WO2016117260A1 - 水処理装置および水処理方法 - Google Patents
水処理装置および水処理方法 Download PDFInfo
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- WO2016117260A1 WO2016117260A1 PCT/JP2015/085515 JP2015085515W WO2016117260A1 WO 2016117260 A1 WO2016117260 A1 WO 2016117260A1 JP 2015085515 W JP2015085515 W JP 2015085515W WO 2016117260 A1 WO2016117260 A1 WO 2016117260A1
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/48—Treatment of water, waste water, or sewage with magnetic or electric fields
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/10—Preparation of ozone
- C01B13/11—Preparation of ozone by electric discharge
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B15/00—Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
- C01B15/01—Hydrogen peroxide
- C01B15/029—Preparation from hydrogen and oxygen
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/4608—Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
- C02F1/46109—Electrodes
- C02F2001/46152—Electrodes characterised by the shape or form
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
- C02F2101/36—Organic compounds containing halogen
- C02F2101/366—Dioxine; Furan
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4611—Fluid flow
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4612—Controlling or monitoring
- C02F2201/46125—Electrical variables
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4616—Power supply
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4619—Supplying gas to the electrolyte
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/78—Details relating to ozone treatment devices
- C02F2201/782—Ozone generators
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/02—Fluid flow conditions
- C02F2301/028—Tortuous
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/22—Eliminating or preventing deposits, scale removal, scale prevention
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2305/00—Use of specific compounds during water treatment
- C02F2305/02—Specific form of oxidant
- C02F2305/023—Reactive oxygen species, singlet oxygen, OH radical
Definitions
- the present invention relates to a water treatment apparatus and a water treatment method for treating water to be treated using ozone, radicals, and the like generated by discharge.
- Industrial wastewater and the like may contain persistent substances that cannot be removed by existing ozone treatment.
- the removal of dioxins and dioxane is a major issue.
- ozone O 3
- hydrogen peroxide H 2 O 2
- ultraviolet light hydroxyl radicals (OH radicals) that are more active than ozone are generated in the water to be treated, making it difficult to decompose.
- a method for removing a substance has been put into practical use.
- such a conventional water treatment apparatus has a reaction vessel that can store water to be treated therein and a pin-like shape that generates discharge for performing discharge radical treatment on the water to be treated.
- the processing unit has a hierarchical configuration having electrodes, and a power source unit that applies a high voltage to the electrodes. According to such a radical treatment system, it is possible to improve the decomposition efficiency of a hardly decomposable substance dissolved in water by using radicals (for example, see Patent Document 1).
- the water treatment which processes a to-be-processed water by arrange
- Devices have also been proposed. According to this water treatment apparatus, water to be treated can be efficiently treated with a simple configuration (see, for example, Patent Document 2).
- JP 2007-307486 A Japanese Patent No. 4635204
- the conventional water treatment apparatus disclosed in Patent Document 2 forms a barrier discharge on a pair of electrodes facing each other while flowing water to be treated. For this reason, a discharge cannot be formed in a wide area, and a large amount of an oxidizing substance such as ozone that is effective in decomposing organic substances cannot be generated. As a result, when water treatment is attempted at a high speed, it is necessary to enlarge the reaction vessel and provide more electrodes, resulting in an increase in the size of the apparatus and an increase in apparatus cost.
- the present invention has been made to solve the above-described problems, and is capable of performing high-speed and efficient decomposition of a hardly decomposable substance or removal of high-concentration organic dirt with a relatively small apparatus. It is an object to obtain a water treatment apparatus and a water treatment method capable of
- the water treatment apparatus includes a plurality of ground electrodes arranged in the vertical direction inside the treatment tank, two ground electrodes that are continuous in the vertical direction, a lower surface of the upper ground electrode, and a lower ground.
- a plurality of discharge electrodes provided in gaps formed between the upper surfaces of the electrodes, and the plurality of ground electrodes are alternately arranged so that the upper surfaces of two ground electrodes that are continuous in the vertical direction Arranged so as to incline in opposite directions, each of the plurality of discharge electrodes forms a first discharge in the air between the lower surface of the upper ground electrode and the discharge electrode by applying a voltage.
- the water treatment method according to the present invention includes a plurality of ground electrodes arranged in the vertical direction inside the treatment tank, two ground electrodes continuous in the vertical direction, a lower surface of the upper ground electrode, and a lower side.
- a plurality of discharge electrodes provided in gaps formed between each of the upper surfaces of the ground electrodes, and the plurality of ground electrodes, the upper surfaces of the two ground electrodes continuous in the vertical direction being
- the supplied water to be treated is continuously caused to flow down along the upper surface from the uppermost ground electrode to the lowermost ground electrode, and is passed through the gap in which the first discharge and the second discharge are formed. Thus, it has a process of treating the water to be treated.
- the water to be treated continuously flows down the upper surfaces of the plurality of ground electrodes arranged in the vertical direction inside the treatment tank, and the discharge electrode and the upper ground electrode A discharge is formed between the lower surface and between the discharge electrode and the upper surface of the lower ground electrode. For this reason, a discharge is formed in a wide area in the treatment tank, and a large amount of oxidizing substances such as ozone can be generated. Therefore, it is possible to decompose hardly decomposed substances or remove high-concentration organic dirt in a relatively small treatment tank. A water treatment apparatus and a water treatment method that can be performed at high speed and efficiently can be obtained.
- FIG. 2 is an enlarged view showing two adjacent ground electrodes and their surroundings in FIG. 1 of Embodiment 1 of the present invention. It is sectional drawing of the water treatment apparatus by Embodiment 1 of this invention. It is sectional drawing of the water treatment apparatus which concerns on Embodiment 2 of this invention. It is sectional drawing of the water treatment apparatus which concerns on Embodiment 3 of this invention. It is an expanded sectional view of the grounding cartridge shown in FIG. 5 of Embodiment 3 of this invention. It is sectional drawing which shows the assembly method of the water treatment apparatus of Embodiment 3 of this invention. It is sectional drawing of the water treatment apparatus which concerns on Embodiment 4 of this invention. FIG.
- FIG. 9 is an enlarged cross-sectional view of the first type grounding cartridge shown in FIG. 8 according to the fourth embodiment of the present invention.
- FIG. 9 is an enlarged cross-sectional view of a second type of grounding cartridge shown in FIG. 8 according to Embodiment 4 of the present invention.
- It is sectional drawing of the water treatment apparatus which concerns on Embodiment 5 of this invention.
- It is sectional drawing of the water treatment apparatus which concerns on Embodiment 6 of this invention.
- FIG. 13 is an enlarged view showing two adjacent ground electrodes and their surroundings shown in FIG. 12 of Embodiment 6 of the present invention.
- It is sectional drawing of the water treatment apparatus which concerns on Embodiment 7 of this invention.
- Embodiment 8 of this invention It is sectional drawing of the water treatment apparatus which concerns on Embodiment 9 of this invention.
- FIG. 1 is a cross-sectional view of a water treatment apparatus according to Embodiment 1 of the present invention.
- FIG. 2 is an enlarged view showing two adjacent ground electrodes 2a and 2b in FIG. 1 of the first embodiment of the present invention and their surroundings.
- the water treatment apparatus according to the first embodiment will be described in detail with reference to FIGS. 1 and 2.
- a water supply port 1a and a gas discharge port 1b are provided in the upper part of a metal processing tank 1 having a sealed structure.
- a drain port 1 c is provided on the bottom side surface of the processing tank 1.
- a gas supply port 1 d is provided on the side surface of the processing tank 1.
- ground electrodes 2a, 2b, 2c, and 2d are arranged side by side in the vertical direction (up and down direction). That is, the ground electrode 2a is provided at the top, the ground electrode 2b below it, the ground electrode 2c below it, and the ground electrode 2d at the bottom.
- the four ground electrodes 2a, 2b, 2c, and 2d are all the same type, and have an isosceles triangular prism shape. That is, each of the four ground electrodes 2a, 2b, 2c, and 2d has a shape in which the isosceles triangles shown in FIG. 1 extend in the depth direction of the paper surface.
- the two equal sides (slanted sides) of the isosceles triangles of the ground electrodes 2a, 2b, 2c, and 2d are arranged symmetrically with respect to the horizontal plane. That is, the two oblique sides are inclined in directions opposite to each other with respect to the horizontal plane.
- the other side (bottom side) of the isosceles triangle faces the vertical direction and is connected to one side wall of the treatment tank 1.
- the apex angle of the isosceles triangle (intersection of two oblique sides) is held with a gap from the other side wall of the processing tank 1.
- the two continuous ground electrodes are arranged symmetrically with respect to the vertical plane with a predetermined interval therebetween.
- the bottom of the ground electrode 2a is connected to the left side wall 16a of the processing tank 1, and the bottom of the ground electrode 2b is connected to the right side wall 16b of the processing tank 1.
- the bottom of the ground electrode 2c is connected to the left side wall 16a of the processing tank 1
- the bottom of the ground electrode 2d is connected to the right side wall 16b of the processing tank 1.
- a gap 5a having a uniform height is provided between the ground electrodes 2a and 2b, a gap 5b having a uniform height is provided between the ground electrodes 2b and 2c, and a gap between the ground electrodes 2c and 2d. Is formed with a gap 5c having a uniform height.
- Discharge electrodes 18a, 18b, 18c, and 18d are formed above the ground electrodes 2a, 2b, 2c, and 2d via lower gaps 19a, 19b, 19c, and 19d, respectively. Further, upper gaps 20a, 20b, and 20c are formed between the lower surfaces of the ground electrodes 2a, 2b, and 2c and the discharge electrodes 18b, 18c, and 18d, respectively.
- the lower gaps 19a, 19b, 19c, and 19d and the upper gaps 20a, 20b, and 20c are each formed with a uniform height.
- a gap 5a is formed by the upper gap 20a and the lower gap 19b
- a gap 5b is formed by the upper gap 20b and the lower gap 19c
- a gap 5c is formed by the upper gap 20c and the lower gap 19d.
- the discharge electrode 18b is composed of a plurality (five in FIG. 2) of wire electrodes 6a, 6b, 6c, 6d, and 6e.
- the wire electrodes 6a, 6b, 6c, 6d, and 6e are arranged at intervals in the left and right directions in FIG. Further, the wire electrodes 6a, 6b, 6c, 6d, and 6e are stretched in parallel and horizontally in the width direction of the ground electrodes 2a and 2b (the depth direction in FIG. 2).
- the wire electrodes 6a, 6b, 6c, 6d, and 6e are all connected to the wiring 8b.
- the right side wall 16b of the processing tank 1 is provided with a current introduction terminal 14b, and the wiring 8b penetrates the right side wall 16b via the current introduction terminal 14b.
- the wiring 8b and the processing tank 1 are electrically insulated by the current introduction terminal 14b.
- the discharge electrodes 18a, 18c, and 18d in FIG. 1 are each composed of wire electrodes 6a, 6b, 6c, 6d, and 6e, connected to the wirings 8a, 8c, and 8d, and the current introduction terminal 14a. , 14c, 14d to the outside of the processing tank 1.
- the output on the high voltage side of the pulse power supply 7 provided outside the processing tank 1 is connected to the wiring 8.
- the output on the ground side of the pulse power source 7 is connected to the processing tank 1 and is electrically grounded.
- the ground electrodes 2a, 2b, 2c, and 2d are electrically connected to the processing tank 1, and all are at ground potential.
- the wiring 8 is connected to the bus bar 15, and wirings 8 a, 8 b, 8 c and 8 d are connected to the bus bar 15.
- the discharge electrodes 18a, 18b, 18c, and 18d are electrically connected to the pulse power source 7 in parallel.
- the gas supply port 1d is connected to a gas supply source 9 filled with oxygen gas via a flow rate regulator 10.
- the oxygen gas is adjusted to a predetermined flow rate by the flow rate regulator 10 from the gas supply source 9, and then supplied into the processing tank 1 from the gas supply port 1d.
- the gas in the processing tank 1 is exhausted from the gas discharge port 1b at the same flow rate as the supply oxygen gas flow rate.
- air is discharged from the processing tank 1, and an atmosphere having a high oxygen concentration is formed in the processing tank 1.
- the treated water 4 supplied into the treatment tank 1 from the water supply port 1a flows down on the upper surface of the ground electrode 2a while forming the water film 3, and the ground electrode 2b from the most downstream portion (right end portion in FIG. 1). Falls on the top of the.
- the water to be treated 4 flows down the top surfaces of the ground electrode 2b, the ground electrode 2c, and the ground electrode 2d in this order, and finally falls to the bottom of the treatment tank 1 as the treated water 13 It is discharged from the drain port 1c.
- an atmosphere of high oxygen concentration containing water vapor is formed inside the treatment tank 1.
- the water film 3 and the discharge electrodes 18a, 18b, 18c, and 18d are not in contact with each other. That is, the thickness of the water film 3 is adjusted so that a gas layer is formed between the discharge electrodes 18 a, 18 b, 18 c, 18 d and the water film 3.
- the thickness of the water film is determined by the flow rate of the treated water 4 to be shared, the inclination angle of the upper surface of the ground electrodes 2a, 2b, 2c, and 2d with respect to the horizontal plane, or the surface roughness of the upper surface of the ground electrodes 2a, 2b, 2c, and 2d. It is adjusted by the length.
- the lower discharges 12a, 12b, 12c, 12d, and 12e are sequentially touched to remove the hardly decomposable substances. Water treatment is performed.
- ozone and hydrogen peroxide generated by the respective upper discharges 11a, 11b, 11c, 11d, and 11e are dissolved in the water 4 to be treated, so that water treatment such as removal of hardly decomposable substances is performed by an underwater reaction. Is called.
- M is the third body of the reaction and represents any molecule or atom in the air. O + O 2 + M ⁇ O 3 (3)
- Oxidizing particles (O, OH, O 3 , H 2 O 2 ) generated by the reactions of the above formulas (1) to (4) are converted into the ground electrodes 2a, 2b, 2c, 2d by the following formula (5). It reacts with the organic matter in the vicinity of the water surface of the water 4 to be treated flowing on the upper surface, and is oxidized and decomposed into carbon dioxide (CO 2 ) and water.
- R is an organic substance to be processed.
- O 3 (l) and H 2 O 2 (l) generate OH radicals by the reaction in water as shown in the following formula (8).
- the water to be treated in the region where the water to be treated 4 is in contact with the lower discharges 12a, 12b, 12c, 12d and 12e, the water to be treated is obtained by both the reaction of the above equation (5) and the reaction of the above equation (9).
- the organic matter in the treated water 4 is decomposed.
- the organic matter in the water 4 to be treated is decomposed by the reaction of the above formula (9).
- ozone and hydrogen peroxide are generated by the reactions of the above formulas (1) to (4) also by the upper discharges 11a, 11b, 11c, 11d, and 11e.
- many reactions of the above formulas (6) to (9) occur, and the decomposition of organic matter by the water reaction is promoted.
- the lower discharges 12a, 12b, 12c, 12d, and 12e, and the upper discharges 11a, 11b, 11c, Both 11d and 11e are formed.
- the discharge region in the treatment tank 1 is widened, and more ozone and excess are discharged. Hydrogen oxide is produced. As a result, ozone and hydrogen peroxide that are consumed along with the decomposition of the organic matter are quickly supplemented, so that high-speed water treatment can be performed in the small treatment tank 1.
- the lower discharges 12a, 12b, 12c, 12d, and 12e are discharges toward the water film 3. For this reason, the discharge occurs at a gas containing a relatively high concentration of water molecules or at the interface between the gas and the water film 3. Therefore, many reactions of the above formulas (2) and (4) occur, and the production of hydrogen peroxide increases.
- the upper discharges 11 a, 11 b, 11 c, 11 d, and 11 e are discharges at locations away from the water film 3. For this reason, it becomes discharge with the gas containing a relatively low concentration of water molecules. Therefore, many reactions of the above formulas (1) and (3) occur, and ozone generation increases.
- the concentration ratio of O 3 (l) to H 2 O 2 (l) needs to be appropriate.
- H 2 O 2 (l) may be excessive and O 3 (l) may be insufficient.
- FIG. 1 is a cross-sectional view of the water treatment apparatus according to Embodiment 1 of the present invention, and the shape of the ground electrode is different from that of FIG.
- the shape of the ground electrode can be a triangular prism shape in which the two hypotenuses have different lengths.
- the ground electrodes 2a and 2c have a gradual slope of the upper surface compared to the slope of the lower surface, and the ground electrodes 2b and 2d, on the contrary, have a steeper top surface than the slope of the lower surface.
- the inclination angles of the lower surface of the ground electrode 2a and the upper surface of the ground electrode 2b are the same.
- the inclination angles of the lower surface of the ground electrode 2b and the upper surface of the ground electrode 2c, and the lower surface of the ground electrode 2c and the upper surface of the ground electrode 2d. are the same.
- the heights of the gaps 5a, 5b, and 5c are all uniform in the plane.
- Other configurations are the same as those in FIG.
- the structure shown in FIG. 3 can provide the same effect as that of the structure shown in FIG.
- the pulse power source 7 is used for discharge formation.
- the power source applied to the present invention is not necessarily a pulse power source as long as a stable discharge can be formed, and may be an AC power source or a DC power source, for example.
- the polarity, voltage peak value, repetition frequency, pulse width, etc. of the voltage output from the pulse power supply 7 can be determined as appropriate according to various conditions such as the electrode structure and gas type.
- the voltage peak value is desirably 1 kV to 50 kV. This is because if it is less than 1 kV, a stable discharge is not formed, and if it exceeds 50 kV, the cost increases significantly due to an increase in the size of the power source and difficulty in electrical insulation.
- the repetition frequency is 10 pps (pulse-per-second) or more and 100 kpps or less. This is because if it is less than 10 pps, a very high voltage is required to supply sufficient discharge power. Conversely, if it is greater than 100 kpps, the effect of water treatment is saturated and the power efficiency is lowered.
- the voltage, pulse width, and pulse repetition frequency may be adjusted according to at least one of the flow rate of the water to be treated 4 and the water quality of the substance to be treated.
- ground electrodes 2a, 2b, 2c and 2d are desirable to use.
- a metal material having excellent corrosion resistance such as stainless steel or titanium for the ground electrodes 2a, 2b, 2c and 2d and the wire electrodes 6a, 6b, 6c, 6d and 6e.
- other conductive materials can be used.
- the surfaces of the ground electrodes 2a, 2b, 2c, 2d or the wire electrodes 6a, 6b, 6c, 6d, 6e may be covered with a dielectric such as glass or ceramic.
- the wire electrodes 6a, 6b, 6c, 6d, and 6e are used as the discharge electrodes 18a, 18b, 18c, and 18d.
- the discharge electrode is not necessarily in the form of a wire.
- a rod, a needle, a mesh, a screw, a ribbon, or a punching metal can be used as the discharge electrode.
- the inside of the processing tank 1 was made into the high oxygen concentration atmosphere by supplying oxygen gas from the gas supply source 9.
- the gas species is not limited to oxygen. If it is in a gas containing oxygen, the reactions of the above formulas (1) to (9) occur, so that water treatment can be performed.
- nitrogen or a rare gas can be mixed with oxygen at an arbitrary ratio.
- a rare gas if a rare gas is used, a discharge can be stably formed even at a relatively low voltage, and if air is used, the gas cost can be greatly reduced.
- the flow rate of the gas to be supplied does not need to be constant, and can be appropriately adjusted according to the water quality of the water to be treated 4 or discharge conditions.
- the organic matter concentration in the water 4 to be treated is high, a large amount of oxygen is consumed in the oxidative decomposition process. For this reason, it is preferable to increase the supply gas flow rate.
- the organic substance concentration in the water to be treated 4 is low, the ozone concentration in the gas is increased by reducing the flow rate of the supply gas, and the reaction can be speeded up.
- Embodiment 1 described above five wire electrodes 6a, 6b, 6c, 6d, and 6e are used as the discharge electrodes 18a, 18b, 18c, and 18d.
- the number of wire electrodes can be appropriately changed according to the dimensions of the ground electrodes 2a, 2b, 2c, and 2d, the quality of the water 4 to be treated, the treatment flow rate, and the like.
- the heights of the lower gaps 19a, 19b, 19c, 19d and the upper gaps 20a, 20b, 20c can be arbitrarily determined. However, these heights are preferably 1 mm or more and 50 mm or less. If it is less than 1 mm, it is difficult to define an accurate height. Conversely, if it is greater than 50 mm, a very high voltage is required for discharge formation.
- the heights of the lower gaps 19a, 19b, 19c, 19d and the upper gaps 20a, 20b, 20c need not be the same. That is, the positions of the discharge electrodes 18a, 18b, 18c, and 18d are not necessarily in the center of the gaps 5a, 5b, and 5c. For example, in consideration of the thickness of the water film 3, the discharge electrodes 18a, 18b, 18c, and 18d may be disposed above the centers of the gaps 5a, 5b, and 5c.
- the distance from the discharge electrodes 18a, 18b, 18c, 18d to the lower surfaces of the ground electrodes 2a, 2b, 2c and the distance to the water surface of the water film 3 can be made equal, and the lower discharges 12a, 12b, 12c, 12d, 12e and upper discharges 11a, 11b, 11c, 11d, 11e can be formed uniformly.
- discharge electrodes 18a, 18b, 18c, 18d below the center of the gaps 5a, 5b, 5c, discharge to the water surface of the water 4 to be treated, that is, the lower discharges 12a, 12b, 12c, 12d and 12e can be relatively strong, and the discharge in the gas phase, that is, the upper discharges 11a, 11b, 11c, 11d, and 11e can be relatively weak.
- the ratio of ozone and hydrogen peroxide supplied to the to-be-processed water 4 can be changed, and relatively much hydrogen peroxide can be supplied.
- the pressure in the treatment tank 1 is preferably set to atmospheric pressure or the vicinity thereof so that supply and drainage of the water to be treated 4 can be facilitated.
- a positive pressure or a negative pressure can be used as necessary.
- the lower discharges 12a, 12b, 12c, 12d, and 12e and the upper discharges 11a, 11b, 11c, 11d, and 11e are formed at a relatively low voltage.
- the power supply can be reduced in size and simplified.
- the discharge is more easily spread as the pressure is lower, the water 4 to be treated comes into contact with the lower discharges 12a, 12b, 12c, 12d, and 12e in a wide area, and the efficiency and speed of the water treatment are improved.
- ground electrodes 2a, 2b, 2c, and 2d are used.
- the number of ground electrodes can be appropriately set according to the dimensions of the treatment tank 1 or the required water treatment capacity.
- FIG. FIG. 4 is a cross-sectional view of a water treatment device according to Embodiment 2 of the present invention.
- the second embodiment is different from the first embodiment in the arrangement of the wire electrodes 21a, 21b, 21c, and 21d that are discharge electrodes.
- the wire electrode 21a is provided above the ground electrode 2a in the right and left direction of the drawing with the same inclination as that of the upper surface of the ground electrode 2a.
- the wire electrode 21a includes an insulator 22a that is an insulating member provided on the left side wall 16a that is the outer peripheral wall of the processing tank 1, and a current introduction terminal 14a that is provided on the right side wall 16b that is the outer peripheral wall of the processing tank 1. Is held by. Further, a plurality of wire electrodes 21a are provided in the depth direction of the paper surface of FIG. 4 so as to cover the upper surface of the ground electrode 2a.
- a wire electrode 21b is provided above the ground electrode 2b by an insulator 22b and a current introduction terminal 14b.
- a wire electrode 21c is provided above the ground electrode 2c by a insulator 22c and a current introduction terminal 14c.
- a wire electrode 21d is provided above the ground electrode 2d by a insulator 22d and a current introduction terminal 14d.
- the wire electrodes 21a, 21b, 21c, and 21d are connected to the wirings 8a, 8b, 8c, and 8d, respectively.
- the wires 8a, 8b, 8c, 8d are connected to the bus bar 15 outside the processing tank 1.
- the bus bar 15 is connected to the high voltage output side of the pulse power source 7 by the wiring 8.
- the ground side of the pulse power source 7 is connected to the processing tank 1 and is electrically grounded.
- Other configurations are the same as those of the first embodiment.
- the water to be treated 4 flows down from the uppermost part of the treatment tank 1 to the upper surface of each of the ground electrodes 2a, 2b, 2c, and 2d in the form of a water film 3, and is discharged from the lowest part of the treatment tank 1. At this time, the film thickness of the water film 3 is adjusted so that the wire electrodes 21a, 21b, 21c, and 21d are not submerged.
- the pulse power supply 7 is operated and a pulse voltage is applied to the wire electrodes 21a, 21b, 21c, and 21d. As a result, a lower discharge 24a is formed between the wire electrode 21a and the upper surface of the ground electrode 2a.
- An upper discharge 23a is formed between the wire electrode 21b and the lower surface of the ground electrode 2a, and a lower discharge 24b is formed between the wire electrode 21b and the upper surface of the ground electrode 2b.
- an upper discharge 23b and a lower discharge 24c are formed above and below the wire electrode 21c, and an upper discharge 23c and a lower discharge 24d are formed above and below the wire electrode 21d.
- Other operations are the same as those in the first embodiment.
- the wire electrodes 6a, 6b, 6c, 6d, and 6e are provided to extend in the depth direction of the paper surface of FIG. That is, the wire electrodes 6a, 6b, 6c, 6d, and 6e were formed on the horizontal plane without being inclined.
- water droplets formed when the water to be treated 4 falls or water droplets formed by water vapor in the treatment tank 1 may adhere to the wire electrode.
- the distance to the ground electrodes 2a, 2b, 2c, and 2d becomes close at that portion.
- a strong discharge is formed only in the water droplet adhering portion, and the efficiency of water treatment may decrease due to a local temperature rise or the like.
- the wire electrodes 21a, 21b, 21c, and 21d are provided with an inclination, and water droplets attached to the wire electrode flow down along the inclination. For this reason, the effect that a uniform discharge is formed as a whole is obtained without forming a strong discharge locally, and an efficient water treatment can be performed.
- FIG. 5 is a cross-sectional view of a water treatment device according to Embodiment 3 of the present invention.
- FIG. 6 is an enlarged cross-sectional view of the grounding cartridge 25 shown in FIG. 5 according to Embodiment 3 of the present invention.
- FIG. 7 is sectional drawing which shows the assembly method of the water treatment apparatus of Embodiment 3 of this invention.
- the water treatment apparatus according to the third embodiment will be described with reference to FIGS.
- grounding cartridges 25a, 25b, 25c, and 25d are arranged side by side in the vertical direction (up and down direction) inside the metal treatment tank 1 having a sealed structure.
- the ground cartridge 25a is provided at the top, the ground cartridge 25b below it, the ground cartridge 25c below it, and the ground cartridge 25d at the bottom.
- the four grounding cartridges 25a, 25b, 25c, and 25d all have the same shape. A detailed configuration of the grounding cartridge 25 will be described with reference to FIG. In FIG. 6, the ground cartridge 25 includes a metal ground electrode 28 and a metal flange 29 connected to the ground electrode 28.
- the ground electrode 28 has a hollow isosceles triangular prism shape, and the isosceles triangle shown in FIG. 6 has a shape extending in the depth direction of the paper surface.
- Two equal sides (oblique sides) of the isosceles triangle of the ground electrode 28 are arranged symmetrically with respect to the horizontal plane. That is, the two oblique sides are inclined in directions opposite to each other with respect to the horizontal plane.
- a flange 29 is connected to the other side (bottom side) of the isosceles triangle, and the flange 29 faces the vertical direction.
- a current introduction terminal 30 is provided so as to penetrate through the bottoms of the flange 29 and the ground electrode 28.
- an upstream insulator 26 a that is an insulating member penetrating from the upper surface of the ground electrode 28 to the hollow portion 34
- a downstream insulator 26 b that is an insulating member attached to the upper surface of the ground electrode 28 are provided.
- the wire electrode 27 is attached in parallel with the upper surface of the ground electrode 28 above the ground electrode 28 by the upstream insulator 26a and the downstream insulator 26b.
- a plurality of wire electrodes 27 are provided in the depth direction of the paper surface of FIG. 6 and are arranged so as to cover the upper surface of the ground electrode 28. Further, the wire electrode 27 is held by being electrically insulated from the ground electrode 28 by the upstream insulator 26a and the downstream insulator 26b.
- the electric wire 31 passes from the outside of the grounding cartridge 25 through the current introduction terminal 30 to the hollow portion 34, and is further connected to the wire electrode 27 through the upstream insulator 26a.
- the electric wire 31 is electrically insulated from the ground cartridge 25 by the current introduction terminal 30 and the upstream insulator 26a.
- the left side wall 16a which is the outer peripheral wall of the processing tank 1 is provided with a plurality of (two in FIG. 7) openings 32a and 32c arranged in the vertical direction.
- the right side wall 16b which is the outer peripheral wall of the processing tank 1 is provided with two openings 32b and 32d arranged in the vertical direction.
- the opening 32b and the opening 32d are formed at positions lower from the openings 32a and 32c by a height that is half the distance between the openings 32a and 32c, respectively.
- the openings 32 a, 32 b, 32 c, and 32 d have an opening area corresponding to the size of the flange 29.
- the grounding cartridge 25a is inserted into the opening 32a, and the flange 29 and the left side wall 16a are fastened by the bolt 33.
- the grounding cartridge 25b is inserted into the opening 32b, the grounding cartridge 25c is inserted into the opening 32c, and the grounding cartridge 25d is inserted into the opening 32d, and the respective flanges 29 are fastened with bolts 33.
- the heights of the gaps between the grounding cartridges 25a and 25b, between 25b and 25c, and between 25c and 25d are uniform. Further, in FIG. 5, the wire electrode 27 is disposed at substantially the center height of each gap formed by the ground cartridges 25a, 25b, 25c, and 25d.
- the electric wires 31 of the grounding cartridges 25a, 25b, 25c, and 25d are connected to a pulse power source (not shown), and the processing tank 1 is electrically grounded.
- the flanges 29 of the ground cartridges 25a, 25b, 25c, and 25d are electrically connected to the processing tank 1 and connected thereto.
- the treated water 4 flows down from the uppermost part of the treatment tank 1 to the upper surface of each ground electrode of the ground cartridges 25a, 25b, 25c, and 25d in the form of a water film, and is discharged from the lowest part of the treatment tank 1.
- the pulse power supply is operated to form a discharge between the wire electrode 27 of the ground cartridge 25a and the upper surface of the ground electrode 28. Further, discharge is generated between the wire electrode 27 of the ground cartridge 25b and the lower surface of the ground electrode 28 of the ground cartridge 25a, and between the wire electrode 27 and the upper surface of the ground electrode 28 of the ground cartridge 25b.
- Other operations are the same as those in the first embodiment.
- a water treatment device can be formed simply by inserting the grounding cartridges 25a, 25b, 25c, and 25d into the treatment tank 1 and fastening them with the bolts 33. For this reason, the effect that an assembly becomes easy is acquired.
- the grounding cartridges 25a, 25b, 25c, and 25d are all the same type. For this reason, it is possible to easily produce a large water treatment device or a plurality of water treatment devices by mass-producing the grounding cartridge. Furthermore, even if a failure occurs, it can be repaired simply by exchanging the grounding cartridge at the corresponding location, so that maintainability is improved and the apparatus operating rate is improved.
- the case where four openings 32a, 32b, 32c, and 32d are provided in the processing tank 1 and the four grounding cartridges 25a, 25b, 25c, and 25d are attached has been described.
- the number of openings and grounding cartridges is not limited to this.
- the processing tank 1 can be formed high and more than four through holes can be formed, the required number of grounding cartridges can be attached, and the remaining openings can be covered.
- FIG. 8 is a cross-sectional view of a water treatment device according to Embodiment 4 of the present invention.
- FIG. 9 is an enlarged cross-sectional view of the first type grounding cartridge 35 shown in FIG. 8 according to the fourth embodiment of the present invention.
- FIG. 10 is an enlarged cross-sectional view of the second type of grounding cartridge 36 shown in FIG. 8 according to the fourth embodiment of the present invention.
- the fourth embodiment is different from the third embodiment in that two kinds of grounding cartridges 35 and 36 having different configurations are provided.
- the water treatment apparatus according to the fourth embodiment will be described with reference to FIGS.
- grounding cartridges 35a and 35b are attached in place of the grounding cartridges 25a and 25c shown in FIG. 5 in the third embodiment.
- ground cartridges 36a and 36b are attached in place of the ground cartridges 25b and 25d shown in FIG.
- the ground cartridge 35 includes an upstream insulator 38 a that is an insulating member that penetrates the lower surface of the ground electrode 28 and reaches the hollow portion 34, and a downstream insulator that is an insulating member provided on the lower surface of the ground electrode 28. 38b is provided.
- the wire electrode 37 is attached below the ground electrode 28 in parallel with the lower surface of the ground electrode 28 by the upstream insulator 38a and the downstream insulator 38b.
- a plurality of wire electrodes 37 are provided in the depth direction of the paper surface of FIG. 9 and are arranged so as to cover the lower surface of the ground electrode 28.
- the electric wire 31 communicates from the outside of the ground cartridge 35 through the current introduction terminal 30 to the hollow portion 34, and is connected to the wire electrode 27 through the upstream insulator 26a and to the wire electrode 37 through the upstream insulator 38a. Has been.
- the wire electrode 37 is held by being electrically insulated from the ground electrode 28 by the upstream insulator 38a and the downstream insulator 38b.
- the electric wire 31 is electrically insulated from the ground cartridge 35 by the current introduction terminal 30, the upstream insulator 26a, and the upstream insulator 38a.
- Other configurations are the same as those of the third embodiment.
- the grounding cartridge 36 includes only the grounding electrode 28 and the flange 29. That is, as compared with the ground cartridge 35, the ground cartridge 36 includes an upstream insulator 26a, a downstream insulator 26b, a wire electrode 27, a current introduction terminal 30, an electric wire 31, a wire electrode 37, an upstream insulator 38a, and a downstream insulator 38b. Not equipped.
- two grounding cartridges 35a and 35b arranged in the vertical direction are attached to the left side wall 16a of the processing tank 1.
- two grounding cartridges 36a and 36b arranged in the vertical direction are attached to the right side wall 16b of the processing tank 1.
- the ground cartridge 36a is disposed between the ground cartridges 35a and 35b, and the ground cartridge 35b is disposed between the ground cartridges 36a and 36b. That is, in the processing tank 1, the ground cartridge 35a, the ground cartridge 36a, the ground cartridge 35b, and the ground cartridge 36b are attached to the left and right in this order from top to bottom.
- the wire electrode 37 is disposed at substantially the center height of each gap formed by the ground cartridges 35a, 36a, 35b, and 36b.
- the electric wires 31 of the ground cartridges 35a and 35b are connected to a pulse power source (not shown), and the processing tank 1 is electrically grounded.
- the flanges 29 of the grounding cartridges 35 a and 35 b and the grounding cartridges 36 a and 36 b are electrically connected to the processing tank 1.
- the water to be treated 4 flows down from the top of the treatment tank 1 to the top surface of the ground electrode 28 of each of the ground cartridge 35a, the ground cartridge 36a, the ground cartridge 35b, and the ground cartridge 36b in the form of a water film. It is discharged from the department.
- the pulse power source is operated to form a discharge between the wire electrode 27 and the upper surface of the ground electrode 28 of the ground cartridge 35a. Further, a discharge is formed between the wire electrode 37 of the ground cartridge 35a and the lower surface of the ground electrode 28 of the ground cartridge 35a, and between the wire electrode 37 of the ground cartridge 35a and the upper surface of the ground electrode 28 of the ground cartridge 36a.
- Other operations are the same as those in the third embodiment.
- the fourth embodiment by supplying power to the electric wires 31 of the ground cartridges 35a and 35b, a discharge can be formed as in the third embodiment. Therefore, the electric wire for power feeding can be simplified and shortened as compared with the third embodiment.
- FIG. 11 is a cross-sectional view of a water treatment device according to Embodiment 5 of the present invention.
- the ground electrodes 44a, 44b, 44c and 44d are all the same shape and have a hollow structure.
- the bottom sides of the ground electrodes 44a, 44b, 44c, and 44d are connected to the side walls of the processing tank 1, and through holes that extend from the side walls of the processing tank 1 to the bottom sides of the ground electrodes 44a, 44b, 44c, and 44d.
- Certain connection ports 43a, 43b, 43c, and 43d are formed.
- a plurality of pores 46 which are through-holes are formed on the upper surface of each ground electrode 44a, 44b, 44c, 44d.
- An air inlet 41 is provided in the upper part of the treatment tank 1, and a circulation pipe 42 is connected to the air inlet 41.
- the circulation pipe 42 is provided with a circulation pump 40.
- the circulation pipe 42 is branched on the downstream side of the circulation pump 40 (opposite side of the intake port 41) to form circulation pipes 42a, 42b, 42c, and 42d. ing.
- circulation pipes 42a, 42b, 42c, and 42d are connected to the connection ports 43a, 43b, 43c, and 43d, respectively.
- Other configurations are the same as those of the second embodiment.
- the water to be treated 4 is supplied from the uppermost part of the treatment tank 1, flows down the respective upper surfaces of the ground electrodes 44 a, 44 b, 44 c, 44 d into the water film 3 and is discharged from the lowermost part of the treatment tank 1.
- the circulation pump 40 is operated, and the gas in the processing tank 1 is sucked from the suction port 41 and supplied to the connection ports 43a, 43b, 43c, and 43d.
- the circulating gas supplied to the connection ports 43a, 43b, 43c, 43d is discharged into the processing tank 1 through the respective pores 46 of the ground electrodes 44a, 44b, 44c, 44d.
- a part of the water film 3 of the water 4 to be treated flowing on the upper surfaces of the ground electrodes 44a, 44b, 44c, and 44d becomes water droplets 45 and is spouted upward.
- Other operations are the same as those in the second embodiment.
- the gas in the processing tank 1 is sucked by the circulation pump 40 and is discharged from the pores 46 formed in the ground electrodes 44a, 44b, 44c, 44d.
- a part of the water droplets 45 can be spouted up. For this reason, the contact with the to-be-processed water 4 and oxidizing particles, such as ozone generated by discharge and OH radical, is accelerated
- FIG. 12 is a cross-sectional view of a water treatment device according to Embodiment 6 of the present invention.
- FIG. 13 is an enlarged view showing two adjacent ground electrodes 2a and 2b shown in FIG. 12 according to the sixth embodiment of the present invention and their surroundings.
- the shapes of the ground electrodes 2a, 2b, 2c, and 2d and the discharge electrodes 47a, 47b, and 47c are different from those of the first embodiment. Therefore, the following description will be made with reference to FIGS. 12 and 13 focusing on these differences.
- the ground electrodes 2 a, 2 b, 2 c, and 2 d are arranged vertically in the processing tank 1.
- the ground electrodes 2a, 2b, 2c, and 2d are all flat plates having the same shape, and are inclined with respect to the horizontal plane.
- the two ground electrodes that are continuous in the vertical direction are arranged symmetrically with respect to the vertical plane with a predetermined interval in the vertical direction.
- the left end of FIG. 12 is connected to the left wall 16a of the processing tank 1, and the right end is held lower than the left end.
- the right end of the ground electrode 2b is connected to the right wall 16b of the processing tank 1, and the left end is held lower than the right end. The same applies to the ground electrodes 2c and 2d.
- a gap 50a is formed between the ground electrodes 2a and 2b
- a gap 50b is formed between the ground electrodes 2b and 2c
- a gap 50c is formed between the ground electrodes 2c and 2d.
- the gaps 50a, 50b, and 50c are provided with discharge electrodes 47a, 47b, and 47c, respectively. Therefore, a specific configuration of the discharge electrodes 47a, 47b, and 47c will be described with reference to FIG. 13, taking the discharge electrode 47a as an example.
- the discharge electrode 47a disposed in the gap 50a is composed of five ribbon-shaped electrodes (hereinafter referred to as ribbon electrodes) 51a, 51b, 51c, 51d, and 51e connected to the wiring 8a.
- the ribbon electrodes 51a, 51b, 51c, 51d, and 51e are vertically arranged in the order of 51a, 51b, 51c, 51d, and 51e from the right. Further, the ribbon electrode 51a is shortest in the vertical direction, and becomes longer in the order of 51b, 51c, 51d, and 51e.
- an upper gap 48a having a substantially uniform height is formed between the upper ends of the ribbon electrodes 51a, 51b, 51c, 51d, 51e and the lower surface of the ground electrode 2a.
- a lower gap 49a having a substantially uniform height is formed between the lower ends of the ribbon electrodes 51a, 51b, 51c, 51d, and 51e and the upper surface of the ground electrode 2b. Further, the upper gap 48a and the lower gap 49a have substantially the same height.
- upper gaps 48b and 48c and lower gaps 49b and 49c are formed for the other discharge electrodes 47b and 47c in FIG.
- Other configurations are the same as those of the first embodiment.
- the water to be treated 4 is supplied from the uppermost part of the treatment tank 1, flows down the respective upper surfaces of the ground electrodes 2 a, 2 b, 2 c, and 2 d into a water film 3 and is discharged from the lowermost part of the treatment tank 1.
- a pulse power supply (not shown) is operated and a pulse voltage is applied to the discharge electrodes 47a, 47b, 47c, whereby the upper discharges 52a, 52b, 52c, 52d, and 52e are formed.
- lower discharges 53a, 53b, 53c, 53d, and 53e are formed in the lower gap 49a.
- Other operations are the same as those in the first embodiment.
- the uniform-shaped wire electrodes 6a, 6b, 6c are formed by forming the gaps 5a, 5b, 5c having a uniform height between the ground electrodes 2a, 2b, 2c, 2d arranged vertically. , 6d, and 6e were used to form an upper discharge and a lower discharge.
- the heights of the gaps 50a, 50b, 50c expand in the flow direction of the water to be treated 4 flowing on the ground electrodes 2b, 2c, 2d, while the ribbon electrodes 51a, 51b, 51c,
- an upper gap 48a and a lower gap 49a having substantially uniform heights are formed.
- An upper discharge is formed in the upper gap 48a thus formed, and a lower discharge is formed in the lower gap 49a.
- the ground electrodes 2a, 2b, 2c, and 2d can be formed in a plate shape, and compared to the first to fifth embodiments, the material usage fee related to the ground electrode is reduced, and the device is reduced.
- the weight can be reduced.
- FIG. FIG. 14 is a cross-sectional view of a water treatment device according to Embodiment 7 of the present invention.
- the seventh embodiment is the same as the fifth embodiment except that the configurations of the ground electrodes 44a, 44b, 44c, and 44d are different.
- a plurality of upper pores 54 that are through holes are formed on the upper surfaces of the ground electrodes 44a, 44b, 44c, and 44d, and the lower surfaces of the ground electrodes 44a, 44b, and 44c are formed on the respective lower surfaces.
- a plurality of lower pores 55 that are through-holes are formed.
- Other configurations are the same as those of the fifth embodiment.
- the gas in the processing tank 1 sucked by the circulation pump 40 from the intake port 41 at the top of the processing tank 1 passes through the circulation pipes 42a, 42b, 42c, and 42d and enters the ground electrodes 44a, 44b, 44c, and 44d. Supplied and discharged from the upper pore 54 and the lower pore 55. Thereby, a part of the water film 3 of the water to be treated 4 flowing on the upper surfaces of the ground electrodes 44a, 44b, 44c, and 44d becomes water droplets 45, which are sprayed upward.
- the gas in the treatment tank 1 containing ozone and hydrogen peroxide is sprayed from the lower pore 55 onto the water droplet 45 and the water surface of the water film 3.
- Other operations are the same as those in the fifth embodiment.
- the gas in the processing tank 1 is sucked by the circulation pump 40 and discharged from the lower pores 55 formed on the lower surfaces of the ground electrodes 44a, 44b, 44c.
- Gas in the treatment tank 1 containing hydrogen oxide is sprayed on the water droplets 45 and the water surface of the water film 3.
- FIG. FIG. 15 is a cross-sectional view of a water treatment device according to Embodiment 8 of the present invention.
- the lower water film 56 is formed on the lower surface of each of the ground electrodes 2a, 2b, 2c, 2d, and the protrusions 58a, 58b are formed on the lower surfaces of the ground electrodes 2a, 2b, 2c, 2d.
- 58c, 58d are different from the first embodiment.
- the lower surfaces of the ground electrodes 2a, 2b, 2c, and 2d are hydrophilic.
- Protrusions 58a, 58b, 58c, and 58d are provided in the vicinity of the bottoms of the lower surfaces of the ground electrodes 2a, 2b, 2c, and 2d.
- Other configurations are the same as those of the first embodiment.
- the water to be treated 4 supplied to the treatment tank 1 flows down along the upper surface of the isosceles triangular prism-shaped ground electrode 2a. At the apex angle 57 of the ground electrode 2a, a part of the water to be treated 4 falls toward the ground electrode 2b, and the rest of the water to be treated 4 adheres to the lower surface of the ground electrode 2a due to surface tension. It flows down while forming the side water film 56.
- the lower water film 56 falls away from the lower surface of the ground electrode 2a by the protrusion 58a. Similarly, in the ground electrodes 2b, 2c, and 2d, a part of the water to be treated 4 flows down by forming a lower water film 56 so as to stick to the lower surfaces thereof. Other operations are the same as those in the first embodiment.
- the lower water film 56 is formed on the lower surface of each of the ground electrodes 2a, 2b, 2c, and 2d, and the water surface of the lower water film 56 serves as the upper discharge 11 (not shown). touch. Therefore, the area of the water to be treated 4 that is in contact with the discharge, compared with the first embodiment in which the water to be treated 4 flows down with only the water film 3 formed on the upper surfaces of the ground electrodes 2a, 2b, 2c, and 2d. Will increase.
- the bottom surfaces of the ground electrodes 2a, 2b, 2c, and 2d are made hydrophilic by forming them with a hydrophilic material, coating them with a hydrophilic material, or applying a hydrophilic treatment. Can do.
- a discharge is formed on the lower surfaces of the ground electrodes 2a, 2b, and 2c. Therefore, the ground electrodes 2a, 2b, 2b, 2b after a predetermined time due to the action of ozone generated by the discharge.
- the lower surface of 2c is hydrophilized.
- the protrusions 58a, 58b, 58c, and 58d are not always necessary.
- the projections 58a, 58b, 58c, and 58d are not provided, the water to be treated 4 that flows as the lower water film 56 flows down the left side wall 16a and the right side wall 16c of the processing tank.
- FIG. FIG. 16 is a cross-sectional view of a water treatment device according to Embodiment 9 of the present invention.
- the ninth embodiment is different from the previous sixth embodiment in the configuration of the discharge electrode.
- the ground electrodes 2 a, 2 b, 2 c, and 2 d are arranged vertically in the processing tank 1.
- the ground electrodes 2a, 2b, 2c, and 2d are of a flat plate type and are inclined with respect to the horizontal plane.
- the two ground electrodes that are continuous in the vertical direction are arranged symmetrically with respect to the vertical plane with a predetermined interval in the vertical direction. That is, the left end of FIG. 16 is connected to the left wall 16a of the processing tank 1, and the right end is held lower than the left end of the ground electrode 2a.
- ground electrode 2b is connected to the right wall 16b of the processing tank 1, and the left end is held lower than the right end. The same applies to the ground electrodes 2c and 2d.
- a gap 50a is formed between the ground electrodes 2a and 2b
- a gap 50b is formed between the ground electrodes 2b and 2c
- a gap 50c is formed between the ground electrodes 2c and 2d.
- the gap 50a is provided with an upper discharge electrode 59a and a lower discharge electrode 60a.
- the upper discharge electrode 59a is composed of a plurality (five in FIG. 16) of wire electrodes, and is arranged extending in the depth direction of the paper surface of FIG. Further, the five upper discharge electrodes 59a are arranged with an equal distance from the lower surface of the ground electrode 2a via the upper gap 48a.
- the lower discharge electrode 60a is composed of a plurality (five in FIG. 16) of wire electrodes, and is arranged extending in the depth direction of the paper surface of FIG. In addition, the five lower discharge electrodes 60a are arranged with an equal distance from the upper surface of the ground electrode 2b via the lower gap 49a.
- the upper discharge electrode 59b and the lower discharge electrode 60b are provided in the gap 50b between the ground electrodes 2b and 2c, and the upper discharge electrode 59c and the lower discharge electrode are provided in the gap 50c between the ground electrodes 2c and 2d. 60c are provided respectively.
- the upper discharge electrode 59a and the lower discharge electrode 60a are all connected to the wiring 8a.
- the upper discharge electrode 59b and the lower discharge electrode 60b are connected to the wiring 8b, and the upper discharge electrode 59c and the lower discharge electrode 60c are connected to the wiring 8a. 8c is connected.
- Other configurations are the same as those of the sixth embodiment.
- the positions of the upper discharge electrodes 59a, 59b, 59c and the lower discharge electrodes 60a, 60b, 60c can be determined independently. For this reason, the freedom degree at the time of forming a space
- the water treatment speed described in the present specification is determined as the amount of organic matter decomposed in the treated water 4 per unit time.
- the water treatment efficiency described in the present specification is determined as the amount of organic matter decomposed in the water to be treated 4 per unit input energy.
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Abstract
Description
図1は、本発明の実施の形態1による水処理装置の断面図である。また、図2は、本発明の実施の形態1の図1における隣接する2つの接地電極2a、2bとその周囲を示す拡大図である。以下、図1と図2を用いて、本実施の形態1における水処理装置について、詳細に説明する。
として形成されている。
e+O2→2O (1)
e+H2O→H+OH (2)
O+O2+M→O3 (3)
OH+OH→H2O2 (4)
R+(O、OH、O3、H2O2)→CO2+H2O (5)
O3→O3(l) (6)
H2O2→H2O2(l) (7)
O3(l)+H2O2(l)→OH(l) (8)
R+(O3(l)、H2O2(l)、OH(l))
→CO2+H2O (9)
図4は、本発明の実施の形態2に係る水処理装置の断面図である。本実施の形態2は、放電電極であるワイヤ電極21a、21b、21c、21dの配置が、先の実施の形態1と異なっている。
図5は、本発明の実施の形態3に係る水処理装置の断面図である。また、図6は、本発明の実施の形態3の図5に示した接地カートリッジ25の拡大断面図である。また、図7は、本発明の実施の形態3の水処理装置の組立て方法を示す断面図である。以下、図5~図7を用いて、本実施の形態3における水処理装置について説明する。
図8は、本発明の実施の形態4に係る水処理装置の断面図である。また、図9は、本発明の実施の形態4の図8に示した1種類目の接地カートリッジ35の拡大断面図である。また、図10は、本発明の実施の形態4の図8に示した2種類目の接地カートリッジ36の拡大断面図である。
図11は、本発明の実施の形態5に係る水処理装置の断面図である。図11において、接地電極44a、44b、44c、44dは、いずれも同形状であり、中空構造となっている。また、各接地電極44a、44b、44c、44dの底辺は、処理槽1の側壁に接続されており、処理槽1の側壁から各接地電極44a、44b、44c、44dの底辺に連なる貫通穴である接続口43a、43b、43c、43dが形成されている。また、各接地電極44a、44b、44c、44dの上面には、貫通孔である複数の細孔46が形成されている。
図12は、本発明の実施の形態6に係る水処理装置の断面図である。また、図13は、本発明の実施の形態6の図12に示した隣接する2つの接地電極2a、2bとその周囲を示す拡大図である。本実施の形態6は、接地電極2a、2b、2c、2dと、放電電極47a、47b、47cの形状が、先の実施の形態1と異なる。そこで、図12と図13を用いて、これらの相違点を中心に、以下に説明する。
図14は、本発明の実施の形態7に係る水処理装置の断面図である。本実施の形態7は、接地電極44a、44b、44c、44dの構成が異なる点を除き、実施の形態5と同様である。
図15は、本発明の実施の形態8に係る水処理装置の断面図である。本実施の形態8は、接地電極2a、2b、2c、2dのそれぞれの下面に下側水膜56が形成され、かつ接地電極2a、2b、2c、2dのそれぞれの下面に、突起58a、58b、58c、58dが備えられている点が、先の実施の形態1と異なる。
図16は、本発明の実施の形態9に係る水処理装置の断面図である。本実施の形態9は、先の実施の形態6と比べて、放電電極の構成が異なる。図16において、接地電極2a、2b、2c、2dは、処理槽1の内部に上下に並べて配置されている。接地電極2a、2b、2c、2dは、平板型であり、水平面に対して傾斜して配置されている。
Claims (14)
- 処理槽の内部に上下方向に並べて配置された複数の接地電極と、
前記上下方向において連続する2つの接地電極の、上側の接地電極の下面と、下側の接地電極の上面との間のそれぞれに形成された空隙に設けられた複数の放電電極と
を備え、
前記複数の接地電極は、前記上下方向において連続する2つの接地電極の上面が、水平面に対して交互に逆方向に傾斜するように配置されており、
前記複数の放電電極のそれぞれは、電圧が印加されることで、前記上側の接地電極の下面と放電電極との間の気中に第1の放電を形成し、前記下側の接地電極の上面と放電電極との間の気中に第2の放電を形成し、
前記処理槽の上部から供給された被処理水を、最上部の接地電極から最下部の接地電極まで、それぞれの上面に沿って連続的に流下させることで、前記被処理水を処理する
水処理装置。 - 前記空隙は、前記被処理水が流下する領域において、前記上下方向において連続する2つの接地電極間に均一に形成されている
請求項1に記載の水処理装置。 - 前記空隙は、
前記接地電極の上面と前記放電電極との間に形成された下方空隙と、
前記接地電極の下面と前記放電電極との間に形成された上方空隙と
で構成され、
前記下方空隙および前記上方空隙は、それぞれ均一な高さで形成されている
請求項1に記載の水処理装置。 - 前記複数の接地電極のそれぞれは、三角柱型である
請求項1から3のいずれか1項に記載の水処理装置。 - 前記複数の接地電極のそれぞれは、二等辺三角柱型である
請求項1から3のいずれか1項に記載の水処理装置。 - 前記被処理水は、前記接地電極の下面に沿って流下する
請求項4または5に記載の水処理装置。 - 接地電極とフランジを有して構成された接地カートリッジを複数備え、
前記処理槽の外周壁の前記上下方向に渡って形成された複数の開口部のそれぞれに前記複数の接地カートリッジのそれぞれを挿入し、前記フランジと前記処理槽を締結することで、前記処理槽の内部に前記複数の接地電極が形成されている
請求項1から6のいずれか1項に記載の水処理装置。 - 前記複数の放電電極のそれぞれは、絶縁部材を介して前記複数の接地電極のそれぞれに保持されている
請求項1から7のいずれか1項に記載の水処理装置。 - 前記複数の放電電極のそれぞれは、絶縁部材を介して前記処理槽の外周壁に接続されている
請求項1から7のいずれか1項に記載の水処理装置。 - 前記複数の放電電極のそれぞれは、前記複数の接地電極のそれぞれの内部を通る配線により給電される
請求項1から9のいずれか1項に記載の水処理装置。 - 前記複数の接地電極のそれぞれは、中空構造であり、上面には貫通孔が形成されており、前記中空構造内に供給された酸素を含むガスが前記貫通孔を通って前記処理槽内に吐出される構造を有する
請求項1から10のいずれか1項に記載の水処理装置。 - 前記複数の接地電極のそれぞれは、中空構造であり、下面には貫通孔が形成されており、前記中空構造内に供給された酸素を含むガスが前記貫通孔を通って前記処理槽内に吐出される構造を有する
請求項1から11のいずれか1項に記載の水処理装置。 - 前記複数の接地電極のそれぞれは、平板型であり、
前記複数の放電電極のそれぞれは、長手面が前記上下方向に配置されたリボン形状の電極である
請求項1に記載の水処理装置。 - 処理槽の内部に上下方向に並べて配置された複数の接地電極と、
前記上下方向において連続する2つの接地電極の、上側の接地電極の下面と、下側の接地電極の上面との間のそれぞれに形成された空隙に設けられた複数の放電電極と
を備え、
前記複数の接地電極は、前記上下方向において連続する2つの接地電極の上面が、水平面に対して交互に逆方向に傾斜するように配置されている水処理装置に適用される水処理方法であって、
前記複数の放電電極のそれぞれに電圧を印加することで、前記上側の接地電極の下面と放電電極との間の気中に第1の放電を形成する工程と、
前記複数の放電電極のそれぞれに電圧を印加することで、前記下側の接地電極の上面と放電電極との間の気中に第2の放電を形成する工程と、
前記処理槽の上部から供給された被処理水を、最上部の接地電極から最下部の接地電極まで、それぞれの上面に沿って連続的に流下させ、前記第1の放電および前記第2の放電が形成された前記空隙を通過させることで、前記被処理水を処理する工程と
を有する水処理方法。
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