WO2009122589A1 - 2枚合わせ片面金属箔張積層板およびその製造方法、ならびに、片面プリント配線板およびその製造方法 - Google Patents
2枚合わせ片面金属箔張積層板およびその製造方法、ならびに、片面プリント配線板およびその製造方法 Download PDFInfo
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- WO2009122589A1 WO2009122589A1 PCT/JP2008/056790 JP2008056790W WO2009122589A1 WO 2009122589 A1 WO2009122589 A1 WO 2009122589A1 JP 2008056790 W JP2008056790 W JP 2008056790W WO 2009122589 A1 WO2009122589 A1 WO 2009122589A1
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- Prior art keywords
- metal foil
- release material
- sided
- clad laminate
- laminate
- Prior art date
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Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0097—Processing two or more printed circuits simultaneously, e.g. made from a common substrate, or temporarily stacked circuit boards
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/15—Position of the PCB during processing
- H05K2203/1536—Temporarily stacked PCBs
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/269—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension including synthetic resin or polymer layer or component
Definitions
- the present invention relates to a two-sided single-sided metal foil-clad laminate and a method for manufacturing the same, and a single-sided printed wiring board and a method for manufacturing the same, and particularly to a multilayer wiring board, a semiconductor chip mounting substrate, and a semiconductor package substrate.
- the present invention relates to a single-sided metal foil-clad laminate and a method for manufacturing the same, and a single-sided printed wiring board using the double-sided single-sided metal foil-clad laminate and a method for manufacturing the same.
- the film which is smaller than a prepreg and a copper-clad laminate, and does not mutually adhere with a copper-clad laminate is put inside a copper-clad laminate.
- the circuit processing cannot be performed on the entire surface of the support substrate, and the efficiency is deteriorated.
- the product cannot be taken well and the probability of a defect is increased.
- the present invention does not allow the chemical solution used in the manufacturing process to permeate, has a good release property of the release material, and does not peel off the mating surface due to the shrinkage of the release film during high temperature treatment.
- An object of the present invention is to provide a sheet-fitting single-sided metal foil-clad laminate and a method for producing the same. It is another object of the present invention to provide a single-sided printed wiring board using the two-sheet single-sided metal foil-clad laminate and a method for manufacturing the same.
- the above problem is solved by the present invention described below. That is, in the present invention, two sets of structures in which metal foils are superposed on one side of one prepreg or a laminated body of a plurality of prepregs are arranged so that each prepreg is inside through a release material.
- the release material is a film made of a resin material or a composite material in which the resin material and a metal material are combined, and the thickness thereof is 10 to 200 ⁇ m. It is a two-sheet single-sided metal foil-clad laminate in which the release material has a heat shrinkage rate of 1.5% or less at a temperature at which treatment is performed.
- the present invention produces a structure by superimposing a metal foil on one side of one prepreg or one side of a laminate of a plurality of prepregs, and the two sets of the structures are separated from each other through a release material.
- a two-layer laminated single-sided metal foil-clad laminate having a thickness of 10 to 200 ⁇ m and a heat shrinkage rate of the release material at a temperature at which the heat and pressure treatment is applied is 1.5% or less. It is a manufacturing method of a board.
- the present invention provides a circuit processing treatment, a solder resist coating treatment, a Ni—Au plating treatment, and a contour processing treatment on both surfaces of the two-sheet laminated single-sided metal foil-clad laminate, or each of the above treatments. After at least one of them is applied, each of the two sets of single-sided metal foil-clad laminates is a single-sided printed wiring board that is separated from the release material.
- the two-sided single-sided metal foil-clad laminate is separated from the mold release material after manufacturing the single-sided printed wiring board.
- the release material has good peelability, and the mating surface does not peel due to shrinkage of the release film during high temperature processing
- a laminated single-sided metal foil-clad laminate and a method for producing the same can be provided.
- seat single-sided metal foil tension laminated board and its manufacturing method can be provided.
- Reference numeral 1 denotes a prepreg
- 2 denotes a metal foil
- 3 denotes a release material
- 4 denotes an end plate.
- the double-ply single-sided metal-foil-clad laminate of the present invention has a metal foil superimposed on one side of one prepreg or one side of a laminate of prepregs. Two sets of structural bodies to be formed are overlaid by heat and pressure treatment so that each prepreg is inside through a release material.
- the two-sheet single-sided metal foil-clad laminate of the present invention will be described.
- the release material used in the present invention adheres to the printed wiring board by the heating and pressurizing process without peeling off from the prepreg itself. On the other hand, when peeling with intention, the two-sided single-sided metal foil-clad laminate is used. The prepreg can be easily peeled by hand.
- the release material is a film made of a resin material or a composite material in which the resin material and a metal material are combined. If the mold release material is composed of only metal materials, it is easy for various chemicals to seep into the wiring board manufacturing process. However, if the mold release material is made of the above materials, the chemicals will not seep. The adverse effect of the chemical remaining on the mating surface with the mold release material can be reduced.
- the heat shrinkage rate of the release material is required to be 1.5% or less at the temperature at which the heat and pressure treatment is performed, and is preferably 1.0% or less, preferably 0.01 to 0.00. It is more preferably 9%, and further preferably 0.01 to 0.8%.
- the thermal shrinkage rate exceeds 1.5%, the mold release material tends to shrink at a high temperature (eg, 160 ° C. or higher) such as a solder resist cure, and the mating surface peels off. That is, the heat resistance of the release material is inferior.
- the heat shrinkage ratio is measured using a three-dimensional measuring instrument (manufactured by Mitutoyo) for the dimensions before and after being treated for 1 hour in a 180 ° C. dryer (difference in dimensions before and after heat treatment / before heat treatment). Dimension) was determined and used as the shrinkage rate.
- the rate of decrease in elongation after the heat and pressure treatment of the release material is preferably 50% or less, more preferably 30% or less, and more preferably 1 to 20% before the heat and pressure treatment. Further preferred. By being 50% or less, generation
- the release material before the heating and pressurizing treatment and the release material after the heating and pressurizing treatment were each pulled at a rate of 5 mm / min.
- the sample length L at the time of rupture is measured by pulling the wire, and the elongation rate (E 0 ) before the heat and pressure treatment is first calculated from the sample length L 0 before the test and the sample length L at the time of rupture according to the following formula 1. And the elongation (E) after the heating and pressing treatment are calculated.
- Elongation (E, E 0 ) (%) (L ⁇ L 0 ) ⁇ 100 / L 0 (Formula 1)
- the elongation reduction rate is calculated and calculated by the following formula 2.
- Reduction rate of elongation (%) (E 0 ⁇ E) ⁇ 100 / E 0 (Formula 2)
- polyphenylene sulfide polyphenylene oxide, polysulfone, polyether sulfone, polyphenylene sulfone, polyetherimide, polyimide, polyamideimide, polyamide, polycarbonate, polyarylate, polyetherketone, polyetheretherketone, Examples include polyacetal, cellulose acetate, poly-4-methylpentene-1, polyethylene terephthalate, polyethylene naphthalate, and derivatives of these resins. Of these, polyphenylene sulfide and polyimide are preferable.
- a mold release material consists of a composite material which combined the resin material and the metal material
- a resin material As the metal material, stainless steel, brass, or the like can be used.
- the thickness of the metal layer is preferably less than 1 ⁇ m.
- the thickness is less than 1 ⁇ m, even if the end of the laminated board is exposed to various chemicals in the manufacturing process of the wiring board, the chemicals do not penetrate to the back, and the adverse effects of the chemicals can be minimized.
- a fluororesin polyvinylidene fluoride, polytetrafluoroethylene, etc.
- a fluororesin polyvinylidene fluoride, polytetrafluoroethylene, etc.
- the thickness of the release material is 10 to 200 ⁇ m, preferably 12 to 125 ⁇ m, and more preferably 40 to 125 ⁇ m.
- the thickness is less than 10 ⁇ m, the strength of the release material is insufficient, and when the release material is separated from the two-sided single-sided metal foil-clad laminate, the release material is broken and the peelability is poor.
- the handling at the time of constructing a two-sheet single-sided metal foil-clad laminate is not good.
- the thickness exceeds 200 ⁇ m, it is not preferable from the viewpoint of availability and price.
- Metal foil As the metal foil, a metal foil used for a normal printed wiring board, for example, a copper foil can be used.
- the copper foil may be either an electrolytic copper foil or a rolled copper foil, and the thickness is not particularly limited. Accordingly, it is possible to use a copper foil having a thickness of 105 ⁇ m or less or a peelable copper foil generally used for printed wiring boards. Note that an etchable type copper foil having an aluminum carrier or a nickel carrier may be used instead of the peelable type.
- the roughening process is generally given to the copper foil used for a printed wiring board, also in this invention, such a copper foil can be used and the roughening process is not given. But it does n’t matter.
- the prepreg is formed by impregnating, coating or adhering a matrix resin composition to a base material.
- Materials constituting the substrate include glasses (E glass, D glass, S glass, T glass, quartz glass (quartz glass), etc.), ceramics (alumina, boron nitride, etc.), heat resistant engineering plastics (all Aromatic polyamide, polyphenylene sulfide, polyetherimide, polyimide, cell carbon) and the like, and these may be used alone or in combination of two or more.
- Examples of the form of the substrate include a woven or non-woven fabric using fibers, chops, etc .; an open-cell porous fluororesin film or sheet; and the like.
- the matrix resin that is the main component of the prepreg matrix resin composition includes phenol resin, polyester resin, epoxy resin, cyanate resin, thermosetting polyimide resin, and other thermosetting resins; a composition comprising two or more of them. And so on.
- the resin composition for a matrix of the prepreg may contain an inorganic filler for improving reliability.
- the inorganic filler is not particularly limited, and examples thereof include silica, fused silica, talc, alumina, aluminum hydroxide, barium sulfate, calcium hydroxide, aerosil and calcium carbonate. These may be used alone or in combination of two or more. Silica is preferred in terms of dielectric properties and low thermal expansion.
- the inorganic filler may be treated with various coupling agents such as a silane coupling agent.
- the matrix resin composition of the prepreg may contain a thermoplastic resin for improving flexibility.
- thermoplastic resin include, but are not limited to, fluororesin, polyphenylene ether, modified polyphenylene ether, polyphenylene sulfide, polycarbonate, polyether imide, polyether ether ketone, polyarylate, polyamide, polyamide imide, and polybutadiene. I don't mean.
- the thermoplastic resins may be used alone or in combination of two or more.
- additives such as a coupling agent, a pigment, a leveling agent, an antifoaming agent, and an ion trapping agent may be blended as necessary.
- the number of prepregs constituting the single-sided metal foil-clad laminate is at least one, but a plurality of prepregs may be used.
- the metal foil described above is provided on one side of the laminated body of the prepreg after lamination.
- the two-piece single-sided metal foil-clad laminate of the present invention is produced as follows (see FIG. 1). That is, first, a metal foil 2 is superposed on one side of a prepreg 1 (or a laminated body when a plurality of prepregs are laminated) to produce a structure. Next, two sets of this structure are prepared, and are laminated by applying heat and pressure treatment with the respective prepregs being inside through the release material 3 according to the present invention. The heat and pressure treatment is performed, for example, by inserting these materials between the two end plates 4.
- the release material 3 has a length (size) equal to or greater than that of the prepreg 1 and the metal foil 2. It is preferable that it is the same from a viewpoint of the operativity at the time of printed wiring board manufacture.
- the conditions of heating and pressing differ depending on the prepreg resin.
- the temperature is preferably 150 to 250 ° C. and the pressure is preferably 0.5 to 8.0 MPa.
- the single-sided printed wiring board of the present invention is a circuit processing treatment, a solder resist coating treatment, a Ni—Au plating treatment on both surfaces of the two-sheet single-sided metal foil-clad laminate of the present invention. And after performing an external shape processing process, or after giving at least any one of each process, each of two sets of single-sided metal foil tension laminated sheets is manufactured separately from a mold release material. It should be noted that a connection failure (AOI) inspection or the like may be performed at the end of the series of processes or after separating the single-sided metal foil-clad laminate by any process.
- AOI connection failure
- Example 1 A prepreg with a thickness of 18 mm (3EC-VLP-18 made by Mitsui Kinzoku Co., Ltd.) and a prepreg with glass cloth as a base material impregnated with epoxy resin (GEA-679FGB made by Hitachi Chemical Co., Ltd.) Two sets of constructions in which two sheets were sequentially stacked were produced. These are laminated by heat and pressure treatment (180 ° C., 3 MPa, press molding treatment for 1 hour) so that each prepreg is inside through a release material (release film) having a thickness of 50 ⁇ m. A metal foil-clad laminate was produced.
- the release material used was a polyimide-based film (trade name: Upilex-S) manufactured by Ube Industries, Ltd., with a thermal shrinkage rate of 0.05% at 180 ° C. and an elongation reduction rate after pressing. It was 5%.
- the copper foil, the glass cloth base epoxy resin prepreg, and the release material were all 510 mm ⁇ 510 mm in size.
- Example 2 (Example 2) Implemented except that the release material was a 25 ⁇ m thick Torelina film (manufactured by Toray Industries, Inc., heat shrinkage at 180 ° C., 0.7%, elongation reduction after pressing, 10%, polyphenylene sulfide film)
- Torelina film manufactured by Toray Industries, Inc., heat shrinkage at 180 ° C., 0.7%, elongation reduction after pressing, 10%, polyphenylene sulfide film
- Example 3 (Example 3) Implemented except that the release material was a Torelina film with a thickness of 75 ⁇ m (manufactured by Toray Industries, Inc., heat shrinkage at 180 ° C., 0.5%, elongation reduction after pressing, 18%, polyphenylene sulfide film)
- the release material was a Torelina film with a thickness of 75 ⁇ m (manufactured by Toray Industries, Inc., heat shrinkage at 180 ° C., 0.5%, elongation reduction after pressing, 18%, polyphenylene sulfide film)
- a two-sided single-sided metal foil-clad laminate was produced.
- Example 4 A two-sheet single-sided metal foil-clad laminate was prepared in the same manner as in Example 1 except that the thickness of the release material was 12.5 ⁇ m.
- Example 5 A two-sheet single-sided metal foil-clad laminate was prepared in the same manner as in Example 1 except that the thickness of the release material was 125 ⁇ m.
- the mold release material was a 38 ⁇ m thick MAQINAS (manufactured by Nikko Metal Co., Ltd., with a heat shrinkage rate of 0.1% at 180 ° C., a reduction rate of elongation after pressing of 5%, and a polyimide resin film with a copper content of 0.1%.
- a two-sided single-sided metal foil-clad laminate was prepared in the same manner as in Example 1 except that the film was vapor-deposited so as to have a thickness of 3 ⁇ m.
- Example 7 The release material was 0 ⁇ m copper on the film surface of a 25 ⁇ m thick Aflex film (Asahi Glass Co., Ltd., heat shrinkage 2.0% at 180 ° C., elongation reduction 10% after pressing, fluororesin). Except that the film was prepared by vapor deposition to a thickness of 3 ⁇ m (thermal shrinkage rate at 180 ° C .: 0.5%, elongation reduction rate after pressing: 10%). A two-sheet single-sided metal foil-clad laminate was prepared.
- Example 8 Except the release material was a 50 ⁇ m thick Theonex film (Teijin DuPont Co., Ltd., heat shrinkage at 180 ° C, 1.5%, elongation reduction after pressing, 8%, polyethylene naphthalate film) In the same manner as in Example 1, a two-sheet single-sided metal foil-clad laminate was prepared.
- Theonex film Teijin DuPont Co., Ltd., heat shrinkage at 180 ° C, 1.5%, elongation reduction after pressing, 8%, polyethylene naphthalate film
- Example 1 Example except that the release material was an 25 mm thick aflex film (Asahi Glass Co., Ltd., heat shrinkage at 180 ° C. 2.0%, elongation reduction after pressing 10%, fluororesin) In the same manner as in Example 1, a two-sheet single-sided metal foil-clad laminate was produced.
- the release material was an 25 mm thick aflex film (Asahi Glass Co., Ltd., heat shrinkage at 180 ° C. 2.0%, elongation reduction after pressing 10%, fluororesin)
- a two-sheet single-sided metal foil-clad laminate was produced.
- Example 2 Comparative Example 2 Except that the mold release material is a Lumirror film with a thickness of 4.5 ⁇ m (manufactured by Toray Industries, Inc., heat shrinkage at 180 ° C., 0.5%, elongation reduction after pressing, 60%, polyester film) In the same manner as in Example 1, a two-sided single-sided metal foil-clad laminate was produced.
- the mold release material is a Lumirror film with a thickness of 4.5 ⁇ m (manufactured by Toray Industries, Inc., heat shrinkage at 180 ° C., 0.5%, elongation reduction after pressing, 60%, polyester film)
- Example 3 A two-sheet single-sided metal foil-clad laminate was prepared in the same manner as in Example 1 except that the release material was 7.5 ⁇ m in thickness.
- Example 4 Example except that the release material was Sepanium with a thickness of 40 ⁇ m (manufactured by Sun Aluminum Industry Co., Ltd., heat shrinkage rate of 0.0% at 180 ° C., elongation reduction rate after pressing is 0%, made of aluminum) In the same manner as in Example 1, a two-sheet single-sided metal foil-clad laminate was produced.
- the release material was Sepanium with a thickness of 40 ⁇ m (manufactured by Sun Aluminum Industry Co., Ltd., heat shrinkage rate of 0.0% at 180 ° C., elongation reduction rate after pressing is 0%, made of aluminum)
- a two-sheet single-sided metal foil-clad laminate was produced.
- solder resist (SR-7200G, manufactured by Hitachi Chemical Co., Ltd.) is applied on a two-sheet laminated single-sided metal foil-clad laminate subjected to circuit processing by screen printing so that the finished thickness is 25 ⁇ m and dried at 80 ° C. for 30 minutes. It was. Next, exposure printing was performed at 500 mJ / cm 2 , and development was performed at 30 ° C. for 3 minutes using a 1% aqueous sodium hydrogen carbonate solution. Thereafter, it was washed with running water and cured by heating at 170 ° C. for 60 minutes.
- SR-7200G manufactured by Hitachi Chemical Co., Ltd.
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Abstract
Description
また、上記2枚合わせ片面金属箔張積層板の両面に、回路加工処理、ソルダーレジスト塗布処理、Ni-Auめっき処理、および外形加工処理を施した後、又は前記各処理の少なくともいずれかの処理を施した後、前記2組の片面金属箔張積層板のそれぞれを前記離型材から分離する片面プリント配線板の製造方法である。
本発明の2枚合わせ片面金属箔張積層板は、1枚のプリプレグの片面、又は複数枚のプリプレグの積層体の片面に金属箔が重ね合わされてなる構成体2組が、離型材を介しそれぞれのプリプレグが内側となるように加熱加圧処理により重ね合わされてなる。
以下、本発明の2枚合わせ片面金属箔張積層板について説明する。
本発明で用いる離型材は、加熱加圧処理によってプリント配線板の製造プロセスにおいて自らプリプレグと剥離することなく接着する一方で、意図を持って剥離する時には、2枚合わせ片面金属箔張積層板からプリプレグを容易に手で剥離できる態様となっている。そして、当該離型材は、樹脂材料、又は該樹脂材料と金属材料とを組み合わせた複合材料からなるフィルムである。金属材料のみで離型材を構成すると、配線板の製造プロセスにおいて、種々の薬液の滲み込みが発生しやすくなるが、上記のような材料で離型材を構成することで、薬液の滲み込みが無くなり、離型材との合わせ面に残留した薬液による悪影響を低減することができる。
なお、熱収縮率は、180℃の乾燥機にて1時間処理した前後の寸法を、三次元測定器(ミツトヨ製)を用いて測定し、(加熱処理前後の寸法の差/加熱処理前の寸法)を求めて収縮率とした。
なお、伸びの低下率については、精密万能試験機(島津製作所製)を用いて、上記加熱加圧処理前の離型材と上記加熱加圧処理後の離型材をそれぞれ引っ張り速度5mm/min.で引っ張って破断時の試料長さLを測定し、先ず試験前の試料長さL0と破断時の試料長さLから下記式1によって上記加熱加圧処理する前の伸び率(E0)と上記加熱加圧処理後の伸び率(E)とを算出する。
次に、下記式2によって伸びの低下率を算出して求める。
伸びの低下率(%)=(E0-E)×100/E0 (式2)
なお、複合材料として使用される場合、樹脂材料としては、上記の他にフッ素樹脂(ポリフッ化ビニリデン、ポリテトラフロロエチレン等)を使用することができる。
なお、上記離型材は、必要に応じて上記厚みの範囲内で複数枚重ねて使用してもよい。複数枚重ねることで、2枚合わせ片面金属箔張積層板からの離型材の分離が容易となる場合がある。
金属箔としては、通常のプリント配線板に用いられる金属箔、例えば、銅箔を用いることができる。銅箔としては、電解銅箔および圧延銅箔のいずれでもよく、厚みは特に限定されるものではない。従って、一般にプリント配線板に用いられている厚み105μm以下の銅箔や、ピーラブルタイプの銅箔を用いることができる。
なお、ピーラブルタイプの代わりに、アルミキャリアやニッケルキャリアを有するようなエッチャブルタイプの銅箔を用いることもできる。
プリプレグは、基材にマトリックス樹脂組成物が含浸、塗布または付着されてなる。
基材を構成する材料としては、ガラス類(Eガラス、Dガラス、Sガラス、Tガラス、石英ガラス(クオーツガラス)など)、セラミックス類(アルミナ、窒化硼素など)、耐熱性エンジニアリングプラスチック類(全芳香族ポリアミド、ポリフェニレンスルフィド、ポリエーテルイミド、ポリイミド、セルカーボン)などが挙げられ、これを1種または2種以上適宜併用することができる。基材の形態としては、繊維、チョップなどを用いた織布または不織布;連続気泡多孔質のフッ素樹脂フィルムまたはシート;などが挙げられる。
分散性を高める等の目的で、無機フィラーには、シランカップリング剤等の各種カップリング剤で処理を施してもよい。
本発明の2枚合わせ片面金属箔張積層板は、下記のようにして製造される(図1参照)。すなわち、まず、プリプレグ1(プリプレグを複数枚積層する場合は、その積層体)の片面に金属箔2を重ね合わせて構成体を作製する。次に、この構成体を2組用意し、本発明に係る離型材3を介しそれぞれのプリプレグが内側となるようにして加熱加圧処理を施して積層する。加熱加圧処理は、例えば、2枚の鏡板4の間にこれらの材料を挿んで行う。本発明において、離型材3はプリプレグ1及び金属箔2と同等以上の長さ(大きさ)を有している。プリント配線板製造時の操作性の観点から同じであることが好ましい。
本発明の片面プリント配線板は、本発明の2枚合わせ片面金属箔張積層板の両面に、回路加工処理、ソルダーレジスト塗布処理、Ni-Auめっき処理、および外形加工処理を施した後、又は各処理の少なくともいずれかを施した後、2組の片面金属箔張積層板のそれぞれを離型材から分離して製造される。
なお、これら一連の処理の最後に、又は任意の処理で片面金属箔張積層板を分離した後、接続不良(AOI)検査などを行ってもよい。
厚さ18μmの銅箔(三井金属株式会社製3EC-VLP-18)に、厚さ0.1mmのプリプレグ(ガラス布を基材としエポキシ樹脂を含浸したプリプレグ 日立化成工業株式会社製GEA-679FGB)2枚を順次重ねた構成体を2組作製した。これらを、厚さ50μmの離型材(離型フィルム)を介しそれぞれのプリプレグが内側となるように加熱加圧処理(180℃、3MPa、1時間のプレス成形処理)により積層し、2枚合わせ片面金属箔張積層板を作製した。
離型材を、厚さ25μmのトレリナフィルム(東レ株式会社製、180℃での熱収縮率0.7%、プレス後における伸びの低下率が10%、ポリフェニレンスルフィドフィルム)としたこと以外は実施例1と同様にして2枚合わせ片面金属箔張積層板を作製した。
離型材を、厚さ75μmのトレリナフィルム(東レ株式会社製、180℃での熱収縮率0.5%、プレス後における伸びの低下率が18%、ポリフェニレンスルフィドフィルム)としたこと以外は実施例1と同様にして2枚合わせ片面金属箔張積層板を作製した。
離型材の厚みを12.5μmとしたこと以外は実施例1と同様にして2枚合わせ片面金属箔張積層板を作製した。
離型材の厚みを125μmとしたこと以外は実施例1と同様にして2枚合わせ片面金属箔張積層板を作製した。
離型材を、厚さ38μmのマキナス(MAQINAS)(日鉱金属株式会社製、180℃での熱収縮率0.1%、プレス後における伸びの低下率が5%、ポリイミド樹脂フィルムに銅を0.3μmの厚みとなるように蒸着したフィルム)としたこと以外は実施例1と同様にして2枚合わせ片面金属箔張積層板を作製した。
離型材を、厚さ25μmのアフレックスフィルム(旭硝子株式会社製、180℃での熱収縮率2.0%、プレス後における伸びの低下率が10%、フッ素樹脂)のフィルム表面に銅を0.3μmの厚みとなるように蒸着して作製したフィルム(180℃での熱収縮率0.5%、プレス後における伸びの低下率が10%)としたこと以外は実施例1と同様にして2枚合わせ片面金属箔張積層板を作製した。
離型材を厚さ50μmのテオネックスフィルム(帝人デュポン株式会社製,180℃での熱収縮率1.5%,プレス後における伸びの低下率8%,ポリエチレンナフタレートフィルム)とした以外は,実施例1と同様にして,2枚合わせ片面金属箔張積層板を作製した。
離型材を、厚さ25μmのアフレックスフィルム(旭硝子株式会社製、180℃での熱収縮率2.0%、プレス後における伸びの低下率が10%、フッ素樹脂)としたこと以外は実施例1と同様にして2枚合わせ片面金属箔張積層板を作製した。
離型材を、厚さ4.5μmのルミラーフィルム(東レ株式会社製、180℃での熱収縮率0.5%、プレス後における伸びの低下率が60%、ポリエステルフィルム)としたこと以外は実施例1と同様にして2枚合わせ片面金属箔張積層板を作製した。
離型材を、厚さ7.5μmとしたこと以外は実施例1と同様にして2枚合わせ片面金属箔張積層板を作製した。
離型材を、厚さ40μmのセパニウム(サン・アルミニウム工業社製、180℃での熱収縮率0.0%、プレス後における伸びの低下率が0%、アルミニウム製)としたこと以外は実施例1と同様にして2枚合わせ片面金属箔張積層板を作製した。
各実施例および比較例で得られた2枚合わせ片面金属箔張積層板の周辺をカットして、寸法を500mm×500mmとした。次に、この状態で両面にドライフィルム(日立化成工業株式会社製、H-K425(商品名)を使用した)をラミネートし、露光、現像、水洗、エッチング、水洗の各処理を順次行って回路加工を行った。
回路加工処理した2枚合わせ片面金属箔張積層板上にソルダーレジスト(日立化成工業株式会社製SR-7200G)をスクリーン印刷で仕上り厚が25μmになるように塗布し、80℃で30分間乾燥させた。次に、500mJ/cm2で露光焼付けを行い、1%炭酸水素ナトリウム水溶液を用いて、30℃、3分間現像した。その後、流水で洗浄し、170℃、60分間加熱硬化させた。
次に、この2枚合わせ片面金属箔張積層板に下記表1に示す手順で、各種の処理a)~q)を順次行った。
Z-200:株式会社ワールドメタル製
SA-100:日立化成工業株式会社製
NIPS-100:日立化成工業株式会社製
トップケミアロイ66:奥野薬品工業株式会社製
パレット:小島化学薬品株式会社製
HGS-100:日立化成工業株式会社製
HGS-2000:日立化成工業株式会社製
各処理を施した後、2組のそれぞれの片面金属箔張積層板を離型材から分離し、その時の剥離性を確認した。表2中の「◎」は、離型材の剥離が問題なく行えたことを示し、「○」は、離型材の剥離がほとんど問題なく行えたことを示し、「×」は、剥離の際に離型材の一部が破れたことを示す。なお、「◎」及び「○」であれば、剥離性が良好で実用上問題はない。
各処理を施した後、2組のそれぞれの片面金属箔張積層板を離型材から分離し、離型材の合わせ面に薬液(各処理で使用した溶液)の染込みがないか目視で確認した。
ソルダーレジスト塗布処理の際、170℃となるソルダーレジストの加熱硬化部分で、合わせ面の剥離の有無を確認した。表2中の「◎」は、合わせ面での剥離が無く耐熱性が非常に良好であることを示し、「○」は、合わせ面での剥離が無く耐熱性が良好であることを示し、「×」は、合わせ面での剥離があり耐熱性が劣ることを示す。
一方、比較例1では、離型材の熱収縮率が大きいため、高温になると合わせ面で剥離が起こった。比較例2はプレス後の伸びが大きく低下するため、2枚合わせ片面金属箔張積層板を分離する際に、離型材が破れてしまい上手く剥離できなかった。比較例3は、離型材が非常に薄く強度がないため、分離の際に離型材が破れてしまった。比較例4は、離型材が金属であるため、合わせ面に薬液が染込みかつ離型材が少し溶解していた。
Claims (5)
- 1枚のプリプレグの片面、又は複数枚のプリプレグの積層体の片面に金属箔が重ね合わされてなる構成体2組が、離型材を介しそれぞれのプリプレグが内側となるように加熱加圧処理により重ね合わされてなり、
前記離型材が樹脂材料、または該樹脂材料と金属材料とを組み合わせた複合材料からなるフィルムであり、その厚みが10~200μmで、かつ、前記加熱加圧処理を施す温度での前記離型材の熱収縮率が1.5%以下である2枚合わせ片面金属箔張積層板。 - 前記離型材の加熱加圧処理後における伸びの低下率が、加熱加圧処理前の50%以下である請求項1に記載の2枚合わせ片面金属箔張積層板。
- 1枚のプリプレグの片面、又は複数枚のプリプレグの積層体の片面に金属箔を重ね合わせて構成体を作製し、該構成体2組を、離型材を介しそれぞれのプリプレグが内側となるように加熱加圧処理を施して重ね合わせる2枚合わせ片面金属箔張積層板の製造方法であって、
前記離型材が樹脂材料、または該樹脂材料と金属材料とを組み合わせた複合材料からなるフィルムであり、その厚みが10~200μmで、かつ、前記加熱加圧処理を施す温度での前記離型材の熱収縮率が1.5%以下である2枚合わせ片面金属箔張積層板の製造方法。 - 請求項1または2に記載の2枚合わせ片面金属箔張積層板の両面に、回路加工処理、ソルダーレジスト塗布処理、Ni-Auめっき処理、および外形加工処理が施された後、又は前記各処理の少なくともいずれかが施された後、前記2組の片面金属箔張積層板のそれぞれが前記離型材から分離されてなる片面プリント配線板。
- 請求項1または2に記載の2枚合わせ片面金属箔張積層板の両面に、回路加工処理、ソルダーレジスト塗布処理、Ni-Auめっき処理、および外形加工処理を施した後、又は前記各処理の少なくともいずれかの処理を施した後、前記2組の片面金属箔張積層板のそれぞれを前記離型材から分離する片面プリント配線板の製造方法。
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