JP5329641B2 - クロロシラン回収装置およびそれを用いたクロロシラン回収方法 - Google Patents
クロロシラン回収装置およびそれを用いたクロロシラン回収方法 Download PDFInfo
- Publication number
- JP5329641B2 JP5329641B2 JP2011503605A JP2011503605A JP5329641B2 JP 5329641 B2 JP5329641 B2 JP 5329641B2 JP 2011503605 A JP2011503605 A JP 2011503605A JP 2011503605 A JP2011503605 A JP 2011503605A JP 5329641 B2 JP5329641 B2 JP 5329641B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- gas
- tetrachlorosilane
- chlorosilane
- collection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 title claims description 141
- 239000005046 Chlorosilane Substances 0.000 title claims description 127
- 238000011084 recovery Methods 0.000 title claims description 48
- 238000000034 method Methods 0.000 title claims description 17
- 239000007788 liquid Substances 0.000 claims description 225
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims description 120
- 239000000203 mixture Substances 0.000 claims description 79
- 238000001816 cooling Methods 0.000 claims description 39
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 30
- 239000005052 trichlorosilane Substances 0.000 claims description 30
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims description 13
- 239000007789 gas Substances 0.000 description 100
- 239000007795 chemical reaction product Substances 0.000 description 16
- 238000010791 quenching Methods 0.000 description 15
- 230000000171 quenching effect Effects 0.000 description 13
- 238000000605 extraction Methods 0.000 description 11
- 239000002994 raw material Substances 0.000 description 8
- 239000007921 spray Substances 0.000 description 8
- 238000003860 storage Methods 0.000 description 8
- 239000002826 coolant Substances 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 5
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 229910003902 SiCl 4 Inorganic materials 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000007664 blowing Methods 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 239000000110 cooling liquid Substances 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- BUMGIEFFCMBQDG-UHFFFAOYSA-N dichlorosilicon Chemical compound Cl[Si]Cl BUMGIEFFCMBQDG-UHFFFAOYSA-N 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- -1 that is Chemical compound 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
- C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2009/054666 WO2010103633A1 (fr) | 2009-03-11 | 2009-03-11 | Appareil de récupération de chlorosilane et procédé de récupération de chlorosilane à l'aide dudit appareil |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2010103633A1 JPWO2010103633A1 (ja) | 2012-09-10 |
JP5329641B2 true JP5329641B2 (ja) | 2013-10-30 |
Family
ID=42727941
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011503605A Active JP5329641B2 (ja) | 2009-03-11 | 2009-03-11 | クロロシラン回収装置およびそれを用いたクロロシラン回収方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5329641B2 (fr) |
TW (1) | TW201036912A (fr) |
WO (1) | WO2010103633A1 (fr) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102992328A (zh) * | 2012-08-17 | 2013-03-27 | 陕西天宏硅材料有限责任公司 | 氯硅烷精馏过程中氯硅烷废气、废液回收工艺 |
CN105439151B (zh) * | 2014-08-13 | 2018-12-25 | 新特能源股份有限公司 | 一种多晶硅生产中的尾气中的氯硅烷的回收方法和装置 |
JP6391390B2 (ja) * | 2014-09-25 | 2018-09-19 | デンカ株式会社 | ヘキサクロロジシランの製造方法 |
JP6391389B2 (ja) * | 2014-09-25 | 2018-09-19 | デンカ株式会社 | オクタクロロトリシランの製造方法並びに該方法により製造されるオクタクロロトリシラン |
JP6486049B2 (ja) * | 2014-09-25 | 2019-03-20 | デンカ株式会社 | ペンタクロロジシランの製造方法並びに該方法により製造されるペンタクロロジシラン |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5935017A (ja) * | 1982-08-23 | 1984-02-25 | Denki Kagaku Kogyo Kk | 三塩化シランの製法 |
JPS6081010A (ja) * | 1983-10-13 | 1985-05-09 | Denki Kagaku Kogyo Kk | トリクロルシランの製造法 |
JPH0297415A (ja) * | 1988-08-20 | 1990-04-10 | Huels Ag | 塩化水素又は塩化水素と塩素との混合物と金属珪素含有物質との反応の際に四塩化珪素の量を上昇させるための方法 |
JP2002173312A (ja) * | 2000-12-06 | 2002-06-21 | Sumitomo Titanium Corp | トリクロロシランの精製方法 |
WO2008053786A1 (fr) * | 2006-10-31 | 2008-05-08 | Mitsubishi Materials Corporation | Appareil de production de trichlorosilane |
-
2009
- 2009-03-11 WO PCT/JP2009/054666 patent/WO2010103633A1/fr active Application Filing
- 2009-03-11 JP JP2011503605A patent/JP5329641B2/ja active Active
-
2010
- 2010-01-28 TW TW099102344A patent/TW201036912A/zh unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5935017A (ja) * | 1982-08-23 | 1984-02-25 | Denki Kagaku Kogyo Kk | 三塩化シランの製法 |
JPS6081010A (ja) * | 1983-10-13 | 1985-05-09 | Denki Kagaku Kogyo Kk | トリクロルシランの製造法 |
JPH0297415A (ja) * | 1988-08-20 | 1990-04-10 | Huels Ag | 塩化水素又は塩化水素と塩素との混合物と金属珪素含有物質との反応の際に四塩化珪素の量を上昇させるための方法 |
JP2002173312A (ja) * | 2000-12-06 | 2002-06-21 | Sumitomo Titanium Corp | トリクロロシランの精製方法 |
WO2008053786A1 (fr) * | 2006-10-31 | 2008-05-08 | Mitsubishi Materials Corporation | Appareil de production de trichlorosilane |
Also Published As
Publication number | Publication date |
---|---|
TW201036912A (en) | 2010-10-16 |
JPWO2010103633A1 (ja) | 2012-09-10 |
WO2010103633A1 (fr) | 2010-09-16 |
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