WO2008081855A1 - 水素透過膜、及びその製造方法 - Google Patents

水素透過膜、及びその製造方法 Download PDF

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Publication number
WO2008081855A1
WO2008081855A1 PCT/JP2007/075082 JP2007075082W WO2008081855A1 WO 2008081855 A1 WO2008081855 A1 WO 2008081855A1 JP 2007075082 W JP2007075082 W JP 2007075082W WO 2008081855 A1 WO2008081855 A1 WO 2008081855A1
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Prior art keywords
hydrogen permeable
permeable film
manufacturing
same
ceramic material
Prior art date
Application number
PCT/JP2007/075082
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English (en)
French (fr)
Inventor
Katsuhiko Fukui
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Mikuni Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mikuni Corporation filed Critical Mikuni Corporation
Priority to EP07860304.0A priority Critical patent/EP2127733B1/en
Priority to JP2008552145A priority patent/JP5363121B2/ja
Priority to US12/519,024 priority patent/US8147596B2/en
Publication of WO2008081855A1 publication Critical patent/WO2008081855A1/ja

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/14—Dynamic membranes
    • B01D69/141—Heterogeneous membranes, e.g. containing dispersed material; Mixed matrix membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039—Inorganic membrane manufacture
    • B01D67/0072—Inorganic membrane manufacture by deposition from the gaseous phase, e.g. sputtering, CVD, PVD
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/0215—Silicon carbide; Silicon nitride; Silicon oxycarbide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/022—Metals
    • B01D71/0221—Group 4 or 5 metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/022—Metals
    • B01D71/0223—Group 8, 9 or 10 metals
    • B01D71/02231—Palladium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/501—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion
    • C01B3/503—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion characterised by the membrane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/501—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion
    • C01B3/503—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion characterised by the membrane
    • C01B3/505—Membranes containing palladium
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/06—Epitaxial-layer growth by reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/16—Oxides
    • C30B29/22—Complex oxides
    • C30B29/30—Niobates; Vanadates; Tantalates
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/16—Oxides
    • C30B29/22—Complex oxides
    • C30B29/32—Titanates; Germanates; Molybdates; Tungstates
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/38—Nitrides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2325/00—Details relating to properties of membranes
    • B01D2325/04—Characteristic thickness
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2325/00—Details relating to properties of membranes
    • B01D2325/30—Chemical resistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/022—Metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/024—Oxides

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

　　本発明により、ＩＶａ、Ｖａ、又はＶＩａ族に属する金属元素の窒化物又は酸化物からなるセラミックス材料と、前記セラミックス材料中に分散させてなるパラジウム（Ｐｄ）、ニオブ（Ｎｂ）、バナジウム（Ｖ）、タンタル（Ｔａ）及びこれらの合金から選ばれる少なくとも１種の水素透過性金属粒子とを有する水素透過膜であって、該水素透過膜中の水素透過性金属粒子の割合が２０～７０質量％であり、該水素透過膜の厚みが５～１０００ｎｍである水素透過膜が開示される。
PCT/JP2007/075082 2006-12-28 2007-12-27 水素透過膜、及びその製造方法 WO2008081855A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP07860304.0A EP2127733B1 (en) 2006-12-28 2007-12-27 Hydrogen permeable film and method for manufacturing the same
JP2008552145A JP5363121B2 (ja) 2006-12-28 2007-12-27 水素透過膜、及びその製造方法
US12/519,024 US8147596B2 (en) 2006-12-28 2007-12-27 Hydrogen permeable film and method for manufacturing the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-356427 2006-12-28
JP2006356427 2006-12-28

Publications (1)

Publication Number Publication Date
WO2008081855A1 true WO2008081855A1 (ja) 2008-07-10

Family

ID=39588537

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/075082 WO2008081855A1 (ja) 2006-12-28 2007-12-27 水素透過膜、及びその製造方法

Country Status (4)

Country Link
US (1) US8147596B2 (ja)
EP (1) EP2127733B1 (ja)
JP (1) JP5363121B2 (ja)
WO (1) WO2008081855A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013066877A (ja) * 2011-09-26 2013-04-18 Toshiba Corp 減酸素素子、減酸素装置及び冷蔵庫
WO2017018482A1 (ja) * 2015-07-28 2017-02-02 北川工業株式会社 逆浸透膜の製造方法
JP2017064692A (ja) * 2015-07-28 2017-04-06 北川工業株式会社 逆浸透膜の製造方法
WO2018212338A1 (ja) * 2017-05-18 2018-11-22 公益財団法人地球環境産業技術研究機構 多孔質構造体
JP2021018164A (ja) * 2019-07-22 2021-02-15 株式会社住化分析センター ガス透過セル、ガス透過度測定方法、及びガス透過度測定装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2538577C2 (ru) * 2013-01-22 2015-01-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Воронежский государственный университет" (ФГОУ ВПО "ВГУ") Способ создания композиционной мембраны для очистки водорода
KR102130069B1 (ko) * 2013-09-06 2020-07-03 삼성전자주식회사 분리막, 이를 포함하는 수소 분리막, 및 상기 분리막의 제조 방법
CN109957772A (zh) * 2017-12-26 2019-07-02 北京有色金属研究总院 一种钯/陶瓷复合薄膜

Citations (8)

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Publication number Priority date Publication date Assignee Title
JPH07775A (ja) 1993-06-15 1995-01-06 Japan Pionics Co Ltd 水素透過膜
JP2000189771A (ja) * 1998-12-25 2000-07-11 Ngk Insulators Ltd 水素分離体
JP2002071611A (ja) * 2000-08-30 2002-03-12 Fis Kk 水素ガスセンサ
JP2002336664A (ja) 2001-05-14 2002-11-26 Japan Steel Works Ltd:The 水素透過膜ユニット及びその製造方法
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JPH07775A (ja) 1993-06-15 1995-01-06 Japan Pionics Co Ltd 水素透過膜
JP2000189771A (ja) * 1998-12-25 2000-07-11 Ngk Insulators Ltd 水素分離体
JP2002071611A (ja) * 2000-08-30 2002-03-12 Fis Kk 水素ガスセンサ
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JP2005058822A (ja) * 2003-08-13 2005-03-10 Ngk Insulators Ltd 選択透過膜型反応器
JP2005270966A (ja) 2004-02-27 2005-10-06 Mikuni Corp 水素透過膜及びその製造方法
JP2006204990A (ja) * 2005-01-26 2006-08-10 Nissan Motor Co Ltd 水素分離膜及びその製造方法
JP2006314925A (ja) * 2005-05-12 2006-11-24 Toyota Motor Corp 水素透過膜およびそれを備えた燃料電池

Non-Patent Citations (2)

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KITANO M. ET AL.: "Decomposition of water in the separate evolution of hydrogen and oxygen using visible light-responsive TiO2 thin film photocatalysis: Effect of the work function of the substrates on the yield of the reaction", APPLIED CATALYSIS, vol. 314, no. 2, 2006, pages 179 - 183, XP025142525 *
See also references of EP2127733A4

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013066877A (ja) * 2011-09-26 2013-04-18 Toshiba Corp 減酸素素子、減酸素装置及び冷蔵庫
WO2017018482A1 (ja) * 2015-07-28 2017-02-02 北川工業株式会社 逆浸透膜の製造方法
JP2017064692A (ja) * 2015-07-28 2017-04-06 北川工業株式会社 逆浸透膜の製造方法
KR20180023964A (ko) * 2015-07-28 2018-03-07 키타가와고우교가부시끼가이샤 역침투막의 제조 방법
CN107847877A (zh) * 2015-07-28 2018-03-27 北川工业株式会社 反渗透膜的制造方法
KR101981644B1 (ko) 2015-07-28 2019-05-23 키타가와고우교가부시끼가이샤 역침투막의 제조 방법
US10751668B2 (en) 2015-07-28 2020-08-25 Kitagawa Industries Co., Ltd. Method of forming reverse osmosis membrane
WO2018212338A1 (ja) * 2017-05-18 2018-11-22 公益財団法人地球環境産業技術研究機構 多孔質構造体
JP2021018164A (ja) * 2019-07-22 2021-02-15 株式会社住化分析センター ガス透過セル、ガス透過度測定方法、及びガス透過度測定装置
JP7293022B2 (ja) 2019-07-22 2023-06-19 株式会社住化分析センター ガス透過セル、ガス透過度測定方法、及びガス透過度測定装置

Also Published As

Publication number Publication date
US20100083836A1 (en) 2010-04-08
JP5363121B2 (ja) 2013-12-11
US8147596B2 (en) 2012-04-03
JPWO2008081855A1 (ja) 2010-04-30
EP2127733A1 (en) 2009-12-02
EP2127733B1 (en) 2013-07-03
EP2127733A4 (en) 2012-12-05

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