at the time of box formation. .
  • the thickness of the organic transparent photoresist layer 121 formed in the step 2 is 4 ⁇ m; in the step 3, the red quantum dot ink provided is photosensitive.
  • the resin of the resin system has the ratio of each component: 10 wt% of the dispersing resin, 6 wt% of the monomer, 8 wt% of the photoinitiator, 61 wt% of the solvent, 6 wt% of the pigment, and 9 wt% of the quantum dot;
  • the ink of the epoxy resin system has the ratio of each component: 55 wt% of epoxy resin, 8 wt% of curing agent, 6.5 wt% of accelerator, 15 wt% of diluent, 7.5 wt% of pigment, and 8 wt% of quantum dots; First, the red quantum dot ink is first applied to the corresponding red pixel region on the transparent substrate 11 by inkjet printing, and then the red quantum dot ink is
  • the green quantum dot ink is applied to the corresponding green pixel region on the transparent substrate 11 by inkjet printing, and then step 4 is performed, and graphite is disposed on the color filter layer 12 by a transfer method.
  • a conductive layer and then thermally curing the green quantum dot ink; and in the step 3, in order to prevent overflow, the sprayed film thickness of the red quantum dot layer 122 is set to be 0.2 ⁇ m lower than the organic transparent photoresist layer 121, and the green quantum dot is The spray film thickness of the layer 123 is set to be 0.2 ⁇ m lower than that of the organic transparent photoresist layer 121; in addition, in order to display when the quantum dot color filter substrate is used in a display device, the white point color coordinates are adjusted to the target range (0.25) ⁇ x ⁇ 0.35, 0.24 ⁇ y ⁇ 0.35), setting the area AT of the transparent pixel region and the The area ratio AR/AR of the area of the red pixel region is 0.5, and the area ratio AR/
  • the thickness of the organic transparent photoresist layer 121 formed in the step 2 is 3.5 ⁇ m; in the step 3, the green quantum dot ink is provided.
  • the ink of the photosensitive resin system was selected, and the ratio of each component was: 9 wt% of the dispersion resin, 5 wt% of the monomer, 7.5 wt% of the photoinitiator, 62 wt% of the solvent, 7 wt% of the pigment, and 9.5% by weight of the quantum dot;
  • the quantum dot ink adopts an epoxy resin ink, and the ratio of each component is: epoxy resin 52wt%, curing agent 7wt%, accelerator 7.5wt%, diluent 18wt%, pigment 8wt%, quantum dot 7.5wt%; Then, in step 3, the green quantum dot ink is first applied to the corresponding green pixel region on the transparent substrate 11 by inkjet printing, and then the green quantum dot
  • the red quantum dot ink is applied to the corresponding red pixel region on the transparent substrate 11 by inkjet printing, and then step 4 is performed on the color filter layer 12 by spraying.
  • the graphene conductive layer is disposed, and then the red quantum dot ink is thermally cured; and in the step 3, in order to prevent overflow, the sprayed film thickness of the red quantum dot layer 122 is set to be 0.15 ⁇ m lower than the organic transparent photoresist layer 121,
  • the spray film thickness of the green quantum dot layer 123 is set to be lower than the organic transparent photoresist layer 121 by 0.15 ⁇ m; in addition, in order to display when the quantum dot color filter substrate is used in a display device, the white point color coordinates are adjusted to the target The range (0.25 ⁇ x ⁇ 0.35, 0.24 ⁇ y ⁇ 0.35), the area ratio AT of the area of the transparent pixel area to the area of the red pixel area AT/AR is 0.45, and the area of the red pixel area is AR.
  • the thickness of the organic transparent photoresist layer 121 formed in the step 2 is 3.2 ⁇ m; in the step 3, the red quantum dot ink is provided.
  • the ink of the epoxy resin system is selected, the proportion of each component is: epoxy resin 48wt%, curing agent 7.5wt%, accelerator 8wt%, diluent 20wt%, pigment 8wt%, quantum dot 8.5wt%;
  • the green quantum dot ink adopts an epoxy resin ink, and the ratio of each component is: epoxy resin 52wt%, curing agent 7wt%, accelerator 7.5wt%, diluent 18wt%, pigment 8wt%, QDs 7.5wt%;
  • the red and green quantum dot inks are applied to the corresponding red and green pixel regions on the transparent substrate 11 by inkjet printing, and then step 4 is applied to the color filter layer 12 by spraying.
  • a graphene conductive layer is disposed thereon, and then the red and green quantum dot inks are thermally cured; and in the step 3, in order to prevent overflow, the sprayed film thickness of the red quantum dot layer 122 is set to be lower than that of the organic transparent photoresist layer 121.
  • the spray film thickness of 123 is set to be 0.1 ⁇ m lower than that of the organic transparent photoresist layer 121; in addition, in order to display when the quantum dot color filter substrate is used in a display device, the white point color coordinate is adjusted to a target range (0.25 ⁇ x ⁇ 0.35, 0.24 ⁇ y ⁇ 0.35), setting the area AT of the transparent pixel area and the red
  • the area ratio AR/AR of the area of the pixel area is 0.4, and the area ratio AR/AG of the area AR of the red pixel area to the area AG of the green pixel area is 0.9.
  • the quantum dot color filter substrate 10 obtained by the present invention includes a transparent substrate 11 and a color filter layer 12 on the transparent substrate 11 based on the method for fabricating the quantum dot color film substrate. a graphene conductive layer 13 on the color filter layer 12, and a black photoresist layer 14 on the graphene conductive layer 13;
  • the color filter layer 12 includes a plurality of organic transparent photoresist layers 121, a plurality of red quantum dot layers 122, and a plurality of green quantum dot layers 123 arranged side by side;
  • the red quantum dot layer 122 and the green quantum dot layer 123 are separated by the organic transparent photoresist layer 121, and each red quantum dot layer 122 is located between the two organic transparent photoresist layers 121, and each green quantum dot is The layer 123 is located between the two organic transparent photoresist layers 121;
  • the black photoresist layer 15 includes a black matrix 141, and a plurality of main spacers 142 and a plurality of auxiliary spacers 143 on the black matrix 141;
  • the black matrix 141 includes a plurality of longitudinal light-shielding strips 1411 and a plurality of lateral light-shielding strips 1412; the main spacers 142 are disposed above the lateral light-shielding strips 1412 corresponding to the organic transparent photoresist layer 121, the auxiliary spacers 143 is disposed above the lateral light shielding tape 1412 corresponding to the red quantum dot layer 122 and the green quantum dot layer 123.
  • the quantum dot color film substrate obtained by the present invention is used in a liquid crystal display device whose backlight is blue light.
  • the liquid crystal display device includes a liquid crystal display panel 1 and a backlight module 2;
  • the display panel 1 includes the quantum dot color film substrate 10, the array substrate 20, and the liquid crystal layer 30 between the quantum dot color filter substrate 10 and the array substrate 20; the backlight of the backlight module 2 is adopted.
  • a blue LED having a wavelength in the range of 450-480 nm.
  • the organic transparent photoresist layer 121 on the quantum dot color film substrate 10 itself corresponds to a pixel region, and can directly pass through the blue light of the backlight, thereby effectively improving the aperture ratio of the display and improving the utilization rate of the light source;
  • the layer 121 and the green quantum dot layer 122 comprise quantum dot materials, which can improve the utilization of the light source compared with the red photoresist and the green photoresist in the conventional color filter, and the half-wave width of the excitation light using the quantum dots is narrow.
  • the characteristic is that high color purity light can be obtained, thereby achieving high color gamut and low power consumption of the liquid crystal display device.
  • the liquid crystal display device may be a large-sized liquid crystal display, a liquid crystal television, or a small and medium-sized mobile phone, a tablet computer, a digital camera, or other special function display device, such as electronic paper.
  • the method for fabricating the quantum dot color film substrate of the present invention the quantum dots are blended into red and green quantum dot inks, and formed by inkjet printing to obtain a color filter layer, which can improve the brightness of the display and Color saturation; at the same time, at least one of red and green quantum dot inks
  • a conductive layer of graphene is formed thereon as an electrode, so that the adhesion of the graphene conductive layer and the color filter layer can be greatly improved.
  • the use of graphene instead of ITO as a conductive layer can alleviate the current problem of low ITO resources and high price, and the conductivity and transmittance of graphene are high, so that the high-quality display of the TFT-LCD screen is ensured, and the panel is thinned. Lightweight is achieved. This design helps to improve conductivity and integration benefits, and has a very large application prospect in the curved surface market.

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Abstract

提供一种量子点彩膜基板的制作方法,将红、绿量子点分别调配成红、绿色量子点油墨,并通过喷墨打印的方式成型,得到彩色滤光层,可以提高显示器的亮度和色彩饱和度;同时,红、绿色量子点油墨中至少一种为环氧胶体系的油墨,在环氧胶体系的油墨未固化时,在其上形成一层石墨烯导电层作为电极,可使石墨烯导电层与彩色滤光层的附着力得到较大提升,另外,采用石墨烯取代ITO作为导电层,可缓和目前ITO资源少、价格走高问题,且石墨烯导电率、穿透率高,使TFT-LCD画面优质显示得到保证,面板整机薄化、轻量化得以实现,这种设计有助于提升电导率及整合效益,在曲面市场也有着非常大的应用前景。

Description

量子点彩膜基板的制作方法 技术领域
本发明涉及显示技术领域,尤其涉及一种量子点彩膜基板的制作方法。
背景技术
薄膜晶体管液晶显示器(Thin Film Transistor Liquid Crystal Display,TFT-LCD)由于色彩度高、体积小、功耗低等优势,在目前平板显示领域占主流地位。作为液晶显示器重要组件之一的彩色滤光片(Color filter),主要通过RGB彩色层的滤光实现显色。传统TFT-LCD的RGB彩色层主要采用黄光工艺,通过曝光显影成型,存在工艺复杂、耗时较长的问题;而且彩色光阻层对背光的利用率较低,且由于材料本身的限制,显示器的亮度和色彩饱和度都难得到较大提升。
量子点材料(Quantum Dots,简称QDs)是指粒径在1-100nm的半导体晶粒。由于QDs的粒径较小,小于或者接近相应体材料的激子波尔半径,产生量子限域效应,本体材料连续的能带结构会转变为分立的能级结构,在外部光源的激发下,电子会发生跃迁,发射荧光。QDs这种特殊的分立能级结构使其半波宽较窄,因而可发出较高纯度的单色光,相比于传统显示器具有更高的发光效率。同时,由于QDs的能级带隙,受其尺寸影响较大,可以通过调控QDs的尺寸或使用不同成分的QDs来激发出不同波长的光。为了满足人们对显示器宽色域、色彩高饱和度的需求,通过在背光结构中加入光致发光的量子点器件成为各大显示器厂商的有效选择。
此外,目前在TFT-LCD中大量使用的电极材料氧化铟锡(ITO),面临资源少,价格走高的趋势,而且ITO不耐受挠曲,不能满足面板曲面设计,由于材料本身的特性,使得面板进一步的薄化、轻量化受到限制。
石墨烯是一种新型碳纳米材料,是由碳原子构成的单层网络结构,具有电子导电率好、阻抗低、光透过率高、化学稳定性佳、机械性能优异等特点。制备石墨烯的原料石墨来源广、价格低廉,而且石墨烯可耐受简单的屏幕挠曲或曲面设计,这些优异的特性使得石墨烯成为取代ITO的主流材料。
发明内容
本发明的目的在于提供一种量子点彩膜基板的制作方法,将量子点调 配成量子点油墨,并通过喷墨打印的方式成型,得到彩色滤光层,其中量子点油墨中至少有一种为环氧胶体系的油墨,在环氧胶体系的油墨完全固化前,在其上形成一层石墨烯导电层作为电极,使石墨烯导电层与彩色滤光层的附着力得到较大提升。
为实现上述目的,本发明提供了一种彩膜基板的制作方法,包括以下步骤:
步骤1、提供一透明基板;
将所述透明基板划分为并排设置的数个红色像素区域、数个绿色像素区域、及数个透明像素区域;
步骤2、在所述透明基板上对应所述透明像素区域形成图形化的有机透明光阻层;
步骤3、提供红色量子点油墨、及绿色量子点油墨;所述红色量子点油墨、和绿色量子点油墨中至少有一种为环氧树脂体系的油墨,所述环氧树脂体系的油墨的配方如下:
环氧树脂40~65wt%;
固化剂1~15wt%;
促进剂0.3~8wt%;
稀释剂10~20wt%;
颜料3~12wt%;
量子点1~10wt%;
将红色量子点油墨采用喷墨打印的方式涂布在所述透明基板上对应的红色像素区域,形成图形化的红色量子点层,将绿色量子点油墨采用喷墨打印的方式涂布在所述透明基板上对应的绿色像素区域,形成图形化的绿色量子点层;得到包含有机透明光阻层、红色量子点层、及绿色量子点层的彩色滤光层;
步骤4、在所述环氧树脂体系的油墨未固化时,在所述彩色滤光层上形成一层石墨烯导电层,以提升石墨烯导电层与彩色滤光层的附着力;然后采用UV固化、和热固化中的一种或两种方式对所述透明基板上的环氧树脂体系的油墨进行完全固化;
步骤5、在所述石墨烯导电层上形成黑色光阻层,所述黑色光阻层包括黑色矩阵、及位于黑色矩阵上的数个主间隔物与数个辅助间隔物。
所述红色量子点油墨、和绿色量子点油墨的粘度为1~40cp,表面张力为30~70dy/cm。
在所述环氧树脂体系的油墨中,所述环氧树脂为双酚A型环氧树脂 E44、双酚A型环氧树脂E51、双酚A型环氧树脂E54、双酚A型环氧树脂EPON826或双酚A型环氧树脂EPON828;
所述固化剂为六氢邻苯二甲酸酐、四氢邻苯二甲酸酐、丁二酸酰肼、己二酸酰肼、双氰胺或对苯二胺;
所述促进剂为二-乙基-四甲基咪唑、咪唑、二甲基咪唑或三乙胺;
所述稀释剂为异丙醇、丙酮、正丁醇、乙二醇醚、乙酸乙酯、甲乙酮、甲基异丁基酮、单甲基醚乙二醇酯、丙二醇单甲基醚、丙二醇甲醚醋酸酯、丙二醇单甲基醚醋酸酯中的一种或多种的组合;
所述颜料根据显示需求为红色、绿色、和黄色颜料中的一种或多种的组合,所述红色、绿色、和黄色颜料分别为单偶氮黄色和橙色颜料、双偶氮颜料、萘酚系列颜料、色酚AS系列颜料、偶氮色淀类颜料、偶氮缩合颜料、苯并咪唑酮颜料、酞菁颜料、硫靛系颜料、喹吖啶酮类颜料、喹酞酮类颜料、蒽醌颜料、二噁嗪颜料、三芳甲烷类颜料、及吡咯并吡咯二酮系颜料中的一种或多种的组合;
所述量子点对应红、绿色量子点油墨分别为发红光、绿光的量子点,所述量子点的材料包括Ⅱ-Ⅵ族量子点材料、及Ⅰ-Ⅲ-Ⅵ族量子点材料中的一种或多种;所述量子点的结构为球形、核壳形、带凸起的类球形、或不规则形状。
所述红色颜料为PR264、PR254、PR224、PR190、PR179、PR177、PR123、PR122中的一种或多种的组合;所述绿色颜料为PG58、PG37、PG36、PG7中的一种或多种的组合;所述黄色颜料为PY180、PY174、PY150、PY139、PY138、PY126、PY109、PY95、PY93、PY83、PY13、PY12、PY1中的一种或多种的组合;
所述量子点的材料包括CdSe、CdS、CdTe、ZnS、ZnSe、CuInS、ZnCuInS中的一种或多种。
所述红色量子点油墨、和绿色量子点油墨中的一种为感光树脂体系的油墨,所述感光树脂体系的油墨的配方如下:
分散树脂1~16wt%;
单体1~16wt%;
光起始剂0.5~12wt%;
溶剂30~85wt%;
颜料3~12wt%;
量子点1~10wt%;
其中,所述分散树脂为1,6-己二醇双丙烯酸酯、二缩丙二醇双丙烯酸 酯、三缩丙二醇双丙烯酸酯、三羟甲基丙烷三丙烯酸酯、乙氧基化三羟甲基丙烷三丙烯酸酯、季戊四醇四丙烯酸酯、二缩三羟甲基丙烷四丙烯酸酯、和双季戊四醇五丙烯酸酯中的一种或多种的组合;
所述单体为甲基丙烯酸、丙烯酸、丁烯酸、马来酸、马来酸酐、苯乙烯、甲氧基苯乙烯、丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸环氧丙基酯、丙烯腈中的一种或多种的组合;
所述光起始剂为二苯甲酮、4-苯基二苯甲酮、苯甲酰、邻苯甲酰甲酸甲酯、苯甲酰甲苯磺酸酯、对二甲氨基苯甲酸乙酯、苯甲酰基甲醚、苯甲酰基乙醚、苯甲酰基异丙醚、苯甲酰基异丁醚、2,4,6-三甲基苯甲酰二苯膦氧化物、2,2’-二邻氯苯基-4,4’,5,5’-四苯基-1,2’-二咪唑、2-乙基蒽醌、莰醌、联苯酰、4-羟基苯二甲基锍p-甲苯磺酸盐、三苯锍六氟锑酸盐、二苯碘鎓六氟锑酸盐、2-羟基-2-甲基-1-苯丙基-1-酮、二乙氧基乙酰苯酚、2-甲基-2-吗啉代-1-(4-甲基苯硫基)丙烷-1-酮、2-羟基-2-甲基-1-[4-(甲基乙稀)苯基]丙基-1-酮、2,4-二(三氯甲烷基)-6-(四-甲氧基苯)-1,3,5-三嗪、2,4-二(三氯甲基)-6-胡椒基1,3,5-三嗪、2,4-二(三氯甲烷)-6-[2-(5-甲基呋喃)-乙烯基]-1、3,5三嗪、2-苯基苄-2-二甲基胺-1-(4-吗啉苄苯基)丁酮中的一种或多种的组合;
所述溶剂为环己烷、二甲苯、异丙醇、正丁醇、γ-丁内酯、丙酮、丁酮、甲乙酮、甲基异丁基酮、脂肪醇、乙二醇单甲醚、乙二醇单乙醚、乙二醇单丙醚、乙二醇单丁醚、丙酸-3-乙醚乙酯、单甲基醚乙二醇酯、二乙二醇二乙醚乙酸乙酯、丁基卡必醇、丁基卡必醇醋酸酯、丙二醇单甲基醚、丙二醇单甲基醚醋酸酯中的一种或多种的组合;
所述颜料根据显示需求为红色、绿色、和黄色颜料中的一种或多种的组合,所述红色、绿色、和黄色颜料分别为单偶氮黄色和橙色颜料、双偶氮颜料、萘酚系列颜料、色酚AS系列颜料、偶氮色淀类颜料、偶氮缩合颜料、苯并咪唑酮颜料、酞菁颜料、硫靛系颜料、喹吖啶酮类颜料、喹酞酮类颜料、蒽醌颜料、二噁嗪颜料、三芳甲烷类颜料、及吡咯并吡咯二酮系颜料中的一种或多种的组合;
所述量子点对应红、绿色量子点油墨分别为发红光、绿光的量子点,所述量子点的材料包括Ⅱ-Ⅵ族量子点材料、及Ⅰ-Ⅲ-Ⅵ族量子点材料中的一种或多种;所述量子点的结构为球形、核壳形、带凸起的类球形或不规则形状。
所述步骤4中,采用转印、喷墨打印、喷涂、狭缝涂布、或旋涂方式形成石墨烯导电层。
在所述透明基板上,所述红色像素区域与绿色像素区域被所述透明像素区域间隔开,每一红色像素区域位于两透明像素区域之间,每一绿色像素区域位于两透明像素区域之间;所述步骤3中,以有机透明光阻层作为挡墙,将红、绿色量子点油墨采用喷墨打印的方式涂布在所述透明基板上对应的红、绿色像素区域。
所述步骤3中,为防止溢流,设置所述红色量子点层、及绿色量子点层的喷涂膜厚比有机透明光阻层的膜厚低0.01-2μm;
所述步骤5中,所述黑色矩阵包括数条纵向遮光带、及数条横向遮光带;所述主间隔物设于对应所述有机透明光阻层的横向遮光带上方,所述辅助间隔物设于对应所述红色量子点层及绿色量子点层的横向遮光带上方。
所述步骤2中,所述有机透明光阻层的材料为具有UV固化性能的透明光阻材料、具有热固化性能的透明光阻材料、或同时具有热固化和光固化性能的透明光阻材料;所述有机透明光阻层通过黄光制程制得。
所述透明像素区域的面积AT与所述红色像素区域的面积AR的面积比范围为0.05≤AT/AR≤0.5,所述红色像素区域的面积AR与所述绿色像素区域的面积AG的面积比范围为0.3≤AR/AG≤1。
本发明还提供一种量子点彩膜基板的制作方法,包括以下步骤:
步骤1、提供一透明基板;
将所述透明基板划分为并排设置的数个红色像素区域、数个绿色像素区域、及数个透明像素区域;
步骤2、在所述透明基板上对应所述透明像素区域形成图形化的有机透明光阻层;
步骤3、提供红色量子点油墨、及绿色量子点油墨;所述红色量子点油墨、和绿色量子点油墨中至少有一种为环氧树脂体系的油墨,所述环氧树脂体系的油墨的配方如下:
环氧树脂40~65wt%;
固化剂1~15wt%;
促进剂0.3~8wt%;
稀释剂10~20wt%;
颜料3~12wt%;
量子点1~10wt%;
将红色量子点油墨采用喷墨打印的方式涂布在所述透明基板上对应的红色像素区域,形成图形化的红色量子点层,将绿色量子点油墨采用喷墨 打印的方式涂布在所述透明基板上对应的绿色像素区域,形成图形化的绿色量子点层;得到包含有机透明光阻层、红色量子点层、及绿色量子点层的彩色滤光层;
步骤4、在所述环氧树脂体系的油墨未固化时,在所述彩色滤光层上形成一层石墨烯导电层,以提升石墨烯导电层与彩色滤光层的附着力;然后采用UV固化、和热固化中的一种或两种方式对所述透明基板上的环氧树脂体系的油墨进行完全固化;
步骤5、在所述石墨烯导电层上形成黑色光阻层,所述黑色光阻层包括黑色矩阵、及位于黑色矩阵上的数个主间隔物与数个辅助间隔物;
其中,所述步骤4中,采用转印、喷墨打印、喷涂、狭缝涂布、或旋涂方式形成石墨烯导电层;
其中,在所述透明基板上,所述红色像素区域与绿色像素区域被所述透明像素区域间隔开,每一红色像素区域位于两透明像素区域之间,每一绿色像素区域位于两透明像素区域之间;所述步骤3中,以有机透明光阻层作为挡墙,将红、绿色量子点油墨采用喷墨打印的方式涂布在所述透明基板上对应的红、绿色像素区域;
其中,所述步骤3中,为防止溢流,设置所述红色量子点层、及绿色量子点层的喷涂膜厚比有机透明光阻层的膜厚低0.01-2μm;
所述步骤5中,所述黑色矩阵包括数条纵向遮光带、及数条横向遮光带;所述主间隔物设于对应所述有机透明光阻层的横向遮光带上方,所述辅助间隔物设于对应所述红色量子点层及绿色量子点层的横向遮光带上方;
其中,所述步骤2中,所述有机透明光阻层的材料为具有UV固化性能的透明光阻材料、具有热固化性能的透明光阻材料、或同时具有热固化和光固化性能的透明光阻材料;所述有机透明光阻层通过黄光制程制得。
本发明的有益效果:本发明提供了一种量子点彩膜基板的制作方法,将红、绿色量子点分别调配成红、绿色量子点油墨,并通过喷墨打印的方式成型,得到彩色滤光层,可以提高显示器的亮度和色彩饱和度;同时,红、绿色量子点油墨中至少有一种为环氧胶体系的油墨,在环氧胶体系的油墨完全固化前,在其上形成一层石墨烯导电层作为电极,可使石墨烯导电层与彩色滤光层的附着力得到较大提升,另外,采用石墨烯取代ITO作为导电层,可缓和目前ITO资源少、价格走高问题,且石墨烯电导率、穿透率高,使TFT-LCD画面优质显示得到保证,面板整机薄化、轻量化得以实现,这种设计有助于提升电导率及整合效益,在曲面市场也有着非常大 的应用前景。
为了能更进一步了解本发明的特征以及技术内容,请参阅以下有关本发明的详细说明与附图,然而附图仅提供参考与说明用,并非用来对本发明加以限制。
附图说明
下面结合附图,通过对本发明的具体实施方式详细描述,将使本发明的技术方案及其它有益效果显而易见。
附图中,
图1为本发明的量子点彩膜基板的制作方法的流程图;
图2为本发明的量子点彩膜基板的制作方法的步骤2中在基板上形成有机透明光阻层的示意图;
图3为本发明的量子点彩膜基板的制作方法的步骤2中在基板上形成的有机透明光阻层沿图2中A-A线的剖面示意图;
图4为本发明的量子点彩膜基板的制作方法的步骤5的示意图;
图5为本发明制得的量子点彩膜基板的结构示意图;
图6为本发明制得的量子点彩膜基板在液晶显示装置进行彩色显示的示意图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果,以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图1,本发明首先提供一种量子点彩膜基板的制作方法,包括以下步骤:
步骤1、提供一透明基板11;
将所述透明基板11划分为并排设置的数个红色像素区域、数个绿色像素区域、及数个透明像素区域;
具体的,在所述透明基板11上,所述红色像素区域与绿色像素区域被所述透明像素区域间隔开,每一红色像素区域位于两透明像素区域之间,每一绿色像素区域位于两透明像素区域之间;
具体的,为了当所述量子点彩膜用于显示装置中而进行显示时,调整白点色坐标至目标范围(0.25<x<0.35,0.24<y<0.35),控制所述透明像素区域的面积AT与所述红色像素区域的面积AR的面积比范围为0.05≤AT/AR≤0.5,所述红色像素区域的面积AR与所述绿色像素区域的面积 AG的面积比范围为0.3≤AR/AG≤1;
步骤2、如图2-3所示,在所述透明基板11上对应所述透明像素区域形成图形化的有机透明光阻层121;
具体的,所述步骤2中,所述有机透明光阻层121的材料为具有UV固化性能的透明光阻材料、具有热固化性能的透明光阻材料、或同时具有热固化和光固化性能的透明光阻材料;所述有机透明光阻层121通过黄光制程制得。
步骤3、提供红色量子点油墨、及绿色量子点油墨;所述红色量子点油墨、和绿色量子点油墨中至少有一种为环氧树脂体系的油墨,所述环氧树脂体系的油墨的配方如下:
环氧树脂40~65wt%;固化剂1~15wt%;促进剂0.3~8wt%;稀释剂10~20wt%;颜料3~12wt%;量子点1~10wt%;
以有机透明光阻层121作为挡墙,将红色量子点油墨采用喷墨打印的方式涂布在所述透明基板11上对应的红色像素区域,形成图形化的红色量子点层122,将绿色量子点油墨采用喷墨打印的方式涂布在所述透明基板11上对应的绿色像素区域,形成图形化的绿色量子点层123;得到包含有机透明光阻层121、红色量子点层122、及绿色量子点层123的彩色滤光层12;
具体的,如图2-3所示,经步骤2之后,红色像素区域、绿色像素区域均位于两有机透明光阻层121组成的挡墙之间,以有机透明光阻层121作为挡墙进行喷墨打印,喷涂的精度可以得到较大提升,且以喷墨打印的方式形成量子点层,工艺简单,耗时短,设备成本相对较低;同时,所述有机透明光阻层121本身可直接透过背光源的蓝光,可以提高显示器开口率,提高光源利用率,采用量子点材料做替代传统的红色滤光层和绿色滤光层,提高光源利用率,同时利用量子点半波宽较窄,可获得较高色纯度光,从而实现显示器的高色域和低功耗;
具体的,所述环氧树脂体系的油墨中,环氧树脂可以是双酚A型环氧树脂E44、双酚A型环氧树脂E51、双酚A型环氧树脂E54、双酚A型环氧树脂EPON826或双酚A型环氧树脂EPON828;固化剂可以是六氢邻苯二甲酸酐、四氢邻苯二甲酸酐、丁二酸酰肼、己二酸酰肼、双氰胺或对苯二胺;促进剂可以是二-乙基-四甲基咪唑、咪唑、二甲基咪唑或三乙胺;稀释剂可以是异丙醇、丙酮、正丁醇、乙二醇醚、乙酸乙酯、甲乙酮、甲基异丁基酮、单甲基醚乙二醇酯、丙二醇单甲基醚、丙二醇甲醚醋酸酯、丙二醇单甲基醚醋酸酯中的一种或几种;所述颜料根据显示需求选用红色、 绿色、黄色颜料中的一种或几种,颜料的成分没有特别限定,现有的有机颜料都可供上述颜料选择:单偶氮黄色和橙色颜料、双偶氮颜料、萘酚系列颜料、色酚AS系列颜料、偶氮色淀类颜料、偶氮缩合颜料、苯并咪唑酮颜料、酞菁颜料、硫靛系颜料、喹吖啶酮类颜料、喹酞酮类颜料、蒽醌颜料、二噁嗪颜料、三芳甲烷类颜料、吡咯并吡咯二酮系颜料等,更优选的,红色颜料选自PR264、PR254、PR224、PR190、PR179、PR177、PR123、PR122中的一种或几种,绿色颜料选自PG58、PG37、PG36、PG7中的一种或几种,若所述颜料为红色颜料与黄色颜料的混合,其中的黄色颜料可选自PY180、PY174、PY150、PY139、PY138、PY126、PY109、PY95、PY93、PY83、PY13、PY12、PY1中的一种或几种;所述量子点的材料可选择Ⅱ-Ⅵ族量子点材料、和Ⅰ-Ⅲ-Ⅵ族量子点材料,进一步优选CdSe,CdS,CdTe,ZnS,ZnSe,CuInS,ZnCuInS等量子点材料中一种或多种,其结构可以是球形、核壳形、带凸起的类球形或不规则形状等;具体的,所述量子点对应红、绿色量子点油墨分别为发红光、绿光的量子点,通过控制量子点的粒径,调整量子点受激后的发光波长。
具体的,红色量子点油墨与绿色量子点油墨中的一种可选用感光树脂体系的油墨,其配方组成如下:
分散树脂1~16wt%;单体1~16wt%;光起始剂0.5~12wt%;溶剂30~85wt%;颜料3~12wt%;量子点1~10wt%;
其中,分散树脂选自1,6-己二醇双丙烯酸酯、二缩丙二醇双丙烯酸酯、三缩丙二醇双丙烯酸酯、三羟甲基丙烷三丙烯酸酯、乙氧基化三羟甲基丙烷三丙烯酸酯、季戊四醇四丙烯酸酯、二缩三羟甲基丙烷四丙烯酸酯和双季戊四醇五丙烯酸酯中的一种或几种;单体选自甲基丙烯酸、丙烯酸、丁烯酸、马来酸、马来酸酐、苯乙烯、甲氧基苯乙烯、丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸环氧丙基酯、丙烯腈中的一种或几种;光起始剂选自二苯甲酮、4-苯基二苯甲酮、苯甲酰、邻苯甲酰甲酸甲酯、苯甲酰甲苯磺酸酯、对二甲氨基苯甲酸乙酯、苯甲酰基甲醚、苯甲酰基乙醚、苯甲酰基异丙醚、苯甲酰基异丁醚、2,4,6-三甲基苯甲酰二苯膦氧化物、2,2’-二邻氯苯基-4,4’,5,5’-四苯基-1,2’-二咪唑、2-乙基蒽醌、莰醌、联苯酰、4-羟基苯二甲基锍p-甲苯磺酸盐、三苯锍六氟锑酸盐、二苯碘鎓六氟锑酸盐、2-羟基-2-甲基-1-苯丙基-1-酮、二乙氧基乙酰苯酚、2-甲基-2-吗啉代-1-(4-甲基苯硫基)丙烷-1-酮、2-羟基-2-甲基-1-[4-(甲基乙稀)苯基]丙基-1-酮、2,4-二(三氯甲烷基)-6-(四-甲氧基苯)-1,3,5-三嗪、2,4-二(三氯甲基)-6-胡椒基1,3,5-三嗪、2,4-二(三氯甲烷)-6-[2-(5-甲基呋喃)-乙烯基]-1、3,5三嗪、2-苯基苄-2-二甲 基胺-1-(4-吗啉苄苯基)丁酮、中的一种或几种;溶剂选自环己烷、二甲苯、异丙醇、正丁醇、γ-丁内酯、丙酮、丁酮、甲乙酮、甲基异丁基酮、脂肪醇、乙二醇单甲醚、乙二醇单乙醚、乙二醇单丙醚、乙二醇单丁醚、丙酸-3-乙醚乙酯、单甲基醚乙二醇酯、二乙二醇二乙醚乙酸乙酯、丁基卡必醇、丁基卡必醇醋酸酯、丙二醇单甲基醚、丙二醇单甲基醚醋酸酯中的一种或几种;颜料根据显示需求选用红色、绿色、黄色颜料中的一种或几种,颜料的成分没有特别限定,现有的有机颜料都可供上述颜料选择:单偶氮黄色和橙色颜料、双偶氮颜料、萘酚系列颜料、色酚AS系列颜料、偶氮色淀类颜料、偶氮缩合颜料、苯并咪唑酮颜料、酞菁颜料、硫靛系颜料、喹吖啶酮类颜料、喹酞酮类颜料、蒽醌颜料、二噁嗪颜料、三芳甲烷类颜料、吡咯并吡咯二酮系颜料等,更优选的,红色颜料选自PR264、PR254、PR224、PR190、PR179、PR177、PR123、PR122中的一种或几种,绿色颜料选自PG58、PG37、PG36、PG7中的一种或几种,若所述颜料为红色颜料与黄色颜料的混合,其中的黄色颜料可选自:PY180、PY174、PY150、PY139、PY138、PY126、PY109、PY95、PY93、PY83、PY13、PY12、PY1中的一种或几种;所述量子点的材料,可选择Ⅱ-Ⅵ族量子点材料和Ⅰ-Ⅲ-Ⅵ族量子点材料,进一步优选CdSe,CdS,CdTe,ZnS,ZnSe,CuInS,ZnCuInS等量子点材料的一种或多种,其结构可以是球形、核壳形、带凸起的类球形或不规则形状等;具体的,所述量子点对应红、绿色量子点油墨分别为发红光、绿光的量子点,通过控制量子点的粒径,调整量子点受激后的发光波长。
具体的,所配置成的红、绿色量子点油墨的粘度范围为1~40cp,表面张力范围为30~70dy/cm。
具体的,所述步骤3中,若红、绿色量子点油墨中之一为非环氧树脂体系的油墨,则先喷涂该油墨,且喷涂完成后,还包括一次UV固化和/或热固化步骤,以使其固化成型;之后再喷涂环氧树脂体系的油墨。
具体的,所述步骤3中,为防止溢流,设置所述红色量子点层122、及绿色量子点层123的喷涂膜厚比有机透明光阻层121的膜厚低0.01-2μm。
步骤4、在所述环氧树脂体系的油墨未固化时,采用转印、喷墨打印(Inkjet)、喷涂(Spray)、狭缝涂布(Slit)或旋涂等方式在所述彩色滤光层12上形成一层石墨烯导电层13,以提升石墨烯导电层13与彩色滤光层12的附着力;然后采用UV固化、和热固化中的一种或两种方式对所述透明基板11上的环氧树脂体系的油墨进行完全固化;在环氧树脂体系的油墨固化前,在其上形成石墨烯层,石墨烯与彩色滤光层12的附着力可得到较大 提升,另外,采用石墨烯取代ITO作为导电层,可缓和目前ITO资源少、价格走高问题,而且石墨烯电导率、穿透率高,使得TFT-LCD画面优质显示得到保证,对于面板整机而言又可实现薄化、轻量化。
步骤5、如图4所示,在所述石墨烯导电层13上形成黑色光阻层14,得到如图5所示的量子点彩膜基板10;所述黑色光阻层14包括黑色矩阵141、及位于黑色矩阵141上的数个主间隔物142与数个辅助间隔物143。
具体的,所述黑色矩阵141包括数条纵向遮光带1411、及数条横向遮光带1412,所述纵向遮光带1411用于遮挡各像素区域之间交叠的区域,防止混色;所述横向遮光带1412用于将所述红色量子点层122、绿色量子点层123、及有机透明光阻层121分别分割成数个子像素区域。
具体的,所述主间隔物142、及辅助间隔物143用于控制液晶显示面板中上下基板间的厚度和均匀性。
具体的,利用所述有机透明光阻层121高于所述红色量子点层122及绿色量子点层123的优势,将所述主间隔物142设于对应所述有机透明光阻层121的横向遮光带1412上方,所述辅助间隔物143设于对应所述红色量子点层122及绿色量子点层123的横向遮光带1412上方,不需其他特殊设计,即可在主间隔物142与辅助间隔物143之间形成较大段差,满足成盒时的LC Margin(液晶余量)需求。。
在本发明的彩膜基板的制作方法的一优选实施例中,所述步骤2中形成的有机透明光阻层121的厚度为4μm;所述步骤3中,所提供的红色量子点油墨选用感光树脂体系的油墨,其各组分比例为:分散树脂10wt%,单体6wt%,光起始剂8wt%,溶剂61wt%,颜料6wt%,量子点9wt%;所提供的绿色量子点油墨选用环氧树脂体系的油墨,其各组分比例为:环氧树脂55wt%,固化剂8wt%,促进剂6.5wt%,稀释剂15wt%,颜料7.5wt%,量子点8wt%;则在步骤3中,先将红色量子点油墨采用喷墨打印的方式涂布在所述透明基板11上对应的红色像素区域,然后采用UV固化、热固化混合的方式对该红色量子点油墨进行固化,待固化完成后,再将绿色量子点油墨采用喷墨打印的方式涂布在所述透明基板11上对应的绿色像素区域,然后进行步骤4,采取转印方式于彩色滤光层12上设置石墨烯导电层,而后对绿色量子点油墨进行热固化;且所述步骤3中,为防止溢流,红色量子点层122的喷涂膜厚设置为比有机透明光阻层121低0.2μm,绿色量子点层123的喷涂膜厚设置为比有机透明光阻层121低0.2μm;另外,为了当所述量子点彩膜基板用于显示装置中而进行显示时,调整白点色坐标至目标范围(0.25<x<0.35,0.24<y<0.35),设置所述透明像素区域的面积AT与所 述红色像素区域的面积AR的面积比AT/AR为0.5,所述红色像素区域的面积AR与所述绿色像素区域的面积AG的面积比AR/AG为1。
在本发明的彩膜基板的制作方法的另一优选实施例中,所述步骤2中形成的有机透明光阻层121的厚度为3.5μm;所述步骤3中,所提供的绿色量子点油墨选用感光树脂体系的油墨,其各组分比例为:分散树脂9wt%,单体5wt%,光起始剂7.5wt%,溶剂62wt%,颜料7wt%,量子点9.5wt%;所提供的红色量子点油墨选用环氧树脂体系的油墨,其各组分比例为:环氧树脂52wt%,固化剂7wt%,促进剂7.5wt%,稀释剂18wt%,颜料8wt%,量子点7.5wt%;则在步骤3中,先将绿色量子点油墨采用喷墨打印的方式涂布在所述透明基板11上对应的绿色像素区域,然后采用UV固化、热固化混合的方式对该绿色量子点油墨进行固化,待固化完成后,再将红色量子点油墨采用喷墨打印的方式涂布在所述透明基板11上对应的红色像素区域,然后进行步骤4,采取喷涂的方式于彩色滤光层12上设置石墨烯导电层,而后对红色量子点油墨进行热固化;且所述步骤3中,为防止溢流,红色量子点层122的喷涂膜厚设置为比有机透明光阻层121低0.15μm,绿色量子点层123的喷涂膜厚设置为比有机透明光阻层121低0.15μm;另外,为了当所述量子点彩膜基板用于显示装置中而进行显示时,调整白点色坐标至目标范围(0.25<x<0.35,0.24<y<0.35),设置所述透明像素区域的面积AT与所述红色像素区域的面积AR的面积比AT/AR为0.45,所述红色像素区域的面积AR与所述绿色像素区域的面积AG的面积比AR/AG为1。
在本发明的彩膜基板的制作方法的再一优选实施例中,所述步骤2中形成的有机透明光阻层121的厚度为3.2μm;所述步骤3中,所提供的红色量子点油墨选用环氧树脂体系的油墨,其各组分比例为:环氧树脂48wt%,固化剂7.5wt%,促进剂8wt%,稀释剂20wt%,颜料8wt%,量子点8.5wt%;所提供的绿色量子点油墨选用环氧树脂体系的油墨,其各组分比例为:环氧树脂52wt%,固化剂7wt%,促进剂7.5wt%,稀释剂18wt%,颜料8wt%,QDs 7.5wt%;在步骤3中,将红、绿色量子点油墨采用喷墨打印的方式涂布在所述透明基板11上对应的红、绿色像素区域,然后进行步骤4,采取喷涂的方式于彩色滤光层12上设置石墨烯导电层,而后对红、绿色量子点油墨进行热固化;且所述步骤3中,为防止溢流,红色量子点层122的喷涂膜厚设置为比有机透明光阻层121低0.1μm,绿色量子点层123的喷涂膜厚设置为比有机透明光阻层121低0.1μm;另外,为了当所述量子点彩膜基板用于显示装置中而进行显示时,调整白点色坐标至目标范围(0.25<x<0.35,0.24<y<0.35),设置所述透明像素区域的面积AT与所述红色 像素区域的面积AR的面积比AT/AR为0.4,所述红色像素区域的面积AR与所述绿色像素区域的面积AG的面积比AR/AG为0.9。
基于上述量子点彩膜基板的制作方法,如图5所示,本发明所得到的量子点彩膜基板10包括透明基板11、位于所述透明基板11上的彩色滤光层12、位于所述彩色滤光层12上的石墨烯导电层13、及位于所述石墨烯导电层13上的黑色光阻层14;
具体的,所述彩色滤光层12包含并排设置的数个有机透明光阻层121、数个红色量子点层122、及数个绿色量子点层123;
其中,所述红色量子点层122与绿色量子点层123被所述有机透明光阻层121间隔开,每一红色量子点层122位于两有机透明光阻层121之间,每一绿色量子点层123位于两有机透明光阻层121之间;
具体的,所述黑色光阻层15包括黑色矩阵141、及位于黑色矩阵141上的数个主间隔物142与数个辅助间隔物143;
所述黑色矩阵141包括数条纵向遮光带1411、及数条横向遮光带1412;所述主间隔物142设于对应所述有机透明光阻层121的横向遮光带1412上方,所述辅助间隔物143设于对应所述红色量子点层122及绿色量子点层123的横向遮光带1412上方。
具体的,本发明所得到的量子点彩膜基板用于背光为蓝光的液晶显示装置中,如图6所示,所述液晶显示装置包括液晶显示面板1、及背光模组2;所述液晶显示面板1包括如上所述的量子点彩膜基板10、阵列基板20、及位于所述量子点彩膜基板10与阵列基板20之间的液晶层30;所述背光模组2的背光源采用蓝光LED,所述背光源的波长范围为450-480nm。
在液晶显示装置中,量子点彩膜基板10上的有机透明光阻层121本身对应一像素区域,可直接透过背光源的蓝光,从而有效提高显示器开口率,提高光源利用率;红色量子点层121、绿色量子点层122包含量子点材料,与传统彩膜滤光片中的红色光阻、绿色光阻相比,可提高光源利用率,同时利用量子点的激发光半波宽较窄的特性,可获得较高色纯度光,从而实现液晶显示装置的高色域和低功耗。
具体的,该液晶显示装置可以是大尺寸的液晶显示器、液晶电视,也可以是中小尺寸的手机、平板电脑、数码相机,或其他特殊功能的显示器件,如电子纸等。
综上所述,本发明的量子点彩膜基板的制作方法,将量子点调配成红、绿色量子点油墨,并通过喷墨打印的方式成型,得到彩色滤光层,可以提高显示器的亮度和色彩饱和度;同时,红、绿色量子点油墨中至少有一种 为环氧胶体系的油墨,在环氧胶体系的油墨完全固化前,在其上形成一层石墨烯导电层作为电极,可使石墨烯导电层与彩色滤光层的附着力得到较大提升,另外,采用石墨烯取代ITO作为导电层,可缓和目前ITO资源少、价格走高问题,且石墨烯电导率、穿透率高,使TFT-LCD画面优质显示得到保证,面板整机薄化、轻量化得以实现,这种设计有助于提升电导率及整合效益,在曲面市场也有着非常大的应用前景。
以上所述,对于本领域的普通技术人员来说,可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形,而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (16)

  1. 一种量子点彩膜基板的制作方法,包括以下步骤:
    步骤1、提供一透明基板;
    将所述透明基板划分为并排设置的数个红色像素区域、数个绿色像素区域、及数个透明像素区域;
    步骤2、在所述透明基板上对应所述透明像素区域形成图形化的有机透明光阻层;
    步骤3、提供红色量子点油墨、及绿色量子点油墨;所述红色量子点油墨、和绿色量子点油墨中至少有一种为环氧树脂体系的油墨,所述环氧树脂体系的油墨的配方如下:
    环氧树脂40~65wt%;
    固化剂1~15wt%;
    促进剂0.3~8wt%;
    稀释剂10~20wt%;
    颜料3~12wt%;
    量子点1~10wt%;
    将红色量子点油墨采用喷墨打印的方式涂布在所述透明基板上对应的红色像素区域,形成图形化的红色量子点层,将绿色量子点油墨采用喷墨打印的方式涂布在所述透明基板上对应的绿色像素区域,形成图形化的绿色量子点层;得到包含有机透明光阻层、红色量子点层、及绿色量子点层的彩色滤光层;
    步骤4、在所述环氧树脂体系的油墨未固化时,在所述彩色滤光层上形成一层石墨烯导电层,以提升石墨烯导电层与彩色滤光层的附着力;然后采用UV固化、和热固化中的一种或两种方式对所述透明基板上的环氧树脂体系的油墨进行完全固化;
    步骤5、在所述石墨烯导电层上形成黑色光阻层,所述黑色光阻层包括黑色矩阵、及位于黑色矩阵上的数个主间隔物与数个辅助间隔物。
  2. 如权利要求1所述的量子点彩膜基板的制作方法,其中,所述红色量子点油墨、和绿色量子点油墨的粘度为1~40cp,表面张力为30~70dy/cm。
  3. 如权利要求1所述的量子点彩膜基板的制作方法,其中,在所述环氧树脂体系的油墨中,所述环氧树脂为双酚A型环氧树脂E44、双酚A型环氧树脂E51、双酚A型环氧树脂E54、双酚A型环氧树脂EPON826或双 酚A型环氧树脂EPON828;
    所述固化剂为六氢邻苯二甲酸酐、四氢邻苯二甲酸酐、丁二酸酰肼、己二酸酰肼、双氰胺或对苯二胺;
    所述促进剂为二-乙基-四甲基咪唑、咪唑、二甲基咪唑或三乙胺;
    所述稀释剂为异丙醇、丙酮、正丁醇、乙二醇醚、乙酸乙酯、甲乙酮、甲基异丁基酮、单甲基醚乙二醇酯、丙二醇单甲基醚、丙二醇甲醚醋酸酯、丙二醇单甲基醚醋酸酯中的一种或多种的组合;
    所述颜料根据显示需求为红色、绿色、和黄色颜料中的一种或多种的组合,所述红色、绿色、和黄色颜料分别为单偶氮黄色和橙色颜料、双偶氮颜料、萘酚系列颜料、色酚AS系列颜料、偶氮色淀类颜料、偶氮缩合颜料、苯并咪唑酮颜料、酞菁颜料、硫靛系颜料、喹吖啶酮类颜料、喹酞酮类颜料、蒽醌颜料、二噁嗪颜料、三芳甲烷类颜料、及吡咯并吡咯二酮系颜料中的一种或多种的组合;
    所述量子点对应红、绿色量子点油墨分别为发红光、绿光的量子点,所述量子点的材料包括Ⅱ-Ⅵ族量子点材料、及Ⅰ-Ⅲ-Ⅵ族量子点材料中的一种或多种;所述量子点的结构为球形、核壳形、带凸起的类球形、或不规则形状。
  4. 如权利要求3所述的量子点彩膜基板的制作方法,其中,所述红色颜料为PR264、PR254、PR224、PR190、PR179、PR177、PR123、PR122中的一种或多种的组合;所述绿色颜料为PG58、PG37、PG36、PG7中的一种或多种的组合;所述黄色颜料为PY180、PY174、PY150、PY139、PY138、PY126、PY109、PY95、PY93、PY83、PY13、PY12、PY1中的一种或多种的组合;
    所述量子点的材料包括CdSe、CdS、CdTe、ZnS、ZnSe、CuInS、ZnCuInS中的一种或多种。
  5. 如权利要求1所述的量子点彩膜基板的制作方法,其中,所述红色量子点油墨、和绿色量子点油墨中的一种为感光树脂体系的油墨,所述感光树脂体系的油墨的配方如下:
    分散树脂1~16wt%;
    单体1~16wt%;
    光起始剂0.5~12wt%;
    溶剂30~85wt%;
    颜料3~12wt%;
    量子点1~10wt%;
    其中,所述分散树脂为1,6-己二醇双丙烯酸酯、二缩丙二醇双丙烯酸酯、三缩丙二醇双丙烯酸酯、三羟甲基丙烷三丙烯酸酯、乙氧基化三羟甲基丙烷三丙烯酸酯、季戊四醇四丙烯酸酯、二缩三羟甲基丙烷四丙烯酸酯、和双季戊四醇五丙烯酸酯中的一种或多种的组合;
    所述单体为甲基丙烯酸、丙烯酸、丁烯酸、马来酸、马来酸酐、苯乙烯、甲氧基苯乙烯、丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸环氧丙基酯、丙烯腈中的一种或多种的组合;
    所述光起始剂为二苯甲酮、4-苯基二苯甲酮、苯甲酰、邻苯甲酰甲酸甲酯、苯甲酰甲苯磺酸酯、对二甲氨基苯甲酸乙酯、苯甲酰基甲醚、苯甲酰基乙醚、苯甲酰基异丙醚、苯甲酰基异丁醚、2,4,6-三甲基苯甲酰二苯膦氧化物、2,2’-二邻氯苯基-4,4’,5,5’-四苯基-1,2’-二咪唑、2-乙基蒽醌、莰醌、联苯酰、4-羟基苯二甲基锍p-甲苯磺酸盐、三苯锍六氟锑酸盐、二苯碘鎓六氟锑酸盐、2-羟基-2-甲基-1-苯丙基-1-酮、二乙氧基乙酰苯酚、2-甲基-2-吗啉代-1-(4-甲基苯硫基)丙烷-1-酮、2-羟基-2-甲基-1-[4-(甲基乙稀)苯基]丙基-1-酮、2,4-二(三氯甲烷基)-6-(四-甲氧基苯)-1,3,5-三嗪、2,4-二(三氯甲基)-6-胡椒基1,3,5-三嗪、2,4-二(三氯甲烷)-6-[2-(5-甲基呋喃)-乙烯基]-1、3,5三嗪、2-苯基苄-2-二甲基胺-1-(4-吗啉苄苯基)丁酮中的一种或多种的组合;
    所述溶剂为环己烷、二甲苯、异丙醇、正丁醇、γ-丁内酯、丙酮、丁酮、甲乙酮、甲基异丁基酮、脂肪醇、乙二醇单甲醚、乙二醇单乙醚、乙二醇单丙醚、乙二醇单丁醚、丙酸-3-乙醚乙酯、单甲基醚乙二醇酯、二乙二醇二乙醚乙酸乙酯、丁基卡必醇、丁基卡必醇醋酸酯、丙二醇单甲基醚、丙二醇单甲基醚醋酸酯中的一种或多种的组合;
    所述颜料根据显示需求为红色、绿色、和黄色颜料中的一种或多种的组合,所述红色、绿色、和黄色颜料分别为单偶氮黄色和橙色颜料、双偶氮颜料、萘酚系列颜料、色酚AS系列颜料、偶氮色淀类颜料、偶氮缩合颜料、苯并咪唑酮颜料、酞菁颜料、硫靛系颜料、喹吖啶酮类颜料、喹酞酮类颜料、蒽醌颜料、二噁嗪颜料、三芳甲烷类颜料、及吡咯并吡咯二酮系颜料中的一种或多种的组合;
    所述量子点对应红、绿色量子点油墨分别为发红光、绿光的量子点,所述量子点的材料包括Ⅱ-Ⅵ族量子点材料、及Ⅰ-Ⅲ-Ⅵ族量子点材料中的一种或多种;所述量子点的结构为球形、核壳形、带凸起的类球形或不规则形状。
  6. 如权利要求1所述的量子点彩膜基板的制作方法,其中,所述步骤 4中,采用转印、喷墨打印、喷涂、狭缝涂布、或旋涂方式形成石墨烯导电层。
  7. 如权利要求1所述的量子点彩膜基板的制作方法,其中,在所述透明基板上,所述红色像素区域与绿色像素区域被所述透明像素区域间隔开,每一红色像素区域位于两透明像素区域之间,每一绿色像素区域位于两透明像素区域之间;所述步骤3中,以有机透明光阻层作为挡墙,将红、绿色量子点油墨采用喷墨打印的方式涂布在所述透明基板上对应的红、绿色像素区域。
  8. 如权利要求7所述的量子点彩膜基板的制作方法,其中,所述步骤3中,为防止溢流,设置所述红色量子点层、及绿色量子点层的喷涂膜厚比有机透明光阻层的膜厚低0.01-2μm;
    所述步骤5中,所述黑色矩阵包括数条纵向遮光带、及数条横向遮光带;所述主间隔物设于对应所述有机透明光阻层的横向遮光带上方,所述辅助间隔物设于对应所述红色量子点层及绿色量子点层的横向遮光带上方。
  9. 如权利要求1所述的量子点彩膜基板的制作方法,其中,所述步骤2中,所述有机透明光阻层的材料为具有UV固化性能的透明光阻材料、具有热固化性能的透明光阻材料、或同时具有热固化和光固化性能的透明光阻材料;所述有机透明光阻层通过黄光制程制得。
  10. 如权利要求7所述的量子点彩膜基板的制作方法,其中,所述透明像素区域的面积AT与所述红色像素区域的面积AR的面积比范围为0.05≤AT/AR≤0.5,所述红色像素区域的面积AR与所述绿色像素区域的面积AG的面积比范围为0.3≤AR/AG≤1。
  11. 一种量子点彩膜基板的制作方法,包括以下步骤:
    步骤1、提供一透明基板;
    将所述透明基板划分为并排设置的数个红色像素区域、数个绿色像素区域、及数个透明像素区域;
    步骤2、在所述透明基板上对应所述透明像素区域形成图形化的有机透明光阻层;
    步骤3、提供红色量子点油墨、及绿色量子点油墨;所述红色量子点油墨、和绿色量子点油墨中至少有一种为环氧树脂体系的油墨,所述环氧树脂体系的油墨的配方如下:
    环氧树脂40~65wt%;
    固化剂1~15wt%;
    促进剂0.3~8wt%;
    稀释剂10~20wt%;
    颜料3~12wt%;
    量子点1~10wt%;
    将红色量子点油墨采用喷墨打印的方式涂布在所述透明基板上对应的红色像素区域,形成图形化的红色量子点层,将绿色量子点油墨采用喷墨打印的方式涂布在所述透明基板上对应的绿色像素区域,形成图形化的绿色量子点层;得到包含有机透明光阻层、红色量子点层、及绿色量子点层的彩色滤光层;
    步骤4、在所述环氧树脂体系的油墨未固化时,在所述彩色滤光层上形成一层石墨烯导电层,以提升石墨烯导电层与彩色滤光层的附着力;然后采用UV固化、和热固化中的一种或两种方式对所述透明基板上的环氧树脂体系的油墨进行完全固化;
    步骤5、在所述石墨烯导电层上形成黑色光阻层,所述黑色光阻层包括黑色矩阵、及位于黑色矩阵上的数个主间隔物与数个辅助间隔物;
    其中,所述步骤4中,采用转印、喷墨打印、喷涂、狭缝涂布、或旋涂方式形成石墨烯导电层;
    其中,在所述透明基板上,所述红色像素区域与绿色像素区域被所述透明像素区域间隔开,每一红色像素区域位于两透明像素区域之间,每一绿色像素区域位于两透明像素区域之间;所述步骤3中,以有机透明光阻层作为挡墙,将红、绿色量子点油墨采用喷墨打印的方式涂布在所述透明基板上对应的红、绿色像素区域;
    其中,所述步骤3中,为防止溢流,设置所述红色量子点层、及绿色量子点层的喷涂膜厚比有机透明光阻层的膜厚低0.01-2μm;
    所述步骤5中,所述黑色矩阵包括数条纵向遮光带、及数条横向遮光带;所述主间隔物设于对应所述有机透明光阻层的横向遮光带上方,所述辅助间隔物设于对应所述红色量子点层及绿色量子点层的横向遮光带上方;
    其中,所述步骤2中,所述有机透明光阻层的材料为具有UV固化性能的透明光阻材料、具有热固化性能的透明光阻材料、或同时具有热固化和光固化性能的透明光阻材料;所述有机透明光阻层通过黄光制程制得。
  12. 如权利要求11所述的量子点彩膜基板的制作方法,其中,所述红色量子点油墨、和绿色量子点油墨的粘度为1~40cp,表面张力为30~70dy/cm。
  13. 如权利要求11所述的量子点彩膜基板的制作方法,其中,在所述环氧树脂体系的油墨中,所述环氧树脂为双酚A型环氧树脂E44、双酚A型环氧树脂E51、双酚A型环氧树脂E54、双酚A型环氧树脂EPON826或双酚A型环氧树脂EPON828;
    所述固化剂为六氢邻苯二甲酸酐、四氢邻苯二甲酸酐、丁二酸酰肼、己二酸酰肼、双氰胺或对苯二胺;
    所述促进剂为二-乙基-四甲基咪唑、咪唑、二甲基咪唑或三乙胺;
    所述稀释剂为异丙醇、丙酮、正丁醇、乙二醇醚、乙酸乙酯、甲乙酮、甲基异丁基酮、单甲基醚乙二醇酯、丙二醇单甲基醚、丙二醇甲醚醋酸酯、丙二醇单甲基醚醋酸酯中的一种或多种的组合;
    所述颜料根据显示需求为红色、绿色、和黄色颜料中的一种或多种的组合,所述红色、绿色、和黄色颜料分别为单偶氮黄色和橙色颜料、双偶氮颜料、萘酚系列颜料、色酚AS系列颜料、偶氮色淀类颜料、偶氮缩合颜料、苯并咪唑酮颜料、酞菁颜料、硫靛系颜料、喹吖啶酮类颜料、喹酞酮类颜料、蒽醌颜料、二噁嗪颜料、三芳甲烷类颜料、及吡咯并吡咯二酮系颜料中的一种或多种的组合;
    所述量子点对应红、绿色量子点油墨分别为发红光、绿光的量子点,所述量子点的材料包括Ⅱ-Ⅵ族量子点材料、及Ⅰ-Ⅲ-Ⅵ族量子点材料中的一种或多种;所述量子点的结构为球形、核壳形、带凸起的类球形、或不规则形状。
  14. 如权利要求13所述的量子点彩膜基板的制作方法,其中,所述红色颜料为PR264、PR254、PR224、PR190、PR179、PR177、PR123、PR122中的一种或多种的组合;所述绿色颜料为PG58、PG37、PG36、PG7中的一种或多种的组合;所述黄色颜料为PY180、PY174、PY150、PY139、PY138、PY126、PY109、PY95、PY93、PY83、PY13、PY12、PY1中的一种或多种的组合;
    所述量子点的材料包括CdSe、CdS、CdTe、ZnS、ZnSe、CuInS、ZnCuInS中的一种或多种。
  15. 如权利要求11所述的量子点彩膜基板的制作方法,其中,所述红色量子点油墨、和绿色量子点油墨中的一种为感光树脂体系的油墨,所述感光树脂体系的油墨的配方如下:
    分散树脂1~16wt%;
    单体1~16wt%;
    光起始剂0.5~12wt%;
    溶剂30~85wt%;
    颜料3~12wt%;
    量子点1~10wt%;
    其中,所述分散树脂为1,6-己二醇双丙烯酸酯、二缩丙二醇双丙烯酸酯、三缩丙二醇双丙烯酸酯、三羟甲基丙烷三丙烯酸酯、乙氧基化三羟甲基丙烷三丙烯酸酯、季戊四醇四丙烯酸酯、二缩三羟甲基丙烷四丙烯酸酯、和双季戊四醇五丙烯酸酯中的一种或多种的组合;
    所述单体为甲基丙烯酸、丙烯酸、丁烯酸、马来酸、马来酸酐、苯乙烯、甲氧基苯乙烯、丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸环氧丙基酯、丙烯腈中的一种或多种的组合;
    所述光起始剂为二苯甲酮、4-苯基二苯甲酮、苯甲酰、邻苯甲酰甲酸甲酯、苯甲酰甲苯磺酸酯、对二甲氨基苯甲酸乙酯、苯甲酰基甲醚、苯甲酰基乙醚、苯甲酰基异丙醚、苯甲酰基异丁醚、2,4,6-三甲基苯甲酰二苯膦氧化物、2,2’-二邻氯苯基-4,4’,5,5’-四苯基-1,2’-二咪唑、2-乙基蒽醌、莰醌、联苯酰、4-羟基苯二甲基锍p-甲苯磺酸盐、三苯锍六氟锑酸盐、二苯碘鎓六氟锑酸盐、2-羟基-2-甲基-1-苯丙基-1-酮、二乙氧基乙酰苯酚、2-甲基-2-吗啉代-1-(4-甲基苯硫基)丙烷-1-酮、2-羟基-2-甲基-1-[4-(甲基乙稀)苯基]丙基-1-酮、2,4-二(三氯甲烷基)-6-(四-甲氧基苯)-1,3,5-三嗪、2,4-二(三氯甲基)-6-胡椒基1,3,5-三嗪、2,4-二(三氯甲烷)-6-[2-(5-甲基呋喃)-乙烯基]-1、3,5三嗪、2-苯基苄-2-二甲基胺-1-(4-吗啉苄苯基)丁酮中的一种或多种的组合;
    所述溶剂为环己烷、二甲苯、异丙醇、正丁醇、γ-丁内酯、丙酮、丁酮、甲乙酮、甲基异丁基酮、脂肪醇、乙二醇单甲醚、乙二醇单乙醚、乙二醇单丙醚、乙二醇单丁醚、丙酸-3-乙醚乙酯、单甲基醚乙二醇酯、二乙二醇二乙醚乙酸乙酯、丁基卡必醇、丁基卡必醇醋酸酯、丙二醇单甲基醚、丙二醇单甲基醚醋酸酯中的一种或多种的组合;
    所述颜料根据显示需求为红色、绿色、和黄色颜料中的一种或多种的组合,所述红色、绿色、和黄色颜料分别为单偶氮黄色和橙色颜料、双偶氮颜料、萘酚系列颜料、色酚AS系列颜料、偶氮色淀类颜料、偶氮缩合颜料、苯并咪唑酮颜料、酞菁颜料、硫靛系颜料、喹吖啶酮类颜料、喹酞酮类颜料、蒽醌颜料、二噁嗪颜料、三芳甲烷类颜料、及吡咯并吡咯二酮系颜料中的一种或多种的组合;
    所述量子点对应红、绿色量子点油墨分别为发红光、绿光的量子点,所述量子点的材料包括Ⅱ-Ⅵ族量子点材料、及Ⅰ-Ⅲ-Ⅵ族量子点材料中的 一种或多种;所述量子点的结构为球形、核壳形、带凸起的类球形或不规则形状。
  16. 如权利要求11所述的量子点彩膜基板的制作方法,其中,所述透明像素区域的面积AT与所述红色像素区域的面积AR的面积比范围为0.05≤AT/AR≤0.5,所述红色像素区域的面积AR与所述绿色像素区域的面积AG的面积比范围为0.3≤AR/AG≤1。
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