PT3156516T - Fonte de evaporação de arco - Google Patents
Fonte de evaporação de arcoInfo
- Publication number
- PT3156516T PT3156516T PT158279125T PT15827912T PT3156516T PT 3156516 T PT3156516 T PT 3156516T PT 158279125 T PT158279125 T PT 158279125T PT 15827912 T PT15827912 T PT 15827912T PT 3156516 T PT3156516 T PT 3156516T
- Authority
- PT
- Portugal
- Prior art keywords
- evaporation source
- arc evaporation
- arc
- source
- evaporation
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014154722 | 2014-07-30 | ||
JP2015036107A JP6403269B2 (ja) | 2014-07-30 | 2015-02-26 | アーク蒸発源 |
Publications (1)
Publication Number | Publication Date |
---|---|
PT3156516T true PT3156516T (pt) | 2020-03-24 |
Family
ID=55217279
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PT158279125T PT3156516T (pt) | 2014-07-30 | 2015-07-03 | Fonte de evaporação de arco |
Country Status (11)
Country | Link |
---|---|
US (1) | US10913997B2 (pt) |
EP (1) | EP3156516B1 (pt) |
JP (1) | JP6403269B2 (pt) |
KR (1) | KR101943725B1 (pt) |
CN (1) | CN106460159B (pt) |
BR (1) | BR112016030966B1 (pt) |
ES (1) | ES2764281T3 (pt) |
IL (1) | IL249422B (pt) |
MX (1) | MX2017001286A (pt) |
PT (1) | PT3156516T (pt) |
WO (1) | WO2016017374A1 (pt) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG11201606347XA (en) * | 2014-03-18 | 2016-09-29 | Canon Anelva Corp | Deposition apparatus |
CN107881478B (zh) * | 2017-11-30 | 2024-02-27 | 嘉兴岱源真空科技有限公司 | 一种引弧点火装置及纳米材料制作设备 |
Family Cites Families (54)
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AT376460B (de) * | 1982-09-17 | 1984-11-26 | Kljuchko Gennady V | Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen |
US4556471A (en) * | 1983-10-14 | 1985-12-03 | Multi-Arc Vacuum Systems Inc. | Physical vapor deposition apparatus |
DE3789307T2 (de) * | 1986-04-04 | 1994-06-09 | Univ Minnesota | Bogenbeschichtung von feuerfesten metallverbindungen. |
JP2537210B2 (ja) * | 1986-09-18 | 1996-09-25 | 株式会社東芝 | 高密度プラズマの発生装置 |
US4767931A (en) * | 1986-12-17 | 1988-08-30 | Hitachi, Ltd. | Ion beam apparatus |
DE3700633C2 (de) * | 1987-01-12 | 1997-02-20 | Reinar Dr Gruen | Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma |
DE4017111C2 (de) * | 1990-05-28 | 1998-01-29 | Hauzer Holding | Lichtbogen-Magnetron-Vorrichtung |
JPH04221064A (ja) | 1990-12-21 | 1992-08-11 | Nkk Corp | 真空アーク発生装置並びに該装置を利用したイオンビーム発生装置 |
JP3221892B2 (ja) * | 1991-09-20 | 2001-10-22 | 帝国ピストンリング株式会社 | ピストンリング及びその製造法 |
US5279723A (en) * | 1992-07-30 | 1994-01-18 | As Represented By The United States Department Of Energy | Filtered cathodic arc source |
US5480527A (en) * | 1994-04-25 | 1996-01-02 | Vapor Technologies, Inc. | Rectangular vacuum-arc plasma source |
JP3287163B2 (ja) * | 1995-01-23 | 2002-05-27 | 日新電機株式会社 | アーク式蒸発源 |
GB9722645D0 (en) * | 1997-10-24 | 1997-12-24 | Univ Nanyang | Enhanced macroparticle filter and cathode arc source |
SE511139C2 (sv) * | 1997-11-20 | 1999-08-09 | Hana Barankova | Plasmabearbetningsapparat med vridbara magneter |
AU9410498A (en) * | 1997-11-26 | 1999-06-17 | Vapor Technologies, Inc. | Apparatus for sputtering or arc evaporation |
US6103074A (en) * | 1998-02-14 | 2000-08-15 | Phygen, Inc. | Cathode arc vapor deposition method and apparatus |
TWI242049B (en) * | 1999-01-14 | 2005-10-21 | Kobe Steel Ltd | Vacuum arc evaporation source and vacuum arc vapor deposition apparatus |
US6929727B2 (en) * | 1999-04-12 | 2005-08-16 | G & H Technologies, Llc | Rectangular cathodic arc source and method of steering an arc spot |
US6440282B1 (en) * | 1999-07-06 | 2002-08-27 | Applied Materials, Inc. | Sputtering reactor and method of using an unbalanced magnetron |
JP2001152319A (ja) * | 1999-11-25 | 2001-06-05 | Kohan Kogyo Kk | 密着性に優れた表面処理層を有する表面処理金属部材、その表面処理方法、及びその表面処理方法を用いてなる回転機器用部材 |
JP3860954B2 (ja) * | 2000-07-07 | 2006-12-20 | 株式会社日立グローバルストレージテクノロジーズ | リアルタイムパーティクルフィルタを具備したプラズマ処理装置 |
JP4371569B2 (ja) * | 2000-12-25 | 2009-11-25 | 信越化学工業株式会社 | マグネトロンスパッタ装置とそれを用いたフォトマスクブランクの製造方法 |
ES2228830T3 (es) * | 2001-03-27 | 2005-04-16 | Fundacion Tekniker | Evaporador de arco con guia magnetica intensa para blancos de superficie amplia. |
SE525231C2 (sv) * | 2001-06-14 | 2005-01-11 | Chemfilt R & D Ab | Förfarande och anordning för att alstra plasma |
WO2004027825A2 (en) * | 2002-09-19 | 2004-04-01 | Applied Process Technologies, Inc. | Beam plasma source |
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US6896773B2 (en) * | 2002-11-14 | 2005-05-24 | Zond, Inc. | High deposition rate sputtering |
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EP2018653B1 (de) * | 2006-05-16 | 2014-08-06 | Oerlikon Trading AG, Trübbach | Arcquelle und magnetanordnung |
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DE102007019982B4 (de) * | 2007-04-23 | 2011-02-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Anordnung zur Ausbildung von Beschichtungen auf Substraten im Vakuum |
JP4878020B2 (ja) | 2007-09-27 | 2012-02-15 | 株式会社神戸製鋼所 | 真空アーク蒸発源 |
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JP5037630B2 (ja) * | 2007-12-18 | 2012-10-03 | キヤノンアネルバ株式会社 | プラズマ処理装置 |
DE102009008161A1 (de) * | 2009-02-09 | 2010-08-12 | Oerlikon Trading Ag, Trübbach | Modifizierbare Magnetkonfiguration für Arc-Verdampfungsquellen |
JP5649308B2 (ja) * | 2009-04-28 | 2015-01-07 | 株式会社神戸製鋼所 | 成膜速度が速いアーク式蒸発源及びこのアーク式蒸発源を用いた皮膜の製造方法 |
JP5318052B2 (ja) | 2010-06-23 | 2013-10-16 | 株式会社神戸製鋼所 | 成膜速度が速いアーク式蒸発源、このアーク式蒸発源を用いた皮膜の製造方法及び成膜装置 |
JP5081320B2 (ja) * | 2011-02-23 | 2012-11-28 | 株式会社神戸製鋼所 | アーク式蒸発源 |
JP5081315B2 (ja) * | 2011-02-23 | 2012-11-28 | 株式会社神戸製鋼所 | アーク式蒸発源 |
KR20150103382A (ko) * | 2011-02-23 | 2015-09-10 | 가부시키가이샤 고베 세이코쇼 | 아크식 증발원 |
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JP5946337B2 (ja) * | 2012-06-20 | 2016-07-06 | 株式会社神戸製鋼所 | アーク式蒸発源 |
-
2015
- 2015-02-26 JP JP2015036107A patent/JP6403269B2/ja active Active
- 2015-07-03 CN CN201580033266.9A patent/CN106460159B/zh active Active
- 2015-07-03 WO PCT/JP2015/069340 patent/WO2016017374A1/ja active Application Filing
- 2015-07-03 US US15/321,227 patent/US10913997B2/en active Active
- 2015-07-03 PT PT158279125T patent/PT3156516T/pt unknown
- 2015-07-03 EP EP15827912.5A patent/EP3156516B1/en active Active
- 2015-07-03 BR BR112016030966-9A patent/BR112016030966B1/pt active IP Right Grant
- 2015-07-03 MX MX2017001286A patent/MX2017001286A/es unknown
- 2015-07-03 KR KR1020167035899A patent/KR101943725B1/ko active IP Right Grant
- 2015-07-03 ES ES15827912T patent/ES2764281T3/es active Active
-
2016
- 2016-12-06 IL IL249422A patent/IL249422B/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
IL249422B (en) | 2020-10-29 |
US10913997B2 (en) | 2021-02-09 |
ES2764281T3 (es) | 2020-06-02 |
MX2017001286A (es) | 2017-05-10 |
EP3156516A4 (en) | 2017-04-19 |
WO2016017374A1 (ja) | 2016-02-04 |
CN106460159A (zh) | 2017-02-22 |
KR101943725B1 (ko) | 2019-01-29 |
CN106460159B (zh) | 2019-03-05 |
KR20170008298A (ko) | 2017-01-23 |
EP3156516A1 (en) | 2017-04-19 |
JP6403269B2 (ja) | 2018-10-10 |
BR112016030966B1 (pt) | 2021-12-07 |
US20170204507A1 (en) | 2017-07-20 |
IL249422A0 (en) | 2017-02-28 |
BR112016030966A2 (pt) | 2018-07-17 |
JP2016033256A (ja) | 2016-03-10 |
EP3156516B1 (en) | 2019-12-18 |
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