WO2011090057A1 - 基板、基板に対する露光方法、光配向処理方法 - Google Patents

基板、基板に対する露光方法、光配向処理方法 Download PDF

Info

Publication number
WO2011090057A1
WO2011090057A1 PCT/JP2011/050829 JP2011050829W WO2011090057A1 WO 2011090057 A1 WO2011090057 A1 WO 2011090057A1 JP 2011050829 W JP2011050829 W JP 2011050829W WO 2011090057 A1 WO2011090057 A1 WO 2011090057A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
exposure
mask
display
certain size
Prior art date
Application number
PCT/JP2011/050829
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
貴浩 平子
Original Assignee
シャープ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by シャープ株式会社 filed Critical シャープ株式会社
Priority to CN201180006810.2A priority Critical patent/CN102725680B/zh
Priority to JP2011550921A priority patent/JP5351287B2/ja
Publication of WO2011090057A1 publication Critical patent/WO2011090057A1/ja

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation

Definitions

  • the present invention relates to a substrate, an exposure method for the substrate, and a photo-alignment processing method, and more particularly, a substrate for a liquid crystal display panel or a substrate for manufacturing a liquid crystal display panel, which is suitable for photo-alignment processing. And an exposure method for the substrate and a photo-alignment processing method to which the exposure method is applied.
  • a general liquid crystal display panel includes two display panel substrates, these two substrates are arranged to face each other at a predetermined minute interval, and liquid crystal is filled between them. It has the configuration.
  • an alignment film for defining the alignment of liquid crystal is formed on a substrate for a liquid crystal display panel.
  • the alignment film is formed in the process of manufacturing a substrate for a display panel and subjected to an alignment process. For this alignment treatment, rubbing is widely used.
  • Photo-alignment is a method of adjusting the surface properties of the alignment film by irradiating the alignment film with light energy (for example, ultraviolet rays) from a predetermined direction.
  • light energy for example, ultraviolet rays
  • a light energy irradiation method in photo-alignment for example, a structure in which a mask provided with a pattern having a predetermined shape is placed on the substrate surface and irradiated with ultraviolet rays or the like from above is used (Patent Literature). 1).
  • a relative movement method is used.
  • the light energy is adjusted so that the mask is not displaced in a direction perpendicular to the direction of relative movement with the substrate.
  • the mask position is controlled during irradiation.
  • a mask position control method for example, the following method is used. While the projection optical system and the mask and the substrate are relatively moved, predetermined elements (for example, scanning lines, data lines, black matrix, etc. formed in the display area) formed on the substrate and the mask A distance (particularly, a distance in a direction perpendicular to the direction of relative movement) between the provided alignment marks is continuously measured. Then, the position of the mask is controlled so that this distance is maintained at a predetermined value.
  • a method of manufacturing a plurality of display panel substrates from a single mother substrate is widely used.
  • a plurality of display regions are formed on a single mother substrate in a manufacturing process of a display panel substrate.
  • an alignment film is formed on the mother substrate on which the plurality of display regions are formed (that is, the mother substrate before being divided), and the formed alignment film is subjected to alignment treatment.
  • the following problems may arise when applying a light orientation in which light energy is irradiated while relatively moving the projection optical system and the mask and the mother substrate to the mother substrate on which a plurality of display areas are formed. is there.
  • the mask position can be controlled.
  • the mask When a plurality of display areas are formed on the mother substrate, the mask may straddle a plurality of display areas (particularly, a plurality of display areas arranged in a direction perpendicular to the direction of relative movement). In this case, light energy is simultaneously irradiated to a plurality of display areas through one mask.
  • a part of the mask and the alignment mark provided on the mask are located outside one display area, but another part of the mask may be located in another display area. In this state, the mask position cannot be controlled or is difficult to control, and hence the irradiation position of the light energy on the other display area cannot be controlled or is difficult.
  • the alignment film cannot align the liquid crystal in a predetermined manner.
  • the other display region is positioned outside the display region and the portion irradiated with light energy while the alignment mark provided on the mask is positioned inside the one display region.
  • the state of the alignment treatment is different from the portion irradiated with light energy during the process.
  • the manufactured display panel (a display panel to which the other display area is applied) may cause display unevenness, light leakage, and the like, and display quality may be deteriorated.
  • the present invention provides a substrate, an exposure method, and a photo-alignment process capable of accurately irradiating all exposure target regions with light energy when irradiating light energy onto a substrate on which a plurality of exposure target regions are formed.
  • a photo-alignment process capable of accurately irradiating all exposure target regions with light energy when irradiating light energy onto a substrate on which a plurality of exposure target regions are formed.
  • a substrate according to the present invention includes a plurality of exposure target areas having a certain size and a plurality of exposure target areas having a different size from the certain size, Control of the irradiation position of light energy when the exposure target area is exposed between a range where a plurality of exposure target areas are formed and a range where the plurality of exposure target areas of other sizes are formed.
  • the gist of the invention is that an alignment pattern serving as a reference is formed.
  • the outline of the alignment pattern includes a straight line portion along a boundary between a range in which the plurality of exposure target areas of the certain size are formed and a range in which the exposure target areas of the other sizes are formed. Preferably there is.
  • the alignment pattern has a configuration in which the alignment pattern is formed in a band shape or a line shape along a boundary between a range in which the plurality of exposure target regions of the certain size are formed and a range in which the exposure target regions of the other sizes are formed. Applicable.
  • the substrate according to the present invention includes a row in which a plurality of exposure target regions of a certain size are arranged, and a plurality of other sizes different from the certain size adjacent to the row in which the plurality of exposure target regions of a certain size are arranged. And a column in which a plurality of exposure target regions of a certain size are arranged and a column in which a plurality of exposure target regions of the other size are arranged.
  • the gist of the present invention is that an alignment pattern serving as a reference for controlling the irradiation position of light energy is formed when the exposure target area is exposed.
  • the column in which the plurality of exposure target regions of a certain size are arranged is parallel to the column in which the plurality of exposure target regions of the other size are arranged, and the contour of the alignment pattern includes a plurality of the certain size It is preferable that a straight line portion parallel to the column in which the exposure target regions are arranged and the column in which the plurality of exposure target regions of other sizes are arranged is included.
  • the column in which the plurality of exposure target regions of a certain size are arranged and the column in which the plurality of exposure target regions of the other size are arranged are parallel, and the alignment pattern has a plurality of exposure targets of the certain size.
  • a configuration can be applied in which the region is formed in a strip shape or a line shape parallel to the row in which the regions are arranged and the row in which the plurality of exposure target regions of other sizes are arranged.
  • the substrate according to the present invention is a multi-planar substrate for manufacturing a plurality of display panel substrates having a display area for displaying an image, the plurality of display areas having a certain size, and the certain size.
  • the outline of the alignment pattern includes a straight portion along a boundary between a range in which the plurality of display areas of the certain size are formed and a range in which the plurality of display areas of the other sizes are formed.
  • a configuration is preferred.
  • the alignment pattern is formed in a band shape or a line shape along a boundary between a range in which the plurality of display areas of the certain size are formed and a range in which the plurality of display areas of the other sizes are formed. Configuration can be applied.
  • a plurality of picture elements are arranged in the display area, and the alignment pattern includes a straight line portion parallel to the arrangement direction of the plurality of picture elements.
  • a plurality of picture element electrodes are arranged in a matrix in two directions orthogonal to each other, a scanning line parallel to one of the arrangement directions of the plurality of picture elements, and an arrangement of the plurality of picture elements A data line parallel to the other of the directions is formed, and the outline of the alignment pattern includes one of the arrangement directions of the plurality of picture elements and a straight line portion parallel to the scanning line, or the plurality A configuration including a straight line portion parallel to the other of the picture element arrangement direction and the data line is applicable.
  • the alignment pattern may be formed of the same material as the scanning line or the data line.
  • a black matrix having a plurality of strip-like or linear portions orthogonal to each other and a colored layer for color display are formed, and the contour of the alignment pattern has the strip-like or linear shape orthogonal to each other
  • a configuration including a straight line portion parallel to one of the directions of the portion can be applied.
  • the alignment pattern may be formed of the same material as the black matrix or the colored layer.
  • a substrate according to the present invention is a multi-planar substrate for manufacturing a plurality of display panel substrates having a display area for displaying an image, and is a column in which a plurality of display areas of a certain size are arranged. And a column in which a plurality of display regions of a different size different from the certain size are arranged adjacent to a column in which the plurality of display regions of the certain size are arranged, A reference for controlling an irradiation position of light energy when the display area is exposed between a row in which the display areas are arranged and a row in which the plurality of display areas of other sizes are arranged.
  • the gist is that an alignment pattern is formed.
  • the column in which the plurality of display areas of the certain size are arranged and the column in which the plurality of display areas of the other size are arranged are parallel, and the outline of the alignment pattern includes the plurality of the certain sizes. It is preferable that a straight line portion parallel to the column in which the display areas are arranged and the column in which the plurality of display areas of other sizes are arranged is included.
  • the column in which the plurality of display regions of the certain size are arranged and the column in which the plurality of display regions of the other size are arranged are parallel, and the alignment pattern is the plurality of the displays of the certain size.
  • a configuration may be applied in which a row or a line is formed in parallel with a row in which regions are arranged and a row in which the plurality of display regions of other sizes are arranged.
  • a plurality of picture elements are arranged in the display area, and the alignment pattern includes a straight line portion parallel to the arrangement direction of the plurality of picture elements.
  • a plurality of picture element electrodes are arranged in a matrix in two directions orthogonal to each other, a scanning line parallel to one of the arrangement directions of the plurality of picture elements, and an arrangement of the plurality of picture elements A data line parallel to the other of the directions is formed, and the outline of the alignment pattern includes one of the arrangement directions of the plurality of picture elements and a straight line portion parallel to the scanning line, or the plurality A configuration including a straight line portion parallel to the other of the picture element arrangement direction and the data line is applicable.
  • the alignment pattern may be formed of the same material as the scanning line or the data line.
  • a black matrix having a plurality of strip-like or linear portions orthogonal to each other and a colored layer for color display are formed, and the contour of the alignment pattern has the strip-like or linear shape orthogonal to each other
  • a configuration including a straight line portion parallel to one of the directions of the portion can be applied.
  • the alignment pattern may be formed of the same material as the black matrix or the colored layer.
  • An exposure method is an exposure method for the substrate (a substrate having a plurality of exposure target regions), and includes a light source and a mask on which a translucent pattern capable of transmitting light energy emitted from the light source is formed.
  • a translucent pattern capable of transmitting light energy emitted from the light source is formed.
  • the exposure unit in which the mask spans the exposure target area of the certain size and the exposure target area of the other size uses the alignment pattern as a reference for the positioning control of the mask, and the exposure target area of the certain size
  • the gist of the present invention is to irradiate light energy to both of the exposure target areas of other sizes.
  • An exposure method is an exposure method for the substrate (a substrate having a plurality of exposure target regions), which includes a light source, a translucent pattern through which light energy emitted from the light source can be transmitted, and an irradiation position of the light energy.
  • the substrate and the exposure unit are relatively Irradiating light energy to the substrate through the light-transmitting pattern formed on the mask while moving the mask, and exposing the mask across the exposure target area of the certain size and the exposure target area of the other size.
  • the unit captures the alignment pattern and the reference pattern by the imaging unit and The distance from the reference pattern is calculated, the position of the mask is adjusted based on the calculated distance, and light energy is irradiated to both the exposure target area of the certain size and the exposure target area of the other size.
  • the gist is to do.
  • An exposure method is an exposure method for the substrate (substrate having a plurality of display areas), and includes a light source and a mask on which a light-transmitting pattern capable of transmitting light energy emitted from the light source is formed.
  • a mask spans the display area of the certain size and the display area of the other size uses the alignment pattern as a reference for the positioning control of the mask, and the display area of the certain size and the other size
  • the gist is to irradiate both of the display areas with light energy.
  • An exposure method is an exposure method for the substrate (a substrate having a plurality of display areas), and controls a light source, a translucent pattern through which light energy emitted from the light source can be transmitted, and a light energy irradiation position.
  • An exposure apparatus having a plurality of exposure units each including a mask on which a reference pattern used in the imaging is formed and an imaging unit capable of imaging the reference pattern and the substrate is relatively moved between the substrate and the exposure unit.
  • the exposure unit irradiates the substrate with light energy through the translucent pattern formed on the mask while the mask spans the display area of the certain size and the display area of the other size,
  • the alignment means and the reference pattern are picked up by the imaging means by imaging the alignment pattern and the reference pattern. And adjusting the position of the mask based on the calculated distance to irradiate both the display area of the certain size and the display area of the other size with light energy. It is what.
  • a photo-alignment processing method is a photo-alignment processing method using any one of the above exposure methods, wherein a plurality of pictures arranged along the relative movement direction of the substrate and the exposure unit. Irradiating light energy from a certain direction to each partial region of the element through the translucent pattern formed on the mask, and the other partial region of the plurality of picture elements The gist is to irradiate light energy from another direction different from the direction through the translucent pattern formed on the mask.
  • the substrate according to the present invention and the exposure method according to the present invention even when a single mask extends over a plurality of exposure target areas or a plurality of display areas having different sizes, a plurality of exposure target areas or The accuracy of the irradiation position and range of light energy can be maintained for each of the plurality of display areas. That is, in the case where one mask may straddle a plurality of exposure target areas or a plurality of display areas having different sizes, the mask position is controlled by either the plurality of exposure target areas or the plurality of display areas.
  • the predetermined element to be formed is used, if the mask is positioned outside any one of the exposure target areas or any one of the display areas, it is difficult to control the position of the mask with high accuracy.
  • the alignment pattern is used for controlling the irradiation position and range of the light energy in the exposure, whereby a plurality of exposure target regions having different sizes from each other.
  • highly accurate control of the mask position can be continued for any of the plurality of display areas.
  • the photo-alignment processing method it is possible to accurately irradiate light energy to the picture elements formed in all display areas. Accordingly, in all display regions formed on the substrate, when forming a plurality of regions having different alignment states formed in one picture element, the alignment is disturbed at the boundary between the regions having different alignment states. Occurrence can be prevented or suppressed. For this reason, in all display panels manufactured from one substrate, it is possible to prevent or suppress the occurrence of liquid crystal alignment disorder. Therefore, it is possible to maintain or improve the display quality of a plurality of display panels manufactured from a single substrate. In addition, it is possible to prevent or suppress the inclusion of defective products in a plurality of display panels manufactured from a single substrate.
  • FIG. It is the top view which showed typically the structure of the principal part of the exposure apparatus used in the exposure method (orientation processing method concerning embodiment of this invention) concerning embodiment of this invention, and the side in a normal installation aspect It is the figure seen from. It is the top view which showed typically the structure of the principal part of the exposure apparatus used in the exposure method (orientation processing method concerning embodiment of this invention) concerning embodiment of this invention from the upper direction in a normal installation aspect.
  • FIG. It is the top view which showed the structure of the mask typically. A state in which part of the mask enters one of the display areas adjacent in the direction perpendicular to the scanning direction and the other part of the mask enters the other of the display areas adjacent in the direction perpendicular to the scanning direction. It is the top view shown in.
  • (b) is a plan view schematically showing the relationship between the size and position of the translucent pattern and the pattern of the picture element provided in the display area of the first substrate according to the embodiment of the present invention. It is.
  • the substrate 1 according to the embodiment of the present invention is a substrate for manufacturing a substrate for a liquid crystal display panel (or a substrate for manufacturing a liquid crystal display panel).
  • An alignment film is formed on the substrate 1 according to the embodiment of the present invention, and thereafter, the alignment process is performed on the formed alignment film using the exposure method according to the embodiment of the present invention. That is, the substrate 1 according to the embodiment of the present invention is a substrate having a configuration suitable for alignment processing by the photo-alignment method (particularly, a configuration suitable for alignment processing using the exposure method according to the embodiment of the present invention). .
  • liquid crystal display panel manufactured from the substrate 1 according to the embodiment of the present invention will be briefly described.
  • the liquid crystal display panel manufactured from the substrate 1 according to the embodiment of the present invention may be referred to as “the present liquid crystal display panel”.
  • This liquid crystal display panel includes two liquid crystal display panel substrates.
  • a TFT array substrate is applied to one of the two liquid crystal display panel substrates, and a color filter is applied to the other.
  • a display area and a panel frame area are formed on each of the TFT array substrate and the color filter.
  • the display area is an area where an image can be displayed, and a plurality of picture elements are arranged in a predetermined manner (for example, in a matrix form).
  • An alignment film is formed on the surface of the display region. An alignment treatment is performed on the alignment film.
  • the panel frame area is an area formed so as to surround the display area. In the panel frame region, a predetermined wiring or a light shielding film may be formed. Note that the alignment film is not formed in the panel frame region (the alignment film may not be formed). Then, the TFT array substrate and the color filter are bonded to each other with a predetermined minute distance therebetween, and liquid crystal is filled between them. The orientation direction of the filled liquid crystal molecules is defined by the alignment film.
  • FIG. 1 is a plan view schematically showing the configuration of a substrate 1 according to an embodiment of the present invention.
  • the substrate for manufacturing the TFT array substrate is referred to as “first substrate according to the embodiment of the present invention” 1a
  • the substrate for manufacturing the color filter is referred to as “second substrate according to the embodiment of the present invention”. It may be distinguished by being referred to as a “substrate” 1b.
  • the substrate 1 according to the embodiment of the present invention is a multi-sided substrate. That is, a plurality of TFT array substrates are manufactured from the first substrate 1a according to the embodiment of the present invention. A plurality of color filters are manufactured from the second substrate 1b according to the embodiment of the present invention. For this reason, the substrate 1 according to the embodiment of the present invention is formed with a plurality of “regions to be display regions in a state where each substrate is used for a liquid crystal display panel” 11a and 11b. For convenience of explanation, these areas may be simply referred to as “display areas” 11a and 11b.
  • a substrate for a liquid crystal display panel (or a liquid crystal display panel) having display areas of different sizes can be manufactured. Therefore, as shown in FIG. 1, display areas 11 a and 11 b having different sizes are formed on the substrate 1 according to the embodiment of the present invention. Specifically, a plurality of display areas 11a having a certain size and a plurality of display areas 11b having a different size from the certain size are formed. For this reason, the substrate 1 according to the embodiment of the present invention includes a liquid crystal display panel substrate having a display area 11a of a certain size and a liquid crystal display panel substrate having a display area 11b of another size. A substrate (or a liquid crystal display panel) for a liquid crystal display panel having a size of various types of display areas can be manufactured.
  • These display areas 11a and 11b are "exposure target areas" in the exposure method according to the embodiment of the present invention. That is, the substrate 1 according to the embodiment of the present invention has a configuration in which a plurality of exposure target regions having different sizes are formed.
  • a plurality of display areas 11a of a certain size are formed so as to be collectively arranged in a matrix near one side of the substrate 1 according to the embodiment of the present invention.
  • the plurality of display areas 11b having other sizes are formed so as to be arranged in a matrix on the other side.
  • a plurality of display areas 11a of a certain size are formed on one side of the Y-axis direction, and a plurality of display areas 11b of other sizes are formed on the other side of the Y-axis direction. The configuration is shown.
  • an alignment pattern 12 is formed between a range where a plurality of display areas 11a of a certain size are formed and a range where a plurality of display areas 11b of another size are formed.
  • the alignment pattern 12 is a pattern serving as a reference for controlling the irradiation position of light energy when light energy is irradiated by the exposure method according to the embodiment of the present invention.
  • Alignment pattern 12 is an elongated strip or thin line pattern extending along a predetermined direction. Specifically, the alignment pattern 12 extends along a boundary between a range where a plurality of display areas 11a of a certain size are formed and a range where a plurality of display areas 11b of another size are formed (in FIG. 1). Is a strip-like or linear pattern (element) extending in the X-axis direction.
  • the outline of the alignment pattern 12 includes a straight portion extending along the predetermined direction (X-axis direction). This straight portion is formed over substantially the entire length in a predetermined direction (X-axis direction) of the substrate 1 according to the embodiment of the present invention. For example, if the alignment pattern 12 is formed in a substantially rectangular shape, one or both of the long sides of the rectangle become the “straight line portion”.
  • FIG. 2 is a schematic plan view illustrating a part of the display areas 11a and 11b of the substrate 1 according to the embodiment of the present invention.
  • FIG. 2 (a) is a first view according to the embodiment of the present invention.
  • FIG. 2B shows the configuration of picture elements formed in the display areas 11a and 11b of the substrate 1a, and
  • FIG. 2B shows the picture elements formed in the display areas 11a and 11b of the second board 1b according to the embodiment of the present invention. The structure of is shown.
  • the display areas 11a and 11b of the first substrate 1a include a plurality of pixel electrodes 111, a plurality of scanning lines 112, and a plurality of data lines. 113 and a plurality of switching elements 114 (specifically, for example, thin film transistors) are provided. Although other predetermined elements may be provided, description and illustration are omitted.
  • the plurality of scanning lines 112 are formed in parallel with each other at a predetermined interval.
  • the plurality of data lines 113 are also formed in parallel with each other at a predetermined interval.
  • the extending direction of the plurality of scanning lines 112 and the extending direction of the plurality of data lines 113 are formed to be at right angles.
  • a switching element 114 is provided in the vicinity of the intersection of each scanning line 112 and each data line 113.
  • Each switching element 114 and each pixel electrode 111 are connected by a drain line 115.
  • the arrangement direction of the plurality of pixel electrodes 111 (the row direction or the column direction of the matrix) and the extending direction of the plurality of scanning lines 112 are parallel, and the arrangement direction of the plurality of pixel electrodes 111 and the plurality of data lines 113 are arranged. Is parallel to the stretching direction.
  • the display regions 11a and 11b of the second substrate 1b include a black matrix 117, a colored layer 119 of a predetermined color, and a common electrode.
  • a color layer 119 having a predetermined color for color display is formed in the opening 1171 formed in the black matrix 117.
  • a common electrode is formed on the surface of the black matrix 117 and the colored layer 119 of a predetermined color.
  • the above-described configuration is an example, and the configuration of the display areas 11a and 11b (configuration of picture elements formed in the display areas 11a and 11b) is not limited.
  • the display regions 11a and 11b may be configured so that a plurality of picture elements are arranged and an element extending parallel to the arrangement direction of the picture elements is formed.
  • the scanning lines 112 and the data lines 113 are elements that extend parallel to the arrangement direction of the picture elements (picture element electrodes 111).
  • the black matrix 117 includes picture elements (the opening 1171 of the black matrix 117 and the colored layer 119 of a predetermined color formed in the opening 1171 of the black matrix 117. ) In the direction parallel to the arrangement direction.
  • the straight line extending direction is set in parallel.
  • a black matrix 117 and a colored layer 119 of a predetermined color are formed.
  • Embodiment the black matrix 117 includes a plurality of linear portions or strip-like portions (hereinafter referred to as “thin lines”) 1172 formed in a straight line parallel to each other and extending in a predetermined direction, and the predetermined matrix parallel to each other.
  • a plurality of fine wires 1173 extending in a direction perpendicular to the direction.
  • a colored layer 119 having a predetermined color is formed in each opening portion 1171.
  • the substrate 1 according to the embodiment of the present invention has the configuration in which the display areas 11a and 11b of two types are formed.
  • the size of the display areas 11a and 11b is shown.
  • the type and number are not limited. For example, a configuration in which a display area having a single size may be formed, or a configuration in which display areas having three or more sizes may be formed.
  • the alignment pattern 12 having the configuration is formed at a predetermined position.
  • the configuration of the substrate 1 according to the embodiment of the present invention is expressed by another method as follows.
  • a plurality of display areas 11a and 11b are formed on the substrate 1 according to the embodiment of the present invention.
  • the “display area column” is the “exposure target area column”.
  • the alignment pattern 12 includes the positions and ranges of the display regions 11a and 11b included in the “display region column (exposure target region column)” (in particular, the display regions 11a and 11b in each “display region column”).
  • the positions and ranges in the direction along the arrangement direction (X-axis direction in FIG. 1) are formed between “display region columns” that are different from each other.
  • the alignment pattern 12 indicates the position and range of the region between the display regions 11a and 11b in the “display region column” (particularly, the arrangement direction of the display regions 11a and 11b in each “display region column” (see FIG. 1 is formed between “display area columns” having different positions and ranges in the direction along the X-axis direction.
  • the alignment pattern 12 is formed in a strip shape or a line shape extending along the arrangement direction of the display regions 11a and 11b in the “display region column”.
  • a "display area column” composed of display areas 11a of a certain size and display areas 11b of other sizes.
  • the alignment pattern 12 is formed between a “display region column” composed of a display region 11a of a certain size and a “display region column” composed of a display region 11b of another size.
  • the substrate 1 according to the embodiment of the present invention has an alignment pattern 12 adjacent to a “display region column” composed of display regions 11 a of a certain size, and other sizes.
  • the display area 11b is formed between the “display area columns”.
  • FIG. 3 is a plan view schematically showing the configuration of the substrate 1c on which the display areas 11c, 11d, and 11e having three types of sizes are formed.
  • a plurality of display areas 11c having the first size are arranged in a matrix or in series in the X-axis direction together near one side in a predetermined direction (Y-axis direction in FIG. 3).
  • a plurality of display areas 11d having the second size are arranged in a matrix or in series in the X-axis direction together on the other side in a predetermined direction (the Y-axis direction in FIG. 3).
  • a plurality of display areas 11e having a third size are formed in a matrix shape or in series in the X-axis direction between them.
  • the first size, the second size, and the third size are different from each other (at least the first size and the third size are different sizes, the second size and the third size Are different sizes).
  • the alignment pattern 12 is formed between the range in which the display area 11c having the first size is formed and the range in which the display area 11e having the third size is formed. Similarly, the alignment pattern 12 is formed between a range where the display area 11d having the second size is formed and a range where the display area 11e having the third size is formed.
  • the configuration of the alignment pattern 12 is the same as described above.
  • a “display area consisting of the display area 11c having the first size” And a “display area column” composed of the display area 11e having the third size are adjacent to each other.
  • the “display region column” composed of the display region 11c having the first size and the “display region column” composed of the display region 11e having the third size are the display region in the “display region column”.
  • the positions and ranges of 11c and 11e are different from each other.
  • the alignment pattern 12 is formed between the “display region column” formed of 11c and the “display region column” formed of the display region 11e having the third size.
  • the boundary between the range in which the display area 11d having the second size is formed and the range in which the display area 11e having the third size is formed includes the display area 11d having the second size.
  • the “display area column” is adjacent to the “display area column” composed of the display area 11e having the third size.
  • the “display region column” composed of the display region 11d having the second size and the “display region column” composed of the display region 11e having the third size are the display region in the “display region column”.
  • the alignment pattern 12 is formed between a “display region column” formed of 11d and a “display region column” formed of the display region 11e having the third size.
  • the alignment pattern 12 is not formed (or may not be formed) between the “display region columns” composed of the display regions 11c, 11d, and 11e having the same size. That is, between the “display area columns” composed of the display areas 11 c having the first size, between the “display area columns” composed of the display areas 11 d having the second size, and the third size The alignment pattern 12 is not formed (or may not be formed) between the “display region columns” composed of the display regions 11e having the same.
  • FIG. 4 is a plan view schematically showing the configuration of the substrate 1d on which a plurality of display areas 11f and 11g of a single size are formed. As shown in FIG. 4, even if only a single size display area 11f, 11g is formed, when a plurality of display areas 11f, 11g having different directions are included, the alignment pattern 12 is included. May be formed.
  • the alignment pattern 12 is formed along the boundary of the range.
  • a “display region column” composed of a plurality of display regions 11f in a certain direction and a “display region column” composed of a plurality of display regions 11g in another direction are arranged in an array of the display regions 11f and 11g.
  • the positions and ranges of the display areas 11f and 11g along the direction are different.
  • the type of display area size is not limited.
  • the material of the alignment pattern 12 is not particularly limited.
  • the following configuration can be applied.
  • the alignment pattern 12 is formed of the same material as one of the scanning line 112 or the data line 113. Then, a configuration in which the alignment pattern 12 is formed in the process of forming the scanning line 112 or a configuration in which the alignment pattern 12 is formed in the process of forming the data line 113 can be applied.
  • the alignment pattern 12 is formed of the same material as the black matrix 117 or the same material as the colored layer 119 of any color.
  • a configuration in which the alignment pattern 12 is formed in the step of forming the black matrix 117 or a configuration in which the alignment pattern 12 is formed in the step of forming the colored layer 119 of a predetermined color can be applied. .
  • the alignment pattern 12 may be a pattern that can be recognized by an imaging means such as a camera (at least a pattern that can recognize a straight line included in the outline of the alignment pattern 12), and the material and the formation method are limited. It is not something.
  • FIG. 5 and 6 show an exposure apparatus 5 (hereinafter sometimes referred to as “the present exposure apparatus” 5) used in the exposure method according to the embodiment of the present invention (the alignment processing method according to the embodiment of the present invention). It is the top view which showed the structure of the principal part typically. Specifically, FIG. 5 is a view of the exposure apparatus 5 as viewed from the side in a normal installation mode, and FIG. 6 is a view of the exposure apparatus 5 as viewed from above in a normal installation mode.
  • the part relevant to implementation of the exposure method concerning embodiment of this invention is demonstrated, and description is abbreviate
  • a conventionally well-known structure can be applied to the part where the description is omitted.
  • the present exposure apparatus 5 includes a stage 51, a stage control system (not shown), a plurality of exposure units 52, and an alignment light source 53.
  • a stage 51 a stage control system (not shown)
  • a plurality of exposure units 52 a plurality of exposure units 52
  • an alignment light source 53 an alignment light source 53.
  • the configuration in which the present exposure apparatus 5 includes ten exposure units 52 is shown and described, but this is an example, and the number of exposure units 52 is not limited.
  • the stage 51 can place the substrate 1 according to the embodiment of the present invention, and can reciprocate the placed substrate 1 according to the embodiment of the present invention in the surface direction.
  • the stage control system includes a drive unit that drives the stage 51, a control unit that controls the drive unit, and the like.
  • a conventionally known configuration can be applied to the stage 51 and the stage control system. Therefore, the description is omitted.
  • Each exposure unit 52 includes a light source 521, an exposure head 525, a mask 522, an imaging unit 523, an image analysis unit 524, and a mask position control unit 526.
  • the light source 521 can emit light energy in a predetermined wavelength band.
  • the wavelength band of the light energy emitted from the light source 521 is set according to the exposure object. For example, a light source that can emit ultraviolet light is applied.
  • the exposure head 525 can irradiate the light energy emitted from the light source 521 outward at a predetermined angle.
  • the mask 522 is a member formed in a plate shape, for example.
  • FIG. 7 is a plan view schematically showing the configuration of the mask 522.
  • a translucent pattern 5221 and a reference pattern 5222 are formed on the mask 522.
  • the translucent pattern 5221 has a predetermined size and shape at a predetermined location, and is a pattern that can transmit light energy emitted from the light source 521.
  • the number, size, and shape of the translucent patterns 5221 are appropriately set depending on the shape and position of the light energy irradiation target, the light energy irradiation range and position, and the like. A specific configuration will be described later.
  • the reference pattern 5222 is a pattern used as a reference in controlling the position of the mask 522.
  • the outline of the reference pattern 5222 includes a straight line portion extending in parallel with a “scanning direction” described later.
  • Other configurations, for example, the size and shape of the outline of the reference pattern 5222 are not particularly limited. In short, any configuration having a straight portion that can be imaged by the imaging means may be used. For example, as shown in FIG. 7, an opening 5223 through which light energy can be transmitted is formed in a mask 522, and a band-like or linear reference pattern 5222 extending along the “scanning direction” is formed in the opening 5223.
  • the configuration to be applied is applicable.
  • the number of reference patterns 5222 is not limited.
  • the opening 5223 is formed in the mask 522
  • the reference pattern 5222 is formed in the opening 5223. Therefore, the surface of the substrate 1 according to the embodiment of the present invention can be imaged through the opening 5223 and the reference pattern 5222 can be imaged.
  • various known CCD cameras can be applied to the imaging unit 523.
  • the reference pattern 5222 formed on the mask 522 is disposed so as to enter a part of the field of view of the imaging unit 523.
  • the image analysis unit 524 can analyze the image captured by the imaging unit 523. Specifically, the outline of the reference pattern 5222 of the mask 522 shown in the image picked up by the image pickup means 523 and the outline of the predetermined element formed on the substrate 1 according to the embodiment of the present invention (specifically, The distance to the straight line included in the contour of the alignment pattern 12 (here, the distance in a direction perpendicular to the “scanning direction” described later) can be calculated.
  • the image analysis means 524 is realized by hardware such as a CPU and a memory incorporated in the exposure apparatus 5 and software operating on the hardware. As the image analysis method by the image analysis means 524, a conventionally known method can be applied. Therefore, detailed description is omitted.
  • the mask position control unit 526 can adjust the position of the mask 522 (here, a position in a direction perpendicular to the “scanning direction” described later). For this reason, the mask position control unit 526 includes a drive unit that can reciprocate the mask 522 in a direction perpendicular to the scanning direction, a control unit that controls the drive unit, and the like. Note that a known mask position adjustment unit can be applied to the mask position control unit 526. Therefore, detailed description is omitted.
  • the alignment light source 53 is a light source used when the imaging unit 523 images the surface of the substrate 1 and the reference pattern 5222 of the mask 522 according to the embodiment of the present invention. As shown in FIG. 5, it arrange
  • Each exposure unit 52 can irradiate the surface of the exposure object from a predetermined direction with the light energy emitted from the light source 521 through the light transmission pattern 5221 formed on the exposure head 525 and the mask 522.
  • An arrow b in the drawing schematically shows light emitted from the light source 521.
  • a plurality of exposure units 52 are arranged in a direction perpendicular to the scanning direction. For example, a configuration that is arranged in a zigzag pattern along a direction perpendicular to the scanning direction or a configuration that is arranged approximately in series is applied. For this reason, each exposure unit 52 can irradiate light energy with respect to the full length of the direction orthogonal to the scanning direction of the board
  • each exposure unit 52 can operate independently. At least, the mask position control unit 526 can operate independently from the mask position control unit 526 of the other exposure unit 52. For this reason, each exposure unit 52 can control the position of the mask 522 separately.
  • the substrate 1 according to the embodiment of the present invention is placed on the stage 51.
  • the direction of the substrate 1 according to the embodiment of the present invention is set so that the straight line extending direction included in the outline of the alignment pattern 12 formed on the substrate 1 according to the embodiment of the present invention is parallel to the scanning direction.
  • each exposure unit 52 will be described in three groups.
  • the first group is a group of exposure units 52 that irradiate only a single display area 11a, 11b with light energy through the mask 522 at a time. That is, the exposure unit 52 belonging to the first group irradiates light energy only to a plurality of display areas 11a and 11b included in a certain “display area column”, and simultaneously displays a plurality of “display area columns”. The display areas 11a and 11b included in "" are not irradiated with light energy.
  • the second group irradiates light energy to a plurality of display areas 11a and 11b (more precisely, display areas 11a and 11b included in a plurality of “display area columns”) through the mask 522 at the same time.
  • a group of exposure units 52 that may However, the plurality of display areas 11a and 11b are groups that are display areas 11a and 11b having the same size. That is, it is a group that irradiates light energy only to the plurality of display areas 11a having the certain size, or irradiates light energy only to the plurality of display areas 11b having the other sizes.
  • the third group irradiates light energy to a plurality of display regions 11a and 11b (more precisely, display regions 11a and 11b included in a plurality of “display region columns”) through the mask 522 at the same time.
  • a group of exposure units 52 that may However, this is a group in which the display areas 11a and 11b having different sizes are included in the plurality of display areas 11a and 11b. That is, this is a group in which light energy is irradiated to both the plurality of display areas 11a having a certain size and the plurality of display areas 11b having the other sizes.
  • each exposure unit 52 When the substrate 1 according to the embodiment of the present invention and each exposure unit 52 start to move relatively, a part or all of the mask 522 of each exposure unit 52 is formed on the substrate 1 according to the embodiment of the present invention. It is located inside the display areas 11a and 11b.
  • the masks 522 of some of the exposure units 52 have the entire length in the direction perpendicular to the scanning direction within the ends of the one display area 11a, 11b in the direction perpendicular to the scanning direction.
  • Such a group of exposure units 52 is a first group.
  • predetermined elements in the display areas 11a and 11b formed by the imaging unit 523 ( The structure) and the reference pattern 5222 formed on the mask 522 are imaged.
  • the image analysis means 524 includes the outline of a predetermined element extending in parallel to the scanning direction (that is, an element extending in parallel to the alignment pattern 12) among the predetermined elements formed in the display areas 11a and 11b.
  • the contour of the reference pattern 5222 formed on the mask 522 is recognized, and the distance between them (the distance in the direction perpendicular to the scanning direction) is calculated.
  • the second substrate 1b according to the embodiment of the present invention in the black matrix 117 formed in the display areas 11a and 11b, the outline of a band-like or thin line-like portion extending parallel to the scanning direction, and the mask The distance from the outline of the reference pattern 5222 formed at 522 is calculated.
  • the mask position control unit 526 adjusts the position of the mask 522 (here, a position perpendicular to the scanning direction) based on the distance calculated by the image analysis unit 524. That is, the mask position control unit 526 adjusts the position of the mask 522 so that the distance is maintained at a predetermined distance (or so that the distance is within a predetermined tolerance).
  • the light energy transmitted through the translucent pattern 5221 formed on the mask 522 is irradiated to a predetermined range of the display areas 11a and 11b of the substrate 1 according to the embodiment of the present invention. That is, the irradiation position of light energy is positioned.
  • the optical energy is accurately measured through the translucent pattern 5221 formed in the mask 522 in the elongated strip-shaped region along the direction of the pixel arrangement of the display regions 11a and 11b of the substrate 1 according to the embodiment of the present invention. I can irradiate well.
  • the irradiation position of the light energy is accurately controlled for the display areas 11a and 11b. be able to.
  • the mask 522 of the exposure unit 52 of the second group may enter inside the display areas 11a and 11b arranged in a direction perpendicular to the scanning direction. Specifically, for example, part of the mask 522 enters inside one of the display regions 11a and 11b adjacent to each other in a direction perpendicular to the scanning direction, and the other part of the mask 522 is perpendicular to the scanning direction.
  • the display areas 11a and 11b adjacent to each other in the direction may enter the other inside. That is, the mask 522 may straddle a plurality of display areas 11 a and 11 b included in “display area columns” adjacent to each other.
  • the mask of the exposure unit 52 of the second group may straddle the plurality of display areas 11a and 11b having the same size, but does not straddle the plurality of display areas 11a and 11b having different sizes. In other words, such an exposure unit 52 is the second group.
  • the exposure unit 52 of the second group is adjacent to each other in the direction perpendicular to the scanning direction by the imaging unit 523 while the substrate 1 and each exposure unit 52 according to the embodiment of the present invention are relatively moving.
  • a predetermined element (structure) formed in one of the plurality of display areas 11 a and 11 b and a reference pattern 5222 formed on the mask 522 are imaged.
  • the image analysis unit 524 includes an outline of a predetermined element extending in parallel with the scanning direction among predetermined elements formed in any one of the plurality of display regions 11a and 11b across the mask 522, and The contour of the reference pattern 5222 formed on the mask 522 is recognized, and the distance between them (the distance in the direction perpendicular to the scanning direction) is calculated.
  • the subsequent operations are the same as those of the exposure unit of the first group.
  • the mask 522 moves between the display areas 11a and 11b adjacent in the direction of relative movement. May be located.
  • the imaging means 523 cannot image a predetermined element formed in any one of the plurality of display areas 11a and 11b. Therefore, it becomes impossible or difficult for the mask position control unit 526 to adjust the position of the mask 522 with high accuracy.
  • the display areas 11a and 11b do not need to be irradiated with light energy, the position of the mask 522 need not be controlled with high accuracy.
  • the mask 522 enters the plurality of display areas 11a and 11b arranged in the direction perpendicular to the scanning direction at the same time, and at the same time the outer side. Get out.
  • the predetermined element formed in a specific one of the plurality of display areas 11a and 11b across the mask 522 is used as a reference for adjusting the position of the mask 522, a part of the mask 522 is used. Is positioned outside one specific area of the display areas 11a and 11b, the other part of the mask 522 is also positioned outside the other display areas 11a and 11b. In this way, irradiation of light energy is performed on all the display areas 11a and 11b across the mask 522 (for example, on the two display areas 11a and 11b adjacent in the direction perpendicular to the scanning direction). The accuracy of the position can be maintained.
  • the mask 522 of the exposure unit 52 of the third group may enter inside the display areas 11a and 11b arranged in a direction perpendicular to the scanning direction. Specifically, for example, a part of the mask 522 enters inside one of the display regions 11a and 11b adjacent in the direction perpendicular to the scanning direction, and the other part of the mask 522 is a direction perpendicular to the scanning direction. May enter the other side of the display area 11a, 11b adjacent to the other.
  • the plurality of display areas 11a and 11b include those having different sizes. In other words, such a group of exposure units 52 is a third group of exposure units 52.
  • a part of the mask 522 enters one of the display areas 11a and 11b adjacent in the direction perpendicular to the scanning direction, and the other part of the mask 522 is adjacent to the direction perpendicular to the scanning direction. It is the top view which showed typically the state which entered into the other of 11a, 11b.
  • the translucent pattern 5221 and the reference pattern 5222 of the mask 522 are indicated by broken lines.
  • the imaging unit 523 of the exposure unit 52 in the third group causes the alignment pattern 12 and the reference pattern 5222 formed on the mask 522. And image.
  • the image analysis means 524 of the exposure unit 52 of the third group recognizes the straight line portion of the contour of the alignment pattern 12 and the contour of the reference pattern 5222 formed on the mask 522, and between these Distance (distance in a direction perpendicular to the scanning direction) E is calculated.
  • the subsequent operation is the same as that of the exposure unit 52 of the first group or the second group, except that the alignment pattern 12 is used as a reference for controlling the position of the mask 522.
  • the exposure unit 52 of the third group when the substrate 1 and the mask 522 according to the embodiment of the present invention move relative to each other, a part of the mask 522 becomes a “display region column”.
  • the display areas 11a and 11b (display area 11a of a certain size in FIG. 8) included in the display area 11 are positioned between the display areas 11a and 11b, but another part of the mask 522 is included in another “display area column”. It may be located inside the areas 11a and 11b (display area 11b of another size in FIG. 8).
  • the exposure unit 52 of the third group can continue to control the position of the mask 522 based on the alignment pattern 12. Therefore, the exposure unit 52 of the third group can maintain the accuracy of the irradiation position of the light energy for all the display areas 11a and 11b.
  • the exposure unit 52 of the third group performs the same operation as the exposure unit 52 of the second group, the following problem occurs.
  • another part of the mask 522 may be located inside the display areas 11a and 11b belonging to other “display area columns”. If a predetermined element formed in the display areas 11 a and 11 b belonging to a certain “display area column” is used as a reference for controlling the position of the mask 522, the mask 522 becomes a certain “display area column”.
  • the accuracy of controlling the position of the mask 522 may be lowered. For this reason, it may be difficult to maintain the accuracy of the irradiation position of the light energy for the display areas 11a and 11b belonging to other "display area columns".
  • the alignment pattern 12 is formed over substantially the entire length of the substrate 1 according to the embodiment of the present invention. Therefore, if the alignment pattern 12 is used as a reference for controlling the position of the mask 522, a part of the mask 522 is positioned outside the display areas 11a and 11b belonging to a certain “display area column”. The accuracy of controlling the position of the mask 522 can be maintained even during the period. Therefore, it is possible to maintain the accuracy of the irradiation position of the light energy for all the display areas 11a and 11b.
  • the light is applied to all the display areas 11a and 11b formed on the substrate 1 according to the embodiment of the present invention (that is, the multi-faced substrate).
  • the accuracy of the energy irradiation position can be maintained.
  • the exposure method according to the embodiment of the present invention can be applied to a method of irradiating the alignment film with light energy for photo-alignment.
  • alignment division is implement
  • the alignment division is a method of averaging viewing angle characteristics by forming a plurality of alignment states in one picture element of a liquid crystal display panel.
  • light energy is irradiated from different directions for each predetermined region in one picture element. Since the orientation of the alignment film is determined according to the direction of light energy irradiation, if light energy is irradiated from different directions to the alignment film in one pixel, the alignment film in one pixel is irradiated. A plurality of regions having different alignment states are formed.
  • FIG. 9 is a perspective view schematically showing an aspect of irradiation of light energy to each picture element of the substrate according to the embodiment of the present invention.
  • FIG. 9A shows an aspect of light energy irradiation to the first substrate 1a according to the embodiment of the present invention
  • FIG. 9B shows the light with respect to the second substrate 1b according to the embodiment of the present invention.
  • An aspect of energy irradiation is shown.
  • each region is irradiated with light energy from different directions. Specifically, the direction is inclined with respect to the normal of the picture element (inclination angle ⁇ in FIG. 9A). Then, when the optical axes of the irradiated light energies are projected onto the surface of the picture element, the projected optical axes are substantially parallel to the data line 113 and the directions are opposite.
  • the specific value of the angle ⁇ is set as appropriate and is not particularly limited.
  • the picture elements of the second substrate 1b according to the embodiment of the present invention are bonded to the first substrate 1a according to the embodiment of the present invention among the four sides of the black matrix 117 that partitions each picture element.
  • two regions formed by being divided into two substantially at the center of two sides parallel to the scanning line 112 of the first substrate 1a according to the embodiment of the present invention are assumed.
  • region is irradiated with light energy from a mutually different direction. Specifically, the light energy irradiated to each region is inclined at a predetermined angle ⁇ with respect to the normal line of the picture element surface.
  • the optical axis of the irradiated optical energy is projected onto the surface of the picture element
  • the optical axis of the projected optical energy is parallel to the scanning line 112 of the first substrate 1a according to the embodiment of the present invention. And opposite to each other.
  • the specific value of the angle ⁇ is set as appropriate similarly to the first substrate 1a according to the embodiment of the present invention, and is not particularly limited.
  • FIG. 10A shows a mask 522a (hereinafter referred to as “first mask”) used when the exposure method according to the embodiment of the present invention is applied to the first substrate 1a according to the embodiment of the present invention. It is the top view which showed typically the structure of the translucent pattern 5221a.
  • FIG. 10B shows the dimensions of the translucent pattern 5221a formed on the first mask 522a and the pattern of picture elements provided on the display areas 11a and 11b of the first substrate 1a according to the embodiment of the present invention. It is the top view which showed typically the relationship of position.
  • the first mask 522a is a substantially rectangular plate-shaped member.
  • a plurality of slit-like translucent patterns 5221a capable of transmitting light energy are formed so as to be arranged with a predetermined pitch Pa.
  • Pitch P a of the translucent patterns 5221a as shown in FIG. 10 (b), the display area 11a of the first board 1a according to the embodiment of the present invention, the data line 113 or the scanning line is formed on 11b 112 (In FIG. 10A, a configuration is shown in which the pitch is set equal to the pitch of the data lines 113).
  • the arrangement direction of the dimension of the light transmitting pattern 5221A dimensions of each light-transmitting pattern 5221a L a is set to about 1/2 of the pitch P a.
  • FIG. 11 shows a mask 522b (hereinafter referred to as “second mask”) used when the exposure method according to the embodiment of the present invention is applied to the second substrate 1b according to the embodiment of the present invention.
  • FIG. 5 is a plan view schematically showing the position and dimensional relationship with the black matrix 117 formed in the display areas 11a and 11b of the second substrate 1b according to the embodiment of the present invention.
  • the translucent pattern 5221b of the second mask 522b has the same configuration as the translucent pattern 5221a of the first mask 522a as a whole (see FIG. 10A). That is, slit-like light transmitting pattern 5221b which light energy can pass, are formed so as to be arranged at a predetermined pitch P b.
  • the pitch of the light transmission patterns 5221b is the pitch of the black matrix 117 formed in the display areas 11a and 11b of the second substrate 1b according to the embodiment of the present invention (here, the first pitch according to the embodiment of the present invention). When bonded to the substrate 1a, it is set equal to the pitch of the side parallel to the scanning line 112 of the first substrate 1a according to the embodiment of the present invention.
  • the dimensional L b (here, the dimension along the direction of arrangement of the light transmitting pattern 5221B) of the light-transmitting pattern 5221B is set to about 1/2 of the dimension of the pitch P b.
  • the exposure of the first substrate 1a is as follows.
  • the reference pattern 5222 of the mask 522a is imaged.
  • the image analysis unit 524 calculates the distance between the contour of the predetermined element and the contour of the reference pattern 5222, and based on the calculated distance, the mask position control unit 526 determines the position of the first mask 522a. Control.
  • the imaging unit 523 images the alignment pattern 12 and the reference pattern 5222 of the first mask 522a.
  • the image analysis unit 524 calculates the distance between the straight line portion of the outline of the alignment pattern 12 and the outline of the reference pattern 5222, and based on the calculated distance, the mask position control unit 526 uses the first mask. Control the position of 522a.
  • the exposure of the second substrate 1b is as follows.
  • the imaging unit 523 images the black matrix 117 formed in one display area 11a, 11b and the reference pattern 5222 of the second mask 522b.
  • the image analysis unit 524 calculates the distance between the outline of the linear or strip-like portion parallel to the scanning direction in the black matrix 117 and the outline of the reference pattern 5222. Based on the calculated distance, the mask position control unit 526 controls the position of the second mask 522b.
  • the imaging means 523 images the alignment pattern 12 and the reference pattern 5222 of the second mask 522b.
  • the image analysis unit 524 calculates the distance between the straight line portion of the contour of the alignment pattern 12 and the contour of the reference pattern 5222, and based on the calculated distance, the mask position control unit 526 uses the second mask. Control the position of 522b.
  • Light energy can be irradiated well.
  • an orientation process in a different direction is performed on the area of each half of each picture element.
  • the exposure method it is possible to accurately irradiate light energy to all display areas. Further, it is possible to prevent the occurrence of a sudden displacement of the mask. Therefore, in the alignment division, the occurrence of light leakage or the like is prevented or suppressed at the boundary of each region, and the display quality of the liquid crystal display panel can be improved. Therefore, a high-quality liquid crystal display panel can be provided.
  • the overall flow of the manufacturing method of the first substrate 1a (that is, the substrate for manufacturing the TFT array substrate) according to the embodiment of the present invention is as follows.
  • the alignment pattern 12 is formed outside the display areas 11a and 11b. The alignment pattern 12 may be formed in a process different from this process.
  • a single-layer or multilayer conductor film (hereinafter referred to as a first conductor film) made of chromium, tungsten, molybdenum, aluminum or the like is formed over the entire surface of one side of the transparent substrate.
  • a first conductor film made of chromium, tungsten, molybdenum, aluminum or the like is formed over the entire surface of one side of the transparent substrate.
  • Various known sputtering methods can be applied to the method for forming the first conductor film.
  • the thickness of the first conductor film is not particularly limited, for example, a thickness of about 300 nm can be applied.
  • the formed first conductor film is patterned into the shape of the scanning line 112 and the gate electrode of the switching element 114 in the display regions 11a and 11b. In addition, outside the display areas 11a and 11b, the patterning is performed in the shape of the alignment pattern 12.
  • Various known wet etchings can be applied to the patterning of the first conductor film. In the configuration in which the first conductor film is made of chromium, wet etching using a (NH 4 ) 2 [Ce (NH 3 ) 6 ] + HNO 3 + H 2 O solution can be applied.
  • SiNx silicon nitride
  • a plasma CVD method or the like can be applied as a method for forming the insulating film.
  • a semiconductor film having a predetermined shape is formed at a predetermined position on the surface of the insulating film. Specifically, this semiconductor film is formed at a position overlapping with the gate electrode with the insulating film interposed therebetween.
  • the semiconductor film has a two-layer structure including a first sub semiconductor film and a second sub semiconductor film.
  • amorphous silicon having a thickness of about 100 nm can be applied.
  • n + -type amorphous silicon having a thickness of about 20 nm can be applied.
  • the first sub-semiconductor film functions as an etching stopper layer in a process of forming a source wiring or a drain wiring by etching.
  • the second sub-semiconductor film is for improving the ohmic contact between the first sub-semiconductor film and the source and drain electrodes (which are formed in a later step).
  • the plasma CVD method and the photolithography method can be applied to the method for forming this semiconductor film (the first sub semiconductor film and the second sub semiconductor film).
  • a semiconductor film is formed by depositing the material of the semiconductor film (the first sub semiconductor film and the second sub semiconductor film) on one surface of the transparent substrate that has undergone the above-described process by using plasma CVD. The Then, the formed semiconductor film (first sub semiconductor film and second sub semiconductor film) is patterned into a predetermined shape by a photolithography method or the like. Specifically, a layer of a photoresist material is formed on the surface of the formed semiconductor film. A spin coater or the like can be applied to form the photoresist material layer. The formed photoresist material layer is exposed to light using a photomask, and then developed. Then, a layer of a photoresist material having a predetermined pattern remains on the surface of the semiconductor film in the display regions 11a and 11b.
  • the semiconductor film is patterned using the patterned layer of the photoresist material as a mask.
  • the semiconductor film for example, wet etching using HF + HNO 3 solution or dry etching using Cl 2 and SF 6 gas can be applied.
  • semiconductor films first sub-semiconductor film and second sub-semiconductor film are formed at positions overlapping the gate electrode with the insulating film interposed therebetween.
  • a second conductor film is formed on the surface of the transparent substrate that has undergone the above-described steps.
  • This second conductor film has a laminated structure of two or more layers made of titanium, aluminum, chromium, molybdenum or the like.
  • the second conductor film has a two-layer structure. That is, the second conductor film has a two-layer structure including a first sub conductor film on the side closer to the transparent substrate and a second sub conductor film on the far side. Titanium or the like can be applied to the first sub conductor film. Aluminum or the like can be applied to the second sub conductor film.
  • Various known sputtering methods can be applied to the method for forming the second conductor film.
  • dry etching using Cl 2 and BCl 3 gas and wet etching using phosphoric acid, acetic acid, and nitric acid can be applied.
  • the data line 113, the drain wiring, and the drain electrode made of the second conductor film are formed.
  • the second sub semiconductor film is also etched using the first sub semiconductor film as an etching stopper layer.
  • the alignment pattern 12 is patterned at the same time.
  • the switching elements 114 that is, the gate electrode, the source electrode, the drain electrode, and the insulating film
  • the scanning lines 112 are formed in the display regions 11a and 11b.
  • a passivation film is formed on the transparent substrate that has undergone the above steps.
  • SiNx silicon nitride
  • As a method for forming the passivation film a plasma CVD method or the like can be applied.
  • an organic insulating film is formed on the surface of the passivation film.
  • An acrylic resin material can be applied to the organic insulating film.
  • the formed organic insulating film is patterned into a predetermined pattern by photolithography or the like. Specifically, in the display regions 11a and 11b, an opening (that is, a contact hole) for electrically connecting the pixel electrode 111 and the drain wiring is formed. When the organic insulating film is patterned to form an opening, a predetermined portion of the passivation film is exposed through the opening.
  • the passivation film and the insulating film are patterned using the patterned organic insulating film as a mask.
  • the pixel electrode 111 is formed in the display areas 11a and 11b.
  • ITO IndiumideTin Oxide
  • Various known sputtering methods can be applied to the method of forming the pixel electrode 111.
  • the first substrate 1a according to the embodiment of the present invention is manufactured.
  • the overall flow of the method for manufacturing the second substrate 1b (that is, the substrate for manufacturing the color filter) according to the embodiment of the present invention is as follows.
  • the manufacturing method of the second substrate 1b according to the embodiment of the present invention includes a black matrix forming step, a colored layer forming step, a protective film forming step, and a transparent electrode (common electrode) forming step.
  • the contents of the black matrix forming step are as follows for the resin BM method, for example.
  • a BM resist (referred to as a photosensitive resin composition containing a black colorant) or the like is applied to the surface of the transparent substrate.
  • the applied BM resist is formed into a predetermined pattern using a photolithography method or the like.
  • a black matrix 117 having a predetermined pattern is formed in “a region that becomes a display region in a state where it is a substrate for a single display panel” (as described above, simply referred to as “display region”).
  • the alignment pattern 12 is formed at the same time. Note that a configuration in which the alignment pattern 12 is not formed in this step may be employed (described later).
  • the color sensitive material method is as follows. First, a colored photosensitive material (referred to as a solution in which a pigment of a predetermined color is dispersed in a photosensitive material) is applied to the surface of the transparent substrate on which the black matrix 117 is formed. Next, the applied colored light-sensitive material is formed into a predetermined pattern using a photolithography method or the like. This step is performed for each color of red, green, and blue. Thereby, the colored layer 119 of each color is formed.
  • the alignment pattern 12 when the alignment pattern 12 is a structure which is not formed in a black matrix formation process, it forms in a colored layer formation process. That is, the alignment pattern 12 is formed at the same time as any one of the red, green, and blue colored layers is formed.
  • the method used in the black matrix forming step is not limited to the resin BM method.
  • various known methods such as a chromium BM method and a superposition method can be applied.
  • the method used in the colored layer forming step is not limited to the colored photosensitive material method.
  • various known methods such as printing, dyeing, electrodeposition, transfer, and etching can be applied.
  • a back exposure method in which the colored layer 119 is formed first and then the black matrix 117 is formed may be used.
  • protective films are formed on the surfaces of the black matrix 117 and the colored layer 119.
  • a protective film having a predetermined pattern is formed on the surface of the transparent substrate that has undergone the above-described steps by a method (overall coating method) in which a protective film material is applied using a spin coater, printing, or photolithography.
  • a method (patterning method) or the like can be applied.
  • the protective film material for example, an acrylic resin or an epoxy resin can be applied.
  • the structure in which a protective film is not formed may be sufficient.
  • the common electrode is formed on the surface of the protective film (in the configuration where the protective film is not formed, the surface of the black matrix 117 and the colored layer 119 of each color).
  • a mask is disposed on the surface of the transparent substrate that has undergone the above-described steps, and indium tin oxide (ITO) is deposited by sputtering or the like to form a transparent electrode (common electrode).
  • ITO indium tin oxide
  • the second substrate 1b according to the embodiment of the present invention is manufactured.
  • alignment films are formed on the surfaces of the display regions 11a and 11b of the first substrate 1a according to the embodiment of the present invention manufactured through the above steps and the second substrate 1b according to the embodiment of the present invention. It is formed. Then, alignment treatment is performed on the formed alignment film. For this alignment treatment, the exposure method according to the embodiment of the present invention is used. Thereafter, the first substrate 1a according to the embodiment of the present invention and the second substrate 1b according to the embodiment of the present invention are bonded together, and liquid crystal is filled therebetween. Then, it is divided into individual liquid crystal display panels.
  • an alignment material is applied to the surfaces of the display areas 11a and 11b of the substrate 1 according to the embodiment of the present invention using an alignment material application device or the like.
  • the alignment material refers to a solution containing a material that is a raw material for the alignment film.
  • polyimide can be applied to the alignment film.
  • the solution which uses a polyimide as a solute is applicable to an orientation material.
  • An ink jet printing apparatus (dispenser) can be applied to the alignment material coating apparatus.
  • the applied alignment material is heated and baked using an alignment film baking apparatus or the like.
  • alignment treatment is performed on the baked alignment film.
  • the display regions 11a and 11b are surrounded by the first substrate 1a according to the embodiment of the present invention or the second substrate 1b according to the embodiment of the present invention by using a seal patterning device or the like. A sealing material is applied.
  • a spacer for example, a plastic bead having a predetermined diameter
  • a spacer spraying device or the like is the first substrate 1a according to the embodiment of the present invention, or Are dispersed on the surface of the second substrate 1b according to the embodiment of the present invention.
  • a spacer is not sprayed.
  • the liquid crystal is dropped on a region surrounded by the sealing material on the surface of the first substrate 1a according to the embodiment of the present invention or the second substrate 1b according to the embodiment of the present invention. Is done.
  • the first substrate 1a according to the embodiment of the present invention and the second substrate 1b according to the embodiment of the present invention are bonded together under a reduced pressure atmosphere.
  • the sealing material is solidified.
  • the sealing material is irradiated with ultraviolet rays after bonding.
  • each of the divided liquid crystal display panels is subjected to a predetermined inspection (for example, a lighting inspection), and then a polarizing film is attached to the surfaces on both sides thereof in a crossed Nicol manner.
  • a predetermined inspection for example, a lighting inspection
  • a polarizing film is attached to the surfaces on both sides thereof in a crossed Nicol manner.
  • the region where the inspection terminal is provided is divided.
  • the liquid crystal display panel is manufactured through these steps.
  • the liquid crystal display panel subjected to the alignment treatment by the exposure method according to the embodiment of the present invention it is possible to make the alignment state uniform for all the liquid crystal display panels manufactured from one substrate.
  • the alignment state can be made uniform. For this reason, a liquid crystal display panel with high display quality can be provided.
  • the substrate according to the present invention and the exposure method according to the present invention even when a single mask extends over a plurality of exposure target areas or a plurality of display areas having different sizes, a plurality of exposure target areas or The accuracy of the irradiation position and range of light energy can be maintained for each of the plurality of display areas.
  • the mask position is controlled by either the plurality of exposure target areas or the plurality of display areas.
  • the predetermined element to be formed if the mask is positioned outside any one of the exposure target areas or any one of the display areas, it is difficult to control the position of the mask with high accuracy. For this reason, there is a possibility that the accuracy of the irradiation position and range of the optical energy with respect to any other exposure target area or any other display area may be lowered.
  • the alignment pattern is used for controlling the irradiation position and range of the light energy in the exposure, whereby a plurality of exposure target regions having different sizes from each other.
  • highly accurate control of the mask position can be continued for any of the plurality of display areas.
  • the photo-alignment processing method it is possible to accurately irradiate light energy to the picture elements formed in all display areas. Accordingly, in all display regions formed on the substrate, when forming a plurality of regions having different alignment states formed in one picture element, the alignment is disturbed at the boundary between the regions having different alignment states. Occurrence can be prevented or suppressed. For this reason, in all display panels manufactured from one substrate, it is possible to prevent or suppress the occurrence of liquid crystal alignment disorder. Therefore, it is possible to maintain or improve the display quality of a plurality of display panels manufactured from a single substrate. In addition, it is possible to prevent or suppress the inclusion of defective products in a plurality of display panels manufactured from a single substrate.
  • the exposure method in the photo-alignment has been described.
  • the method can be applied to processes other than the alignment process. .

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
PCT/JP2011/050829 2010-01-21 2011-01-19 基板、基板に対する露光方法、光配向処理方法 WO2011090057A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201180006810.2A CN102725680B (zh) 2010-01-21 2011-01-19 基板、针对基板的曝光方法、光取向处理方法
JP2011550921A JP5351287B2 (ja) 2010-01-21 2011-01-19 基板、基板に対する露光方法、光配向処理方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010-010584 2010-01-21
JP2010010584 2010-01-21

Publications (1)

Publication Number Publication Date
WO2011090057A1 true WO2011090057A1 (ja) 2011-07-28

Family

ID=44306859

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2011/050829 WO2011090057A1 (ja) 2010-01-21 2011-01-19 基板、基板に対する露光方法、光配向処理方法

Country Status (3)

Country Link
JP (1) JP5351287B2 (zh)
CN (1) CN102725680B (zh)
WO (1) WO2011090057A1 (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015125322A (ja) * 2013-12-26 2015-07-06 大日本印刷株式会社 多面付けカラーフィルタ、有機エレクトロルミネッセンス表示装置および多面付けカラーフィルタの製造方法
JP2018526678A (ja) * 2015-09-01 2018-09-13 深▲セン▼市華星光電技術有限公司 光配向に用いられるフォトマスク及び光配向の方法
KR102154767B1 (ko) * 2019-05-20 2020-09-10 우리마이크론(주) 디스플레이 패널 검사 장치

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6415479B2 (ja) * 2016-06-01 2018-10-31 キヤノン株式会社 露光装置、露光方法、及び半導体パッケージの製造方法
CN105892156B (zh) * 2016-06-07 2019-05-03 深圳市华星光电技术有限公司 对透明基板进行曝光的方法
CN106200132A (zh) * 2016-08-31 2016-12-07 深圳市华星光电技术有限公司 一种改善套切面板光配向性的装置
CN107065312B (zh) * 2016-12-30 2020-09-04 深圳市华星光电技术有限公司 一种平曲面共用改善液晶显示穿透率的方法
CN108519709A (zh) * 2018-06-01 2018-09-11 Oppo广东移动通信有限公司 电致变色母板、电致变色单元、壳体以及电子设备
CN109507851B (zh) * 2018-12-29 2021-06-29 成都中电熊猫显示科技有限公司 显示面板和显示装置
US11043437B2 (en) * 2019-01-07 2021-06-22 Applied Materials, Inc. Transparent substrate with light blocking edge exclusion zone
CN111596531B (zh) * 2020-06-18 2023-08-01 京东方科技集团股份有限公司 一种曝光机的曝光方法及显示基板

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS603609A (ja) * 1983-06-21 1985-01-10 Sharp Corp 液晶表示素子の製造方法
JP2004177942A (ja) * 2002-11-28 2004-06-24 Lg Phillips Lcd Co Ltd 液晶表示装置の製造方法
WO2006132369A1 (ja) * 2005-06-09 2006-12-14 Sharp Kabushiki Kaisha 液晶表示装置
WO2008108032A1 (ja) * 2007-03-05 2008-09-12 Sharp Kabushiki Kaisha 液晶表示装置及びその製造方法
JP2009198535A (ja) * 2008-02-19 2009-09-03 Seiko Epson Corp マザー基材、膜形成領域の配設方法、及びカラーフィルタの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100698044B1 (ko) * 2002-10-19 2007-03-23 엘지.필립스 엘시디 주식회사 마스크 설계 방법 및 패널 형성 방법
JP4478411B2 (ja) * 2003-07-22 2010-06-09 株式会社リコー パターン形成方法
JP4253707B2 (ja) * 2004-04-28 2009-04-15 株式会社ブイ・テクノロジー 露光パターン形成方法
US7388663B2 (en) * 2004-10-28 2008-06-17 Asml Netherlands B.V. Optical position assessment apparatus and method
JPWO2006101086A1 (ja) * 2005-03-22 2008-09-04 株式会社ニコン 露光装置、露光方法及びマイクロデバイスの製造方法
JP4754924B2 (ja) * 2005-10-07 2011-08-24 株式会社ブイ・テクノロジー 露光装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS603609A (ja) * 1983-06-21 1985-01-10 Sharp Corp 液晶表示素子の製造方法
JP2004177942A (ja) * 2002-11-28 2004-06-24 Lg Phillips Lcd Co Ltd 液晶表示装置の製造方法
WO2006132369A1 (ja) * 2005-06-09 2006-12-14 Sharp Kabushiki Kaisha 液晶表示装置
WO2008108032A1 (ja) * 2007-03-05 2008-09-12 Sharp Kabushiki Kaisha 液晶表示装置及びその製造方法
JP2009198535A (ja) * 2008-02-19 2009-09-03 Seiko Epson Corp マザー基材、膜形成領域の配設方法、及びカラーフィルタの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015125322A (ja) * 2013-12-26 2015-07-06 大日本印刷株式会社 多面付けカラーフィルタ、有機エレクトロルミネッセンス表示装置および多面付けカラーフィルタの製造方法
JP2018526678A (ja) * 2015-09-01 2018-09-13 深▲セン▼市華星光電技術有限公司 光配向に用いられるフォトマスク及び光配向の方法
KR102154767B1 (ko) * 2019-05-20 2020-09-10 우리마이크론(주) 디스플레이 패널 검사 장치

Also Published As

Publication number Publication date
JPWO2011090057A1 (ja) 2013-05-23
JP5351287B2 (ja) 2013-11-27
CN102725680B (zh) 2015-02-11
CN102725680A (zh) 2012-10-10

Similar Documents

Publication Publication Date Title
JP5351287B2 (ja) 基板、基板に対する露光方法、光配向処理方法
US8055099B2 (en) Exposure method and exposure device
KR101183374B1 (ko) 액정표시장치 및 그 제조방법
KR102113622B1 (ko) 표시 장치 및 그 제조 방법
JP2000122071A (ja) 液晶表示素子及び液晶表示素子の製造方法
KR100949493B1 (ko) 액정표시패널의 제조방법
JP2006243171A (ja) 表示装置用基板
US6502324B2 (en) Method of alignment between sheet materials, method of alignment, substrate assembling method and aligning apparatus
JP4744954B2 (ja) 基板製造方法および露光装置
TW201131216A (en) Color filter substrate, display device and exposure method
US20080062217A1 (en) Inkjet printing apparatus and method for inspecting color filter and method for manufacturing color filter panel using the same
JP2008102241A (ja) パターン描画装置、パターン描画システムおよびパターン描画方法
US20090155933A1 (en) Manufacturing Method of Display Device
WO2010047307A1 (ja) 表示パネル用の基板、表示パネル、表示パネル用の基板の製造方法
JP2004133200A (ja) 露光用マスク及びそれを用いた液晶表示装置の製造方法
US9229285B2 (en) Method of manufacturing a display device
JP2006337696A (ja) 液晶パネルの製造方法
US20170329177A1 (en) Liquid Crystal Display Panel, Liquid Crystal Display Apparatus, and Method of Manufacturing Liquid Crystal Display Panel
KR101060876B1 (ko) 배향막 인쇄판과 그 제조방법 및 그를 포함하는 배향막인쇄장치
JP2001159755A (ja) 液晶表示装置及びその製造方法
KR20080089959A (ko) 액정표시장치용 인쇄장치
JP4632741B2 (ja) 液晶表示装置用の基板の製造方法
JP2007240932A (ja) 表示パネル用の基板および表示パネル
JP2007271740A (ja) 滴下装置、滴下方法、表示パネル用の基板および表示パネル
JP3823692B2 (ja) 露光基板の製造方法及び電気光学装置の製造方法、並びに露光基板及び電気光学装置

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 201180006810.2

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 11734663

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2011550921

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 11734663

Country of ref document: EP

Kind code of ref document: A1