WO2016067422A1 - キャリア付銅箔及びそれを用いたプリント配線板の製造方法 - Google Patents
キャリア付銅箔及びそれを用いたプリント配線板の製造方法 Download PDFInfo
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- WO2016067422A1 WO2016067422A1 PCT/JP2014/078959 JP2014078959W WO2016067422A1 WO 2016067422 A1 WO2016067422 A1 WO 2016067422A1 JP 2014078959 W JP2014078959 W JP 2014078959W WO 2016067422 A1 WO2016067422 A1 WO 2016067422A1
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- layer
- carrier
- copper foil
- protective layer
- bonding
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/043—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
- B32B7/14—Interconnection of layers using interposed adhesives or interposed materials with bonding properties applied in spaced arrangements, e.g. in stripes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2311/00—Metals, their alloys or their compounds
- B32B2311/12—Copper
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
Definitions
- the present invention relates to a copper foil with a carrier and a method for producing a printed wiring board using the same.
- multilayered printed wiring boards have been widely used.
- Such a multilayer printed wiring board is used for the purpose of weight reduction and size reduction in many portable electronic devices.
- the multilayer printed wiring board is required to further reduce the thickness of the interlayer insulating layer and further reduce the weight of the wiring board.
- a method of manufacturing a printed wiring board to be multilayered after forming a wiring layer directly on an ultrathin metal layer has been proposed, one of which is a manufacturing method using a coreless build-up method Is adopted.
- this coreless buildup method it has been proposed to use a copper foil with a carrier foil for peeling between the support substrate and the multilayer printed wiring board.
- a copper foil with a carrier foil comprising at least four layers of copper foil layer / peeling layer / heat-resistant metal layer / carrier foil is used.
- a support substrate is obtained by laminating an insulating layer constituent material (coreless support) on the surface of the carrier foil of the foil, and a build-up wiring layer is formed on the surface of the copper foil layer of the copper foil with carrier foil of the support substrate.
- a method for producing a multilayer printed wiring board in which a support substrate with an up wiring layer is obtained, and this is separated by a release layer to obtain a multilayer laminated board, and a multilayer printed wiring board is obtained by performing necessary processing on the multilayer laminated board Has been.
- 2012-094840 discloses a multilayer metal foil in which a first carrier metal foil, a second carrier metal foil, and a base metal foil are laminated in this order. Even if foreign matter such as resin powder adheres to the surface of the foil, the surface of the second carrier metal foil free from the influence of foreign matter is formed by peeling the first carrier metal foil from the second carrier metal foil. It is supposed to be possible. The first carrier metal foil and the second carrier metal foil are bonded to each other through a release layer so as to be physically peelable.
- the present inventors are now bonded to the ultrathin copper layer at least at one bonding portion on the ultrathin copper layer of the carrier-attached copper foil, and are not bonded to the ultrathin copper layer in other regions.
- a protective layer By providing a protective layer, foreign matter can be prevented from adhering to the surface of the ultra-thin copper layer in the production of printed wiring boards (for example, coreless methods), and scratches and roughened surfaces of the ultra-thin copper layer can be prevented when peeling off the protective layer. The knowledge that crushing can be prevented was obtained. Also, if the adhesive layer with the protective layer is cut off, the protective layer can be peeled off with zero peel strength, and no residue remains on the surface of the ultrathin copper layer after the protective layer is peeled off. The knowledge of was also obtained.
- the object of the present invention is to prevent foreign matter from adhering to the surface of the ultrathin copper layer in the production of a printed wiring board (for example, coreless method) and to scratch or roughen the ultrathin copper layer when the protective layer is peeled off.
- An object of the present invention is to provide a copper foil with a carrier that can prevent crushing of the surface and does not leave any residue on the surface of the ultrathin copper layer after the protective layer is peeled off.
- a carrier-attached copper foil comprising a carrier layer, a release layer and an ultrathin copper layer in this order
- the copper foil with carrier further comprises a protective layer on the ultrathin copper layer, Copper foil with carrier, wherein the protective layer is bonded to the ultrathin copper layer at at least one protective layer bonding portion, and is not bonded to the ultrathin copper layer in a region other than the protective layer bonding portion Is provided.
- a printed wiring board manufacturing method (A) a step of laminating a copper foil with a carrier according to the above aspect of the present invention on one or both sides of a coreless support, and forming a laminate; (B) cutting the portion corresponding to the region in the vicinity of the outer periphery of the carrier-attached copper foil including the protective layer adhesion portion; (C) peeling the protective layer from the copper foil with carrier to expose the ultrathin copper layer; (D) forming a buildup wiring layer on the ultrathin copper layer to produce a laminate with a buildup wiring layer; (F) separating the laminate with a buildup wiring layer by the release layer to obtain a multilayer wiring board including the buildup wiring layer; (G) processing the multilayer wiring board to obtain a printed wiring board; A method is provided comprising:
- FIG. 1 An example schematic perspective view of a copper foil with carrier of the present invention is shown in the copper foil Figure 1 with a carrier.
- the copper foil 10 with a carrier shown in FIG. 1 includes a carrier layer 12, a release layer 14, and an ultrathin copper layer 16 in this order.
- the carrier-attached copper foil 10 further includes a protective layer 18 on the ultrathin copper layer 16. Due to the presence of the protective layer 18, foreign matter on the surface of the ultrathin copper layer 16 when the coreless support is laminated on the surface of the carrier layer 12 (typically, resin powder derived from the coreless support (prepreg, etc.)) Can be effectively prevented.
- the environment in which the coreless support is laminated is an environment where there is a lot of scattered matter from prepreg and the like, and the cleanliness is low, and static electricity is likely to be generated due to the friction of the cushioning member.
- the lamination process of the coreless support is a process in which foreign matters such as resin powder and cylinder lubricant are generated and easily adhere to the surface of the ultrathin copper layer, that is, the surface of the ultrathin copper layer is easily contaminated. If such foreign matter (especially organic foreign matter) is present on the surface of the ultrathin copper layer 16, when the circuit is formed on the ultrathin copper layer, plating of the portion where the foreign matter adheres becomes insufficient.
- the use of the copper foil with a carrier of the present invention prevents foreign matter from adhering to the ultrathin copper layer 16 by the protective layer 18.
- a circuit can be formed.
- the protective layer 18 is bonded to the ultrathin copper layer 16 at at least one protective layer bonding portion 20 and is not bonded to the ultrathin copper layer 16 in the region 22 other than the protective layer bonding portion 20. .
- the protective layer 18 is locally adhered to the ultrathin copper layer 16 only at the protective layer adhesion portion 20 to form the protective layer non-adhesive region 22, so that the protective layer 18 is protected to the minimum necessary adhesion region (protection).
- the other protective layer non-adhesion region 22 eliminates as much as possible the factors that deteriorate the surface state of the ultrathin copper layer 16 Can do.
- the ultrathin copper layer 16 is not in close contact with the protective layer 18 in the protective layer non-adhesion region 22, it is possible to prevent scratches on the ultrathin copper layer 16 and crushing of the roughened surface when the protective layer 18 is peeled off. Further, since there is no intermediate layer providing a peeling strength such as a peeling layer between the ultrathin copper layer 16 and the protective layer 18 in the protective layer non-bonding region 22, the protective layer 18 only needs to be excised. Can be peeled from the ultrathin copper layer 16 with zero peel strength. For this reason, since a residue (such as the intermediate layer) does not remain on the surface of the ultrathin copper layer after the protective layer is peeled off, subsequent processing is facilitated.
- a residue such as the intermediate layer
- the present invention it is possible to prevent foreign matter from adhering to the surface of the ultrathin copper layer in the production of a printed wiring board (for example, a coreless method), and scratches of the ultrathin copper layer when the protective layer is peeled off. It is possible to provide a copper foil with a carrier that can prevent the roughened surface from being crushed and that no residue remains on the surface of the ultrathin copper layer after the protective layer is peeled off.
- the carrier layer 12 is a layer (typically a foil) for supporting an ultrathin copper layer and improving its handleability.
- the carrier layer include an aluminum foil, a copper foil, a stainless steel (SUS) foil, a resin film whose surface is metal-coated, and the like, preferably a copper foil.
- the copper foil may be a rolled copper foil or an electrolytic copper foil.
- the thickness of the carrier layer is typically 250 ⁇ m or less, preferably 12 ⁇ m to 200 ⁇ m.
- the release layer 14 has a function of weakening the peeling strength of the carrier foil, ensuring stability of the strength, and further suppressing interdiffusion that may occur between the carrier foil and the copper foil during press molding at a high temperature.
- the release layer is generally formed on one side of the carrier foil, but may be formed on both sides.
- the release layer may be either an organic release layer or an inorganic release layer. Examples of organic components used in the organic release layer include nitrogen-containing organic compounds, sulfur-containing organic compounds, carboxylic acids and the like. Examples of nitrogen-containing organic compounds include triazole compounds, imidazole compounds, and the like. Among these, triazole compounds are preferred in terms of easy release stability.
- triazole compounds examples include 1,2,3-benzotriazole, carboxybenzotriazole, N ′, N′-bis (benzotriazolylmethyl) urea, 1H-1,2,4-triazole and 3-amino- And 1H-1,2,4-triazole.
- sulfur-containing organic compound examples include mercaptobenzothiazole, thiocyanuric acid, 2-benzimidazolethiol and the like.
- carboxylic acid examples include monocarboxylic acid and dicarboxylic acid.
- examples of inorganic components used in the inorganic release layer include Ni, Mo, Co, Cr, Fe, Ti, W, P, Zn, and a chromate-treated film.
- the release layer may be formed by bringing a release layer component-containing solution into contact with at least one surface of the carrier foil and fixing the release layer component to the surface of the carrier foil.
- this contact may be performed by immersion in the release layer component-containing solution, spraying of the release layer component-containing solution, flowing down of the release layer component-containing solution, or the like.
- the release layer component may be fixed to the surface of the carrier foil by drying the release layer component-containing solution, electrodeposition of the release layer component in the release layer component-containing solution, or the like.
- the thickness of the release layer is typically 1 nm to 1 ⁇ m, preferably 5 nm to 500 nm.
- the peel strength between the release layer 14 and the carrier foil is preferably 7 gf / cm to 50 gf / cm, more preferably 10 gf / cm to 40 gf / cm, and more preferably 15 gf / cm to 30 gf / cm.
- the ultrathin copper layer 16 may be a known configuration employed for an ultrathin copper foil with a carrier and is not particularly limited.
- the ultrathin copper layer 16 may be formed by a wet film formation method such as an electroless copper plating method and an electrolytic copper plating method, a dry film formation method such as sputtering and chemical vapor deposition, or a combination thereof.
- the preferable thickness of the ultrathin copper layer 16 is 0.05 ⁇ m to 7 ⁇ m, more preferably 0.075 ⁇ m to 5 ⁇ m, and still more preferably 0.09 ⁇ m to 4 ⁇ m.
- the ultrathin copper layer 16 is preferably provided with a rough surface on the surface on the protective layer side.
- the adhesiveness with the metal layer and resin layer at the time of printed wiring board manufacture can be improved.
- the arithmetic average roughness Ra measured according to JIS B 0601 (2001) of the rough surface is preferably 50 nm or more, more preferably 50 to 1000 nm, and still more preferably 80 to 800 nm.
- the ultrathin copper layer 16 is the protective layer 18 in the protective layer non-adhesive region 22. Therefore, the rough surface of the ultrathin copper layer 16 can be prevented from being crushed when the protective layer 18 is peeled off. In this way, it is possible to prevent foreign matters from adhering to the surface of the ultrathin copper layer 16 while maintaining a desirable rough surface form.
- another functional layer may be provided between the peeling layer 14 and the carrier layer 12 and / or the ultrathin copper layer 16.
- An example of such another functional layer is an auxiliary metal layer.
- the auxiliary metal layer is preferably made of nickel and / or cobalt. By forming such an auxiliary metal layer on the surface side of the carrier layer 12 and / or the surface side of the ultrathin copper layer 16, the carrier layer 12 and the ultrathin copper layer 16 can be formed during high-temperature or long-time hot press molding. Interdiffusion that can occur between the two is suppressed, and the stability of the peeling strength of the carrier layer can be ensured.
- the thickness of the auxiliary metal layer is preferably 0.001 to 3 ⁇ m.
- the protective layer 18 is not particularly limited as long as it covers the surface of the ultrathin copper layer 16 and can prevent adhesion of foreign matters, but a metal foil or a resin film is preferable in terms of good handling properties, and a metal foil is more preferable. preferable.
- the surface of the metal foil or resin film may be subjected to antistatic treatment. Further, it is desirable that no adhesive is applied to the surface of the protective layer 18 in order to secure the protective layer non-adhesive region 22.
- the protective layer 18 is a metal foil
- examples of the metal foil include an aluminum foil, an iron foil, a stainless steel (SUS) foil, a titanium foil, and a copper foil.
- the protective layer 18 is extremely thin from the viewpoint of handling properties when the protective layer 18 is peeled off.
- Aluminum foil, iron foil, stainless steel (SUS) foil, and titanium foil which are metal foils having a specific gravity lower than that of copper constituting the copper layer 16, are preferable. More preferably, an aluminum foil that is a metal foil having a lower elastic modulus than copper constituting the ultrathin copper layer 16 is particularly preferable because it does not damage the surface of the ultrathin copper layer 16.
- the thickness of the protective layer 18 is preferably 10 to 300 ⁇ m, more preferably 12 to 200 ⁇ m, and still more preferably 15 to 100 ⁇ m.
- the surface of the protective layer 18 facing the ultrathin copper layer 16 is handled in order to prevent the surface of the ultrathin copper layer 16 from being damaged by friction with the surface of the ultrathin copper layer 16 in contact with the surface. It is desirable to be smooth to the extent that no slippage occurs.
- the surface of the protective layer 18 preferably has an arithmetic average roughness Ra measured in accordance with JIS B 0601 (2001) of 400 nm or less, more preferably 20 to 350 nm, and even more preferably. Is 30 to 320 nm.
- the surface of the protective layer 18 on the side not facing the ultrathin copper layer 16 is also in the arithmetic average roughness range in terms of preventing generation of foreign matters due to friction during packaging of the copper foil with a carrier.
- the protective layer 18 is bonded to the ultrathin copper layer 16 at at least one protective layer bonding portion 20, and is not bonded to the ultrathin copper layer 16 in the protective layer non-bonding region 22 other than the protective layer bonding portion 20. . Since the protective layer bonding portion 20 is cut off when the printed wiring board is manufactured, the carrier-attached copper is used so that the widest possible protective layer non-bonding region 22 can be secured and the region where the build-up wiring layer can be formed can be maximized. It is preferable to provide a desired shape, desirably a linear shape and / or a dotted shape, near the outer periphery of the foil.
- the protective layer bonding portion 20 By providing the protective layer bonding portion 20 in a linear shape and / or a dot shape, the protective layer 18 can be bonded to the ultrathin copper layer 16 with a minimum bonding area as close to the outer periphery as possible.
- the protective layer bonding portion 20 is preferably provided in the vicinity of at least two opposite sides constituting the outer periphery of the carrier-attached copper foil 10 in order to prevent the protective layer 18 from turning up from one side. May be provided in the vicinity. In the case of being provided in the vicinity of the four sides, the linear or dotted protective layer bonding portion 20 in the vicinity of the four sides may be formed so as to exhibit a frame-like or cross-shaped outline as a whole.
- the protective layer bonding portion 20 may be formed on the outer edge of the ultrathin copper layer itself, or as shown in FIGS. 1 and 3, the protective layer bonding portion 20 is formed of the ultrathin copper layer.
- the bonding width is preferably 0.05 to 10 mm, more preferably 0.1 to 8 mm, and still more preferably 0.2 to 6 mm.
- Adhesion in the protective layer bonding part 20 is not particularly limited as long as the protective layer 18 and the ultrathin copper layer 16 can be bonded so that they are not easily peeled off, but ultrasonic bonding, laser bonding, seam bonding, and adhesive application It is preferably performed by at least one selected from the group consisting of: ultrasonic bonding in that it can be reliably and efficiently welded while applying a load. As shown schematically in FIG. 4, ultrasonic bonding (also referred to as ultrasonic welding) is performed by connecting a bonding object 100 made of two or more materials, a hard wall 102, an ultrasonic transmission terminal (horn) 104, and the like.
- the ultrasonic vibration can be transmitted to the joining object 100 while applying a load L (pressure) to the ultrasonic transmission terminal 104.
- the joining is realized by alloying the joining interface by locally reaching a high temperature of several hundred to 1000 ° C. at the maximum point of the ultrasonic amplitude.
- Various conditions used for ultrasonic bonding are not particularly limited, but the ultrasonic frequency is preferably 5 to 100 KHz, more preferably 10 to 80 KHz.
- the output is preferably 100 to 5000 W, more preferably 200 to 4000 W.
- the load (pressing force) is preferably 0.05 to 500 MPa, more preferably 0.5 to 300 MPa, and more preferably 1 to 100 MPa. Further, the bonding effect is enhanced by performing ultrasonic bonding at a high frequency.
- the carrier layer 12 is adhered to the ultrathin copper layer 16 at least at one carrier layer adhesion portion 24 so that it is less likely to be peeled off than the region 26 (carrier layer non-adhesion region 26) other than the carrier layer adhesion portion 24.
- the carrier layer adhesion portion 24 it is possible to prevent the chemical solution from penetrating between the carrier layer 12 and the ultrathin copper layer 16 when forming the build-up wiring. If permeation into such a chemical solution is allowed at the time of build-up wiring formation, peeling of the copper foil with carrier foil may be promoted, which may lead to a decrease in manufacturing yield. In this respect, such a problem can be avoided or reduced by providing the carrier layer bonding portion 24.
- the end face of the copper foil with a carrier is masked with a tape or the like to prevent the penetration of the chemical solution, but by providing the carrier layer bonding portion 24, such complicated masking is not required.
- the manufacturing process can be simplified.
- the carrier layer adhesion portion 24 and masking according to this embodiment may be used in combination.
- the carrier layer bonding portion 24 does not overlap the protective layer bonding portion 20 and is provided in a region inside the region 22 surrounded by the protective layer bonding portion 20. It is preferred that By doing so, the protective layer adhesive portion 20 can be excised while leaving at least a part of the carrier layer adhesive portion 24 located in the inner region, so that the protective layer adhesive portion 20 and the protective layer 18 are removed. Even in the state, the effect of preventing the penetration of the drug by the carrier layer adhesion portion 24 can be obtained with certainty.
- the carrier layer bonding portion 24 is provided in an elongated shape in the vicinity of two or four sides that constitute the outer periphery of the carrier-attached copper foil 10.
- the carrier layer bonding portion 24 is provided in a long shape in the vicinity of the four sides, and more preferably in a long shape in the vicinity of the four sides, rather than only two opposite sides constituting the outer periphery.
- the four carrier layer bonding portions 24 provided are in contact with each other or intersect to form a frame-like or cross-beam-like region. According to this configuration, it is possible to more reliably prevent the chemical liquid from entering the carrier layer 12 and the ultrathin copper layer 16.
- the vicinity of the side constituting the outer periphery of the carrier-attached copper foil with respect to the carrier layer bonding portion 24 is desirably a region inside the region 22 surrounded by the protective layer bonding portion 20, and preferably an ultrathin copper layer. Is an area 1 to 50 mm inside from the outer edge, more preferably an area 2 to 40 mm inside from the outer edge, and further preferably an area inside 3 to 30 mm.
- the bonding width is preferably 0.05 to 10 mm, more preferably 0.1 to 8 mm, and still more preferably 0.2 to 6 mm.
- Adhesion in the carrier layer adhesion portion 24 is not particularly limited as long as it is performed by a technique that can reliably adhere the carrier layer 12 and the ultrathin copper layer 16, but at least selected from the group consisting of ultrasonic bonding, laser bonding, and seam bonding. It is preferable to use any one of them, and ultrasonic bonding is particularly preferable in that it can be reliably and efficiently welded while applying a load. Details of the ultrasonic bonding are as described above.
- the protective layer bonding portion 20 may overlap a part of the carrier layer bonding portion 24.
- This configuration is a configuration that can be realized at the same time when the protective layer bonding portion 20 is formed by bonding such as ultrasonic bonding, laser bonding, or seam bonding. That is, according to these joining methods, by appropriately setting the matching conditions, the protective layer 18 and the ultrathin copper layer 16 are joined (that is, the protective layer adhesion portion 20 is formed), the carrier layer 12 and the ultrathin copper layer 16. (That is, formation of the carrier layer adhesion portion 24) can be realized at the same time. In this case, since the adhesive is not used, there is an advantage that it is not necessary to consider the area where the adhesive spreads.
- the protective layer bonding portion 20 is integrated with the carrier layer bonding portion 24, the carrier layer 12 is less likely to be peeled from the integrated product even when the carrier-attached copper foil is bent or complicatedly handled. In addition, there is an advantage of excellent handling resistance.
- FIG. 5 An example of a preferable method for producing the carrier-attached copper foil 10 having not only the protective layer adhesion part 20 but also the carrier layer adhesion part 24 is shown in FIG.
- a copper foil 11 with a carrier without a protective layer is prepared as shown in FIG. 5 (A), and ultrasonic bonding or the like is performed as shown in FIG. 5 (B).
- the carrier layer 12 is extremely thin so that the four carrier layer bonding portions 24 provided in the vicinity of the four sides of the outer edge cross each other to form a frame-shaped or cross-shaped region. Adhere to the copper layer 16.
- FIG. 5 An example of a preferable method for producing the carrier-attached copper foil 10 having not only the protective layer adhesion part 20 but also the carrier layer adhesion part 24 is shown in FIG.
- FIG. 5 An example of a preferable method for producing the carrier-attached copper foil 10 having not only the protective layer adhesion part 20 but also the carrier layer adhesion part 24 is shown in FIG.
- the protective layer 18 is placed on the copper foil 11 with a carrier without a protective layer in which the carrier layer adhesion portion 24 is formed.
- the protective layer bonding portion 20 is provided in the vicinity of at least two opposite sides constituting the outer periphery of the carrier-attached copper foil 10 by using an adhesion method such as ultrasonic bonding. It is preferable to adhere the protective layer 18 to the ultrathin copper layer 16 as described. At this time, it is preferable that at least a part of the carrier layer bonding portion 24 is provided in a region inside the region 22 that does not overlap the protective layer bonding portion 20 and is surrounded by the protective layer bonding portion 20.
- the protective layer adhesive portion 20 can be excised while leaving at least a part of the carrier layer adhesive portion 24 located in the inner region, so that the protective layer adhesive portion 20 and the protective layer 18 are removed. Even in the state, the effect of preventing the penetration of the drug by the carrier layer adhesion portion 24 can be obtained with certainty.
- the carrier layer 12 and the ultrathin copper layer 16 be bonded in a region immediately below the protective layer bonding portion 20 to constitute a part of the carrier layer bonding portion 24. It can be formed at the same time when the protective layer adhesion portion 20 is formed by the joining technique.
- FIG. 8 shows a process of forming the carrier layer adhesion portion 24 and bonding the protection layer 18 (that is, formation of the protection layer adhesion portion 20) by ultrasonic bonding to the copper foil 11 with no protection layer drawn out from the roll by ultrasonic bonding.
- An example of is shown.
- the copper foil 11 with a carrier without a protective layer drawn out from a roll is formed into a long shape parallel to and perpendicular to the transport direction by ultrasonic bonding (that is, a cross beam).
- the carrier layer bonding portion 24 is formed.
- a protective layer 18 (for example, an aluminum foil) is placed on the ultrathin copper layer 16, and ultrasonic waves are linearly formed near both ends of the long copper foil with carrier.
- the protective layer adhesion part 20 is formed by joining. In this way, the long copper foil with a carrier provided with the protective layer 18 is cut at the center of the carrier layer bonding portion 24 formed in the foil width direction, and the sheet piece shape as shown in FIG. The copper foil 10 with a carrier is obtained.
- a carrier layer adhesion portion 24 is formed in a frame shape in parallel with these sides in the vicinity of the four sides constituting the outer periphery, and the frame-shaped carrier layer adhesion portion A protective layer bonding portion 20 is formed in the vicinity of the two opposite sides outside 24.
- the carrier layer bonding portion 24 includes a form in which the bonding portion between the carrier layer and the ultrathin copper layer is formed not only on one side but also on a plurality of sides in parallel.
- a printed wiring board can be preferably manufactured using the copper foil with a carrier of this invention mentioned above.
- a printed wiring board is manufactured by (a) laminating a copper foil with a carrier according to the present invention on one or both sides of a coreless support, and (b) including a protective layer adhesive portion. A portion corresponding to the region near the outer periphery of the foil is excised, (c) the protective layer is peeled off from the copper foil with carrier to expose the ultrathin copper layer, and (d) a build-up wiring layer is formed on the ultrathin copper layer.
- the printed wiring board can be manufactured by a technique that can prevent the crushing of the roughened surface and that does not leave a residue on the surface of the ultrathin copper layer after the protective layer is peeled off.
- FIGS. 6 and 7 are drawn so as to form the build-up wiring layer 36 by providing the carrier-attached copper foil 10 on one side of the coreless support 28 for simplicity of explanation. It is desirable to provide the copper foil 10 with a carrier on both surfaces of the support 28 and form the build-up wiring layer 36 on both surfaces.
- the copper foil with carrier 10 according to the above-described aspect of the present invention is laminated on one side or both sides of the coreless support.
- This lamination may be performed in accordance with known conditions and techniques adopted for lamination of copper foil and prepreg in a normal printed wiring board manufacturing process.
- the coreless support 28 typically comprises a resin, preferably an insulating resin.
- the coreless support 28 is preferably a prepreg and / or a resin sheet, more preferably a prepreg.
- the prepreg is a general term for composite materials in which a base material such as a synthetic resin plate, a glass plate, a glass woven fabric, a glass nonwoven fabric, and paper is impregnated with a synthetic resin.
- a base material such as a synthetic resin plate, a glass plate, a glass woven fabric, a glass nonwoven fabric, and paper
- the insulating resin impregnated in the prepreg include epoxy resin, cyanate resin, bismaleimide triazine resin (BT resin), polyphenylene ether resin, phenol resin and the like.
- the insulating resin that constitutes the resin sheet include insulating resins such as epoxy resins, polyimide resins, and polyester resins.
- the coreless support 28 may contain filler particles composed of various inorganic particles such as silica and alumina from the viewpoint of improving the insulating properties.
- the thickness of the coreless support 28 is not particularly limited, but is preferably 3 to 1000 ⁇ m, more preferably 5 to 400
- a build-up wiring layer 36 is formed on the ultrathin copper layer 16 to produce a laminate with a build-up wiring layer.
- the first wiring layer 30, the insulating layer 32, and the second wiring layer 34 are sequentially formed on the ultrathin copper layer 16 to build up the wiring layer. 36.
- the first wiring layer 30 is formed by a pattern plating method.
- the method for forming the build-up layer after the second wiring layer 34 is not particularly limited. Subtractive methods, MSAP (modified semi-additive process) methods, SAP (semi-additive) methods, full-additive methods, and the like are available. It can be used.
- a wiring pattern can be formed.
- the carrier-attached copper foil has the carrier layer adhesion portion 24, it is possible to prevent the chemical solution from penetrating between the carrier layer 12 and the ultrathin copper layer 16 when forming the build-up wiring.
- the above process is repeated as necessary to obtain a laminate with a build-up wiring layer.
- This process may be repeated until a desired number of build-up wiring layers are formed.
- solder resist, bumps for mounting such as pillars, and the like may be formed on the outer layer surface.
- an outer layer wiring pattern may be formed on the outermost layer surface of the build-up wiring layer in the subsequent multilayer wiring board processing step (g).
- the step (d) preferably includes a step of directly forming the wiring (first wiring layer 30) on the surface of the ultrathin copper layer.
- the surface of the ultrathin copper layer 16 is coated with a plating resist or the like to cover a portion other than the portion where the wiring is to be formed, from the copper or the like.
- a wiring pattern may be formed and used in advance.
- a wiring pattern made of gold, tin, nickel, or the like may be formed in advance at a site where wiring is formed.
- This step (e) is an optional step of cutting the carrier layer adhesion portion 24 performed between the step (d) and the step (f) when the copper foil with carrier 10 has the carrier layer adhesion portion 24.
- This step (e) at least a part of the carrier layer bonding portion 24 does not overlap the protective layer bonding portion 20 and is provided in a region inside the region surrounded by the protective layer bonding portion 20. Therefore, it is a requirement that the portion to be cut out in the step (b) is a portion outside the carrier layer bonding portion 24.
- the laminated body with the buildup wiring layer is cut at a position inside the carrier layer bonding portion 24, and thereby a portion corresponding to the region in the vicinity of the outer periphery of the copper foil with the carrier is cut out.
- region including the carrier layer adhesion part 24 is cut out from the laminated body with a buildup wiring layer, and the cross section of the carrier layer non-adhesion area
- the build-up wiring layer 36 in the step (d) is formed in a region inside the carrier layer adhesion portion 24.
- step (F) Separation of Laminated Body with Buildup Wiring Layer In this step (f), as shown in FIG. 7 (E), the laminated body with buildup wiring layer is separated by the release layer 14 and the buildup wiring layer 36 is separated. A multilayer wiring board 38 including is obtained. Separation at the interface between the ultrathin copper layer 16 and the release layer 14 can be performed by peeling off the ultrathin copper layer 16 and / or the carrier layer 12.
- the multilayer wiring board 38 is processed to obtain the printed wiring board 40.
- a desired multilayer printed wiring board is processed using the multilayer wiring board 38 obtained in the separation step.
- Various known methods may be adopted as a processing method from the multilayer wiring board 38 to the multilayer printed wiring board 40.
- the ultra-thin copper layer 16 in the outer layer of the multilayer wiring board 38 is etched to form the outer circuit wiring to obtain a multilayer printed wiring board.
- the ultrathin copper layer 16 on the outer layer of the multilayer wiring board 38 can be completely removed by etching and used as the multilayer printed wiring board 40 as it is.
- the ultrathin copper layer 16 on the outer layer of the multilayer wiring board 38 is completely removed by etching, and a circuit shape is formed on the surface of the exposed resin layer with a conductive paste, or an outer layer circuit is directly formed by a semi-additive method or the like. It is also possible to form a multilayer printed wiring board by forming it. Further, the ultrathin copper layer 16 on the outer layer of the multilayer wiring board 38 is completely removed by etching, and the first wiring layer 30 is soft etched to obtain the first wiring layer 30 with the recesses. Can be used as a pad for mounting.
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Abstract
Description
前記キャリア付銅箔が、前記極薄銅層上に保護層をさらに備えてなり、
前記保護層が、少なくとも1か所の保護層接着部で前記極薄銅層に接着されており、前記保護層接着部以外の領域では前記極薄銅層に接着されていない、キャリア付銅箔が提供される。
(a)本発明の上記態様によるキャリア付銅箔をコアレス支持体の片面又は両面に積層して積層体を形成する工程と、
(b)前記保護層接着部を含む、前記キャリア付銅箔の外周近傍の領域に相当する部分を切除する工程と、
(c)前記キャリア付銅箔から前記保護層を剥離して前記極薄銅層を露出させる工程と、
(d)前記極薄銅層上にビルドアップ配線層を形成してビルドアップ配線層付積層体を作製する工程と、
(f)前記ビルドアップ配線層付積層体を前記剥離層で分離して前記ビルドアップ配線層を含む多層配線板を得る工程と、
(g)前記多層配線板を加工してプリント配線板を得る工程と、
を含む、方法が提供される。
図1に本発明のキャリア付銅箔の一例の模式斜視図が示される。図1に示されるキャリア付銅箔10は、キャリア層12、剥離層14及び極薄銅層16をこの順に備えてなる。このキャリア付銅箔10は、極薄銅層16上に保護層18をさらに備えてなる。保護層18があることで、キャリア層12表面にコアレス支持体を積層する際における極薄銅層16表面への異物(典型的には、コアレス支持体(プリプレグ等)に由来する樹脂粉等)の付着を有効に防止することができる。特に、コアレス支持体の積層工程が行われる環境は、プリプレグ等からの飛散物の多い清浄度が低い環境であり、しかも、緩衝部材の摩擦により静電気が発生しやすく、その上、プレス盤の周辺には油圧シリンダーや油圧ポンプが設置された環境である。このため、コアレス支持体の積層工程は、樹脂粉やシリンダー潤滑剤等の異物が発生し極薄銅層表面に付着しやすい、すなわち極薄銅層表面が汚染されやすい工程である。このような異物(特に有機系の異物)が極薄銅層16表面に存在すると、その極薄銅層上に回路形成を行う際に異物の付着する箇所のめっきが不十分となって回路の断線等の欠陥が生じうる他、不要な箇所にパターンめっき用の開口が形成されてしまい、回路の短絡(ショート)等の欠陥も生じうることとなる。このような状況下であっても本発明のキャリア付銅箔を用いることで、異物の極薄銅層16への付着が保護層18により阻止されるので、異物が無い極薄銅層16上に回路を形成することができる。その結果、異物に起因する回路の断線や短絡等の欠陥が生じにくくなり、プリント配線板の歩留りを向上することができる。その上、保護層18は、少なくとも1か所の保護層接着部20で極薄銅層16に接着されており、保護層接着部20以外の領域22では極薄銅層16に接着されていない。このように保護層18は極薄銅層16に保護層接着部20でのみ局所的に接着させて保護層非接着領域22を形成することで、保護層18を必要最小限の接着領域(保護層接着部20)で極薄銅層16に確実に固定して剥離を防止しながら、それ以外の保護層非接着領域22では極薄銅層16の表面状態を悪化させる要因を極力排除することができる。例えば、保護層非接着領域22では極薄銅層16が保護層18と密着していないため、保護層18の剥離時における極薄銅層16のキズや粗化面の潰れを防止できる。また、保護層非接着領域22において極薄銅層16と保護層18の間は剥離層等の剥離強度を与える中間層が介在しないため、保護層接着部20を切除しさえすれば保護層18を極薄銅層16から剥離強度ゼロで剥離可能となる。このため、保護層剥離後の極薄銅層表面に(上記中間層等の)残渣が残らないため、後続の加工が容易になる。このように、本発明によれば、プリント配線板の製造(例えばコアレス工法等)における極薄銅層表面への異物の付着を防止し、かつ、保護層剥離時における極薄銅層のキズや粗化面の潰れを防止することができ、しかも保護層剥離後の極薄銅層表面に残渣が残らない、キャリア付銅箔を提供することができる。
上述した本発明のキャリア付銅箔を用いてプリント配線板を好ましく製造することができる。本発明の好ましい態様によれば、プリント配線板の製造は(a)本発明のキャリア付銅箔をコアレス支持体の片面又は両面に積層し、(b)保護層接着部を含む、キャリア付銅箔の外周近傍の領域に相当する部分を切除し、(c)キャリア付銅箔から保護層を剥離して極薄銅層を露出させ、(d)極薄銅層上にビルドアップ配線層を形成し、(f)得られたビルドアップ配線層付積層体を剥離層で分離し、(g)得られた多層配線板を加工することにより行うことができる。前述したとおり、本発明のキャリア付銅箔を用いることで、コアレス支持体の積層時における極薄銅層表面への異物の付着を防止し、かつ、保護層剥離時における極薄銅層のキズや粗化面の潰れを防止することができ、しかも保護層剥離後の極薄銅層表面に残渣が残らない手法でプリント配線板を製造することができる。
この工程(a)においては、図6(A)に示されるように、本発明の上述した態様によるキャリア付銅箔10をコアレス支持体28の片面又は両面に積層して積層体を形成する。この積層は、通常のプリント配線板製造プロセスにおいて銅箔とプリプレグ等との積層に採用される公知の条件及び手法に従って行えばよい。コアレス支持体28は、典型的には樹脂、好ましくは絶縁性樹脂を含んでなる。コアレス支持体28はプリプレグ及び/又は樹脂シートであるのが好ましく、より好ましくはプリプレグである。プリプレグとは、合成樹脂板、ガラス板、ガラス織布、ガラス不織布、紙等の基材に合成樹脂を含浸させた複合材料の総称である。プリプレグに含浸される絶縁性樹脂の好ましい例としては、エポキシ樹脂、シアネート樹脂、ビスマレイミドトリアジン樹脂(BT樹脂)、ポリフェニレンエーテル樹脂、フェノール樹脂等が挙げられる。また、樹脂シートを構成する絶縁性樹脂の例としては、エポキシ樹脂、ポリイミド樹脂、ポリエステル樹脂等の絶縁樹脂が挙げられる。また、コアレス支持体28には絶縁性を向上する等の観点からシリカ、アルミナ等の各種無機粒子からなるフィラー粒子等が含有されていてもよい。コアレス支持体28の厚さは特に限定されないが、3~1000μmが好ましく、より好ましくは5~400μmであり、さらに好ましくは10~200μmである。
この工程(b)では、保護層接着部20を含む、キャリア付銅箔10の外周近傍の領域に相当する部分を切除する。このとき、図6(A)に点線で示されるように、保護層接着部20で囲まれる領域の内側で且つ(存在する場合には)キャリア層接着部24の外側で切断するのが好ましい。こうすることで、(存在する場合には)キャリア層接着部24を残しつつ、保護層18と極薄銅層16を確保していた保護層接着部20のみが除去されるので、所望の機能を確保しつつ保護層18を極めて容易に剥離することが可能となる。
この工程(c)では、図6(B)に示されるように、キャリア付銅箔10から保護層18を剥離して極薄銅層16を露出させる。このとき、保護層18にはもはや保護層接着部20が存在しないため、極めて容易に保護層18を剥離できる。保護層18は極薄銅層16に非接触又はそうでなくとも非接触に近い状態であり、しかもその間に剥離層等の剥離強度を与える中間層も介在しないので、保護層18は極薄銅層16から剥離強度ゼロで剥離可能となり(すなわち剥離する際の抵抗も生じず)、傷の発生も防止できる。その上、保護層18の剥離後の極薄銅層16表面に(上記中間層等の)残渣が残らないため、後続の加工が容易になる。
この工程(d)では、極薄銅層16上にビルドアップ配線層36を形成してビルドアップ配線層付積層体を作製する。例えば、図6(C)及び図7(D)に示されるように、極薄銅層16上に第一配線層30、絶縁層32及び第二配線層34が順に形成されてビルドアップ配線層36とされうる。第一配線層30はパターンめっき法で形成されることとなる。第二配線層34以降のビルドアップ層の形成方法についての工法は特に限定されず、サブトラクティブ法、MSAP(モディファイド・セミ・アディティブ・プロセス)法、SAP(セミアディティブ)法、フルアディティブ法等が使用可能である。例えば、樹脂層及び銅箔に代表される金属箔を同時にプレス加工で張り合わせる場合は、ビアホール形成及びパネルめっき等の層間導通手段の形成と組み合わせて、当該パネルめっき層及び金属箔をエッチング加工して、配線パターンを形成することができる。また、極薄銅層16の表面に樹脂層のみをプレス又はラミネート加工により張り合わせる場合は、その表面にセミアディティブ法で配線パターンを形成することもできる。いずれにしても、キャリア付銅箔がキャリア層接着部24を有する場合、ビルドアップ配線形成時におけるキャリア層12と極薄銅層16の間への薬液の染み込みを防止することができる。ビルドアップ配線形成時に薬液に染み込みの許してしまうとキャリア箔付銅箔の剥がれが促進され、ビルドアップ層のデラミネーション発生や第一配線層30の脱落等につながるおそれがあり、製造歩留りの低下を招きうるが、キャリア層接着部24があることでそのような問題を回避又は低減することができる。
この工程(e)は、キャリア付銅箔10がキャリア層接着部24を有する場合に工程(d)と工程(f)の間に行われる、キャリア層接着部24を切除する任意工程である。この工程(e)を行う前提として、そのキャリア層接着部24の少なくとも一部が、保護層接着部20と重ならず、かつ、保護層接着部20で囲まれる領域よりも内側の領域に設けられ、工程(b)において切除される部分が、キャリア層接着部24よりも外側の部分であることが要件となる。したがって、この工程(e)ではキャリア層接着部24よりも内側の位置でビルドアップ配線層付積層体を切断し、それによりキャリア付銅箔の外周近傍の領域に相当する部分を切除する。このようにビルドアップ配線層付積層体からキャリア層接着部24を包含する不要な領域を切除して、キャリア付銅箔10のキャリア層非接着領域26の断面を露出させる。こうすることで、後続の工程(e)において極薄銅層16をキャリア層12から分離しやすくなる。この態様においては、キャリア層接着部24が切除されることになるため、工程(d)におけるビルドアップ配線層36の形成がキャリア層接着部24よりも内側の領域に行われるのが好ましい。
この工程(f)では、図7(E)に示されるように、ビルドアップ配線層付積層体を剥離層14で分離してビルドアップ配線層36を含む多層配線板38を得る。極薄銅層16と剥離層14との界面での分離は、極薄銅層16及び/又はキャリア層12を引き剥がすことにより行うことができる。
この工程(g)では、多層配線板38を加工してプリント配線板40を得る。この工程では、上記分離工程により得られた多層配線板38を用いて、所望の多層プリント配線板に加工する。多層配線板38から多層プリント配線板40への加工方法は公知の種々の方法を採用すればよい。例えば、多層配線板38の外層にある極薄銅層16をエッチングして外層回路配線を形成して、多層プリント配線板を得ることができる。また、多層配線板38の外層にある極薄銅層16を、完全にエッチング除去し、そのままの状態で多層プリント配線板40として使用することもできる。さらに、多層配線板38の外層にある極薄銅層16を、完全にエッチング除去し、露出した樹脂層の表面に、導電性ペーストで回路形状を形成する又はセミアディティブ法等で外層回路を直接形成する等して多層プリント配線板とすることも可能である。さらに、多層配線板38の外層にある極薄銅層16を、完全にエッチング除去するととも第一配線層30をソフトエッチングすることで、凹部の形成された第一配線層30を得て、これを実装用のパッドとなすことも可能である。
Claims (16)
- キャリア層、剥離層及び極薄銅層をこの順に備えたキャリア付銅箔であって、
前記キャリア付銅箔が、前記極薄銅層上に保護層をさらに備えてなり、
前記保護層が、少なくとも1か所の保護層接着部で前記極薄銅層に接着されており、前記保護層接着部以外の領域では前記極薄銅層に接着されていない、キャリア付銅箔。 - 前記保護層接着部が、前記キャリア付銅箔の外周近傍に線状及び/又は点状に設けられる、請求項1に記載のキャリア付銅箔。
- 前記保護層接着部が、前記キャリア付銅箔の外周を構成する相対する少なくとも2辺の近傍に設けられる、請求項2に記載のキャリア付銅箔。
- 前記キャリア層が、少なくとも1か所のキャリア層接着部で、該キャリア層接着部以外の領域よりも剥離しにくいように前記極薄銅層に接着されてなる、請求項1~3のいずれか一項に記載のキャリア付銅箔。
- 前記キャリア層接着部の少なくとも一部が、前記保護層接着部と重ならず、かつ、前記保護層接着部で囲まれる領域よりも内側の領域に設けられる、請求項4に記載のキャリア付銅箔。
- 前記キャリア層接着部が、前記キャリア付銅箔の外周を構成する相対する2辺又は4辺の近傍に長尺状に設けられる、請求項5に記載のキャリア付銅箔。
- 前記極薄銅層が前記保護層側に粗面を備えてなる、請求項1~6のいずれか一項に記載のキャリア付銅箔。
- 前記粗面の算術平均粗さRaが50nm以上である、請求項7に記載のキャリア付銅箔。
- 前記保護層が金属箔又は樹脂フィルムである、請求項1~8のいずれか一項に記載のキャリア付銅箔。
- 前記保護層接着部が前記キャリア層接着部の一部に重なっている、請求項1~9のいずれか一項に記載のキャリア付銅箔。
- 前記保護層接着部における接着が、超音波接合、レーザー接合、シーム接合及び接着剤接合からなる群から選択される少なくともいずれか1種により行われたものである、請求項1~10のいずれか一項に記載のキャリア付銅箔。
- 前記キャリア層接着部における接着が、超音波接合、レーザー接合及びシーム接合からなる群から選択される少なくともいずれか1種により行われたものである、請求項4~11のいずれか一項に記載のキャリア付銅箔。
- プリント配線板の製造方法であって、
(a)請求項1~12のいずれか一項に記載のキャリア付銅箔をコアレス支持体の片面又は両面に積層して積層体を形成する工程と、
(b)前記保護層接着部を含む、前記キャリア付銅箔の外周近傍の領域に相当する部分を切除する工程と、
(c)前記キャリア付銅箔から前記保護層を剥離して前記極薄銅層を露出させる工程と、
(d)前記極薄銅層上にビルドアップ配線層を形成してビルドアップ配線層付積層体を作製する工程と、
(f)前記ビルドアップ配線層付積層体を前記剥離層で分離して前記ビルドアップ配線層を含む多層配線板を得る工程と、
(g)前記多層配線板を加工してプリント配線板を得る工程と、
を含む、方法。 - 前記工程(d)が前記極薄銅層の表面に配線を直接形成する工程を含んでなる、請求項13に記載の方法。
- 前記キャリア付銅箔が、請求項5~13のいずれか一項に記載のキャリア付銅箔であり、
前記工程(b)において切除される部分が、前記キャリア層接着部よりも外側の部分であり、かつ、
前記工程(d)と工程(f)の間に、前記キャリア層接着部よりも内側の位置で前記ビルドアップ配線層付積層体を切断し、それにより前記キャリア付銅箔の外周近傍の領域に相当する部分を切除する工程(e)をさらに有する、請求項13又は14に記載の方法。 - 前記工程(d)におけるビルドアップ配線層の形成が、前記キャリア層接着部よりも内側の領域に行われる、請求項15に記載の方法。
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JPWO2018097264A1 (ja) * | 2016-11-28 | 2019-10-17 | 三井金属鉱業株式会社 | 多層配線板の製造方法 |
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JP6471140B2 (ja) * | 2016-11-30 | 2019-02-13 | 福田金属箔粉工業株式会社 | 複合金属箔及び該複合金属箔を用いた銅張積層板並びに該銅張積層板の製造方法 |
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