WO2014023617A1 - Optoelektronisches halbleiterbauteil, konversionsmittelplättchen und verfahren zur herstellung eines konversionsmittelplättchens - Google Patents
Optoelektronisches halbleiterbauteil, konversionsmittelplättchen und verfahren zur herstellung eines konversionsmittelplättchens Download PDFInfo
- Publication number
- WO2014023617A1 WO2014023617A1 PCT/EP2013/066011 EP2013066011W WO2014023617A1 WO 2014023617 A1 WO2014023617 A1 WO 2014023617A1 EP 2013066011 W EP2013066011 W EP 2013066011W WO 2014023617 A1 WO2014023617 A1 WO 2014023617A1
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- WIPO (PCT)
- Prior art keywords
- conversion
- agent particles
- conversion agent
- layer
- particles
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/505—Wavelength conversion elements characterised by the shape, e.g. plate or foil
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/508—Wavelength conversion elements having a non-uniform spatial arrangement or non-uniform concentration, e.g. patterned wavelength conversion layer, wavelength conversion layer with a concentration gradient of the wavelength conversion material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
- H01L33/502—Wavelength conversion materials
- H01L33/504—Elements with two or more wavelength conversion materials
Definitions
- An optoelectronic semiconductor component is specified.
- this includes
- Optoelectronic semiconductor device at least one
- the semiconductor chip is set up to generate a primary radiation.
- Primary radiation is preferably ultraviolet radiation, blue light or green light.
- the semiconductor chip is preferably a light-emitting diode chip, or LED chip for short.
- the semiconductor component can then be a light-emitting diode module.
- this includes
- Semiconductor component at least one conversion agent platelet.
- the conversion agent tile is adapted to the Partially or completely absorbing primary radiation and partially or completely absorbing secondary radiation
- the secondary radiation in particular has a greater wavelength than the primary radiation.
- Spectral width of the secondary radiation may exceed a spectral width of the primary radiation.
- Conversion medium platelets attached directly or indirectly to a main radiation side of the semiconductor chip. This may mean that the conversion agent plate touches the main radiation side or that between the main radiation side and the conversion medium plate only a connecting means for fixing the
- Conversion medium platelets is located.
- Radiation main side of the semiconductor chip is in particular that main side on which the semiconductor chip in
- Radiation main side can by a radiation-transparent substrate of the semiconductor chip or by an epitaxially grown semiconductor material or by a
- Seal layer of the semiconductor chip may be formed.
- this includes
- Conversion medium platelets a matrix material.
- Matrix material is preferably clear for the
- the matrix material is a silicone, an epoxy or a silicone-epoxy hybrid material. In accordance with at least one embodiment, this includes
- Conversion agent platelets at least one or more varieties of conversion agent particles.
- Conversion agent particles are in the matrix material
- Conversion agent particles are surrounded around the matrix material.
- Conversion medium platelets on a conversion layer is one such layer of the conversion agent wafer that is closest to the semiconductor chip.
- the conversion layer are the conversion agent particles.
- Conversion agent particles alone or together with optiona existing diffusion media particles, with a
- the conversion agent particles i of the conversion layer are packed tightly or almost densely.
- Conversion medium platelets at least one binding layer.
- the bonding layer is in particular that layer of the conversion agent platelet which is furthest away from the semiconductor chip.
- a volume fraction of the conversion agent particles in the bonding layer is at most 2.5% or at most 1% or at most 0.5%. Is preferred the binding layer free of the conversion agent particles.
- the binder layer may contain diffuser particles.
- the binding layer immediately follows the at least one conversion layer.
- the binding layer produces a mechanical connection of the conversion agent particles with one another.
- the tie layer may be the the conversion agent platelet
- Binding layer and the conversion layer each one
- the binding layer and the conversion layer have the same matrix material.
- Example are the conversion agent particles in the
- this includes
- Optoelectronic semiconductor device one or more optoelectronic semiconductor chips for generating a
- the semiconductor component comprises at least one conversion medium plate, which is attached to a main radiation side of the semiconductor chip and which is adapted for the at least partial conversion of the primary radiation into a secondary radiation.
- Conversion agent plate has a matrix material and embedded therein conversion agent particles. Furthermore, the conversion agent platelet comprises one or more
- Conversion medium particles The conversion agent particles, alone or together with optional ones
- Diffusion agent particles make up a volume fraction of at least 50% of the conversion layer. Further, the conversion agent pad includes a tie layer farthest from the semiconductor chip. In the bonding layer, the conversion agent particles are present with a volume fraction of at most 2.5 ⁇ 6.
- Such a conversion agent plate can be produced efficiently by means of electrophoresis. Further, in such a conversion agent plate is a good thermal contact between the conversion agent particles and the
- a volume fraction of the conversion agent particles in the conversion layer is comparatively low, since there are generally at least small fractions of the matrix material between adjacent conversion agent particles.
- Conversion agent on a semiconductor chip is the conversion agent particles directly on the
- Reproducibility of the process depends on the exact geometry and also tolerances in an assembly of the Semiconductor chips can influence the resulting color location by a varying layer thickness of the conversion agent layer.
- Conversion medium platelets exactly two, exactly three or more than three of the conversion layers. It is also possible that the conversion agent platelets exactly one
- Conversion layer includes. Does that know
- Conversion medium platelets multiple conversion layers, they may be the same or different
- the comprises
- a further conversion layer comprises second conversion agent particles.
- the further conversion layer follows the conversion layer closest to the semiconductor chip.
- Conversion medium particles For example, of the first conversion agent particles of blue light becomes red light and green light from the second blue medium conversion agent particles. Alternatively, it is also possible that the first conversion agent particles for
- Generation of short-wave light are set up, compared to the second conversion agent particles.
- Conversion agent particles which are located in the semiconductor chip closest conversion layer, a smaller average diameter than the second
- the average diameters differ by at least a factor of 1.5 or by at least a factor of 2 or by at least a factor of 3.
- Conversion agent particles also have a larger mean
- the first and / or the second conversion agent particles are in each case alone or together with the optionally present ones
- Conversion agent particles alone or together with the optional diffuser particles, many through
- Diffusion agent particles thus preferably have one
- a volume fraction of the conversion agent particles, alone or together with the optional diffusion agent particles is at least 70%. or at least 80% or at least 90% of
- the densest packing of these conversion agent particles is the densest sphere packing.
- a volume share is about 74%.
- volume fraction is above the volume fraction for the densest spherical packing for spherical particles of the same diameter.
- the first and / or the second conversion agent particles have a
- the average diameter is at most 5.0 ym or at most 4.0 ym or at most 3.0 ym.
- Conversion agent particles have an average diameter of at least 5 ym or at least 7.5 ym or of
- the mean diameter is at most 25 ym or at most 20 ym or at most 15 ym. According to at least one embodiment, this includes
- Semiconductor device a carrier with a carrier top.
- the carrier is preferably the component mechanically stabilizing and carrying the semiconductor component.
- the semiconductor chip is directly or indirectly on the top of the carrier
- Connecting means for fixing the semiconductor chip
- the conversion agent plate does not touch the carrier.
- a distance between the carrier and the conversion medium plate corresponds, for example, to at least the thickness of the semiconductor chip.
- Conversion agent platelets have a thickness of at least 30 ym or at least 50 ym or at least 70 ym.
- the bonding layer has a proportion of the thickness of the conversion agent platelets of at least 60% or at least 70% or at least 80%. Alternatively or additionally, this percentage is at most 95% or at most 90% or at most 85%. In other words, a majority of the thickness of the conversion agent chip makes up the bonding layer.
- Thin can mean that the transition region has a thickness of at most 1.5 times, at most 1.0 times or at most 0.5 times the mean diameter of the Conversion agent particles of these adjacent
- Conversion layers apply, in which case in particular the average diameter of the smaller conversion agent particles is used. In other words, then the conversion agent particles of the conversion layers do not mix and the individual conversion layers are sharp
- the conversion layer located closer to the semiconductor chip also comprises conversion agent particles from the at least one further conversion layer.
- Conversion agent particles from the further conversion layer is then, for example, at least 2.5% by volume or at least 5% by volume and alternatively or additionally at most 20% by volume or at most 15% by volume.
- the conversion agent particles from the further conversion layer have a small mean
- the further one is selected from:
- Conversion layer which is located farther away from the semiconductor chip, free of conversion agent particles from the closer to the semiconductor chip
- Conversion layer In other words, it is possible that mixing of the conversion agent particles toward the semiconductor chip is possible, in the direction away from the semiconductor chip
- Conversion medium platelets limited to the main radiation side of the semiconductor chip. It is thus possible that the conversion agent plate does not project beyond the main radiation side laterally or not significantly. It is also possible for the conversion medium plate and the semiconductor chip to terminate laterally flush with a tolerance of at most 5 ⁇ m or at most 50 ⁇ m all around.
- this includes
- the diffusion agent particles are preferably from a
- the diffusing agent particles are made of silicon oxide
- Alumina or formed from aluminum nitride is Alumina or formed from aluminum nitride.
- Diffusing agent particles can have a spherical basic form. According to at least one embodiment, the
- Diffusing agent particles have an average diameter of at least 2 ym or at least 3 ym. Alternatively or additionally, the average diameter of the
- a volume fraction of the diffusion agent particles lies in the at least one
- Diffusion agent particles in the bonding layer with a Volume fraction of at least 1.0% or at least 2.5% or at least 5%. This volume fraction in the binding layer is for example at most 30% or at most 20% or at most 15%.
- the conversion agent wafer is intended in particular for an optoelectronic semiconductor component, as in
- Conversion medium plate mechanically self-supporting. This may mean that the conversion agent platelets by means of a pick and place machine, English pick-and-place machine,
- Conversion medium platelets a mechanically coherent, not decaying unit under normal use.
- Optoelectronic semiconductor device is used. Characteristics of the method are therefore also for that
- Conversion medium platelets as well as for the optoelectronic semiconductor device disclosed and vice versa.
- the method comprises at least or exactly the following steps:
- the application of the conversion agent particles by means of electrophoresis is preferably by means of a
- Liquid phase process such as a dispensing or printing applied.
- the step of applying the matrix material follows the step of applying the conversion agent particles. In other words, then all the conversion agent particles can be applied before the matrix material is added.
- the method takes place with the aid of an intermediate carrier.
- the intermediate carrier has a carrier top side. It includes the intermediate carrier an electrically insulating masking layer or it is at the top of the intermediate carrier such
- the masking layer preferably comprises a plurality of openings.
- the openings are designed to deposit the conversion agent particles in the openings in an electrophoretically targeted manner.
- an electrically conductive material is located in the openings.
- the electrically conductive material may be exposed and form an upper side of the intermediate carrier.
- the electrically conductive layer of one in comparison is covered to the masking layer thin, further insulating layer.
- one form of the conversion agent platelets in particular in FIG. 1
- the openings for the matrix material act as a kind of casting mold. Specifically, it can be dispensed with a separation of the conversion agent platelets, after the detachment from the intermediate carrier.
- Figure 1 is a schematic sectional view of a
- FIGS. 1 to 5 are schematic sectional views of
- FIG. 1 is an embodiment of a
- the semiconductor component comprises a carrier 2 with a carrier top 20.
- the carrier 2 includes unshown interconnects and electrical contact structures for connecting a
- the semiconductor chip 3 which is preferably a light-emitting diode chip, is attached to the carrier top side 20.
- the semiconductor chip 3 faces away from the carrier 2.
- the semiconductor chip 3 emits blue light during operation.
- the semiconductor device 1 comprises a
- connection means 5 is in particular a silicone adhesive.
- a thickness of the bonding agent 5 is preferably at most 6 ⁇ m or at most 4 ⁇ m.
- the conversion agent plate 4 comprises a
- Conversion layer 41a and a bonding layer 41c Conversion layer 41a and a bonding layer 41c.
- the two layers 41a, 41c follow each other directly and are mechanically firmly connected.
- the layers 41a, 41c of the conversion medium plate 4 are symbolically separated from each other by a dashed line.
- conversion agent particles 43 are densely packed. A volume fraction of
- Conversion agent particles 43 at the conversion layer 41a is, for example, about 75%.
- Conversion agent particles 43 may be approximately spherically shaped.
- the conversion agent particles 43 are based on a rare earth-doped garnet,
- the conversion agent particles 43 are set up to produce yellow light.
- the bonding layer 41c is free from the
- the matrix material 42 and the conversion agent particles 43 are mechanically connected to each other. Via the matrix material 42, a mechanical integrity of the conversion medium plate 4 is achieved.
- the matrix material 42 is, for example, a
- Methylsiloxane or a phenylsiloxane is Methylsiloxane or a phenylsiloxane.
- Binding layer 41c preferably exceeds a thickness of
- the bonding layer 41c has a surface facing away from the conversion layer 41a, which forms a platelet top side 40 of the conversion agent platelet 4.
- the wafer top 40 is an exposed surface of the wafer
- FIG. 2 shows a further exemplary embodiment of the invention
- Conversion medium platelet 4 shown. According to FIG. 4 the conversion agent plate 4 two conversion layers 41a, 41b. The further conversion layer 41b is disposed between the first conversion layer 41a and the bonding layer 41c. The conversion agent particles 43a in the
- Conversion layer 41a have a smaller diameter than the conversion agent particles 43b in the
- the two conversion layers 41a, 41b have only a thin transition region, so that the conversion agent particles 43a, 43b are separated from one another and do not or not substantially mix.
- the first conversion layer 41a has a higher one
- Conversion layer 41a has a larger volume fraction of conversion agent particles than the other
- the smaller average diameter conversion agent particles 43a are, for example, a conversion agent for generating red light.
- Conversion agent particles 43b with the larger average diameter are particularly adapted to produce green light.
- Conversion agent particles 43a are closer to the not
- Conversion layer 41a is a higher temperature stability and a longer life reachable, since specifically red-emitting conversion agent particles are more sensitive to elevated temperatures and also a stronger
- remote platelet top 40 are located.
- Platelet top 40 are present, but that a
- Diffusion agent particles 45 remain the same or increase.
- the gradient toward the wafer top 40 can be both volume fractional
- Conversion medium plate 4 according to Figure 3 is a
- Conversion agent particles 43a, 43b reversed, in comparison to Figure 2.
- the conversion agent particles 43a with the smaller diameter partially enter the conversion layer 41a with the conversion agent particles 43a with the larger
- Conversion layers 41a, 41b has.
- an additional conversion layer for generating yellow light may be present.
- Diffusionsmittelp Microwaves GmbH 45, hatched drawn.
- the diffusion agent particles 45 for example, by
- Silica particles are formed, can occur both in the conversion layer 41a and in the bonding layer 41c or even in only one of these layers 41a, 41c.
- a volume fraction of the diffusion agent particles 45 may be in the conversion layer 41a of a volume fraction in the
- Tie layer 41c be different or equal. Such diffusion agent particles 45 may also be present in all other embodiments.
- a wafer top 40 which faces away from the semiconductor chip 3 in the semiconductor component 1, is curved.
- the Platelet top 40 shaped in the form of a converging lens.
- the wafer top 40 may also have other, non-planar shapes, for example
- One of the platelet upper side 40 opposite underside of the conversion medium plate 4 is preferably planar and planar.
- the conversion plate 4 has two
- Bonding layers 41c, 41d and a scattering layer 41e which is located between the two bonding layers 41c, 41d.
- the scattering layer 41e is thus spaced from the conversion layer 41a.
- Platelet top 40 may be thicker than the other
- Tie layer 41d different from drawn.
- FIG. 6 shows an embodiment of a
- the intermediate carrier 6 comprises a substrate 61 and a continuous, electrically conductive layer 62, for example of a transparent conductive oxide such as ITO or aluminum-doped tin oxide. It is also possible that the electrically conductive layer 62 of a
- the masking layer 7 is made of a material having a comparatively low
- the conversion agent particles 43 are deliberately deposited in the openings 74 on the electrically conductive layer 62.
- the electrically conductive layer 62 At the electrically conductive
- Layer 62 is hereby applied a voltage for electrophoresis.
- the particles 43 are deposited tightly packed.
- Grain size distributions are deposited in one or more layers, as indicated in connection in particular with the figures 2 to 5.
- the opening 74 is completely filled up. Notwithstanding this, it is also possible that the matrix material projects beyond the opening 74 or does not completely fill the opening 74.
- the matrix material 42 is preferably applied to the conversion agent particles 43 in a low-viscosity state so that the liquid matrix material 42 has spaces between them
- Conversion agent particles 43 completely or partially fills and so that after curing, a mechanically cohesive conversion agent plate 4 is formed.
- a mounting carrier 8 is applied and, compare FIG. 6E, the conversion agent plate 4 is released from the intermediate carrier 6 with the masking layer 7.
- Conversion medium wafer 4 is shown in FIG. According to FIG. 7, the electrically conductive layer 62 is structured and connected to the substrate 61 by means of plated-through holes 64 with an electrode 63.
- the method steps can be carried out analogously to the method according to FIG.
- the intermediate carrier 6 in this case comprises a plurality of openings 74.
- the openings 74 have a square basic shape, wherein a recess 44 is present in one of the corners. By the recess 44 is in the
- Bonding wire ready for contacting the semiconductor chip.
- two of the recesses 44 are provided on two opposite longitudinal sides, via which recesses for two bonding wires can be realized.
- corresponding indentations 44 can also be mounted centrally in the openings 74 or in one of the
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015525824A JP2015524620A (ja) | 2012-08-08 | 2013-07-30 | オプトエレクトロニクス半導体デバイス、変換手段プレートおよび変換手段プレートの製造方法 |
US14/420,310 US9406847B2 (en) | 2012-08-08 | 2013-07-30 | Optoelectronic semiconductor component, conversion-medium lamina and method for producing a conversion-medium lamina |
CN201380042300.XA CN104521015B (zh) | 2012-08-08 | 2013-07-30 | 光电子半导体构件、转换介质小板和用于制造转换介质小板的方法 |
KR1020157003958A KR102033203B1 (ko) | 2012-08-08 | 2013-07-30 | 광전자 반도체 소자, 변환 매체 박판 및 변환 매체 박판의 제조를 위한 방법 |
DE112013003979.6T DE112013003979B4 (de) | 2012-08-08 | 2013-07-30 | Optoelektronisches Halbleiterbauteil, Konversionsmittelplättchen und Verfahren zur Herstellung eines Konversionsmittelplättchens |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102012107290.6 | 2012-08-08 | ||
DE102012107290.6A DE102012107290A1 (de) | 2012-08-08 | 2012-08-08 | Optoelektronisches Halbleiterbauteil, Konversionsmittelplättchen und Verfahren zur Herstellung eines Konversionsmittelplättchens |
Publications (1)
Publication Number | Publication Date |
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WO2014023617A1 true WO2014023617A1 (de) | 2014-02-13 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/EP2013/066011 WO2014023617A1 (de) | 2012-08-08 | 2013-07-30 | Optoelektronisches halbleiterbauteil, konversionsmittelplättchen und verfahren zur herstellung eines konversionsmittelplättchens |
Country Status (6)
Country | Link |
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US (1) | US9406847B2 (de) |
JP (1) | JP2015524620A (de) |
KR (1) | KR102033203B1 (de) |
CN (1) | CN104521015B (de) |
DE (2) | DE102012107290A1 (de) |
WO (1) | WO2014023617A1 (de) |
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DE102015116710A1 (de) * | 2015-10-01 | 2017-04-06 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement |
DE102017117488A1 (de) * | 2017-08-02 | 2019-02-07 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement |
DE102017121185A1 (de) * | 2017-09-13 | 2019-03-14 | Osram Gmbh | Optoelektronisches Bauelement und Verfahren zur Herstellung eines optoelektronischen Bauelements |
JP2019050391A (ja) * | 2018-10-25 | 2019-03-28 | 日亜化学工業株式会社 | 発光装置 |
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JP7304507B2 (ja) * | 2018-04-26 | 2023-07-07 | パナソニックIpマネジメント株式会社 | 波長変換素子、蛍光体ホイール、光源装置、及び投写型映像表示装置 |
US11923482B2 (en) * | 2020-09-29 | 2024-03-05 | Lumileds Llc | Ultra-thin phosphor layers partially filled with Si-based binders |
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Also Published As
Publication number | Publication date |
---|---|
CN104521015B (zh) | 2017-06-13 |
CN104521015A (zh) | 2015-04-15 |
US20150200339A1 (en) | 2015-07-16 |
JP2015524620A (ja) | 2015-08-24 |
KR102033203B1 (ko) | 2019-10-16 |
DE102012107290A1 (de) | 2014-02-13 |
KR20150040933A (ko) | 2015-04-15 |
US9406847B2 (en) | 2016-08-02 |
DE112013003979B4 (de) | 2021-12-09 |
DE112013003979A5 (de) | 2015-05-28 |
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