WO2010103633A1 - Appareil de récupération de chlorosilane et procédé de récupération de chlorosilane à l'aide dudit appareil - Google Patents

Appareil de récupération de chlorosilane et procédé de récupération de chlorosilane à l'aide dudit appareil Download PDF

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WO2010103633A1
WO2010103633A1 PCT/JP2009/054666 JP2009054666W WO2010103633A1 WO 2010103633 A1 WO2010103633 A1 WO 2010103633A1 JP 2009054666 W JP2009054666 W JP 2009054666W WO 2010103633 A1 WO2010103633 A1 WO 2010103633A1
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Prior art keywords
liquid
gas
tetrachlorosilane
chlorosilane
collection
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PCT/JP2009/054666
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English (en)
Japanese (ja)
Inventor
靖史 松尾
晃一 竹村
誠 松倉
和之 湯舟
一正 松音
潤 中本
裕介 和久田
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電気化学工業株式会社
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Priority to JP2011503605A priority Critical patent/JP5329641B2/ja
Priority to PCT/JP2009/054666 priority patent/WO2010103633A1/fr
Priority to TW099102344A priority patent/TW201036912A/zh
Publication of WO2010103633A1 publication Critical patent/WO2010103633A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane

Definitions

  • the present invention relates to a chlorosilane recovery apparatus having excellent recovery efficiency and a chlorosilane recovery method using the same.
  • Trichlorosilane (SiHCl 3 ) is a special material gas used for manufacturing semiconductors, liquid crystal panels, solar cells, and the like. In recent years, demand has been steadily expanding, and growth is expected as a CVD material widely used in the electronics field.
  • Trichlorosilane is produced by contacting tetrachlorosilane (SiCl 4 ) and hydrogen (H 2 ) to achieve the following thermal equilibrium state.
  • SiCl 4 + H 2 ⁇ SiHCl 3 + HCl (1) This reaction is performed by heating a raw material gas composed of gasified tetrachlorosilane and hydrogen to 700 to 1400 ° C. in a reaction furnace. At this time, the following equilibrium reaction occurs in addition to the above reaction, and monochlorosilane (SiH 3 Cl) and dichlorosilane (SiH 2 Cl 2 ) are by-produced in addition to trichlorosilane.
  • chlorosilanes other than trichlorosilane that is, monochlorosilane, dichlorosilane, and tetrachlorosilane, can be reused for the production of trichlorosilane or used as a raw material for producing monosilane (SiH 4 ). It is desirable to collect.
  • the mixed gas discharged from the reactor that is, the reaction product gas containing various chlorosilanes including trichlorosilane is transferred to the ⁇ 70 ° C. condenser. It is introduced from above (FIGS. 3 and 4). Therefore, the chlorosilane that has not been condensed in the condenser and of course the chlorosilane that has been condensed but not collected as a liquid but mixed in the gas flow in the form of fine particles is discharged from the condenser as uncondensed gas.
  • the non-condensed gas discharged from the condenser cooled to ⁇ 70 ° C. still contains a non-negligible amount of chlorosilane, which contributes to a reduction in chlorosilane recovery.
  • the present invention has been made in view of the above circumstances, and an object thereof is to provide a chlorosilane recovery apparatus having excellent recovery efficiency and a chlorosilane recovery method using the same.
  • the chlorosilane recovery apparatus of the present invention is A cooler for cooling chlorosilane gas containing tetrachlorosilane; A collection tank containing a collection liquid containing tetrachlorosilane; A gas-liquid mixture supply pipe for deriving a gas-liquid mixture composed of a liquid component liquefied by the cooler and a gas component not liquefied from the cooler into the collected liquid in the collection tank; A tetrachlorosilane supply pipe for adjusting the concentration of tetrachlorosilane in the collection liquid to be higher than the concentration of tetrachlorosilane in the liquid component of the gas-liquid mixture by adding tetrachlorosilane to the collection tank;
  • the chlorosilane recovery apparatus of the present invention is A cooler for cooling chlorosilane gas comprising tetrachlorosilane and at least one chlorosilane selected from the group consisting of monochlorosilane, dichlorosilane, and trichlorosilane;
  • a gas-liquid mixture supply pipe for deriving a gas-liquid mixture composed of a liquid component liquefied by the cooler and a gas component not liquefied from the cooler into the collected liquid in the collection tank;
  • a tetrachlorosilane supply pipe for adjusting the concentration of tetrachlorosilane in the collection liquid to be higher than the concentration of tetrachlorosilane in the liquid component of the gas-liquid mixture
  • the chlorosilane recovery method of the present invention comprises: A step of cooling chlorosilane gas containing tetrachlorosilane, A step of deriving a gas-liquid mixture comprising a liquid component liquefied by cooling and a gas component not liquefied into a collection liquid containing tetrachlorosilane, Adding tetrachlorosilane to the collection liquid and adjusting the tetrachlorosilane concentration of the collection liquid to be higher than the tetrachlorosilane concentration of the liquid component of the gas-liquid mixture; A step of recovering chlorosilane from the collected liquid.
  • the chlorosilane recovery method of the present invention includes: Cooling a chlorosilane gas comprising tetrachlorosilane and at least one chlorosilane selected from the group consisting of monochlorosilane, dichlorosilane and trichlorosilane; A gas-liquid mixture comprising a liquid component liquefied by cooling and a gas component not liquefied comprises tetrachlorosilane and at least one chlorosilane selected from the group consisting of monochlorosilane, dichlorosilane and trichlorosilane.
  • the present inventors derive a gas-liquid mixture obtained by cooling chlorosilane gas containing tetrachlorosilane into a collection liquid having a higher tetrachlorosilane concentration than the liquid components constituting the gas-liquid mixture.
  • a gas-liquid mixture obtained by cooling chlorosilane gas containing tetrachlorosilane into a collection liquid having a higher tetrachlorosilane concentration than the liquid components constituting the gas-liquid mixture.
  • the gas component of the gas-liquid mixture is vented as fine bubbles in the collected liquid, so that it is condensed by cooling, but is suspended in the gas component in the form of fine particles. Can be brought into contact with the interface with the collection liquid with a high probability, and can be reliably captured in the collection liquid.
  • the gas component of the gas-liquid mixture is aerated in the collection liquid as fine bubbles to surround the finely divided gas component and cool it, the gas component can be cooled more reliably. it can. Therefore, the chlorosilane contained in the gas component of the gas-liquid mixture in an uncondensed state can be more reliably condensed.
  • the recovery efficiency of chlorosilane can be improved by positively adding tetrachlorosilane to the collection liquid and adjusting the tetrachlorosilane concentration of the collection liquid to be higher than the liquid component of the gas-liquid mixture.
  • emitted as uncondensed gas can be reduced.
  • the chlorosilane contained in the gas component without being condensed can be more reliably condensed, and the gas component can be condensed. Mist chlorosilane floating in the form of fine particles can be captured more reliably.
  • the recovery efficiency of chlorosilane can be improved by adjusting the concentration of tetrachlorosilane in the collected liquid to be higher than the liquid component of the gas-liquid mixture. For this reason, the amount of chlorosilane that would otherwise be discharged as uncondensed gas can be reduced, and as a result, the productivity of the target chlorosilane can be greatly improved.
  • FIG. 1 schematically shows a chlorosilane recovery device of this embodiment.
  • the chlorosilane recovery apparatus 100 of this embodiment is A cooler 102 for cooling chlorosilane gas containing tetrachlorosilane;
  • a collection tank 106 containing a collection liquid 111 containing tetrachlorosilane;
  • a gas-liquid mixture supply pipe 103 for deriving a gas-liquid mixture composed of a liquid component liquefied by the cooler 102 and a gas component not liquefied from the cooler 102 into a collecting liquid 111 in the collecting tank 106;
  • a tetrachlorosilane supply pipe 109 for adjusting the concentration of tetrachlorosilane in the collection liquid 111 to be higher than the liquid component of the gas-liquid mixture by adding tetrachlorosilane to the collection tank 106;
  • the cooler 102 is not particularly limited as long as it can finally cool the chlorosilane gas containing tetrachlorosilane to about ⁇ 40 to ⁇ 70 ° C., more preferably about ⁇ 60 to ⁇ 70 ° C.
  • the chlorosilane gas containing tetrachlorosilane it may be possible to cool to a lower temperature.
  • the boiling point of HCl that can be contained in the chlorosilane gas is ⁇ 85 ° C. and the coagulation temperature of tetrachlorosilane is ⁇ 70 ° C., it is preferable to cool to the above temperature range.
  • the cooler 102 includes a chlorosilane gas introduction pipe 101 that introduces chlorosilane gas into the cooler 102, and a collection tank that will be described later with a gas-liquid mixture comprising a liquid component liquefied by the cooler 102 and a gas component that has not been liquefied.
  • the gas-liquid mixture supply pipe 103 that supplies the collected liquid 111 accommodated in 106 is connected.
  • the collection tank 106 is made of a material that does not react with chlorosilane gas, typically a metal such as stainless steel.
  • a gas-liquid mixture supply pipe 103 for taking in the gas-liquid mixture obtained by the cooler 102 is connected to the lower side wall of the collection tank 106, and the tip of the gas-liquid mixture supply pipe 103 is connected to the inside of the collection tank 106. Has been inserted to reach.
  • a condensate drain pipe 107 is connected to the bottom of the collection tank 106 so that the liquid component collected in the collection tank 106 can be taken out together with the collection liquid 111 described later.
  • An uncondensed gas extraction pipe 108 is connected to the upper part of the collection tank 106 so that uncondensed gas components that have not been collected in the collection tank 106 can be derived.
  • a cooling unit 110 for cooling the collection liquid 111 accommodated in the collection tank 106 is provided on the outer peripheral portion of the collection tank 106.
  • the cooling unit 110 is capable of cooling the collected liquid 111 to a temperature substantially equal to or lower than the liquid component of the gas-liquid mixture cooled by the cooler 102, preferably about ⁇ 60 to ⁇ 70 ° C.
  • the temperature of the collected liquid 111 is substantially the same temperature or lower than that of the gas-liquid mixture, when the gas-liquid mixture is supplied to the collected liquid 111, the mist-like chlorosilane is warmed. It is possible to prevent vaporization again.
  • the gas component of the gas-liquid mixture is vented as fine bubbles in the collection liquid 111, the cooled collection liquid 111 surrounds the bubbles, so that the gas component can be further reliably cooled.
  • the gas-liquid mixture supply pipe 103 supplies a gas-liquid mixture composed of the liquid component liquefied by the cooler 102 and the gas component not liquefied into the collection liquid 111 accommodated in the collection tank 106. Since a gas component is contained in the gas-liquid mixture supplied from the gas-liquid mixture supply pipe 103, the gas component is vented into the collection liquid 111 with such a configuration. For this reason, the gas component divided into fine bubbles can be surrounded and cooled, and the gas component can be reliably cooled.
  • the bubbles of the released gas component are further refined, and the cooling efficiency is further improved.
  • the distal end portion 104 of the gas-liquid mixture supply pipe 103 is not particularly limited, and for example, the pipe may be bent in a concentric circle shape, a spiral shape, or a parallel shape, and a large number of blowing holes 105 may be formed therethrough. Further, as the distal end portion 104, a disc-shaped or spherical header having a large number of blowing holes 105 provided at the distal end of the gas-liquid mixture supply pipe 103 may be attached.
  • ⁇ Tetrachlorosilane supply pipe The tetrachlorosilane supply pipe 109 supplies liquid tetrachlorosilane to the inside of the collection tank 106 to adjust the tetrachlorosilane concentration in the collection liquid 111.
  • the tetrachlorosilane concentration in the collection liquid 111 gradually decreases while the gas-liquid mixture cooled by the cooler 102 is supplied.
  • the tetrachlorosilane supply pipe 109 supplements tetrachlorosilane with a decrease in the tetrachlorosilane concentration in the collection liquid 111, and maintains the tetrachlorosilane concentration at a constant value higher than the tetrachlorosilane concentration of the liquid component of the gas-liquid mixture.
  • the temperature of the tetrachlorosilane supplied from the tetrachlorosilane supply pipe 109 is cooled to a temperature substantially equal to or lower than that of the collection liquid 111 so that the temperature of the collection liquid 111 is not increased by the supply of tetrachlorosilane. Keep it.
  • the supplied tetrachlorosilane is uniformly mixed in the collection liquid 111 by stirring the collection liquid 111 with bubbles released from the tip 104 of the gas-liquid mixture supply pipe 103.
  • ⁇ Collecting liquid> As the collection liquid 111, a liquid having substantially the same composition as the liquid component obtained by cooling the chlorosilane gas with the cooler 102 is used. Typically, tetrachlorosilane is added to the liquid component obtained by the cooler 102 and the tetrachlorosilane concentration is increased as compared with the liquid component. Moreover, the composition of the liquid component of a gas-liquid mixture can be investigated beforehand, and tetrachlorosilane and various chlorosilanes can be mixed and prepared.
  • the collected liquid 111 is cooled by the cooling unit 110 to a temperature substantially equal to or lower than the liquid component of the gas-liquid mixture cooled by the cooler 102, preferably about ⁇ 60 to ⁇ 70 ° C. .
  • the tetrachlorosilane concentration of the collection liquid 111 is adjusted to be higher than the liquid component obtained by cooling the chlorosilane gas with the cooler 102 via the tetrachlorosilane supply pipe 109 as described above.
  • the concentration of tetrachlorosilane in the collection liquid 111 is adjusted to be 10% or more, more preferably 20% or more higher than the liquid component of the gas-liquid mixture, the recovery efficiency is large. An improvement is observed.
  • the reaction tower 200 for reacting the raw material gas at a high temperature, and the reaction product gas extracted from the reaction tower 200 are rapidly cooled to freeze the equilibrium.
  • a raw material gas obtained by mixing gasified tetrachlorosilane and hydrogen is supplied to the reaction furnace 201 from the bottom of the reaction tower 200 through a raw material gas supply pipe 204.
  • the reaction furnace 201 is made of graphite, and the internal temperature can be maintained in the range of more than 700 ° C. and not more than 1400 ° C. by heating with a heater 202 provided around. If the reaction temperature is 700 ° C. or higher, the equilibrium of the above formula (1) is sufficiently tilted to the right, and if it is 1400 ° C. or lower, it is preferable because the phenomenon that metal silicon precipitates and leads to blockage of the apparatus can be suppressed.
  • the reaction product gas that has been heated in the reaction furnace 201 and has reached the thermal equilibrium state represented by the above formula (1) moves upward of the reaction furnace 201 and maintains a temperature of 1200 ° C. or higher. It is introduced into the quenching tower 300 through 203.
  • the reactor gas extraction pipe 203 passes through the side wall of the quenching tower 300 and reaches the inside of the quenching tower 300.
  • a coolant is sprayed from the primary spray nozzle 301 to the reaction product gas released from the reactor gas extraction pipe 203 to bring the reaction product gas into contact with the coolant in the form of fine droplets.
  • the latent heat of vaporization when the coolant is vaporized can be used to instantly and efficiently remove heat from the reaction product gas, and the reaction product gas is instantaneously cooled to a temperature of 600 ° C. or lower where the equilibrium is frozen. .
  • the rapidly cooled reaction product gas rises inside the quenching tower 300.
  • a coolant is further sprayed from the secondary spray nozzle 302 to condense the high-boiling point polymer (Si 2 Cl 6 , Si 3 Cl 8 , Si 2 H 2 Cl 4, etc.) in the reaction product gas while condensing the reaction.
  • the coolant sprayed into the quenching tower 300 is extracted by the pump 303, cooled by the heat exchanger 304, and supplied again to the quenching tower 300 through the primary spray nozzle and the secondary spray nozzle.
  • the reaction product gas that is still in a gaseous state even when cooled to the range of 30 to 60 ° C. is extracted from the quenching tower gas component extraction pipe 305 and introduced into the condenser 400.
  • the condenser 400 may be a generally used condenser.
  • the capacitor 400 is described as if it is a single device, but a capacitor consisting of only a single device has a large load on the device, and it may be difficult to perform sufficient cooling. In that case, it is good also as a structure which arranges a some apparatus in series and performs stepwise cooling.
  • the liquid component condensed by the condenser 400 is led out to the storage tank 500 through the condenser liquid component lead-out pipe 401. Most of the chlorosilane contained in the reaction product gas is condensed by the condenser 400.
  • the gaseous component passing through the capacitor 400 that is, the chlorosilane gas containing unreacted tetrachlorosilane is supplied to the cooler 102 of the chlorosilane recovery apparatus 100 via the chlorosilane gas introduction pipe 101.
  • the chlorosilane gas supplied from the condenser 400 is finally cooled to about ⁇ 5 to ⁇ 20 ° C. so that the cooler 102 is not overloaded.
  • the chlorosilane gas is finally cooled to ⁇ 40 to ⁇ 70 ° C.
  • a gas-liquid mixture composed of a liquid component liquefied by cooling and a gas component not liquefied is supplied to the collection liquid 111 accommodated in the collection tank 106 via the tip 104 of the gas-liquid mixture supply pipe 103. Is done. At this time, the liquid component of the gas-liquid mixture is absorbed by the collection liquid 111, and the gas component is aerated in the collection liquid 111 in the form of fine bubbles and moves upward of the collection tank 106.
  • tetrachlorosilane is supplied from the tetrachlorosilane supply pipe 109 into the collection liquid 111, and the concentration of tetrachlorosilane in the collection liquid 111 is adjusted to be higher than the concentration of tetrachlorosilane in the liquid component of the gas-liquid mixture.
  • the temperature of the collected liquid 111 is the same as or lower than that of the gas-liquid mixture cooled in the cooler 102 by the cooling unit 110 provided on the outer periphery of the collection tank 106, and is about ⁇ 60 to ⁇ 70 ° C. Cool to range.
  • Chlorosilane trapped in the collection liquid 111 in the collection tank 106 is led out to the storage tank 500 through the condensate drain pipe 107. Further, the gas component that has not been captured in the collection tank 106 is discharged out of the chlorosilane recovery device 100 from the uncondensed gas extraction pipe 108. In this embodiment, the uncondensed gas extraction pipe 108 is passed through the condenser 400 to be used for cooling the chlorosilane gas in the condenser 400.
  • the liquid components condensed in the chlorosilane recovery apparatus 100 and the condenser 400 are further led out from the storage tank 500 to a distillation tower (not shown), where monochlorosilane, dichlorosilane and tetrachlorosilane including trichlorosilane are separated.
  • the cooling unit 110 is provided on the outer peripheral portion of the collection tank 106.
  • the collection liquid 111 may be cooled to substantially the same temperature or lower than the liquid component of the gas-liquid mixture. If possible, it is not necessary to provide the cooling unit 110 on the outer peripheral portion of the collection tank 106.
  • the collection liquid 111 may be extracted from the collection tank 106, cooled by an external cooler, and then circulated back to the collection tank 106.
  • the collection liquid 111 may be extracted to the outside, and the tetrachlorosilane concentration in the collection liquid 111 may be adjusted there and circulated to the collection tank 106.
  • Example 1 In Example 1, the apparatus shown in FIGS. 1 and 2 was used.
  • the reaction furnace 201 was heated by a heater 202 having an inner diameter of 50 mm and a length of 800 mm and a maximum output of 500 KW, and the center of the reaction furnace 201 was heated to 1300 ° C.
  • a raw material gas (molar ratio 1: 2) composed of tetrachlorosilane and hydrogen previously heated to 600 ° C. is continuously supplied to the reaction furnace 201 through the raw material gas supply pipe 204 at a flow rate of 27 mol / hour.
  • the gas reacted in 201 was supplied into the quenching tower 300 having an inner diameter of 140 mm and a length of 1300 mm through the reactor gas extraction pipe 203.
  • the temperature of the coolant was kept at 30 ° C. by passing through the heat exchanger 304.
  • the sprayed coolant was extracted from the bottom of the quenching tower 300 using a pump 303 and continuously circulated for use. If necessary, the cooling liquid was supplemented with tetrachlorosilane or trichlorosilane to keep the composition constant.
  • the reaction product gas cooled in the quenching tower 300 is cooled in stages by a condenser 400 in which four condensers are arranged in series, so that the temperature of the finally discharged chlorosilane gas becomes ⁇ 10 ° C. Cooled down. At this time, the condensate liquefied by the condenser 400 was led to the storage tank 500.
  • the chlorosilane gas cooled to ⁇ 10 ° C. by the condenser 400 was supplied to the cooler 102 where it was cooled to ⁇ 70 ° C.
  • a gas-liquid mixture composed of a liquid component and a gas component obtained by cooling with the cooler 102 was led through the gas-liquid mixture supply pipe 103 while being bubbled into the collection liquid 111 in the collection tank 106. .
  • the concentration of tetrachlorosilane in the liquid component obtained by cooling with the cooler 102 was 38%. Therefore, in Example 1, the concentration of tetrachlorosilane in the collection liquid 111 was set to 50%, and tetrachlorosilane was appropriately supplemented from the tetrachlorosilane supply pipe 109 so as to keep this concentration constant during operation of the apparatus.
  • the liquid component captured in the collection tank 106 was appropriately led out to the storage tank 500 together with the collection liquid 111.
  • the liquid component stored in the storage tank 500 was further sent to the distillation tower, where chlorosilane was separated and purified.
  • the uncondensed chlorosilane loss that was not condensed was 0.28%.
  • Example 1 Chlorosilane was separated and purified under the same conditions as in Example 1 except that the gas-liquid mixture was led out to the internal space of the collection tank 106 without using the collection liquid 111. In this case, the uncondensed chlorosilane loss was 0.42%, and the chlorosilane loss increased by about 50%.
  • Examples 2 to 5 and Comparative Example 2 Chlorosilane was separated and purified under the same conditions as in Example 1 except that the concentration of tetrachlorosilane in the collection liquid 111 was adjusted to the value shown in Table 1 below. For each of Examples 2 to 5 and Comparative Example 2, the recovery rate of chlorosilane was examined. The results are shown in Table 1 below together with the results of Example 1.
  • Example 1 ⁇ Consideration of results> From the experimental results of Example 1 and Comparative Example 1, the chlorosilane loss can be reduced by supplying the gas-liquid mixture while bubbling it into the collection liquid, and as a result, the recovery rate of the target chlorosilane can be improved. I understand. Further, as shown in Examples 1 to 5 and Comparative Example 2, by adjusting the tetrachlorosilane concentration of the collected liquid to be higher than the tetrachlorosilane concentration of the liquid component of the gas-liquid mixture, chlorosilane loss can be reduced, As a result, it can be seen that the desired recovery rate of chlorosilane can be improved.
  • Example 5 it can be seen that if the tetrachlorosilane concentration is increased as much as possible, it is effective to reduce chlorosilane loss.

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  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)

Abstract

La présente invention concerne un appareil de récupération de chlorosilane (100) qui présente un excellent rendement de récupération. L'appareil inclut : un refroidisseur (102) qui refroidit un gaz de chlorosilane contenant du tétrachlorosilane ; un réservoir de collecte (106) qui contient un liquide de collecte (111) contenant du tétrachlorosilane ; un tuyau d'alimentation de mélange gaz/liquide (103) par lequel un mélange gaz/liquide contenant un composant liquide liquéfié avec le refroidisseur et un composant gazeux qui n'a pas été liquéfié est acheminé du refroidisseur (102) vers le liquide de collecte (111) dans le réservoir de collecte (106) ; et un tuyau d'alimentation en tétrachlorosilane (109) par lequel du tétrachlorosilane est ajouté au réservoir de collecte (106) pour réguler la concentration de tétrachlorosilane dans le liquide de collecte de façon à ce qu'elle soit supérieure à la concentration de tétrachlorosilane dans le composant liquide du mélange gaz/liquide.
PCT/JP2009/054666 2009-03-11 2009-03-11 Appareil de récupération de chlorosilane et procédé de récupération de chlorosilane à l'aide dudit appareil WO2010103633A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011503605A JP5329641B2 (ja) 2009-03-11 2009-03-11 クロロシラン回収装置およびそれを用いたクロロシラン回収方法
PCT/JP2009/054666 WO2010103633A1 (fr) 2009-03-11 2009-03-11 Appareil de récupération de chlorosilane et procédé de récupération de chlorosilane à l'aide dudit appareil
TW099102344A TW201036912A (en) 2009-03-11 2010-01-28 Recovery device of chlorosilane and recovery method of chlorosilane using the same

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PCT/JP2009/054666 WO2010103633A1 (fr) 2009-03-11 2009-03-11 Appareil de récupération de chlorosilane et procédé de récupération de chlorosilane à l'aide dudit appareil

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Cited By (5)

* Cited by examiner, † Cited by third party
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CN102992328A (zh) * 2012-08-17 2013-03-27 陕西天宏硅材料有限责任公司 氯硅烷精馏过程中氯硅烷废气、废液回收工艺
CN105439151A (zh) * 2014-08-13 2016-03-30 新特能源股份有限公司 一种多晶硅生产中的尾气中的氯硅烷的回收方法和装置
JP2016064953A (ja) * 2014-09-25 2016-04-28 デンカ株式会社 ヘキサクロロジシランの製造方法
JP2016064952A (ja) * 2014-09-25 2016-04-28 デンカ株式会社 ペンタクロロジシランの製造方法並びに該方法により製造されるペンタクロロジシラン
JP2016064951A (ja) * 2014-09-25 2016-04-28 デンカ株式会社 オクタクロロトリシランの製造方法並びに該方法により製造されるオクタクロロトリシラン

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JPS6081010A (ja) * 1983-10-13 1985-05-09 Denki Kagaku Kogyo Kk トリクロルシランの製造法
JPH0297415A (ja) * 1988-08-20 1990-04-10 Huels Ag 塩化水素又は塩化水素と塩素との混合物と金属珪素含有物質との反応の際に四塩化珪素の量を上昇させるための方法
JP2002173312A (ja) * 2000-12-06 2002-06-21 Sumitomo Titanium Corp トリクロロシランの精製方法
WO2008053786A1 (fr) * 2006-10-31 2008-05-08 Mitsubishi Materials Corporation Appareil de production de trichlorosilane

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JPS5935017A (ja) * 1982-08-23 1984-02-25 Denki Kagaku Kogyo Kk 三塩化シランの製法
JPS6081010A (ja) * 1983-10-13 1985-05-09 Denki Kagaku Kogyo Kk トリクロルシランの製造法
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CN105439151A (zh) * 2014-08-13 2016-03-30 新特能源股份有限公司 一种多晶硅生产中的尾气中的氯硅烷的回收方法和装置
CN105439151B (zh) * 2014-08-13 2018-12-25 新特能源股份有限公司 一种多晶硅生产中的尾气中的氯硅烷的回收方法和装置
JP2016064953A (ja) * 2014-09-25 2016-04-28 デンカ株式会社 ヘキサクロロジシランの製造方法
JP2016064952A (ja) * 2014-09-25 2016-04-28 デンカ株式会社 ペンタクロロジシランの製造方法並びに該方法により製造されるペンタクロロジシラン
JP2016064951A (ja) * 2014-09-25 2016-04-28 デンカ株式会社 オクタクロロトリシランの製造方法並びに該方法により製造されるオクタクロロトリシラン

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