WO2007110552A2 - Systeme de couches a faible emissivite et haute tenue a la chaleur pour substrats transparents - Google Patents
Systeme de couches a faible emissivite et haute tenue a la chaleur pour substrats transparents Download PDFInfo
- Publication number
- WO2007110552A2 WO2007110552A2 PCT/FR2007/051032 FR2007051032W WO2007110552A2 WO 2007110552 A2 WO2007110552 A2 WO 2007110552A2 FR 2007051032 W FR2007051032 W FR 2007051032W WO 2007110552 A2 WO2007110552 A2 WO 2007110552A2
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- WO
- WIPO (PCT)
- Prior art keywords
- layer
- zno
- layers
- partial
- mixed oxide
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31598—Next to silicon-containing [silicone, cement, etc.] layer
- Y10T428/31601—Quartz or glass
Definitions
- the invention relates to a low-emissivity and heat treatment-resistant layer system for transparent substrates, in particular glass panes, which has at least from the substrate a lower antireflection coating consisting of a plurality of partial layers and having a layer essentially consisting of ZnO to which is adjacent a silver-based functional layer, a substantially metallic blocking layer located above the silver-based layer, an upper antireflection coating consisting of several partial layers and a possibly covering coating consisting of several partial layers, the layers being applied by vacuum spraying.
- the present invention also relates to a glazing incorporating at least one carrier substrate of a layer system according to the invention.
- heat-treated high temperature layer systems is meant layer systems which withstand the temperatures of about 600-750 ° C. necessary for the bending and / or tempering operation of glass substrates without being destroyed and without losing their essential properties, namely a high transmission in the visible range of the spectrum, a high reflection in the range of thermal radiation, a low dispersion, a high neutrality of hue, a high mechanical resistance and high chemical resistance.
- these layer systems are also called “hardenable” and / or “bumpy”. Basically, of course, it is also possible to deposit these layer systems on substrates which are not subsequently thermally treated.
- both these known layer systems and the layer systems according to the invention are suitable also for transparent substrates made of synthetic material.
- Functional layers are generally metal layers that can be intrinsically used for thermal insulation (heat reflection).
- the functional layer of the present layer systems is silver-based or essentially silver (which has a positive effect on the color neutrality of the layer system), but also known other materials for functional layers, for example gold and copper.
- the antireflection layers are all made of silicon nitride (Si 3 N 4 ) which is separated from the silver functional layer by thin CrNi blocking layers and / or NiCrO x .
- the anti-reflective layers consist of oxide layers.
- These layer systems whose antireflection layers consist of pure oxides are described for example in the documents DE 198 52 358 C1, EP 0 991 92 B1, EP 1 538 131 A1 and WO 2004/058660 A1.
- These layer systems can also be equipped with upper layer of metal nitride and in particular Si 3 N 4 .
- EP 0 718 250 B1 discloses quenchable layer systems with anti-reflective layers of oxides, nitrides or carbides and in which the silver-based functional layer is covered by a metal blocking layer which may consist for example of Nb, Ta, Ti, Cr or Ni or an alloy of at least two of these metals.
- a thin ZnO intermediate layer is disposed between the Nb blocking layer disposed on the silver layer and the upper Si 3 N 4 antireflection layer.
- DE 102 35 154 B4 discloses a high heat resistant layer system of the type indicated at the beginning and provided with a titanium alloy blocking layer. This document also discloses layer systems in which a ZnO layer optionally doped with Al is applied to the metal blocking layer, a layer of Si 3 N 4 which is part of the upper antireflection coating such as the ZnO layer being disposed on this layer. layer of ZnO.
- DE 101 05 199 C1 discloses a high heat resistant layer structure with oxide anti-reflection layers in which an intermediate layer of 0.5 to 5 nm thickness of metal nitride is provided. for example Si 3 N 4 or AlN, is disposed between the silver layer and the metal blocking layer disposed above the silver layer.
- EP 1 238 950 A2 and EP 1 583 723 A1 disclose quenchable layer systems which optionally have a plurality of silver functional layers and nitride antireflection layers or nitride partial layers which form the antireflection layers, and in which which a succession of layers in NiCrO x - SnO 2 - Si 3 N 4 is placed above the silver functional layer.
- WO 97/48649 also discloses high heat resistant layer systems which are provided with silver functional layers and Si 3 N 4 antireflection layers.
- the succession of layers situated above the upper layer of silver may also consist of Nb - ZnO - TiN - Si 3 N 4 .
- the problem underlying the invention is to further improve the mechanical properties and chemical properties of high heat-resistant layer systems and to develop layer systems that have good optical properties and high strength. technical manipulations.
- the invention solves this problem with the arrangements described in claim 1.
- the detailed dependent claims have particularly advantageous features.
- a relatively high hardness and good properties of manipulation of the layer system with the known sequence of Si 3 N 4 -ZnO above and / or above the silver layer can already be obtained basically, with this succession of layers, quality defects are sometimes observed in the production and subsequent processing operations.
- these quality defects can be avoided by intercalating according to the invention a separation layer into a metal oxide or a mixed oxide cubic lattice.
- Si 3 N 4 is an amorphous material which has marked isotropic properties
- ZnO is a crystalline material with a very dense hexagonal stack and anisotropic properties.
- Anisotropy is caused by the spatial structure of the network and manifests itself for example in elasticity, hardness, peelability and thermal elongation, depending on the dependence of these properties on from the direction.
- the layer of intercalated cubic lattice crystalline material as the separation layer is optically isotropic, but as far as its mechanical properties are concerned, it behaves as an anisotropic material. It thus performs a dual function and in this way acts as a reinforcing layer for the bond between the Si 3 N 4 layer and the ZnO layer.
- materials for the cubic lattice separation layer are suitable for example layers based on or consisting of NiCrO x , Al 2 O 3 , MgAlO x , TiAlO x , NiAlO x and NiO.
- the mixed oxide layer which contains ZnO may be based on or consisting of ZnSnO x , ZnAlO x , ZnBiO x , ZnSbO x or ZnInO x . (in the usual way, letters in index indicate numbers to obtain some stoichiometry).
- the succession of partial layers of the upper antireflection coating proposed by the invention that is to say the arrangement of a separation layer in a metal oxide or a mixed oxide with cubic crystal lattice between the partial layer which contains the ZnO and in an advantageous development of the invention, the silicon nitride partial layer may alternatively or cumulatively also be produced inside the lower antireflection coating of the layer system.
- a lower antireflection coating and / or an upper antireflection coating which has:
- a separation layer with a thickness of 0.5 to 5 nm, consisting of a metal oxide or a mixed oxide with a cubic crystal lattice, which prevents direct contact between these two partial layers by direct contact.
- the layer systems according to the invention can also have in particular the following arrangements of the partial layers: substrate (glass) / Si 3 N 4 / ZnO: Al / Ag / NiCr / ZnO: Al /
- ZnO Al / NiCrO x / Si 3 N 4 / (cover layer) substrate (glass) / Si 3 N 4 / ZnSnO x / ZnO: Al / Ag / NiCr /
- ZnO Al / NiCrO x / Si 3 N 4 / (cover layer) substrate (glass) / Si 3 N 4 / NiCrO x / ZnSnO x / ZnO: Al / Ag /
- a first advantageous covering layer consists of TiZrHf (C x OyN 2 ).
- This covering layer is sprayed from a metal target of TiZrHf with N 2 working gas supplemented with 0.5% CH 4 .
- CH 4 the necessary carbon in the working gas which surrounds the TiZrHf target by the hydrocarbons present in the pumping system at a low level of suction capacity, as well as basically disclosed EP 0 270 024 B 1 in which the sputtering of TiC x OyN 2 layers. Oxygen incorporation occurs immediately when the layer comes in contact with the atmosphere.
- WO 2004/71984 A1 discloses quenchable layer systems in which the cover layer may consist of oxynitrides, oxycarbides and carbonitrides of Ti, Zr and other elements of groups IVb, Vb and VIb of the periodic system.
- the cover layer may consist of oxynitrides, oxycarbides and carbonitrides of Ti, Zr and other elements of groups IVb, Vb and VIb of the periodic system.
- these known layer systems are mixtures of individual compounds and this layer is not identical to the complex and homogeneous bonding structure provided in the invention.
- Another advantageous covering layer consists of an oxidized pure layer of TiZrHfYO x .
- This oxidized coating layer is preferably sprayed from an oxidized conductive ceramic target which contains, based on the ZrO 2 content, from 5 to 10% by weight of Y 2 O 3 .
- This layer is preferably sprayed from a tubular target in a working atmosphere of Ar / O 2 .
- ASTM 2486 It is measured to what extent defects in the layer can be observed after 300 strokes.
- a needle biased by a weight on the layer is fired at a defined speed, both before quenching (v) and after quenching (n).
- the weight for which scratches are visible is a measure of the scratch resistance.
- This test is performed after prestressing by rubbing the layer with a cloth impregnated with alcohol. You can not see any friction spots.
- the ZnOiAl layers are sprayed from a ZnAl metal target which contains 2% by weight of Al.
- the blocking layer disposed on the silver layer is sprayed with argon as the working gas from a NiCr metal target consisting of 80% by weight of Ni and 20% by weight of Cr.
- the silicon nitride antireflection upper layer is sprayed under reactive conditions with a working gas of Ar / N 2 from a Si target and the upper covering layer (“topcoat" layer) is also sprayed under conditions reactive with ArO 2 working gas from a metal target of ZnTi alloy which has 73% by weight of Zn and 27% by weight of Ti.
- topcoat upper covering layer
- a 4 mm thick floatr glass pane was coated with the following layer system: glass / 25Si 3 N 4 / 9ZnO: Al / 11, 5Ag / 3.5NiCr / 5ZnO: Al /
- the ZnO: Al layers, the NiCr layer and the Si 3 N 4 layers are sprayed under the same conditions as those indicated in the comparative example.
- the target used for the deposition of the TiZrHf covering layer (C x OyN 2 ) consists of an alloy of TiZrHf at 55% by weight of Ti, 44% by weight of Zr and 1% by weight of Hf and is sprayed with a mixture of Ar and N 2 as working gas.
- the incorporation of C into the covering layer is carried out from the residual gas present in the installation after lowering the suction power on this cathode and the incorporation of 0 also takes place from the residual gas, but also from the atmosphere after the layer has been brought into contact with the cathode. outside atmosphere.
- the XPS / ESCA and AES measurements made on this overlay layer have a good correspondence with the data of the structure Me-carbooxynitride disclosed in the literature.
- a 4 mm thick float glass pane was coated with the following layer system: glass / 25Si 3 N 4 / 2.5NiCrO x / 9Zn0: Al / 11.5Ag / 3.5NiCr /
- the TiZrHfYO x cover layer is deposited from a tubular ceramic target made of a conductive oxidized material.
- the oxidized material is prepared from a metal alloy which comprises 56% by weight of Ti, 40% by weight of Zr, 1% by weight of Hf and 3% by weight of Y.
- the other layers are pulverized in the same conditions than in the previous examples.
- this layer system is reproducibly free of roughness and when examined under daylight or under halogen light.
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- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
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- Metallurgy (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2007800123512A CN101415652B (zh) | 2006-03-29 | 2007-03-28 | 用于透明基材的高度耐热的具有低发射性多层体系 |
CA 2647412 CA2647412A1 (fr) | 2006-03-29 | 2007-03-28 | Systeme de couches a faible emissivite et haute tenue a la chaleur pour substrats transparents |
US12/295,090 US8043707B2 (en) | 2006-03-29 | 2007-03-28 | Highly heat-resistant low-emissivity multilayer system for transparent substrates |
EA200870383A EA015326B1 (ru) | 2006-03-29 | 2007-03-28 | Термостойкая многослойная система c низкой излучательной способностью для прозрачных подложек |
KR1020087023853A KR101400420B1 (ko) | 2006-03-29 | 2007-03-28 | 투명한 기판을 위한 높은 열-저항 저-방사율 다층 시스템 |
BRPI0709920-7A BRPI0709920A2 (pt) | 2006-03-29 | 2007-03-28 | sistema de camadas de baixa emissividade e de alta resistÊncia ao tratamento tÉrmico para substratos transparentes, em particular para vidraÇas, e, vidraÇa |
EP07731838A EP2001813A2 (fr) | 2006-03-29 | 2007-03-28 | Systeme de couches a faible emissivite et haute tenue a la chaleur pour substrats transparents. |
JP2009502171A JP5529528B2 (ja) | 2006-03-29 | 2007-03-28 | 透明支持体の高耐熱性低輻射率多層系 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE200610014796 DE102006014796B4 (de) | 2006-03-29 | 2006-03-29 | Thermisch hoch belastbares Low-E-Schichtsystem für transparente Substrate |
DE102006014796.0 | 2006-03-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007110552A2 true WO2007110552A2 (fr) | 2007-10-04 |
WO2007110552A3 WO2007110552A3 (fr) | 2007-11-15 |
Family
ID=38438680
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/FR2007/051032 WO2007110552A2 (fr) | 2006-03-29 | 2007-03-28 | Systeme de couches a faible emissivite et haute tenue a la chaleur pour substrats transparents |
Country Status (10)
Country | Link |
---|---|
US (1) | US8043707B2 (fr) |
EP (1) | EP2001813A2 (fr) |
JP (1) | JP5529528B2 (fr) |
KR (1) | KR101400420B1 (fr) |
CN (1) | CN101415652B (fr) |
BR (1) | BRPI0709920A2 (fr) |
CA (1) | CA2647412A1 (fr) |
DE (1) | DE102006014796B4 (fr) |
EA (1) | EA015326B1 (fr) |
WO (1) | WO2007110552A2 (fr) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2008096089A2 (fr) | 2007-01-05 | 2008-08-14 | Saint-Gobain Glass France | Procede de depot de couche mince et produit obtenu |
WO2010134957A3 (fr) * | 2009-05-22 | 2011-04-07 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) | Article revêtu d'une couche à faible émissivité ayant une couche à base de stannate de zinc entre les couches réfléchissant l'infrarouge pour une réduction des marbrures et procédé correspondant |
JP2011515314A (ja) * | 2008-03-20 | 2011-05-19 | エージーシー グラス ユーロップ | フィルム被覆板ガラス |
JP2011515313A (ja) * | 2008-03-20 | 2011-05-19 | エージーシー グラス ユーロップ | フィルム被覆板ガラス |
JP2011515312A (ja) * | 2008-03-20 | 2011-05-19 | エージーシー グラス ユーロップ | フィルム被覆板ガラス |
WO2012007737A1 (fr) * | 2010-07-13 | 2012-01-19 | Pilkington Group Limited | Électrode avant transparente pour dispositif photovoltaïque |
US20120225317A1 (en) * | 2011-03-03 | 2012-09-06 | Guardian Industries Corp. | Barrier layers comprising Ni-inclusive ternary alloys, coated articles including barrier layers, and methods of making the same |
CN103643210A (zh) * | 2013-11-14 | 2014-03-19 | 中山市创科科研技术服务有限公司 | 一种低成本低辐射率薄膜的制备方法 |
DE202008018513U1 (de) | 2008-01-04 | 2014-10-31 | Saint-Gobain Glass France | Dispositif |
RU2656284C2 (ru) * | 2013-04-30 | 2018-06-04 | Сэн-Гобэн Гласс Франс | Подложка, снабженная стеклопакетом с тепловыми свойствами |
EP3233749B1 (fr) | 2014-12-19 | 2020-04-29 | Saint-Gobain Glass France | Vitrage utilise comme un element constitutif d'un dispositif chauffant |
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Publication number | Priority date | Publication date | Assignee | Title |
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DE102008007981B4 (de) * | 2008-02-07 | 2009-12-03 | Saint-Gobain Sekurit Deutschland Gmbh & Co. Kg | Thermisch hoch belastbares Schichtsystem für transparente Substrate und Verwendung zur Beschichtung eines transparenten flächigen Substrats |
GB0823501D0 (en) | 2008-12-24 | 2009-01-28 | Pilkington Group Ltd | Heat treatable coated glass pane |
JP2011054708A (ja) * | 2009-09-01 | 2011-03-17 | Elpida Memory Inc | 絶縁膜およびその製造方法、半導体装置、ならびにデータ処理システム |
DE102009051796A1 (de) | 2009-11-03 | 2011-05-05 | Kramer & Best Process Engineering Gmbh | Thermisch belastbares Schichtsystem |
TWI408183B (zh) | 2010-12-07 | 2013-09-11 | Ind Tech Res Inst | 隔熱材料及其製造方法 |
DE102011000800A1 (de) * | 2011-02-17 | 2012-08-23 | Glas Trösch Holding AG | Beschichtungsverfahren, Schichtsystem sowie Verglasungselement |
US8679633B2 (en) | 2011-03-03 | 2014-03-25 | Guardian Industries Corp. | Barrier layers comprising NI-inclusive alloys and/or other metallic alloys, double barrier layers, coated articles including double barrier layers, and methods of making the same |
GB201106788D0 (en) | 2011-04-21 | 2011-06-01 | Pilkington Group Ltd | Heat treatable coated glass pane |
CN102757185B (zh) * | 2012-07-26 | 2014-08-20 | 福耀玻璃工业集团股份有限公司 | 一种可热处理的低辐射镀膜玻璃及其夹层玻璃制品 |
US8900729B2 (en) * | 2012-11-19 | 2014-12-02 | Guardian Industries Corp. | Coated article with low-E coating including zinc oxide inclusive layer(s) with additional metal(s) |
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WO2008096089A2 (fr) | 2007-01-05 | 2008-08-14 | Saint-Gobain Glass France | Procede de depot de couche mince et produit obtenu |
DE202008018514U1 (de) | 2007-01-05 | 2014-10-30 | Saint-Gobain Glass France | Material |
EP2792650A1 (fr) | 2007-01-05 | 2014-10-22 | Saint-Gobain Glass France | Procédé de dépôt de couche mince et produit obtenu |
EP2792651A1 (fr) | 2007-01-05 | 2014-10-22 | Saint-Gobain Glass France | Procede de depot de couche mince et produit obtenu |
DE202008018513U1 (de) | 2008-01-04 | 2014-10-31 | Saint-Gobain Glass France | Dispositif |
JP2011515312A (ja) * | 2008-03-20 | 2011-05-19 | エージーシー グラス ユーロップ | フィルム被覆板ガラス |
EP2262744B2 (fr) † | 2008-03-20 | 2022-12-28 | AGC Glass Europe | Vitrage revêtu de couches minces |
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EP2262744B1 (fr) | 2008-03-20 | 2020-01-08 | AGC Glass Europe | Vitrage revêtu de couches minces |
EP2262745B1 (fr) | 2008-03-20 | 2019-01-23 | AGC Glass Europe | Vitrage revetu de couches minces |
JP2011515313A (ja) * | 2008-03-20 | 2011-05-19 | エージーシー グラス ユーロップ | フィルム被覆板ガラス |
JP2011515314A (ja) * | 2008-03-20 | 2011-05-19 | エージーシー グラス ユーロップ | フィルム被覆板ガラス |
EP2262743B1 (fr) | 2008-03-20 | 2019-05-22 | AGC Glass Europe | Vitrage revêtu de couches minces |
US8281617B2 (en) | 2009-05-22 | 2012-10-09 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) | Coated article with low-E coating having zinc stannate based layer between IR reflecting layers for reduced mottling and corresponding method |
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WO2010134957A3 (fr) * | 2009-05-22 | 2011-04-07 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) | Article revêtu d'une couche à faible émissivité ayant une couche à base de stannate de zinc entre les couches réfléchissant l'infrarouge pour une réduction des marbrures et procédé correspondant |
US9789750B2 (en) | 2009-05-22 | 2017-10-17 | Centre Luxembourgeois de Recherches pour la Verre et la Ceramique S.A. (C.R.V.C.) | Coated article with low-E coating having zinc stannate based layer between IR reflecting layers for reduced mottling and corresponding method |
WO2012007737A1 (fr) * | 2010-07-13 | 2012-01-19 | Pilkington Group Limited | Électrode avant transparente pour dispositif photovoltaïque |
US20120225317A1 (en) * | 2011-03-03 | 2012-09-06 | Guardian Industries Corp. | Barrier layers comprising Ni-inclusive ternary alloys, coated articles including barrier layers, and methods of making the same |
US9005763B2 (en) | 2011-03-03 | 2015-04-14 | Guardian Industries Corp. | Barrier layers comprising Ni-inclusive ternary alloys, coated articles including barrier layers, and methods of making the same |
US20140186636A1 (en) * | 2011-03-03 | 2014-07-03 | Guardian Industries Corp. | Barrier layers comprising ni-inclusive ternary alloys, coated articles including barrier layers, and methods of making the same |
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RU2656284C2 (ru) * | 2013-04-30 | 2018-06-04 | Сэн-Гобэн Гласс Франс | Подложка, снабженная стеклопакетом с тепловыми свойствами |
CN103643210A (zh) * | 2013-11-14 | 2014-03-19 | 中山市创科科研技术服务有限公司 | 一种低成本低辐射率薄膜的制备方法 |
EP3233749B1 (fr) | 2014-12-19 | 2020-04-29 | Saint-Gobain Glass France | Vitrage utilise comme un element constitutif d'un dispositif chauffant |
Also Published As
Publication number | Publication date |
---|---|
KR101400420B1 (ko) | 2014-05-27 |
EA200870383A1 (ru) | 2009-04-28 |
KR20080106952A (ko) | 2008-12-09 |
CN101415652A (zh) | 2009-04-22 |
CA2647412A1 (fr) | 2007-10-04 |
DE102006014796B4 (de) | 2009-04-09 |
JP5529528B2 (ja) | 2014-06-25 |
WO2007110552A3 (fr) | 2007-11-15 |
BRPI0709920A2 (pt) | 2011-07-26 |
CN101415652B (zh) | 2013-03-13 |
DE102006014796A1 (de) | 2007-10-04 |
US20100178492A1 (en) | 2010-07-15 |
US8043707B2 (en) | 2011-10-25 |
EP2001813A2 (fr) | 2008-12-17 |
EA015326B1 (ru) | 2011-06-30 |
JP2009531266A (ja) | 2009-09-03 |
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