Classifications

• • C—CHEMISTRY; METALLURGY
  • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
  • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
  • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
  • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
  • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
  • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
  • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
• • C—CHEMISTRY; METALLURGY
  • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
  • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
  • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
  • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
  • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
  • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
  • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
  • C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
• • C—CHEMISTRY; METALLURGY
  • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
  • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
  • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
  • C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
  • C25B11/03—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form perforated or foraminous
  • C25B11/031—Porous electrodes
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
  • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
  • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
  • Y02E60/30—Hydrogen technology
  • Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis

Definitions

• the invention is directed to an electrolytic electrode and a coating thereon having decreased amounts of platinum group metals with little or no valve metal for use in the electrolysis of aqueous chlor-alkali solutions.
• Lifetimes of electrodes composed essentially of an active coating on a substrate, are a function of both the amount of active material applied to the substrate and the current density. Decreasing the amount of coating or increasing the current density results in a more rapid failure of the electrode. In general, an early failure of an electrode is attributed to two major factors, loss of the active coating and dissolution, or in case of the film-forming metals, passivation of the substrate. Sometimes these occur simultaneously and the electrode at the end of its lifetime may show some active material left in the coating, but the substrate has passivated.
• valve metal oxides in combination with the precious metal coating has been attempted.
• Such an anode for use in electrolytic processes such as chlorine production is disclosed in U.S. Patent 4,070,504.
• the electrode utilizes a titanium or tantalum metal substrate with a coating of mixed metal oxides, preferably valve metal oxides and platinum group metal oxides which have been doped with a doping oxide.
• electrode lifetime is also important with oxygen evolving electrodes used as anodes in various industrially important electrochemical processes, e.g., low current density oxygen evolving processes.
• electrodes with platinum-group metal oxide coatings are used as oxygen evolving anodes.
• These platinum-group metal oxide anodes are found to operate very well under relatively difficult conditions imposed by these processes (e.g. current densities of up to 2-3 kA/m 2 in aggressive electrolytes).
• these electrodes must have relatively high platinum-group metal loadings (e.g. more than about 1 2-1 6 g/m 2 ).
• the electrode active component includes 1 .3 g/m 2 of platinum metal in the underlayer and 3.0 g/m 2 of iridium oxide in the top layer. According to the document, the electrode has maximum lifetime of 80 hours under accelerated lifetime tests performed in an aqueous solution with 1 50 g/l of H 2 SO 4 as an electrolyte at 80° C and current density of 25 kA/m 2 .
• the electrode base may be a sheet of any film-forming metal such as titanium, tantalum, zirconium, niobium, tungsten and silicon, and alloys containing one or more of these metals, with titanium being preferred for cost reasons.
• film-forming metal it is meant a metal or alloy which has the property that when connected as an anode in the electrolyte in which the coated anode is subsequently to operate, there rapidly forms a passivating oxide film which protects the underlying metal from corrosion by electrolyte, i.e., those metals and alloys which are frequently referred to as “valve metals", as well as alloys containing valve metal (e.g., Ti-Ni, Ti-Co, Ti-Fe and Ti-Cu), but which in the same conditions form a non-passivating anodic surface oxide film.
• valve metal e.g., Ti-Ni, Ti-Co, Ti-Fe and Ti-Cu
• Electrodes Plates, rods, tubes, wires or knitted wires and expanded meshes of titanium or other film-forming metals can be used as the electrode base. Titanium or other film-forming metal clad on a conducting core can also be used. It is also possible to surface treat porous sintered titanium with dilute paint solutions in the same manner.
• the base will be roughened by means of etching or grit blasting, or combinations thereof, but in some instances the base can simply be cleaned, and this gives a very smooth electrode surface.
• the film-forming metal substrate can have a pre-applied surface film of film-forming metal oxide which, during application of the active coating, can be attacked by an agent in the coating solution (e.g. HCI) and reconstituted as a part of the integral surface film.
• the electrolytic process of the present invention is particularly useful in the chlor-alkali industry for the production of chlorine.
• the electrode described herein when used in such process will virtually always find service as an anode.
• the word “anode” is often used herein when referring to the electrode, but this is simply for convenience and should not be construed as limiting the invention.
• the metals for the electrode are broadly contemplated to be any coatable metal.
• the metal might be such as nickel or manganese, but will most always be valve metals, including titanium, tantalum, aluminum, zirconium and niobium.
• titanium Of particular interest for its ruggedness, corrosion resistance and availability is titanium.
• the suitable metals of the substrate include metal alloys and intermetallic mixtures, as well as ceramics and cermets such as contain one or more valve metals.
• titanium may be alloyed with nickel, cobalt, iron, manganese or copper.
• grade 5 titanium may include up to 6.75 weight percent aluminum and 4.5 weight percent vanadium, grade 6 up to 6 percent aluminum and 3 percent tin, grade 7 up to 0.25 weight percent palladium, grade 1 0, from 1 0 to 1 3 weight percent plus 4.5 to 7.5 weight percent zirconium and so on.
• elemental metals By use of elemental metals, it is most particularly meant the metals in their normally available condition, i.e., having minor amounts of impurities.
• metal of particular interest i.e., titanium
• various grades of the metal are available including those in which other constituents may be alloys or alloys plus impurities. Grades of titanium have been more specifically set forth in the standard specifications for titanium detailed in ASTM B 265-79. Because it is a metal of particular interest, titanium will often be referred to herein for convenience when referring to metal for the electrode base.
• the electrode base is advantageously a cleaned surface. This may be obtained by any of the treatments used to achieve a clean metal surface, including mechanical cleaning. The usual cleaning procedures of degreasing, either chemical or electrolytic, or other chemical cleaning operation may also be used to advantage.
• the base preparation includes annealing, and the metal is grade 1 titanium
• the titanium can be annealed at a temperature of at least about 450°C for a time of at least about 1 5 minutes, but most often a more elevated annealing temperature, e.g., 600°C to 875 °C is advantageous.
• a surface roughness When a clean surface, or prepared and cleaned surface, has been obtained, it may be advantageous to obtain a surface roughness. This will be achieved by means which include intergranular etching of the metal, plasma spray application, which spray application can be of particulate valve metal or of ceramic oxide particles, or both, and sharp grit blasting of the metal surface, optionally followed by surface treatment to remove embedded grit and/or clean the surface.
• Etching will be with a sufficiently active etch solution to develop a surface roughness and/or surface morphology, including possible aggressive grain boundary attack.
• Typical etch solutions are acid solutions. These can be provided by hydrochloric, sulfuric, perchloric, nitric, oxalic, tartaric, and phosphoric acids as well as mixtures thereof, e.g., aqua regia.
• Other etchants that may be utilized include caustic etchants such as a solution of potassium hydroxide/hydrogen peroxide, or a melt of potassium hydroxide with potassium nitrate.
• the etched metal surface can then be subjected to rinsing and drying steps.
• the suitable preparation of the surface by etching has been more fully discussed in U.S. Pat. No. 5, 1 67,788, which patent is incorporated herein by reference.
• plasma spraying for a suitably roughened metal surface, the material will be applied in particulate form such as droplets of molten metal.
• the metal is melted and sprayed in a plasma stream generated by heating with an electric arc to high temperatures in inert gas, such as argon or nitrogen, optionally containing a minor amount of hydrogen.
• inert gas such as argon or nitrogen
• the particulate material employed may be a valve metal or oxides thereof, e.g., titanium oxide, tantalum oxide and niobium oxide. It is also contemplated to melt spray titanates, spinels, magnetite, tin oxide, lead oxide, manganese oxide and perovskites. It is also contemplated that the oxide being sprayed can be doped with various additives including dopants in ion form such as of niobium or tin or indium.
• plasma spray application may be used in combination with etching of the substrate metal surface.
• the electrode base may be first prepared by grit blasting, as discussed hereinabove, which may or may not be followed by etching.
• a suitably roughened metal surface can be obtained by special grit blasting with sharp grit, optionally followed by removal of surface embedded grit.
• the grit which will usually contain angular particles, will cut the metal surface as opposed to peening the surface.
• Serviceable grit for such purpose can include sand, aluminum oxide, steel and silicon carbide. Etching, or other treatment such as water blasting, following grit blasting can be used to remove embedded grit and/or clean the surface.
• the surface may then proceed through various operations, providing a pretreatment before coating, e.g., the above-described plasma spraying of a valve metal oxide coating.
• Other pretreatments may also be useful.
• the surface be subjected to a hydriding or nitriding treatment.
• an electrochemically active material Prior to coating with an electrochemically active material, it has been proposed to provide an oxide layer by heating the substrate in air or by anodic oxidation of the substrate as described in U.S. Patent 3,234,1 10.
• Various proposals have also been made in which an outer layer of electrochemically active material is deposited on a sublayer, which primarily serves as a protective and conductive intermediate.
• Various tin oxide based underlayers are disclosed in U.S. Patent Nos. 4,272,354, 3,882,002 and 3,950,240. It is also contemplated that the surface may be prepared as with an antipassivation layer.
• an electrochemically active coating layer may then be applied to the substrate member.
• electrochemically active coatings that are often applied, are those provided from active oxide coatings such as platinum group metal oxides, magnetite, ferrite, cobalt spinel or mixed metal oxide coatings. They may be water based, such as aqueous solutions, or solvent based, e.g., using alcohol solvent.
• the preferred coating composition solutions are typically those consisting of RuCI 3 and lrCI 3 and hydrochloric acid, all in alcohol solution, with or without the presence of a valve metal component.
• RuCI 3 may be utilized in a form such as RuCI 3 xH 2 O and lrCI 3 xH 2 0 can be similarly utilized.
• such forms will generally be referred to herein simply as RuCI 3 and lrCI 3 .
• the ruthenium chloride will be dissolved along with the iridium chloride in an alcohol such as either isopropanol or butanol, all combined with or with out small additions of hydrochloric acid, with n-butanol being preferred.
• Such coating composition will contain sufficient ruthenium constituent to provide at least about 5 mole percent, up to about 50 mole percent of ruthenium metal, basis 1 00 mole percent of the metal content of the coating, with a preferred range being from about 1 5 mole percent to up to about 35 mole percent of ruthenium. It will be understood that the constituents are substantially present as their oxides, and the reference to the metals is for convenience, particularly when referring to proportions.
• Such coating composition will contain sufficient Ir constituent to provide at least about 50 mole percent up to about 95 mole percent iridium metal, basis 100 mole percent of iridium and ruthenium metals, with a preferred range being from about 50 mole percent up to about 75 mole percent iridium.
• Ru:lr will be from about 1 : 1 to about 1 :4 with a preferred ratio being about 1 : 1 .6.
• valve metal component may optionally be included in the coating composition in order to further stabilize the coating and/or alter the anode efficiency
• Various valve metals can be utilized including titanium, tantalum, niobium, zirconium, hafnium, vanadium, molybdenum, and tungsten.
• the valve metal component can be formed from a valve metal alchoxide in an alcohol solvent, with or without the presence of an acid.
• Such valve metal alchoxides which are contemplated for use in the present invention include methoxides, ethoxides, isopropoxides and butoxides.
• titanium ethoxide, titanium propoxide, titanium butoxide, tantalum ethoxide, tantalum isopropoxide or tantalum butoxide may be useful.
• salts of the dissolved metals may be utilized, and suitable inorganic substituents can include chlorides, iodides, bromides, sulfates, borates, carbonates, acetates, and citrates, e.g., TiCI 3; TiCI 4 or TaCI 5 , in acid or alcohol solutions.
• the coating composition will contain from about 0.1 mole percent up to not greater than 25 mole percent basis 100 mole percent of the metal content of the coating, with the preferred composition containing from about 5 mole percent up to about 1 5 mole percent.
• any of the multiple coating layers utilized herein will be applied by any of those means which are useful for applying a liquid coating composition to a metal substrate.
• Such methods include dip spin and dip drain techniques, brush application, roller coating and spray application such as electrostatic spray.
• spray application and combination techniques e.g., dip drain with spray application can be utilized.
• the amount of coating applied will be sufficient to provide in the range of from about 0.05 g/m 2 (gram per square meter) to about 3.0 g/m 2 , and preferably, from about 0.2 g/m 2 to about 1 ,0 g/m 2 based on iridium content, as metal, per side of the electrode base.
• the applied composition will be heated to prepare the resulting mixed oxide coating by thermal decomposition of the precursors present in the coating composition.
• This prepares the mixed oxide coating containing the mixed oxides in the molar proportions, basis the metals of the oxides, as above discussed.
• Such heating for the thermal decomposition will be conducted at a temperature of at least about 350°C for a time of at least about 3 minutes. More typically, the applied coating will be heated at a more elevated temperature of up to about 550°C for a time of not more than about 20 minutes.
• Suitable conditions can include heating in air or oxygen.
• the heating technique employed can be any of those that may be used for curing a coating on a metal substrate.
• oven coating including conveyor ovens may be utilized.
• infrared cure techniques can be useful. Following such heating, and before additional coating as where an additional application of the coating composition will be applied, the heated and coated substrate will usually be permitted to cool to at least substantially ambient temperature. Particularly after all applications of the coating composition are completed, postbaking can be employed. Typical postbake conditions for coatings can include temperatures of from about 400°C up to about 550°C. Baking times may vary from about 1 0 minutes, up to as long as about 300 minutes.
• a top coating layer e.g., of a valve metal oxide, or tin oxide, or mixtures thereof, may be utilized for preparing an anode for resistance to agents (e.g. organic additives) in the electrolyte.
• agents e.g. organic additives
• the topcoats may also be used to decrease the rate of oxidation of minor species in solutions.
• the top coating layer will typically be formed from the salt of a dissolved metal, e.g.,
• TaCI 5 in butanol where titanium oxide will be utilized, it is contemplated that such substituent may be used with doping agents.
• suitable precursor substituents can include SnCI 4 , SnSO 4 , or other inorganic tin salts.
• the tin oxide may be used with doping agents.
• an antimony salt may be used to provide an antimony doping agent.
• Other doping agents include ruthenium, iridium, platinum, rhodium and palladium, as well as mixtures of any of the doping agents.
• the coating of the present invention is particularly serviceable for an anode in an electrolytic process for the manufacture of chlorine and alkali metal hydroxides.
• these electrodes may find use in other processes, such as the manufacture of chlorates and hypochlorites.
• the electrodes of the invention may be used for the electrolysis of lithium, sodium and potassium chlorides, bromides and iodides and more generally for the electrolysis of halogenides, for the electrolysis of other saits which undergo decomposition under electrolysis conditions, ' for the electrolysis of HCI solutions and for the electrolysis of water. They generally may be used for other purposes such as electrolytic oxidation or reduction of dissolved species, e.g. oxidation of ferrous ion to ferric ion.
• Coating compositions as set forth in Table 1 were applied to four separate samples.
• Coating solutions A-E were prepared by adding the amount of metals, as chloride salts, as listed in Table 1 , to a solution of 1 9.2 ml of n-butanol and 0.8 ml concentrated HCI.
• Coating solution F was prepared by adding the amount of Ru and Ir, as chlorides, and . the Ti, as titanium butoxide, as listed in Table I, to a solution of 5.3 ml BuOH and 0.3 ml HCI. After mixing to dissolve all of the salts, the solutions were applied to individual samples of prepared titanium plates.
• Samples A-C are in accordance with the present invention. Samples D-F are considered comparative examples.
• the set of samples, A-F, were then operated as anodes in an accelerated test as an oxygen-evolving anode at a current density of 1 0 kA/m 2 in an electrochemical cell containing 1 50 g/l H 2 S0 4 at 50°C.
• Cell voltage versus time data was collected every 30 minutes. The results are summarized in Table II as the elapsed time before a given voltage rise.
• An anode of approximately 1 .5 m 2 for a commercial chlorine membrane cell was prepared and coated with a solution comprised of Ru:lr:Ta in mole ratio of 35:55: 10 using chloride salts in n-butanol with 1 3.3 ml HCI per liter of solution.
• Total metal concentration (Ru + Ir + Ta) was 1 5 gpl.
• This solution was applied in 10 layers with each layer being dried at ca. 1 1 0-1 50 °C then heated to 480 °C for 7 minutes.
• a section of the anode was cut with a projected mesh area of 1 2.7 x 1 2.7 cm and installed in a lab membrane chlorine cell. The unit was operated at up to 8 kA/m2 for 295 days.
• the loss of Ru and Ir was less than 1 5%.
• a coating comprised of Ru:lr:Ti at 1 5: 1 0:75 mole % (similar to Sample E in Example 1 ) was applied to a lab membrane cell anode and operated in a similar manner. After 269 days on line the loss of Ru and Ir was over 30% .
• the coating of this invention 35:55: 10 Ru:lr:Ta

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• Chemical & Material Sciences (AREA)
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• Chemical Kinetics & Catalysis (AREA)
• Electrochemistry (AREA)
• Materials Engineering (AREA)
• Metallurgy (AREA)
• Organic Chemistry (AREA)
• Electrodes For Compound Or Non-Metal Manufacture (AREA)
• Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
• Electrolytic Production Of Metals (AREA)
• Prevention Of Electric Corrosion (AREA)
• Coating By Spraying Or Casting (AREA)

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• 2003
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