WO2016017374A1 - アーク蒸発源 - Google Patents
アーク蒸発源 Download PDFInfo
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- WO2016017374A1 WO2016017374A1 PCT/JP2015/069340 JP2015069340W WO2016017374A1 WO 2016017374 A1 WO2016017374 A1 WO 2016017374A1 JP 2015069340 W JP2015069340 W JP 2015069340W WO 2016017374 A1 WO2016017374 A1 WO 2016017374A1
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- WIPO (PCT)
- Prior art keywords
- target
- tip surface
- magnet
- evaporation source
- magnetic field
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge
Definitions
- the present invention relates to an arc evaporation source.
- a coating on the surface of a substrate using arc discharge have been proposed as a method for forming a coating on the surface of a substrate such as a tool or machine part for the purpose of improving wear resistance.
- a material for such a film for example, a rod-shaped target may be used to enable continuous film formation.
- Patent Document 1 discloses an arc evaporation source having a rod-shaped target.
- arc discharge such as AIP
- the tip surface of the rod-shaped target is melted and evaporated by arc discharge.
- the molten and evaporated material adheres to the surface of the substrate.
- the arc spot which is a point where arc discharge occurs on the tip surface of the target, moves in an unstable manner. For this reason, the arc spot may move out of the range of the front end surface of the target and cause unexpected movement or stray to the side surface of the target or to the direction other than the target. In such a case, since the film forming apparatus must automatically stop the arc discharge, there is a possibility that continuous film formation cannot be performed.
- an annular coil for generating a magnetic field is arranged coaxially with the target around the rod-shaped target. Has been. In the magnetic field generated by this coil, magnetic field lines extending in the normal direction from the tip surface of the target are formed. The arc spot is maintained so as not to come out of the range of the tip surface of the target by the magnetic force lines extending in the normal direction from the tip surface of the target.
- film formation may be performed using a carbon target as the target.
- the arc spot moves more unstable, it tends to come out more easily from the tip surface of the target. Therefore, in order to maintain the arc spot within the range of the tip surface of the target, stronger magnetic field lines are required.
- An object of the present invention is to provide an arc evaporation source capable of stably holding an arc spot on the tip surface of a target while suppressing an increase in size of the apparatus.
- the magnetic field formed by the magnets has a magnetic field line with respect to the side surface of the target in order to maintain the arc spot within the range of the tip surface of the target. It has been discovered that the angle of the angle of the target may be lower than a predetermined size, and the size of the component in the axial direction of the target in the strength of the magnetic field lines should satisfy the condition of a predetermined size or more at the same time. The inventor has also found that it is possible to suppress an increase in the size of the apparatus when the magnet is arranged so as to generate a magnetic field that satisfies such a condition.
- the arc evaporation source of the present invention is A target that is melted and evaporated from the tip surface by arc discharge; At least one magnet disposed at a position spaced apart in a radial direction of the target from a side surface continuous to a peripheral edge of the tip surface of the target; With The magnet In the range from the tip surface of the target in the axial direction of the target perpendicular to the tip surface on the side surface of the target up to 10 mm, the following conditions a) and b): a) The angle formed by the magnetic lines of force with respect to the side surface of the target is 45 degrees or less, and b) The component in the axial direction of the target in the intensity of the magnetic field lines is arranged so as to form a magnetic field that satisfies a condition of 200 G or more.
- FIG. 1 It is a perspective view of the arc evaporation source which concerns on embodiment of this invention. It is the figure which looked at the target and magnet of FIG. 1 from the side of the target. It is the figure which looked at the target and magnet of FIG. 1 from the front end surface of the target. It is a figure which shows the magnetic field generated by the magnet of FIG. It is the figure which expanded the part between the target front end surface and magnet in the magnetic field of FIG. It is a graph which shows the relationship between the distance from the front end surface of the target of FIG. 1, and a horizontal magnetic flux density. It is a graph which shows the relationship between the distance from the front end surface of the target of FIG. 1, and the angle of the magnetic force line with respect to the side surface of a target.
- a comparative example of the present invention it is a diagram showing a state where a magnet in which different magnetic poles are arranged in the axial direction of a target generates a magnetic field that does not satisfy the magnetic field generation conditions a) and b) of the present invention. It is a graph which shows the relationship between the distance from the front end surface of the target of FIG. 9, and a horizontal magnetic flux density. 10 is a graph showing the relationship between the distance from the tip surface of the target of FIG. 9 and the angle of the magnetic field lines with respect to the side surface of the target.
- the arc evaporation source 1 shown in FIGS. 1 to 3 includes a main body 2, a rod-like carbon target 3, a plurality of magnets 4 arranged radially around the target 3, and these magnets 4 are separated from the arc discharge.
- a shield plate 5 to be protected, a delivery unit 6 for sending the target 3 in the axial direction A, and an ignition device 7 for starting arc discharge of the target 3 are provided.
- the main body 2 has a main plate 2a and a cylinder 2b.
- the main plate portion 2a is disposed in a chamber (not shown) of the film forming apparatus.
- the cylinder portion 2b is disposed outside the chamber on the back side of the main plate portion 2a.
- the tip of the rod-shaped target 3 penetrates the main plate portion 2a and the shield plate 5 and is exposed in the chamber.
- the remaining part 3c of the target 3 is accommodated inside the cylindrical part 2b.
- the shield plate 5 has a through hole 5a through which the target 3 passes.
- the rod-shaped carbon target 3 has a columnar shape, and specifically has a circular tip surface 3a and a side surface 3b continuous to the periphery of the tip surface 3a.
- the diameter of the target 3 is about 10 to 30 mm.
- the length of the target 3 is sufficiently longer than the diameter of the target 3.
- the arc spot S (see FIG. 2) slowly rotates (one rotation in several seconds) within the range of the circular tip surface 3a, as in the case of the metal target. There is a tendency not to move randomly within the tip surface.
- the diameter of the target 3 is preferably about 10 to 30 mm as described above.
- the target 3 may have a shape other than a rod shape (for example, various three-dimensional shapes in which the length of the target 3 is not sufficiently longer than the diameter of the target 3 such as a flat plate shape).
- the target 3 is made of a material containing carbon (that is, carbon), and is manufactured by, for example, a pure substance of carbon or a mixture of carbon and another substance.
- the target 3 is melted and evaporated from the front end surface 3a by arc discharge in order to form a film on the surface of the substrate in the chamber of the film forming apparatus.
- the arc discharge is started when the contact bar 7 a of the ignition device 7 comes into contact with the target 3.
- the target 3 is automatically sent out in the axial direction A perpendicular to the distal end surface 3a by the delivery unit 6 so as to protrude into the chamber by the melted length. Therefore, the position of the tip surface 3a of the target 3 is maintained at a predetermined position even when the target 3 is consumed.
- the temperature of the carbon target 3 used in this embodiment is less likely to increase when it is evaporated by arc discharge than a target made of another material (for example, metal). Therefore, the arc evaporation source 1 does not require a mechanism for cooling the target 3.
- the target may be a material other than carbon (for example, a metal target such as tungsten carbide described later).
- the plurality of magnets 4 have different magnetic poles 4a and 4b, respectively.
- the plurality of magnets 4 are arranged such that magnetic poles 4 a and 4 b different from each other are arranged in the radial direction B of the target 3 at positions spaced from the side surface 3 b of the target 3 in the radial direction B of the target 3.
- These magnets 4 generate a magnetic field MF1 (see FIGS. 4 to 5) that satisfies conditions a) and b) described later.
- the magnetic pole 4a facing the side surface 3b of the target 3 is an N pole
- the magnetic pole 4b facing the outside in the radial direction B of the target 3 is an S pole.
- the plurality of magnets 4 are attached to the main plate portion 2a of the main body 2 so as to be arranged at equal intervals in the circumferential direction of the target 3. Thereby, on the side surface 3 b of the target 3, the magnetic field MF ⁇ b> 1 generated by the magnet 4 can be uniformly distributed in the circumferential direction of the target 3.
- magnets 4 are arranged on the rear side in the axial direction A of the target 3 from the tip surface 3 a of the target 3.
- the magnet 4 is disposed so that the center thereof is located 20 mm behind the tip surface 3 a of the target 3 (rightward in FIG. 4). Therefore, it is possible to reliably generate a magnetic field MF1 that satisfies conditions a) and b) to be described later, and it is possible to avoid the possibility that the molten material that jumps out from the tip surface 3a of the target 3 adheres to the magnet 4. It is.
- the magnet 4 is limited to being arranged on the rear side in the axial direction A of the target 3 from the tip surface 3a of the target 3 as long as the magnetic field MF1 satisfying the conditions a) and b) can be formed. It is not a thing.
- a part of the magnet 4 may protrude forward from the front end surface 3a (specifically, the side facing the front end surface 3a in FIG. 4 (the left side in FIG. 4)).
- a shield plate 5 is interposed as shown in FIG.
- Each magnet 4 is made of a permanent magnet that generates a strong magnetic force, and is made of, for example, an alloy containing neodymium (for example, NdFeB). Although the permanent magnet containing neodymium is small, it can generate a strong magnetic field line FL1 that satisfies conditions a) and b) described later. Moreover, the permanent magnet which generate
- the magnet 4 is made of a permanent magnet, it can be made smaller than an electromagnet having a coil. Therefore, it is possible to improve the degree of freedom of arrangement of the magnets 4 and more reliably reduce the size of the arc evaporation source 1.
- the magnets 4 are arranged radially in such a manner as to be separated from the side surface 3b of the target 3 and arranged with the magnetic poles 4a, 4b in the radial direction B as described above. 5 is formed.
- the magnet 4 is arranged on the rear side from the tip surface 3 a of the target 3, and specifically, the magnet 4 is arranged so that the center of the magnet 4 is located 20 mm behind the tip surface 3 a of the target 3.
- the positional relationship of the magnet 4 with respect to the tip surface 3a is not limited to this.
- the magnetic field line FL1 of the magnetic field MF1 emerges from the magnetic pole 4a facing the side surface 3b of the target 3 and is in the vicinity of the tip surface 3a of the side surface 3b of the target 3 (specifically, the range from the tip surface 3a of the target 3 to 10 mm). ) Extend at an acute angle with respect to the side surface 3b of the target 3 (specifically, an acute angle of 45 degrees or less in FIGS. 4 to 5). That is, the magnetic field line FL1 extends in the direction toward the outside in the radial direction B while approaching the tip surface 3a on the side surface 3b of the target 2 in the range from the tip surface 3a to 10 mm of the target 3. Moreover, in this range, the magnetic lines of force FL1 are kept in a dense state (that is, the magnetic flux density is high).
- This magnetic field MF1 is the following conditions a) and b) in the range from the tip surface 3a of the target 3 in the axial direction A of the target 3 to 10 mm, that is, a) The angle ⁇ formed by the magnetic field line FL1 due to the magnetic field MF1 with respect to the side surface 3b of the target 3 is 45 degrees or less, and b) The condition that the component Bx in the axial direction A of the target 3 at the intensity of the magnetic field line FL1 satisfies the condition of 200 G or more.
- the magnetic force line FL1 (see FIGS. 4 to 5) on the side surface 3b of the target 3 acts to push the arc spot S back into the front end surface 3a.
- the arc spot S is maintained within the range of the tip surface 3a of the carbon target 3, and the arc spot S is prevented from going out of the range of the tip surface 3a of the target 3.
- each magnet 4 Since the magnets 4 are arranged so as to generate a magnetic field that satisfies the above conditions a) and b), each magnet 4 needs to have a large size in order to generate a strong magnetic force. Disappear. Therefore, it is possible to suppress the increase in size of the arc evaporation source 1.
- the target 3 since the target 3 has a rod shape, continuous film formation is possible for a long time according to the length.
- the arc spot S tends to move more unstable, and the arc spot S tends to come out from the tip surface 3a.
- the magnet 4 generates a magnetic field that satisfies the above conditions a) and b), so that the arc spot S can be stably held on the tip surface 3a of the target 3 even when the carbon target 3 is used. Is possible.
- the plurality of magnets 4 are different from each other on the side of the carbon target 3.
- the magnetic poles 4 a and 4 b are arranged in the radial direction B of the target 3.
- the magnet 4 may be arranged such that different magnetic poles 4 a (for example, N pole) and magnetic pole 4 b (for example, S pole) are aligned in the axial direction A of the target 3. Good. Also in this case, if the magnet 4 is arranged so as to generate the magnetic field MF1 ′ satisfying the above conditions a) and b), the target 3 may be out of the range of the tip surface 3a of the carbon target 3. In the vicinity of the tip surface 3a, that is, in the range from the tip surface 3a to 10 mm, the magnetic field lines FL1 ′ on the side surface 3b of the target 3 can push the arc spot S back into the range of the tip surface 3a. In addition, since the individual magnets 4 shown in FIG.
- the magnetic poles 4a and 4b are arranged side by side in the axial direction of the target 3 in this way, the electrons emitted from the tip surface 3a of the target 3 are magnetic poles 4a on the side close to the tip surface 3a along the magnetic force line FL1 ′. Since the magnetic pole 4a portion of the magnet 4 is heated as an anode (anode), the magnetic pole portion 4a is preferably cooled by a cooling mechanism such as water cooling.
- the magnet 4 when the magnets 4 are arranged so that the magnetic poles 4a and 4b, which are different from each other, are aligned in the axial direction A of the target 3, the magnet 4 may be a ring-shaped magnet. Alternatively, as shown in FIG. 8, a plurality of magnets 4 may be arranged around the target 3 in the circumferential direction. The number of the ring-shaped magnets may be at least one and only one.
- the component Bx in the axial direction A of the target 3 at the intensity of the magnetic force line FL1 is preferably 500 G or more.
- Such magnetic field lines FL1 can surely push back the arc spot S within the range of the tip surface 3a of the target 3 made of carbon.
- FIG. 6 shows the horizontal magnetic flux of the magnetic field MF1 formed by the distance X (mm) from the tip surface 3a of the target of FIG. 1 and the magnet 4 when the magnets 4 are arranged radially as shown in FIG.
- the component Bx in the axial direction A of the target 3 in the intensity of the magnetic force line FL1 is shown as a horizontal magnetic flux density Bx.
- the curve I in the graph of FIG. 6 shows the horizontal magnetic flux density Bx in the magnet 4 made of a permanent magnet made of an alloy containing neodymium (NdFeB) in the present embodiment.
- the horizontal magnetic flux density Bx of 200 G or more, specifically, the horizontal magnetic flux density Bx of 230 to 800 G is shown in the range where the distance X from the tip surface 3 a of the target 3 is 0 to 10 mm. Therefore, it can be seen that strong magnetic field lines that can push the arc spot S back to the tip surface 3a are generated in this range.
- Curve I shows a horizontal magnetic flux density Bx of 800 G or more when the distance X is in the range of 10 to 16 mm, and it can be seen that very strong lines of magnetic force are generated in this range. In this range, since the lines of magnetic force are very strong, the arc spot S can be reliably pushed back by the tip surface 3a by the action of the magnetic force.
- a curve II in the graph of FIG. 6 shows the horizontal magnetic flux density Bx in the magnet 4 made of a permanent magnet made of an alloy containing samarium and cobalt (SmCo) in the present embodiment.
- the horizontal magnetic flux density Bx of 200 G or more, specifically 210 to 620 G is shown in the range where the distance X from the tip surface 3a of the target 3 is 0 to 10 mm. It can be seen that strong lines of magnetic force that can be pushed back to the tip surface 3a are generated.
- Curve II shows a horizontal magnetic flux density Bx of 800 G or more in the range where the distance X is 13 to 14 mm.
- the component Bx in the axial direction A of the target 3 in the strength of the magnetic force line FL1 is It increases as the distance from the surface 3a in the axial direction A of the target 3 increases.
- the magnetic force line FL1 becomes stronger as the distance from the front end surface 3a of the target 3 in the axial direction A of the target 3 increases.
- the effect of pushing back the arc spot S on the side surface 3b of the carbon target 3 is largely due to the horizontal component strength Bx of the magnetic field lines FL1.
- the horizontal component strength Bx of the magnetic field lines FL1 are distributed so that the horizontal component strength Bx of the magnetic field lines FL1 uniformly increases monotonously, the arc spot S can be reliably pushed back to 3a on the tip surface of the target 3.
- a curve III in the graph of FIG. 6 shows a horizontal magnetic flux density Bx in a magnet made of an existing permanent magnet mainly made of iron (Fe) as a reference example.
- the horizontal magnetic flux density Bx is generally lower in the range where the distance X from the tip surface 3a of the target 3 is 0 to 20 mm as compared with the curves I and II. In most parts of the distance X in the range of 0 to 10 mm, the horizontal magnetic flux density Bx is 200 G or less. Therefore, with such an existing permanent magnet made of iron, the arc spot S can be pushed back to the tip surface 3a. It can be seen that strong magnetic field lines cannot be obtained.
- FIG. 7 shows the distance X (mm) from the tip surface 3a of the target 3 in FIG. 1 and the angle of the magnetic force line FL1 with respect to the side surface 3b of the target 3 when the magnets 4 are arranged radially as shown in FIG.
- a graph showing the relationship with ⁇ is shown.
- the angle ⁇ is in the acute angle range of 0 to 30 degrees, and the magnetic field line FL1 moves the arc spot S to the tip surface 3a. It can be seen that it has a sharp angle that can be pushed back.
- the magnets 4 made of a permanent magnet made of an alloy containing neodymium (NdFeB) or an alloy containing samarium and cobalt (SmCo) are arranged radially as shown in FIGS. It has been confirmed by experiments by the inventors that the magnetic field lines MF1 satisfying the above conditions a) and b) are generated, thereby preventing the arc spot S from going out of the range of the tip surface 3a of the target 3. ing.
- NdFeB neodymium
- SmCo samarium and cobalt
- the magnet 104 is separated from the side surface 3 b of the target 3, and the magnetic poles 104 a and 104 b are arranged in the axial direction A of the target 3. Thereby, the magnet 104 forms the magnetic field MF2 shown in FIG. 9 on the side surface 3b of the target 3.
- the magnet 104 is disposed so that the intermediate position in the axial direction of the magnet 104 is 20 mm behind the tip surface 3 a of the target 3.
- the magnetic field line FL2 of the magnetic field MF2 comes out from the magnetic pole 104a facing the tip surface 3a side of the target 3, but in the vicinity of the tip surface 3a in the side 3b of the target 3 (specifically, from the tip surface 3a of the target 3).
- the target 3 enters the inside of the target 3 from the side surface 3b. That is, the magnetic field line FL2 extends in the direction toward the inner side in the radial direction B while approaching the front end surface 3a on the side surface 3b of the target 2 in the range from the front end surface 3a of the target 3 to about 6 mm.
- the magnetic field lines FL2 are sparse (that is, the magnetic flux density is low).
- FIG. 10 shows the distance X (mm) from the tip surface 3a of the target 3 and the magnetic field MF2 formed by the magnet 4 when the magnet 104 is arranged in the axial direction of the target 3 as shown in FIG.
- a graph showing the relationship with the horizontal magnetic flux density Bx (the unit is G ( ⁇ 10 ⁇ 4 T)) is shown.
- FIG. 10 represents a horizontal magnetic flux density Bx in the magnet 104 made of a permanent magnet made of an alloy containing neodymium (NdFeB).
- Curve V shows horizontal magnetic flux density Bx in magnet 104 made of a permanent magnet made of an alloy containing samarium and cobalt (SmCo).
- a curve VI indicates the horizontal magnetic flux density Bx in the magnet 104 made of a permanent magnet mainly made of iron (Fe).
- FIG. 11 when the magnet 104 is arranged in the axial direction of the target 3 as shown in FIG. 9, the distance X (mm) from the tip surface 3 a of the target 3 and the magnetic force line FL ⁇ b> 2 with respect to the side surface 3 b of the target 3.
- a graph showing the relationship with the angle ⁇ is shown. In the graph of FIG. 11, it is understood that the angle ⁇ is 0 degrees or less in the range where the distance X from the tip surface 3a of the target 3 is 0 to 6 mm.
- the magnetic field line FL 2 extends in the direction toward the inside of the radial direction B while approaching the tip surface 3 a on the side surface 3 b of the target 3 and enters the target 3. .
- the magnetic force lines FL2 entering the target 3 have a weak action of pushing the arc spot S back to the tip surface 3a on the side surface 3b of the target 3.
- the magnetic field MF ⁇ b> 2 formed in the magnet 104 is the target 3 in the axial direction A of the target 3. It can be seen that it is difficult to construct a configuration that satisfies the above conditions a) and b) in the range from the tip surface 3a to 10 mm. Therefore, as shown in FIGS. 9 to 11, when the above conditions a) and b) are not satisfied, the arc spot S is pushed back into the range of the front end surface 3a of the target 3 by the magnetic force line FL2 on the side surface 3b of the target 3. It seems difficult.
- FIGS. 4 to 5 the configuration in which the magnetic poles 4a and 4b having different magnets 4 are arranged in the radial direction of the target 3 as shown in FIGS.
- a configuration that satisfies the magnetic field generation conditions a) and b) can be easily constructed. Recognize. Therefore, the configuration in which the magnets 4 shown in FIGS. 4 to 5 are arranged radially can more stably hold the arc spot S on the tip surface 3a of the target 3, and the arc evaporation source 1 It can be seen that it is possible to reliably achieve the downsizing.
- the target 3 is described by taking a carbon target as an example, but the present invention is not limited to this.
- the target 3 may include tungsten carbide, tungsten, molybdenum, or niobium.
- the arc spot tends to move in an unstable manner as in the case of the carbon target 3 described above.
- the magnet generates a magnetic field that satisfies the above conditions a) and b), so that the arc spot can be stably held on the tip surface of the target 3 even when the target 3 made of tungsten carbide is used. It is possible.
- the target 3 made of tungsten carbide or the like is expensive, the consumption form and the yield of the target 3 are particularly emphasized. Therefore, using tungsten carbide or the like as the rod-shaped target 3 in the arc evaporation source 1 described above makes the consumption form of the target 3 uniform (that is, the target 3 is uniformly consumed over the entire tip surface) and This is effective in improving the yield.
- the arc evaporation source of this embodiment is A target that is melted and evaporated from the tip surface by arc discharge; At least one magnet disposed at a position spaced apart in a radial direction of the target from a side surface continuous to a peripheral edge of the tip surface of the target; With The magnet In the range from the tip surface of the target in the axial direction of the target perpendicular to the tip surface on the side surface of the target up to 10 mm, the following conditions a) and b): a) The angle formed by the magnetic lines of force with respect to the side surface of the target is 45 degrees or less, and b) The component in the axial direction of the target in the intensity of the magnetic field lines is arranged so as to form a magnetic field that satisfies a condition of 200 G or more.
- the magnetic lines of force on the side surface of the target act to push the arc spot back into the front end surface.
- the arc spot is maintained within the range of the tip surface of the target.
- each magnet since the magnets are arranged so as to generate a magnetic field that satisfies the above conditions a) and b), each magnet does not need to be large in size in order to generate a strong magnetic force. Therefore, it is possible to suppress the enlargement of the apparatus.
- the target is preferably rod-shaped. In this case, continuous film formation is possible over a long period of time according to the length of the rod-shaped target.
- the target may contain carbon.
- the arc spot tends to move more unstable, and the arc spot tends to come out from the tip surface.
- a magnetic field that satisfies the above conditions a) and b) as described above, it is possible to stably hold an arc spot on the tip surface of the target even if a carbon target is used. is there.
- the target may include tungsten carbide, tungsten, molybdenum, or niobium.
- the arc spot tends to move in an unstable manner, similar to the carbon target.
- the arc spot can be stably held on the tip surface of the target even when a target such as tungsten carbide is used. Is possible. Targets such as those made of tungsten carbide are expensive, and therefore, the consumption form and yield of the target are particularly emphasized. Therefore, the use of tungsten carbide or the like as the rod-shaped target in the arc evaporation source is effective in terms of uniformizing the consumption of the target and improving the yield.
- the magnet has magnetic poles different from each other, and the magnets are arranged so that the magnetic poles different from each other are arranged in the radial direction of the target.
- the magnets are arranged such that different magnetic poles of the magnets are arranged in the radial direction of the target on the side of the target. In this case, one magnetic pole of each magnet faces the side surface of the target, and the other magnetic pole faces radially outward of the target.
- the magnetic pole facing the side surface of the target has an acute angle of 45 degrees or less and strong magnetic field lines satisfying the above conditions a) and b) with respect to the side surface of the target in the range of 10 mm from the tip surface. Can occur.
- the individual magnets can be small while generating strong magnetic field lines with an acute angle of 45 degrees or less with respect to the side surface of the target. Can be reliably reduced in size.
- the magnet may have magnetic poles different from each other, and the magnets may be arranged so that the magnetic poles different from each other are arranged in the axial direction of the target. Also in this case, if the magnets are arranged so as to generate a magnetic field that satisfies the above conditions a) and b), the individual magnets generate a strong magnetic force, so that it is not necessary to enlarge the magnets. Therefore, it is possible to suppress the enlargement of the apparatus.
- the axial component of the target in the intensity of the magnetic field lines is preferably 500 G or more.
- This magnetic field line can surely push back the arc spot within the range of the tip surface of the target.
- the axial component of the target in the strength of the magnetic field lines increases as the distance from the tip surface of the target increases in the axial direction of the target.
- the magnetic field lines become stronger from the tip surface of the target in the axial direction of the target.
- the arc spot can be reliably pushed back to the tip surface of the target by the action of magnetic force without staying on the side surface.
- the magnetic field has a place where the axial component of the target in the intensity of the magnetic field lines is 800 G or more in the range of 20 mm from the tip surface of the target in the axial direction of the target on the side surface of the target. .
- This configuration makes it possible to push the arc spot back more reliably to the tip surface of the target by the action of magnetic force without the arc spot staying on the side surface of the target.
- the magnet is preferably a permanent magnet.
- the magnet can be made smaller than an electromagnet having a coil.
- the degree of freedom in arranging the magnets can be improved, and the arc evaporation source can be reduced in size more reliably.
- the permanent magnet preferably contains neodymium.
- a permanent magnet containing neodymium is capable of generating strong lines of magnetic force that satisfy the above conditions a) and b) while being small.
- the plurality of magnets are preferably arranged at equal intervals in the circumferential direction of the target.
- the magnetic field generated by the magnet can be uniformly distributed in the circumferential direction of the target on the target side surface. Therefore, it is possible to eliminate a portion where the magnetic field lines are locally weak where the arc spot may stay on the side surface of the target. As a result, the arc spot can be more reliably pushed back to the target tip surface by the action of magnetic force.
- the magnet is preferably disposed on the rear side in the axial direction of the target from the tip surface of the target.
- the magnet By arranging the magnet as described above, it is possible to reliably generate a magnetic field that satisfies the above conditions a) and b), and the molten material that jumps out from the tip surface of the target adheres to the magnet. It is possible to avoid fear.
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Abstract
Description
アーク放電によって先端面から溶解されて蒸発されるターゲットと、
前記ターゲットの前記先端面の周縁に連続する側面から当該ターゲットの半径方向に離間した位置に配置された少なくとも1つの磁石と、
を備えており、
前記磁石は、
前記ターゲットの側面において前記先端面に直交する前記ターゲットの軸方向の前記ターゲットの先端面から10mmまでの範囲において、以下の条件a)およびb)、すなわち、
a)前記ターゲットの側面に対して磁場による磁力線がなす角度は、45度以下であり、かつ、
b)当該磁力線の強度における前記ターゲットの軸方向の成分は、200G以上である
という条件を満たす磁場を形成するように配置されていることを特徴とする。
a)ターゲット3の側面3bに対して磁場MF1による磁力線FL1がなす角度θは、45度以下であり、かつ、
b)当該磁力線FL1の強度におけるターゲット3の軸方向Aの成分Bxは、200G以上である
という条件を満たす。
アーク放電によって先端面から溶解されて蒸発されるターゲットと、
前記ターゲットの前記先端面の周縁に連続する側面から当該ターゲットの半径方向に離間した位置に配置された少なくとも1つの磁石と、
を備えており、
前記磁石は、
前記ターゲットの側面において前記先端面に直交する前記ターゲットの軸方向の前記ターゲットの先端面から10mmまでの範囲において、以下の条件a)およびb)、すなわち、
a)前記ターゲットの側面に対して磁場による磁力線がなす角度は、45度以下であり、かつ、
b)当該磁力線の強度における前記ターゲットの軸方向の成分は、200G以上である
という条件を満たす磁場を形成するように配置されていることを特徴とする。
Claims (13)
- アーク放電によって先端面から溶解されて蒸発されるターゲットと、
前記ターゲットの前記先端面の周縁に連続する側面から当該ターゲットの半径方向に離間した位置に配置された少なくとも1つの磁石と、
を備えており、
前記磁石は、
前記ターゲットの側面において前記先端面に直交する前記ターゲットの軸方向の前記ターゲットの先端面から10mmまでの範囲において、以下の条件a)およびb)、すなわち、
a)前記ターゲットの側面に対して磁場による磁力線がなす角度は、45度以下であり、かつ、
b)当該磁力線の強度における前記ターゲットの軸方向の成分は、200G以上である
という条件を満たす磁場を形成するように配置されているアーク蒸発源。 - 前記ターゲットは、棒状である、請求項1に記載のアーク蒸発源。
- 前記ターゲットは、カーボンを含んでいる、請求項1に記載のアーク蒸発源。
- 前記ターゲットは、タングステンカーバイド、タングステン、モリブデン、または、ニオブを含んでいる、請求項1に記載のアーク蒸発源。
- 前記磁石は、互いに異なる磁性の磁極を有し、
当該互いに異なる磁性の磁極が当該ターゲットの半径方向に並ぶように、前記磁石が配置されている、請求項1に記載のアーク蒸発源。 - 前記磁石は、互いに異なる磁性の磁極を有し、
当該互いに異なる磁性の磁極が当該ターゲットの軸方向に並ぶように、前記磁石が配置されている、請求項1に記載のアーク蒸発源。 - 前記磁力線の強度における前記ターゲットの軸方向の成分は、500G以上である
請求項1に記載のアーク蒸発源。 - 前記磁力線の強度における前記ターゲットの軸方向の成分は、前記ターゲットの先端面から当該ターゲットの軸方向へ離れるにしたがって増加する
請求項1に記載のアーク蒸発源。 - 前記磁場は、前記ターゲットの側面において前記ターゲットの軸方向の前記ターゲットの先端面から20mmまでの範囲において、前記磁力線の強度における前記ターゲットの軸方向の成分が800G以上になる場所を有する、
請求項1に記載のアーク蒸発源。 - 前記磁石は、永久磁石である、
請求項1に記載のアーク蒸発源。 - 前記永久磁石は、ネオジムを含む、
請求項10に記載のアーク蒸発源。 - 複数の前記磁石は、前記ターゲットの周方向において、互いに等間隔に配置されている
請求項1に記載のアーク蒸発源。 - 前記磁石は、前記ターゲットの先端面から当該ターゲットの軸方向における後方側に配置されている
請求項1に記載のアーク蒸発源。
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ES15827912T ES2764281T3 (es) | 2014-07-30 | 2015-07-03 | Fuente de evaporación por arco |
MX2017001286A MX2017001286A (es) | 2014-07-30 | 2015-07-03 | Fuente de evaporacion de arco. |
BR112016030966-9A BR112016030966B1 (pt) | 2014-07-30 | 2015-07-03 | Fonte de evaporação de arco |
KR1020167035899A KR101943725B1 (ko) | 2014-07-30 | 2015-07-03 | 아크 증발원 |
CN201580033266.9A CN106460159B (zh) | 2014-07-30 | 2015-07-03 | 电弧蒸发源 |
US15/321,227 US10913997B2 (en) | 2014-07-30 | 2015-07-03 | Arc evaporation source |
EP15827912.5A EP3156516B1 (en) | 2014-07-30 | 2015-07-03 | Arc evaporation source |
IL249422A IL249422B (en) | 2014-07-30 | 2016-12-06 | arc evaporation source |
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