WO2015010340A1 - 玻璃基板的清洗方法及实现该方法的装置 - Google Patents

玻璃基板的清洗方法及实现该方法的装置 Download PDF

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Publication number
WO2015010340A1
WO2015010340A1 PCT/CN2013/080233 CN2013080233W WO2015010340A1 WO 2015010340 A1 WO2015010340 A1 WO 2015010340A1 CN 2013080233 W CN2013080233 W CN 2013080233W WO 2015010340 A1 WO2015010340 A1 WO 2015010340A1
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WO
WIPO (PCT)
Prior art keywords
glass substrate
air
cleaned
blowing devices
suction device
Prior art date
Application number
PCT/CN2013/080233
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English (en)
French (fr)
Inventor
孙世英
Original Assignee
深圳市华星光电技术有限公司
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Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Priority to US14/111,560 priority Critical patent/US9409215B2/en
Publication of WO2015010340A1 publication Critical patent/WO2015010340A1/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L5/00—Structural features of suction cleaners
    • A47L5/12—Structural features of suction cleaners with power-driven air-pumps or air-compressors, e.g. driven by motor vehicle engine vacuum
    • A47L5/14—Structural features of suction cleaners with power-driven air-pumps or air-compressors, e.g. driven by motor vehicle engine vacuum cleaning by blowing-off, also combined with suction cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
    • B08B15/04—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area from a small area, e.g. a tool
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
    • B08B7/026—Using sound waves
    • B08B7/028—Using ultrasounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/04—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by a combination of operations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor

Definitions

  • the present invention relates to a cleaning method, and more particularly to a method of cleaning a glass substrate and an apparatus for carrying out the method. Background technique
  • Liquid crystal display has many advantages such as thin body, power saving, and no radiation, and has been widely used.
  • Most of the liquid crystal display devices on the market are backlight type liquid crystal displays, which include a liquid crystal display panel and a backlight module.
  • the working principle of the liquid crystal display panel is to place liquid crystal molecules in two parallel glass substrates, control the liquid crystal molecules to change direction by energizing the circuit of the glass substrate, and refract the light of the backlight module to produce a picture.
  • the existing glass substrate cleaning device is generally a dry cleaning machine.
  • the dry cleaning machine comprises: a conveying platform 100 for carrying and transporting a glass substrate, and two blowing devices 300 located above the conveying platform 100.
  • a getter device 500 located above the transport platform 100, the getter device 500 has an air inlet 502 and a storage portion 504 disposed in communication with the air inlet 502, the air inlet 502 is located at the air blowing device 300, the storage portion 504 is located above the two air blowing devices 300, wherein the two air blowing devices 300 are respectively provided with an ultrasonic generator 302 for transmitting ultrasonic waves to the surface of the glass substrate 700 so as to be attached thereto.
  • the surface impurity 702 is vibrated and separated from the glass substrate 700.
  • the getter device 500 inhales the impurity 702, sucks the impurity 702 into the getter device 500, and stores it in the storage portion 504, thereby realizing the glass substrate.
  • the surface of the 700 is removed.
  • the impurity 702 is a metal impurity having a large particle size
  • the impurity 702 may not be adsorbed into the getter device 500, resulting in cleaning of the glass substrate 700. Thoroughly, the display effect of the liquid crystal display panel produced by the glass substrate 700 is further affected. Summary of the invention
  • An object of the present invention is to provide a method for cleaning a glass substrate, which can effectively remove impurities on the glass substrate, and in particular, has a more remarkable effect of removing impurities from magnetic impurities.
  • Another object of the present invention is to provide a cleaning apparatus for a glass substrate which has a simple structure and a good effect of removing impurities from magnetic impurities.
  • a cleaning method for a glass substrate includes the following steps: Step 1. Providing a transport platform and a glass substrate to be cleaned, wherein the glass substrate to be cleaned has impurities attached thereto, and the impurities include magnetic impurities. And non-magnetic impurities;
  • Step 2 placing the glass substrate to be cleaned on the transfer platform
  • Step 3 providing two blowing devices, the two blowing devices are disposed above the conveying platform at intervals;
  • Step 4 the two blowing devices blow air to the glass substrate to be cleaned, so that impurities attached to the glass substrate to be cleaned are separated from the glass substrate;
  • Step 5 providing an adsorption device, the adsorption device comprising a suction device and a magnetic device, the suction device comprising an air inlet disposed between the two air blowing devices, the magnetic device being located in the air inlet of the air suction device;
  • Step 6 The air suction device aspirates the glass substrate to be cleaned, and the magnetic device generates magnetic attraction force on the magnetic impurities on the glass substrate to be cleaned, thereby sucking impurities on the glass substrate to be cleaned into the adsorption device.
  • An ultrasonic generator is disposed in each of the air blowing devices, and the ultrasonic waves emitted by the two ultrasonic generators in the two air blowing devices are relatively inclined and concentrated on the glass substrate to be cleaned, and the frequency of the ultrasonic generator is 30K ⁇ 100K. Hz.
  • the air suction device further includes a storage portion that communicates with the suction port and an air suction device that is disposed at the end of the storage portion away from the suction port.
  • An isolation net is disposed between the air suction device and the storage portion.
  • the magnetic device is a cylindrical electromagnet.
  • the invention also provides a cleaning device for a glass substrate, comprising: a rack, a transport platform mounted on the rack, two air blowing devices installed on the rack and located above the transport platform, and mounted on the rack
  • the adsorption device comprises an air suction device and a magnetic suction device
  • the air suction device comprises an air inlet port disposed between the two air blowing devices, wherein the magnetic suction device is located in the air suction port of the air suction device.
  • An ultrasonic generator is disposed in each of the air blowing devices, and the ultrasonic waves emitted by the two ultrasonic generators in the two air blowing devices are relatively inclined and concentrated on the glass substrate to be cleaned, and the frequency of the ultrasonic generator is 30K ⁇ 100K. Hz.
  • the air suction device further includes a storage portion that communicates with the suction port and an air suction device that is disposed at the end of the storage portion away from the suction port.
  • the magnetic device is a cylindrical electromagnet.
  • the invention also provides a cleaning device for a glass substrate, comprising: a rack, a transport platform mounted on the rack, two air blowing devices installed on the rack and located above the transport platform, and mounted on the rack
  • An adsorption device comprising: a suction device and a magnetic device, the suction device comprising an air inlet disposed between the two air blowing devices, the magnetic device being located in the air inlet of the air suction device;
  • each of the air blowing devices is provided with an ultrasonic generator, and the ultrasonic waves emitted by the two ultrasonic generators in the two air blowing devices are relatively inclined and concentrated on the glass substrate to be cleaned, and the frequency of the ultrasonic generator is 30K. ⁇ 100K Hz;
  • the air suction device further includes a storage portion connected to the air inlet and an air suction device disposed at the end of the storage portion away from the air inlet.
  • An isolation net is disposed between the air suction device and the storage portion.
  • the magnetic device is a cylindrical electromagnet.
  • the method for cleaning a glass substrate of the present invention and the device for realizing the same can effectively remove magnetic impurities by providing a magnetic device in an air inlet of the air suction device, and the air suction device can effectively remove the magnetic impurities.
  • the cleaning device has poor ability to remove magnetic impurities with a large weight on the glass substrate, thereby avoiding defects such as bright spots and bright lines of the liquid crystal display panel using the glass substrate, thereby effectively improving the quality of the liquid crystal display panel.
  • FIG. 1 is a schematic view showing a simplified structure of a conventional glass substrate cleaning device
  • FIG. 2 is a schematic view showing a large volume of metal impurities adhered to a glass substrate
  • FIG. 3 is a flow chart of a method for cleaning a glass substrate of the present invention.
  • FIG. 4 is a schematic view showing the structure of a cleaning apparatus for a glass substrate of the present invention. detailed description
  • the present invention provides a method for cleaning a glass substrate, comprising the following steps:
  • Step 1 A transfer platform 20 and a glass substrate 40 to be cleaned are provided.
  • the glass substrate 40 to be cleaned has impurities attached thereto.
  • the impurities 42 include magnetic impurities and non-magnetic impurities.
  • Step 2 Place the glass substrate 40 to be cleaned on the transfer platform 20.
  • Step 3 Two air blowing devices 60 are provided, and the two air blowing devices 60 are disposed above the transport platform 20 at intervals.
  • an ultrasonic generator is disposed in each of the air blowing devices 60.
  • Step 4 The two blowing devices 60 blow air to the glass substrate 40 to be cleaned so that the impurities 42 attached to the glass substrate 40 to be cleaned are separated from the glass substrate 40.
  • the ultrasonic waves emitted by the two ultrasonic generators 62 in the two air blowing devices 60 are relatively inclined (as indicated by the arrow toward the glass substrate in FIG. 4) and converge on the glass substrate 40 to be cleaned, and the impurities 42 are subjected to two directions.
  • the vibration of the ultrasonic gas stream is separated from the glass substrate 40.
  • the frequency of the ultrasonic generator 62 is 30K to 100K Hz.
  • each of the air blowing devices 60 is provided with an air outlet 64, and the two air outlets 64 of the two air blowing devices 60 are relatively inclined to make the air outlet direction of the two air outlets 64 (as shown in FIG. 4 toward the glass substrate).
  • the arrow shows a certain angle.
  • the two air blowing devices 60 respectively blow air to the glass substrate 40 to be cleaned through the air outlet 64, and the two ultrasonic generators 62 generate ultrasonic waves so that the airflow blown by the air outlet 64 generates vibrations of the same vibration frequency as the ultrasonic waves, and the vibrations are transmitted to On the impurity 42, the impurity 42 is vibrated to be separated from the glass substrate 40.
  • Step 5 providing an adsorption device 80, the adsorption device 80 includes a suction device 82 and a magnetic device 84, the suction device 82 includes an air inlet 822 disposed between the two air blowing devices 60, the magnetic device 84 Located in the suction port 822 of the air suction device 82.
  • the air suction device 82 further includes a storage portion 824 that communicates with the air inlet 822 and an air suction device (not shown) that is disposed at the end of the storage portion 824 away from the air inlet 822.
  • a spacer (not shown) is disposed between the device and the storage portion 824 to prevent impurities from entering the air extracting device and affecting the service life of the air extracting device.
  • the magnetic device 84 can be a magnet or an electromagnet.
  • the magnetic device 84 is a cylindrical electromagnet, and the cylindrical electromagnet can be optionally installed in the air inlet 822 of the air suction device 82.
  • a rotatable columnar electromagnet is disposed at an air inlet of the existing dry cleaning machine, and two ends of the columnar electromagnet are respectively pivotally connected to the frame, and a trigger switch (not shown) is disposed, The columnar electromagnet is turned on or off according to actual conditions.
  • Step 6 The getter device 82 inhales the glass substrate 40 to be cleaned, and the magnetic device 84 generates magnetic attraction force on the magnetic impurities on the glass substrate 40 to be cleaned, and thus is to be cleared.
  • the impurities 42 on the washed glass substrate 40 are sucked into the adsorption device 80.
  • the present invention also provides a glass substrate cleaning apparatus, comprising: a rack (not shown), a rack-mounted transport platform 20, and a space mounted on the rack and above the transport platform 20.
  • Two air blowing devices 60 are provided, and a suction device 80 mounted on the frame, the adsorption device 80 includes a suction device 82 and a magnetic device 84, and the air suction device 82 is disposed between the two air blowing devices 60.
  • the suction port 822 is located in the suction port 822 of the air suction device 82.
  • An ultrasonic generator 62 is disposed in each of the air blowing devices 60.
  • the ultrasonic waves emitted by the two ultrasonic generators 62 in the two air blowing devices 60 are relatively inclined (as indicated by the arrow toward the glass substrate in FIG. 4) and are concentrated on On the glass substrate 40, the impurities 42 are vibrated by the ultrasonic gas flow in two directions, and are separated from the glass substrate 40.
  • the frequency of the ultrasonic generator 62 is 30K: ⁇ 100K Hz.
  • each of the air blowing devices 60 is provided with an air outlet 64, and the two air outlets 64 of the two air blowing devices 60 are relatively inclined to make the air outlet direction of the two air outlets 64 (as shown in FIG. 4 toward the glass substrate).
  • the arrow shows a certain angle.
  • the two air blowing devices 60 respectively blow air to the glass substrate 40 to be cleaned through the air outlet 64, and the two ultrasonic generators 62 generate ultrasonic waves so that the airflow blown by the air outlet 64 generates vibrations of the same vibration frequency as the ultrasonic waves, and the vibrations are transmitted to On the impurity 42, the impurity 42 is vibrated to be separated from the glass substrate 40.
  • the air suction device 82 further includes a storage portion 824 that communicates with the air inlet 822 and an air suction device (not shown) that is disposed at the end of the storage portion 824 away from the air inlet 822.
  • a spacer (not shown) is disposed between the device and the storage portion 824 to prevent impurities from entering the air extracting device and affecting the service life of the air extracting device.
  • the magnetic device 84 can be a magnet or an electromagnet.
  • the magnetic device 84 is a cylindrical electromagnet, and the cylindrical electromagnet can be optionally installed in the air inlet 822 of the air suction device 82.
  • a rotatable columnar electromagnet is disposed at an air inlet of the existing dry cleaning machine, and two ends of the columnar electromagnet are respectively pivotally connected to the frame, and a trigger switch (not shown) is disposed, The columnar electromagnet is turned on or off according to actual conditions.
  • the method for cleaning a glass substrate of the present invention and the device for realizing the same can effectively remove magnetic impurities by providing a magnetic device in the air inlet of the air suction device, and the air suction device can effectively remove the existing magnetic impurities.
  • the cleaning device has the disadvantage of poor removal ability of the magnetic impurities on the glass substrate, and avoids defects such as bright spots and bright lines of the liquid crystal display panel using the glass substrate, thereby effectively improving the quality of the liquid crystal display panel.

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Liquid Crystal (AREA)

Abstract

一种玻璃基板（40）的清洗方法，包括：步骤1、提供一传送平台（20）及待清洗的玻璃基板（40）；步骤2、将待清洗的玻璃基板（40）置于该传送平台（20）上；步骤3、提供两个吹气装置（60）；步骤4、该两个吹气装置（60）向待清洗的玻璃基板（40）吹气，以使得附着于待清洗的玻璃基板（40）上的杂质（42）脱离玻璃基板（40）；步骤5、提供吸附装置（80）,该吸附装置（80）包括吸气装置（82）及磁吸装置（84）；步骤6、所述吸气装置（82）对待清洗的玻璃基板（40）进行吸气，且该磁吸装置（84）对待清洗的玻璃基板（40）上的磁性杂质产生磁吸力，进而将待清洗的玻璃基板（40）上的杂质（42）吸入吸附装置（80）内。还提供了一种玻璃基板（40）的清洗装置。

Description

玻璃基板的清洗方法及实现该方法的装置 技术领域
本发明涉及一种清洗方法， 尤其涉及一种玻璃基板的清洗方法及实现 该方法的装置。 背景技术
液晶显示装置 （LCD, Liquid Crystal Display )具有机身薄、 省电、 无 辐射等众多优点， 得到了广泛的应用。 现有市场上的液晶显示装置大部分 为背光型液晶显示器， 其包括液晶显示面板及背光模组 （ backlight module ) 。 液晶显示面板的工作原理是在两片平行的玻璃基板中放置液晶 分子， 通过给玻璃基板的电路通电来控制液晶分子改变方向， 将背光模组 的光线折射出来产生画面。
在液晶显示面板的制作过程中， 经常会有杂质残留于玻璃基板， 而导 致液晶显示面板出现亮点或亮线等缺陷， 影响显示效果。
现有的玻璃基板清洗装置一般为干式清洗机， 请参阅图 1 , 该干式清 洗机包括： 用于承载及运输玻璃基板的传送平台 100、 位于传送平台 100 上方的两个吹气装置 300及位于传送平台 100上方的吸气装置 500, 所述 吸气装置 500具有一吸气口 502及与吸气口 502连通设置的储杂部 504, 该吸气口 502位于所述两吹气装置 300之间， 所述储杂部 504位于两吹气 装置 300 上方， 其中， 两个吹气装置 300 上分别设有一超声波发生器 302 , 用于发射超声波至玻璃基板 700 表面， 以使得附着于该表面的杂质 702受到振动而脱离玻璃基板 700, 同时， 所述吸气装置 500对该杂质 702 吸气， 将杂质 702吸入吸气装置 500内， 并存储于储杂部 504内， 进而实 现玻璃基板 700的表面除杂。
然而， 请参阅图 2, 当杂质 702为颗粒较大的金属杂质时， 由于该杂 质 702的重量较大， 可能导致该杂质 702无法被吸附于吸气装置 500内， 导致玻璃基板 700的清洗不彻底， 进而影响用该玻璃基板 700制得的液晶 显示面板的显示效果。 发明内容
本发明的目的在于提供一种玻璃基板的清洗方法， 能有效去除玻璃基 板上的杂质， 尤其对磁性杂质的除杂效果更为明显。 本发明的另一目的在于提供一种玻璃基板的清洗装置， 其结构简单， 对磁性杂质的除杂效果好。
为实现上述目的， 提供一种玻璃基板的清洗方法， 包括以下步骤： 步骤 1、 提供一传送平台及待清洗的玻璃基板， 所述待清洗的玻璃基 板上附着有杂质， 所述杂质包括磁性杂质与非磁性杂质；
步骤 2、 将待清洗的玻璃基板置于该传送平台上；
步骤 3、 提供两个吹气装置， 该两吹气装置间隔设置于传送平台上 方；
步骤 4、 该两个吹气装置向待清洗的玻璃基板吹气， 以使得附着于待 清洗的玻璃基板上的杂质脱离玻璃基板；
步骤 5、 提供吸附装置， 该吸附装置包括吸气装置及磁吸装置， 该吸 气装置包括置于两吹气装置之间的吸气口， 所述磁吸装置位于吸气装置吸 气口内；
步骤 6、 所述吸气装置对待清洗的玻璃基板进行吸气， 且该磁吸装置 对待清洗的玻璃基板上的磁性杂质产生磁吸力， 进而将待清洗的玻璃基板 上的杂质吸入吸附装置内。
所述每一吹气装置内设有一超声波发生器， 该两个吹气装置内的两超 声波发生器发出的超声波相对倾斜并汇聚于待清洗的玻璃基板上， 超声波 发生器的频率为 30K〜100K Hz。
所述吸气装置还包括连通吸气口的储杂部及设于储杂部远离吸气口端 的抽气装置。
所述抽气装置与储杂部之间设有隔离网。
所述磁吸装置为一柱状电磁铁。
本发明还提供一种玻璃基板的清洗装置， 包括： 机架、 安装于机架上 的传送平台、 安装于机架上且位于传送平台上方的间隔设置的两个吹气装 置及安装于机架上的吸附装置， 所述吸附装置包括吸气装置及磁吸装置， 该吸气装置包括置于两吹气装置之间的吸气口， 所述磁吸装置位于吸气装 置吸气口内。
所述每一吹气装置内设有一超声波发生器， 该两个吹气装置内的两超 声波发生器发出的超声波相对倾斜并汇聚于待清洗的玻璃基板上， 超声波 发生器的频率为 30K〜100K Hz。
所述吸气装置还包括连通吸气口的储杂部及设于储杂部远离吸气口端 的抽气装置。
所述抽气装置与储杂部之间设有隔离网。 所述磁吸装置为一柱状电磁铁。
本发明还提供一种玻璃基板的清洗装置， 包括： 机架、 安装于机架上 的传送平台、 安装于机架上且位于传送平台上方的间隔设置的两个吹气装 置及安装于机架上的吸附装置， 所述吸附装置包括吸气装置及磁吸装置， 该吸气装置包括置于两吹气装置之间的吸气口， 所述磁吸装置位于吸气装 置吸气口内；
其中， 所述每一吹气装置内设有一超声波发生器， 该两个吹气装置内 的两超声波发生器发出的超声波相对倾斜并汇聚于待清洗的玻璃基板上， 超声波发生器的频率为 30K〜100K Hz;
其中， 所述吸气装置还包括连通吸气口的储杂部及设于储杂部远离吸 气口端的抽气装置。
所述抽气装置与储杂部之间设有隔离网。
所述磁吸装置为一柱状电磁铁。
本发明的有益效果： 本发明的玻璃基板的清洗方法及实现该方法的装 置， 通过在吸气装置的吸气口内设置磁吸装置， 配合吸气装置， 能有效去 除磁性杂质， 进而克服了现有清洗装置对玻璃基板上重量较大的磁性杂质 去除能力差的缺陷， 避免了因此导致的使用该玻璃基板的液晶显示面板亮 点、 亮线等缺陷， 有效提升液晶显示面板的品质。
为了能更进一步了解本发明的特征以及技术内容， 请参阅以下有关本 发明的详细说明与附图， 然而附图仅提供参考与说明用， 并非用来对本发 明加以限制。 附图说明
下面结合附图， 通过对本发明的具体实施方式详细描述， 将使本发明 的技术方案及其它有益效果显而易见。
附图中，
图 1为现有的玻璃基板的清洗装置的简易结构示意图；
图 2为玻璃基板附着有大体积金属杂质的示意图；
图 3为本发明玻璃基板的清洗方法的流程图；
图 4为本发明玻璃基板的清洗装置的简易结构示意图。 具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果， 以下结合本发明 的优选实施例及其附图进行详细描述。 请参阅图 3及图 4, 本发明提供一种玻璃基板的清洗方法， 包括以下 步骤：
步骤 1、 提供一传送平台 20及待清洗的玻璃基板 40, 所述待清洗的 玻璃基板 40上附着有杂质 42, 所述杂质 42包括磁性杂质与非磁性杂质。
步骤 2、 将待清洗的玻璃基板 40置于该传送平台 20上。
步骤 3、 提供两个吹气装置 60, 该两吹气装置 60 间隔设置于传送平 台 20上方。
优选的， 所述每一吹气装置 60内设有一超声波发生器。
步骤 4、 该两个吹气装置 60向待清洗的玻璃基板 40吹气， 以使得附 着于待清洗的玻璃基板 40 上的杂质 42脱离玻璃基板 40。 该两吹气装置 60 内的两超声波发生器 62发出的超声波相对倾斜（如图 4中朝向玻璃基 板的箭头所示 ) 并汇聚于待清洗的玻璃基板 40上， 所述杂质 42受到两个 方向的超声波气流的振动， 与玻璃基板 40 分离。 在本实施例中， 所述超 声波发生器 62的频率为 30K〜100K Hz。
具体地， 所述每一吹气装置 60设有一出风口 64, 该两个吹气装置 60 的两出风口 64相对倾斜设置， 使两出风口 64的出风方向 （如图 4中朝向 玻璃基板的箭头所示）形成一定的夹角。 所述两个吹气装置 60 分别通过 出风口 64向待清洗的玻璃基板 40吹风， 两超声波发生器 62产生超声波 使得由出风口 64 吹出的气流产生与超声波相同振动频率的振动， 该振动 传递到杂质 42上， 使得杂质 42振动而脱离玻璃基板 40。
步骤 5、 提供吸附装置 80, 该吸附装置 80包括吸气装置 82及磁吸装 置 84, 该吸气装置 82包括置于两吹气装置 60之间的吸气口 822, 所述磁 吸装置 84位于吸气装置 82吸气口 822内。
值得一提的是， 所述吸气装置 82还包括连通吸气口 822的储杂部 824 及设于储杂部 824远离吸气口 822端的抽气装置 （未图示） ， 所述抽气装 置与储杂部 824之间设有隔离网 （未图示） 以防止杂质进入抽气装置， 而 影响抽气装置的使用寿命。
所述磁吸装置 84可选用磁铁或电磁铁， 在本实施例中， 磁吸装置 84 为一柱状电磁铁， 且， 该柱状电磁铁可选择安装于吸气装置 82 的吸气口 822 内。 具体的， 在现有的干式洗净机的吸气口设置一可旋转的柱状电磁 铁， 该柱状电磁铁的两端分别枢接于机架上， 并设置触发开关 （未图 示） ， 以根据实际情况开启或关闭该柱状电磁铁。
步骤 6、 所述吸气装置 82对待清洗的玻璃基板 40进行吸气， 且该磁 吸装置 84对待清洗的玻璃基板 40上的磁性杂质产生磁吸力， 进而将待清 洗的玻璃基板 40上的杂质 42吸入吸附装置 80内。
请参阅图 4 , 本发明还提供一种玻璃基板的清洗装置， 包括： 机架 (未图示） 、 安装于机架上的传送平台 20、 安装于机架上且位于传送平台 20上方的间隔设置的两个吹气装置 60及安装于机架上的吸附装置 80, 该 吸附装置 80包括吸气装置 82及磁吸装置 84, 该吸气装置 82包括置于两 吹气装置 60之间的吸气口 822 , 所述磁吸装置 84位于吸气装置 82吸气口 822内。
所述每一吹气装置 60内设有一超声波发生器 62, 该两吹气装置 60内 的两超声波发生器 62发出的超声波相对倾斜（如图 4 中朝向玻璃基板的 箭头所示 )并汇聚于玻璃基板 40上， 所述杂质 42受到两个方向的超声波 气流的振动， 与玻璃基板 40分离。 在本实施例中， 所述超声波发生器 62 的频率为 30K：〜 100K Hz。
具体地， 所述每一吹气装置 60设有一出风口 64, 该两个吹气装置 60 的两出风口 64相对倾斜设置， 使两出风口 64的出风方向 （如图 4中朝向 玻璃基板的箭头所示）形成一定的夹角。 所述两个吹气装置 60 分别通过 出风口 64向待清洗的玻璃基板 40吹风， 两超声波发生器 62产生超声波 使得由出风口 64 吹出的气流产生与超声波相同振动频率的振动， 该振动 传递到杂质 42上， 使得杂质 42振动而脱离玻璃基板 40。
值得一提的是， 所述吸气装置 82还包括连通吸气口 822的储杂部 824 及设于储杂部 824远离吸气口 822端的抽气装置 （未图示） ， 所述抽气装 置与储杂部 824之间设有隔离网 （未图示） 以防止杂质进入抽气装置， 而 影响抽气装置的使用寿命。
所述磁吸装置 84可选用磁铁或电磁铁， 在本实施例中， 磁吸装置 84 为一柱状电磁铁， 且， 该柱状电磁铁可选择安装于吸气装置 82 的吸气口 822 内。 具体的， 在现有的干式洗净机的吸气口设置一可旋转的柱状电磁 铁， 该柱状电磁铁的两端分别枢接于机架上， 并设置触发开关 （未图 示） ， 以根据实际情况开启或关闭该柱状电磁铁。
综上所述， 本发明的玻璃基板的清洗方法及实现该方法的装置， 通过 在吸气装置的吸气口内设置磁吸装置， 配合吸气装置， 能有效去除磁性杂 质， 进而克服了现有清洗装置对玻璃基板上重量较大的磁性杂质去除能力 差的缺陷， 避免了因此导致的使用该玻璃基板的液晶显示面板亮点、 亮线 等缺陷， 有效提升液晶显示面板的品质。
以上所述， 对于本领域的普通技术人员来说， 可以根据本发明的技术 方案和技术构思作出其他各种相应的改变和变形， 而所有这些改变和变形 都应属于本发明权利要求的保护范围

Claims

权 利 要 求
1、 一种玻璃基板的清洗方法， 包括以下步骤：
步骤 1、 提供一传送平台及待清洗的玻璃基板， 所述待清洗的玻璃基 板上附着有杂质， 所述杂质包括磁性杂质与非磁性杂质；
步骤 2、 将待清洗的玻璃基板置于该传送平台上；
步骤 3、 提供两个吹气装置， 该两吹气装置间隔设置于传送平台上 方；
步骤 4、 该两个吹气装置向待清洗的玻璃基板吹气， 以使得附着于待 清洗的玻璃基板上的杂质脱离玻璃基板；
步骤 5、 提供吸附装置， 该吸附装置包括吸气装置及磁吸装置， 该吸 气装置包括置于两吹气装置之间的吸气口， 所述磁吸装置位于吸气装置吸 气口内；
步骤 6、 所述吸气装置对待清洗的玻璃基板进行吸气， 且该磁吸装置 对待清洗的玻璃基板上的磁性杂质产生磁吸力， 进而将待清洗的玻璃基板 上的杂质吸入吸附装置内。
2、 如权利要求 1 所述的玻璃基板的清洗方法， 其中， 所述每一吹气 装置内设有一超声波发生器， 该两个吹气装置内的两超声波发生器发出的 超声波相对倾斜并汇聚于待清洗的玻璃基板上， 超声波发生器的频率为 30K〜100K Hz。
3、 如权利要求 1 所述的玻璃基板的清洗方法， 其中， 所述吸气装置 还包括连通吸气口的储杂部及设于储杂部远离吸气口端的抽气装置。
4、 如权利要求 3 所述的玻璃基板的清洗方法， 其中， 所述抽气装置 与储杂部之间设有隔离网。
5、 如权利要求 1 所述的玻璃基板的清洗方法， 其中， 所述磁吸装置 为一柱状电磁铁。
6、 一种玻璃基板的清洗装置， 包括： 机架、 安装于机架上的传送平 台、 安装于机架上且位于传送平台上方的间隔设置的两个吹气装置及安装 于机架上的吸附装置， 所述吸附装置包括吸气装置及磁吸装置， 该吸气装 置包括置于两吹气装置之间的吸气口， 所述磁吸装置位于吸气装置吸气口 内。
7、 如权利要求 6 所述的玻璃基板的清洗装置， 其中， 所述每一吹气 装置内设有一超声波发生器， 该两个吹气装置内的两超声波发生器发出的 超声波相对倾斜并汇聚于待清洗的玻璃基板上， 超声波发生器的频率为
30K：〜 100K Hz。
8、 如权利要求 6 所述的玻璃基板的清洗装置， 其中， 所述吸气装置 还包括连通吸气口的储杂部及设于储杂部远离吸气口端的抽气装置。
9、 如权利要求 8 所述的玻璃基板的清洗装置， 其中， 所述抽气装置 与储杂部之间设有隔离网。
10、 如权利要求 6所述的玻璃基板的清洗装置， 其中， 所述磁吸装置 为一柱状电磁铁。
11、 一种玻璃基板的清洗装置， 包括： 机架、 安装于机架上的传送平 台、 安装于机架上且位于传送平台上方的间隔设置的两个吹气装置及安装 于机架上的吸附装置， 所述吸附装置包括吸气装置及磁吸装置， 该吸气装 置包括置于两吹气装置之间的吸气口， 所述磁吸装置位于吸气装置吸气口 内；
其中， 所述每一吹气装置内设有一超声波发生器， 该两个吹气装置内 的两超声波发生器发出的超声波相对倾斜并汇聚于待清洗的玻璃基板上， 超声波发生器的频率为 30K〜100K Hz;
其中， 所述吸气装置还包括连通吸气口的储杂部及设于储杂部远离吸 气口端的抽气装置。
12、 如权利要求 11 所述的玻璃基板的清洗装置， 其中， 所述抽气装 置与储杂部之间设有隔离网。
13、 如权利要求 11 所述的玻璃基板的清洗装置， 其中， 所述磁吸装 置为一柱状电磁铁。
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