WO2006048982A1 - 気密封止用キャップ、気密封止用キャップの製造方法および電子部品収納用パッケージ - Google Patents
気密封止用キャップ、気密封止用キャップの製造方法および電子部品収納用パッケージ Download PDFInfo
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- WO2006048982A1 WO2006048982A1 PCT/JP2005/017599 JP2005017599W WO2006048982A1 WO 2006048982 A1 WO2006048982 A1 WO 2006048982A1 JP 2005017599 W JP2005017599 W JP 2005017599W WO 2006048982 A1 WO2006048982 A1 WO 2006048982A1
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- layer
- electronic component
- solder
- sealing cap
- hermetic sealing
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1007—Mounting in enclosures for bulk acoustic wave [BAW] devices
- H03H9/1014—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/06—Containers; Seals characterised by the material of the container or its electrical properties
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/10—Containers; Seals characterised by the material or arrangement of seals between parts, e.g. between cap and base of the container or between leads and walls of the container
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1064—Mounting in enclosures for surface acoustic wave [SAW] devices
- H03H9/1071—Mounting in enclosures for surface acoustic wave [SAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the SAW device
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00011—Not relevant to the scope of the group, the symbol of which is combined with the symbol of this group
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01327—Intermediate phases, i.e. intermetallics compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16195—Flat cap [not enclosing an internal cavity]
Definitions
- Hermetic sealing cap manufacturing method of hermetic sealing cap, and electronic component storage package
- the present invention relates to a hermetic sealing cap, a method for manufacturing a hermetic sealing cap, and an electronic component storage package, and more particularly to a hermetic sealing cap used for storing electronic components, and hermetic sealing.
- the present invention relates to a cap manufacturing method and an electronic component storage package.
- SMD Surface Mount Device
- SAW surface acoustic wave filters
- crystal resonators used for noise removal of mobile phones.
- Such an electronic component storage package includes an electronic component storage member (case) on which the electronic component is mounted and an airtight cap for hermetically sealing the electronic component storage member.
- the hermetic sealing cap is joined to the electronic component housing member via the solder layer when heated. Thereafter, the electronic component package is attached to a printed wiring board such as an electronic device by being heated again.
- an Au—Sn alloy (Sn: about 20 mass%) is used so that the sealing portion of the hermetic sealing cap does not melt.
- High melting point solder mainly composed of precious metals such as high melting point solder and Sn-Pb alloy power are used.
- high melting point solder with Au-Sn alloy strength is very expensive, and high melting point solder with Sn-Pb alloy strength contains Pb, so it should not be used from an environmental point of view. U prefer.
- a Ni-based metal layer is disposed on the upper surface of the core (base material), and a Ni alloy layer and a brazing material layer (diffusing into the brazing material layer when hermetic sealing is performed on the lower surface (A)
- An electronic component package using a lid (a hermetic sealing cap) that is integrally formed by stacking the solder layers in this order and then pressing and bonding the four-layer materials is disclosed.
- the Ni alloy layer diffuses into the brazing filler metal layer during hermetic sealing, and an intermetallic compound is formed in the brazing filler metal layer.
- a four-layer material including a brazing material layer is integrally formed by press-contacting, so that the brazing material layer is an electronic component package. It is arranged so as to cover the upper surface of the electronic component arranged inside. For this reason, when the lid is hermetically sealed, the characteristics of the electronic component may deteriorate due to the brazing material layer being scattered on the electronic component.
- a Ni alloy layer is formed on the lower surface of the base material, and a solder layer is formed only on the sealing portion on the lower surface of the Ni alloy layer It is conceivable to form.
- the solder layer is diffused by disposing the solder paste on the lower surface of the Ni alloy layer and then melting the solder paste. Is generally formed.
- the present invention has been made to solve the above-described problems, and one object of the present invention is to suppress the deterioration of the characteristics of the electronic component and reduce the material cost.
- Caps for hermetic sealing that can use solder that does not contain Pb and that can suppress a decrease in hermeticity, a method for manufacturing a cap for hermetic sealing, a knock box for storing electronic components, and
- An object of the present invention is to provide a method for manufacturing an electronic component storage package.
- a hermetic sealing cap provides a hermetic sealing used for an electronic component storage package including an electronic component storage member for storing an electronic component.
- the second layer includes the first layer. When the solder layer is joined to the electronic component housing member at a second temperature higher than the first temperature, the first layer is attached to the second layer. And has a function of diffusing into the solder layer.
- the second layer is configured to suppress the first layer from diffusing into the solder layer at the first temperature.
- the hermetic sealing cap is heated to the second temperature higher than the first temperature to join the electronic component storage member via the solder layer, the solder layer with respect to the electronic component storage member is Since the wettability can be prevented from being lowered, the airtightness of the electronic component storage package can be prevented from being lowered.
- the solder layer is disposed inside the electronic component storage package. Since it is possible to prevent the upper surface of the component from being covered, it is possible to suppress the solder layer from being scattered on the electronic component when the hermetic sealing cap is joined to the electronic component storage member. Thereby, it can suppress that the characteristic of an electronic component deteriorates.
- the second layer is joined to the electronic component housing member at the second temperature where the solder layer is higher than the first temperature, the first layer is diffused to the solder layer via the second layer. By making it function, an intermetallic compound can be formed in the solder layer.
- the melting point of the solder layer can be increased.
- the solder layer melts due to the high temperature of the electronic component storage package and the high temperature of the solder layer. It can be suppressed.
- the first temperature is a temperature at which the solder layer is formed by melting the solder paste
- the second temperature is This is the temperature at which the hermetic sealing cap is joined to the electronic component housing member by melting the solder layer.
- the second layer is made of Ni.
- the second layer of N can easily prevent the first layer from diffusing into the solder layer.
- the second layer has a thickness of 0.03 111 or more and 0.075 m or less.
- the first layer contains 7.5% by mass to 20% by mass of Co as a diffusion promoting material.
- the first layer when the solder layer is bonded to the electronic component housing member at the second temperature higher than the first temperature, the first layer is sufficiently connected to the solder layer via the second layer. Since it can be diffused, it is enough for the solder layer An amount of intermetallic compound can be formed.
- the base material is formed of a Fe—Ni—Co-based alloy. If comprised in this way, since the thermal expansion coefficient of a base material can be made small, the thermal expansion coefficient of the cap for airtight sealing can be made small. This makes it possible to reduce the difference in thermal expansion coefficient between the hermetic sealing cap and the electronic component storage member when the electronic component storage member is formed of a thermal expansion coefficient force such as ceramic or a dice material. In addition, it is possible to suppress the occurrence of cracks and cracks at the joint between the hermetic sealing cap and the electronic component housing member at high temperatures.
- the first layer and the second layer are formed by plating. With this configuration, the first layer and the second layer can be easily formed.
- the first layer is preferably formed on the entire surface of the substrate.
- the second layer is formed on the entire surface of the first layer. If comprised in this way, the 1st layer and the 2nd layer can be more easily formed by plating.
- the solder layer does not contain Pb and contains Ag. Even when using low-melting-point solder that does not contain Pb and has Sn-Ag force, the melting point of the solder layer is high when the hermetic sealing cap and the electronic component storage member are joined. Thus, when the electronic component storage package is attached to a printed wiring board such as an electronic device, the solder layer can be prevented from melting.
- An electronic component storage package is an electronic component storage package including an electronic component storage member for storing an electronic component.
- a third layer is formed in the electronic component housing member corresponding to the solder layer, and the solder layer and the third layer are joined to each other. At the same time, an intermetallic compound containing Sn of the solder layer is formed at the joint between the hermetic sealing cap and the electronic component housing member.
- the second layer is suppressed from diffusing the first layer into the solder layer at the first temperature.
- the hermetic sealing cap is heated to a second temperature higher than the first temperature to join the electronic component storage member via the solder layer, the wettability of the solder layer to the electronic component storage member Therefore, it is possible to prevent the airtightness of the electronic component storage package from being lowered.
- the solder layer is disposed inside the electronic component storage package. Since it is possible to suppress covering the upper surface of the electronic component, it is possible to suppress the solder layer from being scattered on the electronic component when the hermetic sealing cap is joined to the electronic component storage member. Thereby, it can suppress that the characteristic of an electronic component deteriorates.
- the second layer is joined to the electronic component housing member at the second temperature where the solder layer is higher than the first temperature, the first layer is diffused to the solder layer via the second layer.
- an intermetallic compound can be formed in the solder layer, so that the melting point of the solder layer can be increased.
- the solder layer melts due to the high temperature of the electronic component storage package and the high temperature of the solder layer. Can be suppressed.
- there is no need to use an expensive Au—Sn alloy or Sn—Pb alloy high melting point solder so that the material cost can be reduced and solder containing no Pb is used. be able to.
- the joint portion between the hermetic sealing cap and the electronic component storage member includes an intermetallic compound having Ni—Sn-based alloy force, Second layer corresponding to the joint between the sealing cap and the electronic component housing member This part is diffused in the intermetallic compound.
- the first layer can be easily diffused into the solder layer via the second layer.
- a method for manufacturing an airtight sealing cap is a method for manufacturing an airtight sealing cap used in an electronic component storage package including an electronic component storage member for storing an electronic component.
- the solder layer When the solder layer is formed at the first temperature, the first layer is prevented from diffusing into the solder layer, and the solder layer is connected to the electronic component housing member at the second temperature higher than the first temperature.
- a second layer having a function of diffusing the first layer to the solder layer through the second layer is formed. Including a process.
- the step of forming the second layer includes the step of forming the solder layer at the first temperature.
- the step of forming the second layer having a function of suppressing the diffusion of the first layer into the solder layer, it is possible to prevent an intermetallic compound from being formed in the solder layer at the first temperature. Since it can suppress, it can suppress that melting
- the solder layer with respect to the electronic component storage member is Since the wettability can be prevented from being lowered, the airtightness of the electronic component storage package can be prevented from being lowered.
- the solder layer is disposed inside the electronic component housing package. Since it is possible to prevent the upper surface of the component from being covered, it is possible to suppress the solder layer from being scattered on the electronic component when the hermetic sealing cap is joined to the electronic component storage member.
- the second layer is joined to the electronic component housing member at a second temperature at which the solder layer is higher than the first temperature
- the first layer is diffused to the solder layer through the second layer. It is possible to form an intermetallic compound in the solder layer.
- the melting point of the solder layer can be increased.
- the solder layer is prevented from melting due to the high temperature of the electronic component storage package and the high temperature of the solder layer. can do.
- there is no need to use a high melting point solder such as an expensive Au—Sn alloy or Sn—Pb alloy alloy, so that the material cost can be reduced and solder containing no Pb is used. be able to.
- the step of forming the solder layer includes Sn in the region where the electronic component housing member on the surface of the second layer is joined. And a step of forming a solder layer mainly composed of Sn by melting the solder paste at a first temperature.
- the second layer is made of Ni. According to this configuration, the second layer that is also N can easily suppress the first layer from diffusing into the solder layer.
- the second layer has a thickness of 0.03 ⁇ m or more and 0.075 ⁇ m or less.
- the second layer which is also N, easily suppresses the first layer from diffusing into the solder layer at the first temperature, and the solder layer is higher than the first temperature.
- the first layer can be formed so as to have a function of diffusing the solder layer through the second layer.
- the first layer contains 7.5% by mass to 20% by mass of Co as a diffusion promoting material.
- the base material is formed of an Fe-Ni-Co-based alloy. If comprised in this way, the thermal expansion of a base material will be carried out. Since the tension coefficient can be reduced, the thermal expansion coefficient of the hermetic sealing cap can be reduced. As a result, when the electronic component storage member is formed of a thermal expansion coefficient force such as ceramic or a material, the difference in thermal expansion coefficient between the hermetic sealing cap and the electronic component storage member can be reduced. It is possible to suppress the occurrence of cracks and cracks at the joint between the hermetic sealing cap and the electronic component housing member.
- the step of forming the first layer includes a step of forming the first layer by plating
- the forming step includes a step of forming the second layer by plating.
- the step of forming the first layer includes a step of forming the first layer by plating
- the step of forming the second layer includes a step of forming the second layer by plating.
- the step of forming the first layer by plating includes the step of forming the first layer on the entire surface of the base material, and the second layer is formed by plating.
- the step includes a step of forming the second layer on the entire surface of the first layer.
- the solder layer does not contain Pb and contains Ag. Even when using low melting point solder composed of Sn-Ag that does not contain Pb as described above, the melting point of the solder layer is high when the hermetic sealing cap and the electronic component housing member are joined due to the configuration of the invention described above. Thus, when the electronic component storage package is attached to a printed wiring board such as an electronic device, the solder layer can be prevented from melting.
- FIG. 1 is a cross-sectional view showing a hermetic sealing cap used in an electronic component storage package according to an embodiment of the present invention.
- FIG. 2 is a bottom view showing a hermetic sealing cap according to an embodiment of the present invention.
- FIG. 3 is a cross-sectional view for explaining a method of manufacturing the hermetic sealing cap according to the embodiment of the present invention shown in FIG. 1.
- FIG. 4 illustrates a method for manufacturing a hermetic sealing cap according to an embodiment of the present invention shown in FIG. It is sectional drawing for clarifying.
- FIG. 5 is a cross-sectional view for explaining a method of manufacturing the hermetic sealing cap shown in FIG. 1 according to the embodiment of the present invention.
- FIG. 6 is a cross-sectional view for explaining a method of manufacturing the hermetic sealing cap shown in FIG. 1 according to the embodiment of the present invention.
- FIG. 7 is a cross-sectional view for explaining a method for manufacturing an electronic component storage package using the hermetic sealing cap shown in FIG. 1.
- FIG. 8 is a cross-sectional view for explaining a method for manufacturing an electronic component storage package using the hermetic sealing cap shown in FIG. 1.
- FIG. 9 is a sectional view for explaining a method of manufacturing an electronic component storage package using the hermetic sealing cap shown in FIG. 1.
- FIG. 10 is a cross-sectional view showing a hermetic sealing cap used in an electronic component storage package according to a first modification of one embodiment of the present invention.
- FIG. 11 is a cross-sectional view showing a hermetic sealing cap used in an electronic component storage package according to a second modification of the embodiment of the present invention.
- a hermetic sealing cap 1 is formed so as to surround a surface of the low thermal expansion layer 2 and a low thermal expansion layer 2 made of an Fe—Ni—Co alloy.
- Co-containing Ni—Co alloy (Co: about 7.5 mass% to about 20 mass%) layer 3 and a surface of Ni—Co alloy layer 3 are formed to surround the surface of Ni—Co alloy layer 3
- the low thermal expansion layer 2 is an example of the “base material” in the present invention
- the Ni—Co alloy layer 3 is an example of the “first layer” in the present invention.
- the Ni layer 4 is an example of the “second layer” in the present invention.
- the low thermal expansion layer 2 is formed to have a thickness of approximately 0.15 mm and approximately 3.5 mm square.
- Ni — Co alloy layer 3 is formed by plating with a thickness of about 2 m.
- the Ni layer 4 is formed by plating with a thickness of about 0.03111 to about 0.075 / zm.
- the solder layer 5 has a width of about 0.45 mm and a thickness of about 0.05 mm in an area where an electronic component housing member 10 described later on the lower surface of the Ni layer 4 is joined. It is formed to have.
- FIG. 3 to 6 are cross-sectional views for explaining a method of manufacturing the hermetic sealing cap shown in FIG. 1 according to the embodiment of the present invention.
- FIG. 1 and FIGS. 3 to 6 a method for manufacturing a hermetic sealing cap according to an embodiment of the present invention will be described.
- a Fe-Ni-Co alloy plate-like coil is punched out by pressing to provide a Fe-Ni-Co alloy having a thickness of about 0.15 mm in about 3.5 mm square.
- a low thermal expansion layer 2 made of Ni—Co alloy is formed.
- a Ni—Co alloy layer 3 is formed by plating with a thickness of about 2 m.
- the Ni layer 4 is formed by plating on the entire surface of the Ni—Co alloy layer 3 with a thickness of about 0.03 ⁇ m to about 0.075 ⁇ m.
- solder paste 6 is applied by screen printing to a width of about 0.45mm in a region where an electronic component housing member 10 to be described later is joined on the lower surface of the Ni layer 4. It is formed to have a thickness of 0.08 mm. Then, by heating the solder paste 6 (see Fig. 6) at a temperature of about 235 ° C (first temperature), the solder layer 5 has a thickness of about 0.05 mm as shown in Figs. It forms so that it may have. In this manner, the hermetic sealing cap 1 according to the embodiment of the present invention is formed.
- an electronic device in which a tungsten layer 13, a Ni—Co alloy layer 14, and an Au layer 15 are formed in this order on the upper surface of a ceramic frame 12 disposed on a ceramic substrate 11.
- the Ni—Co alloy layer 14 is an example of the “third layer” in the present invention.
- the electronic component 20 having the bumps 21 is attached on the upper surface of the ceramic substrate 11.
- the solder layer 5 of the hermetic sealing cap 1 formed by the above-described method is disposed so as to be in contact with the upper surface of the ceramic frame body 12. Thereafter, the solder layer 5 is melted at a temperature of about 300 ° C. to about 320 ° C.
- the hermetic sealing cap 1 is attached to the ceramic frame. Bond to the top of body 12.
- the Ni layer 4 diffuses into the solder layer 5 having Sn—Ag alloy strength, so the portion where the Ni layer 4 is diffused
- the Ni—Co alloy layer 3 is bonded to the solder layer 5 via Further, since the Ni—Co alloy layer 3 diffuses into the solder layer 5 having Sn—Ag alloy force, the intermetallic compound 7 containing the Ni—Sn alloy as shown in FIG. 9 is formed in the solder layer 5. Is done.
- the Au layer 15 diffuses into the solder layer 5.
- an electronic component storage package stores an airtight sealing cap 1, an electronic component 20 such as a SAW filter or a crystal resonator, and the electronic component 20.
- an electronic component housing member 10 for performing the above.
- the electronic component storage member 10 includes a ceramic substrate 11 having an insulating material force such as alumina, and a ceramic frame having an insulating material force such as alumina constituting a storage space on a predetermined region of the surface of the ceramic substrate 11. Includes 12.
- An electronic component 20 is attached via a bump 21 on the ceramic substrate 11 located in the storage space surrounded by the ceramic frame 12.
- the intermetallic compound 7 has a needle shape and is formed so as to diffuse throughout the solder layer 5. The portion of the Ni layer 4 on which the solder layer 5 is formed diffuses into the intermetallic compound 7, and the Ni—Co alloy layer 3 passes through the portion where the Ni layer 4 is diffused, Bonded to solder layer 5.
- the Ni layer 4 is prevented from diffusing into the solder layer 5 at the temperature (about 235 ° C.) when the Ni—Co alloy layer 3 forms the solder layer 5.
- the solder layer 5 is heated by heating the hermetic sealing cap 1 to a temperature (about 300 ° C. to about 320 ° C.) higher than the temperature (about 235 ° C.) when forming the solder layer 5.
- the solder layer 5 is formed in the region where the electronic component housing member 10 on the surface of the Ni layer 4 is joined. Accordingly, it is possible to suppress the solder layer 5 from covering the upper surface of the electronic component 20 disposed inside the electronic component storage package, so that when the hermetic sealing cap 1 is joined to the electronic component storage member 10 In addition, the solder layer 5 can be prevented from being scattered on the electronic component 20. Thereby, it is possible to suppress the deterioration of the characteristics of the electronic component 20.
- the Ni layer 4 is joined to the electronic component housing member 10 at a temperature (about 300 ° C. to about 320 ° C.) higher than the temperature at which the solder layer 5 forms the solder layer 5 (about 235 ° C.).
- the intermetallic compound 7 can be formed in the solder layer 5 by functioning so that the Ni—Co alloy layer 3 is diffused in the solder layer 5, so that the solder layer after forming the electronic component housing package is formed.
- the melting point of 5 can be increased.
- the solder layer 5 is heated due to the high temperature of the electronic component storage package and the high temperature of the solder layer 5. It can suppress melting. In this case, it is not necessary to use an expensive Au—Sn alloy or Sn—Pb alloy high melting point solder, so that the material cost can be reduced and solder containing no Pb can be used.
- the Ni—Co alloy layer 3 is diffused into the solder layer 5 by the Ni layer 4 by disposing the Ni layer 4 between the Ni—Co alloy layer 3 and the solder layer 5. This can be easily suppressed.
- the Ni layer 4 is formed to a thickness of 0.03 ⁇ m or more, whereby the Ni layer 4 is easily formed and the Ni—Co alloy layer 3 forms the solder layer 5.
- the solder layer 5 is higher than the temperature at which the solder layer 5 is formed (about 235 ° C). It can be formed to have a function of diffusing the Ni-Co alloy layer 3 to the solder layer 5 through the Ni layer 4 when joining with the electronic component housing member 10 at a temperature of about 320 ° C. .
- the Ni—Co alloy layer 3 contains 7.5% by mass to 20% by mass of Co as a diffusion promoter so that the solder layer 5 forms the solder layer 5.
- the Ni-Co alloy layer 3 is passed through the Ni layer 4 As a result, the solder layer 5 can be sufficiently diffused, so that a sufficient amount of the intermetallic compound 7 can be formed in the solder layer 5.
- the low thermal expansion layer 2 is formed of an Fe-Ni-Co-based alloy.
- the thermal expansion coefficient of the low thermal expansion layer 2 can be reduced, so that the thermal expansion coefficient of the hermetic sealing cap 1 can be reduced.
- the Ni—Co alloy layer 3 and the Ni layer 4 can be easily formed by forming the Ni—Co alloy layer 3 and the Ni layer 4 by plating.
- soldering is performed when the hermetic sealing cap 1 and the electronic component housing member 10 are joined. Since the intermetallic compound 7 in which the melting point of the layer 5 is increased is formed, the solder layer 5 can be prevented from melting when the electronic component storage package is attached to a printed wiring board such as an electronic device.
- the temperature is about 235 ° C.
- solder paste 6 having Sn—Ag alloy strength is applied to the region where the electronic component housing member 10 on the lower surface of the Ni—Co alloy layer 3 is joined by a screen printing method with a width of about 0.45 mm. It was formed to a thickness of 08mm. Then, the solder paste 6 was heated at a temperature of about 235 ° C. (first temperature). For these samples, the growth state of the Ni—Sn alloy (intermetallic compound 7) was confirmed. The results are shown in Table 1.
- the solder paste 6 made of Sn-Ag alloy is applied by screen printing to a width of about 0.4 mm. The thickness was formed. Then, the solder paste 6 was heated at a temperature of about 235 ° C. (first temperature). Regarding these samples, the diffusion state of the Ni—Co alloy layer 3 to the solder layer 5 made of Sn—Ag alloy was confirmed. The results are shown in Table 2.
- hermetic sealing cap 1 using Ni layer 4 having a thickness of 0.03 ⁇ m to 0.2 ⁇ m (Examples 4 to 6, Comparative Examples 6 and 7) ), It has been found that the Ni layer 4 force Ni—Co alloy layer 3 has a function of suppressing diffusion into the solder layer 5 having Sn—Ag alloy force.
- the Ni-Co alloy layer 3 is formed on the entire surface of the low thermal expansion layer 2 by plating, but the present invention is not limited to this, and is shown in FIG.
- the Ni—Co alloy layer 3a may be formed by pressure welding to the upper and lower surfaces of the low thermal expansion layer 2, as shown in FIG.
- the Ni—Co alloy layer 3 b is pressed only on the lower surface of the low thermal expansion layer 2. It may be formed by contact bonding.
- the Co content of the Ni-Co alloy layer 3 of the hermetic sealing cap is about 7.5 mass% to about 20 mass%.
- the Co content of the Ni—Co alloy layer 3 of the hermetic cap may be less than 5 mass%.
- the Co content of the Ni—Co alloy layer 14 of the electronic component housing member is increased. This facilitates the growth of the Ni—Sn alloy (intermetallic compound) in the solder layer, so that the melting point of the solder layer can be increased. Thereby, sufficient heat resistance can be obtained when the electronic component storage package is attached to the printed circuit board of the electronic device.
- the force showing an example in which a Sn-Ag alloy (Ag: about 3.5% by mass) is used for the solder layer.
- the present invention is not limited to this. Even if the content is other than 3.5% by mass, it is also possible to use a solder composed of Sn as a main component.
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Acoustics & Sound (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020057024548A KR101133339B1 (ko) | 2004-11-05 | 2005-09-26 | 기밀 밀봉용 캡, 기밀 밀봉용 캡의 제조 방법 및 전자 부품수납용 패키지 |
DE112005000051T DE112005000051T5 (de) | 2004-11-05 | 2005-09-26 | Hermetische Abdichtkappe, Verfahren zur Herstellung einer hermetischen Abdichtkappe sowie Aufbewahrungsverpackung für eine elektronische Komponente |
US10/568,075 US20080271908A1 (en) | 2004-11-05 | 2005-09-26 | Hermetic Sealing Cap, Method of Manufacturing Hermetic Sealing Cap and Electronic Component Storage Package |
JP2006542296A JP4722859B2 (ja) | 2004-11-05 | 2005-09-26 | 気密封止用キャップ、気密封止用キャップの製造方法および電子部品収納用パッケージ |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2004321631 | 2004-11-05 | ||
JP2004-321631 | 2004-11-05 |
Publications (1)
Publication Number | Publication Date |
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WO2006048982A1 true WO2006048982A1 (ja) | 2006-05-11 |
Family
ID=36318997
Family Applications (1)
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PCT/JP2005/017599 WO2006048982A1 (ja) | 2004-11-05 | 2005-09-26 | 気密封止用キャップ、気密封止用キャップの製造方法および電子部品収納用パッケージ |
Country Status (6)
Country | Link |
---|---|
US (1) | US20080271908A1 (ja) |
JP (1) | JP4722859B2 (ja) |
KR (1) | KR101133339B1 (ja) |
CN (1) | CN100452365C (ja) |
DE (1) | DE112005000051T5 (ja) |
WO (1) | WO2006048982A1 (ja) |
Cited By (4)
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WO2009144224A1 (de) * | 2008-05-27 | 2009-12-03 | Epcos Ag | Hermetisch geschlossenes gehäuse für elektronische bauelemente und herstellungsverfahren |
JP2010011373A (ja) * | 2008-06-30 | 2010-01-14 | Kyocera Kinseki Corp | 電子部品用の蓋体及び圧電振動子並びに圧電発振器 |
JP2010011372A (ja) * | 2008-06-30 | 2010-01-14 | Kyocera Kinseki Corp | 電子部品用の蓋体及び圧電振動子並びに圧電発振器 |
TWI479612B (zh) * | 2008-05-02 | 2015-04-01 | Hitachi Metals Ltd | 氣密封止用蓋 |
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US20100059244A1 (en) * | 2007-03-05 | 2010-03-11 | Kyocera Corporation | Microstructure Apparatus and Method for Manufacturing Microstructure Apparatus |
JP5588784B2 (ja) * | 2010-08-20 | 2014-09-10 | 日本電波工業株式会社 | 圧電デバイスの製造方法及び圧電デバイス |
CN103837145B (zh) * | 2012-11-26 | 2018-12-28 | 精工爱普生株式会社 | 电子器件及其制造方法、盖体、电子设备以及移动体 |
JP2015052629A (ja) * | 2013-09-05 | 2015-03-19 | セイコーエプソン株式会社 | 光学デバイス、光学モジュール、電子機器、光学筐体、及び光学筐体の製造方法 |
JP6314406B2 (ja) * | 2013-10-03 | 2018-04-25 | 日立金属株式会社 | 気密封止用キャップ、電子部品収納用パッケージおよび気密封止用キャップの製造方法 |
JP6061276B2 (ja) * | 2014-08-29 | 2017-01-18 | インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Machines Corporation | 金属層間のはんだ接合の形成方法 |
US10196745B2 (en) | 2014-10-31 | 2019-02-05 | General Electric Company | Lid and method for sealing a non-magnetic package |
US10431509B2 (en) | 2014-10-31 | 2019-10-01 | General Electric Company | Non-magnetic package and method of manufacture |
JP6387818B2 (ja) * | 2014-12-11 | 2018-09-12 | 日立金属株式会社 | 気密封止用蓋材の製造方法 |
US10587024B2 (en) | 2016-10-21 | 2020-03-10 | LGS Innovations LLC | Hermetic sealing of ceramic filters |
US10834827B2 (en) * | 2017-09-14 | 2020-11-10 | HELLA GmbH & Co. KGaA | System for potting components using a cap |
US20210398871A1 (en) * | 2020-06-18 | 2021-12-23 | Intel Corporation | Integrated circuit heat spreader including sealant interface material |
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- 2005-09-26 DE DE112005000051T patent/DE112005000051T5/de not_active Withdrawn
- 2005-09-26 WO PCT/JP2005/017599 patent/WO2006048982A1/ja active Application Filing
- 2005-09-26 JP JP2006542296A patent/JP4722859B2/ja not_active Expired - Fee Related
- 2005-09-26 US US10/568,075 patent/US20080271908A1/en not_active Abandoned
- 2005-09-26 KR KR1020057024548A patent/KR101133339B1/ko not_active IP Right Cessation
- 2005-09-26 CN CNB2005800007584A patent/CN100452365C/zh not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
---|---|
KR20070083245A (ko) | 2007-08-24 |
JP4722859B2 (ja) | 2011-07-13 |
JPWO2006048982A1 (ja) | 2008-05-22 |
CN1842912A (zh) | 2006-10-04 |
US20080271908A1 (en) | 2008-11-06 |
CN100452365C (zh) | 2009-01-14 |
KR101133339B1 (ko) | 2012-04-06 |
DE112005000051T5 (de) | 2006-08-31 |
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