JP5351287B2 - 基板、基板に対する露光方法、光配向処理方法 - Google Patents

基板、基板に対する露光方法、光配向処理方法 Download PDF

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Publication number
JP5351287B2
JP5351287B2 JP2011550921A JP2011550921A JP5351287B2 JP 5351287 B2 JP5351287 B2 JP 5351287B2 JP 2011550921 A JP2011550921 A JP 2011550921A JP 2011550921 A JP2011550921 A JP 2011550921A JP 5351287 B2 JP5351287 B2 JP 5351287B2
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Japan
Prior art keywords
substrate
exposure
mask
display
certain size
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Expired - Fee Related
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Japanese (ja)
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JPWO2011090057A1 (ja
Inventor
貴浩 平子
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Sharp Corp
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Sharp Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
JP2011550921A 2010-01-21 2011-01-19 基板、基板に対する露光方法、光配向処理方法 Expired - Fee Related JP5351287B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011550921A JP5351287B2 (ja) 2010-01-21 2011-01-19 基板、基板に対する露光方法、光配向処理方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2010010584 2010-01-21
JP2010010584 2010-01-21
JP2011550921A JP5351287B2 (ja) 2010-01-21 2011-01-19 基板、基板に対する露光方法、光配向処理方法
PCT/JP2011/050829 WO2011090057A1 (ja) 2010-01-21 2011-01-19 基板、基板に対する露光方法、光配向処理方法

Publications (2)

Publication Number Publication Date
JPWO2011090057A1 JPWO2011090057A1 (ja) 2013-05-23
JP5351287B2 true JP5351287B2 (ja) 2013-11-27

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JP2011550921A Expired - Fee Related JP5351287B2 (ja) 2010-01-21 2011-01-19 基板、基板に対する露光方法、光配向処理方法

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JP (1) JP5351287B2 (zh)
CN (1) CN102725680B (zh)
WO (1) WO2011090057A1 (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6459170B2 (ja) * 2013-12-26 2019-01-30 大日本印刷株式会社 多面付けカラーフィルタ、有機エレクトロルミネッセンス表示装置および多面付けカラーフィルタの製造方法
CN105068375B (zh) * 2015-09-01 2017-05-31 深圳市华星光电技术有限公司 用于光配向的光罩及光配向方法
JP6415479B2 (ja) * 2016-06-01 2018-10-31 キヤノン株式会社 露光装置、露光方法、及び半導体パッケージの製造方法
CN105892156B (zh) * 2016-06-07 2019-05-03 深圳市华星光电技术有限公司 对透明基板进行曝光的方法
CN106200132A (zh) * 2016-08-31 2016-12-07 深圳市华星光电技术有限公司 一种改善套切面板光配向性的装置
CN107065312B (zh) * 2016-12-30 2020-09-04 深圳市华星光电技术有限公司 一种平曲面共用改善液晶显示穿透率的方法
CN108519709A (zh) * 2018-06-01 2018-09-11 Oppo广东移动通信有限公司 电致变色母板、电致变色单元、壳体以及电子设备
CN109507851B (zh) * 2018-12-29 2021-06-29 成都中电熊猫显示科技有限公司 显示面板和显示装置
US11043437B2 (en) * 2019-01-07 2021-06-22 Applied Materials, Inc. Transparent substrate with light blocking edge exclusion zone
KR102154767B1 (ko) * 2019-05-20 2020-09-10 우리마이크론(주) 디스플레이 패널 검사 장치
CN111596531B (zh) * 2020-06-18 2023-08-01 京东方科技集团股份有限公司 一种曝光机的曝光方法及显示基板

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005043424A (ja) * 2003-07-22 2005-02-17 Ricoh Co Ltd パターン形成方法
JP2006128693A (ja) * 2004-10-28 2006-05-18 Asml Netherlands Bv 光学的に位置を評価する機器及び方法
WO2006101086A1 (ja) * 2005-03-22 2006-09-28 Nikon Corporation 露光装置、露光方法及びマイクロデバイスの製造方法
JP2007102094A (ja) * 2005-10-07 2007-04-19 V Technology Co Ltd 露光装置
JP2009198535A (ja) * 2008-02-19 2009-09-03 Seiko Epson Corp マザー基材、膜形成領域の配設方法、及びカラーフィルタの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS603609A (ja) * 1983-06-21 1985-01-10 Sharp Corp 液晶表示素子の製造方法
KR100698044B1 (ko) * 2002-10-19 2007-03-23 엘지.필립스 엘시디 주식회사 마스크 설계 방법 및 패널 형성 방법
KR100710163B1 (ko) * 2002-11-28 2007-04-20 엘지.필립스 엘시디 주식회사 액정표시장치의 제조방법
JP4253707B2 (ja) * 2004-04-28 2009-04-15 株式会社ブイ・テクノロジー 露光パターン形成方法
TWI405013B (zh) * 2005-06-09 2013-08-11 Sharp Kk 液晶顯示裝置
US8134668B2 (en) * 2007-03-05 2012-03-13 Sharp Kabushiki Kaisha Liquid crystal display device and production method thereof

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005043424A (ja) * 2003-07-22 2005-02-17 Ricoh Co Ltd パターン形成方法
JP2006128693A (ja) * 2004-10-28 2006-05-18 Asml Netherlands Bv 光学的に位置を評価する機器及び方法
WO2006101086A1 (ja) * 2005-03-22 2006-09-28 Nikon Corporation 露光装置、露光方法及びマイクロデバイスの製造方法
JP2007102094A (ja) * 2005-10-07 2007-04-19 V Technology Co Ltd 露光装置
JP2009198535A (ja) * 2008-02-19 2009-09-03 Seiko Epson Corp マザー基材、膜形成領域の配設方法、及びカラーフィルタの製造方法

Also Published As

Publication number Publication date
JPWO2011090057A1 (ja) 2013-05-23
WO2011090057A1 (ja) 2011-07-28
CN102725680B (zh) 2015-02-11
CN102725680A (zh) 2012-10-10

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