WO2010064547A1 - 電子材料用Cu-Ni-Si-Co系銅合金及びその製造方法 - Google Patents
電子材料用Cu-Ni-Si-Co系銅合金及びその製造方法 Download PDFInfo
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- C22C9/00—Alloys based on copper
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- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/08—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
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- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/06—Alloys based on copper with nickel or cobalt as the next major constituent
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/02—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working in inert or controlled atmosphere or vacuum
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- the present invention relates to a precipitation hardening type copper alloy, and more particularly to a Cu—Ni—Si—Co based copper alloy suitable for use in various electronic components.
- Copper alloys for electronic materials used in various electronic parts such as connectors, switches, relays, pins, terminals, and lead frames are required to have both high strength and high conductivity (or thermal conductivity) as basic characteristics. Is done. In recent years, high integration and miniaturization / thinning of electronic components have been rapidly progressing, and the level of demand for copper alloys used in electronic device components has been increased accordingly.
- the amount of precipitation hardening type copper alloys is increasing instead of conventional solid solution strengthened copper alloys such as phosphor bronze and brass as copper alloys for electronic materials.
- precipitation-hardened copper alloys by aging the supersaturated solid solution that has undergone solution treatment, fine precipitates are uniformly dispersed, increasing the strength of the alloy and reducing the amount of solid solution elements in the copper. Electrical conductivity is improved. For this reason, a material excellent in mechanical properties such as strength and spring property and having good electrical conductivity and thermal conductivity can be obtained.
- Cu-Ni-Si copper alloys commonly called Corson alloys
- Corson alloys are representative copper alloys that have relatively high electrical conductivity, strength, and bending workability, and are currently active in the industry. It is one of the alloys being developed. In this copper alloy, the strength and conductivity can be improved by precipitating fine Ni—Si intermetallic compound particles in the copper matrix.
- Patent Document 1 JP 2005-532477 A (Patent Document 1) describes, by weight, nickel: 1% to 2.5%, cobalt: 0.5% to 2.0%, silicon: 0.5% to 1.5%, And a wrought copper alloy comprising a balance of copper and inevitable impurities, a total content of nickel and cobalt of 1.7% to 4.3% and a ratio (Ni + Co) / Si of 2: 1 to 7: 1
- the wrought copper alloy is said to have a conductivity greater than 40% IACS.
- Cobalt is said to combine with silicon to form silicides that are effective for age hardening in order to limit grain growth and improve softening resistance.
- the first aging annealing temperature and the second time length effective for precipitating the second phase without performing intermediate cold working after the solution treatment are substantially single phase.
- the first aging annealing is performed on the alloy to form a multiphase alloy having silicide, the multiphase alloy is cold worked, the second cross-sectional area is reduced, and the volume of the precipitated particles is reduced.
- the second aging annealing is performed at the effective temperature (however, the second aging annealing temperature is lower than the first aging annealing temperature) and the length of time, and the second aging annealing is performed sequentially on the multiphase alloy. Including a process (paragraph 0018).
- the solution treatment is performed at a temperature of 750 ° C. to 1050 ° C. for 10 seconds to 1 hour (paragraph 0042), and the first aging annealing is performed at a temperature of 350 ° C. to 600 ° C. for 30 minutes to 30 hours, with a working degree of 5 to It is described that cold working is performed at 50% and the second aging annealing temperature is 350 ° C. to 600 ° C. for 10 seconds to 30 hours (paragraphs 0045 to 0047).
- Patent Document 2 contains 0.5 to 4.0 mass% of Ni, 0.5 to 2.0 mass% of Co, and 0.3 to 1.5 mass% of Si. The balance is made of copper and inevitable impurities, the ratio of the sum of Ni and Co and the ratio of Si (Ni + Co) / Si is 2 to 7, and the density of the second phase (number per unit area) is 10 8 to In a copper alloy excellent in strength, electrical conductivity, bending workability and stress relaxation characteristics characterized by 10 12 pieces / mm 2 , the density of the second phase having a size of 50 to 1000 nm is 10 4 to 10 8. Disclosed to be pieces / mm 2 .
- the density of the second phase (number per unit area) is 10 8 to 10 12 pieces / mm 2 (paragraph 0019).
- the density of the second phase having a size of 50 to 1000 nm is 10 4 to 10 8 pieces / mm 2 , in the solution heat treatment at a high temperature such as 850 ° C. or more by dispersing the second phase. It is said that bending workability can be improved by suppressing the crystal grain size from becoming coarse (paragraph 0022).
- the size of the second phase is less than 50 nm, the effect of suppressing grain growth is low, which is not preferable (paragraph 0023).
- the above copper alloy is subjected to ingot homogenization heat treatment at 900 ° C. or higher, and in the subsequent hot working, the cooling rate to 850 ° C. is performed at 0.5 to 4 ° C./second. It describes that it can be manufactured by performing each processing once or more (paragraph 0029).
- Patent Document 1 Although the copper alloy described in Patent Document 1 can obtain relatively high strength, electrical conductivity, and bending workability, there is still room for property improvement. In particular, there is a problem that the sag resistance, which is a permanent deformation that occurs when used as a spring material, is not sufficient.
- Patent Document 2 discusses the influence of the distribution of the second phase particles on the alloy characteristics and defines the distribution state of the second phase particles, but it is not yet sufficient.
- the second phase particles having a particle size in the range of 5 nm or more and less than 20 nm contribute to improvement in strength and initial sag resistance
- the second phase particles having a particle size in the range of 20 nm or more and 50 nm or less are It has been found that the strength and sag resistance can be improved in a well-balanced manner by controlling the number density and ratio thereof because it contributes to the improvement of sag resistance repeatedly.
- the number density of those having a particle size of less than is 5nm or 20nm
- copper for electronic material particle sizes of 3-6 represents a ratio to the number density of more than 50nm following are 20nm It is an alloy.
- the number density of second phase particles having a particle size of 5 nm or more and less than 20 nm is 2 ⁇ 10 12 to 7 ⁇ 10 13 and the particle size is 20 nm or more and 50 nm or less.
- the number density of the two-phase particles is 3 ⁇ 10 11 to 2 ⁇ 10 13 .
- the copper alloy according to the present invention further contains up to 0.5% by mass of Cr.
- the copper alloy according to the present invention is further selected from the group consisting of Mg, P, As, Sb, Be, B, Mn, Sn, Ti, Zr, Al, Fe, Zn, and Ag. Contains a maximum of 2.0 mass% of seeds or two or more seeds in total.
- -Step 1 of melt casting an ingot having the desired composition A step 2 in which the material temperature is set to 950 ° C. or higher and 1050 ° C. or lower and hot rolling is performed after heating for 1 hour or longer; -Optional cold rolling process 3; A step 4 of performing a solution treatment in which the material temperature is heated to 950 ° C. or higher and 1050 ° C. or lower; A first aging treatment step 5 in which the material temperature is heated at 400 ° C. to 500 ° C. for 1 to 12 hours; -Cold rolling step 6 with a rolling reduction of 30-50%; A second aging treatment step 7 in which the material temperature is heated at 300 ° C. or more and 400 ° C. or less for 3 to 36 hours, and the heating time is 3 to 10 times the heating time in the first aging treatment; Is a method for producing a copper alloy for electronic materials.
- the present invention is a copper drawn product made of the copper alloy according to the present invention.
- the present invention is an electronic component including the copper alloy according to the present invention.
- a Cu—Ni—Si—Co based copper alloy having an improved balance of strength, conductivity, bending workability and sag resistance can be obtained.
- Addition amounts of Ni, Co, and Si Ni, Co, and Si form an intermetallic compound by performing an appropriate heat treatment, and can increase the strength without deteriorating conductivity.
- the addition amounts of Ni, Co and Si are less than Ni: 1.0% by mass, Co: less than 0.5% by mass, and Si: less than 0.3% by mass, the desired strength cannot be obtained. If it exceeds 2.5% by mass, Co: more than 2.5% by mass, and Si: more than 1.2% by mass, the strength can be increased, but the electrical conductivity is remarkably lowered, and the hot workability is further deteriorated. Therefore, the addition amounts of Ni, Co, and Si were set to Ni: 1.0 to 2.5 mass%, Co: 0.5 to 2.5 mass%, and Si: 0.3 to 1.2 mass%.
- the addition amounts of Ni, Co, and Si are preferably Ni: 1.5 to 2.0 mass%, Co: 0.5 to 2.0 mass%, and Si: 0.5 to 1.0 mass%.
- the added amount Cr of Cr preferentially precipitates at the grain boundaries in the cooling process during melt casting, so that the grain boundaries can be strengthened, cracks during hot working are less likely to occur, and yield reduction can be suppressed. That is, Cr precipitated at the grain boundaries during melt casting is re-dissolved by a solution treatment or the like, but at the subsequent aging precipitation, precipitated particles having a bcc structure mainly composed of Cr or a compound with Si are generated. In a normal Cu—Ni—Si alloy, Si that did not contribute to aging precipitation suppresses the increase in conductivity while remaining in solid solution in the matrix phase, but the silicide-forming element Cr is reduced.
- the amount of dissolved Si can be reduced, and the electrical conductivity can be increased without impairing the strength.
- Cr concentration exceeds 0.5% by mass, coarse second-phase particles are easily formed, so that product characteristics are impaired. Therefore, Cr can be added to the Cu—Ni—Si—Co alloy according to the present invention at a maximum of 0.5 mass%.
- the effect is small if it is less than 0.03% by mass, it is preferably added in an amount of 0.03 to 0.5% by mass, more preferably 0.09 to 0.3% by mass.
- Addition amounts of Mg, Mn, Ag and P Mg, Mn, Ag and P improve the product properties such as strength and stress relaxation characteristics without adding a small amount of addition by adding a small amount.
- the effect of addition is exhibited mainly by solid solution in the matrix phase, but further effects can be exhibited by inclusion in the second phase particles.
- the total concentration of Mg, Mn, Ag and P exceeds 2.0% by mass, the effect of improving characteristics is saturated and manufacturability is impaired. Therefore, it is preferable to add one or more selected from Mg, Mn, Ag and P to the Cu—Ni—Si—Co alloy according to the present invention in a total amount of 2.0% by mass or less.
- the effect is small at less than 0.01% by mass, more preferably 0.01 to 2.0% by mass in total, still more preferably 0.02 to 0.5% by mass in total, typically Add 0.04 to 0.2 mass% in total.
- the addition of a small amount improves product properties such as strength, stress relaxation properties, and plating properties without impairing electrical conductivity.
- the effect of addition is exhibited mainly by solid solution in the matrix.
- the total amount of Sn and Zn exceeds 2.0% by mass, the effect of improving characteristics is saturated and manufacturability is impaired. Therefore, the Cu—Ni—Si—Co alloy according to the present invention can be added with one or two selected from Sn and Zn in total up to 2.0 mass%.
- the amount is less than 0.05% by mass, the effect is small. Therefore, it is preferable to add 0.05 to 2.0% by mass in total, and more preferably 0.5 to 1.0% by mass in total.
- Addition amounts of As, Sb, Be, B, Ti, Zr, Al, and Fe As, Sb, Be, B, Ti, Zr, Al, and Fe are also adjusted according to required product characteristics. This improves product properties such as conductivity, strength, stress relaxation properties, and plating properties.
- the effect of addition is exhibited mainly by solid solution in the parent phase, but it can also be exhibited by forming the second phase particles having a new composition or contained in the second phase particles. However, if the total amount of these elements exceeds 2.0% by mass, the effect of improving characteristics is saturated and manufacturability is impaired.
- a total of one or more selected from As, Sb, Be, B, Ti, Zr, Al and Fe is 2.0 at the maximum. Mass% can be added. However, if the amount is less than 0.001% by mass, the effect is small. Therefore, the total amount is preferably 0.001 to 2.0% by mass, and more preferably 0.05 to 1.0% by mass.
- the total amount of Mg, P, As, Sb, Be, B, Mn, Sn, Ti, Zr, Al, Fe, Zn, and Ag exceeds 2.0% by mass, manufacturability is likely to be impaired.
- the total of these is 2.0% by mass or less, more preferably 1.5% by mass or less, and still more preferably 1.0% by mass or less.
- the second-phase particle mainly refers to silicide, but is not limited to this.
- Crystallized substances generated in the solidification process of melt casting and precipitation generated in the subsequent cooling process This refers to precipitates generated in the cooling process after hot rolling, precipitates generated in the cooling process after solution treatment, and precipitates generated in the aging process.
- fine second phase particles of nanometer order (generally less than 0.1 ⁇ m), mainly composed of intermetallic compounds, are deposited by applying an appropriate aging treatment, without deteriorating the conductivity. It is known that high strength can be achieved. However, among such fine second-phase particles, there are a particle size range that tends to contribute to strength and a particle size range that tends to contribute to sag resistance. It has not been known that the sag resistance can be improved in a well-balanced manner.
- the present inventor has found that the number density of very fine second-phase particles having a particle size of about 50 nm or less has an important influence on the improvement of strength, conductivity and sag resistance.
- the second phase particles having a particle size in the range of 5 nm or more and less than 20 nm contribute to improvement in strength and initial sag resistance
- the second phase particles having a particle size in the range of 20 nm or more and 50 nm or less are Since it contributes to the improvement of repeated sag resistance, it has been found that the strength and sag resistance can be improved in a balanced manner by controlling the number density and ratio thereof.
- the number density of the second phase particles having a particle size of 5 nm to 50 nm is 1 ⁇ 10 12 to 1 ⁇ 10 14 particles / mm 3 , preferably 5 ⁇ 10 12 to 5 ⁇ 10 13 particles / mm 3 . It is important to control to mm 3 . If the number density of the second phase particles is less than 1 ⁇ 10 12 / mm 3 , the advantage of precipitation strengthening is hardly obtained, so that the desired strength and conductivity cannot be obtained, and sag resistance is obtained. Also gets worse. On the other hand, it is considered that the higher the number density of the second phase particles, the higher the feasible level, the better the characteristics. However, when the precipitation of the second phase particles is promoted to increase the number density, the second phase particles are improved. It becomes difficult to produce a number density exceeding 1 ⁇ 10 14 / mm 3 because the particles are easily coarsened.
- the number density of second phase particles having a particle size of 5 nm or more and less than 20 nm which is likely to contribute to strength improvement, and grains that are likely to contribute to improvement of sag resistance. It is necessary to control the ratio of the number density of the second phase particles having a diameter of 20 nm to 50 nm. Specifically, the number density of second phase particles having a particle size of 5 nm or more and less than 20 nm is controlled to 3 to 6 in terms of the ratio to the number density of second phase particles having a particle size of 20 nm or more and 50 nm or less.
- the ratio of the second phase particles that contribute to the strength becomes too small, and the balance between strength and sag resistance deteriorates, so the strength decreases and the initial sag resistance also deteriorates. Become.
- the ratio is larger than 6, the ratio of the second phase particles that contribute to sag resistance becomes too small, and the balance between strength and sag resistance also deteriorates. Becomes worse.
- the number density of second phase particles having a particle size of 5 nm or more and less than 20 nm is 2 ⁇ 10 12 to 7 ⁇ 10 13 particles / mm 3 , and the second phase having a particle size of 20 nm or more and 50 nm or less.
- the number density of the particles is 3 ⁇ 10 11 to 2 ⁇ 10 13 particles / mm 3 .
- the strength depends on the number density of second phase particles having a particle size exceeding 50 nm, but by controlling the number density of second phase particles having a particle size of 5 nm or more and 50 nm or less as described above, The number density of the second phase particles having a diameter exceeding 50 nm naturally settles in an appropriate range.
- the copper alloy according to the present invention is a ratio of the minimum radius (MBR) to the plate thickness (t) where cracks do not occur when performing a Badway W bending test according to JIS H 3130.
- the t value is 2.0 or less.
- the MBR / t value can typically be in the range of 1.0 to 2.0.
- a Corson copper alloy In a general manufacturing process of a Corson copper alloy, first, an atmospheric melting furnace is used to melt raw materials such as electrolytic copper, Ni, Si, and Co to obtain a molten metal having a desired composition. Then, this molten metal is cast into an ingot. Thereafter, hot rolling is performed, and cold rolling and heat treatment are repeated to finish a strip or foil having a desired thickness and characteristics.
- Heat treatment includes solution treatment and aging treatment. In the solution treatment, heating is performed at a high temperature of about 700 to about 1000 ° C. to cause the second phase particles to be dissolved in the Cu matrix and simultaneously to recrystallize the Cu matrix. The solution treatment may be combined with hot rolling.
- the second phase particles that are heated in the temperature range of about 350 to about 550 ° C. for 1 hour or more and solid-dissolved by the solution treatment are precipitated as fine particles of nanometer order.
- This aging treatment increases strength and conductivity.
- cold rolling may be performed before and / or after aging.
- strain relief annealing low temperature annealing
- grinding, polishing, shot blast pickling and the like for removing oxide scale on the surface are appropriately performed.
- the copper alloy according to the present invention basically undergoes the above manufacturing process, but in the finally obtained copper alloy, in order to set the distribution form of the second phase particles within the range specified by the present invention. It is important to strictly control the hot rolling, solution treatment and aging treatment conditions. Unlike the conventional Cu-Ni-Si-based Corson alloy, the Cu-Ni-Co-Si-based alloy of the present invention is a Co (which in some cases) tends to coarsen the second phase particles as an essential component for age precipitation hardening. Further, this is because Cr) is positively added. This is because the generation and growth rate of the second phase particles formed by the added Co together with Ni and Si are sensitive to the holding temperature and the cooling rate during the heat treatment.
- Hot rolling is performed after holding at 950 ° C. to 1050 ° C. for 1 hour or longer, and if the temperature at the end of hot rolling is 850 ° C. or higher, even if Co and further Cr are added, it is dissolved in the matrix. be able to.
- the temperature condition of 950 ° C. or higher is a higher temperature setting than other Corson alloys. If the holding temperature before hot rolling is less than 950 ° C., solid solution is insufficient, and if it exceeds 1050 ° C., the material may be dissolved.
- the purpose of the solution treatment is to increase the age-hardening ability after the solution treatment by solidifying the crystallized particles during melt casting and the precipitated particles after hot rolling.
- the holding temperature and time during the solution treatment are important.
- the holding time is constant, if the holding temperature is increased, the crystallized particles at the time of melting and casting and the precipitated particles after hot rolling can be dissolved, and the area ratio can be reduced.
- the solution treatment temperature is less than 950 ° C., the solid solution is insufficient and the desired strength cannot be obtained, while if the solution treatment temperature exceeds 1050 ° C., the material can be dissolved. There is sex.
- the material temperature is heated to 950 ° C. or higher and 1050 ° C. or lower.
- the solution treatment time is preferably 60 seconds to 1 hour.
- the cooling rate after the solution treatment is preferably quenched in order to prevent precipitation of the solid phase second phase particles.
- a mild aging treatment is performed in two stages after the solution treatment, and cold rolling is performed between the two aging treatments. It is valid. Thereby, the coarsening of the precipitate is suppressed, and the distribution state of the second phase particles as defined in the present invention can be obtained.
- a temperature slightly lower than that conventionally used as being useful for refining the precipitate is selected, and the second aging treatment is performed while promoting the precipitation of fine second-phase particles. Prevents coarsening of precipitates that may have been deposited in solution.
- the first aging treatment is less than 400 ° C.
- the density of the second phase particles having a size of 20 nm to 50 nm, which repeatedly improves sag resistance tends to be low, whereas when the first aging is over 500 ° C.
- Cold rolling is performed after the first aging treatment.
- insufficient age hardening in the first aging treatment can be supplemented by work hardening. If the rolling reduction at this time is 30% or less, the strain that becomes a precipitation site is small, and the second phase particles that precipitate in the second aging are difficult to precipitate uniformly. If the degree of cold rolling is 50% or more, the bending workability tends to deteriorate. In addition, the second phase particles precipitated by aging at the first time are dissolved again. Therefore, the reduction ratio of the cold rolling after the first aging treatment is preferably 30 to 50%, and more preferably 35 to 40%.
- the second phase particles precipitated in the first aging treatment are newly grown as much as possible without growing the second phase particles precipitated in the first aging treatment as much as possible. It is the purpose. If the second aging temperature is set high, the second phase particles already precipitated grow too much, and the number density distribution of the second phase particles intended by the present invention cannot be obtained. Therefore, it should be noted that the second aging treatment is performed at a low temperature. However, new second phase particles do not precipitate even if the temperature of the second aging treatment is too low. Therefore, the second aging treatment is preferably performed in a temperature range of 300 ° C. to 400 ° C. for 3 to 36 hours, and more preferably in a temperature range of 300 ° C. to 350 ° C. for 9 to 30 hours.
- the second aging In order to control the number density of the second phase particles having a particle size of 5 nm or more and less than 20 nm as a ratio to the number density of the second phase particles having a particle size of 20 nm or more and 50 nm or less to 3 to 6, the second aging The relationship between the processing time and the time of the first aging treatment is also important. Specifically, by setting the time of the second aging treatment to 3 times or more of the time of the first aging treatment, a relatively large amount of second phase particles having a particle size of 5 nm or more and less than 20 nm are precipitated, The density ratio can be 3 or more.
- the time of the second aging treatment is less than 3 times the time of the first aging treatment, the second phase particles having a particle size of 5 nm or more and less than 20 nm are relatively reduced, and the number density ratio is less than 3.
- the time of the second aging treatment is very long compared to the time of the first aging treatment (eg, 10 times or more), the second phase particles having a particle size of 5 nm or more and less than 20 nm increase.
- Second phase particles having a particle size of 20 nm or more and 50 nm or less are also increased by the growth of precipitates precipitated by the first aging treatment and the precipitates precipitated by the second aging treatment. It tends to be less than 3. Therefore, the time of the second aging treatment is preferably 3 to 10 times the time of the first aging treatment, and more preferably 3 to 5 times.
- the Cu—Ni—Si—Co alloy of the present invention can be processed into various copper products, such as plates, strips, tubes, bars and wires, and the Cu—Ni—Si—Co based copper according to the present invention.
- the alloy can be used for electronic components such as lead frames, connectors, pins, terminals, relays, switches, and secondary battery foil materials, and is particularly suitable for use as a spring material.
- Examples of the Invention Copper alloys having the respective component compositions shown in Table 1 were melted at 1300 ° C. in a high-frequency melting furnace and cast into a 30 mm-thick ingot. Next, this ingot was heated at 1000 ° C. for 3 hours, then hot-rolled to a plate thickness of 10 mm at an ascending temperature (hot rolling end temperature) of 900 ° C., and rapidly cooled to room temperature after the hot rolling was completed. Next, the surface was chamfered to a thickness of 9 mm for removing the scale, and then a plate having a thickness of 0.15 mm was formed by cold rolling. Next, solution treatment was performed at each temperature and time, and after the solution treatment was completed, the solution was quickly cooled to room temperature. Next, a first aging treatment is performed at each temperature and time in an inert atmosphere, and cold rolling is performed at each reduction rate. Finally, a second aging treatment is performed at each temperature and time in an inert atmosphere. Each test piece was manufactured.
- the particle size of the second phase particles was (major axis + minor axis) / 2.
- the major axis is the length of the longest line segment that passes through the particle's center of gravity and has the intersections with the particle boundary line at both ends.
- the minor axis is the particle's boundary line through the particle's center of gravity. The length of the shortest line segment among the line segments that have the intersections with.
- the electrical conductivity (EC;% IACS) was determined by volume resistivity measurement using a double bridge.
- the sag resistance is sandwiched between each test piece processed 1mm wide x 100mm long x 0.08mm thick, using a knife edge with a bending distance of 5mm and a stroke of 1mm.
- the amount of permanent deformation (sagging) shown in Table 2 after 5 seconds of loading at room temperature was measured.
- the initial sag resistance was evaluated by setting the number of loads by the knife edge as 1, and the repeated sag resistance was evaluated by setting the number of loads by the knife edge as 10.
- MBR bending workability
- MBR is a ratio of the minimum radius (MBR) to the plate thickness (t) where cracks do not occur by performing a W-way bending test (the bending axis is the same direction as the rolling direction) according to JIS H 3130. / T value was measured.
- MBR / t can be generally evaluated as follows. MBR / t ⁇ 1.0 Excellent 1.0 ⁇ MBR / t ⁇ 2.0 Excellent 2.0 ⁇ MBR / t Insufficient
- Table 2 shows the measurement results for each test piece.
- Comparative Example Copper alloys having respective component compositions shown in Table 3 were melted at 1300 ° C. in a high-frequency melting furnace and cast into an ingot having a thickness of 30 mm. Next, this ingot was heated at 1000 ° C. for 3 hours, then hot-rolled to a plate thickness of 10 mm at an ascending temperature (hot rolling end temperature) of 900 ° C., and rapidly cooled to room temperature after the hot rolling was completed. Next, the surface was chamfered to a thickness of 9 mm for removing the scale, and then a plate having a thickness of 0.15 mm was formed by cold rolling. Next, solution treatment was performed at each temperature and time, and after the solution treatment was completed, the solution was quickly cooled to room temperature. Next, a first aging treatment is performed at each temperature and time in an inert atmosphere, and cold rolling is performed at each reduction rate. Finally, a second aging treatment is performed at each temperature and time in an inert atmosphere. Each test piece was manufactured.
- the second phase particles having a particle size of 5 nm to 50 nm specified in the present invention were generally insufficient. . ⁇ No. 60, 70>
- the time in the first aging and the second aging was long, and the second phase particles having a particle size of 5 nm or more and less than 20 nm became insufficient. ⁇ No.
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Abstract
Description
この特許文献によれば、第2相の密度(単位面積当たりの個数)が108~1012個/mm2であることによって、優れた諸特性を実現出来るとされる(段落0019)。また、50~1000nmの大きさの第2相の密度が104~108個/mm2であることにより、第2相を分散させることによって、850℃以上などの高温での溶体化熱処理において、結晶粒径が粗大化することを抑制することにより、曲げ加工性を改善することが出来るとされる(段落0022)。一方で、第2相の大きさが50nm未満で有る場合は、粒成長を抑制する効果が低く、好ましくないとされる(段落0023)。
上記銅合金は、鋳塊の均質化熱処理を900℃以上で行い、かつ、その後の熱間加工において850℃までの冷却速度を0.5~4℃/秒で行い、その後、熱処理と冷間加工をそれぞれ1回以上行うことで製造可能であることが記載されている(段落0029)。
-所望の組成をもつインゴットを溶解鋳造する工程1と、
-材料温度を950℃以上1050℃以下として1時間以上加熱後に熱間圧延を行う工程2と、
-随意的な冷間圧延工程3と、
-材料温度を950℃以上1050℃以下に加熱する溶体化処理を行う工程4と、
-材料温度を400℃以上500℃以下で1~12時間加熱する第一の時効処理工程5と、
-圧下率30~50%の冷間圧延工程6と、
-材料温度を300℃以上400℃以下で3~36時間加熱し、加熱時間を第1の時効処理における加熱時間の3~10倍とする第二の時効処理工程7と、
を順に行なうことを含む電子材料用銅合金の製造方法である。
Ni、Co及びSiは、適当な熱処理を施すことにより金属間化合物を形成し、導電率を劣化させずに高強度化が図れる。
Ni、Co及びSiの添加量がそれぞれNi:1.0質量%未満、Co:0.5質量%未満、Si:0.3質量%未満では所望の強度が得られず、逆に、Ni:2.5質量%超、Co:2.5質量%超、Si:1.2質量%超では高強度化は図れるが導電率が著しく低下し、更には熱間加工性が劣化する。よってNi、Co及びSiの添加量はNi:1.0~2.5質量%、Co:0.5~2.5質量%、Si:0.3~1.2質量%とした。Ni、Co及びSiの添加量は好ましくは、Ni:1.5~2.0質量%、Co:0.5~2.0質量%、Si:0.5~1.0質量%である。
Crは溶解鋳造時の冷却過程において結晶粒界に優先析出するため粒界を強化でき、熱間加工時の割れが発生しにくくなり、歩留低下を抑制できる。すなわち、溶解鋳造時に粒界析出したCrは溶体化処理などで再固溶するが、続く時効析出時にCrを主成分としたbcc構造の析出粒子またはSiとの化合物を生成する。通常のCu-Ni-Si系合金では添加したSi量のうち、時効析出に寄与しなかったSiは母相に固溶したまま導電率の上昇を抑制するが、珪化物形成元素であるCrを添加して、珪化物をさらに析出させることにより、固溶Si量を低減でき、強度を損なわずに導電率を上昇できる。しかしながら、Cr濃度が0.5質量%を超えると粗大な第二相粒子を形成しやすくなるため、製品特性を損なう。従って、本発明に係るCu-Ni-Si-Co系合金には、Crを最大で0.5質量%添加することができる。但し、0.03質量%未満ではその効果が小さいので、好ましくは0.03~0.5質量%、より好ましくは0.09~0.3質量%添加するのがよい。
Mg、Mn、Ag及びPは、微量の添加で、導電率を損なわずに強度、応力緩和特性等の製品特性を改善する。添加の効果は主に母相への固溶により発揮されるが、第二相粒子に含有されることで一層の効果を発揮させることもできる。しかしながら、Mg、Mn、Ag及びPの濃度の総計が2.0質量%を超えると特性改善効果が飽和するうえ、製造性を損なう。従って、本発明に係るCu-Ni-Si-Co系合金には、Mg、Mn、Ag及びPから選択される1種又は2種以上を総計で最大2.0質量%添加するのが好ましい。但し、0.01質量%未満ではその効果が小さいので、より好ましくは総計で0.01~2.0質量%、更により好ましくは総計で0.02~0.5質量%、典型的には総計で0.04~0.2質量%添加する。
Sn及びZnにおいても、微量の添加で、導電率を損なわずに強度、応力緩和特性、めっき性等の製品特性を改善する。添加の効果は主に母相への固溶により発揮される。しかしながら、Sn及びZnの総計が2.0質量%を超えると特性改善効果が飽和するうえ、製造性を損なう。従って、本発明に係るCu-Ni-Si-Co系合金には、Sn及びZnから選択される1種又は2種を総計で最大2.0質量%添加することができる。但し、0.05質量%未満ではその効果が小さいので、好ましくは総計で0.05~2.0質量%、より好ましくは総計で0.5~1.0質量%添加するのがよい。
As、Sb、Be、B、Ti、Zr、Al及びFeにおいても、要求される製品特性に応じて、添加量を調整することで、導電率、強度、応力緩和特性、めっき性等の製品特性を改善する。添加の効果は主に母相への固溶により発揮されるが、第二相粒子に含有され、若しくは新たな組成の第二相粒子を形成することで一層の効果を発揮させることもできる。しかしながら、これらの元素の総計が2.0質量%を超えると特性改善効果が飽和するうえ、製造性を損なう。従って、本発明に係るCu-Ni-Si-Co系合金には、As、Sb、Be、B、Ti、Zr、Al及びFeから選択される1種又は2種以上を総計で最大2.0質量%添加することができる。但し、0.001質量%未満ではその効果が小さいので、好ましくは総計で0.001~2.0質量%、より好ましくは総計で0.05~1.0質量%添加する。
本発明において、第二相粒子とは主にシリサイドを指すが、これに限られるものではなく、溶解鋳造の凝固過程に生ずる晶出物及びその後の冷却過程で生ずる析出物、熱間圧延後の冷却過程で生ずる析出物、溶体化処理後の冷却過程で生ずる析出物、及び時効処理過程で生ずる析出物のことを言う。
コルソン系銅合金の一般的な製造プロセスでは、まず大気溶解炉を用い、電気銅、Ni、Si、Co等の原料を溶解し、所望の組成の溶湯を得る。そして、この溶湯をインゴットに鋳造する。その後、熱間圧延を行い、冷間圧延と熱処理を繰り返して、所望の厚み及び特性を有する条や箔に仕上げる。熱処理には溶体化処理と時効処理がある。溶体化処理では、約700~約1000℃の高温で加熱して、第二相粒子をCu母地中に固溶させ、同時にCu母地を再結晶させる。溶体化処理を、熱間圧延で兼ねることもある。時効処理では、約350~約550℃の温度範囲で1時間以上加熱し、溶体化処理で固溶させた第二相粒子をナノメートルオーダーの微細粒子として析出させる。この時効処理で強度と導電率が上昇する。より高い強度を得るために、時効前及び/又は時効後に冷間圧延を行なうことがある。また、時効後に冷間圧延を行なう場合には、冷間圧延後に歪取焼鈍(低温焼鈍)を行なうことがある。
上記各工程の合間には適宜、表面の酸化スケール除去のための研削、研磨、ショットブラスト酸洗等が適宜行なわれる。
まず、第1の時効処理では析出物の微細化に有用であるとして慣用的に行われている条件よりも若干低い温度を選択し、微細な第二相粒子の析出を促しながら、第2の溶体化で析出した可能性のある析出物の粗大化を防止する。第1の時効処理を400℃未満にすると、繰り返し耐へたり性を向上する20nm~50nmの大きさの第二相粒子の密度が低くなりやすい一方で、1回目の時効を500℃超にすると、過時効条件になり、強度及び初期耐へたり性に寄与する5nm~20nmの大きさの第二相粒子の密度が低くなりやすい。よって、第1の時効処理は400℃以上500℃以下の温度範囲で1~12時間とするのが好ましく、450℃以上480℃以下の温度範囲で3~9時間とするのがより好ましい。
しかし、第2の時効処理の時間が第1の時効処理の時間に比べて非常に長い場合(例:10倍以上)には、粒径が5nm以上20nm未満の第二相粒子は増加するものの、1回目の時効処理で析出した析出物の成長及び2回目の時効処理で析出した析出物の成長により粒径が20nm以上50nm以下の第二相粒子も増加するため、上記個数密度比はやはり3未満となりやすい。
よって、第2の時効処理の時間を第1の時効処理の時間の3~10倍とするのが好ましく、3~5倍とするのがより好ましい。
表1に記載の各成分組成の銅合金を、高周波溶解炉で1300℃で溶製し、厚さ30mmのインゴットに鋳造した。次いで、このインゴットを1000℃で3時間加熱後、上り温度(熱間圧延終了温度)を900℃として板厚10mmまで熱間圧延し、熱間圧延終了後は速やかに室温まで水冷した。次いで、表面のスケール除去のため厚さ9mmまで面削を施した後、冷間圧延により厚さ0.15mmの板とした。次に各温度及び時間で溶体化処理を行い、溶体化処理終了後は速やかに室温まで水冷した。次いで、不活性雰囲気中、各温度及び時間で第一の時効処理を施し、各圧下率で冷間圧延し、最後に、不活性雰囲気中、各温度及び時間で第二の時効処理をして、各試験片を製造した。
MBR/t≦1.0 大変優れている
1.0<MBR/t≦2.0 優れている
2.0<MBR/t 不充分である
表3に記載の各成分組成の銅合金を、高周波溶解炉で1300℃で溶製し、厚さ30mmのインゴットに鋳造した。次いで、このインゴットを1000℃で3時間加熱後、上り温度(熱間圧延終了温度)を900℃として板厚10mmまで熱間圧延し、熱間圧延終了後は速やかに室温まで水冷した。次いで、表面のスケール除去のため厚さ9mmまで面削を施した後、冷間圧延により厚さ0.15mmの板とした。次に各温度及び時間で溶体化処理を行い、溶体化処理終了後は速やかに室温まで水冷した。次いで、不活性雰囲気中、各温度及び時間で第一の時効処理を施し、各圧下率で冷間圧延し、最後に、不活性雰囲気中、各温度及び時間で第二の時効処理をして、各試験片を製造した。
<No.1~50>
第二相粒子の個数密度が適切であったため、強度、導電率、耐へたり性及び曲げ加工性が共に優れていた。
<No.51、61、71、75>
第1時効及び第2時効における温度が低く、粒径5nm以上50nm以下の第二相粒子が全体的に不十分となった。
<No.52、62>
第2時効における温度が低く、粒径5nm以上20nm未満の第二相粒子の比率が小さくなった。
<No.53、63、72、76>
第1時効における温度が高い一方で、第2時効における温度が低く、粒径5nm以上20nm未満の第二相粒子の比率が小さくなった。
<No.54、64>
第1時効における温度が低く、粒径5nm以上50nm以下の第二相粒子が全体的に不十分となった。
<No.55、59、65、69>
粒径5nm以上50nm以下の第二相粒子が全体的に少なく、粒径20nm以上50nm以下の第二相粒子と粒径5nm以上20nm未満の第二相粒子のバランスが悪い。
<No.56、66、73、77>
第1時効における温度が低い一方で、第2時効における温度が高く、粒径20nm以上50nm以下の第二相粒子と粒径5nm以上20nm未満の第二相粒子のバランスが悪くなった。
<No.57、67>
第2時効における温度が高く、粒径5nm以上20nm未満の第二相粒子の比率が小さくなった。
<No.58、68、74、78>
第1時効及び第2時効における温度が高く、第二相粒子が全体的に発達しすぎたため、本発明で規定する粒径5nm以上50nm以下の第二相粒子は全体的に不十分となった。
<No.60、70>
第1時効及び第2時効における時間が長く、粒径5nm以上20nm未満の第二相粒子が不十分となった。
<No.79、80>
第1時効と第2時効の間の冷間圧延の圧下率が低く、第2時効の効果が薄れ、粒径5nm以上20nm未満の第二相粒子の比率が小さくなった。
<No.81、82>
No.81及び82は発明例ではあるが、第1時効と第2時効の間の冷間圧延の圧下率が高く、第2時効の効果が高くなり、曲げ加工性が低下した。
<No.83、84>
第1時効における温度が高い一方で、第1時効と第2時効の間の冷間圧延の圧下率が低く、粒径5nm以上20nm未満の第二相粒子の比率が小さくなった。
<No.85、86>
第2時効を省略したため、粒径5nm以上20nm未満の第二相粒子の比率が小さくなった。
<No.87>
第1時効に比べて第2時効の時効時間が短かったため、粒径5nm以上20nm未満の第二相粒子の比率が小さくなった。
<No.88>
第1時効に比べて第2時効の時効時間が長すぎたため、粒径5nm以上20nm未満の第二相粒子の比率が小さくなった。
12 ナイフエッジ
13 標点距離
14 バイス
15 ストローク
16 へたり
Claims (7)
- Ni:1.0~2.5質量%、Co:0.5~2.5質量%、Si:0.3~1.2質量%を含有し、残部がCu及び不可避不純物からなる電子材料用銅合金であって、母相中に析出した第二相粒子のうち、粒径が5nm以上50nm以下のものの個数密度が1×1012~1×1014個/mm3であり、粒径が5nm以上20nm未満のものの個数密度は、粒径が20nm以上50nm以下のものの個数密度に対する比で表して3~6である電子材料用銅合金。
- 粒径が5nm以上20nm未満の第二相粒子の個数密度が2×1012~7×1013であり、粒径が20nm以上50nm以下の第二相粒子の個数密度が3×1011~2×1013である請求項1記載の電子材料用銅合金。
- 更にCrを最大0.5質量%含有する請求項1又は2記載の電子材料用銅合金。
- 更にMg、P、As、Sb、Be、B、Mn、Sn、Ti、Zr、Al、Fe、Zn及びAgよりなる群から選ばれる1種又は2種以上を総計で最大2.0質量%含有する請求項1~3何れか一項記載の電子材料用銅合金。
- -所望の組成をもつインゴットを溶解鋳造する工程1と、
-材料温度を950℃以上1050℃以下として1時間以上加熱後に熱間圧延を行う工程2と、
-随意的な冷間圧延工程3と、
-材料温度を950℃以上1050℃以下に加熱する溶体化処理を行う工程4と、
-材料温度を400℃以上500℃以下で1~12時間加熱する第一の時効処理工程5と、
-圧下率30~50%の冷間圧延工程6と、
-材料温度を300℃以上400℃以下で3~36時間加熱し、当該加熱時間を第1の時効処理における加熱時間の3~10倍とする第二の時効処理工程7と、
を順に行なうことを含む電子材料用銅合金の製造方法。 - 請求項1~4何れか一項記載の電子材料用銅合金からなる伸銅品。
- 請求項1~4何れか一項記載の電子材料用銅合金を備えた電子部品。
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CN106399749B (zh) * | 2016-10-05 | 2018-01-05 | 宁波兴业盛泰集团有限公司 | 一种高强高弹铜镍硅系合金材料及其制备方法 |
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US9476109B2 (en) | 2010-03-31 | 2016-10-25 | Jx Nippon Mining & Metals Corporation | Cu—Ni—Si—Co copper alloy for electronic material and process for producing same |
US9460825B2 (en) | 2010-05-31 | 2016-10-04 | Jx Nippon Mining & Metals Corporation | Cu-Co-Si-based copper alloy for electronic materials, and method of manufacturing same |
US10056166B2 (en) | 2010-08-24 | 2018-08-21 | Jx Nippon Mining & Metals Corporation | Copper-cobalt-silicon alloy for electrode material |
CN103249851A (zh) * | 2010-12-13 | 2013-08-14 | Jx日矿日石金属株式会社 | 电子材料用Cu-Ni-Si-Co系铜合金及其制造方法 |
EP2692878A4 (en) * | 2011-03-28 | 2014-09-10 | Jx Nippon Mining & Metals Corp | COUPLER ALLOY ON CU-SI-CO BASE FOR ELECTRONIC MATERIALS AND MANUFACTURING METHOD THEREFOR |
EP2692878A1 (en) * | 2011-03-28 | 2014-02-05 | JX Nippon Mining & Metals Corp. | Cu-si-co-base copper alloy for electronic materials and method for producing same |
US9478323B2 (en) | 2011-03-28 | 2016-10-25 | Jx Nippon Mining & Metals Corporation | Cu—Si—Co-based copper alloy for electronic materials and method for producing the same |
US9490039B2 (en) | 2011-03-29 | 2016-11-08 | Jx Nippon Mining & Metals Corporation | Strip of Cu—Co—Si-based copper alloy for electronic materials and the method for producing the same |
EP2692879A4 (en) * | 2011-03-29 | 2014-09-10 | Jx Nippon Mining & Metals Corp | CU-CO-SI BASE COUPLING ALLOY STRIP FOR ELECTRONIC MATERIAL AND METHOD OF MANUFACTURING THEREOF |
EP2692879A1 (en) * | 2011-03-29 | 2014-02-05 | JX Nippon Mining & Metals Corporation | Cu-co-si-based copper alloy strip for electron material, and method for manufacturing same |
JP2013104068A (ja) * | 2011-11-10 | 2013-05-30 | Jx Nippon Mining & Metals Corp | 電子材料用Cu−Ni−Si−Co系銅合金 |
JP2014088604A (ja) * | 2012-10-31 | 2014-05-15 | Dowa Metaltech Kk | Cu−Ni−Co−Si系銅合金板材およびその製造法 |
JP2014156623A (ja) * | 2013-02-14 | 2014-08-28 | Dowa Metaltech Kk | 高強度Cu−Ni−Co−Si系銅合金板材およびその製造法並びに通電部品 |
WO2014126047A1 (ja) * | 2013-02-14 | 2014-08-21 | Dowaメタルテック株式会社 | 高強度Cu-Ni-Co-Si系銅合金板材およびその製造法並びに通電部品 |
US10199132B2 (en) | 2013-02-14 | 2019-02-05 | Dowa Metaltech Co., Ltd. | High strength Cu—Ni—Co—Si based copper alloy sheet material and method for producing the same, and current carrying component |
JP2017043789A (ja) * | 2015-08-24 | 2017-03-02 | Dowaメタルテック株式会社 | Cu−Ni−Co−Si系高強度銅合金薄板材およびその製造方法並びに導電ばね部材 |
Also Published As
Publication number | Publication date |
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TW201026864A (en) | 2010-07-16 |
KR20110088595A (ko) | 2011-08-03 |
CN102227510A (zh) | 2011-10-26 |
US20110244260A1 (en) | 2011-10-06 |
EP2371976A1 (en) | 2011-10-05 |
KR101331339B1 (ko) | 2013-11-19 |
EP2371976A4 (en) | 2013-06-12 |
JP5319700B2 (ja) | 2013-10-16 |
CN102227510B (zh) | 2015-06-17 |
JPWO2010064547A1 (ja) | 2012-05-10 |
TWI400342B (zh) | 2013-07-01 |
EP2371976B1 (en) | 2014-10-22 |
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