WO2015011785A1 - はんだ付け装置及び真空はんだ付け方法 - Google Patents
はんだ付け装置及び真空はんだ付け方法 Download PDFInfo
- Publication number
- WO2015011785A1 WO2015011785A1 PCT/JP2013/069933 JP2013069933W WO2015011785A1 WO 2015011785 A1 WO2015011785 A1 WO 2015011785A1 JP 2013069933 W JP2013069933 W JP 2013069933W WO 2015011785 A1 WO2015011785 A1 WO 2015011785A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- chamber
- vacuum
- pressure
- workpiece
- vacuum pressure
- Prior art date
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/008—Soldering within a furnace
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3494—Heating methods for reflowing of solder
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/08—Treatments involving gases
- H05K2203/085—Using vacuum or low pressure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/16—Inspection; Monitoring; Aligning
- H05K2203/163—Monitoring a manufacturing process
Definitions
- the present invention has a function of defoaming and degassing voids from solder in a vacuum melted state when a component for surface mounting is placed on a predetermined position on a substrate and the component and the substrate are soldered.
- the present invention relates to a soldering apparatus and a vacuum soldering method applicable to a vacuum reflow furnace.
- voids bubbles generated in normal hot air (atmosphere) reflow processing have been regarded as problems, and there is a method of reducing the generation of voids. It is requested.
- FIGS. 13A and 13B are process diagrams showing an example of hot air reflow according to a conventional example.
- the cream solder 8 shown in FIG. 13A is applied on the pad electrode 4 of the substrate 5.
- the cream solder 8 is obtained by adding flux to solder powder so as to have an appropriate viscosity, and is applied on the pad electrode 4 of the substrate 5 by a screen printer through a mask. is there.
- FIGS. 13A and 13B a state in which cream solder 8 is applied onto the pad electrode 4 of the substrate 5 and hot air (atmosphere) reflow processing is performed without mounting electronic components will be schematically described with reference to FIGS. 13A and 13B.
- the solder 3 shown in FIG. 13B is in a state where the cream solder 8 shown in FIG. 13A is thermally reflowed and then the molten solder 7 is cooled into a spherical shape by surface tension and hardened.
- the white circle shape in the figure is the void 2 portion, which is generated involuntarily in the molten solder 7 and remains in the solder 3 after being cooled and solidified.
- the void 2 impairs the heat conduction effect in a power device or the like and causes exhaust heat to deteriorate.
- Patent Document 1 discloses a soldering device (vacuum reflow device) having a vacuum exhaust function.
- a soldering apparatus an exhaust valve, a vacuum pump, and a processing tank are provided.
- the substrate is carried into the processing tank, and the solder on the pad electrode of the substrate is in a molten state.
- the inside of the processing tank is driven and evacuated once. In such a vacuum state, voids remaining as bubbles in the solder during melting of the solder are removed by the defoaming effect.
- the chamber (processing tank) is in a vacuum state when performing the soldering process. At this time, a vacuum state is created by operating the vacuum pump.
- a vacuum processing time is set, and the vacuum pump is continuously operated only for the set vacuum processing time.
- the void is defoamed and degassed by evacuation, the degree of vacuum is continuously changed, so degassing and defoaming are performed rapidly.
- the void 2 in the molten solder 7 is defoamed and degassed, the void 2 gradually becomes larger as it is combined with other voids 2 as it is attracted to the solder surface. Largely gathered voids 2 break (explode), causing flux scattering and solder scattering.
- the soldering apparatus includes a chamber in which a workpiece can be soldered in a vacuum environment, an operation unit that inputs and sets a vacuum pressure in the chamber, and A pump that evacuates the chamber, a detection unit that detects the pressure in the chamber, and a vacuum that is set based on the pressure detection information that is set based on the pressure detection information in the chamber that is output from the detection unit And a control unit for holding the pressure for a predetermined time.
- a soldering apparatus is the soldering apparatus according to the first aspect, wherein one or a plurality of vacuum pressures are input and set by the operation unit.
- the soldering apparatus further comprising: a gas supply unit that supplies at least one of inert gas and active gas into the chamber according to claim 1, and the control unit. Is configured to adjust the inflow amount of the gas supplied from the gas supply unit into the chamber.
- the control unit holds the set vacuum pressure for a predetermined time based on pressure detection information in the chamber from the detection unit. Is controlled so as to be maintained at a predetermined number of revolutions, and the inflow amount of the gas into the chamber is controlled, so that the set vacuum pressure is maintained for a predetermined time.
- the gas is based on pressure detection information in the chamber from the detection unit.
- the amount of flow into the chamber is controlled to be constant and the rotation speed of the pump is controlled so that the set vacuum pressure is maintained for a predetermined time.
- a soldering apparatus includes the heating unit according to any one of the first to fifth aspects, wherein the work is heated to a predetermined temperature before the work is put into the chamber. It is a thing.
- the soldering device is the heating unit according to claim 6, wherein when the workpiece is put into the chamber, the workpiece heated to a predetermined temperature before being put into the chamber is held at the predetermined temperature. It is equipped with.
- the vacuum soldering method wherein a step of inputting and setting a vacuum pressure in a chamber capable of soldering a workpiece in a vacuum environment, and evacuating the chamber in which the vacuum pressure is set. A step of detecting a pressure in the chamber, a step of adjusting a vacuum pressure in the chamber based on pressure detection information in the chamber and a set vacuum pressure, and the set vacuum pressure A step of holding time, and a step of soldering in the chamber in which the vacuum pressure is adjusted.
- a soldering method is the method according to the eighth aspect, wherein one or more vacuum pressures in the chamber are input and set, and the vacuum pressure set for each of the input vacuum pressures is set for a predetermined time. Holding.
- a vacuum soldering method includes the step of heating the workpiece to a predetermined temperature before the workpiece is put into the chamber according to any one of the eighth or ninth aspects.
- a vacuum soldering method is the heating method according to the tenth aspect, in which when the work is put into the chamber, the work heated to a predetermined temperature before being put into the chamber is held at the predetermined temperature. It has a process.
- the vacuum pressure in the chamber is adjusted toward the vacuum pressure set based on the pressure detection information in the chamber and the set vacuum pressure is set for a predetermined time.
- a control unit for holding is provided.
- This configuration allows the inside of the chamber to be maintained at a specified vacuum pressure, so that the soldering process can be performed in the chamber in which the vacuum pressure is optimally adjusted.
- the melted solder void 2 that has reached the target pressure is gradually degassed and degassed by evacuation at a constant pressure, which makes it possible to prevent flux splashing, solder scattering, etc. It is possible to perform high-quality vacuum soldering with few voids.
- the vacuum processing time work / unit tact standby time, it is possible to reduce the pressure by designating the target vacuum pressure (hereinafter referred to as the target pressure) during the evacuation. Can be vacuum-soldered.
- the workpiece / unit tact standby time is a time at which the work is stopped at a place where the work is transported by the unit transport distance (pitch).
- FIG. 3 is a perspective view showing a configuration example of a chamber 40.
- FIG. It is process drawing of the cross section which shows the vacuum deaeration example (the 1) of the solder. It is process drawing of the cross section which shows the vacuum deaeration example (the 2) of the solder.
- 2 is a block diagram illustrating a configuration example of a control system of a vacuum reflow furnace 100.
- FIG. FIG. 6 is a cross-sectional view illustrating a configuration example of a conveyance unit 13. It is sectional drawing which shows the example of conveyance of the workpiece
- FIG. It is sectional drawing which shows the conveyance example (the 3) of the workpiece
- FIG. It is sectional drawing which shows the conveyance example (the 4) of the workpiece
- FIG. It is sectional drawing which shows the example of conveyance of the workpiece
- 4 is a graph showing an example of control of a chamber 40.
- FIG. 3 is a graph showing a temperature profile of the vacuum reflow furnace 100.
- FIG. 4 is a flowchart showing a control example (No. 1) of the vacuum reflow furnace 100.
- 4 is a flowchart showing a control example (No. 2) of the vacuum reflow furnace 100.
- the present invention solves such a problem, and allows the inside of the chamber to be maintained at a specified vacuum pressure for a predetermined time, and enables the soldering process to be performed in a chamber in which the vacuum pressure is optimally adjusted.
- An object of the present invention is to provide a soldering apparatus and a vacuum soldering method.
- a vacuum reflow furnace 100 shown in FIG. 1 constitutes an example of a soldering apparatus.
- a component for surface mounting such as a power device or power module mounting is placed on a predetermined position on a printed circuit board and the component is mounted.
- defoaming and degassing processes are performed in a vacuum.
- the objects of the soldering process are printed circuit boards, solder coated parts, other semiconductor wafers, and the like, hereinafter collectively referred to as a workpiece 1.
- the vacuum reflow furnace 100 has a main body 10.
- the main body 10 constitutes a muffle furnace.
- the main body 10 has a transport path 16 in an intermediate layer, and the main body 10 is divided into an upper muffle and a lower muffle (not shown) based on the transport path 16.
- a hinge mechanism is provided on the back side, the upper part of the muffle is opened, and the conveyance path 16 can be opened and inspected.
- a carry-in port 11 is provided on one side of the main body 10 and a carry-out port 12 is provided on the other side.
- a conveyance unit 13 is provided in the conveyance path 16 between the carry-in port 11 and the carry-out port 12.
- a walking beam type conveyance mechanism 70 (see FIGS. 5 to 8B) is provided. used. According to the transport mechanism 70, the workpiece 1 can be tact-fed at a predetermined transport speed.
- a preheating unit 20 In the main body 10, a preheating unit 20, a main heating unit 30, a chamber 40, and a cooling unit 50 are arranged in this order from the carry-in port 11, and the work 1 passes through these to reach the carry-out port 12 so as to be transported in a tact manner. Is done.
- the preheating unit 20 and the main heating unit 30 constitute an example of a heating unit, and the heating unit adopts a hot air circulation heating method.
- the preheating unit 20 has four preheating zones I to IV, and gradually heats the workpiece 1 to reach a predetermined temperature (eg, 260 ° C.) (about 150-160-170-180 ° C.). To be made.
- the preheating zones I to IV are arranged above and below the conveyance path 16.
- a main heating unit 30 is disposed at a position adjacent to the preheating unit 20, and the workpiece 1 is heated to about 260 ° C. before the workpiece 1 is put into the chamber 40.
- a chamber 40 is disposed at a position adjacent to the main heating unit 30, and the chamber 40 performs defoaming and deaeration processing in a vacuum environment when soldering the workpiece 1.
- the chamber 40 shown in FIG. 2 includes a container 41, a base 42, and an elevating mechanism 43, and shows a state where the container 41 is separated from the base 42 and stopped at a predetermined position above.
- the stop position of the container 41 is referred to as a home position Hp.
- the home position Hp is a position above the position where the container 41 is a reference on the base 42 by a height h.
- the height h may be a height that does not hinder when the workpiece 1 is carried from the main heating unit 30 onto the base 42.
- the container 41 has a case structure with an open bottom, for example, a box-like body made of stainless steel arranged upside down and arranged in a lid shape.
- the inside of the container 41 is a cavity (space).
- the container 41 is moved up and down by an elevating mechanism 43.
- the conveyance direction of the workpiece 1 is the x direction
- the direction orthogonal to the conveyance direction is the y direction
- the direction orthogonal to the x and y directions is the z direction
- the container 41 is in the z direction during vacuum processing. Move up and down.
- a base 42 is disposed below the container 41, and an elevating mechanism 43 is disposed below the base 42.
- an elevating mechanism 43 is disposed below the base 42.
- a hydraulically driven cylinder, an air driven cylinder, or the like is used as the lifting mechanism 43.
- the base 42 has a plane wider than the size of the bottom surface of the container 41 and a predetermined thickness.
- the base 42 has an airtight seal member 48 at a position where the bottom end of the container 41 abuts. Since the seal member 48 is required to have heat resistance, for example, a fluorine-based packing is used.
- An exhaust port 201 is provided at a substantially central portion of the upper surface of the base 42.
- An exhaust pipe (not shown), one of which is connected to the exhaust port 201 and the other of which is connected to the exhaust connection port 202, is disposed inside the base 42.
- the connection port 202 is attached to the side surface of the base 42 that is one of the left side and the right side with respect to the conveyance direction of the workpiece 1.
- the connection port 202 is connected to the electromagnetic valve 22 shown in FIG.
- a gas supply port 203 is provided at a predetermined position on the upper surface of the base 42.
- a gas pipe (not shown) is disposed, one of which is connected to the gas supply port 203 and the other is connected to the gas supply connection port 204.
- the connection port 204 is attached to the other side surface of the base 42 orthogonal to the connection port 204 of the base 42, for example.
- the connection port 204 is connected to the release valve 25 shown in FIG.
- a panel heater 44 is provided on the ceiling surface of the container 41.
- the panel heater 44 constitutes an example of a heating unit, and heats and holds the workpiece 1 at a predetermined temperature (around 260 ° C.). This heating is for maintaining a predetermined temperature by the main heating unit 30 before the work 1 is put into the chamber 40 even after the work 1 is put into the chamber 40.
- the heating method of the panel heater 44 is a far infrared radiation panel method.
- the panel heater 44 is not limited to the ceiling surface of the container 41 and may be provided on the base 42 side.
- a pair of fixed beams 45 and 46 are provided at predetermined positions on both sides of the upper surface of the base 42.
- the fixed beams 45 and 46 constitute an example of the transport unit 13.
- the fixed beam 45 is disposed at the left end of the upper surface of the base 42, and the fixed beam 46 is disposed at the right end thereof. It is made to support both sides of one.
- the fixed beams 45 and 46 are formed of a plate-shaped block body, and a plurality of conical head-shaped pins 47 are provided on the upper surface of the plate-shaped block body.
- the pins 47 form groups of four and are arranged at a predetermined arrangement pitch. The reason why they are arranged at a predetermined arrangement pitch is to support the workpieces 1 without any trouble corresponding to the workpieces 1 having a plurality of lengths.
- a pad electrode 4 is formed on a substrate 5 for use as a power device, such as a printed wiring board or a semiconductor wafer, and the solder 3 is formed on the pad electrode 4 as the work 1.
- the size of the pad electrode 4 in this example is about 5 mm ⁇ 5 mm.
- FIG. 3A shows a state of the molten solder 7 in which the solder 3 is not solidified.
- a white shape (circular shape, elliptical shape, etc.) in the figure is a portion of the void 2 and is a pool of air generated involuntarily in the molten solder 7.
- the vacuum pressure in the chamber 40 decreases (the degree of vacuum increases)
- the air in the molten solder 7 gathers and its shape grows greatly.
- the void 2 is pulled to the outside in the vacuuming process, and a pressure difference is generated between the void 2 and the solder interface.
- the void 2 in the molten solder 7 comes out to the outside (defoamed and degassed).
- the solder 3 shown in FIG. 3B is in a molten state in which the pressure in the container 41 reaches the target pressure.
- control is performed to maintain the target pressure for a predetermined time. Since the molten solder void 2 that has reached the target pressure is gradually defoamed and degassed by evacuation at a constant pressure, the void 2 that has been generated in the past breaks (explodes), and the flux It is possible to avoid the occurrence of solder scattering and solder scattering. Only small voids remain near the outer surface. In this state, the work 1 is cooled. Thereby, the solder 3 in which the void 2 is reduced can be formed on the pad electrode 4.
- control unit 60 includes a control unit 61, a memory unit 62, a timing generation unit 63, and the like.
- the operation unit 21 is connected to the control unit 60, and inputs the vacuum pressure in the chamber 40, the vacuum pressure maintenance time, etc., and sets them in the control unit 61.
- the operation unit 21 is a liquid crystal display panel, a numeric keypad, or the like.
- One or more vacuum pressures are input and set by the operation unit 21.
- the first target pressure P1 and the second target pressure P2 during the vacuum defoaming / degassing process are set.
- the setting of the first target pressure P1 and the second target pressure P2 is for setting the vacuum pressure and performing the vacuum soldering process.
- the first target pressure P1 and the second target pressure P2 are output to the control unit 61 as operation data D21.
- the operation unit 21 is provided with a “start button” (not shown) to instruct the control unit 61 to “start”.
- the transport mechanism 70 is provided in the transport unit 13 and is connected to the control unit 60.
- a transport control signal S ⁇ b> 13 is output from the control unit 60 to the transport mechanism 70.
- the conveyance control signal S13 is a signal for operating the moving beams 18 and 28 and tact feeding the workpiece 1 (see FIGS. 5 to 8).
- the preheating unit 20 is connected to the control unit 60.
- a preheating control signal S ⁇ b> 20 is output from the control unit 60 to the preheating unit 20.
- the preheating control signal S20 is a signal for controlling the four preheating zones I to IV in order to operate the heater, fan, etc. of the preheating unit 20 to bring the workpiece 1 to a predetermined temperature (for example, 260 ° C.). .
- the main heating unit 30 is connected to the control unit 60.
- the main heating control signal S30 is output from the control unit 60 to the main heating unit 30.
- the main heating control signal S30 is a signal for heating the workpiece 1 to 260 ° C. by operating a heater, a fan, or the like of the main heating unit 30.
- the elevating mechanism 43 is connected to the control unit 60.
- a lift control signal S43 is output from the control unit 60 to the lift mechanism 43.
- the elevation control signal S43 is a signal for raising and lowering the container 41.
- the panel heater 44 is connected to the control unit 60.
- a heater control signal S44 is output from the control unit 60 to the panel heater 44.
- the heater control signal S44 is a signal for maintaining the inside of the sealed container 41 at a predetermined temperature.
- the electromagnetic valve 22 is connected to the control unit 60.
- a throttle valve for vacuum control is used.
- a solenoid valve control signal S22 is output from the control unit 60 to the solenoid valve 22.
- the electromagnetic valve control signal S22 is a signal for controlling the valve opening degree of the electromagnetic valve 22.
- the pump 23 is connected to the control unit 60.
- a vacuum pump such as a rotary type (blower) or a reciprocating type (piston) is used.
- a pump control signal S23 is output from the control unit 60 to the pump 23.
- the pump control signal S23 is a signal for controlling the output of the pump 23.
- the arrival sensor 26 is connected to the control unit 60.
- the arrival sensor 26 generates an arrival detection signal S26 during the defoaming / degassing process.
- the arrival detection signal S26 is a signal indicating whether or not the workpiece 1 has reached the chamber 40, and is output from the arrival sensor 26 to the control unit 60.
- a reflective or transmissive optical sensor is used as the arrival sensor 26 as the arrival sensor 26, a reflective or transmissive optical sensor is used.
- the pressure sensor 24 is connected to the control unit 60.
- the pressure sensor 24 constitutes an example of a detection unit, and generates a pressure detection signal S24 during the defoaming / degassing process.
- the pressure detection signal S24 is a signal indicating the pressure in the chamber 40, and is output from the pressure sensor 24 to the control unit 60.
- a diaphragm vacuum gauge, a thermocouple vacuum gauge, a Pirani vacuum gauge, a Benning vacuum gauge, or the like is used as the pressure sensor 24, a diaphragm vacuum gauge, a thermocouple vacuum gauge, a Pirani vacuum gauge, a Benning vacuum gauge, or the like is used.
- One of the release valves 25 is connected to the connection port 204 of the base 42 shown in FIG. 2, and the other is connected to a gas supply unit 29 such as an N 2 (nitrogen) cylinder or an H 2 (hydrogen) cylinder (not shown).
- the gas supply unit 29 has a proportional solenoid valve (not shown).
- the gas supply unit 29 only needs to supply at least one of N 2 gas (inert gas) and H 2 gas (reducing active gas) into the chamber 40.
- the proportional solenoid valve is adapted to adjust the inflow amount of N 2 gas, H 2 gas and the like.
- An opening valve control signal S25 is output from the control unit 60 to the opening valve 25.
- the opening valve control signal S25 is a signal for controlling the opening valve 25.
- the opening valve 25 is, for example, one having an initial opening valve and a main opening valve.
- the initial opening valve has a predetermined diameter, which is smaller than the main opening valve.
- the initial opening valve is used in the case where the amount of gas flowing into the chamber 40 is suppressed to be small or in the pre-stage operation of the main opening valve.
- the main opening valve is larger than the diameter of the initial opening valve, and allows a larger amount of gas to flow through than the initial opening valve.
- the cooling unit 50 is connected to the control unit 60.
- a cooling control signal S50 is output from the control unit 60 to the cooling unit 50.
- the cooling control signal S50 is a signal for controlling a heat exchanger, a fan, and the like.
- the cooling method of the cooling unit 50 is a turbofan (nitrogen atmosphere).
- the control unit 60 includes a control unit 61, a memory unit 62, and a timing generation unit 63.
- the control unit 60 also includes an analog / digital converter, an oscillator, etc. (not shown).
- a memory unit 62 is connected to the control unit 61, and control data D62 is stored.
- the control data D62 is data for controlling the preheating unit 20, the electromagnetic valve 22, the pump 23, the release valve 25, the main heating unit 30, the elevating mechanism 43, the panel heater 44, the cooling unit 50, and the transport mechanism 70.
- ROM Read Only Memory
- RAM Random Access Memory
- HDD fixed disk memory
- the control unit 61 adjusts the vacuum pressure based on the pressure detection signal S24 and controls the electromagnetic valve 22, the pump 23, and the release valve 25 so as to maintain the vacuum pressure for a predetermined time.
- a central processing unit Central Processing Unit
- Central Processing Unit is used for the control unit 61.
- the control unit 61 controls the pump 23 to be maintained at a predetermined number of revolutions based on the pressure detection signal S24, and controls the amount of gas flowing into the chamber 40. Control and hold the set vacuum pressure for a predetermined time. At that time, the controller 61 controls the release valve 25 so as to adjust the inflow amount of gas. This is because the inside of the chamber 40 is held at a set vacuum pressure for a predetermined time. By this control, the inside of the chamber 40 can be maintained at a specified vacuum pressure. Thereby, the void 2 in the molten solder 7 can be gradually deaerated and defoamed. Therefore, the void 2 breaks (explodes), and it becomes possible to prevent flux splashing, solder scattering, and the like.
- the control unit 61 controls the flow rate of the gas into the chamber 40 based on the pressure detection signal S24 and also controls the rotation speed of the pump 23. Then, the set vacuum pressure is held for a predetermined time.
- This control also allows the inside of the chamber 40 to be maintained at a specified vacuum pressure. Thereby, the void 2 in the molten solder 7 can be gradually deaerated and defoamed. A high quality vacuum soldering process with few voids 2 can be performed.
- a timing generation unit 63 is connected to the control unit 61.
- the timing generator 63 receives a reference clock signal obtained from an oscillator (not shown) and a control command from the controller 61, and the above-described preheating control signal S20, electromagnetic valve control signal S22, release valve control signal S25, main heating control signal. S30, lift control signal S43, heater control signal S44, cooling control signal S50 and transport control signal S70 are generated.
- the walking beam type transport mechanism 70 includes fixed beams 17 and 27 and moving beams 18 and 28.
- the feed pitch of the moving beams 18 and 28 is, for example, about 400 mm.
- the side on which the workpiece 1 is carried in is referred to as the carrying-in side
- the side on which the workpiece 1 is carried out is referred to as the carrying-out side.
- the carry-in fixed beam 17 is provided in the preheating unit 20 and the main heating unit 30 shown in FIG. 1, and the carry-out fixed beam 27 is provided in the cooling unit 50.
- a pair of fixed beams 17 and 27 are provided on both sides of the conveyance path 16 of the workpiece 1.
- the moving beams 18 and 28 operate so as to move up and down and left and right with respect to the fixed beams 17 and 27 on both sides (see (1) to (4) in the figure: walking).
- symbol a represents the home position Hp of each of the moving beams 18 and 28.
- the moving beams 18 and 28 are driven independently on the carry-in side and the carry-out side, respectively.
- the moving beam 18 on the carry-in side rises in the vertical direction (a ⁇ b) along the locus (1) and receives the workpiece 1 from the fixed beam 17 (fixed beam 45).
- the workpiece 1 moves in the horizontal direction (b ⁇ c) along the locus (2), descends in the vertical direction (c ⁇ d) along the locus (3), and the workpiece 1 is moved to the fixed beam 17 ( After being placed on the fixed beam 45), the moving beam 18 moves in the horizontal direction (d ⁇ a) along the locus (4) and returns to the home position Hp. In this way, the workpiece 1 is sequentially tact-fed.
- the moving beam 28 on the carry-out side moves in the horizontal direction (a ⁇ b) along the locus (1).
- the moving beam 28 receives the workpiece 1 from the fixed beam 45 (fixed beam 27).
- the workpiece 1 is moved in the horizontal direction (c ⁇ d) along the locus (3) with the workpiece 1 placed thereon.
- the work 1 is sequentially tact-fed at a predetermined transport speed (the work 1 is transported sequentially from the right side to the left side on the paper surface).
- the moving beam 18 rises in the vertical direction (a ⁇ b) along the locus (1), and the moving beam 18 rises, so that the fixed beam 17 of the main heating unit 30 moves from the work 1. Receive. Thereafter, the moving beam 18 moves in the horizontal direction (b ⁇ c) along the trajectory (2) and descends in the vertical direction (c ⁇ d) along the trajectory (3). As the moving beam 18 descends, the workpiece 1 is placed on the fixed beam 45 on the base 42.
- FIG. 8A when the moving beam 18 leaves the chamber 40, the lifting mechanism 43 operates in the chamber 40, and the container 41 descends from the home position Hp. The lowering by the lifting mechanism 43 (not shown) is finished, and the container 41 is in a state of pressing the base 42. At this time, the bottom edge of the container 41 shown in FIG. Thereby, the inside of the container 41 is in a closed room state. Thereafter, the chamber 40 is evacuated.
- the first target pressure P1 and the second target pressure P2 are set and the chamber 40 is evacuated.
- the vertical axis represents the vacuum pressure [Pa] (pressure) in the container 41
- the horizontal axis represents the time related to vacuum defoaming / deaeration processing
- the time in a series of operation times of vacuum reflow processing t5 to t6 [sec] are extracted and shown.
- the bold line graph in the figure is a curve (vacuum pressure control curve) showing the vacuum pressure control characteristics of the chamber 40.
- the first target pressure P1 is set, and the container 41 shown in FIG. 2 is evacuated (depressurized) from the atmospheric pressure (about 100,000 Pa) to the first target pressure P1 from time t51 to t52.
- P1 is 50,000 Pa.
- Time t51 is the pressure reduction start time
- time t52 is the achievement time of the first target pressure P1.
- T1 in the figure is the first vacuum pressure maintenance time (period: set pressure reduction time), which is the time obtained by subtracting t52 from time t53.
- the second target pressure P2 is set, and the vacuum pressure in the container 41 is evacuated (depressurized) to the second target pressure P2 from time t53 to t54.
- P2 is, for example, 1000 Pa.
- Time t53 is the decompression restart time
- time t54 is the achievement time of the second target pressure P2.
- the vacuum pressure in the container 41 is maintained at the second target pressure P2 from time t54 to t55.
- T2 in the figure is the second vacuum pressure maintenance time (set pressure reduction time), which is the time obtained by subtracting t54 from time t55.
- Time t55 is a vacuum break time
- time t56 is a vacuum break completion time.
- the control for maintaining the set vacuum pressure of the present invention for a predetermined time can also be performed in the process of returning from the vacuum break to the atmospheric pressure.
- the intermediate pressure P12 may be set when the pressure is increased from the second target pressure P2 to the first target pressure P1 during the transition to the vacuum break.
- the intermediate pressure P12 is set at time t551, and the intermediate pressure P12 is maintained until time t552.
- the time obtained by subtracting t551 from time t552 is the vacuum pressure maintaining time T3 at the time of vacuum break.
- the first target pressure P1 is reset at time t552, and the first target pressure P1 is maintained at time t556.
- the vacuum pressure maintaining time of the first target pressure P1 at the time of vacuum break is T4.
- the vacuum pressure maintaining time T4 is a time obtained by subtracting t553 from time t56. You may make it return the inside of the container 41 to atmospheric pressure after progress of the vacuum pressure maintenance time T4, ie, from time t56 to t6.
- the target pressures P12, P1, etc. can be set and increased in multiple stages. Accordingly, it is possible to perform the vacuum deaeration soldering process on the workpiece 1 at a desired temperature and a target vacuum pressure both in the vacuum configuration and in the vacuum break. In this way, by performing pressure reduction and high pressure step by step, it becomes possible to prevent flux splashing and solder scattering.
- the lifting mechanism 43 is operated to separate the container 41 from the base 42 shown in FIG. At this time, the bottom end of the container 41 in a state of being pressed by the base 42 is separated from the seal member 48. As shown in FIG. 8B, the container 41 is separated from the base 42, so that the inside of the container 41 becomes an open space.
- the vacuum reflow furnace 100 is comprised, the time which maintains the target pressure P1, P2, P12 of each step
- FIG. 10 is a temperature profile of the vacuum reflow furnace 100.
- the vertical axis represents the temperatures [° C.] of the preheating zones I to IV, the main heating zone V, the vacuum degassing zone VI, and the cooling zone VII, and the horizontal axis represents the elapsed times t1 to t6 [sec].
- the bold curve in the figure is the temperature characteristic in the vacuum reflow furnace 100.
- the flowchart shown in FIG.11 and FIG.12 is the control example on the basis of the workpiece
- work 1 is also advancing simultaneously at the carrying-in side and the conveyance side of the chamber 40, in order to make description easy to understand, Description will be made by paying attention to the movement of one workpiece 1 before and after the chamber 40.
- the operation unit 21 sets a plurality of vacuum pressures (target pressures P1, P2, etc.) and a predetermined time (vacuum pressure maintenance time T1, T2, etc.) for holding each vacuum pressure. ii. Before the workpiece 1 is put into the chamber 40, the workpiece 1 is heated to a predetermined temperature.
- step ST1 process
- the operation unit 21 is used to input the value of the vacuum pressure in the chamber 40 to the control unit 61 to set the first target pressure P1 and the second target pressure P2. Further, the vacuum pressure maintaining times T1 and T2 are also set.
- the setting of the vacuum pressure in the chamber 40 is not limited to the first target pressure P1 and the second target pressure P2, and a plurality of target values may be input, and one target pressure is set. It may be.
- the first target pressure P1, the second target pressure P2, and the like are output to the control unit 61 as operation data D21.
- step ST2 the control unit 61 waits for start.
- the start instruction is performed by the operator pressing a start button provided on the operation unit 21 or the like.
- the process proceeds to step ST ⁇ b> 3 and the control unit 61 performs drive control of the transport mechanism 70.
- the transport mechanism 70 receives a transport control signal S13 from the control unit 60, operates the moving beams 18 and 28 based on the transport control signal S13, and feeds the workpiece 1 (see FIGS. 6A to 8B). ).
- step ST4 the control unit 61 performs a preheating process on the workpiece 1.
- the preheating unit 20 receives the preheating control signal S20 from the control unit 60, operates the four preheating zones I to IV based on the preheating control signal S20, and moves the workpiece 1 to a predetermined temperature (for example, 260). In order to reach (° C.), heating is performed gradually (about 150 ° C. ⁇ 160 ° C. ⁇ 170 ° C. ⁇ 180 ° C.).
- the inside of the furnace is heated from room temperature to around 130 ° C. from time t0 to t1 in the temperature profile shown in FIG.
- the inside of the furnace is heated from a temperature of 130 ° C. to a temperature of around 160 ° C. from time t1 to time t2.
- the inside of the furnace is heated to a temperature of 160 ° C. to 170 ° C. from time t2 to t3.
- the inside of the furnace is heated to around 170 ° C. to 180 ° C. from time t3 to t4.
- step ST5 the control unit 61 performs the main heating process on the workpiece 1.
- the main heating unit 30 receives the main heating control signal S30 from the control unit 60, and operates the heater, the fan, and the like of the main heating unit 30 based on the main heating control signal S30, and moves the workpiece 1 to 260.
- Heat to ° C. According to the temperature profile shown in FIG. 10, the main heating zone V heats the inside of the furnace to a temperature of about 180 ° C. to 240 ° C. from time t4 to t5.
- step ST6 the control unit 61 performs vacuum defoaming / deaeration processing on the workpiece 1.
- the arrival sensor 26 detects the arrival of the workpiece 1 into the chamber 40 and controls the arrival detection signal S26. Output to unit 60.
- the process proceeds to a subroutine shown in FIG. 12, and the control unit 61 determines whether or not the workpiece 1 is received on the base 42 in step ST61. At this time, the control unit 61 inputs an arrival detection signal S26 from the arrival sensor 26, and determines whether or not the workpiece 1 has reached. If the arrival detection signal S26 indicating the arrival of the workpiece 1 is not obtained, the process waits as it is.
- step ST62 When the arrival detection signal S26 indicating the arrival of the workpiece 1 is obtained, the process proceeds to step ST62, and the control unit 61 executes the descent control of the chamber 40.
- the raising / lowering mechanism 43 inputs the raising / lowering control signal S43 from the control unit 60, and operates the cylinder etc. which are not shown in figure, and makes the container 41 a sealing state.
- the panel heater 44 receives the heater control signal S44 from the control unit 60, and maintains the temperature of the workpiece 1 at 260 ° C. based on the heater control signal S44.
- the inside of the container 41 is maintained at a temperature around 235 ° C. to 240 ° C. from time t5 to t6.
- step ST63 the control unit 61 starts the evacuation process in the chamber 40.
- the opening valve 25 receives the opening valve control signal S25 from the control unit 60, and the initial opening valve and the main opening valve are also “fully closed”.
- step ST64 the control unit 61 controls the electromagnetic valve 22 and the pump 23 so that the inside of the chamber 40 is set to the first target pressure P1, and vacuums the inside of the chamber 40.
- step ST65 the controller 61 determines whether or not the vacuum pressure in the chamber 40 has reached the first target pressure P1.
- the pressure sensor 24 detects the pressure in the chamber 40 and outputs a pressure detection signal S24 (pressure detection information) to the control unit 60.
- the control unit 61 detects (verifies) the vacuum pressure in the chamber 40 from the pressure detection signal S24.
- the pressure is calculated from the signal intensity (information obtained by binarizing the current value, voltage value, etc.), or a table in which the relationship between the signal intensity and the detected pressure is described in advance in the ROM or the like is referred to.
- the process proceeds to step ST66, and the control unit 61 continues the evacuation process in the chamber 40.
- the vacuum pressure in the chamber 40 is adjusted based on the pressure detection signal S24 in the chamber 40 and the set vacuum pressure.
- the solenoid valve 22 and the release valve 25 are controlled so as to eliminate the difference between the calculated pressure value based on the signal intensity and the detected pressure.
- the open valve 25 enter the open valve control signal S25, and based on the opening valve control signal S25 to operate the initial opening valve and the main relief valve and the like, N 2 gas Ya , H 2 gas or the like is supplied into the chamber 40.
- step ST68 the control unit 61 sets the second target pressure P2 to the electromagnetic valve 22, the pump 23, and the release valve 25 and restarts the evacuation process in the chamber 40.
- the open valve 25 the initial open valve and the main open valve are also “fully closed”.
- step ST69 the control unit 61 determines whether or not the vacuum pressure in the chamber 40 has reached the second target pressure P2.
- the pressure sensor 24 detects the pressure in the chamber 40 and outputs a pressure detection signal S24 to the control unit 60.
- the control unit 61 detects the vacuum pressure in the chamber 40 from the pressure detection signal S24. Judgment criteria are as described in step ST65.
- step ST70 the controller 61 continues the evacuation process in the chamber 40.
- the vacuum pressure in the chamber 40 is adjusted based on the pressure detection signal S24 in the chamber 40 and the set vacuum pressure.
- the adjustment method at this time is as described in step ST67.
- the control unit 61 maintains the second target pressure P2 for a predetermined time (such as a vacuum pressure maintaining time T2).
- a predetermined time such as a vacuum pressure maintaining time T2
- the controller 61 adjusts the electromagnetic valve 22 and the release valve 25 to maintain the vacuum pressure in the chamber 40 at the vacuum pressure maintaining time T2 and the second target pressure P2.
- step ST72 the control unit 61 determines whether or not the vacuum deaeration has ended.
- step ST73 the control unit 61 starts the vacuum break in the chamber 40.
- the pump 23 is stopped and the release valve 25 is operated, and N 2 gas is supplied into the chamber 40 to increase the vacuum pressure in the container 41.
- the target pressures P12, P1, etc. may be set in multiple stages to increase the pressure (see the wavy characteristics in FIG. 9).
- step ST74 the controller 61 controls the elevating mechanism 43 so that the container 41 is raised.
- the raising / lowering mechanism 43 the raising / lowering control signal S43 is input from the control unit 60, and based on the raising / lowering control signal S43, the cylinder etc. which are not shown in figure are operated and the container 41 is made into an open state.
- the transport mechanism 70 receives a transport control signal S70 from the control unit 60, operates the moving beam 28 based on the transport control signal S70, and tact-feeds the workpiece 1 (see FIG. 6A).
- step ST76 the control unit 61 branches the control in accordance with whether or not the workpiece 1 has been conveyed from the base 42 to the cooling unit 50.
- the process returns to step ST75 and the work 1 unloading process is continued.
- the workpiece 1 is unloaded from the base 42 by the transport mechanism 70, the next workpiece 1 is loaded onto the base 42.
- step ST7 the control unit 61 performs a cooling process for the workpiece 1.
- the cooling unit 50 receives a cooling control signal S50 from the control unit 60, operates a heat exchanger, a fan, or the like based on the cooling control signal S50, and cools the workpiece 1 until it reaches around normal temperature.
- the temperature in the furnace is cooled from 235 ° C. to near room temperature from time t6 to time t7.
- the workpiece 1 can be vacuum deaerated soldered at a desired temperature, in this example, 260 ° C.
- step ST8 the control part 61 controls the conveyance mechanism 70 so that the workpiece
- step ST9 the control unit 61 determines whether or not the vacuum soldering process for all the workpieces 1 has been completed. If the vacuum soldering process for all the workpieces 1 has not been completed, the process returns to step ST3 to continue the work 1 carry-in process, its heating process, its vacuum defoaming / degassing process, and its cooling process. When the vacuum soldering process for all the workpieces 1 is finished, the control is finished.
- the vacuum pressure in the chamber 40 is adjusted to the set vacuum pressure based on the pressure detection signal S24 in the chamber 40 and set.
- a control unit 61 for holding the vacuum pressure for a predetermined time is provided.
- the inside of the chamber 40 can be maintained at a specified vacuum pressure in multiple stages and at a constant pressure only for an arbitrary time, so that the soldering process can be performed in the chamber 40 in which the vacuum pressure is optimally adjusted.
- the pressure in the chamber 40 is monitored at any time while the chamber 40 is decompressed by the pump 23, and an inert gas such as N 2 is used depending on the situation.
- a constant vacuum pressure can be realized in the chamber 40 (feedback pressure adjusting mechanism) by feedback control that a proper amount is mixed.
- step ST8 When the control of subroutine step ST75 and the main routine step ST8 are linked, the control of step ST8 may be omitted.
- the conveyance control of the workpiece 1 in the control unit 61 can be reduced.
- a method of preventing splashes of flux, solder, etc. by arbitrarily changing (variable) the depressurization speed may be adopted.
- a method of achieving a certain vacuum pressure by mixing a gas other than N 2 may be adopted.
- the inside of the chamber 40 can be maintained at a specified vacuum pressure (atmospheric pressure).
- the setting of the vacuum pressure, the time for holding the set vacuum pressure, and the like can be appropriately set based on the workpiece 1 thus mounted and various conditions.
- the time that the work 1 stays in the preheating zones I, II, III, and IV and the time that it stays in the main heating zone V based on the unit tact standby time is TA
- the vacuum degassing zone VI in the chamber 40 is
- the staying time is TB
- the staying time in the cooling zone VII is TC
- the relationship of TC ⁇ TB ⁇ TA is set (see FIG. 9). If this relationship is maintained, the vacuum defoaming / deaeration process can be performed in the work / tact conveyance and the vacuum defoaming / degassing process without causing control failure such as collision.
- the control unit 61 is provided with a correction calculation function so that the correction calculation is performed on the unit tact standby time of the workpiece 1 with respect to the vacuum pressure in the chamber 40 set by the operation unit 21 and the vacuum pressure maintenance time. To avoid the above-mentioned control failure.
- ⁇ 1 and ⁇ 2 are slopes of the vacuum pressure control curve at the time of vacuum configuration
- ⁇ 3 to ⁇ 5 are slopes of the vacuum pressure control curve at the time of vacuum break.
- the present invention provides a vacuum reflow furnace having a function of degassing solder in a vacuum melt state when a component for surface mounting is placed on a predetermined position on a substrate and the component and the substrate are soldered. It is very suitable to apply.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
Description
図5に示した固定ビーム45,(46:図2参照)上にはワーク1が載置され、容器41は搬送部13の搬送動作に支障をきたさない位置で停止している。この位置をチャンバー40のホームポジションHpとし、ここで容器41を待機させるようにしている。これらの動きを前提にして、図5に示した固定ビーム45上のワーク1をチャンバー40から搬出する場合、図6Aにおいて、移動ビーム28は軌跡(1)で水平方向(a→b)に移動し、その後、軌跡(2)で垂直方向(b→c)へ上昇し、基台42上の固定ビーム45からワーク1を受け取る。このとき、移動ビーム28は固定ビーム45の下方からワーク1を持ち上げるようにして受け止める。
そして、図7Aにおいて、搬入側では移動ビーム18は軌跡(1)で垂直方向(a→b)へ上昇し、当該移動ビーム18が上昇することで、本加熱部30の固定ビーム17からワーク1を受け取る。その後、移動ビーム18は軌跡(2)で水平方向(b→c)に移動し、そして、軌跡(3)で垂直方向(c→d)へ降下する。移動ビーム18が降下することで、基台42上の固定ビーム45へワーク1を載置するようになる。
容器41内が密閉空間となされた後にポンプ23によって真空引き処理がなされる。ここで、図9を参照してチャンバー40の制御例について説明する。この例では第1目標圧P1及び第2目標圧P2を設定してチャンバー40を真空引き処理する場合を挙げる。図9において、縦軸は容器41内の真空圧[Pa](圧力)であり、横軸は真空脱泡・脱気処理に係る時間であり、真空リフロー処理の一連の動作時間の中の時刻t5~t6[sec]を抽出して示している。図中の太線の折れグラフはチャンバー40の真空圧制御特性を示す曲線(真空圧制御曲線)である。
真空脱泡・脱気処理が終了すると、昇降機構43を動作させて、図8の(A)に示した基台42から容器41を離間する。このとき、基台42に押さえ込まれていた状態の容器41の底部端辺がシール部材48から分離する。図8の(B)に示すように容器41が基台42から離間することで、容器41内が開放空間となされる。これらにより、真空リフロー炉100を構成し、それぞれの段階の目標圧P1,P2,P12等を維持する時間が設定できて、その真空圧維持時間を調整できる真空はんだ付けシステムを構築できるようになる。
ii.ワーク1がチャンバー40内に投入される前に、ワーク1を所定温度まで加熱する。
11 搬入口
12 搬出口
13 搬送部
16 搬送路
17,27 固定ビーム
18,28 移動ビーム
20 予備加熱部(加熱部)
21 操作部
23 ポンプ
24 圧力センサ
25 開放弁
26 到達センサ
29 ガス供給部
30 本加熱部(加熱部)
40 チャンバー
41 容器
42 基台
43 昇降機構
44 パネルヒーター(加熱部)
45,46 固定ビーム(支持部)
47 ピン
48 シール部材
50 冷却部
100 真空リフロー炉
Claims (11)
- ワークを真空環境下ではんだ付け処理可能なチャンバーと、
前記チャンバー内の真空圧を入力し設定する操作部と、
前記チャンバー内を真空引きするポンプと、
前記チャンバー内の圧力を検出する検出部と、
前記検出部から出力されるチャンバー内の圧力検出情報に基づいて設定された真空圧を調整すると共に設定された真空圧を所定時間保持するための制御部とを備えるはんだ付け装置。 - 前記操作部によって入力し設定される真空圧が1つ又は複数である
請求項1に記載のはんだ付け装置。 - 前記チャンバー内に不活性および活性の少なくともいずれか一方のガスを供給するガス供給部を備え、
前記制御部は、
前記ガス供給部から前記チャンバー内へ供給される前記ガスの流入量を調整するようにした
請求項1又は2のいずれか1項に記載のはんだ付け装置。 - 前記制御部は、
設定された前記真空圧を所定時間保持する際に、
前記検出部からのチャンバー内の圧力検出情報に基づき前記ポンプを所定の回転数に維持するように制御すると共に前記ガスの前記チャンバー内への流入量を制御し、
設定された前記真空圧を所定時間保持するようにした
請求項3に記載のはんだ付け装置。 - 前記制御部は、
設定された前記真空圧を所定時間保持する際に、
前記検出部からのチャンバー内の圧力検出情報に基づき前記ガスの前記チャンバー内への流入量を一定となるように制御すると共に前記ポンプの回転数を制御し、
設定された前記真空圧を所定時間保持するようにした
請求項3に記載のはんだ付け装置。 - 前記ワークが前記チャンバー内に投入される前に当該ワークを所定温度まで加熱する加熱部を備えた請求項1から請求項5のいずれか1項に記載のはんだ付け装置。
- 前記ワークが前記チャンバー内に投入された際に、チャンバー内の投入前に所定温度まで加熱されたワークを所定温度に保持する加熱部を備えた請求項6に記載のはんだ付け装置。
- ワークを真空環境下ではんだ付け処理可能なチャンバー内の真空圧を入力し設定する工程と、
前記真空圧を設定された前記チャンバー内を真空引きする工程と、
当該チャンバー内の圧力を検出する工程と、
前記チャンバー内の圧力検出情報及び設定された真空圧に基づいて当該チャンバー内の真空圧を調整する工程と、
設定された前記真空圧を所定時間保持する工程と、
前記真空圧が調整された前記チャンバー内ではんだ付け処理をする工程とを有する真空はんだ付け方法。 - 前記チャンバー内の真空圧を1つ又は複数入力し設定する工程と、
入力された前記真空圧毎に設定される真空圧をそれぞれ所定時間保持する工程とを有する請求項8に記載の真空はんだ付け方法。 - 前記ワークが前記チャンバー内に投入される前に、ワークを所定温度まで加熱する工程を有する請求項8又は9のいずれか1項に記載の真空はんだ付け方法。
- 前記ワークが前記チャンバー内に投入された際に、チャンバー内の投入前に所定温度まで加熱されたワークを所定温度に保持する加熱工程を有する請求項10に記載の真空はんだ付け方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/906,660 US10252364B2 (en) | 2013-07-23 | 2013-07-23 | Soldering apparatus and vacuum-soldering method |
CN201380078493.4A CN105408046B (zh) | 2013-07-23 | 2013-07-23 | 软钎焊装置和真空软钎焊方法 |
JP2015528049A JP5835533B2 (ja) | 2013-07-23 | 2013-07-23 | はんだ付け装置及び真空はんだ付け方法 |
PCT/JP2013/069933 WO2015011785A1 (ja) | 2013-07-23 | 2013-07-23 | はんだ付け装置及び真空はんだ付け方法 |
KR1020167004193A KR101763545B1 (ko) | 2013-07-23 | 2013-07-23 | 납땜 장치 및 진공 납땜 방법 |
TW103123270A TWI608885B (zh) | 2013-07-23 | 2014-07-07 | Soldering device and vacuum soldering method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2013/069933 WO2015011785A1 (ja) | 2013-07-23 | 2013-07-23 | はんだ付け装置及び真空はんだ付け方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2015011785A1 true WO2015011785A1 (ja) | 2015-01-29 |
Family
ID=52392867
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2013/069933 WO2015011785A1 (ja) | 2013-07-23 | 2013-07-23 | はんだ付け装置及び真空はんだ付け方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US10252364B2 (ja) |
JP (1) | JP5835533B2 (ja) |
KR (1) | KR101763545B1 (ja) |
CN (1) | CN105408046B (ja) |
TW (1) | TWI608885B (ja) |
WO (1) | WO2015011785A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016155141A (ja) * | 2015-02-24 | 2016-09-01 | 株式会社タムラ製作所 | はんだ接合構造体の製造方法 |
CN107378166A (zh) * | 2017-07-28 | 2017-11-24 | 中国振华集团永光电子有限公司(国营第八七三厂) | 一种减少电子元件盖板熔封空洞的熔封工艺 |
CN115625393A (zh) * | 2022-12-06 | 2023-01-20 | 山东才聚电子科技有限公司 | 一种静态真空焊接炉 |
CN117506105A (zh) * | 2023-11-27 | 2024-02-06 | 盐城芯丰微电子有限公司 | 金钯铜共晶焊接上层控制台用预防性维护装置 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9226407B2 (en) * | 2002-07-01 | 2015-12-29 | Semigear Inc | Reflow treating unit and substrate treating apparatus |
WO2015097796A1 (ja) * | 2013-12-25 | 2015-07-02 | 千住金属工業株式会社 | 真空はんだ処理装置及びその制御方法 |
DE102016110040A1 (de) * | 2016-05-31 | 2017-11-30 | Endress + Hauser Gmbh + Co. Kg | Fertigungslinie zum Löten |
WO2018225437A1 (ja) * | 2017-06-05 | 2018-12-13 | 千住金属工業株式会社 | はんだ付け装置 |
JP6709944B2 (ja) * | 2018-10-01 | 2020-06-17 | 株式会社弘輝 | 接合構造体の製造方法 |
US11865645B2 (en) * | 2020-11-12 | 2024-01-09 | Senju Metal Industry Co., Ltd. | Soldering apparatus |
CN112589308A (zh) * | 2020-12-18 | 2021-04-02 | 芜湖德纳美半导体有限公司 | 一种二极管真空焊接装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07330455A (ja) * | 1994-06-13 | 1995-12-19 | Toyota Motor Corp | セラミック材と金属材との接合方法 |
JPH0910927A (ja) * | 1995-06-22 | 1997-01-14 | Chugai Ro Co Ltd | 炉中無フラックスろう付け方法 |
JP2001077524A (ja) * | 1999-09-03 | 2001-03-23 | Fujitsu Ltd | リフロー半田付け装置及びリフロー半田付け方法 |
JP2004327816A (ja) * | 2003-04-25 | 2004-11-18 | Denso Corp | リフロー半田付け方法及び装置 |
JP2010161206A (ja) * | 2009-01-08 | 2010-07-22 | Fujitsu Ltd | 接合方法及びリフロー装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3226014A (en) * | 1963-07-12 | 1965-12-28 | Janenkov Nikolai Petrovich | Two-stage plate rotary vacuum pumps |
US5409543A (en) * | 1992-12-22 | 1995-04-25 | Sandia Corporation | Dry soldering with hot filament produced atomic hydrogen |
JP2973820B2 (ja) * | 1994-06-10 | 1999-11-08 | 住友金属工業株式会社 | セラミックス基板の製造方法 |
JP3617188B2 (ja) | 1996-05-23 | 2005-02-02 | 富士電機機器制御株式会社 | はんだ付方法 |
US5963840A (en) * | 1996-11-13 | 1999-10-05 | Applied Materials, Inc. | Methods for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions |
US7443592B2 (en) * | 2002-08-29 | 2008-10-28 | Genie Lens Technologies, Llc | Visual effect apparatus for displaying interlaced images using block out grids |
JP3887291B2 (ja) * | 2002-09-24 | 2007-02-28 | 東京エレクトロン株式会社 | 基板処理装置 |
US6798068B2 (en) | 2002-11-26 | 2004-09-28 | Advanced Micro Devices, Inc. | MOCVD formation of Cu2S |
JP4732699B2 (ja) * | 2004-02-17 | 2011-07-27 | 神港精機株式会社 | はんだ付け方法 |
JP4697408B2 (ja) * | 2005-06-02 | 2011-06-08 | 関東冶金工業株式会社 | ろう付け炉 |
US20070017022A1 (en) * | 2005-07-25 | 2007-01-25 | Mayer Robert M | Drain seal |
JP2007180447A (ja) * | 2005-12-28 | 2007-07-12 | Toyota Industries Corp | 半田付け方法、半田付け装置、及び半導体装置の製造方法 |
JP2010161207A (ja) | 2009-01-08 | 2010-07-22 | Toyota Industries Corp | 半田付け方法および半田付け装置 |
-
2013
- 2013-07-23 CN CN201380078493.4A patent/CN105408046B/zh active Active
- 2013-07-23 WO PCT/JP2013/069933 patent/WO2015011785A1/ja active Application Filing
- 2013-07-23 US US14/906,660 patent/US10252364B2/en active Active
- 2013-07-23 KR KR1020167004193A patent/KR101763545B1/ko active IP Right Grant
- 2013-07-23 JP JP2015528049A patent/JP5835533B2/ja active Active
-
2014
- 2014-07-07 TW TW103123270A patent/TWI608885B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07330455A (ja) * | 1994-06-13 | 1995-12-19 | Toyota Motor Corp | セラミック材と金属材との接合方法 |
JPH0910927A (ja) * | 1995-06-22 | 1997-01-14 | Chugai Ro Co Ltd | 炉中無フラックスろう付け方法 |
JP2001077524A (ja) * | 1999-09-03 | 2001-03-23 | Fujitsu Ltd | リフロー半田付け装置及びリフロー半田付け方法 |
JP2004327816A (ja) * | 2003-04-25 | 2004-11-18 | Denso Corp | リフロー半田付け方法及び装置 |
JP2010161206A (ja) * | 2009-01-08 | 2010-07-22 | Fujitsu Ltd | 接合方法及びリフロー装置 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016155141A (ja) * | 2015-02-24 | 2016-09-01 | 株式会社タムラ製作所 | はんだ接合構造体の製造方法 |
CN107378166A (zh) * | 2017-07-28 | 2017-11-24 | 中国振华集团永光电子有限公司(国营第八七三厂) | 一种减少电子元件盖板熔封空洞的熔封工艺 |
CN107378166B (zh) * | 2017-07-28 | 2019-12-10 | 中国振华集团永光电子有限公司(国营第八七三厂) | 一种减少电子元件盖板熔封空洞的熔封工艺 |
CN115625393A (zh) * | 2022-12-06 | 2023-01-20 | 山东才聚电子科技有限公司 | 一种静态真空焊接炉 |
CN115625393B (zh) * | 2022-12-06 | 2023-11-14 | 山东才聚电子科技有限公司 | 一种静态真空焊接炉 |
US12103098B1 (en) | 2022-12-06 | 2024-10-01 | Shandong Caiju Electronic Technology Co., Ltd | Static vacuum welding furnace |
CN117506105A (zh) * | 2023-11-27 | 2024-02-06 | 盐城芯丰微电子有限公司 | 金钯铜共晶焊接上层控制台用预防性维护装置 |
Also Published As
Publication number | Publication date |
---|---|
TW201524646A (zh) | 2015-07-01 |
CN105408046B (zh) | 2017-07-21 |
US20160256946A1 (en) | 2016-09-08 |
TWI608885B (zh) | 2017-12-21 |
JPWO2015011785A1 (ja) | 2017-03-02 |
KR20160033192A (ko) | 2016-03-25 |
KR101763545B1 (ko) | 2017-07-31 |
CN105408046A (zh) | 2016-03-16 |
JP5835533B2 (ja) | 2015-12-24 |
US10252364B2 (en) | 2019-04-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5835533B2 (ja) | はんだ付け装置及び真空はんだ付け方法 | |
JP6149827B2 (ja) | 真空処理装置、その制御方法、真空はんだ処理装置及びその制御方法 | |
JP5601436B1 (ja) | 真空はんだ処理装置及びその制御方法 | |
JP5282571B2 (ja) | 半導体装置の製造方法 | |
JP2015123503A (ja) | 真空はんだ処理装置及びその制御方法 | |
JP6416923B2 (ja) | 半導体製造装置、半導体装置の製造方法および記録媒体 | |
JP2012089591A (ja) | 真空処理装置及び真空処理方法 | |
JP2010161207A (ja) | 半田付け方法および半田付け装置 | |
US11387121B2 (en) | Substrate treating apparatus and substrate treating system including pin lift mechanism below cooling base and heat plate | |
JP2015082630A (ja) | 粉末半田を使った半田付け方法及びフラックスレス連続リフロー炉 | |
JP3732085B2 (ja) | リフロー炉及びその処理方法 | |
JP7145839B2 (ja) | はんだ付け基板の製造方法及びはんだ付け装置 | |
JP2007053268A (ja) | 接合構造体の製造方法、ハンダ接合方法及びハンダ接合装置 | |
KR101623011B1 (ko) | 열처리 장치 및 열처리 방법 | |
WO2020179278A1 (ja) | 熱処理装置および熱処理方法 | |
JP6984194B2 (ja) | 加熱冷却装置 | |
JP2005175475A (ja) | モジユ−ル封止方法 | |
KR20220136139A (ko) | 기판 처리 장치 및 기판 처리 방법 | |
JP2013173157A (ja) | ハンダ実装装置及びハンダ実装方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 201380078493.4 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 13889768 Country of ref document: EP Kind code of ref document: A1 |
|
DPE1 | Request for preliminary examination filed after expiration of 19th month from priority date (pct application filed from 20040101) | ||
ENP | Entry into the national phase |
Ref document number: 2015528049 Country of ref document: JP Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
ENP | Entry into the national phase |
Ref document number: 20167004193 Country of ref document: KR Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14906660 Country of ref document: US |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 13889768 Country of ref document: EP Kind code of ref document: A1 |