WO2009118920A1 - 真空装置用異常放電抑制装置 - Google Patents
真空装置用異常放電抑制装置 Download PDFInfo
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- WO2009118920A1 WO2009118920A1 PCT/JP2008/062666 JP2008062666W WO2009118920A1 WO 2009118920 A1 WO2009118920 A1 WO 2009118920A1 JP 2008062666 W JP2008062666 W JP 2008062666W WO 2009118920 A1 WO2009118920 A1 WO 2009118920A1
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- power
- control
- abnormal discharge
- interruption
- handling
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/3299—Feedback systems
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/0203—Protection arrangements
- H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges
Definitions
- the present invention relates to a vacuum abnormal discharge suppressing device, and more particularly to an abnormal discharge suppressing device for a vacuum device that cuts off the output of a high frequency power source in order to suppress abnormal discharge that occurs in plasma generation using a high frequency power source.
- an abnormal discharge suppressing device for a vacuum device that cuts off the output of a high frequency power source in order to suppress abnormal discharge that occurs in plasma generation using a high frequency power source.
- a minority arc is generated, and then energy concentrates to raise the temperature of the minority arc part, and the transition to the most abnormal discharge (majority arc) occurs.
- the target material evaporates due to the positive feedback of the movement of high-energy electrons, the increase of the target surface temperature, the abnormal distribution of gas pressure, and the local plasma density increases. It triggers a large arc called a track arc.
- the majority arc and the racetrack arc there is an influence such as a pinhole being generated in the memory and the optical surface during the film formation due to the fragments.
- one of the factors affecting the substrate processing is the electron density in the plasma. Since the plasma state changes depending on the high-frequency power, the pressure in the vacuum chamber, and the like, even if the impedance is adjusted by the matching unit, the reflected wave that is reflected by the plasma and returns to the high-frequency power source increases depending on the plasma state.
- a device for monitoring the electron density in the plasma by detecting the reflection coefficient has been proposed. (See Patent Document 2)
- the occurrence of abnormal discharges such as arcs may damage glass substrates and silicon wafers.
- the generation of the arc is detected by detecting the reflected wave power, and the output of the high frequency generator is reduced or temporarily (several tens of times) by the control circuit receiving the detection signal. The arc is extinguished by stopping at msec).
- a plasma CVD apparatus having an operation function called an arc cut function that suppresses the occurrence of abnormal discharge has been proposed in order to suppress instantaneous abnormal discharge generated in the film-forming electrode.
- This arc cut function detects a sign that an instantaneous abnormal discharge is generated by a current in the matching box and the like, and stops application of high-frequency power or reduces applied power for a short time. (See Patent Document 4)
- the occurrence of abnormal discharge is detected by a sudden increase in reflected wave power, but this reflected wave power may increase even in cases other than when abnormal discharge occurs.
- the high frequency power supply is cut off despite the abnormal discharge.
- the reflected wave power increases at the time of ignition in which the high frequency power source is activated and high frequency power is supplied to the load side. Therefore, even when abnormal discharge has not occurred, it is determined that abnormal discharge has occurred by detecting this increase in reflected wave power, and control is performed to cut off the output of high-frequency power from the high-frequency power source to the load. Done.
- the output from the high-frequency power source is cut off in this way, no power is supplied, so that plasma is not formed, and the film forming process is hindered.
- the high frequency power supply normally has a drooping characteristic protection function that lowers the output voltage to protect against overcurrent, it is sufficiently higher than the drooping level (for example, 15%) of the reflected wave power. It is necessary to set a detection level (for example, 20% to 50%). As described above, when the detection level for detecting abnormal discharge is set high, it is difficult to detect abnormal discharge in the initial stage, and there is a problem that good abnormal discharge cannot be detected.
- ions remain when the detection level for detecting abnormal discharge is lowered during steady plasma operation. When the remaining ions are accumulated, it becomes a factor for generating an abnormal arc, the frequency of occurrence of abnormal discharge is increased, and there is a problem that it is difficult to supply power to stable plasma.
- an object of the present invention is to solve the above-described conventional problems and to stably supply power to plasma.
- the purpose is to suppress the growth of arcs and eliminate the accumulation of ions that generate abnormal arcs.
- an object is to suppress erroneous detection without setting a detection level for detecting abnormal discharge high at the time of ignition or restart.
- the abnormal discharge suppression device for a vacuum device of the present invention is a device that suppresses the occurrence of abnormal discharge in order to stably supply power to plasma, and includes two modes as modes for suppressing the occurrence of abnormal discharge.
- the first mode for suppressing the abnormal discharge is the first first that enables restart in a state in which ions in the plasma remain by changing the time width of the shut-off time for shutting off the output of the high-frequency power supply. This is a mode in which two interruption controls of the handling interruption control and the second second handling interruption control for performing the restart in a state where the abnormal arc ions are eliminated are properly used.
- the second mode suppresses malfunctions due to erroneous detection of abnormal discharge by prohibiting the shut-off operation in sections where the feedback signal is likely to fluctuate, such as when ignition is restarted after fast handling is interrupted after fast handling is interrupted. It is an aspect to do. Both the first aspect and the second aspect enable stable power supply to the plasma.
- arc growth is suppressed by the first first handling cutoff control that enables restart in a state where ions in the plasma remain, and restart is performed in a state where abnormal arc ions have disappeared.
- the accumulation of ions that generate an abnormal arc is eliminated by the second second handling cutoff control.
- the interruption operation is prohibited even when an abnormal discharge is detected in the section such as at the time of ignition or restart after interruption of the first handling.
- a first aspect of the present invention is an apparatus that suppresses abnormal discharge in a vacuum device that generates plasma by supplying electric power from a high-frequency power source into a plasma reaction chamber, and performs processing such as film formation and etching using the plasma.
- a power control unit that controls the high-frequency power source based on a deviation between the power command value and the power feedback value, and a reflection that occurs at least during the abnormal discharge in the plasma reaction chamber and during the transition process to the abnormal discharge
- a shut-off control unit that shuts off power supply from the high-frequency power source to the plasma reaction chamber based on detection of wave power or reflected wave voltage.
- the cutoff control unit performs first first handling cutoff control and second second handling cutoff control with different cutoff times.
- first fast handling cutoff control ions can remain in the plasma reaction chamber, and the high frequency power source is controlled to be cut off within a time width in which the arcing element of the minority arc that is a cause of abnormal discharge disappears.
- second second handling cutoff control the high frequency power supply is controlled to be cut off within a time range in which the ions of the multi-wave arc during the abnormal discharge disappear.
- the duration of the cutoff time is set to a short duration of 1 ⁇ s to 100 ⁇ s, and the cutoff control is terminated with ions remaining in the plasma reaction chamber. Since the arcing element of the minority arc disappears by this short interruption, the abnormal discharge is eliminated. Moreover, since the ions in the plasma reaction chamber remain in the cutoff time width by the first first handling cutoff control, the power supply can be quickly and quickly started up after restarting after the cutoff. Can do. As a result, normal discharge can be instantaneously restored.
- the duration is 1 ms to 100 ms, and the cutoff control is terminated in a state where the abnormal arc ions of the multi-wave arc have disappeared. Accordingly, it is possible to eliminate the accumulation of ions that generate an abnormal arc and cut off the arcing.
- This second handling interruption is also referred to as an arc ion refresh operation because it eliminates abnormal arc ions.
- the power control unit restarts at a high speed after shutting off the output of the high-frequency power source by the first first handling cutoff control, and the traveling wave power value with respect to the power command value or the voltage command value
- the traveling wave voltage value is feedback-controlled so that the output of the high frequency power supply becomes a power command value or a voltage command value.
- the high-speed start-up performed after the first first handling cutoff control is performed by using a ramp-like power or voltage from zero to the power command power value or voltage command value in the same time order as the cutoff time of the first first handling cutoff control. It is a high-speed start-up that outputs in time width. Therefore, the time width required for this high-speed startup can be determined based on the cutoff time of the first first handling cutoff control.
- the time width of this high-speed startup can be set to 1 ⁇ s to 100 ⁇ s, for example.
- the power control unit performs restart by soft start after shutting off the output of the high frequency power supply by the second second handling shutoff control, and the traveling wave power value or the traveling wave voltage value with respect to the power command value or the voltage command value. Is controlled so that the output of the high-frequency power source becomes a power command value or a voltage command value.
- the soft start performed after the second second handling cutoff control is performed by using a matching box in which a ramp-like power output or voltage output from zero to a power command value or voltage command value is arranged between the high-frequency power source and the plasma reaction chamber. It is performed at a matching speed that the matching circuit can sufficiently cope with. Therefore, the time width required for this soft start can be determined depending on the magnitude of the power command value or voltage command value, the matching characteristics of the matching circuit of the matching box, and the like. The time width of this soft start can be set to 1 ms to 10 s, for example.
- the second second handling cutoff control is intended to eliminate the accumulation of ions that generate an abnormal arc, which is a multi-wave arc, and cut off the arcing. Therefore, it is executed when ions that generate an abnormal arc in the plasma have accumulated. It is effective to do.
- the present invention determines the accumulation state of ions that generate this abnormal arc based on the cumulative number of executions of the first fast handling cutoff control that occurs within a predetermined unit time (for example, 10 ms), and performs the first fast handling.
- a predetermined unit time for example, 10 ms
- the shut-off control prohibiting unit counts the number of times the first handling shut-off control is executed within the first predetermined time, and when the count value obtained by this count reaches a preset number of times, the second second Execute handling cutoff control.
- the second second handling cutoff control is executed and the count value is cleared, the count of the number of executions of the first first handling cutoff control is restarted, and this count value reaches the set number again within a predetermined time. Then, the second second handling cutoff control is executed again.
- the second aspect of the present invention prohibits the interruption operation even when abnormal discharge is detected in the ignition mode section, the high speed rising section after the first handling interruption, the reignition mode section after the second handling interruption, etc. By doing so, interruption due to erroneous detection of abnormal discharge is suppressed, and the power supply to the plasma is stabilized.
- the reflected wave power increases due to the inability to match the plasma load.
- reflected wave power droop control is performed. At this time, the reflected wave power is increased because of a misalignment and not caused by an abnormal discharge arc, so that it is not necessary to perform a blocking operation. Therefore, in such a case, the shutoff operation is prohibited and the power supply to the plasma is stabilized.
- the configuration of the second aspect of the present invention is an apparatus that suppresses abnormal discharge of a vacuum apparatus that performs film formation or etching using plasma generated by supplying electric power to a plasma reaction chamber, and supplies electric power.
- the high-frequency power source includes a power control unit that controls the high-frequency power source based on a deviation between a power command value and a power feedback value, and at least one of the time of abnormal discharge in the plasma reaction chamber and the transition process to abnormal discharge And a cutoff control unit that detects the reflected wave power or the reflected wave voltage generated in step S1 and shuts off the power supply from the high-frequency power source to the plasma reaction chamber.
- the interruption control unit includes an arcing detection / interruption unit that detects abnormal discharge, and an interruption control prohibition unit that prohibits interruption control of power supply by the arcing detection / interruption unit.
- the interruption control prohibiting unit provided in the second aspect of the present invention prohibits the electric power supply interruption control by the interruption control unit within the section determined as the arc interruption prohibition period, and the interruption control unit performs control to interrupt the electric power supply. Even if it is performed, this interruption control is prohibited and the power supply is continued.
- the power control unit uses the traveling wave power value as the power feedback value, and controls the output power so that the deviation between the power command value and the traveling wave power value decreases.
- the cutoff control unit performs cutoff control in two forms.
- the first form is fast handling cutoff control that suppresses minority arcs, and detects abnormal discharge by comparing the reflected wave power or reflected wave voltage with a low level threshold, and based on the detection of this abnormal discharge. Shut off the power supply.
- the second form is a second handling cutoff control that suppresses the multi-wave arc, and detects an increase in the reflected wave power by comparing the reflected wave power or reflected wave voltage with a high level threshold value. The power supply is cut off based on the detection of the increase.
- the first handling cutoff control and the second handling cutoff control have different threshold sizes compared to the reflected wave power Pr.
- a low level value is used as a threshold value to detect an initial stage of increase in reflected wave power or reflected wave voltage.
- an increase in reflected wave power accompanying the occurrence of abnormal discharge is detected.
- the second handling cutoff control uses a high-level value larger than the low-level value used in the first handling cutoff control as the threshold value, and the energy is concentrated and a large number of waves that have shifted to most abnormal discharges. Detects and shuts off arc conditions.
- the blocking control prohibiting unit of the present invention performs the prohibiting control for prohibiting the blocking control for the first handling blocking control, and does not perform the prohibiting control for the second handling blocking control.
- First handling cutoff control causes plasma ions to remain and extinguishes arcing elements of minority arc.
- Second handling cutoff control eliminates majority arc ions during abnormal discharge, thereby suppressing abnormal discharge. It is intended.
- the cutoff control prohibiting unit applies the prohibition control only to the first handling cutoff control so that erroneous cutoff control by erroneously detecting abnormal discharge is not performed.
- the arc cut-off prohibition section is a section where inconsistency with the plasma load of the high-frequency power supply occurs, the ignition mode section when the high-frequency power supply is started, the high-speed start-up section after the first handling is cut off when the high-frequency power supply is restarted, the second Each section includes a reignition mode section after handling interruption and a traveling wave power transient section which is a section until the traveling wave reaches a predetermined level.
- the plasma is in an unstable state, and the matching circuit is not sufficiently matched with the plasma load, so the reflected wave power may increase.
- the increase in reflected wave power at this time is not caused by abnormal discharge.
- the high-frequency power supply performs reflected wave power droop control as a protection operation, and therefore it is not necessary to perform cut-off control in the arc cut-off prohibition section.
- the ignition mode section and the ignition mode section are sections in which the plasma can be regarded as ignited, and are sections from when the traveling wave power starts to output power until it exceeds the drooping level of the reflected wave power.
- the traveling wave power or the load power to the plasma deviates significantly from the power command value of the output power of the high-frequency power source, it receives excessive reflected wave power. Droop control is performed, and overvoltage and overcurrent are protected by drooping characteristics. Since the output power of the high frequency power supply is reduced by this drooping characteristic, it is not necessary to stop the power supply by the cutoff control.
- the first handling cutoff control erroneously detects an increase in reflected wave power as an abnormal discharge, and the power supply is cut off based on this erroneous detection.
- this section continues as an arc cut-off prohibition section without cutting off power supply.
- the droop level can be determined by L ⁇ Cs100% obtained by multiplying the rated power command value Cs100% by the reflection droop coefficient L.
- the reflection droop coefficient L can be determined within a range of 0.1 to 0.3.
- the traveling wave power increases later than the power command value Cs, and gradually approaches the power command value Cs by feedback control.
- the traveling wave power is in a transient state, the detected increase in reflected wave power is detected as abnormal discharge, and the power supply is cut off based on this detection. In contrast, power cannot be supplied. Therefore, this traveling wave power transient period continues without interrupting the power supply as an arc interruption prohibition section.
- the traveling wave power transient section is a section where the difference (Cs ⁇ Pf) between the traveling wave power Pf and the power command value Cs is sufficiently large, with the power command value Cs as the upper limit, and from the power command value Cs to the rated power command value Cs100.
- the traveling wave power Pf is outside this level range, it can be determined by the level range with the lower limit (Cs ⁇ K ⁇ Cs100%) obtained by multiplying% by a predetermined coefficient K and subtracting K ⁇ Cs100%.
- the electric power supply is continued without being cut off as an arc cut-off prohibition section.
- the coefficient K is set within a range of 0.01 to 0.2, for example, and may be 0.03, for example.
- the abnormal discharge suppressing device for a vacuum device of the present invention it is possible to stably supply power to plasma.
- the abnormal discharge suppressing device for a vacuum apparatus of the present invention it is possible to suppress the growth of the arc and eliminate the accumulation of ions that generate the abnormal arc, thereby stably supplying power to the plasma. be able to.
- the abnormal discharge suppressing device for a vacuum apparatus of the present invention it is possible to reduce erroneous detection of abnormal discharge, and thereby to stably supply power to plasma.
- the abnormal discharge suppressing device for a vacuum device of the present invention it is possible to suppress erroneous detection without setting a detection level for detecting abnormal discharge high at the time of ignition or restart. It is possible to stably supply power to the plasma.
- FIG. 1 is a schematic configuration diagram of a power supply system for a vacuum device and an abnormal discharge suppression device for a vacuum device.
- the power supply system includes a high frequency power supply 10 including a power control unit 1, an oscillator 6, and a sensor 9.
- the power control unit 1 uses the traveling wave power Pf detected by the sensor 9 as a feedback signal, and controls the output power based on the difference from the power command value Cs.
- the high frequency power supply 10 supplies power to the plasma load 12 via the matching circuit 11.
- the plasma load 12 is an electrical load when the plasma formed in the plasma reaction chamber provided in the vacuum apparatus is viewed from the power supply side.
- the power control unit 1 receives the traveling wave power Pf from the sensor 9 as a feedback signal, performs feedback control based on the deviation between the input feedback signal and the power command value Cs, and outputs power from the high frequency power supply 10. Is controlled to become the power command value Cs.
- the control by the power control unit 1 can be performed by controlling the output power with respect to the voltage command value in addition to controlling the output power with respect to the power command value Cs. Below, the case where output electric power is controlled with respect to electric power command value Cs is demonstrated.
- the sensor 9 detects the traveling wave power Pf sent from the high frequency power supply 10 to the plasma load 12 and the reflected wave power Pr directed from the plasma load 12 to the high frequency power supply 10.
- a detection signal of the traveling wave power Pf is fed back to the power control unit 1, and a detection signal of the reflected wave power Pr is sent to an arcing detection / cutoff unit 4 included in the cutoff control unit 3, which will be described later. Is transmitted with a detection signal of traveling wave power Pf.
- Sensor 9 detects traveling wave power Pf and reflected wave power Pr, and sends a detection signal of traveling wave power Pf and a detection signal of reflected wave power Pr to power control unit 1.
- the power control unit 1 causes the output power of the high-frequency power supply 10 to follow the target value by feedback control using the detection signal of the traveling wave power Pf.
- the feedback control by the power control unit 1 generates a difference signal between the power command value Cs and the traveling wave power Pf as a command signal for controlling the output power and inputs it to one terminal of the operational amplifier 7.
- a reference high frequency signal is input to the other terminal of the operational amplifier 7.
- the operational amplifier 7 controls the amplitude of the high frequency signal based on the command signal from the power control unit 1.
- the high-frequency signal can be formed by the oscillator 6, and the frequency of the high-frequency signal can be determined according to the high frequency supplied to the plasma load, for example, a 13.56 MHz frequency signal.
- the AC output signal of the operational amplifier 7 is controlled so that the power supplied to the plasma load 12 becomes the power command value Cs.
- the output signal of the operational amplifier 7 is set to a predetermined power by the power amplifier 8 and then sent to the plasma load 12 through the matching circuit 11.
- an inverter can be used instead of the operational amplifier 7, and the voltage of the AC power can be controlled by a PWM control signal that controls the switching interval of the switching elements.
- the power control unit 1 detects an increase in the reflected wave power Pr using the detection signal of the reflected wave power Pr.
- the power control unit 1 performs the droop control, and the reflected wave power Pr Protects the power supply by suppressing overcurrent and overvoltage that accompany the increase.
- the matching circuit 11 is a circuit that performs impedance matching between the high-frequency power source 10 side and the plasma load 12, and can be configured by, for example, an inductance and a capacitor.
- FIG. 2 is a block diagram showing a control system of the power supply control unit.
- Cs is a power command value corresponding to the target value of the output power of the high-frequency power supply 10
- Pf traveling wave power toward the plasma load 12.
- feedback control is performed so that traveling wave power Pf, which is output power, matches target value Cs, which is a power command value.
- S1 is a summing point at which a difference between the power command value Cs and the traveling wave power detection signal Pfb fed back from the sensor 9 via the transfer function ⁇ is calculated and output as a power control deviation ⁇ .
- G is a transfer function for generating the current command signal I according to the power control deviation ⁇ , and has a proportional characteristic and an integral characteristic.
- the traveling wave power Pf is supplied to the plasma load 12 and fed back to the summing point S via the transfer function ⁇ .
- ⁇ is a transfer function when the traveling wave power Pf is fed back to the summing point S, and here corresponds to the transfer function of the sensor 9 that detects the traveling wave power Pf.
- the power control unit 1 also includes soft start control that increases power in a ramp shape from a zero output state to a predetermined power value at the time of start-up or restart after shut-off.
- the high frequency power supply 10 is provided with a mechanism that temporarily cuts off the electric power output toward the plasma load 12 when the abnormal discharge is detected.
- the shut-off mechanism has a shut-off control unit 3 that controls the shut-off operation of output power.
- the shut-off control unit 3 detects arcing and controls the shut-off operation.
- a blocking control prohibiting unit 5 that prohibits the operation of the arcing detection / blocking unit 4 and continues power supply, and a blocking interrupt unit 2 that interrupts a blocking operation by the blocking control unit 3 with respect to normal power control.
- the interruption interrupt unit 2 stops the operation of the oscillator 6 under the interruption control of the interruption control unit 3. By stopping the operation of the oscillator 6, the power supply from the high frequency power supply 10 to the plasma load 12 is temporarily stopped.
- the cutoff control may be a control for reducing the amount of power to be supplied in addition to stopping the power supply to the plasma load 12, and suppressing the output power by the power control unit 1 instead of stopping the operation of the oscillator 6. May be.
- the arcing detection / cut-off unit 4 of the cut-off control unit 3 receives the detection signal of the reflected wave power Pr detected by the sensor 9 and compares the detection signal of the reflected wave power Pr with a cut-off threshold value. When the magnitude of the detection signal of the electric power Pr exceeds this threshold value, it is determined that an abnormal discharge has occurred in the plasma load 12, and a cutoff command is output to the cutoff interrupt unit 2.
- the cutoff interrupting unit 2 stops the oscillation operation of the oscillator 6, thereby temporarily stopping the power supply from the high frequency power source 10 to the plasma load 12 and causing abnormal discharge. Suppresses the occurrence.
- the suppression of the abnormal discharge performed by the interruption control unit 3 includes the first fast handling interruption control that enables the restart in a state where ions in the plasma remain, and the restart in a state where the abnormal arc ions have disappeared.
- This can be performed by two cutoff controls including the second second handling cutoff control to be performed. These two shut-off controls can be selected by changing the duration of the shut-off time for shutting off the output of the high-frequency power supply.
- blocking control suppresses arc growth by performing interruption
- blocking control eliminates the accumulation
- the arcing detection / blocking unit 4 of the blocking control unit 3 performs the first first handling blocking control and the second second handling blocking control with different blocking times.
- the first first handling cutoff control enables ions to remain in the plasma reaction chamber and controls the cutoff of the high frequency power source within a time width during which the arcing element disappears.
- the second second handling cutoff control the high frequency power source is controlled to be cut off within a time range in which abnormal arc ions disappear.
- the duration of the cutoff time is set to a short duration of 1 ⁇ s to 100 ⁇ s, and the cutoff control is terminated with ions remaining in the plasma reaction chamber.
- the arcing element that is the cause of the abnormal discharge disappears by this short interruption, and the abnormal discharge is eliminated.
- ions in the plasma reaction chamber remain. Therefore, in the restart after the interruption, the power supply can be quickly started up in a short time, so that the normal discharge can be instantaneously restored.
- the interruption control is terminated in a state where the abnormal arc ions are extinguished with a time width longer than that of the first first handling interruption control of 1 ms to 100 ms. Accordingly, it is possible to eliminate the accumulation of ions that generate an abnormal arc and cut off the arcing.
- the cutoff operation by the first fast handling cutoff control stops the power supply when the reflected wave power reaches a low level threshold (first handling level) to eliminate the abnormal discharge. Further, in the shut-off operation by the second second handling shut-off control, when the reflected wave power reaches a high level threshold (second handling level), the power supply is stopped and the abnormal arc ions are extinguished.
- This second handling cutoff control is also referred to as an arc ion refresh operation.
- the first interruption control is referred to as first handling
- the second interruption control is referred to as second handling
- the first handling level is the second handling level. Set to a lower level than the handling level.
- the power control unit 1 shuts off the output of the high-frequency power source 10 by the first first handling cutoff control and then restarts it at a high-speed startup, and feedback-controls the traveling wave power value Pf with respect to the power command value Cs. Control is performed so that the output of the power supply becomes the power command value Cs.
- the restart performed after the first cutoff control is a fast rise, and the ramp-like power from the zero output state to the power command value is output in the same time order as the cutoff time of the first first handling cutoff control.
- the time width required for this high-speed startup can be determined according to the cutoff time of the first first handling cutoff control. This time width can be set to 1 ⁇ s to 100 ⁇ s, for example.
- the power control unit 1 performs restart by soft start after shutting off the output of the high frequency power supply 10 by the second second handling shutoff control, and feedback-controls the traveling wave power value Pf with respect to the power command value Cs. Control is performed so that the output of the high frequency power supply becomes the power command value Cs.
- the restart soft start performed after the second second handling cutoff control performs ramp-like power output from the zero output state to the power command value Cs at a matching speed that the matching circuit 11 can sufficiently cope with. As a result, an increase in reflected wave power Pr due to poor alignment can be suppressed.
- the time width required for the soft start of the restart by the second second handling cutoff control can be determined depending on the magnitude of the power command value Cs, the matching characteristics of the matching circuit 11, and the like.
- the time width of this soft start can be set to 1 ms to 10 s, for example.
- the second second handling cutoff control is intended to eliminate the accumulation of ions that generate an abnormal arc and cut off the arcing. Therefore, it is effective to execute when the ions that generate an abnormal arc are accumulated in the plasma. It is.
- the second second handling cutoff control is based on the cumulative number of executions of the first first handling cutoff control that occurs within a predetermined time, and determines the accumulation state of ions that generate an abnormal arc, and the first first handling cutoff control This is executed by determining that the point at which the cumulative number of executions reaches a preset number is the stage where ions that generate an abnormal arc in the plasma are accumulated. Therefore, the arcing detection / blocking unit 4 included in the blocking control unit 3 counts the number of times of execution of the first first handling blocking control together with the blocking control prohibiting unit 5, and the count value obtained by this count is set in advance. When the number of times is reached, the second second handling cutoff control is executed.
- the second second handling cutoff control is executed and the count value is cleared, the count of the first first handling cutoff control execution count is restarted, and again when the count value within a predetermined time reaches the set count.
- the second second handling cutoff control is executed.
- shutoff control unit 3 can perform the shutoff control in two forms: first handling shutoff control and second handling shutoff control.
- Each interruption control can be performed based on the detected abnormal discharge by detecting an abnormal discharge by comparing the absolute value level of the reflected wave power with a threshold value, for example.
- the first handling cutoff control detects abnormal discharge by comparing reflected wave power with a low level threshold value. The power supply is cut off based on the detection of the abnormal discharge.
- the second handling cutoff control detects an increase in reflected wave power by comparing the reflected wave power with a high level threshold, and cuts off the power supply based on the detection of the increase in reflected wave power.
- the first handling cutoff control and the second handling cutoff control are selected by changing the threshold value to be compared with the reflected wave power Pr.
- a low level value is used as a threshold value to detect an initial stage of increase in reflected wave power.
- an increase in reflected wave power accompanying the occurrence of abnormal discharge can be detected.
- abnormal discharge during plasma deposition and etching can be blocked in the state of a minority arc.
- a high level value larger than the low level value used in the first handling cutoff control is used as a threshold value to detect an increase in reflected wave power after the initial stage. This detects and shuts off the state of the multi-wave arc that has concentrated energy and has shifted to most abnormal discharges.
- the interruption control prohibiting unit 5 prohibits the power supply interruption control by the arcing detection / interruption unit 4 in the section determined as the arc interruption prohibiting section, and the interruption control prohibiting unit 5 performs control to interrupt the power supply. Even if it is a case, this interruption
- This arc cut-off prohibition section is a section defined to prevent the power supply from being misidentified as abnormal discharge when the increase in reflected wave power is caused by a factor other than abnormal discharge.
- the arc cut-off prohibition section includes the ignition mode section at the start of the high frequency power supply, the high speed start-up section after the first handling cut-off control, the ignition mode section after the second handling cut-off control, and the feedback value (traveling wave power).
- the traveling wave power transient section can be made asymptotically close to the power command value and within the predetermined fluctuation range.
- the ignition mode section and the ignition mode section are sections until it can be considered that the plasma has ignited, and are sections from the time when the traveling wave power starts to output power to the drop level of the reflected wave power.
- the high frequency power supply performs the reflected wave power drooping control as a protection operation, and therefore it is not necessary to perform the first handling cutoff control.
- the second handling cutoff control executes a cutoff operation regardless of the arc cutoff prohibited section for protection.
- the power supply is cut off based on this erroneous detection, and no abnormal discharge has occurred. Nevertheless, power cannot be supplied to the plasma. Therefore, in the present invention, the electric power supply is continued without being cut off in the arc cut-off prohibition section.
- the arc cut-off prohibition section can be determined at the droop level.
- the droop level can be determined by L ⁇ Cs100% obtained by multiplying the rated power command value Cs100% by the reflection droop coefficient L.
- the reflection droop coefficient L can be determined within a range of 0.1 to 0.3.
- the traveling wave power increases later than the power command value Cs, and gradually approaches the power command value Cs by feedback control.
- the traveling wave power is in a transient state, the detected increase in reflected wave power is detected as abnormal discharge, and the power supply is cut off based on this detection. In contrast, power cannot be supplied. Therefore, this traveling wave power transient period continues without interrupting the power supply as an arc interruption prohibition section.
- the traveling wave power transient section can be defined as a section where the power feedback value (traveling wave power) exceeds a predetermined fluctuation range with respect to the power command value.
- the traveling wave power transient section includes the traveling wave power Pf and the power command value.
- the difference between Cs (Cs – Pf) is a sufficiently large section, with power command value Cs as the upper limit, and K ⁇ Cs100% obtained by multiplying power command value Cs by rated power command value Cs100% by a predetermined coefficient K is subtracted. If the traveling wave power Pf is outside this level range, it will continue without interrupting the power supply as an arc cut-off prohibition section.
- the coefficient K can be set within a range of 0.01 to 0.2, for example.
- the arc cut-off prohibition section can be set by the power range with the power command value Cs as the upper limit and the lower limit of (Cs ⁇ 0.03 ⁇ Cs100%). Is outside this range, the shut-off control is prohibited and the power supply is continued without stopping.
- FIG. 4 and FIG. 6 show a blocking process for blocking the second handling when multiple first handling blocking occurs.
- FIG. 3 shows the case where the high-frequency power supply 10 is powered up by soft start control and the case where high-speed power rise is performed after the first handling is cut off.
- FIG. This shows the case of performing high-speed startup and soft start after the second handling is interrupted.
- a thin broken line indicates a power level that defines an arc interruption prohibition section, and includes a drooping level of reflected wave power and a level range that varies according to the power command value Cs.
- the ignition mode section and reignition mode section determined by the droop level, and the section where the reflected wave power falls below the level range are designated as arc cut-off prohibition sections, and this section indicates the range in which arc cut-off operation is prohibited. Yes.
- the soft start control gradually increases the power from zero power to the target power with a ramp-like increase characteristic over a predetermined time.
- the ignition mode section is an initial period after the application of power to the plasma load.
- the section is from the increase of traveling wave power to the state where the matching is matched and the ignition point is reached. .
- This ignition mode section can be determined by the state where the traveling wave power is below the drooping level.
- This traveling wave power transient section is a transient period in which the traveling wave power Pf increases toward the power command value Cs and gradually approaches the difference caused by the traveling wave power Pf being delayed from the power command value Cs.
- the difference (Cs ⁇ Pf) between the traveling wave power Pf and the power command value Cs is sufficiently large.
- This traveling wave power transient section has the power command value Cs as the upper limit, and is obtained by subtracting K ⁇ Cs100%, which is obtained by multiplying the power command value Cs by the rated power command value Cs100% and a predetermined coefficient K (Cs ⁇ K ⁇ Cs100%). ) As a lower limit.
- the reflected wave power Pr may increase due to a mismatch in the plasma load. Therefore, when an abnormal discharge is detected using an increase in reflected wave power Pr as an index, an increase in reflected wave power Pr in this section may be erroneously detected as an abnormal discharge. Therefore, in the present invention, even if an increase in the reflected wave power Pr is detected in the ignition mode section and the traveling wave power transient section, the power supply is continued without being cut off.
- the range of the arc cut-off prohibition section is a range in which the traveling wave power Pf largely fluctuates with respect to the power command value Cs, and suppresses power supply cut-off due to an increase in the reflected wave power Pr not caused by abnormal discharge. In this range, the power supply is continued. The increase in the reflected wave power Pr not caused by the abnormal discharge is reduced by the drooping characteristic that protects the power supply.
- the matching section in the figure is a section from when the application of power is started until the traveling wave power Pf becomes stable in tracking control to the power command value Cs, and after this section, the traveling wave power Pf is obtained by feedback control. Is controlled following the power command value Cs.
- the power command value Cs is normally commanded to a constant value so that stable power is supplied to the plasma load, and the traveling wave power Pf follows the power command value Cs by feedback control. It is stable at the rated power command value Cs100%.
- the oscillation of the oscillator 6 is stopped by an interrupt from the cutoff interrupt circuit 2.
- the power supply is stopped, and the power supply from the high frequency power supply 10 to the plasma load 12 is temporarily interrupted.
- the cutoff time for stopping the oscillation of the oscillator 6 by the cutoff interrupt circuit 2 is performed at a time interval of 1 ⁇ sec to 3 ⁇ sec, for example.
- the range of the interruption time for this temporary interruption is the shortest time range in which ions in the plasma chamber can remain and arcing elements disappear. For example, it is set to 1 ⁇ sec to 100 ⁇ sec.
- control state of the plasma is maintained even during temporary shutoff, the hold state is released when control is resumed after the temporary shutoff, and the control operation can be continued quickly without performing initial processing for control. Can do.
- this start-up control is referred to as high-speed start-up control.
- the traveling wave power Pf greatly increases from a substantially zero state, and the reflected wave power Pr also increases from a substantially zero state.
- the cut-off control unit 3 detects the increase in the reflected wave power Pr and performs control to cut off the power supply by interruption by the cut-off interrupt circuit 2. However, when the shut-off control of the shut-off control unit 3 is executed, the power supply is shut down and high-speed start-up control becomes impossible. Therefore, by setting this section as an arc cutoff prohibition section, the cutoff control of the cutoff control unit 3 is prohibited so that the power supply is not stopped.
- This arc cut-off prohibition section is set as described above, in which the traveling wave power Pf is below the drooping level of the reflected wave power, and the traveling wave power Pf is rated from the power command value Cs with the power command value Cs as the upper limit.
- the interruption control prohibiting section 5 sets the ignition mode section, the ignition mode section, and the traveling wave power transient section as an arc cutoff prohibiting section, and prohibits the cutoff control by the arcing detection / cutting section 4 in this section to supply power.
- FIG. 3 (b) and 4 (b) show the arc cut-off prohibition section
- FIG. 3 (c) and FIG. 4 (c) show detection states by the first handling cut-off control
- FIG. 3 (d) and FIG. FIG. 3 (e) and FIG. 4 (e) show the detection and blocking states by the second handling blocking control.
- the power control unit 1 starts soft start control (S1).
- the arcing detection / cutoff unit 4 compares the reflected wave power Pr with the second handling cutoff level, and generates an arc by the second handling. If it is detected (S3), a second handling blocking process is performed (S10). Also, in the ignition mode section, arcs due to second handling are not detected, but when arcs due to first handling are detected (S4), this section is an arc cut-off prohibition section, so power that will perform cut-off processing. Supply control is continued (S5).
- the arcing detection / cutoff unit 4 compares the reflected wave power Pr with the second handling cutoff level, and the second handling When an arc due to the above is detected (S6), a second handling interruption process is performed (S11). In addition, when the arc due to the second handling is not detected but the arc due to the first handling is detected (S7), when the traveling wave power transient section (S8), the traveling wave power transient section is the arc interruption prohibition section, Control of power supply is continued without performing the shut-off process (S9).
- steps S6 to S12 are performed at the time of high speed startup after the first handling interruption or the soft start after the second handling interruption in the arc interruption prohibition section in FIGS. 3 (b) and 4 (b). (S13).
- FIGS. 3 (d) and 4 (d) show cutoff control. The cutoff signal by the first handling after a prohibition process is shown.
- the interruption signals shown in FIGS. 3 (d) and 4 (d) are the arc interruption inhibition of FIGS. 3 (b) and 4 (b) among the detection signals of FIGS. 3 (c) and 4 (c). Blocking processing is prohibited for the arcing detection signal in the section, and only the blocking signal outside the section for blocking control is extracted, thereby performing the first handling blocking control.
- FIGS. 3 (e) and 4 (e) show a cutoff signal obtained by comparing the reflected wave power with the second handling cutoff level.
- the interruption signal obtained at this second handling interruption level performs unconditional interruption control regardless of the interruption control prohibition section.
- the second handling interruption shown in FIGS. 3 (e) and 4 (e) is performed in preference to the first handling interruption at the same point shown in FIGS. 3 (d) and 4 (d).
- first handling blocking with a short time width within a predetermined time (for example, 10 msec) is executed a predetermined number of times, and then temporary blocking is performed by second handling blocking with a relatively long time width (for example, 1 msec to 100 msec). To do.
- the second handling is temporarily interrupted with a time width longer than the interruption time width by the first handling interruption (for example, a time width of 1 ms to 100 ms).
- the high-frequency power supply 10 is turned on by soft start control.
- this soft start control similarly to the above-described soft start control at the time of ignition, the time from zero power to the target power is gradually increased with a ramp-like increase characteristic over a predetermined time.
- the broken line in FIG. 4 indicates the power command value Cs, the dark solid line indicates traveling wave power Pf, and the thin solid line indicates reflected wave power Pr.
- FIG. 6 is a flow chart for explaining the procedure for executing the temporary interruption by the second handling interruption.
- the counter value C is compared with a preset number of times N (S24), and when the counter value C exceeds the preset number of times N, temporary shutoff is started (S25) and the power supply is stopped (S26). When the counter value C does not reach the preset number of times N, the second handling is not interrupted and only the first handling is interrupted.
- Steps S21 to S28 are repeated until the film formation process using plasma is completed (S29).
- FIG. 4 (b) shows an arc cutoff prohibition section between a reignition mode section and a traveling wave power transient section
- FIG. 4 (c) shows an arcing detection signal detected by comparing the reflected wave power with the first handling level.
- FIG. 4D shows a first handling cutoff signal.
- the interruption signal shown in FIG. 4 (d) the arcing detection signal in the arc interruption inhibition section is prohibited from interruption, and only the interruption signal outside the interruption control inhibition section is extracted, thereby performing the first handling interruption control.
- FIG. 4E shows a cutoff signal obtained by comparing the reflected wave power and the second handling cutoff level.
- the interruption signal obtained at this second handling interruption level performs unconditional interruption control regardless of the interruption control prohibition section.
- FIG. 7 shows a configuration example of the embodiment of the present invention
- FIGS. 8 and 9 show flowcharts for explaining an operation example
- FIG. 10 shows an output state of the shut-off control unit using the comparison circuit.
- whether or not to cut off is determined based on the power level of the reflected wave power, and the ignition mode section, the ignition mode section, and the traveling wave power transient section are arc suppression sections.
- FIG. 7 is a diagram showing a configuration example of the interruption control unit 3 including the power control unit 1, the arcing detection / interruption unit 4, and the interruption control prohibition unit 5 according to the present invention.
- the arcing detection / blocking unit 4 will be described.
- the arcing detection / blocking unit 4 includes two blocking control systems, a first handling blocking control system 4A and a second handling blocking control system 4B.
- the cutoff operation due to abnormal discharge and the cutoff operation due to factors other than abnormal discharge are distinguished and detected, and the cutoff operation is performed.
- a control signal for performing the operation is output.
- the control signal temporarily stops the transmission operation of the oscillator 6 via the interruption interrupt circuit 2.
- the first handling cutoff control system 4A detects abnormal discharge by comparing the reflected wave power with a low level (first handling level) threshold, and cuts off the power supply based on the detection of the abnormal discharge.
- the second handling cutoff control system 4B detects an increase in reflected wave power by comparing the reflected wave power with a high level threshold (second handling level), and increases the reflected wave power due to factors other than abnormal discharge. Based on this detection, the power supply is cut off.
- the first handling cutoff control system 4A and the second handling cutoff control system 4B are selected by differentiating the threshold value to be compared with the reflected wave power Pr.
- the first handling cutoff control system 4A detects the initial stage of increase in reflected wave power by using a low level first handling level value as a threshold value. Thereby, the state of the minority arc can be detected and interrupted.
- the second handling cutoff control system 4B detects an increase in reflected wave power at the stage past the initial stage by using a high level value larger than the low level value used in the first handling cutoff control as a threshold value. To do. As a result, energy is concentrated and the state of the multi-wave arc that has shifted to most abnormal discharge is detected and cut off.
- the first handling cutoff control system 4A detects abnormal discharge by comparing the reflected wave power Pr with the first handling cutoff level PA and outputs a control signal.
- the interruption interrupt circuit 2 temporarily interrupts the supply of output power from the high frequency power supply 10 to the plasma load 12 by temporarily stopping the oscillation of the oscillator 6 in response to this control signal.
- the first handling cutoff control system 4A compares the detection signal of the reflected wave power Pr detected by the sensor 9 with the first handling cutoff level generated by the power setting unit 4Aa in the first comparison circuit 4Ab, and detects the reflected wave power Pr.
- a control signal is output when the signal exceeds the first handling cutoff level.
- the interruption interrupt circuit 2 temporarily stops the oscillation of the oscillator 6 and performs an interruption operation.
- the second handling cutoff control system 4B detects the increase in the reflected wave power Pr due to a factor other than abnormal discharge by comparing the reflected wave power Pr with the second handling cutoff level, and forms a control signal. Send to.
- the interruption interrupt circuit 2 receives this control signal, temporarily interrupts the oscillation of the oscillator 6 and performs an interruption operation, thereby temporarily interrupting the supply of output power from the high frequency power supply 10 to the plasma load 12.
- the second handling cutoff control system 4B compares the detection signal of the reflected wave power Pr detected by the sensor 9 with the second handling cutoff level generated by the power setting unit 4Ba in the second comparison circuit 4Bb, and detects the detection signal of the reflected wave power Pr. Outputs a control signal when exceeds the second handling cutoff level.
- the interruption interrupt circuit 2 receives this control signal and performs an interruption operation.
- the first handling cutoff level is a low level threshold
- the second handling cutoff level is a high level threshold. Therefore, when the reflected wave power Pr increases, the reflected wave power Pr first exceeds the first handling cutoff level and exceeds the next second handling cutoff level.
- the interruption interrupt circuit 2 temporarily stops the oscillation operation of the oscillator 6 and cuts off the supply of output power based on the control signal of the arcing detection / interruption unit 4 without depending on the operation of the interruption control prohibition unit 5. .
- FIG. 10 is a diagram illustrating an output state of the shut-off control unit 3 using the comparison circuit.
- the control signal SA (FIG. 10 (b)) is output, and the control is performed at the time TB when the reflected signal power Pr exceeds the second handling cutoff level PB.
- a signal SB (FIG. 10B) is output.
- the shut-off control prohibiting unit 5 determines whether the ignition state, reignition state, or traveling wave power fluctuates beyond a predetermined range (Cs to (Cs ⁇ K ⁇ Cs100%)) with respect to the power command value Cs. When the condition is satisfied, the control signal from the arcing detection / shut-off unit 4 is prohibited. When the predetermined condition is not satisfied, the control signal from the arcing detection / shut-off unit 4 is sent to the cutoff interrupt circuit 2. This control signal operates as an arc interruption signal for interrupting the arc by stopping power supply, and is sent from the interruption interrupt circuit 2 to the oscillator 6 to temporarily stop the oscillator 6.
- the cutoff control prohibiting section 5 includes a first switch circuit 5a and a third comparison circuit 5b as a configuration for prohibiting the control signal in the ignition state, and the traveling wave power Pf is predetermined with respect to the power set value.
- the second switch circuit 5c and the determination circuit 5d are provided as a configuration for prohibiting the control signal when it fluctuates beyond this range.
- the configuration of the first switch circuit 5a and the third comparison circuit 5b controls whether or not the control signal generated by the arcing detection / cut-off unit 4 is sent to the cut-off interrupt circuit 2, and the high-frequency power supply 10 is in the ignition state. In this case, transmission of the control signal to the interruption interrupt circuit 2 is stopped and the control signal is prohibited. When the high frequency power supply 10 is not in the ignition state, transmission of the control signal to the interruption interrupt circuit 2 is permitted and controlled. Enable the signal.
- the third comparison circuit 5b determines the ignition mode section by comparing the traveling wave power Pf with the drooping level of the reflected wave power.
- the third comparison circuit 5b turns on the first switch circuit 5a when the traveling wave power Pf exceeds the drooping level.
- the droop level can be set by L ⁇ Cs100% obtained by multiplying the rated power command value Cs100% by the reflection droop coefficient L.
- the reflection droop coefficient L can be determined in the range of 0.1 to 0.3.
- the ignition state may be monitored by counting the elapsed time of the ignition by a counter circuit.
- the counter circuit starts to measure the ignition time in response to a signal informing that the power supply has started from the soft start control unit 1b, and after the preset ignition time has elapsed, the first switch circuit 5a is turned on. To do.
- the first switch circuit 5a inputs an abnormal discharge detection signal detected by the first handling cutoff control system 4A of the arcing detection / shut-off unit 4.
- the first switch circuit 5a stops the transmission of the input detection signal to the second switch circuit 5c during the ignition time interval and prohibits the control signal, and outside the ignition time interval, the first switch circuit 5a
- the control signal is made valid by permitting transmission to the two-switch circuit 5c.
- the second switch circuit 5c and the determination circuit 5d are configured to detect arcing when the traveling wave power fluctuates beyond a predetermined range (Cs to (Cs-K ⁇ Cs100%)) with respect to the power command value Cs. Controls whether or not the control signal generated by the cutoff unit 4 is sent to the cutoff interrupt circuit 2, and stops transmission of the control signal to the cutoff interrupt circuit 2 when the traveling wave power fluctuates beyond a predetermined range. When the control signal is prohibited and the fluctuation of the traveling wave power is within the predetermined range, the control signal is permitted to be transmitted to the interruption interrupt circuit 2 and the control signal is validated. More specifically, the second switch circuit 5c controls transmission of the output signal of the first switch circuit 5a to the interruption interrupt circuit 2.
- the determination circuit 5d receives the detection signal of the traveling wave power Pf from the sensor 9, and compares the detection signal of the traveling wave power Pf with a threshold value to determine whether the traveling wave power Pf has fluctuated beyond a predetermined range. Alternatively, it is determined whether or not the fluctuation of the traveling wave power Pf is within a predetermined range.
- the fluctuation range for determining the fluctuation state of the traveling wave power Pf has the power command value Cs as the upper limit, and the power command value Cs is reduced by K ⁇ Cs100% obtained by multiplying the rated power command value Cs100% by a predetermined coefficient K.
- the level range with the value (Cs-K x Cs100%) as the lower limit is set.
- the predetermined coefficient K can be determined in the range of 0.01 to 0.2.
- the determination circuit 5d sends an arc cut-off prohibiting signal to the second switch circuit 5c, and the cut-off interrupt circuit 2 prohibits the cut-off operation by stopping the power supply. To do.
- the second switch circuit 5c controls transmission of the control signal input from the first switch circuit 4a to the interruption interrupt circuit 2 based on the determination signal from the determination circuit 5d.
- the above-described configuration of the shut-off control prohibiting unit 5 is an example, and is not limited to this configuration.
- the signal states in this embodiment can be represented in FIGS.
- the soft start control unit 1b starts soft start control (S31). After starting the soft start, the traveling wave power Pf is compared with the drooping level (eg, L x Cs 100%) to monitor whether it is in the ignition mode section (S32), and the second handling is cut off in the ignition mode section. Only the processing is performed, and the first handling cutoff processing is prohibited (S33).
- the drooping level eg, L x Cs 100%
- the second comparison circuit 4Bb when the reflected wave power Pr exceeds the second handling cutoff level (S34), the second handling arc is detected and the second handling cutoff processing is performed (S50). In the second handling cutoff processing, the oscillation of the oscillator 6 is stopped and the power output is stopped (S51). After a predetermined time elapses (S52), the oscillation of the oscillator 6 is resumed and the power output is restored (S53). ).
- the traveling wave power Pf After leaving the ignition mode section (S35), the traveling wave power Pf is compared with (Cs ⁇ K ⁇ Cs100%) to determine the fluctuation state of the traveling wave power Pf.
- the traveling wave power Pf is outside the range of Cs and (Cs ⁇ K ⁇ Cs100%) (S36), an arc interruption prohibition section is set and interruption processing is prohibited (S37).
- the power supply output is stopped after a predetermined period (1 ⁇ sec to 100 ⁇ sec) has elapsed (S46), and then the power supply output is restored at a high speed (S47).
- the processing from S34 to S42 is continued until the end (S48).
- 11 is a configuration example that realizes an ion refresh function that eliminates abnormal arc ions accumulated in plasma.
- the shut-off control (first handling shut-off) of the shut-off control prohibition unit described above enables ions to remain in the plasma reaction chamber, and shuts off the high-frequency power source within the time width during which the arcing element disappears.
- the interruption control of the configuration shown in FIG. 11 extinguishes abnormal arc ions by extending the interruption time.
- the interrupting control is terminated in a state where the time width is 1 ms to 100 ms and abnormal arc ions disappear. This eliminates the accumulation of ions that generate an abnormal arc and cuts off arcing.
- the interruption control prohibiting unit 5 determines the accumulation state of ions that generate the abnormal arc based on the cumulative number of executions of the first interruption control, and the cumulative number of executions of the first interruption control has reached a preset number of times. Cut-off control is executed by determining that the point in time is a stage in which ions that generate an abnormal arc are accumulated in the plasma. The first cutoff control is cutoff control by the first switch circuit 5a, the third comparison circuit 5b, and the second switch circuit 5c.
- the cutoff control prohibiting unit 5 includes a counter circuit 5e that counts the number of times of execution of the first cutoff control.
- the counter circuit 5e counts the control signal of the second switch circuit 5c, and executes the cutoff control on the cutoff interrupt circuit 2 when the count value obtained by this count reaches a preset number of times. Send a control signal.
- the counter circuit 5e sends a control signal for shut-off control, clears the count value, re-counts the number of executions of the first shut-off control, and performs the second shut-off control again when the count value reaches the set number. Execute. By repeating this predetermined number of times of the first interruption control and then the second interruption control, it is possible to effectively suppress arc growth and eliminate abnormal arc ions.
- the soft start control unit 1b performs the restart by the soft start after shutting off the output of the high frequency power supply by the second shutoff control, and feedback controls the traveling wave power value with respect to the power command value or the voltage command value. Control is performed so that the output of the high frequency power supply becomes the voltage command value.
- the soft start performed after the second shut-off control is to perform ramp-like power output from zero to the power command value at a matching speed that the matching circuit of the matching box can sufficiently cope with.
- the output is performed in a time width in which impedance matching is performed without detecting electric power as abnormal discharge. Therefore, the time width required for this soft start can be determined depending on the magnitude of the power command value, the matching characteristics of the matching circuit of the matching box, and the like.
- the time width of this soft start can be set to 1 ms to 10 s, for example.
- FIG. 12 shows an arc interruption prohibition section at the time of soft start at the time of starting
- FIG. 13 shows an arc interruption prohibition section at the time of high speed rising after the first handling interruption
- FIG. 14 shows an arc interruption at the soft start after the second handling interruption. The prohibited section is shown.
- the arc cut-off prohibition section includes an ignition mode section and a traveling wave power transient section.
- the ignition mode section is a range in which the traveling wave power Pf is not more than the drooping level of the reflected wave power.
- the droop level can be set as L ⁇ Cs100% obtained by multiplying the rated power command value Cs100% by the reflection droop coefficient L.
- the traveling wave power transient section is a section from which the traveling wave power Pf reaches the predetermined level range defined for the power command value Cs from the drooping level.
- the predetermined level range has the power command value Cs as the upper limit, and the value obtained by subtracting K ⁇ Cs100% obtained by multiplying the power command value Cs by the specified coefficient K by the rated power command value Cs100% (Cs ⁇ K ⁇ Cs100%) is the lower limit.
- the level range can be determined. Further, in FIG. 12, the period until the reflected wave power Pr decreases is set as the matching section.
- the arc interrupting prohibition section includes a section due to the droop level and a traveling wave power transient section.
- the arc cut-off prohibited section is set by the ignition mode section. Since the second handling interruption is an interruption process for eliminating the abnormal arc ions, the traveling wave power gradually approaches the power command value without passing through the traveling wave power transient section after the reignition mode section.
- ions in the plasma chamber can remain, and the first handling cutoff that cuts off the power supply in the shortest time range (1 ⁇ sec to 100 ⁇ sec) required to extinguish the arcing element, and abnormal arc ions Temporary shutoff can be performed to shut off the power supply in the time range (1 msec to 100 msec) required for disappearance.
- the first handling is interrupted, ions remain, so that the rise time after the interruption can be shortened and normal discharge can be generated.
- ions remain, so that the rise time after the interruption can be shortened and normal discharge can be generated.
- by performing a temporary interruption with a relatively long interruption time it is possible to eliminate abnormal arc ions, cut arcing, and supply power to a stable plasma.
- the embodiment of the present invention it is possible to prevent erroneous interruption of power supply due to an increase in the reflected wave power Pr not accompanied by abnormal discharge by setting a section in which the blocking operation is prohibited in the matching section.
- a blocking operation for suppressing abnormal discharge and a blocking operation (second handling blocking operation) for suppressing an increase in reflected wave power not caused by abnormal discharge are blocked. It can be done according to the purpose.
- the abnormal discharge suppressing device for a vacuum apparatus of the present invention is not limited to a film forming apparatus, but can be applied to a processing apparatus field using plasma such as a sputtering apparatus or an ashing apparatus.
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Abstract
Description
1a…電力設定部
1b…ソフトスタート制御部
1c,1d…伝達関数
1e…電力設定部
1f,1g…電力設定部
2…遮断割り込み回路
3…遮断制御部
4…アーキング検出・遮断部
4A…ファーストハンドリング遮断系
4Aa…電力設定部
4Ab…第1比較回路
4Ac…第1制御信号生成回路
4B…セカンドハンドリング遮断系
4Ba…電力設定部
4Bb…第2比較回路
4Bc…第2制御信号生成回路
5…遮断制御禁止部
5a…第1スイッチ回路
5b…第3比較回路
5c…第2スイッチ回路
5d…判定回路
5e…カウンタ回路
6…発振器
7…演算増幅器
8…電力増幅器
9…センサ
10…高周波電源
11…整合回路
12…プラズマ負荷
Claims (16)
- 高周波電源からプラズマ反応室内に電力を供給してプラズマを生成する真空装置の異常放電を抑制する装置であって、
電力指令値と電力フィードバック値との偏差に基づいて前記高周波電源を制御する電力制御部と、
プラズマ反応室内の異常放電時、および異常放電への移行過程時の少なくとも何れかの時期で発生する反射波電力または反射波電圧を検出して前記高周波電源からプラズマ反応室への電力供給を遮断する遮断制御部とを備え、
前記遮断制御部は、遮断時間の時間幅を異にする第1のファーストハンドリング遮断制御と第2のセカンドハンドリング遮断制御を含み、
前記第1のファーストハンドリング遮断制御は、プラズマ反応室内のイオンの残存を可能とし、少数派アークのアーキング要素が消滅する時間幅内で高周波電源を遮断制御し、
前記第2のセカンドハンドリング遮断制御は、異常放電時の多数波アークのイオンが消滅する時間幅内で高周波電源を遮断制御することを特徴とする、真空装置用異常放電抑制装置。 - 前記第1の遮断制御による遮断時間の時間幅は1μsから100μsであり、前記第2の遮断制御による遮断時間の時間幅は1msから100msであることを特徴とする、請求項1に記載の真空装置用異常放電抑制装置。
- 前記電力制御部は、
前記第1の遮断制御によって高周波電源の出力を遮断した後にソフトスタートにより再起動を行い、
当該ソフトスタートは、零から電力指令値までのランプ出力を、前記第1の遮断制御の遮断時間と同じ時間オーダーの時間幅で出力することを特徴とする、請求項1に記載の真空装置用異常放電抑制装置。 - 前記ソフトスタートの時間幅は1μsから100μsであることを特徴とする、請求項3に記載の真空装置用異常放電抑制装置。
- 前記電力制御部は、
前記第2の遮断制御によって高周波電源の出力を遮断した後にソフトスタートにより再起動を行い、
当該ソフトスタートは、零から電力指令値までのランプ出力を、高周波電源とプラズマ反応室との間の整合回路の整合速度に応じた時間幅で出力することを特徴とする、請求項1に記載の真空装置用異常放電抑制装置。 - 前記ソフトスタートの時間幅は1msから10sであることを特徴とする、請求項5に記載の真空装置用異常放電抑制装置。
- 前記遮断制御部は、第1の遮断制御の実行回数を計数し、当該計数値が予め設定された設定回数に達した時点で前記第2の遮断制御を実行することを特徴とする、請求項1から6の何れか一つに記載の真空装置用異常放電抑制装置。
- 前記第2の遮断制御を実行すると共に前記計数値をクリアし、前記第1の遮断制御の実行回数を再計数することを特徴とする、請求項7に記載の真空装置用異常放電抑制装置。
- プラズマ反応室内に電力を供給して成膜処理を行うプラズマを生成する真空装置の異常放電を抑制する装置であって、
前記電力を供給する高周波電源を有し、
前記高周波電源は、電力指令値と電力フィードバック値との偏差に基づいて前記出力電力を制御する電力制御部と、
プラズマ反応室内の異常放電時、および異常放電への移行過程時の少なくとも何れかの時期で発生する反射波電力または反射波電圧を検出し前記高周波電源からプラズマ反応室への電力供給を遮断する遮断制御部とを備え、
前記遮断制御部は、前記異常放電を検出するアーキング検出・遮断部と、
前記アーキング検出・遮断部による電力供給の遮断制御を禁止する遮断制御禁止部とを備え、
前記遮断制御禁止部は、
アーク遮断禁止区間において、前記アーキング検出・遮断部に基づく電力供給の遮断制御を禁止し、電力供給を継続することを特徴とする、真空装置用異常放電抑制装置。 - 前記遮断制御部による電力供給の遮断制御を禁止する遮断制御禁止部を備え、
前記遮断制御禁止部は、
アーク遮断禁止区間において、前記遮断制御部による電力供給の遮断制御を禁止し、電力供給を継続することを特徴とする、請求項1から8のいずれか一つに記載の真空装置用異常放電抑制装置。 - 前記電力制御部は、前記電力フィードバック値として進行波電力値を用い、電力指令値と進行波電力値との偏差が減少するように出力電力を制御し、
前記遮断制御部は、
反射波電力と低レベルのしきい値との比較によって異常放電を検出し、当該異常放電の検出に基づいて電力供給を遮断し、少数派アークを抑制するファーストハンドリング遮断制御と、
反射波電力と高レベルのしきい値との比較によって異常放電を検出し、当該異常放電の検出に基づいて電力供給を遮断し、多数波アークを抑制するセカンドハンドリング遮断制御との遮断制御を有し、
前記遮断制御禁止部は、
アーク遮断禁止区間において前記ファーストハンドリング遮断制御の遮断制御を禁止することを特徴とする、請求項9又は10に記載の真空装置用異常放電抑制装置。 - 前記アーク遮断禁止区間は、プラズマが着火するまでのイグニッション・モード区間、および進行波電力の電力指令値に向けて増加する進行波電力過渡区間を含むことを特徴とする、請求項9から11のいずれか一つに記載の真空装置用異常放電抑制装置。
- 前記イグニッション・モード区間は、進行波電力が電力出力を開始する時点から反射波電力の垂下レベルを超えるまでの区間であることを特徴とする、請求項12に記載の真空装置用異常放電抑制装置。
- 前記垂下レベルは、定格電力指令値Cs100%に反射垂下係数Lを乗じたL×Cs100%であることを特徴とする、請求項13に記載の真空装置用異常放電抑制装置。
- 前記進行波電力過渡区間は、進行波電力が電力指令値に基づいて定まる所定レベル範囲外である区間であることを特徴とする、請求項12に記載の真空装置用異常放電抑制装置。
- 前記所定レベル範囲は、定格電力指令値Cs100%を上限とし、電力指令値Csから定格電力指令値Cs100%に所定係数Kを乗じたK×Cs100%を減じた値(Cs-K×Cs100%)を下限とするレベル範囲であることを特徴とする、請求項15に記載の真空装置用異常放電抑制装置。
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2410075A3 (en) * | 2010-06-30 | 2012-04-18 | PrimeStar Solar, Inc | Methods and apparatus of arc prevention during RF sputtering of a thin film on a substrate |
CN102687597A (zh) * | 2009-12-10 | 2012-09-19 | 株式会社新川 | 等离子体点火装置,等离子体点火方法及等离子体发生装置 |
WO2013190987A1 (ja) * | 2012-06-18 | 2013-12-27 | 株式会社京三製作所 | 高周波電力供給装置、及び反射波電力制御方法 |
JP2014165437A (ja) * | 2013-02-27 | 2014-09-08 | Tokyo Electron Ltd | プラズマ処理装置 |
JP2018073558A (ja) * | 2016-10-26 | 2018-05-10 | イマジニアリング株式会社 | 昇降圧回路を含む電磁波発振装置 |
JP2018532878A (ja) * | 2015-08-24 | 2018-11-08 | エレメント シックス テクノロジーズ リミテッド | マイクロ波発生器および合成ダイヤモンド材料の製造 |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102010031568B4 (de) | 2010-07-20 | 2014-12-11 | TRUMPF Hüttinger GmbH + Co. KG | Arclöschanordnung und Verfahren zum Löschen von Arcs |
US8552665B2 (en) | 2010-08-20 | 2013-10-08 | Advanced Energy Industries, Inc. | Proactive arc management of a plasma load |
JP6029302B2 (ja) * | 2012-03-29 | 2016-11-24 | 株式会社ダイヘン | マイクロ波電力供給装置 |
DE202013012714U1 (de) * | 2012-12-18 | 2018-10-15 | TRUMPF Hüttinger GmbH + Co. KG | Leistungsversorgungssystem mit einem Leistungswandler |
JP6144917B2 (ja) * | 2013-01-17 | 2017-06-07 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理装置の運転方法 |
JP5850581B2 (ja) * | 2013-11-29 | 2016-02-03 | 株式会社京三製作所 | プラズマ未着火状態判別装置およびプラズマ未着火判別方法 |
EP3054472A1 (en) | 2015-02-03 | 2016-08-10 | TRUMPF Huettinger Sp. Z o. o. | Arc treatment device and method therefor |
DE102018204585A1 (de) * | 2017-03-31 | 2018-10-04 | centrotherm international AG | Plasmagenerator, Plasma-Behandlungsvorrichtung und Verfahren zum gepulsten Bereitstellen von elektrischer Leistung |
EP3718129B8 (en) | 2017-11-29 | 2023-07-19 | Comet Technologies USA, Inc | Retuning for impedance matching network control |
JP7202972B2 (ja) * | 2018-06-29 | 2023-01-12 | 東京エレクトロン株式会社 | プラズマ処理装置、プラズマ状態検出方法およびプラズマ状態検出プログラム |
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US11114279B2 (en) | 2019-06-28 | 2021-09-07 | COMET Technologies USA, Inc. | Arc suppression device for plasma processing equipment |
US11527385B2 (en) | 2021-04-29 | 2022-12-13 | COMET Technologies USA, Inc. | Systems and methods for calibrating capacitors of matching networks |
US11596309B2 (en) | 2019-07-09 | 2023-03-07 | COMET Technologies USA, Inc. | Hybrid matching network topology |
US11107661B2 (en) | 2019-07-09 | 2021-08-31 | COMET Technologies USA, Inc. | Hybrid matching network topology |
KR102277822B1 (ko) * | 2019-07-09 | 2021-07-14 | 세메스 주식회사 | 기판 처리 장치 |
KR20210006682A (ko) | 2019-07-09 | 2021-01-19 | 세메스 주식회사 | 기판 처리 장치 |
US12002611B2 (en) | 2019-08-28 | 2024-06-04 | COMET Technologies USA, Inc. | High power low frequency coils |
KR102223876B1 (ko) | 2019-10-28 | 2021-03-05 | 주식회사 뉴파워 프라즈마 | 불안정 매칭 현상을 해소하기 위한 다중 전압 제어 방법 및 다중 전압 제어 방식의 고주파 전원 장치 |
KR102223874B1 (ko) | 2019-10-28 | 2021-03-05 | 주식회사 뉴파워 프라즈마 | 이그니션 동작과 관련된 고주파 전원 장치의 보호 리미트 변경 제어 방법 |
JP7293535B2 (ja) * | 2019-12-25 | 2023-06-20 | 株式会社ダイヘン | アーク検出装置、および、高周波電源装置 |
JP7293536B2 (ja) * | 2019-12-25 | 2023-06-20 | 株式会社ダイヘン | アーク検出装置、および、高周波電源装置 |
US11887820B2 (en) | 2020-01-10 | 2024-01-30 | COMET Technologies USA, Inc. | Sector shunts for plasma-based wafer processing systems |
US12027351B2 (en) | 2020-01-10 | 2024-07-02 | COMET Technologies USA, Inc. | Plasma non-uniformity detection |
US11521832B2 (en) | 2020-01-10 | 2022-12-06 | COMET Technologies USA, Inc. | Uniformity control for radio frequency plasma processing systems |
US11670488B2 (en) | 2020-01-10 | 2023-06-06 | COMET Technologies USA, Inc. | Fast arc detecting match network |
US11830708B2 (en) | 2020-01-10 | 2023-11-28 | COMET Technologies USA, Inc. | Inductive broad-band sensors for electromagnetic waves |
US11961711B2 (en) | 2020-01-20 | 2024-04-16 | COMET Technologies USA, Inc. | Radio frequency match network and generator |
US11605527B2 (en) | 2020-01-20 | 2023-03-14 | COMET Technologies USA, Inc. | Pulsing control match network |
US11373844B2 (en) | 2020-09-28 | 2022-06-28 | COMET Technologies USA, Inc. | Systems and methods for repetitive tuning of matching networks |
KR102511063B1 (ko) | 2021-04-23 | 2023-03-16 | 주식회사 뉴파워 프라즈마 | 출력 안정화 장치를 구비한 플라즈마 발생용 고주파 전력 공급 장치 |
US11923175B2 (en) | 2021-07-28 | 2024-03-05 | COMET Technologies USA, Inc. | Systems and methods for variable gain tuning of matching networks |
US12040139B2 (en) | 2022-05-09 | 2024-07-16 | COMET Technologies USA, Inc. | Variable capacitor with linear impedance and high voltage breakdown |
US11657980B1 (en) | 2022-05-09 | 2023-05-23 | COMET Technologies USA, Inc. | Dielectric fluid variable capacitor |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55145171A (en) * | 1979-04-28 | 1980-11-12 | Tokuda Seisakusho Ltd | Arc-breaking method of glow discharge device using high frequency electric supply source and its apparatus |
JPH08167500A (ja) * | 1994-12-15 | 1996-06-25 | Jeol Ltd | 高周波プラズマ発生装置用電源 |
JPH11323529A (ja) * | 1998-05-13 | 1999-11-26 | Pascal Kk | グロー放電処理用アーク放電発生前兆検出方法、グロー放電処理用アーク放電前知予測抑制方法及びグロー放電処理装置 |
JP2004006147A (ja) * | 2002-05-31 | 2004-01-08 | Shibaura Mechatronics Corp | アーク遮断回路、スパッタ用電源及びスパッタ装置 |
WO2005057993A1 (ja) * | 2003-11-27 | 2005-06-23 | Daihen Corporation | 高周波電力供給システム |
JP2007503096A (ja) * | 2003-08-18 | 2007-02-15 | エム ケー エス インストルメンツ インコーポレーテッド | スパッタ処理システムにおけるプラズマ遷移の制御 |
JP2007149596A (ja) * | 2005-11-30 | 2007-06-14 | Daihen Corp | プラズマ処理システムのアーク検出装置 |
JP2008047292A (ja) * | 2006-08-10 | 2008-02-28 | Nippon Reliance Kk | アーク放電抑止装置および方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01198478A (ja) * | 1988-02-01 | 1989-08-10 | Canon Inc | マイクロ波プラズマcvd装置 |
JPH0732077B2 (ja) | 1992-10-07 | 1995-04-10 | 株式会社京三製作所 | 高周波発生装置 |
DE4441206C2 (de) * | 1994-11-19 | 1996-09-26 | Leybold Ag | Einrichtung für die Unterdrückung von Überschlägen in Kathoden-Zerstäubungseinrichtungen |
JP2733454B2 (ja) | 1995-02-16 | 1998-03-30 | 株式会社京三製作所 | 成膜装置用異常放電抑制装置 |
US6184687B1 (en) * | 1997-10-20 | 2001-02-06 | Kabushiki Kaisha Toshiba | Plasma process end point determination method and apparatus, and plasma evaluation method and apparatus |
JP2000133412A (ja) * | 1998-10-30 | 2000-05-12 | Shibaura Mechatronics Corp | グロー放電装置の放電制御方法および放電制御装置 |
JP2000299198A (ja) | 1999-02-10 | 2000-10-24 | Tokyo Electron Ltd | プラズマ処理装置 |
JP2001102196A (ja) | 1999-09-29 | 2001-04-13 | Hitachi Kokusai Electric Inc | プラズマ処理装置 |
US6841124B2 (en) * | 2000-10-02 | 2005-01-11 | Ethicon, Inc. | Sterilization system with a plasma generator controlled by a digital signal processor |
JP2003064477A (ja) * | 2001-08-20 | 2003-03-05 | Sony Corp | 電源制御装置および電源制御方法 |
KR100626192B1 (ko) * | 2001-09-27 | 2006-09-21 | 동경 엘렉트론 주식회사 | 전자계 공급 장치 및 플라즈마 처리 장치 |
JP4500048B2 (ja) * | 2001-10-22 | 2010-07-14 | 芝浦メカトロニクス株式会社 | グロー放電装置のアーク判定方法及び高周波アーク放電抑制装置 |
US20060252283A1 (en) * | 2003-08-07 | 2006-11-09 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus and sustrate processing method |
US7292045B2 (en) * | 2004-09-04 | 2007-11-06 | Applied Materials, Inc. | Detection and suppression of electrical arcing |
US7305311B2 (en) * | 2005-04-22 | 2007-12-04 | Advanced Energy Industries, Inc. | Arc detection and handling in radio frequency power applications |
KR101416250B1 (ko) * | 2007-10-09 | 2014-07-07 | 삼성전자 주식회사 | 영상처리장치 및 그 제어방법 |
-
2008
- 2008-07-14 CN CN2008801017924A patent/CN101772992B/zh active Active
- 2008-07-14 KR KR1020107000990A patent/KR101124789B1/ko active IP Right Grant
- 2008-07-14 SG SG2012053583A patent/SG183056A1/en unknown
- 2008-07-14 PL PL08778137T patent/PL2259662T3/pl unknown
- 2008-07-14 WO PCT/JP2008/062666 patent/WO2009118920A1/ja active Application Filing
- 2008-07-14 EP EP08778137.3A patent/EP2259662B1/en active Active
- 2008-07-14 JP JP2010505252A patent/JP5454944B2/ja active Active
- 2008-07-14 US US12/670,265 patent/US8169162B2/en active Active
- 2008-08-26 TW TW097132549A patent/TWI446838B/zh active
-
2013
- 2013-10-15 JP JP2013214477A patent/JP5669332B2/ja active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55145171A (en) * | 1979-04-28 | 1980-11-12 | Tokuda Seisakusho Ltd | Arc-breaking method of glow discharge device using high frequency electric supply source and its apparatus |
JPH08167500A (ja) * | 1994-12-15 | 1996-06-25 | Jeol Ltd | 高周波プラズマ発生装置用電源 |
JPH11323529A (ja) * | 1998-05-13 | 1999-11-26 | Pascal Kk | グロー放電処理用アーク放電発生前兆検出方法、グロー放電処理用アーク放電前知予測抑制方法及びグロー放電処理装置 |
JP2004006147A (ja) * | 2002-05-31 | 2004-01-08 | Shibaura Mechatronics Corp | アーク遮断回路、スパッタ用電源及びスパッタ装置 |
JP2007503096A (ja) * | 2003-08-18 | 2007-02-15 | エム ケー エス インストルメンツ インコーポレーテッド | スパッタ処理システムにおけるプラズマ遷移の制御 |
WO2005057993A1 (ja) * | 2003-11-27 | 2005-06-23 | Daihen Corporation | 高周波電力供給システム |
JP2007149596A (ja) * | 2005-11-30 | 2007-06-14 | Daihen Corp | プラズマ処理システムのアーク検出装置 |
JP2008047292A (ja) * | 2006-08-10 | 2008-02-28 | Nippon Reliance Kk | アーク放電抑止装置および方法 |
Non-Patent Citations (1)
Title |
---|
See also references of EP2259662A4 * |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102687597A (zh) * | 2009-12-10 | 2012-09-19 | 株式会社新川 | 等离子体点火装置,等离子体点火方法及等离子体发生装置 |
CN104735894A (zh) * | 2009-12-10 | 2015-06-24 | 株式会社新川 | 等离子体点火装置,等离子体点火方法及等离子体发生装置 |
EP2410075A3 (en) * | 2010-06-30 | 2012-04-18 | PrimeStar Solar, Inc | Methods and apparatus of arc prevention during RF sputtering of a thin film on a substrate |
WO2013190987A1 (ja) * | 2012-06-18 | 2013-12-27 | 株式会社京三製作所 | 高周波電力供給装置、及び反射波電力制御方法 |
JP2014002898A (ja) * | 2012-06-18 | 2014-01-09 | Kyosan Electric Mfg Co Ltd | 高周波電力供給装置、及び反射波電力制御方法 |
KR101523484B1 (ko) * | 2012-06-18 | 2015-05-27 | 가부시끼가이샤교산세이사꾸쇼 | 고주파 전력 공급 장치, 및 반사파 전력 제어방법 |
US9070537B2 (en) | 2012-06-18 | 2015-06-30 | Kyosan Electric Mfg. Co., Ltd. | High-frequency power supply device and reflected wave power control method |
JP2014165437A (ja) * | 2013-02-27 | 2014-09-08 | Tokyo Electron Ltd | プラズマ処理装置 |
JP2018532878A (ja) * | 2015-08-24 | 2018-11-08 | エレメント シックス テクノロジーズ リミテッド | マイクロ波発生器および合成ダイヤモンド材料の製造 |
JP2018073558A (ja) * | 2016-10-26 | 2018-05-10 | イマジニアリング株式会社 | 昇降圧回路を含む電磁波発振装置 |
Also Published As
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SG183056A1 (en) | 2012-08-30 |
CN101772992A (zh) | 2010-07-07 |
JP2014056825A (ja) | 2014-03-27 |
PL2259662T3 (pl) | 2019-10-31 |
EP2259662A1 (en) | 2010-12-08 |
KR20100019573A (ko) | 2010-02-18 |
EP2259662A4 (en) | 2015-08-05 |
CN101772992B (zh) | 2012-08-29 |
TWI446838B (zh) | 2014-07-21 |
JPWO2009118920A1 (ja) | 2011-07-21 |
US20100187998A1 (en) | 2010-07-29 |
JP5669332B2 (ja) | 2015-02-12 |
US8169162B2 (en) | 2012-05-01 |
EP2259662B1 (en) | 2019-06-26 |
KR101124789B1 (ko) | 2012-03-23 |
JP5454944B2 (ja) | 2014-03-26 |
TW200942089A (en) | 2009-10-01 |
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