JP5351287B2 - 基板、基板に対する露光方法、光配向処理方法 - Google Patents

基板、基板に対する露光方法、光配向処理方法 Download PDF

Info

Publication number
JP5351287B2
JP5351287B2 JP2011550921A JP2011550921A JP5351287B2 JP 5351287 B2 JP5351287 B2 JP 5351287B2 JP 2011550921 A JP2011550921 A JP 2011550921A JP 2011550921 A JP2011550921 A JP 2011550921A JP 5351287 B2 JP5351287 B2 JP 5351287B2
Authority
JP
Japan
Prior art keywords
substrate
exposure
mask
display
certain size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011550921A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2011090057A1 (ja
Inventor
貴浩 平子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP2011550921A priority Critical patent/JP5351287B2/ja
Publication of JPWO2011090057A1 publication Critical patent/JPWO2011090057A1/ja
Application granted granted Critical
Publication of JP5351287B2 publication Critical patent/JP5351287B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
JP2011550921A 2010-01-21 2011-01-19 基板、基板に対する露光方法、光配向処理方法 Expired - Fee Related JP5351287B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011550921A JP5351287B2 (ja) 2010-01-21 2011-01-19 基板、基板に対する露光方法、光配向処理方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2010010584 2010-01-21
JP2010010584 2010-01-21
JP2011550921A JP5351287B2 (ja) 2010-01-21 2011-01-19 基板、基板に対する露光方法、光配向処理方法
PCT/JP2011/050829 WO2011090057A1 (ja) 2010-01-21 2011-01-19 基板、基板に対する露光方法、光配向処理方法

Publications (2)

Publication Number Publication Date
JPWO2011090057A1 JPWO2011090057A1 (ja) 2013-05-23
JP5351287B2 true JP5351287B2 (ja) 2013-11-27

Family

ID=44306859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011550921A Expired - Fee Related JP5351287B2 (ja) 2010-01-21 2011-01-19 基板、基板に対する露光方法、光配向処理方法

Country Status (3)

Country Link
JP (1) JP5351287B2 (zh)
CN (1) CN102725680B (zh)
WO (1) WO2011090057A1 (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6459170B2 (ja) * 2013-12-26 2019-01-30 大日本印刷株式会社 多面付けカラーフィルタ、有機エレクトロルミネッセンス表示装置および多面付けカラーフィルタの製造方法
CN105068375B (zh) * 2015-09-01 2017-05-31 深圳市华星光电技术有限公司 用于光配向的光罩及光配向方法
JP6415479B2 (ja) * 2016-06-01 2018-10-31 キヤノン株式会社 露光装置、露光方法、及び半導体パッケージの製造方法
CN105892156B (zh) 2016-06-07 2019-05-03 深圳市华星光电技术有限公司 对透明基板进行曝光的方法
CN106200132A (zh) 2016-08-31 2016-12-07 深圳市华星光电技术有限公司 一种改善套切面板光配向性的装置
CN107065312B (zh) * 2016-12-30 2020-09-04 深圳市华星光电技术有限公司 一种平曲面共用改善液晶显示穿透率的方法
CN108519709A (zh) * 2018-06-01 2018-09-11 Oppo广东移动通信有限公司 电致变色母板、电致变色单元、壳体以及电子设备
CN109507851B (zh) * 2018-12-29 2021-06-29 成都中电熊猫显示科技有限公司 显示面板和显示装置
US11043437B2 (en) * 2019-01-07 2021-06-22 Applied Materials, Inc. Transparent substrate with light blocking edge exclusion zone
KR102154767B1 (ko) * 2019-05-20 2020-09-10 우리마이크론(주) 디스플레이 패널 검사 장치
CN111596531B (zh) * 2020-06-18 2023-08-01 京东方科技集团股份有限公司 一种曝光机的曝光方法及显示基板

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005043424A (ja) * 2003-07-22 2005-02-17 Ricoh Co Ltd パターン形成方法
JP2006128693A (ja) * 2004-10-28 2006-05-18 Asml Netherlands Bv 光学的に位置を評価する機器及び方法
WO2006101086A1 (ja) * 2005-03-22 2006-09-28 Nikon Corporation 露光装置、露光方法及びマイクロデバイスの製造方法
JP2007102094A (ja) * 2005-10-07 2007-04-19 V Technology Co Ltd 露光装置
JP2009198535A (ja) * 2008-02-19 2009-09-03 Seiko Epson Corp マザー基材、膜形成領域の配設方法、及びカラーフィルタの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS603609A (ja) * 1983-06-21 1985-01-10 Sharp Corp 液晶表示素子の製造方法
KR100698044B1 (ko) * 2002-10-19 2007-03-23 엘지.필립스 엘시디 주식회사 마스크 설계 방법 및 패널 형성 방법
KR100710163B1 (ko) * 2002-11-28 2007-04-20 엘지.필립스 엘시디 주식회사 액정표시장치의 제조방법
JP4253707B2 (ja) * 2004-04-28 2009-04-15 株式会社ブイ・テクノロジー 露光パターン形成方法
JP4744518B2 (ja) * 2005-06-09 2011-08-10 シャープ株式会社 液晶表示装置
US8134668B2 (en) * 2007-03-05 2012-03-13 Sharp Kabushiki Kaisha Liquid crystal display device and production method thereof

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005043424A (ja) * 2003-07-22 2005-02-17 Ricoh Co Ltd パターン形成方法
JP2006128693A (ja) * 2004-10-28 2006-05-18 Asml Netherlands Bv 光学的に位置を評価する機器及び方法
WO2006101086A1 (ja) * 2005-03-22 2006-09-28 Nikon Corporation 露光装置、露光方法及びマイクロデバイスの製造方法
JP2007102094A (ja) * 2005-10-07 2007-04-19 V Technology Co Ltd 露光装置
JP2009198535A (ja) * 2008-02-19 2009-09-03 Seiko Epson Corp マザー基材、膜形成領域の配設方法、及びカラーフィルタの製造方法

Also Published As

Publication number Publication date
CN102725680B (zh) 2015-02-11
CN102725680A (zh) 2012-10-10
JPWO2011090057A1 (ja) 2013-05-23
WO2011090057A1 (ja) 2011-07-28

Similar Documents

Publication Publication Date Title
JP5351287B2 (ja) 基板、基板に対する露光方法、光配向処理方法
US8055099B2 (en) Exposure method and exposure device
KR102113622B1 (ko) 표시 장치 및 그 제조 방법
JP2000122071A (ja) 液晶表示素子及び液晶表示素子の製造方法
KR100949493B1 (ko) 액정표시패널의 제조방법
JP2006243171A (ja) 表示装置用基板
US6502324B2 (en) Method of alignment between sheet materials, method of alignment, substrate assembling method and aligning apparatus
US20210271160A1 (en) Photomask, method for producing photomask, and method for producing color filter using photomask
JP4744954B2 (ja) 基板製造方法および露光装置
TW201131216A (en) Color filter substrate, display device and exposure method
US20080062217A1 (en) Inkjet printing apparatus and method for inspecting color filter and method for manufacturing color filter panel using the same
JP2008102241A (ja) パターン描画装置、パターン描画システムおよびパターン描画方法
US20090155933A1 (en) Manufacturing Method of Display Device
JP2004133200A (ja) 露光用マスク及びそれを用いた液晶表示装置の製造方法
WO2010047307A1 (ja) 表示パネル用の基板、表示パネル、表示パネル用の基板の製造方法
US9229285B2 (en) Method of manufacturing a display device
JP2006337696A (ja) 液晶パネルの製造方法
JP2001159755A (ja) 液晶表示装置及びその製造方法
KR102010959B1 (ko) 배향막 형성 방법 및 이를 이용한 액정표시장치 제조 방법
JP2007240932A (ja) 表示パネル用の基板および表示パネル
JP2007271740A (ja) 滴下装置、滴下方法、表示パネル用の基板および表示パネル
JP3823692B2 (ja) 露光基板の製造方法及び電気光学装置の製造方法、並びに露光基板及び電気光学装置
US20100208186A1 (en) Display device and manufacturing mehtod thereof
US8416384B2 (en) Exposing apparatus for fabricating process of flat panel display device
JP2005099232A (ja) 液晶表示装置用基板

Legal Events

Date Code Title Description
TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130730

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130822

R150 Certificate of patent or registration of utility model

Ref document number: 5351287

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees