WO2009110543A1 - 圧電/電歪膜型素子の製造方法 - Google Patents
圧電/電歪膜型素子の製造方法 Download PDFInfo
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- WO2009110543A1 WO2009110543A1 PCT/JP2009/054155 JP2009054155W WO2009110543A1 WO 2009110543 A1 WO2009110543 A1 WO 2009110543A1 JP 2009054155 W JP2009054155 W JP 2009054155W WO 2009110543 A1 WO2009110543 A1 WO 2009110543A1
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- Prior art keywords
- film
- piezoelectric
- electrostrictive
- cavity
- region
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 88
- 239000000758 substrate Substances 0.000 claims abstract description 118
- 239000000463 material Substances 0.000 claims abstract description 33
- 238000001962 electrophoresis Methods 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 137
- 239000005871 repellent Substances 0.000 claims description 52
- 239000003795 chemical substances by application Substances 0.000 claims description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 38
- 230000002940 repellent Effects 0.000 claims description 32
- 230000000873 masking effect Effects 0.000 claims description 20
- 239000000049 pigment Substances 0.000 claims description 15
- 238000011161 development Methods 0.000 claims description 14
- 230000001678 irradiating effect Effects 0.000 claims description 13
- 230000008569 process Effects 0.000 claims description 12
- 239000012528 membrane Substances 0.000 claims description 11
- 238000011049 filling Methods 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 238000009877 rendering Methods 0.000 claims description 3
- 238000000206 photolithography Methods 0.000 abstract description 8
- 238000010030 laminating Methods 0.000 abstract 2
- 239000002981 blocking agent Substances 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 525
- 230000015572 biosynthetic process Effects 0.000 description 50
- 239000004020 conductor Substances 0.000 description 35
- 239000000243 solution Substances 0.000 description 17
- 238000010304 firing Methods 0.000 description 15
- 239000002904 solvent Substances 0.000 description 15
- 239000002612 dispersion medium Substances 0.000 description 12
- 238000006073 displacement reaction Methods 0.000 description 12
- 239000007788 liquid Substances 0.000 description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 11
- 238000000059 patterning Methods 0.000 description 10
- 210000000746 body region Anatomy 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- 230000009191 jumping Effects 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 8
- 230000001629 suppression Effects 0.000 description 8
- 238000005452 bending Methods 0.000 description 7
- 239000000919 ceramic Substances 0.000 description 7
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 7
- 229910001928 zirconium oxide Inorganic materials 0.000 description 7
- 238000007650 screen-printing Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910000480 nickel oxide Inorganic materials 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
- H10N30/077—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
- B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N39/00—Integrated devices, or assemblies of multiple devices, comprising at least one piezoelectric, electrostrictive or magnetostrictive element covered by groups H10N30/00 – H10N35/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
- H10N30/2047—Membrane type
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
Definitions
- the present invention includes a substrate provided with a cavity, and a vibration laminate in which an electrode film and a piezoelectric / electrostrictive film provided on the first main surface of the substrate in alignment with the cavity are laminated.
- the present invention relates to a method for manufacturing a piezoelectric / electrostrictive film type element.
- FIG. 42 is a schematic diagram for explaining a conventional manufacturing method of a piezoelectric / electrostrictive film type element constituting the main part of a piezoelectric / electrostrictive actuator for ink ejection used in an ink jet printer head.
- a conductive material paste is screen-printed on the surface of a substrate 902 provided with a cavity 926 serving as an ink pressurizing chamber, and the obtained coating film is obtained.
- a paste of piezoelectric / electrostrictive material is screen-printed on the lower electrode film 912, and the obtained coating film is baked to piezo-electric / electrostrictive film 914.
- the conductive material paste is screen-printed on the piezoelectric / electrostrictive film 914, and the obtained coating film is baked to form the upper electrode film 916.
- Patent Document 1 discloses a method of manufacturing a piezoelectric / electrostrictive actuator for ink ejection used in an ink jet printer head.
- the planar position of all or a part of the lower electrode film, the piezoelectric / electrostrictive film and the upper electrode film and the planar position of the cavity are shifted due to the dimensional variation or deformation of the substrate or the screen plate.
- the amount of ink discharged from the piezoelectric / electrostrictive actuator can vary. This problem is not only due to the piezoelectric / electrostrictive film type element constituting the main part of the piezoelectric / electrostrictive actuator, but also to the substrate provided with the cavity and the electrode provided with the cavity and the planar position aligned on the surface of the substrate.
- piezoelectric / electrostrictive film type elements including a film and a vibration laminated body in which a piezoelectric / electrostrictive film is laminated
- a piezoelectric thin film resonator (FBAR) having a diaphragm structure (FBAR) for example, a piezoelectric thin film resonator (FBAR) having a diaphragm structure (FBAR).
- FBAR piezoelectric thin film resonator
- FBAR piezoelectric thin film resonator
- FBAR diaphragm structure
- the present invention has been made to solve this problem, and prevents displacement between the plane position of the cavity and the plane position of the film constituting the vibration laminated body in which the electrode film and the piezoelectric / electrostrictive film are laminated.
- An object of the present invention is to provide a method for manufacturing a piezoelectric / electrostrictive film type device.
- a first invention is a substrate in which a cavity is formed, and an electrode film and a piezoelectric / electrostrictive film provided on the first main surface of the substrate in alignment with the cavity and the plane position.
- a piezoelectric / electrostrictive film type device comprising: (a) a step of forming a first photosensitive film on a first main surface of the substrate; and (b) Irradiating light from the second main surface side of the substrate to depict a latent image on which the planar shape of the cavity is transferred on the first photosensitive film; and (c) a region where the cavity is formed.
- the method further comprises (f) a step of filling the cavity with a light shielding agent before the step (b). (b) selectively exposes the first photosensitive film formed in a region where the cavity is not formed, and the step (c) removes an unexposed portion of the first photosensitive film. To do.
- the third invention is the method for producing a piezoelectric / electrostrictive film type device of the second invention, wherein the light shielding agent contains a pigment.
- the step (b) includes the step of forming the first photosensitive film formed in the region where the cavity is formed. In the step (c), the exposed portion of the first photosensitive film is removed.
- the cavity of the second main surface of the substrate is not formed before (g) (b).
- the light shielding film includes a pigment.
- the vibration is applied to the first main surface of the substrate after the step (e).
- An eighth invention is the method for manufacturing a piezoelectric / electrostrictive film type device according to any one of the first to sixth inventions, wherein (m) the vibration is applied to the first main surface of the substrate after the step (e).
- the piezoelectric / electrostrictive material (r) is directed toward an arbitrary electrode film constituting the vibration laminate after the step (e). Forming a piezoelectric / electrostrictive film that constitutes the vibration laminated body by electrophoresis.
- a tenth invention is the method for manufacturing a piezoelectric / electrostrictive film type device according to any one of the first to ninth inventions, wherein (s) after the step (c) and before the step (d). And a step of covering the first photosensitive film remaining in the area where the cavity is not formed with a water-repellent film having higher water repellency than the first photosensitive film.
- An eleventh aspect of the present invention is the method for manufacturing a piezoelectric / electrostrictive film type element according to the tenth aspect of the present invention, wherein the step (s) includes the step (s-1): the step in which the cavity is not formed.
- a twelfth invention is a substrate in which a cavity is formed, and a vibration laminate in which an electrode film and a piezoelectric / electrostrictive film provided on the first main surface of the substrate in alignment with the cavity are laminated.
- a method for manufacturing a piezoelectric / electrostrictive film type device comprising: (a) a step of forming a first photosensitive film on a first main surface of the substrate; and (b) a second main surface of the substrate. Irradiating light from the surface side and drawing a latent image on which the planar shape of the cavity is transferred onto the first photosensitive film; and (c) the first formed in the area where the cavity is not formed.
- a thirteenth aspect of the present invention is the method for manufacturing a piezoelectric / electrostrictive film type element according to the twelfth aspect of the present invention, further comprising (h) a step of filling the cavity with a light shielding agent before the step (b). (b) selectively exposes the first photosensitive film formed in a region where the cavity is not formed, and the step (c) removes an exposed portion of the first photosensitive film. .
- the fourteenth invention is the method for producing a piezoelectric / electrostrictive film type device of the thirteenth invention, wherein the light shielding agent contains a pigment.
- the vibration is applied to the first main surface of the substrate after the step (g).
- the vibration is applied to the first main surface of the substrate after the step (g).
- a seventeenth aspect of the invention is the method for manufacturing a piezoelectric / electrostrictive film type element according to any one of the twelfth to fourteenth aspects of the invention, wherein (s) the arbitrary electrode film constituting the vibration laminate after the step (g) Forming a piezoelectric / electrostrictive film constituting the vibration laminate by electrophoresing a piezoelectric / electrostrictive material toward the substrate.
- the lowermost layer film can be formed in the region where the cavity is formed, it is possible to prevent the gap between the plane position of the cavity and the plane position of the lowermost layer film. it can.
- the resolution of patterning can be improved.
- the difference between the light transmittance of the region where the cavity is formed and the light transmittance of the region where the cavity is not formed can be increased, so that the patterning resolution is improved. be able to.
- the resolution of patterning can be further improved.
- the electrode film can be formed in the region where the piezoelectric / electrostrictive film is formed, the displacement between the plane position of the piezoelectric / electrostrictive film and the plane position of the electrode film is prevented. Can be prevented.
- the piezoelectric / electrostrictive film can be formed in the region where the electrode film is formed, the displacement between the planar position of the electrode film and the planar position of the piezoelectric / electrostrictive film is prevented. Can be prevented.
- the piezoelectric / electrostrictive film can be formed in the region including the region where the electrode film is formed, the planar position of the electrode film and the planar position of the piezoelectric / electrostrictive film Can be prevented from shifting.
- the jumping up at the end of the lowermost film is suppressed.
- the lowermost layer film can be formed in the region where the cavity is formed, it is possible to prevent the gap between the plane position of the cavity and the plane position of the lowermost layer film. Further, since the lowermost layer film is repelled by the water repellent film, the jumping up at the end of the lowermost layer film is suppressed.
- the resolution of patterning can be improved.
- the electrode film can be formed in the region where the piezoelectric / electrostrictive film is formed, the displacement between the planar position of the piezoelectric / electrostrictive film and the planar position of the electrode film is reduced. Can be prevented.
- the piezoelectric / electrostrictive film can be formed in the region where the electrode film is formed, the deviation between the planar position of the electrode film and the planar position of the piezoelectric / electrostrictive film is prevented. Can be prevented.
- the piezoelectric / electrostrictive film can be formed in the region including the region where the electrode film is formed, the planar position of the electrode film and the planar position of the piezoelectric / electrostrictive film Can be prevented from shifting.
- FIG. 2 is a cross-sectional view of the piezoelectric / electrostrictive film type element along AA in FIG.
- FIG. 3 is a cross-sectional view of the piezoelectric / electrostrictive film type element along BB in FIG. 1. It is a figure explaining the manufacturing method of the piezoelectric / electrostrictive film type
- a piezoelectric / electrostrictive film type device including a body a lower electrode film is formed by photolithography using a substrate in which a cavity is filled with a light shielding agent as a mask.
- the piezoelectric / electrostrictive film is electrophoresed toward the lower electrode film to form a piezoelectric / electrostrictive film, and the upper electrode film is formed by photolithography using the piezoelectric / electrostrictive film as a mask. Form.
- FIG. 1 is a perspective view of the piezoelectric / electrostrictive membrane element 1
- FIG. 2 is a cross-sectional view of the piezoelectric / electrostrictive membrane element 1 along II-II of FIG. 1
- FIG. 3 is III-III of FIG. 2 is a cross-sectional view of the piezoelectric / electrostrictive film type element 1 along the line.
- the piezoelectric / electrostrictive film type element 1 constitutes a main part of a piezoelectric / electrostrictive actuator for ink ejection used in an ink jet printer head.
- the method for manufacturing a piezoelectric / electrostrictive film type element described below can also be used for manufacturing other types of piezoelectric / electrostrictive film type elements.
- the piezoelectric / electrostrictive membrane element 1 has a structure in which a plurality of vibration laminates 110 are regularly arranged on the surface of a substrate 102.
- the method for manufacturing a piezoelectric / electrostrictive film type element described below can also be used for manufacturing a piezoelectric / electrostrictive film type element including only one vibration laminate 110.
- the piezoelectric / electrostrictive membrane element 1 has a lower electrode on the surface of a substrate 102 in which a base plate 104, a base plate 106, and a diaphragm 108 are stacked from bottom to top in the order listed. It has a cross-sectional structure provided with a vibration laminate 110 in which a film 112, a piezoelectric / electrostrictive film 114, and an upper electrode film 116 are laminated from bottom to top in the order listed.
- the substrate 102 is a fired body of insulating ceramics.
- the type of insulating ceramic is not limited, but at least one selected from the group consisting of zirconium oxide, aluminum oxide, magnesium oxide, mullite, aluminum nitride, and silicon nitride from the viewpoint of heat resistance, chemical stability, and insulating properties. It is desirable to include. Among these, stabilized zirconium oxide is desirable from the viewpoint of mechanical strength and toughness.
- stabilized zirconium oxide refers to zirconium oxide in which the phase transition of the crystal is suppressed by addition of a stabilizer, and includes partially stabilized zirconium oxide in addition to stabilized zirconium oxide.
- the base plate 104 has a structure in which the ink discharge holes 122 and the ink supply holes 124 having a round planar shape are formed on a plate having a substantially uniform plate thickness.
- the ink discharge hole 122 is formed in the vicinity of one end of a region (hereinafter referred to as “cavity region”) 182 where the cavity 126 described below is formed, and the ink supply hole 124 is formed in the vicinity of the other end of the cavity region 182.
- cavity region region
- the base plate 106 has a structure in which a cavity 126 having an elongated rectangular planar shape is formed into a plate having a substantially uniform thickness.
- the width W1 in the short direction of the cavity 126 is desirably widened and is preferably 50 ⁇ m or more in order to increase the displacement amount of the bending displacement described below and increase the excluded volume.
- the length L in the longitudinal direction of the cavity 126 is for reducing the flow resistance. It is desirable to make it short, and it is desirable to make it 3 mm or less.
- the width W2 of the crosspiece 128 between the adjacent cavities 126 is desirably narrowed and desirably 100 ⁇ m or less in order to increase the displacement amount of the bending displacement and increase the excluded volume.
- planar shape of the cavity 126 does not limit the planar shape of the cavity 126 to an elongated rectangle. That is, the planar shape of the cavity 126 may be a polygon such as a triangle or a quadrangle, or may be a two-dimensional shape such as a circle or an ellipse whose entire or part of the contour is a curve. Further, it is not essential to arrange the cavities 126 in one direction. For example, the cavities 126 may be arranged in a lattice shape in two orthogonal directions.
- the diaphragm 108 is a plate having a substantially uniform thickness.
- the plate thickness of the diaphragm 108 is preferably 30 ⁇ m or less, and more preferably 1 ⁇ m or more and 15 ⁇ m or less. This is because if the thickness is below this range, the diaphragm 108 is likely to be damaged, and if the range is exceeded, the rigidity of the diaphragm 108 increases and the amount of bending displacement tends to decrease. It is not essential that the diaphragm 108 is flat. Even if the diaphragm 108 has some unevenness or curvature, the following method for manufacturing a piezoelectric / electrostrictive film type element can be employed.
- the cavity 126 becomes a cavity inside the substrate 102 and functions as an ink chamber for holding ink.
- the ink ejection holes 122 are connected to the cavity 126 and function as a flow path for ink flowing out of the cavity 126.
- the ink supply hole 124 is also connected to the cavity 126 and functions as a flow path for ink flowing into the cavity 126.
- the total thickness of the base plate 104, the base plate 106, and the vibration plate 108 is determined so that light for exposure described below can be sufficiently transmitted.
- what is the total thickness of the plate can sufficiently transmit light for exposure depends on the type of insulating ceramic and the density of the fired body.
- the lower electrode film 112 and the upper electrode film 116 are a fired body of a conductive material.
- the type of the conductive material is not limited, but is preferably a metal such as platinum, palladium, rhodium, gold or silver or an alloy containing these as a main component from the viewpoint of electric resistance and heat resistance. Among these, platinum that is particularly excellent in heat resistance or an alloy containing platinum as a main component is desirable.
- the film thickness of the lower electrode film 112 is desirably 0.3 ⁇ m or more and 5.0 ⁇ m or less
- the film thickness of the upper electrode film 116 is desirably 0.1 ⁇ m or more and 3.0 ⁇ m or less.
- the lower electrode film 112 and the upper electrode film 116 are preferably formed so as to cover a region that substantially contributes to the bending displacement of the piezoelectric / electrostrictive film 114.
- the piezoelectric / electrostrictive film 114 is formed so as to cover a region of 80% or more of the upper and lower surfaces of the piezoelectric / electrostrictive film 114 including the central portion thereof.
- the piezoelectric / electrostrictive film 114 is a sintered body of piezoelectric / electrostrictive ceramics.
- the type of piezoelectric / electrostrictive ceramics is not limited, but is preferably a lead (Pb) -based perovskite oxide from the viewpoint of electric field induced strain, and is lead zirconate titanate (PZT; Pb (Zr x Ti 1-x ). O 3 ) or a modified product of lead zirconate titanate into which a simple oxide, a complex perovskite oxide or the like is introduced is more desirable.
- lead zirconate titanate and lead niobate niobate (Pb (Mg 1/3 Nb 2/3 ) O 3 ) in which nickel oxide (NiO) is introduced or lead zirconate titanate and nickel acid A solid solution with lead niobate (Pb (Ni 1/3 Nb 2/3 ) O 3 ) is desirable.
- the film thickness of the piezoelectric / electrostrictive film 114 is desirably 1 ⁇ m or more and 20 ⁇ m or less. Below this range, densification of the piezoelectric / electrostrictive film 114 tends to be insufficient, and above this range, the shrinkage stress during sintering of the piezoelectric / electrostrictive film 114 increases. This is because it is necessary to increase the thickness of the diaphragm 108.
- the vibration laminate 110 includes a lower wiring electrode 118 serving as a power supply path to the lower electrode film 112 and an upper wiring electrode 120 serving as a power supply path to the upper electrode film 116.
- One end of the lower wiring electrode 118 is between the lower electrode film 112 and the piezoelectric / electrostrictive film 114 and is electrically connected to one end of the lower electrode film 112, and the other end of the lower wiring electrode 118 is in the cavity region.
- One end of the upper wiring electrode 120 is on the upper electrode film 116 and is electrically connected to one end of the upper electrode film 116, and the other end of the upper electrode film 116 is located in the non-cavity region 184. .
- the bending vibration described below is affected.
- An electric field can be applied to the piezoelectric / electrostrictive film 114 without application.
- the vibration laminate 110 is integrated with the diaphragm 108 above the cavity 126.
- a drive signal is supplied between the lower electrode film 112 and the upper electrode film 116 via the lower wiring electrode 118 and the upper wiring electrode 120 and an electric field is applied to the piezoelectric / electrostrictive film 114
- the piezoelectric / electrostrictive film 114 expands and contracts in a direction parallel to the surface of the substrate 102, and the integrated piezoelectric / electrostrictive film 114 and the vibration plate 108 are bent and displaced. Due to this bending displacement, the ink inside the cavity 126 is ejected to the outside via the ink ejection port 122.
- 4 to 14 are schematic views for explaining the method for manufacturing the piezoelectric / electrostrictive film type device according to the first embodiment.
- 4 to 14 are sectional views of work-in-process of the piezoelectric / electrostrictive film type element.
- the substrate 102 is produced, for example, by pressing and firing a green sheet obtained by forming insulating ceramics into a sheet shape.
- a resist pattern 142 that covers the non-cavity region 184 without covering the cavity region 182 is formed on the surface of the substrate 102.
- the resist pattern 142 is formed by patterning a resist film that covers the surface of the substrate 102 using the substrate 102 as a mask by photolithography.
- a conductive material film 144 to be the lowermost lower electrode film 112 is formed in the cavity region 182 on the surface of the substrate 102 where the resist pattern 142 is not formed. Note that since the resist pattern 142 is removed later, there is no problem even if the conductive material film 144 protrudes into the non-cavity region 184.
- the conductive material film 144 is formed by using a paste in which a conductive material is dispersed in a dispersion medium (hereinafter referred to as “conductive paste”) or a solution in which a resin material resinate is dissolved in a solvent (hereinafter referred to as “conductive resinate solution”).
- the contact angle of the conductive paste with respect to the resist pattern 142 is preferably 50 ° or more, and more preferably 70 ° or more.
- the resist pattern 142 remaining in the non-cavity region 184 is peeled and removed as shown in FIG.
- a conductive material film 144 having the same planar shape as the cavity 126 is formed at the same planar position as the cavity 126.
- the resist pattern 142 is peeled by a chemical method.
- the resist pattern 142 may be peeled off by a heat treatment method, a plasma treatment method, or the like. When the heat treatment method is used, the treatment temperature is preferably 200 to 300 ° C.
- the conductive material film 144 is baked. As a result, as shown in FIG. 8, the conductive material film 144 becomes the lower electrode film 112, and the lower electrode film 112 having the same planar shape as the cavity 126 is formed at the same planar position as the cavity 126. Note that slight shrinkage due to firing is allowed.
- the firing temperature is desirably 200 ° C. or more and 300 ° C. or less, and platinum powder is used as the dispersion medium.
- the firing temperature is desirably 1000 ° C. or higher and 1350 ° C. or lower.
- the baking temperature is preferably 600 ° C. or higher and 800 ° C. or lower.
- the lower wiring electrode 118 is formed.
- the lower wiring electrode 118 may be formed by screen printing a conductive paste and firing it, or may be formed by vapor deposition of a conductive material. The firing of the lower wiring electrode 118 can be performed simultaneously with the firing of the lower electrode film 112.
- a piezoelectric / electrostrictive material film 146 to be the piezoelectric / electrostrictive film 114 is formed.
- the piezoelectric / electrostrictive material film 146 is formed by immersing the work-in-process and the counter electrode 150 in a slurry in which the piezoelectric / electrostrictive material is dispersed in a dispersion medium, with a space therebetween.
- the voltage can be applied to the electrode 112 and the counter electrode 150, and the piezoelectric / electrostrictive material can be electrophoresed toward the lower electrode film 112.
- a piezoelectric / electrostrictive material film 146 having a slightly larger planar shape than the lower electrode film 112 is formed at the same planar position as the lower electrode film 112.
- a region where the piezoelectric / electrostrictive material film 146 is not required to be formed such as a region where the lower wiring electrode 118 is formed, is masked with an organic protective film, etc. It is desirable to remove unnecessary piezoelectric / electrostrictive material together with the protective film. Thereby, it is possible to prevent the piezoelectric / electrostrictive material film 146 from being formed on the lower wiring electrode 118.
- the piezoelectric / electrostrictive material film 146 is baked. As a result, as shown in FIG. 10, the piezoelectric / electrostrictive material film 146 becomes a piezoelectric / electrostrictive film 114, and the piezoelectric / electrostrictive film 114 has a slightly larger planar shape than the lower electrode film 112 at the same planar position as the lower electrode film 112. An electrostrictive film 114 is formed. Note that slight shrinkage due to firing is allowed. The firing of the piezoelectric / electrostrictive material film 146 is preferably performed in a state where the work-in-process is housed in a sheath such as alumina or magnesia.
- piezoelectric / electrostrictive region the region where the piezoelectric / electrostrictive film 114 is formed (hereinafter referred to as “piezoelectric / electrostrictive region”) 186 is not covered.
- a resist pattern 152 covering the non-piezoelectric / electrostrictive body region 188 outside the electrostrictive body region 186 is formed on the surface of the substrate 102.
- the resist pattern 152 is formed by patterning a resist film that covers the surface of the substrate 102 using the piezoelectric / electrostrictive film 114 as a mask by photolithography.
- the resist pattern 152 is not formed on the lower wiring electrode 118. Accordingly, a region where the upper electrode film 116 is not required to be formed, such as a region where the lower wiring electrode 118 is formed, is masked with an organic protective film, and the resist pattern 152 is removed before, after or simultaneously with the removal. It is desirable to remove the organic protective film. Thereby, it is possible to prevent the upper electrode film 116 from being formed on the lower wiring electrode 118.
- a conductive material film 154 to be the upper electrode film 116 is formed on the piezoelectric / electrostrictive body region 186 on the surface of the substrate 102 where the resist pattern 152 is not formed. Overlaid on the strained body film 114. Note that since the resist pattern 152 is removed later, there is no problem even if the conductive material film 154 protrudes into the non-piezoelectric / electrostrictive region 188.
- the conductive material film 154 can be formed in a manner similar to that of the conductive material film 144 described above.
- the resist pattern 152 remaining in the non-piezoelectric / electrostrictive body region 188 is peeled off and removed.
- a conductive material film 154 having the same planar shape as the piezoelectric / electrostrictive film 114 is formed at the same planar position as the piezoelectric / electrostrictive film 114.
- the resist pattern 152 can be removed in the same manner as the resist pattern 142 described above.
- the conductive material film 154 is baked. As a result, as shown in FIG. 14, the conductive material film 154 becomes the upper electrode film 116, and the upper electrode film having the same planar shape as the piezoelectric / electrostrictive film 114 at the same planar position as the piezoelectric / electrostrictive film 114. 116 is formed. Note that slight shrinkage due to firing is allowed.
- the conductive material film 154 can be baked in the same manner as the conductive material film 144 described above.
- the upper wiring electrode 120 After firing the conductive material film 154, the upper wiring electrode 120 is formed.
- the upper wiring electrode 120 can be formed in the same manner as the lower wiring electrode 118.
- the upper wiring electrode 120 can be fired at the same time as the upper electrode film 116 is fired.
- the lower electrode film 112 can be formed in the cavity region 182, so that the deviation between the planar position of the cavity 126 and the planar position of the lower electrode film 112 is achieved. Can be prevented. Further, since the piezoelectric / electrostrictive film 114 can be formed in the piezoelectric / electrostrictive body region 186 including the cavity region 182 in which the lower electrode film 112 is formed, the planar position of the lower electrode film 112 and the piezoelectric / electrostrictive film 114 Deviation from the planar position of the electrostrictive film 114 can be prevented.
- the upper electrode film 116 can be formed in the piezoelectric / electrostrictive body region 186, a shift between the planar position of the piezoelectric / electrostrictive film 114 and the planar position of the upper electrode film 116 can be prevented. Accordingly, it is possible to prevent a deviation between the planar position of the cavity 126 and the planar positions of the lower electrode film 112, the piezoelectric / electrostrictive film 114, and the upper electrode film 116 constituting the vibration laminate 110. As a result, the cavity 126 Can be prevented from being displaced from the plane position of the vibration laminate 110. This contributes to suppressing variations in the ink discharge amount of the piezoelectric / electrostrictive actuator including the piezoelectric / electrostrictive film type element 1.
- 15 to 20 are schematic views for explaining a method of forming the resist pattern 142 according to the first embodiment.
- 15 to 20 are cross-sectional views of work-in-process of the piezoelectric / electrostrictive film type element 1.
- FIG. 1 is a schematic view for explaining a method of forming the resist pattern 142 according to the first embodiment.
- 15 to 20 are cross-sectional views of work-in-process of the piezoelectric / electrostrictive film type element 1.
- a resist film 156 is formed on the surface of the substrate 102 as shown in FIG.
- the resist film 156 is formed by applying a resist solution in which the solid content of the resist is dissolved in a solvent or dispersed in a dispersion medium to the surface of the substrate 102 with a spin coater, and heating the work-in-process with a hot plate, an oven, or the like. This is done by evaporating the solvent.
- the resist solution may be applied by other methods such as spraying.
- the resist film 156 is a photosensitive film whose solubility in a developing solution is reduced when exposed.
- the cavity 126 is filled with a light shielding agent 160, and the function of a mask that shields the cavity region 182 and does not shield the non-cavity region 184 is imparted to the substrate 102. It is sufficient that the light shielding agent 160 is filled into the cavity 126 before light irradiation from the back surface described below. Therefore, the resist film 156 may be formed on the surface of the substrate 102 after the cavity 126 is filled with the light shielding agent 160.
- Filling the cavity 126 with the light shielding agent 160 is performed by injecting a light shielding liquid in which the solid content of the light shielding agent 160 is dissolved in a solvent or dispersed in a dispersion medium into the ink discharge holes 122 or the ink supply holes 124 with a syringe.
- the work in process is heated by, for example, drying the shading solution.
- a porous material such as a sintered metal impregnated with a light shielding liquid may be brought into contact with the back surface of the substrate 102, and the light shielding liquid may be moved from the porous body to the cavity 126 by capillary action.
- vacuum defoaming may be performed after injecting the light shielding liquid.
- the light shielding agent 160 preferably includes a dye or pigment that absorbs light for exposure, and particularly preferably includes a pigment. This is because when the light shielding agent 160 contains a pigment, the resolution of patterning can be improved. Further, a light shielding agent 160 having a refractive index different from that of the substrate 102 may be used so that light for exposure is totally reflected in the cavity region 162.
- the resist film 156 is formed and the light shielding agent 160 is filled in the cavity 126, as shown in FIG. 17, light is irradiated from the back side of the substrate 102, and the resist film 156 formed in the non-cavity region 184 is formed. By selectively exposing, an unexposed portion 162 and an exposed portion 164 are formed. As a result, a latent image obtained by reversing and transferring the planar shape of the cavity 126 is drawn on the resist film 156.
- the unexposed portion 162 of the resist film 156 formed in the cavity region 182 is removed by development as shown in FIG.
- the latent image is developed by immersing the work-in-process in a developing solution and swinging to remove the unexposed portion 162 and then washing the work-in-process with pure water or the like. A developer that selectively dissolves the unexposed portion 162 and does not dissolve the exposed portion 164 is selected.
- the light shielding agent 160 is removed from the cavity 126 as shown in FIG. Note that it is sufficient to remove the light shielding agent 160 from the cavity 126 after the light irradiation from the back surface described above. Therefore, the unexposed portion 162 may be removed after the light shielding agent 160 is removed from the cavity 126.
- the removal of the light shielding agent 160 from the cavity 126 is performed by immersing the work-in-process in a solvent.
- 21 to 24 are schematic views for explaining the method of forming the resist pattern 152 according to the first embodiment.
- 21 to 24 are sectional views of work-in-process of the piezoelectric / electrostrictive film type element 1.
- a resist film 170 is formed on the surface of the substrate 102 so as to overlap the piezoelectric / electrostrictive film 114.
- the formation of the resist film 170 can be performed in the same manner as the formation of the resist film 156, and the same resist as that used for the formation of the resist film 156 can be used.
- the resist film 170 formed in the non-piezoelectric / electrostrictive body region 188 is selectively exposed by irradiating light from the back side of the substrate 102.
- An unexposed portion 172 and an exposed portion 174 are formed.
- a latent image obtained by reversing and transferring the planar shape of the piezoelectric / electrostrictive film 114 is drawn on the resist film 170.
- the unexposed portion 172 of the resist film 170 formed in the piezoelectric / electrostrictive body region 186 is removed by development.
- the development of the latent image can be performed in the same manner as the development of the latent image drawn on the resist film 156, and the same developer as that used for the latent image drawn on the resist film 156 is used. be able to.
- the resist pattern 152 is completed.
- the second embodiment relates to a method for forming a piezoelectric / electrostrictive film 214 that can be employed instead of the method for forming a piezoelectric / electrostrictive film 114 according to the first embodiment.
- the piezoelectric / electrostrictive film 214 is formed by photolithography using the lower electrode film 112 as a mask.
- 25 to 28 are schematic views for explaining a method of forming the piezoelectric / electrostrictive film 214 according to the second embodiment.
- 25 to 28 are sectional views of work-in-process of the piezoelectric / electrostrictive film type element.
- a resist pattern 276 that covers the non-cavity region 184 without covering the cavity region 182 is formed on the surface of the substrate 102.
- the resist pattern 276 is formed by patterning a resist film that covers the surface of the substrate 102 using the lower electrode film 112 as a mask.
- the piezoelectric / electrostrictive material film 246 that becomes the piezoelectric / electrostrictive film 206 is formed in the cavity region 182 on the surface of the substrate 102 where the resist pattern 276 is not formed. Overlaid on the electrode film 112. Since the resist pattern 276 is removed later, there is no problem even if the piezoelectric / electrostrictive material film 246 protrudes into the non-cavity region 184.
- the piezoelectric / electrostrictive material film 246 is formed by applying a paste (hereinafter referred to as “piezoelectric / electrostrictive paste”) in which a piezoelectric / electrostrictive material is dispersed in a dispersion medium, and then removing the dispersion medium.
- the application of the piezoelectric / electrostrictive paste can be performed by screen printing or the like.
- the contact angle of the piezoelectric / electrostrictive paste with respect to the resist pattern 276 is preferably 50 ° or more, and more preferably 70 ° or more. .
- the resist pattern 276 remaining in the non-cavity region 184 where the lower electrode film 112 is not formed is peeled off and removed.
- a piezoelectric / electrostrictive material film 246 having the same planar shape as the lower electrode film 112 is formed at the same planar position as the lower electrode film 112.
- the resist pattern 276 can be removed in the same manner as the resist pattern 142 described above.
- the piezoelectric / electrostrictive material film 246 is baked. As a result, as shown in FIG. 28, the piezoelectric / electrostrictive material film 246 becomes a piezoelectric / electrostrictive film 214 and has the same planar shape as the lower electrode film 112 at the same planar position as the lower electrode film 112. A strained body film 214 is formed. Note that slight shrinkage due to firing is allowed. The firing of the piezoelectric / electrostrictive material film 246 can be performed in the same manner as the firing of the piezoelectric / electrostrictive material film 146 described above.
- the piezoelectric / electrostrictive film 214 can be formed in the cavity region 182 where the lower electrode film 112 is formed. Deviation between the planar position and the planar position of the piezoelectric / electrostrictive film 214 can be prevented, and the piezoelectric / electrostrictive film 214 can function in the same manner as the piezoelectric / electrostrictive film 114 according to the first embodiment. it can.
- FIGS. 29 to 32 are schematic views for explaining a method of forming a resist pattern 276 according to the second embodiment. 29 to 32 are cross-sectional views of work-in-process of the piezoelectric / electrostrictive film type element.
- a resist film 290 is formed on the surface of the substrate 102 so as to overlap the lower electrode film 112.
- the formation of the resist film 290 can be performed in the same manner as the formation of the resist film 156, and the same resist as that used for forming the resist film 156 can be used.
- the resist film 290 is formed, as shown in FIG. 30, light is irradiated from the back side of the substrate 102 to select the resist film 290 formed in the non-cavity region 184 where the lower electrode film 112 is not formed. Exposure is performed to form an unexposed portion 292 and an exposed portion 294. As a result, a latent image obtained by reversing and transferring the planar shape of the lower electrode film 112 is depicted on the resist film 290.
- the unexposed portion 292 of the resist film 290 formed in the cavity region 182 is removed by development as shown in FIG.
- the development of the latent image can be performed in the same manner as the development of the latent image drawn on the resist film 156, and the same developer as that used for the latent image drawn on the resist film 156 is used. be able to.
- a resist pattern 276 is completed.
- the third embodiment relates to a method of forming a resist pattern 342 that can be employed instead of the method of forming the resist pattern 142 according to the first embodiment.
- 33 to 38 are schematic views for explaining a resist pattern forming method according to the third embodiment.
- 33 to 38 are schematic diagrams of work-in-process of the piezoelectric / electrostrictive film type element.
- a resist film 356 is formed on the surface of the substrate 301 in which the base plate 106 and the vibration plate 108 are stacked in the order listed.
- the resist film 356 can be formed in a manner similar to the formation of the resist film 156.
- the resist film 356 is a photosensitive film whose solubility in the developer increases when exposed.
- a light shielding film 396 is formed in the non-cavity region 184 on the back surface of the substrate 301, and the substrate functions as a mask that shields the non-cavity region 184 and does not shield the cavity region 182. 301.
- the light shielding film 396 may be formed before light irradiation from the back surface described below. Therefore, the resist film 356 may be formed on the surface of the substrate 301 after the light shielding film 396 is formed.
- the light-shielding film 396 is formed by applying a light-shielding liquid in which the solid content of the light-shielding film 396 is dissolved in a solvent or dispersed in a dispersion medium to the back surface of the substrate 301 with a spin coater and heating the work-in-process with a hot plate, oven, or the like. It is carried out by evaporating the solvent or dispersion medium from the membrane. Of course, other methods such as spraying the shading liquid may be applied. In these cases, it is desirable to mask the interior of the cavity 126 with a material that can be removed later, such as liquid or organic resin, so that the light shielding film 396 does not enter the cavity 126. Further, a method for forming the light shielding film 396 such as impregnation printing such as transfer offset printing and roller transfer may be employed.
- the light shielding film 396 preferably contains a dye or pigment that absorbs light for exposure, and particularly preferably contains a pigment. This is because when the light shielding film 396 contains a pigment, the resolution of patterning can be improved. By forming such a light shielding film 396, the difference between the light transmittance of the cavity region 182 and the light transmittance of the non-cavity region 184 can be increased, so that the patterning resolution can be improved. However, if a sufficient difference in light transmittance can be obtained without forming the light shielding film 396, the step of forming the light shielding film 396 may be omitted.
- the exposed portion 364 of the resist film 156 formed in the cavity region 182 is removed by development as shown in FIG.
- the development of the latent image is performed by immersing the work-in-process in a developing solution and swinging to remove the exposure unit 364 and then washing the work-in-process with pure water or the like.
- a developing solution that selectively dissolves the exposed portion 364 and does not dissolve the unexposed portion 362 is selected.
- the light shielding film 396 is peeled off and removed as shown in FIG. Note that the light-shielding film 396 may be peeled after the light irradiation from the back surface described above. Therefore, the exposed portion 364 of the resist film 356 may be removed after the light shielding film 396 is peeled off.
- the light shielding film 396 is peeled by a chemical method.
- the light shielding film 396 may be peeled off by a heat treatment method, a plasma treatment method, or the like.
- the resist pattern 342 thus formed can function in the same manner as the resist pattern 142 according to the first embodiment.
- the contact angle of the conductive paste with respect to the resist pattern 342 is preferably 50 ° or more and 70 ° or more in order to suppress jumping at the end of the conductive material film 144. Is more desirable.
- a process of suppressing jumping at the end portion of the conductive material film 144 (hereinafter, referred to as the conductive material film 144 is performed).
- This jumping suppression processing is desirably performed even when the resist pattern 342 of the third embodiment is adopted instead of the resist pattern 142 of the first embodiment.
- the fourth embodiment is desirably employed when the contact angle of the conductive paste with respect to the resist patterns 142 and 342 cannot be increased in the first embodiment or the third embodiment.
- 43 to 46 are diagrams for explaining the jumping-up suppression process of the fourth embodiment.
- 43 to 46 are sectional views of work-in-process of the piezoelectric / electrostrictive film type element 1.
- a masking film 4002 is formed on the surface of the substrate 102 so as to overlap the resist pattern 142 remaining in the non-cavity region 184.
- the masking film 4002 is formed by applying a resin liquid containing a resin such as an epoxy resin or a polyimide resin to the surface of the substrate 102 with a spin coater and heating it with a hot plate, oven or the like, or irradiating ultraviolet rays with an ultraviolet lamp. By curing.
- the resin liquid may be applied by other methods such as spraying.
- the masking film 4002 is removed until the resist pattern 142 is exposed as shown in FIG.
- the masking film 4002 is removed by dissolving the masking film 4002 by, for example, immersing the work-in-process in a solvent. Thereby, the masking film pattern 4004 remaining in the cavity region 182 is formed.
- a water repellent film 4006 is formed on the surface of the substrate 102 so as to overlap the resist pattern 142 and the masking film pattern 4004.
- the water repellent film 4006 needs to have a water repellency with respect to the paste used to form the lower electrode film 112 higher than that of the dyst pattern 142, but the contact angle with respect to the paste is desirably 50 ° or more, and 70 ° or more. More desirably.
- the water-repellent film 4006 is formed by applying a water-repellent agent in which a water-repellent material such as a silicone resin or a fluororesin is dissolved in a solvent or dispersed in a dispersion medium to the surface of the substrate 102 with a spin coater, and using a hot plate, an oven, or the like.
- the product is heated to evaporate the solvent from the coating film and cure the water repellent material.
- the water repellent may be applied by other methods such as spraying.
- heating may be omitted.
- the masking film pattern 4004 and the part formed in the cavity region 182 of the water repellent film 4006, that is, the part on the masking film pattern 4004 are removed. .
- the removal of the masking film pattern 4004 and the water repellent film 4006 is performed by dissolving the masking film pattern 4004 by immersing the work-in-process in a solvent. Thereby, a water repellent film 4008 covering the resist pattern 142 is formed.
- the water repellent film 4008 suppresses jumping at the end of the lower electrode film 112 as shown in FIG. 47B, and the paste repels when forming the lower electrode film 112 as shown in FIG. 47A.
- a flat conductive material film 144 is formed by being repelled by the water film 4008.
- the water repellent film 4008 is removed together when the resist pattern 142 is removed.
- the fifth embodiment relates to a method for forming a water-repellent film pattern 5008 that can be employed in place of the resist pattern 142 according to the first embodiment and the resist pattern 342 according to the third embodiment.
- 48 to 54 are views for explaining a method of forming the water repellent film pattern 5008 according to the fifth embodiment.
- 48 to 54 are sectional views of work-in-process of the piezoelectric / electrostrictive film type element 1.
- FIG. 1
- a resist film 5002 is formed on the surface of the substrate 502 in which the base plate 104, the base plate 106, and the vibration plate 108 are stacked in the order listed.
- the resist film 5002 can be formed in a manner similar to the formation of the resist film 156.
- the resist film 5002 is a photosensitive film whose solubility in a developer increases when exposed.
- the cavity 526 is filled with a light shielding agent 560, and a mask function that shields the cavity region 182 and does not shield the non-cavity region 184 is imparted to the substrate 502.
- the filling of the light shielding agent 560 can be performed in the same manner as the filling of the light shielding agent 160. Note that it is sufficient to fill the cavity 526 with the light-shielding agent 560 before light irradiation from the back surface described below. Therefore, the resist film 556 may be formed on the surface of the substrate 502 after the cavity 526 is filled with the light shielding agent 560.
- the light shielding agent 560 the same one as the light shielding agent 160 can be used.
- the resist film 556 formed in the non-cavity region 184 is irradiated with light from the back surface side of the substrate 502.
- an unexposed portion 562 and an exposed portion 564 are formed.
- a latent image obtained by reversing and transferring the planar shape of the cavity 526 is drawn on the resist film 556.
- the exposed portion 564 of the resist film 556 formed in the non-cavity region 184 is removed by development.
- the latent image is developed by immersing the work-in-process in a developing solution and swinging to remove the exposure portion 562 and then washing the work-in-process with pure water or the like.
- a developing solution that selectively dissolves the exposed portion 564 and does not dissolve the non-exposed portion 562 is selected.
- a water repellent film 5006 is formed on the surface of the substrate 502 so as to overlap the resist pattern 5004 as shown in FIG.
- the water repellent film 5006 can be formed in the same manner as the water repellent film 4002 is formed.
- As the water repellent the same one as in the fourth embodiment can be used.
- the resist pattern 5004 and the part formed in the cavity region 182 of the water repellent film 5006, that is, the part on the resist pattern 5004) are removed.
- the removal of the resist pattern 5004 and the water repellent film 5006 is performed by allowing the solvent and the resist pattern 5004 to come into contact with each other by, for example, immersing the work-in-process in a solvent to dissolve the resist pattern 5004.
- the water repellent film pattern 5008 is completed.
- the paste is repelled by the water repellent film pattern 5008 when the lower electrode film 112 is formed. Bounce-up at is suppressed.
- the contact angle with respect to the paste is desirably 50 ° or more, and more desirably 70 ° or more.
- the removal of the water repellent film pattern 5008 can be performed in the same manner as the removal of the resist pattern 142.
- the method for manufacturing a piezoelectric / electrostrictive film type element has been described by taking as an example the case of including a single layer of piezoelectric / electrostrictive film, but also in the case of including two or more layers of piezoelectric / electrostrictive film.
- the manufacturing method of the piezoelectric / electrostrictive film type element described above can be used. That is, even when two or more piezoelectric / electrostrictive films are provided, a resist pattern is patterned using the substrate as a mask as described in the first and third embodiments, and vibration is performed using the resist pattern.
- the lowermost lower electrode film or piezoelectric / electrostrictive film constituting the laminate can be formed.
- a resist pattern is patterned using an arbitrary piezoelectric / electrostrictive film constituting the vibration laminate as a mask, and the resist pattern is used to form the resist pattern on the piezoelectric / electrostrictive film.
- An electrode film can be formed.
- a resist pattern is patterned using an arbitrary electrode film constituting the vibration laminate as a mask, and a piezoelectric / electrostrictive film is formed on the electrode film using the resist pattern. Can be formed.
- the above-described method for manufacturing a piezoelectric / electrostrictive film type element includes not only the piezoelectric / electrostrictive film type element constituting the main part of the piezoelectric / electrostrictive actuator, but also a substrate provided with a cavity and the first of the substrate.
- Piezoelectric / electrostrictive film type element having an electrode film and a piezoelectric / electrostrictive film laminated on the principal surface of the cavity, the piezoelectric film having a diaphragm structure.
- It can be utilized when manufacturing an electrostrictive resonator (FBAR; Film Bulk Acoustic Resonator) or the like.
- FBAR Film Bulk Acoustic Resonator
- Examples 1 to 3 and Comparative Examples 1 and 2 ⁇ the resist pattern 142 was formed on the surface of the substrate 102 using the method for forming the resist pattern 142 according to the first embodiment described above.
- a resist pattern 142 was formed in the same manner as in Examples 1 and 3, respectively, except that the cavity 126 was not filled with the light shielding agent 160.
- FIG. 39 is a list showing the formation conditions of the resist pattern 142 and the evaluation results of the formed resist pattern 142 in Examples 1 to 3 and Comparative Examples 1 and 2. 39 shows whether the cavity 126 is filled with the light-shielding agent 160, the type of the light-shielding agent, the thickness t1 of the base plate 104, the thickness t2 of the base plate 106, the thickness t3 of the vibration plate 108, and the resist pattern 142. The evaluation results are shown. “Dye system” described in the column of “Type of light shielding agent” shown in FIG. 39 means that a penetrating liquid containing a dye was used as a light shielding liquid, and “pigment system” includes a pigment.
- the substrate 102 was prepared by press-bonding a ceramic sheet of partially stabilized zirconium oxide and firing it at 1450 ° C., and the width W1 of the cavity 126 was 1 mm. . Further, before forming the resist film 156 on the surface of the substrate 102, the substrate 102 was heated to 600 ° C. in an electric furnace in order to clean the surface of the substrate 102.
- the resist used was an acrylic resin-based thick film product manufactured by Tokyo Ohka Kogyo.
- the rotation speed was 1500 rpm
- the holding time was 6 seconds
- the temperature when the resist film 156 was dried by a hot plate was 90 ° C.
- the time was 20 minutes.
- Multi-light USM10 manufactured by Ushio Electric Co., Ltd. which is a three-line wavelength type exposure machine of 365 nm, 405 nm, and 436 nm, was used as an exposure machine for drawing a latent image.
- the irradiation time when irradiating light from the back side of the substrate 102 was 2 minutes, and the integrated light amount was 1300 mJ / cm 2 .
- an alkaline solution which is a developer manufactured by Tokyo Ohka Kogyo Co., Ltd., dedicated to the above-described resist was used.
- the processing time for drawing the latent image was 3 minutes.
- the multi-light USM10 manufactured by Ushio Electric Co., Ltd. was used as an exposure machine for baking the exposure unit 164.
- the irradiation time when baking the exposed portion 164 was 4 minutes.
- the resist pattern 142 when the resist pattern 142 is formed on the surface of the substrate 102 using the method for forming the resist pattern 142 according to the first embodiment, when the light shielding agent 160 is filled in the cavity 126, The resolution of the resist pattern 142 can be improved, and the resolution of the resist pattern 142 can be further improved by filling the cavity 126 with the light shielding agent 160 containing a pigment. This is the same regardless of the thickness t1 of the base plate 104, the thickness t2 of the base plate 106, and the thickness t3 of the diaphragm 108.
- Example 4 the resist pattern 342 was formed on the surface of the substrate 102 using the method for forming the resist pattern 342 according to the third embodiment described above.
- FIG. 41 is a list showing the formation conditions of the resist pattern 342 and the evaluation results of the formed resist pattern 342 in Example 4. 41 lists the same items as the list of FIG. 39, such as the plate thickness t1 of the base plate 106, the plate thickness t2 of the base plate 104, the plate thickness t3 of the diaphragm 108, and the like.
- Example 4 is the same as Example 1 except that the types of resist and developer are different and a light shielding film 396 is formed on the back surface of the substrate 301 instead of filling the cavity 126 with the light shielding agent 160.
- a resist pattern 342 was formed according to the formation conditions.
- the resist pattern 342 can be formed even if the resist pattern 342 is formed on the surface of the substrate 301 by using the method for forming the resist pattern 342 according to the third embodiment. .
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Abstract
Description
第1実施形態では、空洞となるキャビティが設けられた基板と、基板の表面にキャビティと平面位置を合わせて設けられた下部電極膜、圧電/電歪体膜及び上部電極膜を積層した振動積層体とを備える圧電/電歪膜型素子の製造にあたって、キャビティに遮光剤を充填した基板をマスクとしてフォトリソグラフィ法により下部電極膜を形成する。その後に、下部電極膜に向かって圧電/電歪材料の粉末を電気泳動させることにより圧電/電歪体膜を形成するとともに、圧電/電歪体膜をマスクとしてフォトリソグラフィ法により上部電極膜を形成する。
図1~図3は、本発明の第1実施形態に係る圧電/電歪膜型素子の製造方法により製造される圧電/電歪膜型素子1の概略構造を示す模式図である。図1は、圧電/電歪膜型素子1の斜視図、図2は、図1のII-IIに沿う圧電/電歪膜型素子1の断面図、図3は、図1のIII-IIIに沿う圧電/電歪膜型素子1の断面図となっている。圧電/電歪膜型素子1は、インクジェットプリンタのヘッドに使用されるインク吐出用の圧電/電歪アクチュエータの主要部を構成する。なお、下述する圧電/電歪膜型素子の製造方法は、他の種類の圧電/電歪膜型素子の製造に利用することもできる。
基板102は、絶縁セラミックスの焼成体である。絶縁セラミックスの種類は制限されないが、耐熱性、化学的安定性及び絶縁性の観点から、酸化ジルコニウム、酸化アルミニウム、酸化マグネシウム、ムライト、窒化アルミニウム及び窒化ケイ素からなる群より選択される少なくとも1種類を含むことが望ましい。中でも、機械的強度及び靭性の観点から、安定化された酸化ジルコニウムが望ましい。ここで、「安定化された酸化ジルコニウム」とは、安定化剤の添加によって結晶の相転移を抑制した酸化ジルコニウムをいい、安定化酸化ジルコニウムの他、部分安定化酸化ジルコニウムを包含する。
下部電極膜112及び上部電極膜116は、導電材料の焼成体である。導電材料の種類は制限されないが、電気抵抗及び耐熱性の観点から、白金、パラジウム、ロジウム、金若しくは銀等の金属又はこれらを主成分とする合金であることが望ましい。中でも、耐熱性に特に優れる白金又は白金を主成分とする合金であることが望ましい。
図4~図14は、第1実施形態に係る圧電/電歪膜型素子の製造方法を説明する模式図である。図4~図14は、圧電/電歪膜型素子の仕掛品の断面図となっている。
圧電/電歪膜型素子1の製造にあたっては、まず、図4に示すように、基板102を作製する。基板102は、例えば、絶縁セラミックスをシート状に成形したグリーンシートを圧着して焼成することにより作製する。
続いて、図5に示すように、キャビティ領域182を覆わず非キャビティ領域184を覆うレジストパターン142を基板102の表面に形成する。レジストパターン142は、基板102をマスクとして基板102の表面を覆うレジスト膜をフォトリソグラフィ法によりパターニングすることにより形成する。
続いて、下部配線電極118を形成する。下部配線電極118は、導電ペーストをスクリーン印刷した後に焼成することにより形成してもよいし、導電材料を蒸着することにより形成してもよい。下部配線電極118の焼成は、下部電極膜112の焼成と同時に行うこともできる。
続いて、図9に示すように、圧電/電歪体膜114となる圧電/電歪材料膜146を形成する。圧電/電歪材料膜146の形成は、図9に示すように、圧電/電歪材料を分散媒に分散させたスラリーに、仕掛品及び対向電極150を間隔を置いて浸漬するとともに下部電極膜112と対向電極150とに電圧を印加し、圧電/電歪材料を下部電極膜112に向かって電気泳動させることにより行うことができる。これにより、下部電極膜112と同じ平面位置に下部電極膜112よりやや大きな平面形状を有する圧電/電歪材料膜146が形成される。
圧電/電歪材料膜146を焼成した後に、図11に示すように、圧電/電歪体膜114が形成された領域(以下では「圧電/電歪体領域」という)186を覆わず圧電/電歪体領域186の外側の非圧電/電歪体領域188を覆うレジストパターン152を基板102の表面に形成する。レジストパターン152は、圧電/電歪体膜114をマスクとして基板102の表面を覆うレジスト膜をフォトリソグラフィ法によりパターニングすることにより形成する。
導電材料膜154を焼成した後に、上部配線電極120を形成する。上部配線電極120は、下部配線電極118と同様に形成することができる。上部配線電極120の焼成は、上部電極膜116の焼成と同時に行うこともできる。
図15~図20は、第1実施形態に係るレジストパターン142の形成方法を説明する模式図である。図15~図20は、圧電/電歪膜型素子1の仕掛品の断面図となっている。
図21~図24は、第1実施形態に係るレジストパターン152の形成方法を説明する模式図である。図21~図24は、圧電/電歪膜型素子1の仕掛品の断面図となっている。
第2実施形態は、第1実施形態に係る圧電/電歪体膜114の形成方法に代えて採用することができる圧電/電歪体膜214の形成方法に関する。第2実施形態に係る圧電/電歪体膜214の形成方法では、下部電極膜112をマスクとしてフォトリソグラフィ法により圧電/電歪体膜214を形成する。
図25~図28は、第2実施形態に係る圧電/電歪体膜214の形成方法を説明する模式図である。図25~図28は、圧電/電歪膜型素子の仕掛品の断面図となっている。
図29~図32は、第2実施形態に係るレジストパターン276の形成方法を説明する模式図である。図29~図32は、圧電/電歪膜型素子の仕掛品の断面図となっている。
第3実施形態は、第1実施形態に係るレジストパターン142の形成方法に代えて採用することができるレジストパターン342の形成方法に関する。
図33~図38は、第3実施形態に係るレジストパターンの形成方法を説明する模式図である。図33~図38は、圧電/電歪膜型素子の仕掛品の模式図となっている。
第4実施形態は、第1実施形態のレジストパターン142を形成した後であって導電材料膜144を形成する前に望ましくは行われる導電材料膜144の端部における跳ね上がりを抑制する処理(以下では、「跳ね上がり抑制処理」という)に関する。この跳ね上がり抑制処理は、第1実施形態のレジストパターン142に代えて第3実施形態のレジストパターン342を採用した場合にも望ましくは行われる。第4実施形態は、第1実施形態又は第3実施形態においてレジストパターン142,342に対する導電ペーストの接触角を大きくすることができない場合に望ましくは採用される。
第5実施形態は、第1実施形態に係るレジストパターン142、第3実施形態に係るレジストパターン342に代えて採用することができる撥水膜パターン5008の形成方法に関する。
上述の説明では、1層の圧電/電歪体膜を備える場合を例として圧電/電歪膜型素子の製造方法を説明したが、2層以上の圧電/電歪体膜を備える場合にも上述した圧電/電歪膜型素子の製造方法を利用することができる。すなわち、2層以上の圧電/電歪体膜を備える場合にも、第1実施形態及び第3実施形態で説明したように基板をマスクとしてレジストパターンをパターニングし、当該レジストパターンを利用して振動積層体を構成する最下層の下部電極膜又は圧電/電歪体膜を形成することができる。また、第1実施形態で説明したように振動積層体を構成する任意の圧電/電歪体膜をマスクとしてレジストパターンをパターニングし、当該レジストパターンを利用して圧電/電歪体膜の上に電極膜を形成することができる。逆に、第2実施形態で説明したように振動積層体を構成する任意の電極膜をマスクとしてレジストパターンをパターニングし、当該レジストパターンを利用して電極膜の上に圧電/電歪体膜を形成することができる。
以下では、レジストパターンの形成に関する実施例を説明する。
実施例1~3では、上述した第1実施形態に係るレジストパターン142の形成方法を用いて基板102の表面にレジストパターン142を形成した。また、比較例1,2では、キャビティ126に遮光剤160を充填しなかったことを除いて、それぞれ、実施例1,3と同様にしてレジストパターン142を形成した。
実施例4では、上述した第3実施形態に係るレジストパターン342の形成方法を用いて基板102の表面にレジストパターン342を形成した。
Claims (17)
- 空洞が形成された基板と、
前記基板の第1の主面に前記空洞と平面位置を合わせて設けられた電極膜及び圧電/電歪体膜を積層した振動積層体と、
を備える圧電/電歪膜型素子の製造方法であって、
(a) 前記基板の第1の主面に第1の感光膜を形成する工程と、
(b) 前記基板の第2の主面の側から光を照射し、前記空洞の平面形状を転写した潜像を前記第1の感光膜に描写する工程と、
(c) 前記空洞が形成されている領域に形成されている前記第1の感光膜を現像により除去する工程と、
(d) 前記第1の感光膜を除去した領域に前記振動積層体を構成する最下層の膜を形成する工程と、
(e) 前記空洞が形成されていない領域に残存している前記第1の感光膜を除去する工程と、
を備える圧電/電歪膜型素子の製造方法。 - 請求項1に記載の圧電/電歪膜型素子の製造方法において、
(f) 前記工程(b)の前に前記空洞に遮光剤を充填する工程、
をさらに備え、
前記工程(b)は、
前記空洞が形成されていない領域に形成されている前記第1の感光膜を選択的に露光し、
前記工程(c)は、
前記第1の感光膜の未露光部を除去する、
圧電/電歪膜型素子の製造方法。 - 請求項2に記載の圧電/電歪膜型素子の製造方法において、
前記遮光剤が顔料を含む、
圧電/電歪膜型素子の製造方法。 - 請求項1に記載の圧電/電歪膜型素子の製造方法において、
前記工程(b)は、
前記空洞が形成されている領域に形成されている前記第1の感光膜を選択的に露光し、
前記工程(c)は、
前記第1の感光膜の露光部を除去する、
圧電/電歪膜型素子の製造方法。 - 請求項4に記載の圧電/電歪膜型素子の製造方法において、
(g) 前記工程(b)の前に前記基板の第2の主面の前記空洞が形成されていない領域に遮光膜を形成する工程、
をさらに備える圧電/電歪膜型素子の製造方法。 - 請求項5に記載の圧電/電歪膜型素子の製造方法において、
前記遮光膜が顔料を含む、
圧電/電歪膜型素子の製造方法。 - 請求項1に記載の圧電/電歪膜型素子の製造方法において、
(h) 前記工程(e)の後に前記基板の第1の主面に前記振動積層体を構成する任意の圧電/電歪体膜の上に重ねて第2の感光膜を形成する工程と、
(i) 前記基板の第2の主面の側から光を照射し、前記任意の圧電/電歪体膜が形成されていない領域に形成されている前記第2の感光膜を選択的に露光する工程と、
(j) 前記第2の感光膜の未露光部を除去する工程と、
(k) 前記第2の感光膜を除去した領域に前記振動積層体を構成する電極膜を形成する工程と、
(l) 前記任意の圧電/電歪体膜が形成されていない領域に残存している前記第2の感光膜を除去する工程と、
をさらに備える圧電/電歪膜型素子の製造方法。 - 請求項1に記載の圧電/電歪膜型素子の製造方法において、
(m) 前記工程(e)の後に前記基板の第1の主面に前記振動積層体を構成する任意の電極膜の上に重ねて第2の感光膜を形成する工程と、
(n) 前記基板の第2の主面の側から光を照射し、前記任意の電極膜が形成されていない領域に形成された前記第2の感光膜を選択的に露光する工程と、
(o) 前記第2の感光膜の未露光部を除去する工程と、
(p) 前記第2の感光膜を除去した領域に前記振動積層体を構成する圧電/電歪体膜を形成する工程と、
(q) 前記任意の電極膜が形成されていない領域に残存している前記第2の感光膜を除去する工程と、
をさらに備える圧電/電歪膜型素子の製造方法。 - 請求項1に記載の圧電/電歪膜型素子の製造方法において、
(r) 前記工程(e)の後に前記振動積層体を構成する任意の電極膜に向かって圧電/電歪材料を電気泳動させることにより前記振動積層体を構成する圧電/電歪体膜を形成する工程、
をさらに備える圧電/電歪膜型素子の製造方法。 - 請求項1に記載の圧電/電歪膜型素子の製造方法において、
(s) 前記工程(c)の後であって前記工程(d)の前に、前記空洞が形成されていない領域に残存している前記第1の感光膜を前記第1の感光膜より撥水性が高い撥水膜で被覆する工程、
をさらに備える圧電/電歪膜型素子の製造方法。 - 請求項10に記載の圧電/電歪膜型素子の製造方法において、
前記工程(s)は、
(s-1) 前記空洞が形成されていない領域に残存している前記第1の感光膜の上に重ねて前記基板の第1の主面にマスキング膜を形成する工程と、
(s-2) 前記空洞が形成されていない領域に残存している前記第1の感光膜が露出するまで前記マスキング膜を除去する工程と、
(s-3) 前記空洞が形成されていない領域に残存している前記撥水膜及び前記空洞が形成されている領域に残存している前記マスキング膜の上に重ねて前記基板の第1の主面に撥水膜を形成する工程と、
(s-4) 前記空洞が形成されている領域に残存している前記第1の感光膜及び前記空洞が形成されている領域に形成されている前記マスキング膜を除去する工程と、
を備える圧電/電歪膜型素子の製造方法。 - 空洞が形成された基板と、
前記基板の第1の主面に前記空洞と平面位置を合わせて設けられた電極膜及び圧電/電歪体膜を積層した振動積層体と、
を備える圧電/電歪膜型素子の製造方法であって、
(a) 前記基板の第1の主面に第1の感光膜を形成する工程と、
(b) 前記基板の第2の主面の側から光を照射し、前記空洞の平面形状を転写した潜像を前記第1の感光膜に描写する工程と、
(c) 前記空洞が形成されていない領域に形成されている前記第1の感光膜を現像により除去する工程と、
(d) 前記空洞が形成されている領域に残存している前記第1の感光膜の上に重ねて前記基板の第1の主面に撥水膜を形成する工程と、
(e) 前記空洞が形成されている領域に残存している前記第1の感光膜及び前記空洞が形成されている領域に形成されている前記撥水膜を除去する工程と、
(f) 前記第1の感光膜及び前記撥水膜を除去した領域に前記振動積層体を構成する最下層の膜を形成する工程と、
(g) 前記空洞が形成されていない領域に残存している前記撥水膜を除去する工程と、
を備える圧電/電歪膜型素子の製造方法。 - 請求項12に記載の圧電/電歪膜型素子の製造方法において、
(h) 前記工程(b)の前に前記空洞に遮光剤を充填する工程、
をさらに備え、
前記工程(b)は、
前記空洞が形成されていない領域に形成されている前記第1の感光膜を選択的に露光し、
前記工程(c)は、
前記第1の感光膜の露光部を除去する、
圧電/電歪膜型素子の製造方法。 - 請求項13に記載の圧電/電歪膜型素子の製造方法において、
前記遮光剤が顔料を含む、
圧電/電歪膜型素子の製造方法。 - 請求項12に記載の圧電/電歪膜型素子の製造方法において、
(i) 前記工程(g)の後に前記基板の第1の主面に前記振動積層体を構成する任意の圧電/電歪体膜の上に重ねて第2の感光膜を形成する工程と、
(j) 前記基板の第2の主面の側から光を照射し、前記任意の圧電/電歪体膜が形成されていない領域に形成されている前記第2の感光膜を選択的に露光する工程と、
(k) 前記第2の感光膜の未露光部を除去する工程と、
(l) 前記第2の感光膜を除去した領域に前記振動積層体を構成する電極膜を形成する工程と、
(m) 前記任意の圧電/電歪体膜が形成されていない領域に残存している前記第2の感光膜を除去する工程と、
をさらに備える圧電/電歪膜型素子の製造方法。 - 請求項12に記載の圧電/電歪膜型素子の製造方法において、
(n) 前記工程(g)の後に前記基板の第1の主面に前記振動積層体を構成する任意の電極膜の上に重ねて第2の感光膜を形成する工程と、
(o) 前記基板の第2の主面の側から光を照射し、前記任意の電極膜が形成されていない領域に形成された前記第2の感光膜を選択的に露光する工程と、
(p) 前記第2の感光膜の未露光部を除去する工程と、
(q) 前記第2の感光膜を除去した領域に前記振動積層体を構成する圧電/電歪体膜を形成する工程と、
(r) 前記任意の電極膜が形成されていない領域に残存している前記第2の感光膜を除去する工程と、
をさらに備える圧電/電歪膜型素子の製造方法。 - 請求項12に記載の圧電/電歪膜型素子の製造方法において、
(s) 前記工程(g)の後に前記振動積層体を構成する任意の電極膜に向かって圧電/電歪材料を電気泳動させることにより前記振動積層体を構成する圧電/電歪体膜を形成する工程、
をさらに備える圧電/電歪膜型素子の製造方法。
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JP2009529447A JP5281576B2 (ja) | 2008-03-06 | 2009-03-05 | 圧電/電歪膜型素子の製造方法 |
CN2009801003184A CN101796664B (zh) | 2008-03-06 | 2009-03-05 | 压电/电致伸缩膜型元件的制造方法 |
EP09718335.4A EP2251917B1 (en) | 2008-03-06 | 2009-03-05 | Manufacturing method for piezoelectric/electrostrictive film type element |
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US (1) | US8178285B2 (ja) |
EP (1) | EP2251917B1 (ja) |
JP (1) | JP5281576B2 (ja) |
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Cited By (4)
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WO2011125853A1 (ja) * | 2010-03-31 | 2011-10-13 | 日本碍子株式会社 | 圧電膜型デバイスの製造方法 |
JP2012204561A (ja) * | 2011-03-25 | 2012-10-22 | Ngk Insulators Ltd | 電子部品の製造方法 |
JP2013143456A (ja) * | 2012-01-10 | 2013-07-22 | Ricoh Co Ltd | 電気−機械変換素子、液体吐出ヘッド、液滴吐出装置および画像形成装置 |
JP2013154571A (ja) * | 2012-01-31 | 2013-08-15 | Seiko Epson Corp | 液体噴射ヘッドの製造方法 |
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CN105811914B (zh) * | 2016-02-25 | 2019-03-05 | 锐迪科微电子(上海)有限公司 | 一种体声波器件、集成结构及制造方法 |
US10965271B2 (en) * | 2017-05-30 | 2021-03-30 | Samsung Electro-Mechanics Co., Ltd. | Acoustic resonator and method for fabricating the same |
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JP5281576B2 (ja) | 2013-09-04 |
EP2251917A1 (en) | 2010-11-17 |
US8178285B2 (en) | 2012-05-15 |
JPWO2009110543A1 (ja) | 2011-07-14 |
CN101796664B (zh) | 2013-03-13 |
EP2251917B1 (en) | 2015-09-02 |
US20090317750A1 (en) | 2009-12-24 |
CN101796664A (zh) | 2010-08-04 |
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