WO2015053595A1 - Diode électroluminescente à semi-conducteurs - Google Patents

Diode électroluminescente à semi-conducteurs Download PDF

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Publication number
WO2015053595A1
WO2015053595A1 PCT/KR2014/009582 KR2014009582W WO2015053595A1 WO 2015053595 A1 WO2015053595 A1 WO 2015053595A1 KR 2014009582 W KR2014009582 W KR 2014009582W WO 2015053595 A1 WO2015053595 A1 WO 2015053595A1
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Prior art keywords
electrode
layer
film
light emitting
semiconductor
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PCT/KR2014/009582
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English (en)
Korean (ko)
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전수근
진근모
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주식회사 세미콘라이트
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Priority claimed from KR1020130121306A external-priority patent/KR101549870B1/ko
Priority claimed from KR1020130161297A external-priority patent/KR101591966B1/ko
Priority claimed from KR1020140014753A external-priority patent/KR101578484B1/ko
Priority claimed from KR1020140037940A external-priority patent/KR101561203B1/ko
Priority claimed from KR1020140037938A external-priority patent/KR101638120B1/ko
Priority claimed from KR1020140049301A external-priority patent/KR101604095B1/ko
Application filed by 주식회사 세미콘라이트 filed Critical 주식회사 세미콘라이트
Priority to CN201810324277.8A priority Critical patent/CN108389946B/zh
Priority to US15/028,653 priority patent/US9748446B2/en
Priority to CN201480056016.2A priority patent/CN105637658B/zh
Publication of WO2015053595A1 publication Critical patent/WO2015053595A1/fr

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    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
    • H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
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    • H01L33/002—Devices characterised by their operation having heterojunctions or graded gap
    • H01L33/0025—Devices characterised by their operation having heterojunctions or graded gap comprising only AIIIBV compounds
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    • H01L33/0062—Processes for devices with an active region comprising only III-V compounds
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    • H01L33/005—Processes
    • H01L33/0062—Processes for devices with an active region comprising only III-V compounds
    • H01L33/0075—Processes for devices with an active region comprising only III-V compounds comprising nitride compounds
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    • H01L33/145—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure with a current-blocking structure
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    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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    • H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
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    • H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
    • H01L33/06—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
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    • H01L33/26—Materials of the light emitting region
    • H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
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    • H01L33/26—Materials of the light emitting region
    • H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
    • H01L33/32—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
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    • H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • H01L33/382—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending partially in or entirely through the semiconductor body
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    • H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • H01L33/387—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape with a plurality of electrode regions in direct contact with the semiconductor body and being electrically interconnected by another electrode layer
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    • H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40—Materials therefor
    • H01L33/42—Transparent materials
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    • H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls

Definitions

  • the present disclosure relates to a semiconductor light emitting device as a whole, and more particularly, to a semiconductor light emitting device having an electrode structure which reduces resistance of electrical contact and improves reliability of electrical contact.
  • the semiconductor light emitting device refers to a semiconductor optical device that generates light through recombination of electrons and holes, for example, a group III nitride semiconductor light emitting device.
  • the group III nitride semiconductor consists of a compound of Al (x) Ga (y) In (1-x-y) N (0 ⁇ x ⁇ 1, 0 ⁇ y ⁇ 1, 0 ⁇ x + y ⁇ 1).
  • GaAs type semiconductor light emitting elements used for red light emission, etc. are mentioned.
  • FIG. 1 is a view showing an example of a semiconductor light emitting device disclosed in US Patent No. 7,262,436.
  • the semiconductor light emitting device may include a substrate 100, an n-type semiconductor layer 300 grown on the substrate 100, an active layer 400 grown on the n-type semiconductor layer 300, and p grown on the active layer 400.
  • a chip having such a structure that is, a chip in which both the electrodes 901, 902, 903 and the electrode 800 are formed on one side of the substrate 100, and the electrodes 901, 902, 903 function as a reflective film is called a flip chip.
  • the electrodes 901, 902 and 903 may include a high reflectance electrode 901 (eg Ag), an electrode 903 (eg Au) for bonding, and an electrode 902 which prevents diffusion between the electrode 901 material and the electrode 903 material; Example: Ni).
  • This metal reflective film structure has a high reflectance and has an advantage in current spreading, but has a disadvantage of light absorption by metal.
  • FIG. 2 is a view showing an example of a semiconductor light emitting device disclosed in Japanese Laid-Open Patent Publication No. 2006-20913.
  • the semiconductor light emitting device includes a substrate 100, a buffer layer 200 grown on the substrate 100, an n-type semiconductor layer 300 grown on the buffer layer 200, and an active layer 400 grown on the n-type semiconductor layer 300.
  • the bonding pad 700 and the n-side bonding pad 800 are formed on the etched and exposed n-type semiconductor layer 300.
  • the distributed Bragg reflector 900 DBR: Distributed Bragg Reflector
  • the metal reflecting film 904 are provided on the transparent conductive film 600. According to this configuration, the light absorption by the metal reflective film 904 is reduced, but there is a disadvantage in that current spreading is not smoother than using the electrodes 901, 902, 903.
  • FIG. 1 is a view showing an example of a semiconductor light emitting device disclosed in US Patent No. 7,262,436;
  • FIG. 2 is a view showing an example of a semiconductor light emitting device disclosed in Japanese Patent Laid-Open No. 2006-20913;
  • FIG. 3 is a view illustrating an example of a semiconductor light emitting device and a method of manufacturing the same according to the present disclosure
  • FIG. 4 is a view for explaining an example of a method of manufacturing a semiconductor light emitting device described in FIG.
  • FIG. 5 is an enlarged view of a portion R1 of an opening formed by a dry etching process
  • FIG. 6 is a view illustrating an upper surface of an electrode on which a wet etching process is performed
  • FIG. 8 is a view for explaining another example of a semiconductor light emitting device and a method of manufacturing the same according to the present disclosure
  • FIG. 9 is a view for explaining another example of a semiconductor light emitting device and a method of manufacturing the same according to the present disclosure.
  • FIG. 10 is a view for explaining an example of a cross section taken along a line A-A in FIG. 9;
  • FIG. 11 is a view for explaining another example of a semiconductor light emitting device and a method of manufacturing the same according to the present disclosure
  • FIG. 12 is a view for explaining another example of a semiconductor light emitting device and a method of manufacturing the same according to the present disclosure
  • FIG. 13 is a view showing still another example of a semiconductor light emitting device according to the present disclosure.
  • FIG. 14 is a cross-sectional view taken along the line A-A of FIG.
  • 15 is a cross-sectional view taken along the line B-B of FIG. 13;
  • 16 is a view illustrating a state in which a p-side electrode, an n-side electrode, and a non-conductive reflective film are removed from the semiconductor light emitting device of FIG. 13;
  • FIG 17 illustrates another example of the semiconductor light emitting device according to the present disclosure.
  • 19 is a cross-sectional view taken along the line E-E of FIG. 17;
  • 20 is a view showing a state before two semiconductor light emitting devices are separated into independent semiconductor light emitting devices during a semiconductor light emitting device manufacturing process
  • 21 is a view showing a state in which two semiconductor light emitting devices are separated into independent semiconductor light emitting devices during a semiconductor light emitting device manufacturing process
  • FIG. 23 is a cross-sectional view taken along the line AA ′ of FIG. 22;
  • FIG. 24 is a view showing still another example of a semiconductor light emitting device according to the present disclosure.
  • 25 is a view showing still another example of a semiconductor light emitting device according to the present disclosure.
  • 26 is a view showing still another example of a semiconductor light emitting device according to the present disclosure.
  • FIG. 27 is a view showing still another example of a semiconductor light emitting device according to the present disclosure.
  • FIG. 28 is a diagram illustrating an example of a state in which the semiconductor light emitting device illustrated in FIG. 27 is fixed to an external electrode;
  • 29 is a photograph showing the extent of spreading on gold and tin in liquid tin
  • FIG. 30 is a view showing still another example of a semiconductor light emitting device according to the present disclosure.
  • FIG. 32 is a view showing still another example of a semiconductor light emitting device according to the present disclosure.
  • FIG. 33 is a view showing a modification of the semiconductor light emitting device shown in FIG. 27;
  • FIG. 34 is a view showing a modification of the semiconductor light emitting device shown in FIG. 30;
  • 35 is a view showing a modification of the semiconductor light emitting device shown in FIG. 32;
  • 36 is a graph showing a change in bonding strength according to the thickness of the antioxidant layer.
  • 38 is a diagram illustrating an example of a configuration of an n-side electrode and / or a p-side electrode according to the present disclosure
  • FIG. 40 is a view showing a change in production yield according to the thickness of an electrode or bump according to the present disclosure
  • 41 is a view showing still another example of the n-side electrode and / or p-side electrode configuration according to the present disclosure
  • 44 is a view for explaining an example of a semiconductor light emitting device according to the present disclosure.
  • 45 to 50 are views illustrating an example of a method of manufacturing a semiconductor light emitting device according to the present disclosure.
  • 51 is a view for explaining an example of a semiconductor light emitting device according to the present disclosure.
  • FIG. 52 is a view for explaining an example of a second ohmic electrode
  • 53 to 59 are views for explaining an example of a method of manufacturing a semiconductor light emitting device according to the present disclosure
  • 60 is a view for explaining another example of the semiconductor light emitting device according to the present disclosure.
  • 61 is a view for explaining another example of the semiconductor light emitting device according to the present disclosure.
  • 62 is a view for explaining an example of a semiconductor light emitting device according to the present disclosure.
  • FIG. 63 is a view illustrating a cross section taken along a line A-A in FIG. 62;
  • FIG. 64 is an enlarged view of a portion of the semiconductor light emitting device shown in FIG. 63;
  • 65 is a photograph showing an example of a first opening formed in a nonconductive reflecting film
  • 67 is a view showing still another example of the semiconductor light emitting device according to the present disclosure.
  • FIG. 68 is a view showing still another example of a semiconductor light emitting device according to the present disclosure.
  • 70 is a view showing still another example of a semiconductor light emitting device according to the present disclosure.
  • 71 is a view showing an example of a method of manufacturing a semiconductor light emitting device according to the present disclosure
  • 73 is a diagram for explaining a state before forming an upper electrode
  • FIG. 74 is a view showing an example of a cross section taken along the line A-A of FIG. 72,
  • 76 is a view for explaining an example of how the upper rim of the opening is formed
  • 77 is a view for explaining examples of an electrode portion of a semiconductor light emitting device according to the present disclosure.
  • 78 is a view for explaining examples of a planar shape of an electrode portion
  • 79 is a view for explaining other examples of the electrode unit according to the present disclosure.
  • 81 is a view for explaining an example of a semiconductor light emitting device according to the present disclosure.
  • FIG. 82 is a view showing an example of a cross section taken along the line A-A of FIG. 81,
  • 83 is a view schematically showing an example of a semiconductor light emitting device of Comparative Example and a semiconductor light emitting device according to the present disclosure
  • FIG. 84 is a diagram illustrating a state before formation of a first electrode and a second electrode
  • 86 is a view for explaining an example of a layer structure of a lower electrode
  • FIG 3 is a view illustrating an example of a semiconductor light emitting device and a method of manufacturing the same according to the present disclosure.
  • a first semiconductor layer having a first conductivity, a second semiconductor layer having a second conductivity different from the first conductivity, and interposed between the first semiconductor layer and the second semiconductor layer A plurality of semiconductor layers having an active layer that generates light through recombination are formed on the substrate (S11). Thereafter, an electrode electrically connected to the first semiconductor layer or the second semiconductor layer is formed (S21). Next, a non-conductive film is formed covering the electrodes and facing the plurality of semiconductor layers, and reflecting light from the active layer (S31).
  • an opening for exposing the electrode is formed by the first etching process (S41).
  • the material formed on the upper surface of the electrode exposed to the opening by the second etching process is removed (S51).
  • An electrical connection in contact with the electrode is formed in the opening (S61).
  • FIG. 4 is a view for explaining an example of a method of manufacturing the semiconductor light emitting device described in FIG.
  • a buffer layer 20 is first grown on a substrate 10, and an n-type semiconductor layer 30 (first semiconductor layer), an active layer 40, and a p-type semiconductor layer (on the buffer layer 20) 50; second semiconductor layer) is sequentially grown (S11 in FIG. 3).
  • Sapphire, SiC, Si, GaN, etc. are mainly used as the substrate 10, and the substrate 10 may be finally removed, and the buffer layer 20 may be omitted.
  • the p-type semiconductor layer 50 and the active layer 40 are mesa-etched to partially expose the n-type semiconductor layer.
  • the order of mesa etching can be changed.
  • the light absorption preventing part 65 is formed on the p-type semiconductor layer corresponding to the electrode 93 to be formed in the subsequent process.
  • the light absorption prevention unit 65 may be omitted.
  • the light absorption prevention part 65 may include a single layer (eg, SiO 2 ), a multilayered film (eg, Si0 2 / TiO 2 / SiO 2 ), a distributed Bragg reflector, and a light-transmitting material having a lower refractive index than that of the p-type semiconductor layer 50. Or a combination of a single layer and a distributed Bragg reflector.
  • the light absorption prevention part 65 may be made of a non-conductive material (eg, a dielectric film such as SiO x or TiO x ).
  • a light transmissive conductive film 60 is formed on the p-type semiconductor layer 50 to cover the light absorption preventing part 65 and to spread the current through the p-type semiconductor layer 50.
  • the transparent conductive film 60 may be formed of a material such as ITO or Ni / Au.
  • an electrode 93 is formed on the transparent conductive film 60 (S21 of FIG. 3).
  • the electrode 93 is electrically connected to the p-type semiconductor layer 50 by the transparent conductive film 60.
  • An n-side bonding pad 80 that supplies electrons to the n-type semiconductor layer 30 on the exposed n-type semiconductor layer 30 may be formed with the formation of the electrode 93.
  • the n-side bonding pad 80 may be formed together with the reflective electrode 92 to be described later.
  • the electrical connection 94 (see FIG. 7) to be described later is directly connected to the transparent conductive film 60, it is easy to form a good electrical contact between the reflective electrode 92 (see FIG. 7) and the transparent conductive film 60 to be described later. You may not.
  • the electrode 93 is interposed between the transparent conductive film 60 and the electrical connection 94 to make stable and electrical contact therewith and to prevent an increase in contact resistance.
  • a non-conductive reflecting film 91 covering the electrode 93 is formed (S31 in FIG. 3).
  • the non-conductive reflective film 91 may also be formed on portions of the n-type semiconductor layer 30 and the n-side bonding pads 80 that are etched and exposed.
  • the nonconductive reflecting film 91 does not necessarily cover all regions on the n-type semiconductor layer 30 and the p-type semiconductor layer 50.
  • the nonconductive reflecting film 91 functions as a reflecting film, but is preferably formed of a light transmitting material to prevent absorption of light.
  • the nonconductive reflecting film 91 may be formed of a light transmissive dielectric material, for example, SiO x , TiO x , Ta 2 O 5 , MgF 2 .
  • the non-conductive reflecting film 91 is made of SiO x , since the non-conductive reflecting film 91 has a lower refractive index than the p-type semiconductor layer 50 (eg, GaN), light having an incident angle greater than or equal to a critical angle is provided in the plurality of semiconductor layers 30, 40, and 50. Some reflections can be made to the side.
  • the p-type semiconductor layer 50 eg, GaN
  • the non-conductive reflecting film 91 is made of a distributed Bragg reflector (DBR: DBR made of a combination of SiO 2 and TiO 2 )
  • DBR distributed Bragg reflector
  • FIG. 5 is an enlarged view of a portion R2 of the opening formed by the dry etching process
  • FIG. 6 is a view illustrating an upper surface of the electrode on which the wet etching process is performed.
  • an opening 102 exposing a part of the electrode 93 is formed in the nonconductive reflecting film 91 by a dry etching process (first etching process) (S41 in FIG. 3).
  • first etching process halogen gas containing an F group (eg, CF 4 , C 2 F 6 , C 3 F 8 , SF 6, etc.) may be used as an etching gas.
  • the electrode 93 may comprise a plurality of layers.
  • the electrode 93 is formed on the contact layer 95 electrically connected to the p-type semiconductor layer 50, on the anti-oxidation layer 98 and the anti-oxidation layer 98 formed on the contact layer 95.
  • An etch stop layer 99 is included.
  • the electrode 93 includes a contact layer 95, a reflection layer 96, a diffusion barrier layer 97, an antioxidant layer 98, and an etch stop layer 99 that are sequentially formed on the transparent conductive film 60.
  • the contact layer 95 is preferably made of a material which makes good electrical contact with the transparent conductive film 60.
  • materials such as Cr and Ti are mainly used. Ni and TiW may also be used, and Al and Ag having good reflectance may be used.
  • the reflective layer 96 may be made of a metal having excellent reflectance (eg, Ag, Al, or a combination thereof).
  • the reflective layer 96 reflects the light generated by the active layer 40 toward the plurality of semiconductor layers 30, 40, and 50.
  • the reflective layer 96 may be omitted.
  • the diffusion barrier layer 97 prevents the material of the reflective layer 96 or the material of the antioxidant layer 98 from diffusing into another layer.
  • the diffusion barrier layer 97 may be formed of at least one selected from Ti, Ni, Cr, W, TiW, and the like, and when a high reflectance is required, Al, Ag, or the like may be used.
  • the antioxidant layer 98 may be made of Au, Pt, or the like, and may be any material as long as it is exposed to the outside and does not oxidize well in contact with oxygen. As the antioxidant layer 98, Au having good electrical conductivity is mainly used.
  • the etch stop layer 99 is a layer exposed in the dry etching process for forming the opening 102.
  • the etch stop layer 99 is the uppermost layer of the electrode 93.
  • Au is used as the etch stop layer 99, not only the bonding strength with the non-conductive reflecting film 91 is weak, but a portion of Au may be damaged or damaged during etching. Therefore, if the etch stop layer 99 is made of a material such as Ni, W, TiW, Cr, Pd, Mo, instead of Au, the bonding strength with the non-conductive reflective film 91 can be maintained, thereby improving reliability.
  • the etch stop layer 99 protects the electrode 93, and in particular, prevents damage to the antioxidant layer 98.
  • the halogen gas as an etching gas containing an F: can be used (for example, CF 4, C 2 F 6, C 3 F 8, SF 6). Therefore, in order to prevent damage to the antioxidant layer 98, the etch stop layer 99 may be made of a material having excellent etching selectivity in the dry etching process. When the etching selectivity of the etch stop layer 99 is not good, the antioxidant layer 98 may be damaged or damaged in the dry etching process. Therefore, Cr or Ni is suitable as a material of the etch stop layer 99 in view of the etching selectivity. Ni or Cr does not react with or slightly reacts with the etching gas of the dry etching process, and is not etched to protect the electrode 93.
  • a material 107 such as an insulating material or an impurity may be formed on the upper layer of the electrode 93 due to the etching gas.
  • a material 107 may be formed by reacting the halogen etching gas including the F group with the upper metal of the electrode.
  • the halogen etching gas including the F group For example, at least some of Ni, W, TiW, Cr, Pd, Mo, and the like as the material of the etch stop layer 99 may react with the etching gas of the dry etching process as shown in FIG. Example: NiF) can be formed.
  • the material 107 formed as described above may cause a decrease in electrical characteristics (eg, an increase in operating voltage) of the semiconductor light emitting device.
  • Ni, W, TiW, Cr, Pd, Mo, etc. do not react with the etching gas to form a material or form a very small amount of material. It is preferable to suppress material generation or to form a small amount, and Cr is more suitable as a material of the etch stop layer 99 than Ni in this respect.
  • the upper layer of the electrode 93 that is, the portion corresponding to the opening 102 of the etch stop layer 99 is removed by a wet etching process (second etching process) in consideration of the formation of a material, and is illustrated in FIG. 6.
  • second etching process the antioxidant layer 98 corresponding to the opening 102 is exposed.
  • the material 107 is etched away along with the etch stop layer 99. As such, by removing the material 107, the electrical contact between the electrode 93 and the electrical connection 94 (see FIG. 7) is improved, and the electrical characteristics of the semiconductor light emitting device are prevented from being lowered.
  • the first etching process may be performed by wet etching to form the opening 102.
  • HF, BOE, NHO 3 , HCl, or the like may be used alone or in combination of appropriate concentrations as an etchant of the nonconductive reflecting film 91.
  • the etching selectivity of the etch stop layer 99 is excellent for protecting the antioxidant layer 98. .
  • Cr is suitable as a material of the etch stop layer 99.
  • the etch stop layer 99 corresponding to the opening 102 may be removed by a subsequent wet etching process (second etching process).
  • the etch stop layer 99 By the process of forming the opening 102 and the process of removing the etch stop layer 99 corresponding to the opening 102, the etch stop layer 99 having a good bonding strength with the non-conductive reflecting film 91 in portions other than the opening 102.
  • the electrode 93 has a configuration such as Cr (contact layer) / Al (reflective layer) / Ni (diffusion prevention layer) / Au (antioxidation layer) / Cr (etch prevention layer) sequentially stacked.
  • the etch stop layer 99 is removed from the opening 102 to prevent electrical property degradation.
  • etch stop layer 99 may be wet-etched at a portion corresponding to the opening 102, so that some of the etch stop layer 99 remains, and the material concentrated on the upper surface of the etch stop layer may be considered. Can be removed.
  • FIG. 7 is a diagram illustrating an electrical connection formed in the opening.
  • an electrical connection 94 in contact with the electrode 93 is formed in the opening 102 (S61 in FIG. 3). Electrical connection 94 may be formed such that electrical connection 94 is in contact with anti-oxidation layer 98 exposed through opening 102.
  • a reflective electrode 92 may be formed on the non-conductive reflective film 91 in contact with the electrical connection 94 using a metal such as Al or Ag having a high reflectance.
  • the process of forming the reflective electrode 92 may be a method of deposition or plating.
  • the reflective electrode 92 and the electrical connection 94 may be formed together instead of separately.
  • the opening 102 is filled to form an electrical connection 94.
  • Reflective electrode 92 may be formed using Cr, Ti, Ni, or an alloy thereof for stable electrical contact.
  • the reflective electrode 92 may be electrically connected to the outside to supply holes to the p-type semiconductor layer 50, and may reflect light not reflected by the non-conductive reflective film 91.
  • the n-side bonding pad 80 may be formed on the n-type semiconductor layer 30 side or the conductive substrate side from which the substrate 10 is removed.
  • the positions of the n-type semiconductor layer 30 and the p-type semiconductor layer 50 may be changed, and are mainly made of GaN in the group III nitride semiconductor light emitting device.
  • Each semiconductor layer 20, 30, 40, 50 may be composed of multiple layers, and additional layers may be provided.
  • the electrode 93, the n-side bonding pad 80, and the reflective electrode 92 may be formed to have branches for current spreading.
  • the n-side bonding pad 80 may have a height sufficient to be coupled to the package using a separate bump, or may be deposited to a height sufficient to be coupled to the package as shown in FIG. 2.
  • the material 199 is removed between the electrode 93 and the electrical connection 94 to prevent the deterioration of electrical characteristics of the semiconductor light emitting device.
  • a semiconductor light emitting device including an electrode 93 having good bonding force with the non-conductive reflective film 91 and making good electrical contact with the electrical connection 94 can be manufactured.
  • the electrode 93, the electrical connection 94 and the reflective electrode 92 constitute an electrode portion for supplying holes to the second semiconductor layer 50.
  • the electrode portion includes an electrode 93 as a lower electrode, a reflective electrode 92 as an upper electrode, and an electrical connection is formed in the opening to electrically connect the lower electrode and the upper electrode.
  • FIG. 8 is a view for explaining another example of a semiconductor light emitting device and a method of manufacturing the same according to the present disclosure.
  • the manufacturing method of the semiconductor light emitting device is substantially the same as the manufacturing method of the semiconductor light emitting device described with reference to FIGS. 3 to 7 except that the electrode 93 includes a reflective layer 96 and a diffusion barrier layer 97 which are alternately repeatedly stacked. Since the description is the same, duplicate descriptions are omitted.
  • the electrode 93 includes a contact layer 95 formed on the transparent conductive film 60, a reflective layer 96 repeatedly stacked on the contact layer 95, an anti-diffusion layer 97, and an anti-oxidation layer 98 formed on the diffusion prevention layer 97. ), An etch stop layer 99 formed on the anti-oxidation layer 98 and in contact with the non-conductive reflecting film 91. The etch stop layer 99 corresponding to the opening is removed to expose the antioxidant layer 98, and the electrical connection 94 is formed to contact the antioxidant layer 98.
  • the reflective layer 96 / diffusion diffusion layer 97 may be formed such as Al / Ni / Al / Ni / Al / Ni.
  • the area of the electrode 94 may increase.
  • prevention of light absorption by the electrode 93 may become more important, and the reflective layer 96 becomes important.
  • the formation of the reflective layer 96 such as Al with a high thickness can cause various problems such as the bursting of the Al layer, the repeated stacking of the reflective layer 96 / diffusion preventing layer 97 as in this example results in insulating material or impurities. Such materials can be removed to provide good electrical contact while improving reflectance to avoid problems.
  • FIG. 9 is a view illustrating another example of a semiconductor light emitting device and a method of manufacturing the same according to the present disclosure
  • FIG. 10 is a view illustrating an example of a cross section taken along line A-A in FIG. 9.
  • the manufacturing method of the semiconductor light emitting device can be applied to a large area semiconductor light emitting device.
  • the area of the electrode 93 is enlarged or extended in the form of branch electrodes, and a plurality of openings and a plurality of electrical connections 94 are formed, and the non-conductive reflecting film 91 is formed of the dielectric film 91b.
  • distribution Bragg reflector 91a (DBR: Distributed Bragg Reflector; for example, DBR made of a combination of SiO 2 and TiO 2 ) is substantially the same as the manufacturing method of the semiconductor light emitting device described in Figures 3 to 7 Therefore, duplicate descriptions are omitted.
  • the non-conductive reflecting film 91 includes a distributed Bragg reflector, it is possible to reflect a greater amount of light toward the plurality of semiconductor layers 30, 40, and 50.
  • the material is suitably SiO 2 , and the thickness thereof is appropriately 0.2 ⁇ m to 1.0 ⁇ m.
  • the dielectric film 91b made of SiO 2 is preferably formed by Chemical Vapor Deposition (CVD), and particularly, Plasma Enhanced CVD (PECVD).
  • each layer is designed to have an optical thickness of 1/4 of a given wavelength when composed of TiO 2 / SiO 2 , and the number of combinations is suitable for 4 to 20 pairs. Do.
  • the distribution Bragg reflector 91a is preferably formed by Physical Vapor Deposition (PVD), in particular, by E-Beam Evaporation, Sputtering, or Thermal Evaporation.
  • An additional dielectric film may be formed over the distribution Bragg reflector 91a prior to forming the reflective electrode 92.
  • Dielectric film 91b, distributed Bragg reflector 91a and further dielectric film form a lightguide structure.
  • a plurality of electrical connections 94 are formed between the electrode 93 and the p-side reflective electrode 92 to spread current. Therefore, a material may be formed on the upper surface of the electrode 93 exposed by the plurality of openings in a dry etching process for forming the plurality of openings in the non-conductive reflective film 91.
  • the wet etch process removes the material corresponding to the opening along with the top layer of electrode 93, for example, the etch stop layer.
  • An electrical connection 94 is then formed in the plurality of openings. Therefore, the degradation of the electrical characteristics of the large-area semiconductor light emitting device is prevented.
  • FIG. 11 is a view for explaining another example of a semiconductor light emitting device and a method of manufacturing the same according to the present disclosure.
  • an n-side bonding pad 80 is formed on a non-conductive reflective film 91 to form an electrical connection 82 between the n-side bonding pad 80 and the n-side branch electrode 81. Since the process of forming the opening and the heat dissipation and reflective electrode 108 are provided, the description thereof is substantially the same as the method of manufacturing the semiconductor light emitting device described with reference to FIGS.
  • the n-side branch electrode 81 may have a material such as an insulating material or an impurity formed on the top surface thereof.
  • Subsequent wet etching processes may remove the material on the upper surface of the electrode 93 and the n-side branch electrode 81 exposed through the opening, together with the etch stop layer. Thereafter, electrical connections 94 and 82 are formed. The electrical connections 94 and 82 may be formed to contact the antioxidant layers of the exposed electrode 93 and the n-side branch electrode 81 by removing the etch stop layer.
  • the p-side bonding pad 92 and the n-side bonding pad 80 are electrically connected to the p-type semiconductor layer 50 and the n-type semiconductor layer 30 through electrical connections 94 and 82, respectively.
  • FIG. 12 is a view for explaining another example of a semiconductor light emitting device and a method of manufacturing the same according to the present disclosure.
  • the transparent conductive film and the light absorption preventing part are omitted, and the electrode 93 is formed on the entire surface of the p-type semiconductor layer 50 so as to function as a reflecting film and a current spreading conductive film. Since the n-side branch electrode 81 is further provided, the description thereof is substantially the same as the method of manufacturing the semiconductor light emitting device described with reference to FIGS.
  • the electrode 93 includes a reflective layer 96 formed of a material having excellent reflectance such as Ag or Al, and the reflective layer 96 also functions as the p-type semiconductor layer 50 and the ohmic contact layer.
  • the electrode 93 includes an etch stop layer 99 formed of a material having good bonding strength with the non-conductive film 91 on the reflective layer 96.
  • the electrode 93 may include an etch stop layer made of a material such as Ni, W, TiW, Cr, Pd, or Mo on a reflective layer such as an Ag layer or an Al layer.
  • the etch stop layer 99 may be formed entirely on the Ag layer or the Al layer or may be formed only in a portion corresponding to the opening.
  • the etch stop layer 99 is preferably selected in consideration of the fact that the etching selectivity should be good in the dry etching process for forming the opening, and that the smaller the formation of a material such as an insulating material or an impurity that does not react with the etching gas, In this respect, Cr or Ni is suitable.
  • the dielectric film 91 is formed as a non-conductive film.
  • the dielectric film 91 may be formed of a light transmissive dielectric material, for example, SiO x , TiO x , Ta 2 O 5 , MgF 2 .
  • Openings are formed in the dielectric film 91 by a dry etching process.
  • a material such as an insulating material or an impurity may be formed on the upper surface of the electrode 93.
  • the material is removed by a wet etching process.
  • a part of the electrode 93 for example, at least a part of the etch stop layer 99 corresponding to the opening may be removed.
  • An electrical connection 94 is formed in the opening. Therefore, the rise of the operating voltage of the semiconductor light emitting device due to the material is prevented.
  • the semiconductor light emitting devices described above include a first electrode portion (n-side electrode portion) and a second electrode portion (p-side electrode portion). At least one of the first electrode portion and the second electrode portion is a lower electrode (eg, 93, 81) exposed at least in part by an opening, an upper electrode (eg, 92, 80) and an opening formed on the non-conductive film, Electrical connections (eg, 94, 82) connecting the electrode and the upper electrode. In the semiconductor light emitting element described below, such an electrode portion is also provided.
  • FIG. 13 is a view illustrating still another example of the semiconductor light emitting device according to the present disclosure
  • FIG. 14 is a cross-sectional view taken along line AA of FIG. 13
  • FIG. 15 is a cross-sectional view taken along line BB of FIG. 13
  • FIG. 13 the p-side electrode, the n-side electrode, and the non-conductive reflective film are removed.
  • the semiconductor light emitting device 1 is grown on the substrate 10, the buffer layer 20 grown on the substrate 10, the n-type semiconductor layer 30 grown on the buffer layer 20, and the n-type semiconductor layer 30. And an active layer 40 generating light through recombination of holes and a p-type semiconductor layer 50 grown on the active layer 40.
  • the substrate 10 is mainly used as the substrate 10, and the substrate 10 may be finally removed, and the buffer layer 20 may be omitted.
  • the n-side electrode 80 may be formed on the n-type semiconductor layer 30 side or the conductive substrate 10 side from which the substrate 10 is removed.
  • the positions of the n-type semiconductor layer 30 and the p-type semiconductor layer 50 may be changed, and are mainly made of GaN in the group III nitride semiconductor light emitting device.
  • Each semiconductor layer 20, 30, 40, 50 may be composed of multiple layers, and additional layers may be provided.
  • the p-type semiconductor layer 50 and the active layer 40 are partially removed through a mesa etching process to form two n-side contact regions 31 exposing the n-type semiconductor layer 30.
  • the n-side branch electrode 81 is formed on the n-type semiconductor layer 30 in the 31.
  • the n-side contact region 31 extends in parallel with one side C of the semiconductor light emitting device.
  • the n-side contact region 31 may be opened in the lateral direction of the semiconductor light emitting device, but it is preferable that the n-side contact region 31 is not opened to any one side and is surrounded by the active layer 40 and the p-type semiconductor layer 50. .
  • the number of n-side contact regions 31 can be increased or decreased, and the arrangement can be changed.
  • the n-side branch electrode 81 preferably includes a branch portion 88 that extends long and a connection portion 89 formed to have a wide width at one end of the branch portion 88.
  • the n-side contact region 31 is formed in a narrow width at the portion where the branch portion 88 of the n-side branch electrode 81 is positioned, and the connection portion 89 of the n-side branch electrode 81 is positioned. It is formed in a wide width.
  • Three p-side branch electrodes 93 are formed on the p-type semiconductor layer 50.
  • the p-side branch electrode 93 is formed in parallel with the n-side branch electrode 81 and is arranged between the two n-side branch electrodes 81 and on both sides. Accordingly, the n-side branch electrodes 81 are positioned between the three p-side branch electrodes 93, respectively.
  • the p-side branch electrode 93 also preferably includes an elongated branch portion 98 and a connecting portion 99 formed to have a wide width at one end of the branch portion 98. However, as shown in FIG.
  • the connecting portion 99 of the p-side branch electrode 93 is located on the opposite side of the connecting portion 89 of the n-side branch electrode 81 when the semiconductor light emitting device is viewed from above. That is, the connecting portion 99 of the p-side branch electrode 93 is positioned at the left side, and the connecting portion 89 of the n-side branch electrode 81 is positioned at the right side.
  • the p-side branch electrode 93 extends along the direction of one side C of the semiconductor light emitting device. For example, in FIGS. 13 and 16, it extends long from left to right.
  • the p-side branch electrode 93 When the device is turned upside down by the plurality of p-side branch electrodes 93 extending in this way and placed on a mounting portion (for example, a submount, a package, and a chip on board (COB)), the elements can be placed without tilting. From this point of view, the p-side branch electrode 93 is preferably formed as long as possible.
  • p-side branch electrode 93 and n-side branch electrode 81 2um-3um are suitable. Too thin a thickness may cause an increase in operating voltage, and too thick a branch electrode may cause process stability and a material cost increase.
  • a light absorption prevention film 95 is formed on the p-type semiconductor layer 50 corresponding to the p-side branch electrode 93.
  • the light absorption prevention film 95 is formed in a slightly wider width than the p-side branch electrode 93.
  • the light absorption prevention film 95 prevents light generated in the active layer 40 from being absorbed by the p-side branch electrode 93.
  • the light absorption prevention film 95 may have only a function of reflecting some or all of the light generated in the active layer 40, and current from the p-side branch electrode 93 does not flow directly below the p-side branch electrode 93. It may have only a function that prevents it, and may have both functions.
  • the light absorbing film 95 is a single layer of a p-type semiconductor layer 50, the low light-transmissive material than the refractive index (for example: SiO 2) or multiple layers (for example: Si0 2 / TiO 2 / SiO 2) Or a distribution Bragg reflector, or a combination of a single layer and a Distribution Bragg reflector.
  • the light absorption prevention layer 95 may be made of a non-conductive material (eg, a dielectric material such as SiO x or TiO x ).
  • the thickness of the light absorption prevention film 95 is appropriately 0.2um to 3.0um depending on the structure. If the thickness of the light absorption prevention film 95 is too thin, the function is weak.
  • the light absorption prevention film 95 does not necessarily need to be made of a light transmissive material, nor is it necessarily necessarily made of a non-conductive material. However, by using the transparent dielectric material, the effect can be further enhanced.
  • the transmissive conductive film 60 is formed on the p-type semiconductor layer 50 before the p-side branch electrode 93 is formed following the formation of the light absorption prevention film 95.
  • the transparent conductive film 60 is formed to cover almost the entirety of the p-type semiconductor layer 50 except for the n-side contact region 31 formed through the mesa etching process. Accordingly, the light absorption prevention film 95 is disposed between the transparent conductive film 60 and the p-type semiconductor layer 50.
  • the current spreading ability is inferior, and in the case where the p-type semiconductor layer 50 is made of GaN, most of the transparent conductive film 60 should be assisted.
  • the transparent conductive film 60 For example, materials such as ITO and Ni / Au may be used as the transparent conductive film 60.
  • the p-side branch electrode 93 is formed on the transparent conductive film 60 on which the light absorption prevention film 95 is located.
  • the non-conductive reflecting film 91 is formed so as to cover 50 entirely.
  • the nonconductive reflecting film 91 reflects light from the active layer 40 to the n-type semiconductor layer 30 when the substrate 10 used for growth or the substrate 10 is removed. It is preferable that the nonconductive reflective film 91 also covers the exposed surfaces of the p-type semiconductor layer 50 and the active layer 40 that connect the top surface of the p-type semiconductor layer 50 and the top surface of the n-side contact region 31. Do. However, those skilled in the art will appreciate that the non-conductive reflective film 91 does not necessarily cover all regions on the n-type semiconductor layer 30 and the p-type semiconductor layer 50 exposed by etching on the opposite side of the substrate 10. Should be placed in.
  • the non-conductive reflecting film 91 functions as a reflecting film but is preferably made of a light transmitting material to prevent absorption of light.
  • the non-conductive reflecting film 91 may be formed of a light transmitting dielectric material such as SiO x , TiO x , Ta 2 O 5 , and MgF 2 . Can be configured.
  • the non-conductive reflecting film 91 is a single dielectric film composed of a transparent dielectric material such as SiO x , for example, a single distributed Bragg reflector made of a combination of SiO 2 and TiO 2 , a plurality of heterogeneous dielectric films or dielectrics.
  • the dielectric film has a lower refractive index than the p-type semiconductor layer 50 (eg, GaN), it is possible to partially reflect light above the critical angle to the substrate 10 side, and the distribution Bragg reflector transmits a larger amount of light to the substrate 10. It can be reflected to the side and can be designed for a specific wavelength can be effectively reflected in response to the wavelength of light generated.
  • the p-type semiconductor layer 50 eg, GaN
  • the non-conductive reflecting film 91 has a double structure of the distribution Bragg reflector 91a and the dielectric film 91b.
  • the dielectric film 91b having a predetermined thickness can be formed, whereby the distributed Bragg reflector 91a can be stably manufactured and can also help to reflect light. have.
  • the semiconductor light emitting device there is a step in mesa etching for forming the n-side contact region 31, and the step such as the p-side branch electrode 93 or the n-side branch electrode 81. And a process for punching the non-conductive reflecting film 91 as described in detail below even after the non-conductive reflecting film 91 is formed, thus forming the dielectric film 91b. Especially when you need to be careful.
  • the material of the dielectric film 91b is suitably SiO 2 , and the thickness thereof is preferably 0.2 ⁇ m to 1.0 ⁇ m. If the thickness of the dielectric film 91b is too thin, it may be insufficient to sufficiently cover the n-side branch electrode 81 and the p-side branch electrode 93 having a height of about 2 ⁇ m to 3 ⁇ m. This can be a burden on the hole forming process. The thickness of the dielectric film 91b may then be thicker than the thickness of the subsequent distribution Bragg deflector 91a. In addition, it is necessary to form the dielectric film 91b in a manner more suitable for securing device reliability.
  • the dielectric film 91b made of SiO 2 is preferably formed by Chemical Vapor Deposition (CVD), and particularly, Plasma Enhanced CVD (PECVD).
  • CVD Chemical Vapor Deposition
  • PECVD Plasma Enhanced CVD
  • a step exists and covers the step region. This is because the deposition method is advantageous compared to physical vapor deposition (PVD) such as E-Beam Evaporation.
  • PVD physical vapor deposition
  • E-Beam Evaporation such as E-Beam Evaporation.
  • the inclined surface formed by the side or mesa etching of the p-side branch electrode 93 and the n-side branch electrode 81 having a step difference may be formed.
  • the dielectric film 91b is formed thin on the stepped surface or the like, and the dielectric film 91b is formed thin on the stepped surface, the p-side branch electrode 93 and the n-side branch electrode 81 will be described below.
  • the dielectric film 91b is formed by chemical vapor deposition for reliable insulation. It is preferable. Therefore, it is possible to secure the function as the non-conductive reflective film 91 while securing the reliability of the semiconductor light emitting element.
  • the distribution Bragg reflector 91a is formed on the dielectric film 91b to form the non-conductive reflecting film 91 together with the dielectric film 91b.
  • a distributed Bragg reflector (91a) of a repeating laminate structure comprising a combination of TiO 2 / SiO 2, the physical vapor deposition (PVD; Physical Vapor Deposition), In particular, the electron beam vapor deposition method (E-Beam Evaporation) or sputtering (Sputtering Or by thermal evaporation.
  • the distribution Bragg reflector 91a consists of a combination of TiO 2 / SiO 2
  • each layer is designed to have an optical thickness of 1/4 of a given wavelength, the number of combinations being 4 to 20 pairs. Suitable. This is because if the number of combinations is too small, the reflection efficiency of the distribution Bragg reflector 91a is reduced, and if the number of combinations is too large, the thickness becomes excessively thick.
  • the non-conductive reflecting film 91 Due to the formation of the non-conductive reflecting film 91, the p-side branch electrode 93 and the n-side branch electrode 81 are completely covered by the non-conductive reflecting film 91.
  • the non-conductive reflective film 91 is formed.
  • a hole in the form of a through hole is formed, and electrical connections 94 and 82 in the form of an electrode material filled in the hole are formed.
  • Such holes are preferably formed by dry etching or wet etching, or a combination of both.
  • the electrical connection 94 is connected to the p-side branch electrode 93 and the n-side branch electrode. (81) It is preferred to be located above each connection 99,89.
  • a large number of electrical connections 94 must be formed to be directly connected to the transparent conductive film 60 provided almost in front of the p-type semiconductor layer 50, and the n-side branch electrode 81 ), A large number of electrical connections 82 must be formed and connected directly to the n-side contact region 31, but between the p-side electrode 92 and the transparent conductive film 60 and the n-side electrode 80 and n It is not only easy to form a good electrical contact between the type semiconductor layers 30, but also causes many problems in the manufacturing process.
  • the present disclosure forms the n-side branch electrode 81 over the n-side contact region 31, and the p-side branch electrode 93 is formed of the p-type semiconductor layer 50 or preferably. Is formed on the light-transmissive conductive film 60 and then heat-treated, thereby making it possible to create stable electrical contact therebetween.
  • the p-side electrode 92 and the n-side electrode 80 are formed on the non-conductive reflective film 91.
  • the p-side electrode 92 and the n-side electrode 80 cover all or almost all of the non-conductive reflecting film 91 in view of helping to reflect light from the active layer 40 toward the substrate 10 side. It is formed over a large area and serves as a conductive reflective film.
  • the p-side electrode 92 and the n-side electrode 80 are preferably spaced apart from each other on the non-conductive reflective film 91 in order to prevent a short circuit. Therefore, the p-side electrode 92 is disposed on the non-conductive reflective film 91.
  • the p-side electrode 92 and the n-side electrode 80 serve to supply current to the p-side branch electrode 93 and the n-side branch electrode 81, and have a function of connecting the semiconductor light emitting device to an external device, It is formed over an area to perform a function of reflecting light from the active layer 40 and / or a heat radiation function.
  • the semiconductor light emitting device according to the present disclosure has an advantage when coupled to a mounting portion (eg, submount, package, COB). This advantage is particularly large when using a bonding method of eutectic bonding.
  • the p-side branch electrode 93 and the n-side branch electrode 81 are both non-conductive reflective film 91.
  • the p-side branch electrode 93 extends long under the n-side electrode 80 overlying the non-conductive reflecting film 91
  • the n-side branch electrode 81 extends from the non-conductive reflecting film (). 91 extends through the bottom of the p-side electrode 92 overlying.
  • the electrodes 92 and 80 and the branch are formed. Short circuits between the electrodes 93 and 81 are prevented.
  • the p-side branch electrode 93 and the n-side branch electrode 81 as described above, it is possible to supply a current to the semiconductor layer region that is required without restriction in forming a flip chip.
  • the p-side electrode 92, the n-side electrode 80, the p-side branch electrode 93 and the n-side branch electrode 81 are composed of a plurality of metal layers.
  • the lowermost layer should have a high bonding strength with the transparent conductive film 60, and materials such as Cr and Ti may be mainly used. Ni, Ti, TiW, and the like may also be used.
  • Those skilled in the art should keep in mind that Al, Ag and the like having good reflectance can also be used for the p-side branch electrode 93 and the n-side branch electrode 81.
  • Au is used for wire bonding or connection with an external electrode.
  • Ni, Ti, TiW, W, or the like is used between the lowermost layer and the uppermost layer depending on the required specification, or when a high reflectance is required.
  • Al, Ag and the like are used.
  • Au since the p-side branch electrode 93 and the n-side branch electrode 81 must be electrically connected to the electrical connections 94 and 82, Au may be considered as the uppermost layer.
  • the inventors have found that it is inappropriate to use Au as the uppermost layer of the p-side branch electrode 93 and the n-side branch electrode 81.
  • the non-conductive reflective film 91 is deposited on Au, there is a problem in that the bonding force between the two is weak and easily peeled off.
  • the uppermost layer of the branch electrode is made of a material such as Ni, Ti, W, TiW, Cr, Pd, Mo instead of Au, the adhesion to the non-conductive reflective film 91 to be deposited thereon is maintained. Reliability can be improved.
  • the above metal serves as a diffusion barrier to help secure the stability of the subsequent processes and the electrical connections 94 and 82. Becomes
  • FIG. 17 is a view illustrating still another example of the semiconductor light emitting device according to the present disclosure
  • FIG. 18 is a cross-sectional view taken along the line D-D of FIG. 17
  • FIG. 19 is a cross-sectional view taken along the line E-E of FIG. 17.
  • the non-conductive reflecting film 91 is in addition to the dielectric film 91b and the distribution Bragg reflector 91a and the distribution Bragg reflector 91a. It further includes a clad film 91f formed thereon. A large portion of light generated in the active layer 40 is reflected by the dielectric film 91b and the distributed Bragg reflector 91a toward the n-type semiconductor layer 30, but the dielectric film 91b and the Distributed Bragg reflector 91a are also constant. Because of its thickness, some light is trapped therein or emitted through the side of the dielectric film 91b and the distributed Bragg reflector 91a.
  • the inventors have analyzed the relationship between the dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91f from the viewpoint of an optical waveguide.
  • the optical waveguide is a structure that guides the light by using total reflection by surrounding the light propagation part with a material having a lower refractive index. From this point of view, when the distributed Bragg reflector 91a is viewed as the propagation section, the dielectric film 91b and the clad film 91f can be regarded as part of the configuration surrounding the propagation section.
  • the effective refractive index of the distribution Bragg reflector 91a (where the effective refractive indices are mutually It means having an equivalent refractive index of light which can proceed in a waveguide composed of materials having different refractive indices, and has a value of between 1,46 and 2.4.) a refractive index higher than that of the dielectric film (91b) to the SiO 2 Will have
  • the clad film 91f is also made of a material lower than the effective refractive index of the distributed Bragg reflector 91a.
  • the cladding film 91f has a thickness of ⁇ / 4n to 3.0um (where ⁇ is a wavelength of light generated in the active layer 40 and n is a material of the cladding film 91f). Refractive index).
  • the clad film 91f may be formed of SiO 2 , which is a dielectric having a refractive index of 1.46.
  • ⁇ is 450 nm (4500 A)
  • the uppermost layer of the distributed Bragg deflector 91a consisting of a plurality of pairs of SiO 2 / TiO 2 may be made of an SiO 2 layer having a thickness of ⁇ / 4n
  • the clad film 91f is positioned below It is preferable to be thicker than [lambda] / 4n so as to be differentiated from the top layer of the distribution Bragg deflector 91a, and not only burden the subsequent hole forming process, but also 3.0 because the increase in thickness does not contribute to the efficiency and only the material cost can be increased. It is not desirable to be too thick above um, but in some cases it is not impossible to form above 3.0 um.
  • part of the light traveling through the distribution Bragg reflector 91a is the p-side electrode 92 and the n-side electrode. Absorption may occur while being affected by 80, wherein a clad film having a refractive index lower than that of the distribution Bragg reflector 91a is formed between the p-side electrode 92 and the n-side electrode 80 and the distribution Bragg reflector 91a.
  • 91f By inserting 91f), it is possible to minimize the absorption of part of the light traveling through the distribution Bragg reflector 91a at the p-side electrode 92 and the n-side electrode 80, thereby increasing the efficiency of light.
  • the thickness of the clad film 91f is preferably ⁇ / 4n or more.
  • the difference in refractive index between the distributed Bragg reflector 91a and the clad film 91f is large, the light is more strongly constrained by the Distributed Bragg reflector 91a, but a thinner clad film 91f can be used. If the difference in refractive index is small, the thickness of the clad film 91f should be sufficiently thick to obtain the above-described effect.
  • the thickness of the clad film 91f needs to be sufficiently considered as the difference between the refractive index of the material constituting the clad film 91f and the effective refractive index of the distribution Bragg reflector 91a.
  • the clad film 91f is made of SiO 2 and the distribution Bragg reflector 91a is made of SiO 2 / TiO 2
  • the clad film can be distinguished from the top layer of the distribution Bragg reflector 91a made of SiO 2 .
  • the thickness of 91f is 0.3 um or more.
  • the maximum value of the clad film 91f be formed within 1 ⁇ m to 3 ⁇ m.
  • the clad film 91f is not particularly limited as long as the clad film 91f has a refractive index lower than the effective refractive index of the distribution Bragg reflector 91a, and may include a metal oxide such as Al 2 O 3 , a dielectric film such as SiO 2 , SiON, MgF, CaF, or the like. It may be made of. When the difference in refractive index is small, the thickness can be made thick to achieve the effect. In addition, it is possible to increase the efficiency in the case of using the SiO 2, using SiO 2 having a refractive index lower than 1.46.
  • the dielectric film 91b is omitted may be considered, it is not preferable from the viewpoint of the optical waveguide, but from the viewpoint of the overall technical idea of the present disclosure, it is composed of the distributed Bragg reflector 91a and the clad film 91f. There is no reason to rule out this.
  • a case may include a dielectric film made of TiO 2 , which is a dielectric material.
  • the distribution Bragg reflector 91a is provided with the SiO 2 layer on the uppermost layer, the case where the clad film 91f is omitted may also be considered.
  • the non-conductive reflecting film 91 consists of a low refractive index dielectric film 91b and a clad film 91f positioned above and below a high effective refractive index distributed Bragg reflector 91a and a distributed Bragg reflector 91a. It serves as a guide, it is preferred that the total thickness is 3 ⁇ 8um.
  • the nonconductive reflecting film 91 has an inclined surface 91m at its edge. The inclined surface 91m of the edge may be formed through, for example, a dry etching process.
  • the light incident on the non-conductive reflecting film 91 serving as the optical waveguide the light incident on the non-conductive reflecting film 91 at a vertical or near vertical angle is well reflected toward the substrate 10 side, but at an oblique angle. Some of the light including the light incident on the non-conductive reflecting layer 91 may not be reflected toward the substrate 10 and may be trapped in the distribution Bragg reflector 91a serving as the propagation unit and propagate to the side surface. As such, the light propagating to the side surface of the distribution Bragg reflector 91a is emitted to the outside from the inclined surface 91m at the edge of the non-conductive reflecting film 91 or is reflected to the substrate 10 side.
  • the inclined surface 91m at the edge of the non-conductive reflecting film 91 serves as a corner reflector and contributes to the improvement of luminance of the semiconductor light emitting device. It is preferable that the inclined surface 91m has an angle within a range of 50 ° to 70 ° for smooth reflection to the substrate 10 side.
  • the inclined surface 91m may be easily formed by wet etching or dry etching, or a combination thereof.
  • FIG. 20 is a view showing a state before two semiconductor light emitting devices are separated into independent semiconductor light emitting devices during a semiconductor light emitting device manufacturing process
  • FIG. 21 shows two semiconductor light emitting devices as separate semiconductor light emitting devices during a semiconductor light emitting device manufacturing process. It is a figure which shows the state.
  • FIGS. 20 and 21 illustrate a semiconductor light emitting device 3 in which a p-side electrode 92, an n-side electrode 80, and a bonding pad 97 are not formed to explain a manufacturing process.
  • the semiconductor light emitting device is manufactured in the form of a wafer including a plurality of semiconductor light emitting devices, and then separated into individual semiconductor light emitting devices by cutting by a method such as breaking, sawing, scribing and breaking.
  • a method such as breaking, sawing, scribing and breaking.
  • the scribing process uses a laser and can be performed by applying a laser focusing on the substrate side including the substrate surface and the inside of the substrate of the semiconductor light emitting device.
  • the semiconductor light emitting element is preliminarily along the edge boundary G of the semiconductor light emitting element 3, that is, the boundary G between the semiconductor light emitting element 3 and the semiconductor light emitting element 3. To be cut.
  • the pre-cut semiconductor light emitting device is completely separated into individual semiconductor light emitting devices through a breaking process performed following the scribing process.
  • the braking step is, for example, an external force along the boundary line G between the semiconductor light emitting element 3 and the semiconductor light emitting element 3 in the direction of the substrate 10 indicated by the arrow F in FIG. 20 or vice versa. This is done by adding.
  • the substrate 10 and the semiconductor layers 20, 30, 40, and 50 may be precisely cut along the boundary line G as the crystalline, but the ratio on the p-type semiconductor layer 50 Since the malleable reflecting film 91 is amorphous, the malleable reflecting film 91 is not accurately cut along the boundary line G, and cracks are likely to occur in the area around the edge of the nonconductive reflecting film 91. Such damage to the edge peripheral area of the non-conductive reflecting film 91 has a problem of yield decrease due to poor appearance.
  • the semiconductor light emitting device and the semiconductor light emitting device before the scribing process and the braking process using a laser for manufacturing a semiconductor light emitting device in the form of a wafer including a plurality of semiconductor light emitting devices and then separated into individual semiconductor light emitting devices
  • the partial region H of the non-conductive reflecting film 91 around the boundary line G between them is removed.
  • the partial region H of the nonconductive reflecting film 91 removed along the boundary line G of the semiconductor light emitting device 3 corresponds to the edge region of the nonconductive reflecting film 91 from the viewpoint of the individual semiconductor light emitting device.
  • the removal of the partial region H of the non-conductive reflective film 91 around the boundary line G is different from the non-conductive reflective film 91 provided in one semiconductor light emitting device before being separated into individual semiconductor light emitting devices. It also means that the non-conductive reflecting film 91 provided in the semiconductor light emitting device is separated from each other in the boundary line G region.
  • the removal of the partial region H of the non-conductive reflective film 91 may be performed by dry etching or the like, and may be performed before performing the braking process of the entire semiconductor manufacturing process. However, when forming a hole through the non-conductive reflective film 91 to form electrical connections 94 and 82 by a method such as dry etching, it is preferably formed together.
  • the inclined surface 91m which serves as a corner reflector, may be formed through a separate etching process, but in order to prevent damage, the non-conductive reflective film of the individual semiconductor light emitting device may be removed in a process of removing the edge region of the non-conductive reflective film 91. (91) It may be formed at the same time by etching so that the edge portion becomes the inclined surface 91m.
  • a bonding pad 97 may be provided as part of the p-side electrode 92 and the n-side electrode 80 on the p-side electrode 92 and the n-side electrode 80, respectively. Can be.
  • the upper surface of the bonding pad 97 on the p-side electrode 92 and the upper surface of the bonding pad 97 on the n-side electrode 80 have the same height. That is, the upper surface of the bonding pad 97 on the p-side electrode 92 and the upper surface of the bonding pad 97 on the n-side electrode 80 are on the same plane.
  • Such a bonding pad 97 is such that the p-side electrode 92 side and the n-side electrode 80 side have the same final height when the semiconductor light emitting device is coupled with an external device by, for example, a Jewish bonding method. By preventing the inclination on the mounting portion, to provide a wide and flat coupling surface to obtain a good coupling force, and performs the function of dissipating heat inside the semiconductor light emitting device to the outside.
  • a plurality of bonding pads 97 may be provided on the p-side electrode 92 and the n-side electrode 80, respectively, and the n-side branch electrode 81 and the p-side electrode 92 and the n-side electrode 80 may also be provided.
  • the bonding pad 97 is formed in a region except for the p-side branch electrode 93 portion that protrudes upward and the n-side branch electrode 81 portion that is recessed downward.
  • the bonding pad 97 may be formed in a multilayer structure including a spacer layer 97b below and a bonding layer 97a on the spacer layer 97b.
  • the bonding pad 97 may have a total thickness of 5 ⁇ m to 6 ⁇ m. .
  • the spacer layer 97b is made of a metal layer such as Ni, Cu, or a combination thereof, and the bonding layer 97a has Ni / Sn, Ag / Sn / Cu, Ag / Sn to have a thickness of about several um.
  • Cu / Sn, Au / Sn combination may be made of a eutectic bonding layer.
  • the spacer layer 97b functions as a diffusion barrier and a wetting layer for the solder used for the eutectic bonding, and the bonding pad 97 includes the eutectic bonding layer including the expensive Au as a whole. It also reduces the cost burden compared to forming with (97b).
  • the bonding pads 97 may protrude to the top of the p-side electrode 92 and the n-side electrode 80, that is, the p-side branches, in order to match the final height of the bonding surface at the time of bonding (eg, etchant bonding). It is preferable to form 1 to 3 um higher than the height of the portion above the electrode 93. Therefore, at the time of bonding, good coupling between the semiconductor light emitting element and the mounting portion can be obtained, which helps heat dissipation of the semiconductor light emitting element.
  • the spacer layer 97b and the bonding layer 97a may be formed by various methods such as plating, E-Beam evaporation, and thermal evaporation.
  • the region to be etched in the semiconductor light emitting device 100 is limited to the n-side contact region 31, and there is no other portion to be etched at the edge, and all the sides around the semiconductor light emitting device 100 are scribed and It consists of a cut surface by a braking process or the like. As a result, the area of the active layer 40 generating light is increased to improve light extraction efficiency.
  • the stepped surface generated in the etching process that is, the exposed side of the active layer 40 and the p-type semiconductor layer 50 connecting the top surface of the p-type semiconductor layer 50 and the top surface of the n-side contact region 31. Is minimized.
  • the exposed side surfaces of the active layer 40 and the p-type semiconductor layer 50 are difficult to deposit the distributed Bragg reflector 91a constituting the nonconductive reflecting film 91, particularly when forming the nonconductive reflecting film 91. to be. Accordingly, the distribution Bragg reflector 91a of the exposed side regions of the active layer 40 and the p-type semiconductor layer 50 may have a relatively low reflection efficiency. As the exposed side surfaces of the active layer 40 and the p-type semiconductor layer 50 are minimized, a region having low reflection efficiency in the distribution Bragg reflector 91a can be minimized, and the reflection efficiency can be improved as a whole.
  • FIG. 22 is a diagram illustrating still another example of the semiconductor light emitting device according to the present disclosure
  • FIG. 23 is a cross-sectional view taken along the line AA ′ of FIG. 22.
  • the first feature of this embodiment is that the branch electrodes 93 on the p-type semiconductor layer 50 are separated from each other, through each electrical connection 94, and then by electrode 92.
  • the electrode 92 has a function of supplying a current to the branch electrode 93, a function of reflecting light, a heat dissipation function, and / or a function of connecting the element and the outside.
  • branch electrode 93 extends along the direction of one side C of the device. For example, in FIG. 22, it extends long toward the electrode 80 from the electrode 92 side.
  • the branch electrodes 93 extends along the direction of one side C of the device. For example, in FIG. 22, it extends long toward the electrode 80 from the electrode 92 side.
  • a third feature of this embodiment is that the electrode 80 is positioned over the nonconductive reflecting film 91.
  • the electrode 80 is connected with the branch electrode 81 through an electrical connection 82.
  • the electrode 80 has the same function as the electrode 92.
  • the branch electrode 81 can be arranged in the same manner as the branch electrode 93.
  • a fifth feature of this embodiment is the provision of an auxiliary heat dissipation pad 97.
  • the auxiliary heat dissipation pad 97 has a function of emitting heat to the outside and / or a function of reflecting light, while being electrically separated from the electrode 92 and / or the electrode 80, thereby the electrode 92 and the electrode 80 to prevent electrical contact between.
  • the auxiliary heat dissipation pad 93 may be used for bonding.
  • the entire element Does not cause problems with the electrical operation.
  • auxiliary heat dissipation pads 121, 122, 123, and 124 are illustrated between the electrode 92 and the electrode 80.
  • the auxiliary heat dissipation pads 121, 122, 123, and 124 are positioned between the branch electrodes 92 or between the branch electrodes 92 and the branch electrodes 81.
  • the auxiliary heat dissipation pad 121 and the auxiliary heat dissipation pad 122 are separated from the electrode 92 and the electrode 80, and the auxiliary heat dissipation pad 123 is connected to the electrode 92 and the auxiliary heat dissipation pad 124. Is connected to the electrode 80.
  • FIG. 25 is a diagram illustrating still another example of the semiconductor light emitting device according to the present disclosure, wherein the branch electrode 93 extends below the electrode 80 (past the reference line B).
  • the branch electrodes 93 on the p-type semiconductor layer 50 it is possible to supply a current to an element region which is required without restriction in forming a flip chip.
  • Two electrical connections 94 and 94 are provided and the electrical connections 94 can be placed where needed depending on the conditions required for current spreading.
  • the electrical connection 94 on the left side may be omitted.
  • the electrode 92 also functions as an auxiliary heat radiation pad 97 (see FIG. 22).
  • the electrical connection 94 may be directly connected to the transparent conductive film 60 to supply current, but the current may be directly supplied to the p-type semiconductor 50 under the electrode 80.
  • the branch electrode 93 By introducing the branch electrode 93, the current can be supplied even below the electrode 80 which supplies the current to the n-type semiconductor layer 30. The same is true for the electrical connection 82.
  • FIG. 26 is a diagram illustrating still another example of the semiconductor light emitting device according to the present disclosure, wherein the non-conductive reflecting film 91 is formed of multilayer dielectric films 91c, 91d, and 91e.
  • the non-conductive reflecting film 91 may be composed of a dielectric film 91c made of SiO 2 , a dielectric film 91d made of TiO 2 , and a dielectric film 91e made of SiO 2 , which may serve as a reflecting film.
  • the non-conductive reflecting film 91 is formed to include a DBR structure.
  • the semiconductor light emitting device In forming the semiconductor light emitting device according to the present disclosure, a structure such as the branch electrode 93 or the branch electrode 81 is required, and even after the non-conductive reflecting film 91 is formed, the electrical connection 94 or the electrical connection ( 82). Since the process of forming the semiconductor light emitting device is required, it is possible to influence device reliability such as generation of a leakage current after the manufacture of the semiconductor light emitting device. Therefore, in the formation of the dielectric film 91c made of SiO 2 , special attention is required. Needs to be. For this purpose, first, it is necessary to form the thickness of the dielectric film 91c thicker than the thickness of the subsequent dielectric films 91d and 91e.
  • a dielectric film 91c made of SiO 2 is formed by Chemical Vapor Deposition (CVD), preferably (preferably) Plasma Enhanced CVD (PECVD), and TiO 2.
  • the dielectric layer 91d / dielectric layer 91e made of / SiO 2 DBR has a repeated structure of physical vapor deposition (PVD), and preferably (preferably) electron beam evaporation or sputtering. Or by thermal evaporation, it is possible to secure the function as the non-conductive reflective film 91 while ensuring the reliability of the semiconductor light emitting device according to the present disclosure.
  • Step coverage such as mesa-etched regions, is advantageous because chemical vapor deposition is advantageous over physical vapor deposition, in particular electron beam deposition.
  • FIG. 27 is a diagram illustrating still another example of a semiconductor light emitting device according to the present disclosure, and illustrates an example of an electrode part including an lower electrode, an upper electrode, and an electrical connection connecting the same through an opening.
  • At least one of the n-side electrode 80 (an example of the upper electrode of the first electrode portion) and the p-side electrode 92 (an example of the upper electrode of the second electrode portion) is preferably made of tin (Sn) or It becomes a soldering layer containing tin.
  • FIG. 28 is a diagram illustrating an example in which the semiconductor light emitting device illustrated in FIG. 27 is fixed to an external electrode, and the n-side electrode 80 and p of the semiconductor light emitting device or the semiconductor light emitting device chip C illustrated in FIG. 27 are illustrated.
  • the side electrodes 92 are fixed to the external electrodes 1000 and 2000, respectively.
  • the external electrodes 1000 and 2000 may be a conductive part provided in the submount, a lead frame of the package, an electrical pattern formed on the PCB, and the like, provided that the conductive wires are provided independently of the semiconductor light emitting device C. It is not.
  • the external electrodes 1000 and 2000 are provided with solder materials 3000 and 4000, respectively, and the n-side electrode 80 and the p-side electrode 92 are fixed to the external electrodes 1000 and 2000 by soldering. do. In the example shown in FIG. 28, it is fixed to the external electrodes 1000, 2000 through soldering.
  • the semiconductor light emitting device may be broken.
  • soldering soldering, Pb soldering
  • Au gold
  • Au gold
  • conductivity Au, Ag, and the like may be considered, but since Ag is well oxidized, Au is mainly used.
  • the present inventors have a difference in bonding strength during soldering when Au is used as a solder layer between the solder materials 3000 and 4000 provided on the external electrodes 1000 and 2000 and the electrodes 80 or 92 of the semiconductor light emitting element side to be soldered. It has been found that this problem can be solved when using a solder (Sn) as the main component.
  • the thickness of the solder layers 80a and 92a is preferably at least 5000 kPa, more preferably at least 1 ⁇ m. .
  • the bonding force of the tin-containing or tin-containing solder layers 80 and 92 is between the bonding force when the reference Ref and the gold thickness are 100 kPa. In other words, it can be seen that it is better to improve the bonding strength by using only a tin or a solder containing tin than when using only a south solder layer.
  • the amount of the solder material 3000 and 4000 can be reduced.
  • the solder materials 3000 and 4000 have an advantage of reducing the amount of protruding between the n-side electrode 80 and the p-side electrode 92 or toward the side of the semiconductor light emitting device. From this point of view, the solder layers 80a and 92a are better in thickness, but if they are too thick, the thermal resistance may increase. Therefore, about 1-5 micrometers which is an acceptable range in a semiconductor process is suitable.
  • solder layers 80a and 92a may be made of only tin (Sn)
  • the solder layer 80a and 92a may be formed of only tin (Sn), and may further include necessary materials generally considered in soldering in consideration of the solder materials 3000 and 4000.
  • the solder materials 3000 and 4000 include Sn, PbSn, PbSnAg, PbInAb, PbAg, SnPbAg, PbIn, and CdZn.
  • a solder material having a melting point of about 250 to 300 ° C. may be used.
  • the n-side electrode 80 and the p-side electrode 92 are formed on the non-conductive reflecting film 91.
  • the n-side electrode 80 and the p-side electrode 92 are It is preferable that it is formed so as to cover 50% or more of the area of the nonconductive reflecting film 91.
  • the n-side electrode 80 and the p-side electrode 92 having such a structure can be used as an upper layer structure of the electrodes of the conductive reflective films 901, 902 and 903 shown in FIG.
  • the n-side electrode 80 and the p-side electrode 92 of the electrode structure may be applied as an upper layer structure of all the semiconductor light emitting devices shown in FIGS. 1 to 26. Description of the same reference numerals will be omitted.
  • FIG 30 is a view illustrating another example of the semiconductor light emitting device according to the present disclosure, wherein the surfaces of the solder layers 80 and 92 are rough surfaces (RSs) rather than flat surfaces.
  • the rough surface RS serves to speed up energy transfer to the solder layers 80 and 92 by increasing the contact area with the solder materials 3000 and 4000 during the soldering process.
  • the rough surface RS may be formed in the process of forming the solder layers 80 and 92 without a separate process. In this example, the solder layers 80 and 92 were formed by E-beam Evaporation.
  • FIG. 31 is a photograph of a rough surface formed on an electrode according to the present disclosure, and shows a photograph seen from above to the right and a photograph from above on the left. This is a photograph of the surface when deposited to a thickness of about 4 ⁇ m, each projection has a size of about 15 ⁇ 25 ⁇ m.
  • the degree of roughness can be changed by adjusting the deposition conditions, such as deposition rate (eg, 10 ⁇ s / sec).
  • FIG 32 is a view illustrating still another example of a semiconductor light emitting device according to the present disclosure, in which at least one of the n-side electrode 80 and the p-side electrode 92 is formed of a solder material 3000 under the solder layers 80a and 92a. And 4000 are provided with diffusion preventing layers 80c and 92c for preventing the semiconductor layer from penetrating into the plurality of semiconductor layers 30, 40 and 50.
  • the diffusion barrier layers 80c and 92c may be formed of Ti, Ni, Cr, W, TiW, or the like. If necessary, at least one of the n-side electrode 80 and the p-side electrode 92 may include additional layers 80d and 92d.
  • the n-side electrode 80 and the p-side electrode 92 may be formed simultaneously with the electrical connections 82 and 94, and the upper and electrical connections of the non-conductive reflecting film 91.
  • Additional layers 80d and 92d may be formed as light reflecting layers so as to reflect light generated in the active layer 40 at 82 and 94.
  • the additional layers 80d and 92d may be formed of Al, Ag, or the like.
  • Further layers 80d and 92d may be provided with contact layers, such as Cr and Ti, to improve the contact force as the bottom layer of n-side electrode 80 and p-side electrode 92.
  • contact layers such as Cr and Ti
  • solder layers 80a and 92a, the diffusion barrier layers 80c and 92c and the additional layers 80d and 92d may be stacked with the same area as in FIG. 32, but in the semiconductor light emitting device shown in FIGS. Of course, it can be laminated in the same form as. That is, it is also possible to form the diffusion barrier layers 80c and 92c and the additional layers 80d and 92d as a whole, and then partially form the solder layers 80a and 92a.
  • the non-conductive reflective film 91 and / or the plurality of semiconductor layers 30, 40, 50 can be prevented from breaking.
  • the light reflection layer such as Al or Ag
  • the light reflection layer such as Al or Ag
  • it tends to spread itself, and thus, by repeatedly laminating the light reflection layer and the diffusion barrier layers 80c and 92c alternately, the non-conductive reflective film 91 and / or It is possible to prevent the plurality of semiconductor layers 30, 40, and 50 from being broken.
  • they may be repeatedly laminated (Al (5000A) -Ni (3000A) -Al (5000A) -Ni (3000A)) with a thickness of 1 ⁇ m or more.
  • Al (5000A) -Ni (3000A) -Al (5000A) -Ni (3000A) By repeating lamination with a thickness of 2 ⁇ m or more, it is possible to more certainly prevent cracking.
  • FIG. 33 shows a modification of the semiconductor light emitting device shown in FIG. 27
  • FIG. 34 shows a modification of the semiconductor light emitting device shown in FIG. 30,
  • FIG. 35 shows a modification of the semiconductor light emitting device shown in FIG.
  • the oxidation of tin is formed by forming a thin layer of antioxidant layers 80b, 92b on the solder layers 80a, 92a containing tin (Sn). To prevent this.
  • the antioxidant layers 80b and 92b metals such as gold (Au) and platinum (Pt) having strong antioxidant properties and high conductivity may be used.
  • the anti-oxidation layers 80b and 92b are thick enough to prevent oxidation of the solder layers 80a and 92a. It is enough to have and should not be formed too thick. This may vary depending on the metal used. For example, when gold (Au) is used, when gold (Au) has a thickness of about 1 ⁇ m, gold (Au) functions as a solder layer, which may cause the above-described problem. have. Therefore, it is preferable that the antioxidant layers 80b and 92b have a thickness of 5000 kPa or less.
  • the bonding force of the tin-containing or tin-containing solder layers 80 and 92 is between the bonding force when the reference Ref and the gold thickness are 100 kPa.
  • the thickness of gold showed the best binding force around 500 kPa, and from this, the bond strength decreased as the thickness increased.
  • the anti-oxidation layers 80b and 92b more preferably have a thickness of 1000 kPa or less.
  • FIG. 28 is a diagram illustrating an example in which a semiconductor light emitting device is fixed to an external electrode, wherein the n-side electrode 80 and the p-side electrode 92 of the semiconductor light emitting device C are respectively. It is fixed to the external electrodes 1000 and 2000.
  • the external electrodes 1000 and 2000 may be a conductive part provided in the submount, a lead frame of the package, an electrical pattern formed on the PCB, and the like, provided that the conductive wires are provided independently of the semiconductor light emitting device C. It is not.
  • Bonding using paste, bonding using anisotropic conductive film (ACF), eutectic bonding (e.g. AuSn, AnCu, CuSn), soldering may be used to bond the electrodes 80,92 and the external electrodes 1000,2000.
  • Various methods known in the art such as conjugation used may be used.
  • conjugation used may be used.
  • FIG. 37 in the process of fixing or bonding, there is a possibility that cracks (indicated by arrows) occur in the semiconductor light emitting element due to thermal shock or the like.
  • gold (Au) is generally used as the uppermost layer of the electrodes (80,92), as shown on the left of Figure 29, the spread between the tin (Sn) and gold (Au), which is mainly used as a solder material when soldering This is not good, and when gold (Au) is used as the uppermost layer of the electrodes 80,92, the yield of solder may not be good (in experiment, Reflow temperature (process temperature for melting solder): 275 ° C, Reflow) Time: Within 3 seconds, solder material amount: 1/3 of bump (electrode) area was used.).
  • the p-side electrode 92 (an example of the upper electrode of the second electrode portion) is provided on the non-conductive reflective film 91 It is.
  • the p-side electrode 92 includes a lower electrode layer 92-2 and an upper electrode layer 92-3.
  • the lower electrode layer 92-2 may be formed as a stress relieving layer or a crack preventing layer to prevent cracks when the semiconductor light emitting device is fixed to the external electrode.
  • the upper electrode layer 92-3 may be a lower electrode layer 92. It may be formed as a burst prevention layer for preventing the burst of -2).
  • the lower electrode layer 92-2 may be formed as a reflective layer that reflects light passing through the non-conductive reflective film 91.
  • the upper electrode layer 92-3 may be formed as a barrier layer that prevents the solder material from penetrating into the semiconductor light emitting device during bonding such as soldering.
  • the lower electrode layer 92-2 and the upper electrode layer 92-3 may be formed by various combinations of these functions.
  • a metal having high reflectance such as Al or Ag may be used as the lower electrode layer 92-2, and a material such as Al or Ag having a high thermal expansion coefficient may be used in view of crack prevention function (linear thermal expansion coefficient).
  • Al is most preferred in many respects.
  • the upper electrode layer 92-3 may be formed of a material such as Ti, Ni, Cr, W, or TiW from the viewpoint of anti-burst and / or diffusion prevention, and is not particularly limited as long as the metal has such a function. Do not.
  • the electrode 92 may further include a contact layer 92-1.
  • the contact layer 92-1 may be formed of a metal such as Cr, Ti, Ni, or the like, and is not particularly limited as long as it has a higher bonding force than the lower electrode layer 92-2. Because it is necessary to reduce the absorption of light, it is generally formed thin (for example 20 Cr). At this time, the contact layer can be removed if the lower electrode layer can have a bonding force.
  • the contact layers 92-1 d may be omitted, and the non-conductive reflecting film 91 and the lower electrode layer 92-3 may be omitted by appropriately adjusting the deposition conditions (deposition method, deposition pressure, deposition temperature, etc.) of the electrode 92. ) Can increase the bond between. It is not preferable to provide it from a viewpoint of light reflection efficiency.
  • the p-side electrode 92 has a top layer 92-4.
  • the uppermost layer 92-4 is generally made of a metal having good adhesion, excellent electrical conductivity, and strong oxidation resistance.
  • Au, Sn, AuSn, Ag, Pt, and alloys thereof or combinations thereof may be used, and are not particularly limited as long as these conditions are satisfied.
  • the p-side electrode 92 introduces a lower electrode layer 92-2 which functions as a crack prevention layer of 1000 kPa or more, preferably 5000 kPa or more (by introducing a metal layer having a high thermal expansion coefficient (for example, Al)).
  • a metal layer having a high thermal expansion coefficient for example, Al
  • the thermal expansion coefficient is large to prevent it from protruding or bursting.
  • an Al electrode formed thicker than 1000 kV (The arrow which popped out at the time of operation) was shown.) It has a structure which introduce
  • the upper electrode layer 92-3 also serves as a diffusion preventing function, and Ni and Ti are particularly suitable.
  • Ni and Ti are particularly suitable.
  • it is thinner than 1000 GPa the function as a crack prevention layer will fall.
  • the plurality of lower electrode layers 92-2 are provided on the p-side electrode 92, it is not bad to use a thickness thinner than this.
  • the thickness of the upper electrode layer 92-3 may be selected in consideration of the thickness of the lower electrode layer 92-2, and when the thickness of the upper electrode layer 92-3 is greater than 3 ⁇ m, it is unnecessary or may hinder the electrical characteristics of the semiconductor light emitting device.
  • the uppermost layer 92-4 when the uppermost layer 92-4 is provided, when the uppermost layer 92-4 is thick when it is fixed to the external electrode by soldering, an excessive amount of voids (Void) may be formed to weaken the bonding force of the connection site. have. From this point of view, the top layer 92-4 preferably has a thickness of less than 5000 mm 3. 43 shows the DST results according to the thickness of the uppermost layer 92-4.
  • Excellent performance was achieved in the thickness of 1000 ⁇ ⁇ 1500 ⁇ , and relatively poor at 8000 ⁇ . It is desirable to have a thickness of less than 5000 mm to maintain a value of 2500 to 3000 or more. On the other hand, in order to exhibit a function when provided, it is good to have thickness of 100 microseconds or more.
  • the experiment is Cr (10 ⁇ )-n-pair (s) Al (5000 ⁇ ) / Ni (3000 ⁇ )-Au (8000 ⁇ ) This was done by changing the thickness of the sub-layers based on the structure of and tested for soldering (lead free).
  • the electrodes 80 and 92 had a thickness of 2 ⁇ m, the production yield was 50%, and the production yield reached almost 100% at the thickness of 2.5 ⁇ m.
  • the electrodes 80 and 92 patterns having the same shapes as those shown in FIGS. 13 and 29 are used, but have a valid meaning even when other patterns are used.
  • the electrodes 80 and 92 In view of the area occupied by the electrodes 80 and 92, the electrodes 80 and 92 must cover at least 50% of the area of the non-conductive reflecting film 91 so that the electrodes 80 and 92 can be more effectively coped with from the thermal shock generated during bonding. do.
  • 41 is a view showing another example of the n-side electrode and / or p-side electrode configuration according to the present disclosure, the opening 102 is filled by the p-side electrode 92, the electrical connection 94 is a p-side electrode ( 92).
  • the light passing through the non-conductive reflective film 91 may be reflected by the lower electrode layer 92-2, thereby reducing the absorption of light by the electrical connection 94.
  • the contact layer 92-1 when the contact layer 92-1 is provided, the thickness thereof is thin so that the lower electrode layer 92-2 can function as a reflective film.
  • the electrical connection 94 may be formed separately from the p-side electrode 92 through deposition, plating, and / or conductive paste.
  • FIG. 42 is a view showing still another example of the n-side and / or p-side electrode configuration according to the present disclosure, in which the lower electrode layer 92-2 and the upper electrode layer 92-3 are each repeatedly stacked a plurality of times.
  • the p-side electrode 92 is a contact layer 92-1 (20 kPa thick Cr), four pairs of lower contact layers 92-2 (5000 k thick Al) / top contact layer 92-3 (3000 kPa). Ni) and the uppermost layer 92-4 (1 ⁇ m thick Au). Only one of the lower electrode layer 92-2 and the upper electrode layer 92-3 may be provided with a plurality of circuits. In addition, not all lower electrode layers 92-2 and upper electrode layers 92-3 need to be made of the same material.
  • the lower electrode layer 92-2 may be formed of a combination of Al and Ag.
  • one lower electrode layer 92-2 may be formed of a plurality of metals.
  • a material layer may be provided in addition to the contact layer 92-1, the lower electrode layer 92-2, the upper electrode layer 92-3, and the uppermost layer 92-4.
  • it may have a structure shown in FIG. It is possible to more reliably prevent the lower electrode layer 92-2 from sticking out or popping out through the repeated stack structure.
  • 44 is a view for explaining an example of a semiconductor light emitting device according to the present disclosure.
  • the semiconductor light emitting device includes a substrate 10, a plurality of semiconductor layers, a non-conductive reflective film 91, a p-side branch electrode 88, ohmic contact pads 89 and 79, a first electrical connection 71, and a second electrical connection. (81), third electrical connection (82), first connection electrode (73), second connection electrode (83), insulating layer (95), first electrode (75) and second electrode (85). .
  • FIG. 44 is a view for explaining a section taken along the line A-A in FIG.
  • the group III nitride semiconductor light emitting element will be described as an example.
  • the plurality of semiconductor layers may include a buffer layer 20 formed on the substrate 10, a first semiconductor layer 30 having a first conductivity (for example, Si-doped GaN), and a second semiconductor layer having a second conductivity different from the first conductivity. (Eg, Mg-doped GaN) and an active layer 40 interposed between the first semiconductor layer 30 and the second semiconductor layer 50 to generate light through recombination of electrons and holes (eg, InGaN / ( In) GaN multi-quantum well structure).
  • Each of the semiconductor layers 30, 40, and 50 may be formed in multiple layers, and the buffer layer 20 may be omitted.
  • the nonconductive reflecting film 91 reflects light from the active layer 40 toward the plurality of semiconductor layers 30, 40, and 50.
  • the nonconductive reflective film 91 is formed of a nonmetallic material to reduce light absorption by the metal reflective film.
  • the nonconductive reflecting film 91 includes, for example, a distributed Bragg reflector 91a, a dielectric film 91b, and a clad film 91c.
  • the dielectric film 91b or the clad film 91c may be omitted.
  • the distributed Bragg reflector 91a is nonconductive, the entirety of the dielectric film 91b, the distributed Bragg reflector 91a and the clad film 91c function as the nonconductive reflecting film 91.
  • the distribution Bragg reflector 91a reflects light from the active layer 40 toward the substrate 10 side.
  • the distribution Bragg reflector 91a is preferably formed of a light transmitting material (eg, SiO 2 / TiO 2) to prevent absorption of light.
  • the dielectric film 91b is positioned between the plurality of semiconductor layers 30, 40, and 50 and the distribution Bragg reflector 91a, and the dielectric film (for example, SiO 2 ) having a refractive index smaller than the effective refractive index of the Distribution Bragg reflector 91a. It may be made of.
  • the effective refractive index refers to the equivalent refractive index of light that can travel in a waveguide made of materials having different refractive indices.
  • the dielectric layer 91b may also help reflection of light, and may also function as an insulating layer that electrically cuts off the first electrical connection 71 from the second semiconductor layer 50 and the active layer 40.
  • the clad film 91c is formed on the distribution Bragg reflector 91a, and the clad film 91c is also a material lower than the effective refractive index of the distribution Bragg reflector 91a (eg, Al 2 O 3, SiO 2, SiON, MgF, CaF). It can be made of).
  • a large portion of light generated in the active layer 40 is reflected by the dielectric film 91b and the distributed Bragg reflector 91a toward the first semiconductor layer 30.
  • the relationship between the dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91c can be described in terms of an optical waveguide.
  • the optical waveguide is a structure that guides the light by using total reflection by surrounding the light propagation part with a material having a lower refractive index. From this point of view, when the distributed Bragg reflector 91a is viewed as the propagation section, the dielectric film 91b and the clad film 91c surround the propagation section and can be viewed as part of the optical waveguide.
  • the non-conductive reflecting film 91 is formed with a plurality of first semiconductor layer side openings 63 and a plurality of second semiconductor layer side openings 65 used as electrical connection passages.
  • the plurality of first semiconductor layer side openings 63 are formed to a part of the non-conductive reflecting film 91, the second semiconductor layer 50, the active layer 40 and the first semiconductor layer 30.
  • 2 semiconductor layer side opening 65 is formed through the non-conductive reflecting film 91.
  • the dielectric film 91b extends between the current spreading conductive film 60 and the distributed Bragg reflector 91a to the inner surface of the opening of the first semiconductor layer side 63 to connect the first electrical connection 71 to the second.
  • the semiconductor layer 50 is insulated from the active layer 40 and the second connection electrode 83.
  • another separate insulating film may be formed between the dielectric film 91b and the current spreading conductive film 60.
  • the semiconductor light emitting device includes a current diffusion conductive film 60 between the plurality of semiconductor layers 30, 40, 50 and the nonconductive reflecting film 91, for example, between the second semiconductor layer 50 and the dielectric film 91b. ) May be included.
  • the current spreading conductive layer 60 may be formed of a current spreading electrode (ITO, etc.), an ohmic metal layer (Cr, Ti, etc.), a reflective metal layer (Al, Ag, etc.), or a combination thereof.
  • the current diffusion conductive layer 60 is preferably made of a light transmissive conductive material (eg, ITO).
  • the plurality of p-side branch electrodes 88 are positioned between the current spreading conductive film 60 and the dielectric film 91b and extend over the current spreading conductive film 60.
  • the p-side branch electrode 88 is a second semiconductor layer 50 (eg, Mg-doped), which is a p-type semiconductor layer, which is less likely to spread current than the first semiconductor layer 30 (eg, Si-doped GaN), which is an n-type semiconductor layer. GaN) improves current spreading.
  • the shape and arrangement of the plurality of p-side branch electrodes 88 may be changed according to the shape, size, etc. of the semiconductor light emitting device. In this example, the plurality of p-side branch electrodes 88 extend parallel to each other below the first electrode 75 under the second electrode 85 (see FIG. 50).
  • the plurality of p-side ohmic contact pads 89 are arranged on an extension line of the p-side branch electrode 88 under the second electrode 85.
  • the ohmic contact pad 89 is interposed between the current spreading conductive film 60 and the third electrical connection 82 to improve electrical contact.
  • the ohmic contact pad 89 may be made of the same material as the p-side branch electrode 88.
  • the plurality of n-side ohmic contact pads 79 are provided on the first semiconductor layer 30 exposed by the opening 63, under the first electrode 75, under the second electrode 85, and their It is provided in each lower part.
  • the plurality of n-side ohmic contact pads 79 are arranged side by side with the p-side branch electrode 88 between the plurality of p-side branch electrodes 88 (see FIGS. 46 and 50).
  • the n-side ohmic contact pad 79 is interposed between the first semiconductor layer 30 and the first electrical connection 71 to improve electrical contact to prevent the operating voltage from rising.
  • the n-side ohmic contact pad 79 may be made of the same material as the p-side ohmic contact pad 89.
  • a light absorption prevention film or a current block layer is added to correspond to the p-side ohmic contact pad 89 and the p-side branch electrode 88. You may.
  • the first electrical connection 71 leads to the first semiconductor layer side opening 63 and is in electrical communication with the first semiconductor layer 30 via the n-side ohmic contact pad 79.
  • the second electrical connection 81 extends to a portion of the second semiconductor layer side opening 65 and is conductive with the p-side branch electrode 88.
  • the third electrical connection 82 extends to the remaining second semiconductor layer side opening 65 and is in electrical communication with the p-side ohmic contact pad 89.
  • the third electrical connection 82 is electrically connected to the second semiconductor layer 50 separately from the p-side branch electrode 88 through the second semiconductor layer side opening 65.
  • the plurality of p-side branch electrodes 88 extend parallel to each other under the second electrode 85 and below the first electrode 75 to spread current, and the p-side branch between the plurality of p-side branch electrodes 88.
  • a plurality of first semiconductor layer side openings 63 are formed along the electrode 88.
  • the p-side branch electrode 88 is connected to only the second electrical connection 81 and the third electrical connection 82 is performed. Is electrically connected to the second semiconductor layer 50 through the p-side ohmic contact pad 89 separately from the p-side branch electrode 88. Therefore, the p-side branch electrode 88 does not unnecessarily increase, so that the light absorption loss is reduced.
  • the plurality of first electrical connections 71 are distributed on the emission surface without using an n-side branch electrode.
  • the electrons are supplied to the first semiconductor layer 30 through the n-side ohmic contact pads (see FIG. 50).
  • the emission surface reduction is prevented.
  • light absorption loss by the n-side branch electrode can be reduced.
  • the first connection electrode 73 and the second connection electrode 83 are formed on the non-conductive reflecting film 91, for example, on the clad film 91c.
  • the first connection electrode 73 connects the plurality of first electrical connections 71 and contributes to achieving a uniform current supply to the plurality of first electrical connections 71.
  • the second connection electrode 83 connects the plurality of second electrical connections 81 and the third electrical connections 82 to each other and provides a uniform current supply to the second electrical connections 81 and the third electrical connections 82. Contribute to accomplishing
  • the shape of the first connection electrode 73 may be changed according to the arrangement of the plurality of first electrical connections 71. In this example, the first connection electrode 73 has a finger shape.
  • the second connection electrode 83 may be changed in shape depending on the arrangement of the plurality of second electrical connections 81 and the third electrical connections 82.
  • the second connection electrode 83 has a finger shape.
  • the first connection electrode 73 and the second connection electrode 83 are arranged in the form of an interdigitate finger (see FIG. 50).
  • the number, spacing and arrangement of the first semiconductor layer side opening 63 and the second semiconductor layer side opening 65 can be appropriately adjusted for the size, current spreading and uniform current supply and uniformity of light emission of the semiconductor light emitting element. .
  • the semiconductor light emitting device includes an insulating layer 95 covering the first connection electrode 73 and the second connection electrode 83.
  • the first electrode side opening 97 and the second electrode side opening 98 are formed in the insulating layer 95.
  • Insulating layer 95 may be formed of SiO 2.
  • the first electrode 75 and the second electrode 85 are formed on the insulating layer 95.
  • the first electrode 75 is electrically connected to the first connection electrode 73 through the first electrode side opening 97 to supply electrons to the first semiconductor layer 30.
  • the second electrode 85 is electrically connected to the second connection electrode 83 through the second electrode side opening 98 to supply holes to the second semiconductor layer 50.
  • the first electrode 75 and the second electrode 85 may be electrodes for eutectic bonding.
  • a groove or notch 76 for p-side and n-side identification is provided at the edge of the first electrode 75. Formed (see Fig. 50).
  • the semiconductor light emitting device reduces the light absorption by using the non-conductive reflecting film 91 including the distribution Bragg reflector 91a instead of the metal reflecting film.
  • the light absorbing loss is reduced by not supplying a sufficient current to the first semiconductor layer through the plurality of first electrical connections 71 and separately providing the n-side branch electrodes connecting the first electrical connections 71 to each other. Area reduction can be reduced.
  • current spreading is improved through the p-side branch electrode 88 connected to the second electrical connection 81 to improve uniformity of light emission.
  • a third electrical connection 82 which is electrically connected to the second semiconductor layer, is provided separately from the p-side branch electrode 88 to prevent the p-side branch electrode 88 from being unnecessarily lengthened to reduce light absorption loss.
  • 45 to 50 illustrate an example of a method of manufacturing a semiconductor light emitting device according to the present disclosure.
  • a plurality of semiconductor layers 30, 40, 50 are grown on the substrate 10.
  • a buffer layer eg, AlN or GaN buffer layer
  • an undoped semiconductor layer eg, un-doped GaN
  • a first semiconductor layer 30 having a first conductivity eg Si-doped GaN
  • an active layer 40 InGaN / (In) GaN multi-quantum well structure
  • a second semiconductor layer 50 eg, Mg-doped GaN having a second conductivity different from the first conductivity is grown.
  • the buffer layer 20 may be omitted, and each of the semiconductor layers 30, 40, and 50 may be formed in multiple layers.
  • the first semiconductor layer 30 and the second semiconductor layer 50 may be formed with opposite conductivity, but are not preferable in the case of a group III nitride semiconductor light emitting device.
  • the current spreading conductive layer 60 may be formed of a light transmissive conductor (eg, ITO) to reduce light absorption. Although the current spreading conductive film 60 may be omitted, it is generally provided to spread the current to the second semiconductor layer 50.
  • ITO light transmissive conductor
  • the first semiconductor layer side opening 63 is formed by a mesa etching process.
  • the mesa etching process may be performed before forming the current diffusion conductive layer 60.
  • a plurality of p-side branch electrodes 88 and a plurality of p-side ohmic contact pads 89 are formed on the current diffusion conductive film 60, and together with or in a separate process.
  • An n-side ohmic contact pad is formed.
  • the plurality of p-side branch electrodes 88 are patterned to extend under the first electrode 75 under the second electrode 85 in parallel with each other.
  • the shape of the p-side branch electrode 88 may be changed to improve the shape of the semiconductor light emitting device and the uniformity of the current distribution.
  • a plurality of p-side ohmic contact pads 89 are arranged apart from one end of the p-side branch electrode 88.
  • the p-side branch electrode 88 and the p-side ohmic contact pad 89 may include a plurality of layers. This will be described later.
  • a nonconductive reflecting film 91 is formed.
  • the dielectric film 91b covering the current spreading conductive film 60 and the plurality of p-side branch electrodes 88, the p-side ohmic contact pads 89 and the n-side ohmic contact pads 79, the distribution Bragg reflector 91a and clad film 91c are formed.
  • the dielectric film 91b or the clad film 91c may be omitted.
  • the distributed Bragg reflector 91a is formed by stacking a pair of SiO 2 and TiO 2 a plurality of times, for example.
  • the distribution Bragg reflector 91a may be formed of a combination of a high refractive index material such as Ta 2 O 5 , HfO, ZrO, SiN, and a dielectric thin film (typically SiO 2 ) having a lower refractive index.
  • a high refractive index material such as Ta 2 O 5 , HfO, ZrO, SiN
  • a dielectric thin film typically SiO 2
  • the distribution Bragg reflector 91a is composed of TiO 2 / SiO 2 , it is preferable to perform an optimization process in consideration of the incident angle and reflectance according to the wavelength based on an optical thickness of 1/4 of the wavelength of the light emitted from the active layer.
  • the thickness of each layer does not necessarily have to conform to the optical thickness of 1/4 of the wavelength.
  • the number of combinations is suitable for 4 to 20 pairs.
  • the effective refractive index of the distribution Bragg reflector 91a is larger than the refractive index of the dielectric film 91b for the reflection and guide of light.
  • the dielectric film 91b may be made of SiO 2 , and the thickness thereof is appropriately 0.2um to 1.0um. Prior to the deposition of the distributed Bragg reflector 91a requiring precision, by forming the dielectric film 91b having a predetermined thickness, the distributed Bragg reflector 91a can be stably manufactured and can also help reflection of light. .
  • a clad layer (91c) may be formed of a dielectric film (91b), material of MgF, CaF, such as a metal oxide, SiO 2, SiON, such as Al 2 O 3.
  • the clad film 91c may also be formed of SiO 2 having a refractive index of 1.46 smaller than the effective refractive index of the distribution Bragg reflector 91a.
  • the clad film 91c is placed below the distribution Bragg It is preferable to be thicker than [lambda] / 4n so as to be different from the uppermost layer of the reflector 91a.
  • the clad film is not only burdened with the subsequent steps of forming the plurality of first semiconductor layer side openings 63 and the plurality of second semiconductor layer side openings 65, but also because the increase in thickness does not contribute to the improvement in efficiency and only the material cost can be increased.
  • 91c is too thick beyond 3.0um.
  • the maximum value of the clad film 91c be formed within 1 ⁇ m to 3 ⁇ m. will be. However, in some cases, it is not impossible to form more than 3.0um.
  • the distribution Bragg reflector 91a and the p-side branch electrode 88, the first connection electrode 73 and the second connection electrode 83 are in direct contact, a part of the light traveling through the distribution Bragg reflector 91a Absorption may occur by the p-side branch electrode 88, the first connection electrode 73, and the second connection electrode 83. Therefore, by introducing the clad film 91c and the dielectric film 91b having a lower refractive index than the distribution Bragg reflector 91a as described above, the amount of light absorption can be greatly reduced.
  • a case in which the dielectric film 91b is omitted may be considered, which is not preferable from the viewpoint of the optical waveguide, but from the viewpoint of the overall technical idea of the present disclosure, it is composed of the distributed Bragg reflector 91a and the clad film 91c. There is no reason to rule out this. Instead of the distribution Bragg reflector 91a, one may consider the case where the dielectric film 91b made of TiO 2 is used as the dielectric material. In the case where the distribution Bragg reflector 91a is provided with the SiO 2 layer on the uppermost layer, the case where the clad film 91c is omitted may also be considered.
  • the dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91c serve as an optical waveguide as the nonconductive reflecting film 91, and preferably have a total thickness of 1 to 8 um.
  • the plurality of first semiconductor layer side openings 63 and the plurality of second semiconductor layer sides in the nonconductive reflective film 91 by, for example, dry etching or wet etching, or a combination thereof.
  • An opening 65 is formed.
  • the first semiconductor layer side opening 63 is formed to a portion of the non-conductive reflective film 91, the second semiconductor layer 50, the active layer 40, and the first semiconductor layer 30 to expose the n-side ohmic contact pad 79. do.
  • the second semiconductor layer side opening 65 is formed to penetrate through the non-conductive reflective film 91 to expose a portion of the p-side branch electrode 88 and the p-side ohmic contact pad 89. In this example, the second semiconductor layer side opening 65 exposes one end of the p-side branch electrode 88.
  • the first semiconductor layer side opening 63 and the second semiconductor layer side opening 65 may be formed after the formation of the non-conductive reflecting film 91.
  • the dry etching process for forming the plurality of first semiconductor layer side openings 63 and the plurality of second semiconductor layer side openings 65 includes a halogen gas including an F group as an etching gas (eg, CF 4 , C 2 F 6 , C 3). F 8 , SF 6, etc.) may be used.
  • a halogen gas including an F group as an etching gas eg, CF 4 , C 2 F 6 , C 3.
  • F 8 , SF 6, etc. may be used.
  • FIG. 48 illustrates an example of a p-side branch electrode included in a semiconductor light emitting device according to the present disclosure.
  • the p-side branch electrode 88 may include a plurality of layers as described above.
  • the p-side branch electrode 88 includes a contact layer 88a electrically connected to the second semiconductor layer 50, an antioxidant layer 88d and an antioxidant layer 88d formed on the contact layer 88a.
  • An etch stop layer 88e is formed thereon.
  • the p-side branch electrode 88 is a contact layer 88a, a reflective layer 88b, a diffusion barrier 88c, an antioxidant layer 88d, and an etch stop layer 88e sequentially formed on the current diffusion conductive film 60. It includes.
  • the n-side ohmic contact pad 79 and the p-side ohmic contact pad 89 may also have the same layer configuration as the p-side branch electrode 88.
  • the contact layer 88a is preferably made of a material which makes good electrical contact with the current spreading conductive film 60.
  • Materials such as Cr and Ti are mainly used as the contact layer 88a, and Ni, TiW, and the like may be used, and Al and Ag having good reflectance may be used.
  • the reflective layer 88b may be made of a metal having excellent reflectance (eg, Ag, Al, or a combination thereof).
  • the reflective layer 88b reflects the light generated by the active layer 40 toward the plurality of semiconductor layers 30, 40, and 50.
  • the reflective layer 88b may be omitted.
  • the diffusion barrier layer 88c prevents the material of the reflective layer 88b or the material of the antioxidant layer 88d from diffusing into another layer.
  • the diffusion barrier layer 88c may be made of at least one selected from Ti, Ni, Cr, W, TiW, and the like, and when a high reflectance is required, Al, Ag, or the like may be used.
  • the anti-oxidation layer 88d may be made of Au, Pt, or the like, and may be any material as long as it is exposed to the outside and does not oxidize well in contact with oxygen.
  • Au having good electrical conductivity is mainly used.
  • the etch stop layer 88e is a layer exposed in the dry etching process for forming the second semiconductor layer side opening 65.
  • the etch stop layer 88e is the uppermost layer of the p-side branch electrode 88.
  • Au is used as the etch stop layer 88e, not only the bonding strength with the non-conductive reflecting film 91 is weak, but a portion of Au may be damaged or damaged during etching. Therefore, when the etch stop layer 88e is made of a material such as Ni, W, TiW, Cr, Pd, Mo, or the like instead of Au, the bonding strength with the non-conductive reflective film 91 may be maintained, thereby improving reliability.
  • the etch stop layer 88e protects the p-side branch electrode 88 and, in particular, prevents damage to the antioxidant layer 88d.
  • a halogen gas containing an F group eg, CF 4 , C 2 F 6 , C 3 F 8 , SF 6
  • the etch stop layer 88e is preferably made of a material having excellent etching selectivity in the dry etching process. When the etching selectivity of the etch stop layer 88e is not good, the antioxidant layer 88d may be damaged or damaged in the dry etching process.
  • Ni or Ni is suitable as a material of the etch stop layer 88e in view of the etching selectivity. Ni or Cr does not react with or slightly reacts with the etching gas of the dry etching process, and does not etch to serve to protect the p-side branch electrode 88.
  • a material such as an insulating material or an impurity may be formed on the upper layer of the p-side branch electrode 88 due to the etching gas.
  • a material may be formed by reacting the halogen etching gas including the F group with the upper metal of the p-side branch electrode 88.
  • the etch stop layer 88e may react with an etching gas of a dry etching process to form a material (eg, NF).
  • the material formed as described above may cause a decrease in electrical characteristics (eg, an increase in operating voltage) of the semiconductor light emitting device.
  • Other materials of Ni, W, TiW, Cr, Pd, Mo, etc. as the material of the etch stop layer 88e do not react with the etching gas to form a material or form a very small amount of material. It is preferable to suppress material generation or to form a small amount, and Cr is more suitable as a material for the etch stop layer 88e than Ni in this respect.
  • the upper layer of the p-side branch electrode 88 that is, the portion corresponding to the second semiconductor layer side opening 65 of the etch stop layer 88e in consideration of the formation of the material, is removed by a subsequent wet etching process.
  • the antioxidant layer 88d corresponding to the second semiconductor layer side opening 65 is exposed.
  • the material is etched away along with the etch stop layer 88e.
  • wet etching may be performed to form the first semiconductor layer side opening 63 and the second semiconductor layer side opening 65.
  • the non-etching liquid of the conductive reflective film 91 such as HF, BOE, NHO 3, HCl may be used alone or in combination in an appropriate concentration.
  • the etching selectivity of the etch stop layer 88e is excellent for protecting the antioxidant layer 88d.
  • Cr is suitable as a material of the etch stop layer 88e.
  • the etch stop layer 88e corresponding to the second semiconductor layer side opening 65 may be removed by a subsequent wet etching process.
  • the non-conductive reflective film is formed at a portion other than the second semiconductor layer side opening 65.
  • An etching prevention layer 88e having good bonding strength is in contact with the 91, and, for example, the p-side branch electrode 88 is sequentially laminated with Cr (contact layer) / Al (reflective layer) / Ni (diffusion prevention layer) / Au (oxidation). Preventive layer) / Cr (etch prevention layer).
  • the etch stop layer 88e is removed from the second semiconductor layer side opening 65 to prevent electrical property degradation.
  • the ohmic contact pads 89 and 79 may also have the same layer structure as that of the p-side branch electrode 88, and a portion corresponding to the second semiconductor layer side opening 65 may be formed by the anti-oxidation layer of the p-side ohmic contact pad 89. 88d) and the third electrical connection 82 to be described below may contact each other.
  • the anti-oxidation layer 88d of the n-side ohmic contact pad 89 and the first electrical connection 71 to be described later may contact each other.
  • etch stop layer 88e is wet etched in a portion corresponding to the second semiconductor layer side opening 65 so that a portion of the etch stop layer 88e remains, and the etch stop layer 88e may be considered.
  • the material concentrated on the top of) can be removed.
  • the first electrical connection 71 is connected to the first semiconductor layer side opening 63
  • the second electrical connection 81 and the third electrical connection is connected to the second semiconductor layer side opening 65.
  • the first connection electrode 73 and the second connection electrode 83 are formed on the nonconductive reflective film 91 at 82.
  • the first connection electrode 73 and the second connection electrode 83 may be formed in a separate process or in the same process as the first electrical connection 71, the second electrical connection 81, and the third electrical connection 82. Can be.
  • the first electrical connection is performed by plating, or depositing and filling a material of the first connection electrode 73 and the second connection electrode 83 on the first semiconductor layer side opening 63 and the second semiconductor layer side opening 65.
  • the second electrical connection 81, the third electrical connection 82, the first connection electrode 73, and the second connection electrode 83 may be formed together.
  • first connection electrode 73 and the second connection electrode 83 may be deposited using sputtering equipment, E-beam equipment, or the like.
  • the first electrical connection 71, the second electrical connection 81, and the third electrical connection 82 may be formed using Cr, Ti, Ni, or a combination thereof for stable electrical contact, and may be formed of Al or Ag.
  • the same reflective metal layer may be included.
  • the first connection electrode 73 connects the plurality of first electrical connections 71 to each other and is formed in a finger shape as described above.
  • the second connection electrode 83 connects the plurality of second electrical connections 81 and the third electrical connections 82 and is formed in a finger shape, and is disposed in the form of a finger interposed with the first electrical connection 71.
  • the first electrical connection 71 is arranged between the p-side branch electrodes 88 and between the fingers of the second connection electrode 83.
  • the third electrical connection 82 is positioned opposite the p-side branch electrode 88 based on the second electrical connection 81.
  • the p-side branch electrode 88 is connected to the second electrical connection 81 near the first electrode 75 under the second electrode 85 and extends below the first electrode 75.
  • an insulating layer 95 covering the first connection electrode 73 and the second connection electrode 83 is formed.
  • Representative material of the insulating layer 95 is SiO 2 , without being limited thereto, SiN, TiO 2 , Al 2 O 3 , Su-8 and the like may be used.
  • at least one first electrode side opening 97 and at least one second electrode side opening 98 are formed in the insulating layer 95.
  • the first electrode 75 and the second electrode 85 may be deposited on the insulating layer 95 using sputtering equipment, E-beam equipment, or the like.
  • the first electrode 75 is connected to the first connection electrode 73 through at least one first electrode side opening 97, and the second electrode 85 opens at least one second electrode side opening 98. It is connected to the second connection electrode 83 through.
  • the first electrode 75 and the second electrode 85 may be electrically connected to an electrode provided outside (package, COB, submount, etc.) by a method such as stud bump, conductive paste, and eutectic bonding.
  • a method such as stud bump, conductive paste, and eutectic bonding.
  • the semiconductor light emitting device according to the present example since the first electrode 75 and the second electrode 85 can be formed on the insulating layer 95 by the same process, there is almost no height difference between the two electrodes. Thus there is an advantage in the case of eutectic bonding.
  • the uppermost portions of the first electrode 75 and the second electrode 85 are eutectic bonding such as Au / Sn alloy and Au / Sn / Cu alloy. It can be formed of a material.
  • a light absorption prevention film or a current block layer may be added between the second semiconductor layer 50 and the transparent conductive film 60 in correspondence with the p-side ohmic contact pad 89 and the p-side branch electrode 88. It may be.
  • the 44 to 50 include a first electrode part in electrical communication with the first semiconductor layer 30 and a second electrode part in electrical communication with the second semiconductor layer 50. At least one of the first electrode portion and the second electrode portion has a lower electrode, an upper electrode and an electrical connection connecting them.
  • the second electrode portion includes lower electrodes 88 and 89, upper electrode 83, and electrical connections 81 and 82.
  • the second electrode 85 becomes a bonding pad separate from the upper electrode 83.
  • the electrical connections 81 and 82 and the second connection electrode 83 may be regarded as electrical connections extending from the opening to the upper surface of the non-conductive reflecting film, and the second electrode 85 may be viewed as the upper electrode.
  • the first electrode unit includes a lower electrode 79, an upper electrode 73, and an electrical connection 71.
  • the electrical connection 71 and the first connection electrode 73 may be regarded as an electrical connection extending from the opening to the upper surface of the non-conductive reflective film, and the first electrode 75 may be viewed as the upper electrode.
  • 51 is a view for explaining an example of a semiconductor light emitting device according to the present disclosure.
  • the semiconductor light emitting device includes a substrate 10, a plurality of semiconductor layers, a light absorption prevention film 41, a current diffusion conductive film 60, a first ohmic contact pad 56, a second ohmic contact pad 52, The non-conductive reflective film 91, the first connection electrode 71, the second connection electrode 73, the third connection electrode 75, the first electrode 81, and the second electrode 85 are included.
  • FIG. 51 is a view for explaining a cross section taken along a line A-A in FIG. 59; FIG.
  • group III nitride semiconductor light emitting element will be described as an example.
  • the nonconductive reflecting film 91 has a plurality of first openings 63 and a plurality of second openings 65 used as electrical connection passages.
  • the plurality of first openings 63 are formed to a portion of the non-conductive reflecting film 91, the second semiconductor layer 50, the active layer 40, and the first semiconductor layer 30, and the plurality of second openings 65. Is formed through the non-conductive reflecting film 91.
  • the first connection electrode 71, the second connection electrode 73, and the third connection electrode 75 are formed on the non-conductive reflecting film 91, for example, on the clad film 91c.
  • the first connection electrode 71 extends into the plurality of first openings 63 to be electrically connected to the first semiconductor layer 30.
  • the second connection electrode 73 and the third connection electrode 75 are electrically connected to the second semiconductor layer 50 through the plurality of second openings 65.
  • the first connection electrode 71, the second connection electrode 73, and the third connection electrode 75 may be formed using Cr, Ti, Ni, or a combination thereof for stable electrical contact, and may be formed of Al or Ag.
  • the same reflective metal layer may be included.
  • the second connection electrode 73 and the third connection electrode 75 extend to the plurality of second openings 65 to be electrically connected to the current spreading conductive layer 60.
  • the dielectric film 91b extends between the current spreading conductive film 60 and the distributed Bragg reflector 91a to the inner side surface of the first opening 63 to connect the first connection electrode 71 to the second semiconductor layer. (50) and insulate from the active layer (40).
  • another separate insulating film may be formed between the dielectric film 91b and the current spreading conductive film 60.
  • the light absorption prevention film 41 is formed at a position corresponding to the plurality of second openings 65 between the second semiconductor layer 50 and the current spreading conductive film 60.
  • the light absorption prevention layer 41 may be made of SiO 2 , TiO 2, or the like, and the light absorption prevention layer 41 may be omitted.
  • the light absorption prevention film 41 prevents current from concentrating in the direction immediately below the second opening 65, thereby assisting current spreading or spreading current and preventing deterioration of the device due to current concentration.
  • the first ohmic contact pad 56 is formed on the first semiconductor layer 30 exposed through the plurality of first openings 63, and is connected to the first semiconductor layer 30 and the first opening 63. Contact with (71).
  • the first ohmic contact pad 56 may be formed of a combination of Cr, Ti, Al, Ag, Ni, Pt, W, Au, and the like.
  • the first ohmic contact pads 56 may be sequentially stacked ohmic contact layers (eg, Cr, Ti, etc.) / Reflective metal layers (eg, Al, Ag, etc.) / First barrier layer (eg, Ni, Cr, etc.).
  • the ohmic contact layer is made of a metal having a small work function to make ohmic contact with the first semiconductor layer 30 (for example, n-GaN).
  • the reflective metal layer reflects light to reduce absorption loss.
  • the first barrier layer prevents diffusion between the reflective metal layer and the antioxidant layer.
  • the anti-oxidation layer prevents oxidation of the first barrier layer or the like and can make good electrical contact with the first connection electrode 71.
  • the second barrier layer may be in contact with the first connection electrode 71, but may function as a protective metal layer protecting the antioxidant layer in the manufacturing process, and preferably, part of the second barrier layer is removed so that the first connection electrode is removed. 71 and the anti-oxidation layer can make electrical contact.
  • the first ohmic contact layer may have a thickness of 5A to 500A
  • the reflective metal layer may have a thickness of about 500A to 10000A
  • the first barrier layer may have a thickness of about 100A to 5000A
  • the oxidation-preventing layer may be It may have a thickness of about 100A to 5000A
  • the second barrier layer may have a thickness of about 10A to 1000A.
  • the first ohmic contact pads 56 having such a multilayer structure may have some layers omitted or new layers added as necessary.
  • 52 is a diagram for explaining an example of a second ohmic contact pad.
  • the second ohmic contact pad 52 is formed between the current diffusion conductive film 60 and the dielectric film to correspond to the light absorption prevention film 41. 51 and 58, the second ohmic contact pads 52 are partially exposed by the second openings 65, and the non-conductive reflecting film 91 is an edge of the second ohmic contact pads 52. Come up.
  • the second ohmic contact pad 52 is in contact with the second connection electrode 73 and the third connection electrode 75 connected to the current spreading conductive layer 60 and the second opening 65.
  • the second ohmic contact pad 52 is omitted, the current diffusion conductive film 60 is made of ITO, and Cr or Ti, which is the lowermost layer of the second connection electrode 73 and the third connection electrode 75, Contact resistance may be poor when contacting ITO. This is because there is a high possibility of damaging the surface of the ITO by a process of forming an opening in the non-conductive reflecting film 91 which will be described later, so that the contact resistance is likely to increase.
  • the second ohmic contact pad 52 may be formed of a multilayer by a combination of Cr, Ti, Al, Ag, Ni, Pt, W, Au, and the like.
  • the second ohmic contact pad 52 need not have the same structure as the first ohmic contact pad 56, but may have a similar multilayer structure.
  • the second ohmic contact pads 52 are sequentially stacked contact layers 51 / reflective metal layers 53 / first barrier layers 57 / oxide ring layers 58 / second barrier layers 59. ) May be included.
  • the contact layer 51 is formed to be in contact with the current spreading conductive layer 60 and may be made of a material having low contact resistance (eg, Cr, Ti, Ni, etc.) with the current spreading conductive layer 60.
  • the reflective metal layer 53 is made of a metal having excellent reflectivity (eg, Al, Ag, etc.), and reflects light to reduce absorption loss.
  • the first barrier layer 57 may be made of Ni, Cr, Ti, W, Pt, TiW, or the like, and prevents diffusion between the reflective metal layer 53 and the antioxidant layer 58.
  • the anti-oxidation layer 58 may be made of Au, Pt, or the like, prevents oxidation of the first barrier layer 57 or the like, and makes good electrical contact with the second connection electrode 73 and the third connection electrode 75. Can be.
  • the second barrier layer 59 may be made of Cr, Ti, Ni, Pt, Al, or the like.
  • the second barrier layer 59 should have a good bonding strength with the nonconductive reflecting film 91, and is exposed to a process of forming an opening in the nonconductive reflecting film 91, and thus requires a function as a protective metal film. Since it may be etched, it is preferable that the etching selectivity be made of a good material. In consideration of such conditions, Cr, Pt, Al, and Ni may be used as the second barrier layer 59.
  • the second barrier layer 59 may contact the second connection electrode 73 and the third connection electrode 75, the second barrier layer 59 may function as a protective metal layer that protects the antioxidant layer in the manufacturing process.
  • a part of the second barrier layer 59 is removed to make electrical contact between the second connection electrode 73, the third connection electrode 75, and the antioxidant layer 58.
  • the contact layer 51 may have a thickness of 5A to 500A
  • the reflective metal layer 53 may have a thickness of about 500A to 10000A
  • the first barrier layer 57 may have a thickness of about 100A to 5000A.
  • the anti-oxidation layer 58 may have a thickness of about 100A to 5000A
  • the second barrier layer 59 may have a thickness of about 10A to 1000A.
  • the second ohmic contact pads 52 having a multilayer structure may be partially omitted or new layers may be added as necessary.
  • the second ohmic contact pad 52 has a plurality of islands corresponding to the plurality of second openings 65.
  • the second ohmic contact pads 52 are formed in a plurality of island shapes corresponding to the plurality of second openings 65. It may be considered to form additional metal layers (eg, branch electrodes) connecting the plurality of islands of the second ohmic contact pads 52 to facilitate current spreading.
  • additional metal layers eg, branch electrodes
  • branch electrodes connecting the plurality of islands of the second ohmic contact pads 52 to facilitate current spreading.
  • the plurality of first openings 63 and the plurality of second openings 65 are provided as current supply passages, and the first ohmic contact pads 56 and the second ohmic contact pads 52 are provided in the plurality of first openings.
  • a plurality of islands respectively corresponding to the opening 63 and the plurality of second openings 65 are provided, and current is diffused by preventing current concentration by the light absorption prevention film 41.
  • the first ohmic contact pad 56 and the second ohmic contact pad 52 allow a smooth current supply and lower the operating voltage.
  • the electrical connection passage of the first connection electrode 71, the second connection electrode 73 and the third connection electrode 75 for the electrical connection passage of the first connection electrode 71, the second connection electrode 73 and the third connection electrode 75.
  • a plurality of first openings 63 and a plurality of second openings 65 are formed.
  • a plurality of semiconductor layers 30, 40, and 50 are mesa etched and a branch electrode is disposed on the first semiconductor layer 30 exposed by mesa etching for current diffusion, in this case, light emission due to mesa etching There is a problem that the plane is reduced.
  • current is supplied through the plurality of first openings 63 with much smaller etching areas.
  • a plurality of second openings 65 may be formed to be greater than or equal to the number of the plurality of first openings 63 to balance the diffusion of holes and electrons.
  • a plurality of electrical connections are formed through the plurality of first openings 63 and the plurality of second openings 65, it is important to improve electrical contact characteristics.
  • the first ohmic contact pads 56 and the second ohmic contact pads 52 are formed corresponding to the plurality of first openings 63 and the plurality of second openings 65.
  • the first ohmic contact pad 56 and the second ohmic contact pad 52 are formed in a plurality of island shapes between the semiconductor layers 30, 40, 50 and the non-conductive reflective film 91.
  • the number, spacing, and arrangement of the first openings 63 and the second openings 65 may be appropriately adjusted for the size, current spreading, and uniform current supply of the semiconductor light emitting device.
  • the plurality of first openings 63 and the plurality of second openings 65 are symmetrically formed with respect to the center of the semiconductor light emitting element (see FIG. 57).
  • a current is supplied through the plurality of first openings 63 and the plurality of second openings 65, and if the current is nonuniform, some of the first openings 63 and the second openings 65 may be biased. As a result, deterioration may occur at a position where current is biased in the long term.
  • the closed loop shape is not limited to the complete closed loop shape, but also includes a closed loop shape in which a part is turned off.
  • the second connection electrode 73 has a closed loop shape
  • the first connection electrode 71 has a closed loop shape inside the second connection electrode 73
  • the third connection electrode 75 has a closed loop shape. 1 has a square plate shape inside the connection electrode 71 (see FIG. 57).
  • the second opening 65 and the first opening 63 are not positioned inside the third connection electrode 75, that is, in the middle thereof. This may reduce the heat generation in the inner region where the heat generation is relatively high.
  • the insulating layer 95 covers the first connection electrode 71, the second connection electrode 73, and the third connection electrode 75 on the nonconductive reflective film 91. At least one third opening 67 and at least one fourth opening 69 are formed in the insulating layer 95.
  • the insulating layer 95 may be made of SiO 2 .
  • the first electrode 81 and the second electrode 85 are formed on the insulating layer 95.
  • the first electrode 81 is electrically connected to the first connection electrode 71 through the third opening 67 to supply electrons to the first semiconductor layer 30.
  • the second electrode 85 is electrically connected to the second connection electrode 73 and the third connection electrode 75 through the fourth opening 69 to supply holes to the second semiconductor layer 50.
  • the first electrode 81 and the second electrode 85 may be electrodes for eutectic bonding.
  • the semiconductor light emitting device reduces light absorption by using a non-conductive reflecting film (non-conductive reflecting film) 91 including a distributed Bragg reflector 91a instead of a metal reflecting film.
  • a plurality of first openings 63 and second openings 65 are formed to facilitate diffusion of current into the plurality of semiconductor layers 30, 40, 50.
  • the plurality of first openings 63 and the plurality of second openings 65 may be connected to each other by the first connection electrode 71 or the second connection electrode 73 and the third connection electrode 75 having a closed loop shape. The current is supplied more evenly to prevent deterioration due to current bias.
  • the first ohmic contact pad 56 and the second ohmic contact pad 52 are introduced to facilitate current supply and lower the operating voltage.
  • 60 is a view for explaining another example of the semiconductor light emitting device according to the present disclosure.
  • the semiconductor light emitting device includes a point where the light absorption prevention film is removed, a point where the second ohmic contact pad 52 includes an ohmic contact branch 54, and a point where the first opening 63 is added to the center of the light emitting surface. Except for the semiconductor light emitting device described in Figures 51 to 59 except for. Therefore, duplicate descriptions are omitted.
  • the light absorption prevention film may be included in the present embodiment, since the light absorption prevention film is omitted, the light may be absorbed by the first ohmic contact pad 56 and the second ohmic contact pad 52. However, when the first ohmic contact pad 56 and the second ohmic contact pad 52 include a highly reflective metal layer (eg, Al, Ag, etc.) as described with reference to FIG. 52, the degree of light absorption may be insignificant. . In contrast, the process may be reduced, and the operating voltage may be lowered.
  • a highly reflective metal layer eg, Al, Ag, etc.
  • the first opening 63 is added to the center of the light emitting surface, the balance between electrons and holes in the center region may be improved, and light emission may be improved.
  • the first ohmic contact pads 56 and the second ohmic contact pads 52 are formed in a plurality of island shapes respectively corresponding to the plurality of first openings 63 and the plurality of second openings 65.
  • the first ohmic contact pads 56 and the second ohmic contact pads 52 are symmetrically arranged with respect to the center of the light emitting surface for current spreading and equal supply.
  • the second ohmic contact pad 52 includes an ohmic contact pad 55 and an ohmic contact branch 54.
  • the ohmic contact pad 55 corresponds to the second opening 65 and is in contact with the second connection electrode 73 and the third connection electrode 75 leading to the second opening 65.
  • the ohmic contact branches 54 protrude from the ohmic contact pads 55 in a branch shape with a width smaller than that of the ohmic contact pads 55. Although the light absorption prevention film is omitted, the ohmic contact branch 54 allows the current to be better spread laterally, and the smooth flow of the current and the uniformity of the current distribution can be further improved. In addition, the ohmic contact branch 54 may close the distance between the second ohmic contact pad 52 and the first ohmic contact pad 56 and may contribute to an operating voltage drop.
  • 61 is a view for explaining another example of the semiconductor light emitting device according to the present disclosure.
  • the semiconductor light emitting device is substantially the same as the semiconductor light emitting device described with reference to FIGS. 51 to 59 except that the current diffusion conductive film and the light absorption prevention film are deleted. Therefore, duplicate descriptions are omitted.
  • the second ohmic contact pad 52 is in contact with the second semiconductor layer 50.
  • the second semiconductor layer 50 which is a p-type semiconductor layer (eg, Mg-doped GaN), and the metal
  • the second ohmic contact pad 52 is larger than the work function of the second semiconductor layer 50. It may be made of a metal having a function (eg, Ni, Au, Pt). Subsequent heat treatment processes can also be performed to improve ohmic contact.
  • the current spreading conductive film also absorbs light, the amount of light absorption can be reduced by eliminating the current spreading conductive film.
  • the light absorption prevention film there is an advantage of reducing the step when forming the non-conductive reflecting film 91, especially when forming the distribution Bragg reflector.
  • the first electrode part includes a lower electrode 56 (first ohmic contact pad), an electrical connection 71 (first connection electrode), and an upper electrode 81 (first electrode).
  • the second electrode part includes a lower electrode 52 (second ohmic contact pad, 75; second connection electrode, third connection electrode), and an upper electrode 85 (second electrode).
  • first, second and third connection electrodes form an electrical connection and an upper electrode
  • the first electrode and the second electrode may be viewed as bonding pads separate from the upper electrode.
  • FIG. 62 is a view for explaining another example of the semiconductor light emitting device according to the present disclosure
  • FIG. 63 is a view for explaining an example of a cross section taken along line A-A in FIG. 62.
  • the semiconductor light emitting device includes a substrate 10, a plurality of semiconductor layers 30, 40, and 50, a dielectric film 91b, a distributed bragg reflector 91a, a clad film 91f, and a first electrode 80. And a second electrode 92.
  • the dielectric film 91b or the clad film 91f may be omitted.
  • 62, the dielectric film 91b, the distributed Bragg reflector 91a, the clad film 91f, and the second electrode 92 are not shown in FIG.
  • a plurality of semiconductor layers having an active layer 40 that generates light through recombination of electrons and holes is formed on the substrate 10.
  • the buffer layer 20 is grown on the substrate 10, and the n-type semiconductor layer 30 (first semiconductor layer), the active layer 40, and the p-type semiconductor layer 50 (second semiconductor) are formed on the buffer layer 20. Layers) are grown sequentially.
  • Sapphire, SiC, Si, GaN, etc. are mainly used as the substrate 10, and the substrate 10 may be finally removed, and the buffer layer 20 may be omitted.
  • the p-type semiconductor layer 50 and the active layer 40 are mesa-etched to partially expose the n-type semiconductor layer 30.
  • the order of mesa etching can be changed.
  • the light absorption prevention layer 95 is partially formed on the p-type semiconductor layer 50.
  • the light absorption prevention layer 95 may be formed to correspond to the p-side branch electrode 93 to be described later. Although the light absorption prevention film 95 may be introduced to reduce light absorption by the p-side branch electrode 93, the light absorption prevention film 95 may be omitted in some cases.
  • the light absorption prevention film 95 is a single layer (eg SiO 2 ), a multilayer film (eg Si0 2 / TiO 2 / SiO 2 ), a distribution Bragg reflector, a single layer made of a light-transmitting material having a lower refractive index than the p-type semiconductor layer 50. Or a combination of a layer and a distributed Bragg reflector.
  • the light absorption prevention layer 95 may be made of a non-conductive material (eg, a dielectric film such as SiO x or TiO x ).
  • the current diffusion conductive layer 60 is formed on the p-type semiconductor layer 50 to cover the light absorption prevention layer 95 and to diffuse the current into the p-type semiconductor layer 150.
  • the current spreading conductive layer 60 may be formed of a material such as ITO or Ni / Au.
  • the p-side branch electrode 93 is formed on the current spreading conductive film 60.
  • the p-side branch electrode 93 is electrically connected to the p-type semiconductor layer 50 by the current diffusion conductive film 60.
  • the p-side branch electrode 93 may be formed in an island shape differently from the branch electrode.
  • the p-side branch electrode 93 may be omitted, and the p-side electrode 92 (second electrode) may directly contact the current spreading conductive film 60.
  • the n-side bonding pad 80 (first electrode) and the n-side branch electrode 81 for supplying electrons to the n-type semiconductor layer 30 on the exposed n-type semiconductor layer 30 are connected to the p-side branch electrode 93. It can be formed with formation.
  • the n-side bonding pad 80 and the n-side branch electrode 81 may be formed together with the p-side electrode 92.
  • the n-side branch electrode 81 may be omitted.
  • the n-side bonding pad 80 may be formed on the n-type semiconductor layer 30 side or the conductive substrate side from which the substrate 10 is removed.
  • the positions of the n-type semiconductor layer 30 and the p-type semiconductor layer 50 may be changed, and are mainly made of GaN in the group III nitride semiconductor light emitting device.
  • Each semiconductor layer 20, 30, 40, 50 may be composed of multiple layers, and additional layers may be provided.
  • the n-side bonding pad 80 may have a height sufficient to be coupled to the package using a separate bump, or may be deposited to a height sufficient to be coupled to the package as shown in FIG. 2.
  • stable electrical contact is obtained between the current diffusion conductive film 60 and the p-side electrode 92 by the p-side branch electrode 93.
  • Cr, Ti, Ni or alloys thereof may be used for stable electrical contact.
  • FIG. 64 is an enlarged view of a portion of the semiconductor light emitting device illustrated in FIG. 63.
  • a dielectric film 91b, a distributed Bragg reflector 91a, and a clad film 91f covering the p-side branch electrode 93 are formed.
  • the dielectric film 91b or the clad film 91f may be omitted.
  • the distributed Bragg reflector 91a is nonconductive, the entire dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91f function as the nonconductive reflecting film 91.
  • the dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91f include the p-type semiconductor layer 50, the n-type semiconductor layer 30 and the n-side bonding pads 80 exposed by etching the active layer 40. It may also be formed on top of a portion.
  • the dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91f do not necessarily cover all regions on the n-type semiconductor layer 30 and the p-type semiconductor layer 50.
  • the distribution Bragg reflector 91a functions as a reflecting film, but is preferably formed of a light transmitting material to prevent absorption of light.
  • the distributed Bragg reflector 91a is formed by stacking a pair of SiO 2 and TiO 2 a plurality of times, for example.
  • the distribution Bragg reflector 91a may be formed of a combination of a high refractive index material such as Ta 2 O 5 , HfO, ZrO, SiN, and a dielectric thin film having a lower refractive index (typically SiO 2 ).
  • the distribution Bragg reflector 91a is composed of TiO 2 / SiO 2 , it is preferable to perform an optimization process in consideration of the incident angle and reflectance according to the wavelength based on an optical thickness of 1/4 of the wavelength of the light emitted from the active layer.
  • the thickness of each layer does not necessarily have to conform to 1/4 optical thickness of the wavelength.
  • the number of combinations is suitable for 4 to 20 pairs.
  • the dielectric film 91b having a predetermined thickness Prior to the deposition of the distributed Bragg reflector 91a, which requires precision, the dielectric film 91b having a predetermined thickness is formed so that despite the heterogeneous and heterogeneous deposits 50,60,80,81,93, The distribution Bragg reflector 91a can be manufactured stably and can also help reflection of light.
  • the material is suitably SiO 2 , and the thickness thereof is appropriately 0.2 ⁇ m to 1.0 ⁇ m.
  • the non-conductive reflecting film 91 is formed on the distribution Bragg reflector 91a in addition to the dielectric film 91b and the Distribution Bragg reflector 91a.
  • the clad film 91f is further included.
  • the dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91f will be described later.
  • 65 is a photograph showing an example of the first opening formed in the nonconductive reflecting film.
  • a first opening 5 exposing a part of the p-side branch electrode 193 is formed to penetrate through the dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91f.
  • the sum of the thicknesses of the dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91f may be 0.5 ⁇ m or more and 10 ⁇ m or less. Processes such as dry etching or wet etching may be performed to form the first opening 5 penetrating the membrane of this thickness.
  • a slope is formed in the photoresist pattern corresponding to the position where the opening is to be formed.
  • dry etching eg, ICP, RIE, RIBE, CAIBE, etc.
  • the inclined surface 3 formed in the dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91c by the first opening 5 has a distributed Bragg reflector (as shown in FIGS. 63 and 64). It is formed to be inclined with the upper surface of 91a).
  • the inclined surface 3 forms an inclination angle 6 with a vertical line orthogonal to the upper surface of the distributed Bragg reflector 91a.
  • the p-side electrode 92 is formed on the clad film 91f and electrically connected to the p-side branch electrode 93 by an electrical connection 94 formed in the first opening 5.
  • a large portion of light generated in the active layer 40 is reflected by the dielectric film 91b and the distributed Bragg reflector 91a toward the n-type semiconductor layer 30.
  • the dielectric film 91b and the distributed Bragg reflector 91a also have a constant thickness, some light is trapped therein or emitted through the side of the dielectric film 91b and the Distributed Bragg reflector 91a.
  • the relationship between the dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91f can be described in terms of an optical waveguide.
  • the optical waveguide is a structure that guides the light by using total reflection by surrounding the light propagation part with a material having a lower refractive index. From this point of view, when the distribution Bragg reflector 91a is viewed as the propagation section, the dielectric film 91b and the clad film 91f surround the propagation section and can be viewed as part of the optical waveguide.
  • the dielectric film having the effective refractive index of the Distribution Bragg reflector 91a is SiO 2 . It is preferable to form so that it may be larger than the refractive index of (91b).
  • the effective refractive index refers to the equivalent refractive index of light that can travel in a waveguide made of materials having different refractive indices, and has a value between 1.46 and 2.4.
  • the clad film 91f is also made of a material lower than the effective refractive index of the distributed Bragg reflector 91a. Metal oxides such as Al 2 O 3 , dielectric films such as SiO 2 , SiON, MgF, CaF, and the like.
  • the clad film 91f preferably has a thickness of? / 4n to 3.0 um. Is the wavelength of light generated in the active layer 40, and n is the refractive index of the material forming the clad film 91f.
  • the uppermost layer of the multiple pairs of SiO distributed Bragg reflector (91a) made of a 2 / TiO 2 is considered that can be made to the SiO 2 layer having a thickness of ⁇ / 4n
  • the clad layer (91f) is a distribution that is located below the Bragg It is preferable to be thicker than [lambda] / 4n so as to be different from the uppermost layer of the reflector 91a.
  • the clad film 91f is too thick, not less than 3.0 ⁇ m, because not only a burden on the subsequent first opening 5 forming process but also an increase in thickness does not contribute to the improvement of efficiency and only the material cost can be increased.
  • the maximum value of the clad film 91f be formed within 1 ⁇ m to 3 ⁇ m. However, in some cases, it is not impossible to form more than 3.0um.
  • the distribution Bragg reflector 91a and the p-side electrode 92 and the n-side bonding pad 80 are in direct contact with each other, part of the light traveling through the distribution Bragg reflector 91a is the p-side electrode 92 and the n-side. Absorption may occur while being affected by the bonding pad 80, wherein the p-side electrode 92 and the n-side bonding pad 80 and the distribution Bragg reflector 91a have a lower refractive index than the distribution Bragg reflector 91a.
  • the dielectric film 91b is omitted may be considered, it is not preferable from the viewpoint of the optical waveguide, but from the viewpoint of the overall technical idea of the present disclosure, it is composed of the distributed Bragg reflector 91a and the clad film 91f. There is no reason to rule out this.
  • a case may include a dielectric film made of TiO 2 , which is a dielectric material.
  • the distribution Bragg reflector 91a is provided with the SiO 2 layer on the uppermost layer, the case where the clad film 91f is omitted may also be considered.
  • the dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91f serve as optical waveguides, and preferably have a total thickness of 1 to 8 um.
  • the light incident on the non-conductive reflecting film 91 serving as the optical waveguide the light incident on the non-conductive reflecting film 91 at a vertical or near vertical angle is well reflected toward the substrate 10 side, but at an oblique angle. Some of the light including the light incident on the non-conductive reflecting film 91 is not reflected to the substrate 10 side and is trapped in the distribution Bragg reflector 91a serving as the propagation part, and propagates laterally, as shown in FIG. 64. Can be.
  • the inclined surface 3 preferably has an inclination angle 6 within a range of 10 degrees to 80 degrees, for example, to guide the light toward the smooth substrate 10 side. If the inclination angle 6 is smaller than 10 degrees or larger than 80 degrees, the effect of guiding light toward the substrate 10 side is weak, and the formation of the inclination angle of 80 degrees or more may be a burden on the formation of the inclined surface 3. It is preferable that they are 25 degrees-75 degrees in order that the effect which guides light to the board
  • the light is shown in a two-dimensional plane, but in actual three-dimensional light, there is also a light reflected or guided by the inclined plane 3 and obliquely facing the front or the back of the ground. Some of the light reflected or guided at the inclined surface 3 is incident on the p-side branch electrode 93, but most of the reflected or guided light passes through the current spreading conductive film 60.
  • the inclined surface 3 serves as a guide surface or a reflective surface and contributes to the improvement of luminance of the semiconductor light emitting device.
  • 66 illustrates another example of the semiconductor light emitting device according to the present disclosure.
  • the p-side branch electrode is omitted, and the p-side electrode 92 contacts the current diffusion conductive film 60 through the first opening 5, and the inclined surface by the first opening 5 ( It is substantially the same as the semiconductor light emitting device described in FIGS. 62 to 65 except that 3) includes a plurality of sub inclined surfaces. Therefore, duplicate descriptions are omitted.
  • the semiconductor light emitting device may or may not include the light absorption prevention film 95.
  • a process such as dry etching or wet etching may be performed to form the inclined surface 5.
  • heat treatment is performed at 150C and 10min to form an inclination in the photoresist pattern corresponding to the position where the opening is to be formed.
  • dry etching eg, ICP, RIE, RIBE, CAIBE, etc.
  • the inclined surface 3 may be formed to have a rough surface. Due to the plurality of sub inclined surfaces, reflection angles of various angles may be realized.
  • 67 is a diagram illustrating another example of the semiconductor light emitting device according to the present disclosure.
  • the p-side branch electrode is omitted, and the p-side electrode 92 contacts the current diffusion conductive film 60 through the first opening 5, and the inclined surface by the first opening 5 ( It is substantially the same as the semiconductor light emitting device described in FIGS. 62 to 65 except for including a reflective electrode layer in contact with 3). Therefore, duplicate descriptions are omitted.
  • the semiconductor light emitting device may or may not include the light absorption prevention film 95.
  • the reflective metal layer 6 may be formed in contact with the inclined surface 3 by the first opening 5.
  • the reflective metal layer 6 is in contact with the surface of the dielectric film 91b formed by the first opening 5, the surface of the distributed Bragg reflector 91a and the surface of the clad film 91f, and are made of Ag and Al. Or a highly reflective metal layer comprising an alloy thereof.
  • the reflective metal layer 6 may be a lower layer of the second electrode 92 or a separate metal layer.
  • FIG. 68 illustrates another example of the semiconductor light emitting device according to the present disclosure.
  • the p-side branch electrode and the n-side branch electrode are omitted, the non-conductive reflecting film 91 is formed on the current diffusion conductive film 60, and the number of the first openings 5 is increased.
  • the second opening 7 is further formed in the nonconductive reflecting film 91, and the n-side bonding pad 80 is formed on the nonconductive reflecting film 91, and the electrical connection is formed in the second opening 7. It is substantially the same as the semiconductor light emitting device described in FIGS. 62 to 65 except that it is electrically connected to the n-type semiconductor layer 30 by 82. Therefore, duplicate descriptions are omitted.
  • the semiconductor light emitting device may or may not include the light absorption prevention film 95.
  • the nonconductive reflecting film is made of multilayer dielectric films 91c, 91d, 91e.
  • the non-conductive by constructing the reflecting film of a dielectric film (91c), a dielectric film (91d) and the dielectric film (91e) to the SiO 2 in a TiO 2 to the SiO 2 can serve as a reflective film.
  • the dielectric film 91d is formed of a DBR structure.
  • a dielectric film 91c made of SiO 2 is formed by Chemical Vapor Deposition (CVD), preferably (preferably) Plasma Enhanced CVD (PECVD), and TiO 2.
  • CVD Chemical Vapor Deposition
  • PECVD Plasma Enhanced CVD
  • TiO 2 TiO 2
  • the dielectric layer 91d / dielectric layer 91e made of / SiO 2 DBR has a repeated structure of physical vapor deposition (PVD), and preferably (preferably) electron beam evaporation or sputtering.
  • Step coverage such as mesa-etched regions, is advantageous because chemical vapor deposition is advantageous over physical vapor deposition, in particular electron beam deposition.
  • First opening 5 penetrating through dielectric film 91c, distributed Bragg reflector 91d, and dielectric film 91e and exposing a portion of current spreading conductive film 60 and a portion of n-type semiconductor layer 30, respectively. And a second opening 7 is formed.
  • a plurality of first openings 5 are formed to connect the p-side electrode 92 and the current spreading conductive film 60. Electrical connection 94 may be formed.
  • An n-side bonding pad 80 may be formed on the dielectric film 91e to be electrically connected to the n-type semiconductor layer 30 by an electrical connection 82 formed in the second opening 7.
  • One or more second openings 7 may be formed. For this reason, in the case of the flip chip, the step difference between the p-side electrode 92 and the n-side bonding pad 80 may be almost eliminated.
  • the first opening 5 and the second opening 7 cause the dielectric film 91c, the distributed Bragg reflector 91d and the dielectric film 91e to have inclined surfaces 3, 8.
  • the inclined surfaces 3 and 8 may allow more light to be emitted toward the substrate 10.
  • 69 illustrates another example of the semiconductor light emitting device according to the present disclosure.
  • the number of the first openings 5 is increased, the second openings 7 and the third openings 9 are further formed, and the n-side bonding pad 80 is placed on the non-conductive reflective film. And is substantially the same as the semiconductor light emitting device described in FIGS. 62 to 65 except that it is electrically connected to the n-side branch electrode 81 by an electrical connection 82 formed in the second opening 7. . Therefore, duplicate descriptions are omitted.
  • the semiconductor light emitting element may or may not include the light absorption prevention film 95.
  • the second opening 7 is formed to have the inclined surface 8, and the n-side bonding pad 80 is formed in the second opening 7. It is connected to the n-side branch electrode 81 through an electrical connection 82.
  • the first opening 5, the second opening 7, and the third opening 9 are formed in the dielectric film 91c, the distributed Bragg reflector 91d, and the dielectric film e.
  • the third opening 9 may be formed in almost the same shape as the first opening 5. Regardless of the electrical connection, it may be considered that the third opening 9 is formed only for the reflection of light toward the substrate 10 side.
  • the dielectric 91g is made of the same material as the dielectric film 91c, light may be reflected at the interface between the dielectric 91g and the distributed Bragg reflector 91d and the dielectric film 91e.
  • the third opening 9 may be filled with a material such as dielectric 91g.
  • the dielectric 91g may be formed of a material having a smaller refractive index than those of the non-conductive reflective film 91.
  • the dielectric 91g may be made of MaF.
  • the third opening 9 may be left without filling.
  • an opening independent of the electrical connection may be formed to guide more light toward the substrate 10.
  • 70 is a view showing another example of the semiconductor light emitting device according to the present disclosure.
  • the p-side branch electrode is omitted, the ohmic contact layer 52 is added on the current diffusion conductive film 60 to correspond to the first opening 5, and the p-side electrode 92 is the first opening. It is substantially the same as the semiconductor light emitting device described in Figs. 62-65 except that it continues to (5) and contacts the ohmic contact layer 52. Therefore, duplicate descriptions are omitted.
  • an ohmic metal (Cr, Ti, or the like) may be used, may be formed of a reflective metal (Al, Ag), or the like, or a combination thereof.
  • the ohmic contact layer 52 lowers the operating voltage of the semiconductor light emitting device.
  • a light absorption prevention film or a current block layer may be added between the p-type semiconductor layer and the current spreading conductive film 60 in correspondence with the ohmic contact layer 52.
  • FIG. 71 is a view illustrating an example of a method of manufacturing a semiconductor light emitting device according to the present disclosure, wherein a plurality of semiconductor layers, a light absorption prevention film 41, a current diffusion conductive film 60, a first electrode part, and a second electrode part are illustrated in FIG. And a nonconductive reflecting film 91.
  • the plurality of semiconductor layers are described in detail in the above examples, and include a first semiconductor layer having a first conductivity, a second semiconductor layer having a second conductivity different from the first conductivity, and between the first semiconductor layer and the second semiconductor layer. It is provided with an active layer that is interposed and generates light through recombination of electrons and holes.
  • the first electrode portion is in electrical communication with the first semiconductor layer
  • the second electrode portion is in electrical communication with the second semiconductor layer.
  • the non-conductive reflecting film 91 is formed on the plurality of semiconductor layers so as to reflect the light generated in the active layer toward the growth substrate, and the opening 5 for the electrical connection passage is formed.
  • At least one of the first electrode portion and the second electrode portion includes a lower electrode 52, an upper electrode 92, and an electrical connection 94.
  • the lower electrode 52 has an upper surface and a side surface connected to the upper surface, and part of the lower electrode 52 is exposed by the opening 5.
  • the upper electrode 92 is provided on the nonconductive reflecting film 91.
  • a plurality of semiconductor layers are formed on the growth substrate, and a light absorption prevention layer 41 is formed on the second semiconductor layer in correspondence with the lower electrode 52 of the second electrode portion.
  • a current diffusion conductive film 60 is formed to cover the light absorption prevention film 41
  • a lower electrode 52 is formed on the current diffusion conductive film 60 to correspond to the light absorption prevention film 41
  • the opening is formed as an opening.
  • a lower electrode is formed on the exposed first semiconductor layer.
  • a nonconductive reflecting film 91 is formed on the lower electrode 52.
  • the non-conductive reflecting film 91 may include a dielectric film, a distributed Bragg reflector, a clad film, or simply a laminate of dielectric films.
  • the top surface of the current spreading conductive film (eg, ITO) and the top surface of the first semiconductor layer (eg, n-GaN) are affected, thereby causing electrical connection 94.
  • Is in direct contact with ITO and n-GaN there is a fear that the quality of the electrical communication, such as a high contact resistance.
  • the lower electrode 52 is interposed between the electrical connection 94 and the current spreading conductive film 60 and between the electrical connection 94 and the first semiconductor layer (eg, n-GaN) to form contact resistance therewith. Reduction to ensure good electrical contact.
  • the lower electrode 52 is preferably provided not only as an electrode for supplying current or spreading current to the plurality of semiconductor layers, but also for better interconnection with the electrical connection 94.
  • the non-conductive reflective film 91 is slightly convex in the lower electrode 52 portion as shown in FIG.
  • the height difference may be generated with the non-conductive reflective film 91 outside the lower electrode.
  • the light absorption prevention film 41 may be formed at about 0.2 ⁇ m, and there is no significant influence on the height difference generation.
  • the photoresist pattern PR is formed on the nonconductive reflective film 91, and the opening 5 is formed as shown in FIG. 71 (b) by an etching process such as dry etching.
  • the upper inlet edge that is, the upper rim of the opening 5 is higher than the upper surface of the non-conductive reflective film 91 outside the lower electrode 52, resulting in a height difference T1.
  • a metal layer forming process such as a deposition process is performed on the nonconductive reflecting film 91 to form a metal layer that is connected to the upper surface of the nonconductive reflecting film 91 and the opening 5.
  • This metal layer may be formed of a single layer as well as a plurality of layers of different types (e.g., 92 and 80 in FIGS. 32 to 35, 92-1, 92-2, 92-3 of FIGS. 38 and 41, 92-4, 92 in FIG. 42, 6, 92 in FIG. 67).
  • the portion formed on the upper surface of the non-conductive reflective film 91 of the formed metal layer may be divided into the upper electrode 92 and the portion formed in the opening 5 may be divided into the electrical connection 94.
  • the upper electrode 92 may be a eutectic bonding electrode, in which case the uppermost layer of the upper electrode 92 is made of a material for utero bonding.
  • the entire metal layer may be viewed as an electrical connection 94.
  • the separate upper electrode 92 may be formed to avoid the upper rim of the opening 5, or may be formed to cover the opening 5.
  • the plurality of openings (5) are distributed on the light emitting surface of the semiconductor light emitting device as a whole, and the electrical connection 94 formed in each opening (5) to improve the current spreading or the uniformity of the current distribution non-conductive reflective film 91
  • the p-side connection electrode or the n-side connection electrode may be integrally formed with the electrical connection 94 formed in the opening 5 in the same process or may be formed to cover the electrical connection 94 in a separate process. .
  • the insulating layer 95 or the passivation layer covering the p-side connecting electrode or the n-side connecting electrode is formed and the p-side bonding pad 105 and the n-side bonding pad are formed on the insulating layer 95 is possible.
  • the p-side connecting electrode and the n-side connecting electrode may be regarded as the upper electrode, and the p-side bonding pad 105 and the n-side bonding pad may be viewed as separate bonding pads from the upper electrode.
  • the p-side connection electrode and the n-side connection electrode may be regarded as an extension of the electrical connection 94, and the p-side bonding pad 105 and the n-side bonding pad formed on the insulating layer 95 may be viewed as the upper electrode 92. Do. It is necessary to appropriately select the thickness of the insulating layer 95 to sufficiently secure the gap T2 between the upper electrode 92 and the bonding pad 97 leading to the upper rim of the opening 5.
  • FIG. 72 is a view for explaining another example of the semiconductor light emitting device according to the present disclosure
  • FIG. 73 is a view for explaining a state before forming the upper electrode
  • FIG. 74 is an example of a cross section taken along the line AA of FIG. 72. It is a figure which shows.
  • the semiconductor light emitting device includes a plurality of semiconductor layers 30, 40, 50, a light absorption prevention film 41, a current diffusion conductive film 60, a first electrode part, a second electrode part, and a non-conductive reflecting film 91. ).
  • the plurality of semiconductor layers 30, 40, 50 are described in detail in the above examples, and the first semiconductor layer 30 having the first conductivity, the second semiconductor layer 50 having the second conductivity different from the first conductivity, and the like.
  • an active layer 40 interposed between the first semiconductor layer 30 and the second semiconductor layer 50 to generate light through recombination of electrons and holes.
  • the first electrode part is in electrical communication with the first semiconductor layer 30, and the second electrode part is in electrical communication with the second semiconductor layer 50.
  • the non-conductive reflective film 91 is formed on the plurality of semiconductor layers 30, 40, and 50 so as to reflect the light generated from the active layer 40 toward the growth substrate 10, and the openings 63 and 65 for the electrical connection passages are formed. Formed. At least one of the first electrode portion and the second electrode portion includes a lower electrode, an upper electrode and an electrical connection 81, 82, 71, 72. In this example, the first electrode portion includes the lower electrodes 56 and 78, the upper electrode 75, and the electrical connections 71 and 72. The second electrode portion includes a lower electrode 52, 88, an upper electrode 85, and electrical connections 81, 82.
  • the lower electrodes 52, 56, 88, and 78 have an upper surface and side surfaces connected to the upper surface, and at least a portion thereof is exposed by the openings 63 and 65. In this example, the periphery of the lower electrodes 52, 56, 88, 78 is exposed by the openings 63, 65.
  • the upper electrodes 75 and 85 are provided on the nonconductive reflecting film 91. In this example, the upper electrodes 75 and 85 are formed to be in contact with the top surface of the nonconductive reflecting film 91.
  • Electrical connections 81, 82, 71, 72 communicate with upper electrodes 75, 85, and lead to openings 63, 65 to contact the top surfaces of lower electrodes 52, 56, 88, 78, and the lower electrode
  • the top and sides of (52, 56, 88, 78) cover the edges where they meet.
  • a plurality of semiconductor layers 30, 40, 50 are formed on a growth substrate 10, and as shown in FIGS. 73 and 74, a second semiconductor layer ( 50, mesa-etched portions of the active layer 40 and the first semiconductor layer 30 to form n-contact regions (eg, 63 and 64).
  • the n-contact regions 63 and 64 are formed with a plurality of island-like n-contact regions 63 and an elongated branched n-contact region 64.
  • a light absorption prevention layer 41 is formed on the second semiconductor layer 50 so as to correspond to the lower electrodes 52 and 88 of the second electrode portion to be formed later.
  • the light absorption prevention film 41 may also be formed on a part of the n-contact areas 63 and 64. Thereafter, the current diffusion conductive film 60 is formed on the plurality of semiconductor layers 30, 40, and 50 to cover the light absorption prevention film 41. It is also possible to form the n-contact regions 63 and 64 after forming the current spreading conductive film 60. Subsequently, the lower electrode 56 (n-side ohmic contact pad) of the first electrode portion in the island-like n-contact region 63 and the lower electrode 78 of the first electrode portion in the n-contact region 64 in the form of a branch; n-side branch electrodes) are formed. An n-side ohmic contact pad 56 is connected to one end of the n-side branch electrode 78.
  • the lower electrode 52 (p-side ohmic contact pad) of the second electrode portion in an island shape and the lower electrode 88 (p-side branch electrode) of the second electrode portion are formed on the current diffusion conductive film 60.
  • the p-side ohmic contact pad 56 is connected to one end of the p-side branch electrode 88.
  • the light absorption prevention layer 41 is provided under the lower electrodes 52 and 88 of the second electrode unit.
  • FIG. 75 is a view for explaining an example of the opening forming process
  • FIG. 76 is a view for explaining an example of how the upper rim of the opening is formed.
  • a nonconductive reflective film " " 91
  • the openings 63 and 65 are formed through an etching process (eg, plasma etching).
  • the openings 63 and 65 do not exclude the form of opening to the side as well as to the upper side of the semiconductor light emitting device.
  • openings are gradually formed as shown in FIG. 75 (a), and as shown in FIG. 75 (b), a portion of the upper surface of the lower electrode 52 is exposed (for example, 65 in FIG. 47 and FIG. 65 of 58, 5 of FIG. 64, 5 of FIG. 71).
  • the height difference between the upper rim of the opening and the upper surface of the non-conductive reflecting film 91 is reduced in FIG. 75 (b) than in FIG. 75 (a).
  • the periphery of the lower electrode 52 is exposed by the opening 65 as shown in FIG. 75C, and the inclined surface is formed on the non-conductive reflective film 91 due to the opening 65.
  • the n-side ohmic contact pad and the p-side ohmic contact pad 52 are exposed by the openings 63 and 65.
  • the openings 63 and 65 expose the n-contact region around the n-side ohmic contact pad and the current spreading conductive film 60 around the p-side ohmic contact pad 52.
  • the exposed surface etched in the process of forming the openings 63 and 65 forms an upper rim of the openings 63 and 65 so that the opening 63 .
  • the height difference between the upper rim of the non-conductive reflecting film 91 and the upper rim of the non-conductive reflecting film 91 is preferably reduced so that the upper surface of the non-conductive reflecting film 91 is smoothly connected. do.
  • the upper electrode 85 and the electrical connection 82 are then formed. A process of removing material formed on the upper surface of the lower electrode 52 may be added before forming the upper electrode 85 and the electrical connection 82 (see FIGS. 5 and 6).
  • the non-conductive reflecting film 91 corresponding to the openings 63 and 65 is not only etched, but the non-conductive reflecting film 91 convex around the openings 63 and 65 is etched together.
  • the etching mask PR may be configured such that the etching rates of portions corresponding to the openings 63 and 65 and portions corresponding to the non-conductive reflecting film 91 around the openings 63 and 65 are different.
  • the mask of the portion corresponding to the ohmic contact pad 52 is opened, and the inclined surface area A2 surrounding the ohmic contact pad 52 has different etching rates.
  • the openings 63 and 65 cause the inclined surface to be formed in the non-conductive reflecting film 91, and the rim region A1 surrounding the inclined surface area A2 has different etching rates, thereby exposing the etched surface to the non-conductive reflecting film 91.
  • the surface A1 is formed.
  • This etched exposed surface A1 forms the upper rim of the openings 63, 65, as shown in FIG. 76 (b).
  • Such an etching process may be performed in a single process or a plurality of etching processes, or may be a combination of dry and wet etching processes.
  • the etched exposed surface A1 forms the upper rim of the openings 63 and 65, the non-conductive reflective film 91 outside the upper rim of the openings 63 and 65 and the lower electrodes 52, 56, 88 and 78.
  • the step height or height difference T1 between the upper surfaces of the &quot For example, the height difference T1 from the upper surface of the current diffusion conductive film 60 to the upper surface of the non-conductive reflective film 91 and the upper rim A1 (etched exposed surface) of the openings 63 and 65. This becomes significantly smaller than the height difference T1 described in FIG.
  • the distance T2 between the bonding pads 105 that may be formed on the upper electrode 92 may be sufficiently secured to prevent the possibility of electrical hits between the upper electrodes 92 and the bonding pads 105. .
  • FIG. 77 is a view for explaining examples of an electrode portion of a semiconductor light emitting device according to the present disclosure
  • FIG. 78 is a view for explaining examples of planar shapes of the electrode portion.
  • upper electrodes 75 and 85 are formed on the non-conductive reflective film 91 by a deposition process or a plating process, and electrical connections 81, 82, 71, and 72 are formed in the openings 63 and 65.
  • the upper electrodes 75, 85 and the electrical connections 81, 82, 71, 72 are integrally formed, and the electrical connections 81, 82, 71, 72 are the lower electrodes 52, 56, 88, 78 Contacts the current spreading conductive film 60 and the first semiconductor layer 30 exposed by the side surface, the top surface, and the openings 63 and 65.
  • the contact surface between the electrical connections 81, 82, 71, 72 and the lower electrodes 52, 56, 88, 78 increases than the electrode portion described in FIG. 71, and the current diffusion conductive film 60-the lower electrode ( A more stable interconnect structure between 52 and 88 and electrical connections 81 and 82 and the first semiconductor layer 30 and lower electrodes 56 and 78 and electrical connections 71 and 72 can be obtained. .
  • the etched exposed surface causes the upper rim A1 of the openings 63 and 65 to be opened.
  • the etching process can be provided sufficiently strong to achieve such that the height difference T1 between the upper rims of the openings 63 and 65 and other portions of the non-conductive reflecting film 91 can be reduced or flattened to almost negligible.
  • the upper electrode 75 of the first electrode portion and the upper electrode 85 of the second electrode portion are positioned on the non-conductive reflecting film 91 so as to face each other, as shown in FIG.
  • the structure is advantageous for the electrode.
  • the non-conductive reflecting film 91 corresponding to the p-side branch electrode 88 protrudes upward than other portions, and is also disadvantageous for flattening the non-conductive reflecting film 91 of the portion corresponding to the n-side branch electrode 78.
  • the electrodes 75 and 85 are patterned so as not to cover the branch electrodes 78 and 88.
  • the upper electrode 75 (n-side bonding pad) of the first electrode portion is patterned so as not to cover the branch electrode 88 (p-side branch electrode) of the second electrode portion, and the second electrode.
  • the negative upper electrode 85 (p-side bonding pad) is patterned so as not to cover the branch electrode 78 (n-side branch electrode) of the first electrode portion.
  • the upper electrodes 75 and 85 cover the openings 63 and 65, that is, the opening 63.
  • the upper electrodes 75 and 85 may be formed to be flat even when the upper rim A1 is formed to cover the upper rim A1.
  • the upper electrode 75 (n-side bonding pad) of the first electrode portion is formed to cover the lower electrode 56 (n-side ohmic contact pad) in an island form of the first electrode portion
  • the upper electrode ( 85 (p-side bonding pad) is formed to cover the lower electrode 52 (p-side ohmic contact pad) in the form of an island of the second electrode portion.
  • the ohmic contact pads 56 and 52 connected to the branch electrodes 78 and 88 are not symmetrical unlike the island-shaped ohmic contact pads due to the branch electrodes 78 and 88 extending to one side. Therefore, the portion where the branch electrodes 78 and 88 and the ohmic contact pads 56 and 52 are connected has a small height difference decrease unlike other portions of the upper rim A1 of the openings 63 and 65, and the openings 63 and 65 It may be formed to slightly protrude upward than the other portion of the upper rim (A1) of the).
  • the upper electrodes 75 and 85 may be flat. Therefore, in the present example, the upper electrodes 75 and 85 cover the ohmic contact pads 56 and 52, but do not cover a portion of the ohmic contact pads 56 and 52 connected to the branch electrodes 77 and 88.
  • an evacuation groove 87 is formed at an edge of the upper electrodes 75 and 85 so as to avoid a part of the ohmic contact pad connected to the branch electrodes 78 and 88.
  • the thickness of the upper electrodes 75, 85 is thick enough to neglect the protrusion or unevenness 99 of the upper rim A1 of the openings 63, 65 due to the branch electrodes 78, 88, exposure as described above. It may not be necessary to consider a configuration such as the groove 97. However, the thickness of the upper electrodes 75 and 85 may be limited, and when the upper electrodes 75 and 85 have irregularities due to the unevenness 99, the upper electrodes 75 and 85 may be formed on the upper electrodes 75 and 85. There is a possibility of failure, such as an electrical short with a structure (eg, a separate bonding pad on the insulating layer; see 105 in FIG. 80).
  • a structure eg, a separate bonding pad on the insulating layer; see 105 in FIG. 80.
  • a portion of the upper rim A1 of the openings 63 and 65 corresponding to the branch electrodes 78 and 88 forms concave-convex 99 convexly than other portions, thereby controlling the mask pattern and the etching condition to form another portion.
  • FIG. 79 is a view for explaining other examples of the electrode unit according to the present disclosure.
  • at least one of the first electrode unit and the second electrode unit of the semiconductor light emitting device is shown in FIG.
  • An upper surface of the 52 is exposed by the opening, and an electrical connection 82 may be formed in contact with an edge where the upper surface and the side of the lower electrode 52 meet.
  • the electrical connection 82 may contact only the edge of the upper surface of the lower electrodes 52, 56, 88, and 78, and may contact the part of the side surface.
  • the lower electrode 52 preferably contacts the electrical connection 82 with a sufficient area as an ohmic contact pad.
  • the cross-sectional area of the electrical connection 82 is increased, it may be a damage in terms of light absorption, it may be considered to configure the electrical connection 82 to cover the edge of the lower electrode 52 as in this example. In this case, the lower rim of the opening may contact the edge of the lower electrode 52.
  • the light absorption prevention film is omitted below the lower electrode 52. It is also possible to consider a configuration in which the light absorption prevention layer is omitted by comparing the benefits and disadvantages, such as the increase in brightness of the semiconductor light emitting device due to the addition of the light absorption prevention layer and the addition of a process due to the addition of the light absorption prevention layer.
  • the opening may have an inclined surface as well as an opening which appears to be straight because the inclination is very small as shown in FIG. 79 (b), and the opening is exposed around the lower electrode 52, and the electrical connection 82 is performed. ) Is in contact with the inner surface of the opening, the side surface and the upper surface of the current diffusion conductive film 60 and the lower electrode 52.
  • FIG 80 is a view for explaining another example of the electrode unit according to the present disclosure.
  • the semiconductor light emitting device includes an upper electrode 85 and a separate bonding pad 105.
  • An insulating layer or passivation layer 95 is included between the upper electrode 85 and the bonding pad 105.
  • the upper electrode 85 and the electrical connection 82 may be integrally formed, and the upper electrode 85 may extend on the nonconductive reflecting layer 91.
  • An opening may be formed in the passivation layer 95, and the upper electrode 85 and the bonding pad 105 are electrically connected through the opening.
  • an exposure groove is formed in a portion corresponding to the ohmic contact pad 52 connected to the branch electrode 88, or as shown in FIG. 80 (b), the passivation layer 95 is sufficient.
  • the bonding pad 105 may be formed to cover the ohmic contact pad 52 connected to the branch electrode 88 if the thickness is small and the influence of the unevenness is minimal.
  • FIG. 81 is a view illustrating an example of a semiconductor light emitting device according to the present disclosure
  • FIG. 82 is a view illustrating an example of a cross section taken along the line A-A of FIG. 81.
  • the semiconductor light emitting device includes a plurality of semiconductor layers 30, 40, 50, a light absorption prevention film 41, a current diffusion conductive film 60, a non-conductive reflecting film 91, a first electrode part and a second electrode part. Include. At least one of the first electrode portion and the second electrode portion may have a lower electrode, an upper electrode, and an electrical connection connecting them.
  • the first electrode part includes a first branch electrode 78 and a first ohmic contact pad 56 as the lower electrode, a first electrode 75 as the upper electrode, and the lower electrode and the upper electrode. First electrical connections 71 and 72 for connecting.
  • the second electrode part includes a second branch electrode 88 and a second ohmic contact pad 52 as a lower electrode, a second electrode 85 as an upper electrode, and connects the lower electrode and the upper electrode.
  • Second electrical connections 81 and 82 are provided.
  • the plurality of semiconductor layers 30, 40, and 50 may include a first semiconductor layer 30 having a first conductivity, a second semiconductor layer 50 having a second conductivity different from the first conductivity, and a first semiconductor layer 30. And an active layer 40 interposed between the second semiconductor layer 50 and generating light through recombination of electrons and holes, and is sequentially grown using a growth substrate.
  • the non-conductive reflective film 91 is provided on the plurality of semiconductor layers 30, 40, and 50 to reflect the light generated by the active layer 40 toward the growth substrate 10.
  • the first electrode 75 is provided on the nonconductive reflective film 91 and supplies one of electrons and holes to the first semiconductor layer 30.
  • the second electrode 85 is provided away from the first electrode 75 on the nonconductive reflective film 91, and supplies the other one of electrons and holes to the second semiconductor layer 50.
  • At least one of the edge 77 of the first electrode and the edge 87 of the second electrode across the plurality of semiconductor layers 30, 40, 50 is an edge of the plurality of semiconductor layers (eg, 31; see FIG. 83). Oblique lines are formed obliquely with respect to
  • the plurality of semiconductor layers 30, 40, and 50 have a rectangular shape when viewed in a plan view, and have a plurality of corners (for example, C1, C2, C3, C4, see FIG. 83).
  • a plurality of first diagonal directions eg, C1-C2 directions; see FIG. 83
  • Two corners eg, C1, C2; see FIG. 83) of the semiconductor layers 30, 40, and 50 of FIG.
  • the edge 77 of the first electrode and the edge 87 of the second electrode are parallel to each other, and are formed obliquely with respect to the edges 31 of the plurality of semiconductor layers connected to the corners C1 and C2.
  • the area of the 1st electrode 75 and the 2nd electrode 85 should be small from a viewpoint of a brightness improvement.
  • the area of the first electrode 75 and the second electrode 85 may be large. Therefore, in view of heat radiation, there is a limit to widening the gap between the edge 77 of the first electrode and the edge 87 of the second electrode.
  • the luminance is improved by forming the edge 77 of the first electrode and the edge 87 of the second electrode facing each other under such a limitation as described above at an angle, i.e., diagonally.
  • the edge 77 of the first electrode and the edge 87 of the second electrode are formed vertically or side by side with the edge 31 of the plurality of semiconductor layers (see FIG. 83 (a)).
  • the area between the edge 77 of the first electrode and the edge 87 of the second electrode can be formed without significantly affecting other conditions (eg, thermal conductivity) required for the semiconductor light emitting device. It can be wider. As a result, the light absorption loss by the first electrode 75 and the second electrode 85 is reduced to improve the brightness. This is further described below.
  • group III nitride semiconductor light emitting element will be described as an example.
  • the plurality of semiconductor layers 30, 40, and 50 may include a buffer layer 20 formed on the substrate 10, a first semiconductor layer 30 having a first conductivity (eg, Si-doped GaN), and a second different from the first conductivity.
  • a conductive second semiconductor layer 50 eg, Mg-doped GaN
  • an active layer interposed between the first semiconductor layer 30 and the second semiconductor layer 50 to generate light through recombination of electrons and holes ( 40; e.g., InGaN / (In) GaN multi-quantum well structure).
  • Each of the semiconductor layers 30, 40, and 50 may be formed in multiple layers, and the buffer layer 20 may be omitted.
  • the nonconductive reflecting film 91 reflects light from the active layer 40 toward the plurality of semiconductor layers 30, 40, and 50.
  • the nonconductive reflective film 91 is formed of a nonmetallic material to reduce light absorption by the metal reflective film.
  • the nonconductive reflecting film 91 includes, for example, a distributed Bragg reflector 91a, a dielectric film 91b, and a clad film 91f.
  • the dielectric film 91b or the clad film 91f may be omitted.
  • the distributed Bragg reflector 91a is nonconductive, the entire dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91f function as the nonconductive reflecting film 91.
  • the distribution Bragg reflector 91a reflects light from the active layer 40 toward the substrate 10 side.
  • the distribution Bragg reflector 91a is preferably formed of a light transmitting material (eg, SiO 2 / TiO 2) to prevent absorption of light.
  • the dielectric film 91b is positioned between the plurality of semiconductor layers 30, 40, and 50 and the distribution Bragg reflector 91a, and the dielectric film (for example, SiO 2 ) having a refractive index smaller than the effective refractive index of the Distribution Bragg reflector 91a. It may be made of.
  • the effective refractive index refers to the equivalent refractive index of light that can travel in a waveguide made of materials having different refractive indices.
  • the dielectric film 91b may also help reflection of light.
  • the clad film 91f is formed on the distributed Bragg reflector 91a, and the clad film 91f is also lower than the effective refractive index of the distributed Bragg reflector 91a (eg, Al 2 O 3, SiO 2, SiON, MgF, CaF). It can be made of).
  • the effective refractive index of the distributed Bragg reflector 91a eg, Al 2 O 3, SiO 2, SiON, MgF, CaF. It can be made of).
  • a large portion of light generated in the active layer 40 is reflected by the dielectric film 91b and the distributed Bragg reflector 91a toward the first semiconductor layer 30.
  • the relationship between the dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91f can be described in terms of an optical waveguide.
  • the optical waveguide is a structure that guides the light by using total reflection by surrounding the light propagation part with a material having a lower refractive index. From this point of view, when the distribution Bragg reflector 91a is viewed as the propagation section, the dielectric film 91b and the clad film 91f surround the propagation section and can be viewed as part of the optical waveguide.
  • the non-conductive reflecting film 91 is formed with a plurality of openings used as electrical connection passages.
  • the plurality of first semiconductor layer side openings 63 are formed to a portion of the non-conductive reflecting film 91, the second semiconductor layer 50, the active layer 40 and the first semiconductor layer 30.
  • the second semiconductor layer side opening 65 is formed through the non-conductive reflecting film 91.
  • the dielectric film 91b extends from between the current spreading conductive film 60 and the distributed Bragg reflector 91a to the inner surface of the first semiconductor layer side openings 63 and 65, so that the first electrical connection 71 is formed.
  • further first electrical connection 72 from second semiconductor layer 50, active layer 40 may be formed between the dielectric film 91b and the current spreading conductive film 60.
  • the light absorption prevention layer 41 may be formed corresponding to at least one of the second ohmic contact pad 52 and the second branch electrode 88, and may be omitted.
  • the p-side ohmic contact pad 52 (the second ohmic contact pad) and the p-side branch electrode 88 (the second branch electrode) are disposed between the second semiconductor layer 50 and the current diffusion conductive film 60.
  • a light absorption prevention film 41 or a current block layer is provided.
  • the semiconductor light emitting device includes a current diffusion conductive film 60 between the plurality of semiconductor layers 30, 40, 50 and the nonconductive reflecting film 91, for example, between the second semiconductor layer 50 and the dielectric film 91b. ).
  • the current spreading conductive layer 60 may be formed of a current spreading electrode (ITO, etc.), an ohmic metal layer (Cr, Ti, etc.), a reflective metal layer (Al, Ag, etc.), or a combination thereof.
  • the current diffusion conductive layer 60 is preferably made of a light transmissive conductive material (eg, ITO).
  • the first branch electrodes 78 and the first ohmic contact pads 56 are provided in the first semiconductor layer 30 which is etched and exposed, and the second branch electrodes 88 and the second ohmic contact pads 52 are provided with current. It is provided on the diffusion conductive film 60.
  • the first branch electrode 78 and the second branch electrode 88 extend in a second diagonal direction (eg, C3-C4 direction; see FIG. 83). The closer to two corners C1 and C2 in the first diagonal direction, the shorter the lengths of the first branch electrode 78 and the second branch electrode 88 are.
  • the plurality of n-side branch electrodes 78 are provided in the first semiconductor layer 30 that is etched and exposed, and the second electrode 85 is disposed under the first electrode 75. Stretched down. The shape and arrangement of the plurality of n-side branch electrodes 78 may be changed according to the shape, size, etc. of the semiconductor light emitting device.
  • the plurality of n-side ohmic contact pads 56 are arranged on an extension line of the n-side branch electrode 78 under the first electrode 75 in a direction away from the second electrode 85.
  • the n-side ohmic contact pad 56 may be made of the same material as the n-side branch electrode 78 and is interposed between the first semiconductor layer 30 and the additional first electrical connection 72 to improve electrical contact. do.
  • the first electrical connection 71 extends to a portion of the first semiconductor layer side opening 63 and is conductive with the n-side branch electrode 78.
  • An additional first electrical connection 72 extends to the remaining first semiconductor layer side opening 63 and is in electrical communication with the n-side ohmic contact pad 56.
  • a plurality of p-side branch electrodes 88 are provided between the current spreading conductive film 60 and the dielectric film 91b and are disposed below the second electrode 85 to form the first electrode 75. Stretched down.
  • the p-side branch electrode 88 is a second semiconductor layer 50 (eg, Mg-doped), which is a p-type semiconductor layer, which is less likely to spread current than the first semiconductor layer 30 (eg, Si-doped GaN), which is an n-type semiconductor layer. GaN) improves current spreading.
  • the shape and arrangement of the plurality of p-side branch electrodes 88 may be changed according to the shape, size, etc. of the semiconductor light emitting device.
  • the plurality of p-side ohmic contact pads 52 are arranged on an extension line of the p-side branch electrode 88 under the second electrode 85 in a direction away from the first electrode 75.
  • the p-side ohmic contact pad 52 is interposed between the current spreading conductive film 60 and the additional second electrical connection 82 to improve electrical contact.
  • the p-side ohmic contact pad 52 may be made of the same material as the p-side branch electrode 88.
  • the second electrical connection 81 extends to some of the second semiconductor layer side openings 65 and is conductive with the p-side branch electrode 88.
  • An additional second electrical connection 82 extends to the remaining second semiconductor layer side opening 65 and is in contact with the p-side ohmic contact pad 52.
  • the number, spacing and arrangement of the first semiconductor layer side opening 63 and the second semiconductor layer side opening 65 may be appropriately adjusted for the size of the semiconductor light emitting element, the current spreading and the uniform current supply, and the uniformity of the light emission. Can be.
  • the first electrode 75 and the second electrode 85 are formed apart from each other on the nonconductive reflecting film 91.
  • the first electrode 75 is electrically connected to the n-side branch electrode 78 and the n-side ohmic contact pad 56 through the first electrical connection 71 and the additional first electrical connection 72 to form the first semiconductor.
  • the electrons are supplied to the layer 30.
  • the second electrode 85 is electrically connected to the p-side branch electrode 88 and the p-side ohmic contact pad 52 through the second electrical connection 81 and the additional second electrical connection 82 to form the second semiconductor. Holes are supplied to the layer 50.
  • the edge 77 of the first electrode and the edge 87 of the second electrode cross each other on the non-conductive reflective film 91 and are formed obliquely at the edges 31 of the plurality of semiconductor layers. As described above, there are two corners in the first diagonal direction in the region between the edge 77 of the first electrode and the edge 87 of the second electrode.
  • 83 is a diagram schematically illustrating a semiconductor light emitting device according to a comparative example and a semiconductor light emitting device according to the present disclosure, and include a plurality of semiconductor layers 30, 40, 50, a first electrode 75, and a second electrode 85.
  • the p-side branch electrode 88 is shown briefly.
  • the semiconductor light emitting device of the comparative example shown in FIG. 83 (a) and the semiconductor light emitting device according to the present disclosure shown in FIG. 83 (b) have the same length of the width D1 and the length D2,
  • the spacing D3 between the edge 77 of the first electrode and the edge 87 of the second electrode is equal.
  • the plurality of semiconductor layers 30, 40, and 50 are observed in a plan view, so that the lengths of the diagonal layers (for example, the C1-C2 directions) are plural. It is longer than the length of one side edge 31 of the semiconductor layers 30, 40, and 50.
  • the area A2 between the edge 77 of the first electrode and the edge 87 of the second electrode is wider than the area A1. Therefore, the light absorption loss by the first electrode 75 and the second electrode 85 is further reduced in the semiconductor light emitting device according to the present example shown in FIG. 83 (b) than the semiconductor light emitting device of the comparative example shown in FIG. 83 (a). As a result, the brightness is improved.
  • the width D1, the length D2, and the spacing D3 are the same, the first electrode 75 and the second electrode in the semiconductor light emitting device shown in FIG. 83 (b) than the comparative example shown in FIG. 83 (a).
  • the area of 85 is slightly smaller.
  • branch electrodes may be symmetrically disposed at corners.
  • the end of the p-side branch electrode 88 is disposed at the corner C2, but the p-side branch electrode 88 is formed at the corner (C2). It is not arranged in the center of C2) but is biased to one side.
  • the p-side branch electrode 88 and the p-side ohmic contact pad 52 are formed at the second diagonal corners C3 and C4. And symmetrically arranged in the center of C4).
  • the extension of the branch electrodes in the diagonal direction is closely related to the diagonal formation of the edge 77 of the first electrode and the edge 87 of the second electrode as described above.
  • the formation of the diagonal lines of the edge 77 of the first electrode and the edge 87 of the second electrode is also advantageous in improving current density uniformity with respect to the arrangement of the branch electrodes.
  • 84 is a view illustrating a state before formation of the first electrode and the second electrode.
  • a buffer layer eg, AlN or GaN buffer layer
  • an undoped semiconductor layer eg, un-doped GaN
  • a first conductive material are formed on the substrate 10 (eg, Al 2 O 3 , Si, SiC).
  • the first semiconductor layer 30 eg Si-doped GaN
  • active layer 40 that generates light through recombination of electrons and holes (InGaN / (In) GaN multi-quantum well structure), a second conductivity different from the first conductivity
  • the second semiconductor layer 50 eg, Mg-doped GaN
  • the buffer layer 20 may be omitted, and each of the semiconductor layers 30, 40, and 50 may be formed in multiple layers.
  • the first semiconductor layer 30 and the second semiconductor layer 50 may be formed with opposite conductivity, but are not preferable in the case of a group III nitride semiconductor light emitting device.
  • the first semiconductor layer 30 to be provided with the n-side branch electrode 78 and the n-side ohmic contact pad 56 is exposed (for example, regions corresponding to 61 and 63).
  • the mesa etching process may be performed after the light absorption prevention layer 41 to be described later, or after the current diffusion conductive layer 60 is formed.
  • a light absorption prevention film 41 is formed on the second semiconductor layer 50.
  • the light absorption prevention layer 41 may be formed to correspond to at least one of the p-side branch electrode 88 and the p-side ohmic contact pad 52.
  • 82 and 84 in this example, the light absorption prevention film 41 is formed on the p-side branch electrode 88 and the p-side ohmic contact pad 52. It is also conceivable to omit the light absorption prevention film 41.
  • a current diffusion conductive film 60 is formed on the second semiconductor layer 50 so as to cover the light absorption prevention film 41.
  • the current spreading conductive layer 60 may be formed of a light transmissive conductor (eg, ITO) to reduce light absorption. Although the current spreading conductive film 60 may be omitted, it is generally provided for current spreading to the second semiconductor layer 50.
  • the p-side branch electrode 88 and the p-side ohmic contact pad 52 are formed on the current diffusion conductive film 60, and the n-side is formed on the first semiconductor layer 30 exposed together or in a separate process.
  • the branch electrode 78 and the n-side ohmic contact pad 56 are formed.
  • the p-side branch electrode 88, the p-side ohmic contact pad 52, the n-side branch electrode 78 and the n-side ohmic contact pad 56 may be formed of a plurality of layers. This is further described below.
  • the nonconductive reflecting film 91 is formed.
  • the dielectric film covers the current spreading conductive film 60 and the p-side branch electrode 88, the p-side ohmic contact pad 52, the n-side branch electrode 78, and the n-side ohmic contact pad 56.
  • 91b, distributed Bragg reflector 91a, and clad film 91f are formed.
  • the dielectric film 91b or the clad film 91f may be omitted.
  • the distributed Bragg reflector 91a is formed by stacking a pair of SiO 2 and TiO 2 a plurality of times, for example.
  • the distribution Bragg reflector 91a may be formed of a combination of a high refractive index material such as Ta 2 O 5 , HfO, ZrO, SiN, and a dielectric thin film (typically SiO 2 ) having a lower refractive index.
  • a high refractive index material such as Ta 2 O 5 , HfO, ZrO, SiN
  • a dielectric thin film typically SiO 2
  • an optimization process is performed in consideration of the incident angle and the reflectance according to the wavelength based on an optical thickness of 1/4 of the wavelength of the light emitted from the active layer 40. It is desirable, and not necessarily, that the thickness of each layer conform to the optical thickness of 1/4 of the wavelength.
  • the number of combinations is suitable for 4 to 20 pairs.
  • the effective refractive index of the distribution Bragg reflector 91a is larger than the refractive index of the dielectric film 91b for the reflection and guide of light.
  • distributed Bragg reflector (91a) is composed of SiO 2 / TiO 2, and a refractive index of 1.46 of SiO 2, because the refractive index of TiO 2 is 2.4, the effective refractive index of the distributed Bragg reflector has a value of between 1.46 and 2.4. Therefore, the dielectric film 91b may be made of SiO 2 , and the thickness thereof is appropriately 0.2um to 1.0um. Prior to the deposition of the distributed Bragg reflector 91a requiring precision, by forming the dielectric film 91b having a predetermined thickness, the distributed Bragg reflector 91a can be stably manufactured and can also help reflection of light. .
  • the clad film 91f may be made of a metal oxide such as Al 2 O 3 , a dielectric film 91b such as SiO 2 , SiON, MgF, CaF, or the like.
  • the clad film 91f may also be formed of SiO 2 having a refractive index of 1.46 smaller than the effective refractive index of the distribution Bragg reflector 91a.
  • the uppermost layer of the distribution Bragg reflector 91a composed of a plurality of pairs of SiO 2 / TiO 2 may be composed of an SiO 2 layer having a thickness of ⁇ / 4n
  • the clad film 91f is positioned below It is preferable to be thicker than [lambda] / 4n so as to be different from the uppermost layer of the reflector 91a.
  • the clad film 91f is too thick, not less than 3.0 um.
  • the maximum value of the thickness of the clad film 91f is formed to be within 1 ⁇ m to 3 ⁇ m. Will be suitable. However, in some cases, it is not impossible to form more than 3.0um.
  • Distribution Bragg when the distribution Bragg reflector 91a is in direct contact with a metal electrode eg, p-side branch electrode 88, n-side branch electrode 78, first electrode 75, and second electrode 85
  • a metal electrode eg, p-side branch electrode 88, n-side branch electrode 78, first electrode 75, and second electrode 85
  • a portion of the light traveling through the reflector 91a may be absorbed by the metal electrode. Therefore, by introducing the clad film 91f and the dielectric film 91b having a lower refractive index than the distribution Bragg reflector 91a as described above, the amount of light absorption can be greatly reduced.
  • the dielectric film 91b is omitted
  • it is not preferable from the viewpoint of the optical waveguide, but from the viewpoint of the overall technical idea of the present disclosure, it is composed of the distributed Bragg reflector 91a and the clad film 91f.
  • the distribution Bragg reflector 91a one may consider the case where the dielectric film 91b made of TiO 2 is used as the dielectric material.
  • the distribution Bragg reflector 91a is provided with the SiO 2 layer on the uppermost layer
  • the case where the clad film 91f is omitted may also be considered.
  • the dielectric film 91b, the distributed Bragg reflector 91a, and the clad film 91f serve as an optical waveguide as the nonconductive reflecting film 91, and preferably have a total thickness of 1 to 8 um.
  • the first electrode 75 and the second electrode 85 in which most of the light incident on the non-conductive reflective film 91 is reflected toward the first semiconductor layer 30, but part of the light is in contact with the non-conductive reflective film 91.
  • the area 77 between the edge 77 of the first electrode and the edge 87 of the second electrode is diagonally formed with respect to the edge 31 of the plurality of semiconductor layers. Increasingly, the light absorption loss by the first electrode 75 and the second electrode 85 is reduced and consequently the brightness is improved.
  • the non-conductive reflecting film 91 is formed, and then the first semiconductor layer side opening 63 and the second semiconductor layer side opening (not shown) are formed in the non-conductive reflecting film 91 through an etching process (for example, plasma etching). 65) (see FIGS. 81 and 85).
  • the first semiconductor layer side opening 63 and the second semiconductor layer side opening 65 do not exclude the form of opening to the side as well as to the upper side of the semiconductor light emitting element.
  • the first semiconductor layer side opening 63 and the second semiconductor layer side opening 65 have one end of the n-side branch electrode 78, one of the n-side ohmic contact pad 56, and the p-side branch electrode 88.
  • the side ends and the p-side ohmic contact pads 52 are respectively formed.
  • FIG. 856 (a) a portion of the upper surface of the p-side ohmic contact pad 52 is exposed as shown in FIG. 856 (b).
  • FIG. 856 (b) the height difference between the upper rim of the opening 65 and the upper surface of the non-conductive reflective film 91 as the etched exposed surface as shown in Fig. 856 (b) is reduced.
  • the periphery of the p-side ohmic contact pad 52 is exposed by the opening 65 as shown in FIG. 856 (c), and the inclined surface is formed on the non-conductive reflective film 91 due to the opening 65. .
  • the upper rims of the openings 63 and 65 and the upper surface of the non-conductive reflecting film 91 are preferably formed to be flatly connected.
  • an additional second electrical connection 82 and an upper surface and a side surface of the p-side ohmic contact pad 52 are formed in the second semiconductor layer side opening 65 while forming the second electrode 85, Or it is formed to surround the upper surface and the side of the p-side ohmic contact pad 52.
  • the contact surface increases, resulting in a stable electrical connection. Since the formation process of the 1st semiconductor layer side opening 63 is similar to the above description, it abbreviate
  • 86 is a view for explaining an example of the layer structure of the lower electrode.
  • the lower electrode e.g. 56,78,52 due to the process of forming the opening (e.g. 63,65)
  • a process for removing a material adverse to electrical conduction formed on the upper surface of the head 88 may be added.
  • the halogen gas including an F as an etch gas for a plurality of openings (63,65) formed for example: CF 4, C 2 F 6 , C 3 F 8, SF 6 , etc.
  • the opening forming process when the opening forming process is performed without the p-side branch electrode 88, the n-side branch electrode 78, the p-side ohmic contact pad 52 and the n-side ohmic contact pad 56, a current is generated.
  • the surface of the diffusion conductive layer 60 and the surface of the first semiconductor layer 30 may be roughened, and thus may be disadvantageous to electrical contact.
  • the p-side branch electrode 88, the n-side branch electrode 78, the p-side ohmic contact pad 52 and the n-side ohmic contact pad 56 are currents as metal pads for interconnection to prevent such a poor electrical contact.
  • the contact resistance of the diffusion conductive film 60 and the first semiconductor layer 30 is reduced and the electrical connections 71, 72, 81, and 82 are more stably provided.
  • the current diffusion conductive film 60 and the first semiconductor layer 30 are more stable. ) And make an interconnection.
  • the p-side branch electrode 88, the n-side branch electrode 78, the p-side ohmic contact pad 52 and the n-side ohmic contact pad 56 may include a plurality of layers as shown in FIG. 86. .
  • each of these includes a contact layer 51 in contact with the current diffusion conductive film 60 or the first semiconductor layer 30, and an antioxidant layer 58 and an antioxidant layer 58 formed on the contact layer 51.
  • An etch stop layer 59 is formed thereon.
  • the contact layer 51 materials such as Cr and Ti are mainly used. Ni, TiW, and the like may be used, and Al and Ag having good reflectance may be used.
  • the reflective layer 53 may be made of a metal having excellent reflectance (eg, Ag, Al, or a combination thereof). The reflective layer 53 reflects the light generated by the active layer 40 toward the plurality of semiconductor layers 30, 40, and 50. The reflective layer 53 may be omitted.
  • the diffusion barrier layer 57 prevents the material constituting the reflective layer 53 or the material constituting the antioxidant layer 58 from diffusing to another layer.
  • the diffusion barrier layer 57 may be formed of at least one selected from Ti, Ni, Cr, W, TiW, and the like, and when a high reflectance is required, Al, Ag, or the like may be used.
  • the anti-oxidation layer 58 may be made of Au, Pt, or the like, and may be any material as long as it is exposed to the outside and does not oxidize well in contact with oxygen.
  • Au having good electrical conductivity is mainly used.
  • the etch stop layer 59 is a layer exposed to the non-conductive reflective film 91 in the dry etching process for forming the first semiconductor layer side opening 63 and the second semiconductor layer side opening 65.
  • Au the bonding strength with the non-conductive reflecting film 91 is weak, but also part of Au may be damaged or damaged during etching. Therefore, when the etch stop layer 59 is made of a material such as Ni, W, TiW, Cr, Pd, Mo, etc. instead of Au, the bonding strength with the non-conductive reflecting film 91 can be maintained, thereby improving reliability.
  • the etch stop layer 59 protects the p-side branch electrode 88, the p-side ohmic contact pad 52, the n-side branch electrode 78, and the n-side ohmic contact pad 56. Damage to the antioxidant layer 58 is prevented.
  • an etching gas may form a material that is disadvantageous to electrical conduction such as an insulating material or an impurity in the upper layer of the electrode. This material is removed by a wet etching process following the etching process for forming the openings, exposing the antioxidant layer 58 corresponding to the openings 63, 65. The material is etched away with the etch stop layer 59.
  • the material is removed to electrically connect the p-side branch electrodes 88, the p-side ohmic contact pads 52, the n-side branch electrodes 78, and the n-side ohmic contact pads 56.
  • the electrical contact between the electrodes 82 is improved, and the electrical characteristics of the semiconductor light emitting element are prevented from being lowered.
  • the p-side branch electrode 88 and the p-side ohmic contact pad 52 are sequentially stacked Cr (contact layer) / Al (reflection layer) / Ni (diffusion prevention layer) / Au (antioxidation layer) / Cr (etching). Prevention layer).
  • Cr contact layer
  • Al reflection layer
  • Ni diffusion prevention layer
  • Au antioxidation layer
  • Cr etching. Prevention layer
  • a portion corresponding to the second semiconductor layer side opening 65 is removed from the etch stop layer 59 to prevent electrical property deterioration.
  • n-side branch electrode 78 and the n-side ohmic contact pad 52 may also have the same layer structure as the p-side branch electrode 88.
  • Al bursting may occur. In this case, Al / Ni may be repeatedly stacked to prevent bursting.
  • the first electrode 75 and the second electrode 85 may be deposited on the non-conductive reflecting film 91 using sputtering equipment, E-beam equipment, or the like. .
  • electrical connections 71, 72, 81, and 82 are formed together in the openings 63 and 65.
  • the first electrode 75 and the second electrode 85 may be electrically connected to an electrode provided outside (package, COB, submount, etc.) by a method such as stud bump, conductive paste, and eutectic bonding. In the case of eutectic bonding, it is important that the height difference between the first electrode 75 and the second electrode 85 is not large.
  • the height difference of the upper rim of the opening is reduced in the above-described opening forming process, thereby reducing the unevenness, thereby obtaining an advantageous structure for the eutectic bonding.
  • the uppermost portions of the first electrode 75 and the second electrode 85 are eutectic bonding such as Au / Sn alloy and Au / Sn / Cu alloy. It can be formed of a material. As another example, it is also possible to form separate bonding pads on the first electrode 75 and the second electrode 85.
  • FIG. 87 is a view showing another example of a semiconductor light emitting device according to the present disclosure, in which a further p-side branch extending from a second electrical connection 81 adjacent to a first diagonal corner toward an adjacent corner to improve current uniformity.
  • An electrode 86 (third branch electrode) is added, and the length of the n-side branch electrode 78 adjacent to the corner is shorter. The description of the same code is omitted.
  • Symmetrical electrode placement at the corners is desirable to improve current spreading or uniformity of current density.
  • the end of the p-side branch electrode 88 is disposed at the corner, but the p-side branch electrode 88 is not disposed at the center of the corner. It is biased to one side.
  • the p-side branch electrode 88 and the p-side ohmic contact pad 52 are symmetrically disposed at the center of the corner in the second diagonal direction.
  • the additional branch electrodes 86 improve current spreading and uniformity at corners in the first diagonal direction.
  • FIG. 88 is a diagram illustrating other examples of the semiconductor light emitting device according to the present disclosure.
  • the edge 77 of the first electrode and the edge 87 of the second electrode are formed obliquely with respect to the edge of the semiconductor light emitting element.
  • FIG. 88 (a) an embodiment in which no corner is provided in an area between the edge 77 of the first electrode and the edge 87 of the second electrode is also possible.
  • FIG. 88 (b) an embodiment in which one corner is provided in an area between the edge 77 of the first electrode and the edge 87 of the second electrode is also possible.
  • a corner is not provided in the region between the edge 77 of the first electrode and the edge 87 of the second electrode shown in FIG. 88 (c), and the area of the first electrode 75 and the second electrode 85 is shown. It is also possible to vary the embodiment.
  • edges 77 of the first electrode 75 and the edges 87 of the second electrode may be divided into edges 31 of the plurality of semiconductor layers, regardless of the shape and area of the first electrode 75 and the second electrode 85.
  • an oblique line can improve luminance as compared to an example in which the edge 77 of the first electrode and the edge 87 of the second electrode are formed vertically or side by side with the edge 31 of the plurality of semiconductor layers. .
  • a semiconductor light emitting device comprising: a first semiconductor layer having a first conductivity, a second semiconductor layer having a second conductivity different from the first conductivity, and interposed between the first semiconductor layer and the second semiconductor layer and having electrons and holes
  • a second electrode part in electrical communication with the second semiconductor layer and supplying the other one of electrons and holes;
  • a non-conductive reflective film formed on the plurality of semiconductor layers to reflect the light generated from the active layer toward the growth substrate, and having an opening, wherein at least one of the first electrode portion and the second electrode portion includes: at least a portion by the opening A lower electrode to which is exposed; An upper electrode provided on the non-conductive reflecting film; And an electrical connection penetrating through the opening and in contact with the lower electrode, the electrical connection being in electrical communication
  • the opening extends to a portion of the second semiconductor layer, the active layer and the first semiconductor layer, and the lower electrode is in contact with the first semiconductor layer and the electrical connection exposed to the opening, respectively.
  • the lower electrode includes: a contact layer for reducing resistance of electrical communication with the plurality of semiconductor layers; A reflective layer provided on the contact layer; A diffusion barrier layer provided on the reflective layer; An antioxidant layer provided on the diffusion barrier layer; And an etch stop layer provided on the antioxidant layer, wherein the etch stop layer corresponding to the opening is removed so that the electrical connection is in contact with the antioxidant layer.
  • the nonconductive reflecting film includes a distributed Bragg reflector for reflecting light from the active layer.
  • a semiconductor light emitting device characterized in that the uppermost layer of the upper electrode is made of a material for eutectic bonding.
  • the lower electrode includes: a branch electrode extending over the plurality of semiconductor layers; And an ohmic contact pad in the form of an island; A semiconductor light emitting device comprising at least one of.
  • a semiconductor light emitting element characterized in that the surface of the nonconductive reflecting film formed by the opening is inclined.
  • the upper electrode includes: a solder layer containing tin (Sn) as the uppermost layer.
  • the upper electrode includes: a solder layer containing tin (Sn); And an anti-oxidation layer formed on at least one of Au and Pt on the soldering layer.
  • solder layer has a thickness of 5000 kPa or more, and the anti-oxidation layer has a thickness of 1000 kPa or less.
  • the upper electrode includes: a crack preventing layer having a first coefficient of thermal expansion so as to prevent cracking of the semiconductor light emitting device during bonding; And a burst prevention layer provided on the crack prevention layer and having a second thermal expansion coefficient greater than the first thermal expansion coefficient to prevent the crack of the crack prevention layer from bursting.
  • the non-conductive reflecting film includes a distributed Bragg reflector that reflects light from the active layer, and the current spreading conductive film includes an unevenness that reduces the interference between the light generated in the active layer and the light reflected by the distributed Bragg reflector.
  • a semiconductor light emitting device characterized in that it is formed to be distinguished from the plurality of semiconductor layers.
  • a semiconductor light emitting element wherein the lower electrode is partially exposed by the opening, and the non-conductive reflecting film is formed to rise to the edge of the lower electrode.
  • a semiconductor light emitting device characterized in that the lower electrode has an upper surface and a side surface, the periphery of the lower electrode is exposed by the opening, and the electrical connection surrounds the upper surface and the side surface of the lower electrode.
  • a semiconductor light emitting element characterized in that an exposed surface having a reduced height difference due to etching when forming the opening forms an upper rim of the opening.
  • a semiconductor light emitting element wherein an upper rim of the opening protrudes upward from an upper surface of the nonconductive reflecting film.
  • the lower electrode has an ohmic contact pad at least partially exposed by the opening and a branch electrode extending from the ohmic contact pad, the upper electrode covering the electrical connection, the portion of the ohmic contact pad being connected to the branch electrode and A semiconductor light emitting device, characterized in that it is patterned so as not to cover the branch electrode.
  • a bonding pad separate from the upper electrode; And an insulating layer between the bonding pad and the upper electrode, wherein the bonding pad and the upper electrode are in electrical communication with each other through an opening formed in the insulating layer.
  • a semiconductor light emitting device comprising: a first semiconductor layer having a first conductivity, a second semiconductor layer having a second conductivity different from the first conductivity, and interposed between the first semiconductor layer and the second semiconductor layer and having electrons and holes A plurality of semiconductor layers having an active layer for generating light through the recombination of; A plurality of semiconductor layers sequentially grown using a growth substrate; A non-conductive reflecting film provided on the plurality of semiconductor layers to reflect light generated in the active layer toward the growth substrate; A first electrode provided on the nonconductive reflecting film and supplying one of electrons and holes to the first semiconductor layer; And a second electrode provided to be separated from the first electrode on the non-conductive reflecting film and supplying the other one of electrons and holes to the second semiconductor layer, wherein the edges of the first electrode and the first electrode crossing the plurality of semiconductor layers are included. And at least one of the edges of the two electrodes is oblique to the edges of the plurality of semiconductor layers.
  • the plurality of semiconductor layers have a plurality of corners when viewed in a plan view, and two corners in diagonal directions are provided in an area between the edges of the first electrode and the second electrode facing each other.
  • a semiconductor light emitting device characterized in that.
  • a semiconductor light emitting element characterized in that the plurality of semiconductor layers have a rectangular shape when viewed in a plan view.
  • a semiconductor light emitting element characterized in that the edge of the first electrode and the edge of the second electrode are parallel to each other and formed obliquely with respect to the edges of the plurality of semiconductor layers.
  • a plurality of semiconductor layers have a plurality of corners when viewed in a plan view, and at least one corner is provided in the region between the edge of the first electrode and the edge of the second electrode.
  • Light emitting element
  • a plurality of semiconductor layers have a plurality of corners (corners) when viewed in a plan view, and the semiconductor light emitting element is characterized in that no corner is provided in the region between the edge of the first electrode and the edge of the second electrode .
  • a nonconductive reflecting film includes: a distributed Bragg reflector.
  • a first branch electrode provided in the second semiconductor layer and the first semiconductor layer where the active layer is etched and exposed and extending from the bottom of the first electrode to the bottom of the second electrode; And a first electrical connection penetrating the non-conductive reflective film to electrically connect the first electrode and the first branch electrode.
  • a second branch electrode provided between the second semiconductor layer and the nonconductive reflecting film and extending from the bottom of the second electrode to the bottom of the first electrode; And a second electrical connection penetrating the non-conductive reflective film to electrically connect the second electrode and the second branch electrode.
  • a first branch electrode provided in the second semiconductor layer and the first semiconductor layer to which the active layer is etched and extending from the lower portion of the first electrode to the lower portion of the second electrode; A first electrical connection penetrating the non-conductive reflective film to electrically connect the first electrode and the first branch electrode; A second branch electrode provided between the second semiconductor layer and the nonconductive reflecting film and extending from the bottom of the second electrode to the bottom of the first electrode; And a second electrical connection penetrating the non-conductive reflecting film to electrically connect the second electrode and the second branch electrode.
  • the plurality of semiconductor layers may have a quadrangular shape when viewed in a plan view and face each other. Two corners facing each other in the first diagonal direction are provided in an area between the edge of the electrode and the edge of the second electrode, and the first branch electrode and the second branch electrode extend in the second diagonal direction. .
  • a first ohmic contact pad having an island shape provided in the first semiconductor layer away from the first branch electrode at a lower portion of the first electrode; An island-shaped second ohmic contact pad provided in the second semiconductor layer away from the second branch electrode at a lower portion of the second electrode; An additional first electrical connection through the non-conductive reflective film to electrically connect the first ohmic contact pad and the first electrode; And an additional second electrical connection penetrating the non-conductive reflective film to electrically connect the second ohmic contact pad and the second electrode.
  • a light absorption prevention film (41) provided between at least one of the second branch electrode and the second semiconductor layer and between the second ohmic contact pad and the second semiconductor layer.
  • a semiconductor comprising a plurality of first branch electrodes and a plurality of second branch electrodes, wherein the closer to two corners in the first diagonal direction, the shorter the length of the first branch electrode and the second branch electrode is.
  • Light emitting element
  • the opening may be formed by dry etching or wet etching, or a combination of both.
  • the second etching process may be performed as a dry etching process for removing material, or may include both a wet etching process and a dry etching process.
  • the forming of the electrode may include: forming a contact layer electrically connected to the plurality of semiconductor layers; And forming an etch stop layer formed on the contact layer and exposed to the opening by the first etching process.
  • a semiconductor characterized in that the etching prevention layer corresponding to the opening is exposed by the dry etching process, which is the first etching process, and the etching prevention layer corresponding to the opening is removed together with the material by the second etching process, which is the wet etching process.
  • a etch stop layer corresponding to the opening is exposed by the wet etch process as the first etch process, and the etch stop layer corresponding to the opening is removed by the second etch process as the wet etch process. Manufacturing method.
  • forming the electrode includes: forming a reflective layer on the contact layer before forming the etch stop layer; Forming a diffusion barrier layer on the reflective layer; And forming an oxide layer on the diffusion barrier layer, wherein the etch barrier layer is formed on the oxide layer.
  • the first etching process is a dry etching process
  • the etching gas includes a halogen gas containing an F group
  • the antioxidant layer is formed of at least one of Au, Pt
  • the etching prevention layer is Cr, Ni, W, TiW, Pd
  • Method for manufacturing a semiconductor light emitting device characterized in that formed in at least one of Mo.
  • (41) A method of manufacturing a semiconductor light emitting element, wherein the reflective layer and the diffusion barrier layer are alternately laminated a plurality of times.
  • Forming the non-conductive film includes: forming a dielectric film on the opposite side of the plurality of semiconductor layers relative to the electrode; And forming a distributed Bragg reflector on an opposite side of the plurality of semiconductor layers with respect to the electrode; Method for manufacturing a semiconductor light emitting device, characterized in that it comprises at least one process.
  • the method of manufacturing a semiconductor light emitting device includes adding a conductive reflective film separately from the non-conductive film.
  • the forming of the electrode includes: forming a contact layer on the current spreading conductive film; Forming a reflective layer on the contact layer; Forming a diffusion barrier layer on the reflective layer; Forming an antioxidant layer on the diffusion barrier layer; And forming an etch stop layer on the antioxidant layer, wherein the step of forming the non-conductive film includes: forming a dielectric film using SiO 2 to cover the electrode; And the process of the distributed Bragg reflector comprising the TiO 2 / SiO 2 layer on the dielectric film is formed; comprises, first, and the exposed etch stop layer corresponding to the opening by the first etching process, a dry etching process, a wet etching process of claim 2 is a method of manufacturing a semiconductor light
  • a plurality of semiconductor layers having active layers to generate;
  • An electrode electrically connected to the first semiconductor layer or the second semiconductor layer, the electrode including a contact layer formed on the first semiconductor layer or the second semiconductor layer, an antioxidant layer formed on the contact layer, and an etch stop layer formed on the antioxidant layer.
  • electrode A non-conductive film covering the electrode and positioned to face the plurality of semiconductor layers and reflecting light from the active layer, the non-conductive film having an opening for an electrical connection passage with the electrode; And an electrical connection in contact with the electrode through the opening.
  • the semiconductor light emitting device and the method of manufacturing the same according to the present disclosure may be applied to both a vertical semiconductor light emitting device, a lateral chip, a flip chip, and the like.
  • a semiconductor light emitting device characterized in that the etch stop layer corresponding to the opening is removed and the electrical connection is in contact with the exposed antioxidant layer with the etch stop layer removed.
  • a non-conductive film includes: a distributed Bragg reflector comprising a TiO 2 / SiO 2 layer.
  • a semiconductor light emitting device characterized in that the antioxidant layer is formed of at least one of Au and Pt.
  • the etch stop layer is a semiconductor light emitting device, characterized in that formed of at least one of Cr, Ni, W, TiW, Pd, Mo.
  • a reflective layer formed of at least one of Ag and Al between the contact layer and the antioxidant layer; And a diffusion barrier layer formed between at least one of Ti, Ni, Cr, W, and TiW between the reflective layer and the antioxidant layer.
  • a distributed Bragg reflector for reflecting light from an active layer comprising: a distributed Bragg reflector having a first opening, the distributed Bragg reflector having an inclined surface of the distributed Bragg reflector formed by the first opening;
  • a second electrode electrically connected to the plurality of semiconductor layers through the first opening to supply the other one of electrons and holes to the second semiconductor layer.
  • a semiconductor light emitting device comprising at least one of.
  • a semiconductor light emitting element comprising inclination angles formed by a vertical line orthogonal to an upper surface of the distribution Bragg reflector and a surface of the Distribution Bragg reflector formed by the first opening are 25 degrees or more and 75 degrees or less.
  • the inclined surface formed due to the first opening does not necessarily need to be a flat surface.
  • the shape of the inclined surface may be formed to be inclined in a curved surface or a step shape.
  • a semiconductor light emitting element wherein the first opening is inclined to reflect light guided into the distribution Bragg reflector by the dielectric film and the clad film to the plurality of semiconductor layers.
  • a reflective metal layer comprising both a dielectric film and a clad film, wherein the reflective metal layer is formed of a surface of the dielectric film formed by the first opening, a surface of the distribution Bragg reflector, and an Ag, Al, or an alloy thereof in contact with the surface of the clad film.
  • a semiconductor light emitting device characterized in that.
  • the distribution Bragg reflector has a second opening; wherein a surface of the Distribution Bragg reflector formed by the second opening is inclined, and the first electrode is electrically connected to the plurality of semiconductor layers through the second opening.
  • a semiconductor light emitting device characterized in that.
  • the first opening and the second opening need not necessarily be formed together.
  • the distribution Bragg reflector has a third opening, wherein a surface of the Distribution Bragg reflector formed by the third opening is inclined, and the third opening is not covered by the first electrode and the second electrode.
  • Semiconductor light emitting device
  • a dielectric film positioned between the plurality of semiconductor layers and the distributed Bragg reflector, the refractive index being less than the effective refractive index of the Distributed Bragg reflector and penetrated by the first opening; And a clad film positioned on an opposite side of the plurality of semiconductor layers on the basis of the distribution Bragg reflector, the refractive index being smaller than the effective refractive index of the Distribution Bragg reflector, and penetrated by the first opening. And a second opening of the penetrating cladding film, the distributed Bragg reflector and the dielectric film, wherein the first electrode and the second electrode are formed at substantially the same height on the cladding film.
  • a dielectric film positioned between the plurality of semiconductor layers and the distributed Bragg reflector, the refractive index being less than the effective refractive index of the Distributed Bragg reflector and penetrated by the first opening;
  • a clad film positioned on an opposite side of the plurality of semiconductor layers with respect to the distribution Bragg reflector, the refractive index being smaller than the effective refractive index of the Distribution Bragg reflector and penetrated by the first opening;
  • a translucent conductive film positioned between the plurality of semiconductor layers and the dielectric film and electrically connected to the second electrode filling the first opening, wherein the first opening is guided into the distribution Bragg reflector by the dielectric film and the clad film.
  • the distribution Bragg reflector has a second opening, the surface of the Distribution Bragg reflector formed by the second opening is inclined, and the first electrode is configured to A semiconductor light emitting device, characterized in that electrically connected with a plurality of semiconductor layers through.
  • (62) a third electrical connection electrically connected to the second semiconductor layer separately from the branch electrode through the second semiconductor layer side opening.
  • a semiconductor light emitting element characterized in that a plurality of branch electrodes extend below the first electrode and a plurality of first electrical connections are arranged between the plurality of branch electrodes.
  • a third electrical connection electrically connected to the second semiconductor layer separately from the branch electrode through the second semiconductor layer side opening, wherein the third electrical connection is second from the first electrode below the second electrode;
  • a semiconductor light emitting device characterized in that it is farther than the electrical connection.
  • a first connection electrode connecting a plurality of first electrical connections between the non-conductive reflecting film and the first electrode and electrically connected to the first electrode;
  • a second connection electrode connecting the plurality of second electrical connections to each other between the non-conductive reflective film and the second electrode, and electrically connected to the second electrode;
  • an insulating layer formed between at least one of the first connection electrode and the second electrode and between the second connection electrode and the first electrode.
  • a plurality of branch electrodes extend parallel to each other below the first electrode, the plurality of first electrical connections are arranged between the plurality of branch electrodes, and the first connection electrode and the second connection electrode
  • Each of the semiconductor light emitting device having a finger (finger) shape, arranged in a finger shape interposed between each other.
  • a lower electrode having a side surface and at least partially exposed by the opening;
  • An upper electrode provided on the non-conductive reflecting film;
  • an electrical connection in communication with the upper electrode, the electrical connection leading to an opening and contacting an upper surface of the lower electrode and covering an edge where the upper and side surfaces of the lower electrode meet.
  • a semiconductor light emitting element wherein the periphery of the lower electrode is exposed by the opening, and the electrical connection surrounds the top and side surfaces of the lower electrode.
  • a semiconductor light emitting element characterized in that the lower rim of the opening is in contact with the edge of the lower electrode.
  • a non-conductive reflecting film includes: a distributed Bragg reflector.
  • a semiconductor light emitting element characterized in that the vertical thickness from the upper rim of the opening to the upper surface of the lower electrode is 0 .--- times the thickness of the nonconductive reflecting film outside the lower electrode.
  • the opening is formed up to a part of the second semiconductor layer, the active layer and the first semiconductor layer, the lower electrode is a semiconductor light emitting element, characterized in that the contact between them respectively between the first semiconductor layer and the electrical connection.
  • the lower electrode includes: an ohmic contact pad corresponding to the opening; And a branch electrode extending from the ohmic contact pad, wherein a portion on the branch electrode of the upper rim of the opening protrudes upwardly from another portion of the upper rim.
  • the bottom electrode includes a contact layer for reducing the resistance of electrical contact; A reflective layer provided on the contact layer; A diffusion barrier layer provided on the reflective layer; An antioxidant layer provided on the diffusion ring layer; And an etch stop layer provided on the antioxidant layer.
  • a semiconductor light emitting device wherein the uppermost layer of the upper electrode is made of a eutectic bonding material.
  • a semiconductor light emitting element characterized in that the upper electrode covers the electrical connection on the ohmic contact pad, but is patterned to avoid the portion of the ohmic contact pad that is connected to the branch electrode and the branch electrode.
  • the lower electrode has an ohmic contact pad in the form of an island, the upper electrode covers the ohmic contact pad in the form of an island, and the upper electrode on the first electrode portion side covers the ohmic contact pad in the form of an first electrode in the form of an island, and a second And the upper electrode of the second electrode portion is patterned so as not to cover the branch electrodes of the electrode portion, and the ohmic contact pads of the second electrode portion of the island shape are patterned and do not cover the branch electrodes of the first electrode portion.
  • a semiconductor light emitting device comprising: a first semiconductor layer having a first conductivity, a second semiconductor layer having a second conductivity different from the first conductivity, and interposed between the first semiconductor layer and the second semiconductor layer and having electrons and holes A plurality of semiconductor layers having an active layer for generating light through the recombination of; A plurality of semiconductor layers sequentially grown using a growth substrate; A first electrode portion in electrical communication with the first semiconductor layer; A second electrode portion in electrical communication with the second semiconductor layer; And a non-conductive reflective film formed on the plurality of semiconductor layers to reflect the light generated from the active layer toward the growth substrate, wherein the non-conductive reflecting film has an opening formed thereon, the non-conductive reflecting film having an exposed surface etched to reduce the height difference to form an upper rim of the opening.
  • At least one of the first electrode portion and the second electrode portion includes: a lower electrode at least partially exposed by the opening; An electrical connection formed in the opening and in contact with the lower electrode; And an upper electrode provided on the non-conductive reflecting film to be in electrical communication with the electrical connection.
  • the lower electrode has an ohmic contact pad at least partially exposed by the opening and a branch electrode extending from the ohmic contact pad, the upper electrode covering the electrical connection, the portion of the ohmic contact pad being connected to the branch electrode and A semiconductor light emitting device, characterized in that it is patterned so as not to cover the branch electrode.
  • a semiconductor light emitting device characterized in that the lower electrode has an ohmic contact pad in the form of an island, and the upper electrode completely covers the ohmic contact pad in the form of an island.
  • the lower electrode includes a branch electrode, wherein the upper electrode of the first electrode portion and the upper electrode of the second electrode portion are separated from the non-conductive reflective film, and the upper electrode of the first electrode portion is an island-shaped ohmic contact pad of the first electrode portion.
  • the second electrode portion is patterned so as not to cover the branch electrode, and the upper electrode of the second electrode portion covers the island-shaped ohmic contact pad of the second electrode portion, and is patterned so as not to cover the branch electrode of the first electrode portion.
  • a semiconductor light emitting device is patterned so as not to cover the branch electrode, and the upper electrode of the second electrode portion covers the island-shaped ohmic contact pad of the second electrode portion, and is patterned so as not to cover the branch electrode of the first electrode portion.
  • a semiconductor light emitting element characterized in that the branch electrode side portion of the upper rim of the opening protrudes above the ohmic contact pad side of the upper rim.
  • a semiconductor light emitting device characterized in that a groove is formed at an edge of the upper electrode to expose a portion of the ohmic contact pad connected to the branch electrode.
  • a semiconductor light emitting device characterized in that the upper electrode is formed so as not to cover a portion of the ohmic contact pad that is connected to the branch electrode.
  • a semiconductor light emitting element characterized in that an upper rim of an opening corresponding to an island-shaped ohmic contact pad is flatly connected to an upper surface of a non-conductive reflecting film.
  • a semiconductor light emitting element characterized in that the periphery of the ohmic contact pad is exposed by the opening and the electrical connection is in contact with the top and side surfaces of the ohmic contact pad.
  • a semiconductor light emitting device characterized in that the uppermost layer of the upper electrode is made of a eutectic bonding material.
  • a semiconductor light emitting element characterized in that the electrical connection extends from the opening to the top surface of the nonconductive reflecting film along the upper rim of the opening, and the upper electrode is provided over the electrical connection extending to the top surface of the nonconductive reflecting film.
  • the lower electrode includes an island-shaped ohmic contact pad and a branch electrode extending from the ohmic contact pad, and the upper electrode of the first electrode portion covers the ohmic contact pad of the island-shaped first electrode portion, and the branch electrode of the second electrode portion. And the upper electrode of the second electrode portion covers the ohmic contact pads of the island-shaped second electrode portion, and is patterned so as not to cover the branch electrodes of the first electrode portion.
  • 106 a bonding pad separate from the top electrode; And an insulating layer between the bonding pad and the upper electrode, wherein the bonding pad and the upper electrode are in electrical communication with each other through an opening formed in the insulating layer.
  • the electrode part includes the lower electrode, the contact resistance can be reduced.
  • the electrical connection between the current spreading conductive film and the first semiconductor layer and the electrical connection by the electrical connection surrounding the upper surface and at least the edge of the lower electrode is good, and the stable inter Provide a connection structure.
  • the present disclosure by forming an opening that exposes the periphery of the lower electrode, it is possible to significantly reduce the step or height difference of the upper rim of the opening and significantly reduce the unevenness of the non-conductive reflective film. .
  • the upper electrode can be formed flat, which helps in the eutectic bonding.
  • the light of the first electrode and the second electrode is formed by forming the edges of the first electrode and the second electrode facing each other in an oblique diagonal form with respect to the edges of the plurality of semiconductor layers. The absorption is reduced and the brightness is improved.
  • the light absorption loss caused by the metal reflective film is reduced by using the non-conductive reflective film.
  • a material is removed on a surface of an electrode formed in a dry etching process by a subsequent etching process, thereby preventing deterioration of electrical characteristics of the semiconductor light emitting device.
  • a semiconductor light emitting device in the manufacture of a semiconductor light emitting device such as flip chip type, vertical structure, horizontal structure, etc.
  • a material that may be formed is removed by a second etching process to prevent degradation of electrical characteristics of the semiconductor light emitting device.
  • a current diffusion path can be sufficiently secured by electrical connection through an opening.
  • a semiconductor light emitting device having an electrode having good bonding force with a non-conductive reflective film and making good electrical contact with an electrical connection.
  • the brightness is improved by guiding a part of the light toward the side from the inside of the semiconductor light emitting device to the substrate side or the vertical direction of the semiconductor light emitting device.
  • the brightness is improved without additional process or addition of other components.
  • the present disclosure it is possible to reduce the light absorption loss by the n-side branch electrode by not having an n-side branch electrode connecting the first electrical connections to each other.
  • reduction of the light emitting surface is prevented by omitting the n-side branch electrode.
  • the p-side branch electrode is connected to only the second electrical connection, and the third electrical connection is electrically connected to the second semiconductor layer separately from the p-side branch electrode. Therefore, the p-side branch electrode does not unnecessarily increase, so the light absorption loss is reduced.
  • the uniformity of current supply in the flip chip type semiconductor light emitting device is improved, and the light absorption by the metal reflective film is reduced because the non-conductive reflecting film is used.

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  • Engineering & Computer Science (AREA)
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  • Led Devices (AREA)

Abstract

La présente invention se rapporte à une diode électroluminescente à semi-conducteurs qui comprend : une pluralité de couches de semi-conducteur formées successivement au moyen d'un substrat de croissance; une première zone d'électrode qui est reliée électriquement à une première couche de semi-conducteur et fournit des électrons ou des trous d'électrons; une seconde zone d'électrode qui est reliée électriquement à une seconde couche de semi-conducteur et fournit le reste des électrons ou des trous d'électrons qui n'ont pas été fournis par la première zone d'électrode; et un film réfléchissant non conducteur comportant une ouverture, soit la première zone d'électrode, soit la seconde zone d'électrode comprenant une électrode inférieure dont une partie est exposée à travers l'ouverture, une électrode supérieure agencée sur le film réfléchissant non conducteur, et une connexion électrique qui vient en contact avec l'électrode inférieure par passage à travers l'ouverture et qui est reliée électriquement à l'électrode supérieure.
PCT/KR2014/009582 2013-10-11 2014-10-13 Diode électroluminescente à semi-conducteurs WO2015053595A1 (fr)

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CN201810324277.8A CN108389946B (zh) 2013-10-11 2014-10-13 半导体发光元件
US15/028,653 US9748446B2 (en) 2013-10-11 2014-10-13 Semiconductor light emitting device
CN201480056016.2A CN105637658B (zh) 2013-10-11 2014-10-13 半导体发光元件

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KR1020130121306A KR101549870B1 (ko) 2013-10-11 2013-10-11 반도체 발광소자
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KR1020130161297A KR101591966B1 (ko) 2013-12-23 2013-12-23 반도체 발광소자 및 이의 제조방법
KR10-2013-0161297 2013-12-23
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KR1020140014753A KR101578484B1 (ko) 2014-02-10 2014-02-10 반도체 발광소자
KR10-2014-0037938 2014-03-31
KR1020140037933 2014-03-31
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KR1020140037940A KR101561203B1 (ko) 2014-03-31 2014-03-31 반도체 발광소자
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US9748446B2 (en) 2017-08-29
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