WO2004090637A1 - 感光性樹脂膜およびこれからなる硬化膜 - Google Patents
感光性樹脂膜およびこれからなる硬化膜 Download PDFInfo
- Publication number
- WO2004090637A1 WO2004090637A1 PCT/JP2004/004155 JP2004004155W WO2004090637A1 WO 2004090637 A1 WO2004090637 A1 WO 2004090637A1 JP 2004004155 W JP2004004155 W JP 2004004155W WO 2004090637 A1 WO2004090637 A1 WO 2004090637A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- weight
- parts
- photosensitive resin
- resin film
- radiation
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
Definitions
- the present invention relates to a photosensitive resin film and a cured film made of the same. More specifically, the present invention relates to a photosensitive resin film suitable for forming a bump by a photo application and a cured film made of the same. Background art
- a photo application is a method in which a radiation-sensitive resin composition is applied to the surface of a workpiece, the coating film is patterned by photolithography, and the film is used as a mask for chemical etching, electrolytic etching, or electric plating (also referred to as electrolytic plating).
- This is a general term for the technology that manufactures various precision parts by using, alone or in combination with, the electoral opening forming technology, which is the mainstream of precision micromachining technology.
- the height of the conventional type has conventionally been ⁇ or more, more specifically, about 20 to 30 height.
- the present inventors have developed a bump having improved adhesion to a substrate during development in photolithography, improved wettability to a plating solution, and improved plating solution resistance with respect to a material for forming a bump having such a height.
- a radiation-sensitive resin composition suitable as a material for forming and wiring has already been proposed (JP-A-2000-37909).
- this radiation-sensitive resin composition When this radiation-sensitive resin composition is used for photo applications, it has good developability with an alkali developer, sufficient resolution at a film thickness of 20 ⁇ m or more, adhesion to a substrate at the time of image development, It is possible to obtain a bump-forming material having wettability to liquid and anti-penetration property, and it is possible to form bumps having a height of about 20 to 30 with high precision.
- a higher bump (hereinafter, also referred to as a “high bump”) is to be formed on an LSI chip (hereinafter, also simply referred to as a “chip”) with high precision by a photo application, it is used for ordinary bump formation.
- a material comprising a radiation-sensitive resin composition has the following problems. That is, it is difficult to form a coating film having a film thickness necessary for forming a high bump on the chip base material.
- the present inventors have conducted intensive studies in view of the above circumstances, and found that (A) a specific alkali-soluble copolymer, (B) a compound having at least one ethylenically unsaturated double bond, C) When an uncured coating film having a dry film thickness of 70 ⁇ is formed, the coating film has a radiation transmittance of 365% or more of 10% and a radiation transmittance of 405 nm. And a radiation radical polymerization initiator such that the radiation radical polymerization initiator (C) is 20 to 40 parts by weight based on 100 parts by weight of the component (A). It has been found that an uncured photosensitive resin film having a dry film thickness of 50 m or more, which is contained in an amount of parts by weight, is suitable for forming a high bump, and has completed the present invention. Was.
- an object of the present invention is to provide a photosensitive resin film suitable for forming a bump by a photo application and a cured film having such a capability. More specifically, it is an object of the present invention to provide a photosensitive resin film suitable for forming a bump having a height of 50 ⁇ or more and a cured film made of the same.
- A (a) 1 to 30% by weight of a structural unit derived from ⁇ -methyl-p-hydroxystyrene, and (b) 5 to 5% of a structural unit derived from a radical polymerizable compound having a carboxyl group. 20% by weight, (c) derived from acrylic acid aliphatic ester 20 to 40% by weight of a structural unit derived from a radical polymerizable compound having a polycyclic aliphatic group, and 30 to 60% by weight of a structural unit derived from a radically polymerizable compound having a polycyclic aliphatic group.
- a soluble copolymer (a) 1 to 30% by weight of a structural unit derived from ⁇ -methyl-p-hydroxystyrene, and (b) 5 to 5% of a structural unit derived from a radical polymerizable compound having a carboxyl group. 20% by weight, (c) derived from acrylic acid aliphatic ester 20 to 40% by weight of a structural unit derived from a radical
- a radiation radical polymerization initiator 60% or more of a radiation radical polymerization initiator, and the radiation radical polymerization initiator (C) is added in an amount of 20 to 40 parts by weight based on 100 parts by weight of the component (A). And a dry film thickness of 50 ⁇ m or more.
- the photosensitive resin film contains 30 parts of the compound (B) having at least one ethylenically unsaturated double bond per 100 parts by weight of the alkali-soluble copolymer (A). Preferably it is contained in an amount of up to 80 parts by weight.
- the alkali-soluble copolymer (A) preferably has a glass transition point of 60 ° C. or more.
- the structural unit derived from the (d) radical polymerizable compound having a polycyclic aliphatic group, which constitutes the alkali-soluble copolymer (A), is isobornyl (meth) alcohol.
- rate and tricyclo [5.2.1.0 2 '6] is preferably those derived from decanyl (meth) Atari rate.
- the radiation radical polymerization initiator (C) comprises (e) 2,2-dimethoxy-1,2-diphenylethane 11one and (f) 2,4,6 —Containing trimethylbenzoyldiphenyl phosphinoxide, wherein the alkali-soluble copolymer (A) (100 parts by weight) is mixed with the (e) 2,2-dimethoxy-1,2-diphenylethane 1 1 1 on 1 7 ⁇ 30 weight And (f) 2,4,6-trimethylbenzoyldiphenylphosphinoxide in an amount of 3 to 10 parts by weight.
- (A) (a) Structural units derived from ⁇ -methyl-p-hydroxystyrene: from! To 30% by weight; (b) Structural units derived from a radically polymerizable compound having a carboxyl group; 20 to 40% by weight, (c) 20 to 40% by weight of a structural unit derived from an acrylic acid aliphatic ester, and (d) a structural unit derived from a radically polymerizable compound having a polycyclic aliphatic group.
- the coating film has a radiation transmittance of 365 n Hi of 10% or more and a radiation of A radiation radical polymerization initiator having a transmittance of 60% or more, and the radiation radical polymerization initiator (C) is added in an amount of 20 to 100 parts by weight of the component (A). It is characterized by being formed by photocuring an uncured photosensitive resin film containing 40 parts by weight and having a dry film thickness of 50 ⁇ m or more.
- the uncured photosensitive resin film according to the present invention comprises (A) a specific soluble copolymer, (B) a compound having at least one ethylenically unsaturated double bond, and (C) When a 70 ⁇ m dry film coating in the unhardened state is formed, the coating has a radiation transmittance at 365 nm of 10% or more and a radiation transmittance of 405 nm. Contains 60% or more of a radiation radical polymerization initiator, The radiation radical polymerization initiator (C) is contained in an amount of 20 to 40 parts by weight based on 100 parts by weight of the component (A), and the dry film thickness is 50 ⁇ m or more. And
- the uncured photosensitive resin film of the present invention has a dry film thickness of 50 ⁇ or more, and ( ⁇ ) a specific alkali-soluble 1 ⁇ copolymer, and ( ⁇ ) at least 1 A compound having one ethylenically unsaturated double bond and (C) a radiation radical polymerization initiator,
- the radiation radical polymerization initiator (C) forms an uncured coating film having a dry film thickness of 70 ⁇ m containing at least the copolymer ( ⁇ ), the compound ( ⁇ ), and the radiation radical polymerization initiator.
- the type and amount of radiation are such that the coating has a radiation transmittance of 365 nm or more of 10% or more and a radiation transmittance of 405 nm of 60% or more.
- the radical polymerization initiator is desirably contained in an amount of 20 to 40 parts by weight based on 100 parts by weight of the component (A).
- the water-soluble copolymer used in the photosensitive resin film of the present invention is a water-soluble copolymer
- the above-mentioned soluble copolymer is prepared by using a compound capable of deriving these structural units so that each of the structural units (a) to (d) is contained in an amount in a predetermined range described below. It can be obtained by radical copolymerization in the polymer.
- the structural unit ( a ) is derived from ⁇ - methyl-p-hydroxystyrene, and mainly controls the molecular weight of the alkali-soluble copolymer.
- the amount of the structural unit (a) derived from ⁇ -methyl- ⁇ -hydroxystyrene in the alkali-soluble copolymer ( ⁇ ) is usually 130% by weight, preferably 52% by weight. %.
- the amount of the structural unit (a) occupying in the alkali-soluble copolymer (A) is within the above range, the molecular weight of the obtained copolymer (A) can be sufficiently increased, and A coating film of 50 ⁇ or more can be formed, and the resolution of the obtained photosensitive resin film is also improved.
- (b) Structural unit derived from a radically polymerizable compound having a carboxyl group
- the structural unit (b) is a radically polymerizable compound having a carboxyl group (provided that a polycyclic aliphatic group corresponding to (d) described below) The following is referred to as a carboxy group-based compound), and mainly regulates the solubility of the alkali-soluble copolymer (A).
- Examples of such a carboxyl group compound include: monocarboxylic acids such as acrylic acid, methacrylic acid and crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid and itaconic acid; 2-succinoloy Luetyl (meth) atarilate, 2-maleinoylethyl (meta) atarilate, 2-oxahidrophthaloylethyl (meta) atarilate, ⁇ -carboxy-polypolyprolactone monoatrylate (commercially available For example, Aronix III-530, manufactured by Toagosei Co., Ltd., monohydroxyxyl acrylate phthalate (commercially available, for example, Aronix III-540, manufactured by the company), Acryl Carboki such as acid dimer (commercially available, for example, Aronix III-560) Having Le group (meth) acrylic acid derivatives used it can. These compounds can be used alone or
- the amount of the structural unit (b) derived from the radically polymerizable compound having a carboxyl group in the alkali-soluble copolymer (A) is usually 5 to 20% by weight, and preferably 10 to 20% by weight. It is 15% by weight.
- the amount of the structural unit (b) occupying in the copolymer (A) is within the above range, the obtained photosensitive resin film has excellent solubility in an alkali developing solution, and after the development, Sufficient resolution can be achieved without any residue.
- the structural unit (c) is derived from an aliphatic acrylate, and mainly controls the polymerizability of the soluble copolymer (A) to adjust the molecular weight and the conversion.
- the acrylic acid fatty acid ester is a compound other than a compound having a polycyclic aliphatic group described later as (d), and means a substituted or unsubstituted aliphatic phthalate. (However, those which correspond to the carboxyl group compound of the above (b) are excluded.)
- acrylic acid aliphatic ester examples include, for example, methyl acrylate, ethynoleacrylate, n-butynoleacrylate, sec-butyl acrylate, tert-butyl acrylate, and isopropyl acrylate.
- anolequinolea acrylates such as n-hexyl acrylate, isobutyl acrylate, lauryl acrylate, and cetino acrylate; aryl alkyl acrylate such as benzyl / reacrylate; 2-methoxy acrylate Alkoxyalkyl acrylates, such as 3-butoxybutyrate; aryloxyalkyl acrylates, such as phenoxyshethyl acrylate Hydroxyalkyl acrylates such as 2-hydroxyl acrylate and 2-hydroxypropyl acrylate; ethyl carbitol acrylate and tetrahydrofurfuryl acrylate Phenoxypolyethylene glycol oleate acrylate, 2-acryloyl oxetchinoleate 2-hydroxypropyl / reatalylate, dimethylaminoethyl acrylate, morpholinoethyl acrylate, etc. Alkyl acrylate having another substitu
- the amount of the structural unit (c) derived from the acrylic acid aliphatic ester in the alkali-soluble copolymer (A) is usually 20 to 40% by weight, preferably 25 to 35% by weight. %.
- the amount of the structural unit (c) in the alkali-soluble copolymer (A) is within the above range, the molecular weight and the polymerization reaction rate of the alkali-soluble copolymer (A) are appropriately controlled.
- the physical strength of the photosensitive resin film obtained can be adjusted.
- (d) Structural unit derived from a radical polymerizable compound having a polycyclic aliphatic group
- the structural unit (d) is derived from a radical polymerizable compound having a polycyclic aliphatic group, and The glass transition point of the soluble copolymer (A) is adjusted.
- the radical polymerizable I arsenide compound having such a polycyclic aliphatic group specifically, tricyclo [5.2.2 1.0 2, 6] de force - Ruokishechiru (meth) Atari rate, isobornyl (Meth) acrylate, tricyclo [5.2.1.02 2 ' 6 ] decanyl (meth) acrylate, and the like can be used. These compounds can be used alone or in combination of two or more.
- isobornyl (meth) Atari rate tricyclo [5.2.1 1.0 preferably 2.6] decanyl (meth) Akurireto further Isoboru - Le (meth) ⁇ click Relates and tricyclo [5.2.2 1.0 2'6] decanyl (meth) it is more preferable to use this in combination Atari rate Les.
- isobornyl (meth) Atarire one Bok and tricyclo [5.2.2 1.0 2'6] decanyl (meth) by combining the Akurireto, to further improve the hydrophobicity of the photosensitive resin film obtained It can impart plating resistance.
- the amount of the structural unit (d) derived from the radically polymerizable conjugate having a polycyclic aliphatic group in the alkali-soluble copolymer (A) is usually 30 to 60% by weight. And preferably 35-55% by weight.
- the glass transition point of the copolymer is 60 ° C. The above can be adjusted.
- the glass transition temperature of the soluble copolymer (A) is 60 ° C. or higher, preferably 60 ° C. to 100 ° C., on the chip via the cured film after pattern formation, This has the advantage of improving the plating liquid resistance during plating when heated, and of reducing the tackiness of the uncured photosensitive resin film.
- Examples of the polymerization solvent used for producing the alkali-soluble copolymer (A) include alcohols such as methanol, ethanol, ethylene glycol, diethylene glycol and propylene glycol; and cyclic ethers such as tetrahydrofuran and dioxane.
- cyclic ethers polyhydric alcohol alkyl ethers, polyhydric alcohol alkyl ether acetates, ketones, esters and the like are preferable.
- an ordinary radical polymerization initiator can be used as a polymerization catalyst in the radical copolymerization.
- an ordinary radical polymerization initiator can be used.
- a redox initiator may be used in combination with a reducing agent.
- the weight average molecular weight (Mw) of the alkali-soluble copolymer (A) obtained by the above radical copolymerization is usually from 1,000 to 100,000 in terms of gel permeation chromatography polystyrene, preferably from 2,000. 50,000 to 50,000, more preferably 3,000 to 20,000.
- the glass transition point of the alkali-soluble copolymer (A) is 60 from the viewpoint of improving the plating liquid resistance of the obtained cured film and suppressing the tackiness of the uncured photosensitive resin film. ° C or higher, preferably 60 to 100 ° C.
- Examples of such an ethylenically unsaturated compound (B) include 2-hydroxyxethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, and methyl (meth) acrylate , Ethyl (meth) acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, tert-butyl (meth) acrylate, pentyl (meta) ) Atarireto, isoamyl (meth) atalylate, hexyl (meth) atalylate, to Butyl (meth) acrylate, octyl (meta) acrylate, isooctyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, noel (meta
- polyfunctional compound examples include, for example, trimethylolpropane tri (meth) atalylate, ethylene glycol di (meth) atalylate, tetraethylene glycolone resin (meth) atelylate, and polyethylene glycolone resin (meth) atari.
- ethylenically unsaturated compound (B) a commercially available compound can be used as it is.
- specific examples of commercially available compounds include: Knicks M—210, M—309, M—310, M—400, M—7 100, M—8030, M—8060, M—8100, M—9050, M— 240, M-245, M-6100, M-6200, M-62
- M-6300, M-6400, M-6500 (all manufactured by Toagosei Co., Ltd.), KAYARAD R-551, R-712, TMPTA, HDDA, TPGDA, PEG400DA, MANDA, HX-220, HX-620, R-604, DPCA-20, DPCA-30, DPCA-
- the ethylenically unsaturated compound (B) may be used alone or in combination of two or more. Usually, 30 to 80 parts by weight, preferably 100 to 100 parts by weight of the alkali-soluble copolymer (A) is preferable. Is 40 to 65 parts by weight.
- the amount of the ethylenically unsaturated compound (B) is within the above range, the sensitivity of the obtained photosensitive resin film at the time of exposure is good, and the compatibility with the copolymer (A) is excellent.
- the storage stability of the coating solution is improved. Furthermore, since the curability at the time of exposure is good, it is suitable for forming a thick film of 50 m or more.
- the radiation radical polymerization initiator (C) used in the present invention when formed into an uncured coating film having a dry film thickness of 70 ⁇ , has a radiation transmittance at 365 nm of the coating film of 10% or more, preferably A radiation radical polymerization initiator having a radiation transmittance of 12 to 30% and a radiation transmittance of 405 nm of 60% or more, preferably 65 to 80%.
- radiation means ultraviolet rays, visible light rays, far ultraviolet rays, X-rays, electron beams, etc.
- a mercury lamp is used as a light source for curing the photosensitive resin.
- an i-line with a wavelength of 365 nm and a wavelength of 405! ! ! ! ! It is common to use Di.
- the i-ray has high energy, has high curability, and is hardly hindered by curing by oxygen.However, since it has a short wavelength, it is easily absorbed, and is used for curing a thick-film photosensitive resin. In some cases, sufficient energy may not reach the bottom of the photosensitive resin film and a desired pattern shape may not be obtained.
- the cross-sectional shape of the photosensitive resin film after patterning is not rectangular, but becomes a trapezoid whose bottom is more hollow than the surface layer of the photosensitive resin film, and a desired pattern shape may not be obtained. .
- the h-line has lower energy than the i-line and takes longer to cure, the curing of the photosensitive resin film surface is inhibited by oxygen, and the residual film ratio after pattern junging may decrease significantly.
- the light transmittance is high, and even when used for a thick photosensitive resin film, energy can easily reach the bottom of the photosensitive resin film.
- the feature is that the shape becomes rectangular, and a desired pattern shape is easily obtained.
- a radiation radical polymerization initiator (C) of a type and amount such that the radiation transmittance of nm and 405 nm is each a specific value or more enables a photosensitive film having a film thickness of 50 ⁇ m or more.
- the cured film can have a cured film whose bottom and side walls are substantially perpendicular to each other in the cross section of the patterning portion. This makes it possible to form a straight high bump with high precision.
- Such transmittance measurement can be performed, for example, by the following method.
- a predetermined amount of (A) the alkali-soluble monocopolymer, (B) a compound having at least one ethylenically unsaturated double bond, and (C) a radiation radical polymerization initiator A solution of the composition in ethyl lactate (65% by weight) was prepared, and a coating film was formed on a quartz substrate having a thickness of 1 mm by spin coating, and then beta-heated at 120 ° C for 5 minutes on a hot plate. To remove the solvent and form a coating film. In this case, the number of revolutions during spin coating is controlled in advance so that the thickness of the coating film after baking becomes 70 ⁇ .
- the radiation radical polymerization initiator used in the present invention usually has an extinction coefficient of 365 nm for radiation of 365 nm when an uncured coating film having a dry film thickness of 70 m is formed. 0 m-1 or less, and 4 0 extinction coefficient for 5 nm radiation is this and is desirable as it usually has a 4 0 0 0 m "1 hereinafter become kind Contact Yopi amount.
- Specific examples of such a radiation radical polymerization initiator include, for example, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis- (2,6-dimethoxybenzoyl) 1-2.
- the radiation radical polymerization initiator is used in an amount of usually 20 to 40 parts by weight, preferably 20 to 30 parts by weight, and more preferably 100 to 100 parts by weight of the alkali-soluble copolymer (A). It is used in an amount of 22 to 27 parts by weight.
- the transmittance at the wavelength of both the i-line and the h-line is improved, and not only the surface layer of the photosensitive resin film but also the bottom portion is sufficiently provided. Can be cured. Furthermore, a desired pattern can be obtained with high precision because the effect of oxygen deactivation of the photosensitive resin film due to deactivation of radicals is suppressed. In addition, compatibility and storage stability in a coating solution can be improved.
- (e) 2,2-dimethoxy-1,2-diphenylethane-one is generally used in an amount of 17 to 100 parts by weight of the alkali-soluble copolymer (A).
- organic solvent those which can uniformly dissolve the alkali-soluble copolymer (A) and each component and do not react with each component are used.
- organic solvent the same solvent as the polymerization solvent used for producing the alkali-soluble copolymer (A) can be used.
- a high boiling point solvent can also be added.
- alkyl ethers of polyhydric alcohols such as ethylene glycol monoethynoleatenole and ethylene glycol monoethynoleate are preferred from the viewpoints of solubility, reactivity with each component, and ease of film formation.
- alkyl ether acetates of polyhydric alcohols such as propylene glycol monomethyl ether acetate; ethinole 3-ethoxypropionate, methyl 3-methoxypropionate, 2-hydroxypropionic acid Esters such as ethyl and lactate; ketones such as diacetone alcohol are preferred.
- the amount of the solvent to be used can be appropriately determined according to the application, the coating method, and the like.
- the photosensitive resin film of the present invention can contain a thermal polymerization inhibitor.
- thermal polymerization inhibitors include pyrogallow ⁇ ", benzoquinone, hydroquinone, methylenepnole, tertiary butyl phenol, monobenzino oleate, methylhydroquinone, amyl quinone, amide xyhydroquinone, ⁇ -butyl phenol, Phenoenole, hydroquinone monopropinole ethereone, 4,4 '-(1-methylethylidene) bis (2-methylphenol), 4,4'-(1-methylethylidene) bis (2,6-dimethylphenol), 4, 4 '1 [1-[4-1 (1-(4-hydroxyphenyl) 1-methylethyl) phenyl] ethylidene] bisphenol, 4, 4', 4 "-ethylidenetris (2-methylphenol), 4, 4 ', 4 "-ethy
- the photosensitive resin film of the present invention may contain a surfactant for the purpose of improving applicability, defoaming property, leveling property and the like.
- surfactants include ⁇ -1000, ⁇ -1100 (all manufactured by ⁇ Chemical Co., Ltd.), Mega Fac F142D, F1172, F173, and F183 (all Daikin Ink).
- an adhesive aid may be used in the photosensitive resin film of the present invention in order to improve the adhesiveness with the chip substrate.
- a functional silane coupling agent is effective.
- the functional silane coupling agent means a silane coupling agent having a reactive substituent such as a carboxyl group, a methacryloyl group, an isocyanate group, or an epoxy group, and specific examples thereof include trimethoxysilylbenzoic acid.
- ⁇ -metararyloxypropyltrimethoxysilane, vinyltriethoxyethoxysilane, vinyltrimethoxysilane, ⁇ -isocyanatoprovyletethoxysilane, ⁇ -glycidoxypropyltrimethoxysilane, ⁇ - (3,4-epoxycyclohexyl) ethyltrimethoxysilane, etc. be able to.
- the use amount thereof is preferably 20 parts by weight or less based on 100 parts by weight of the alkali-soluble copolymer ( ⁇ ).
- acetic acid, propionic acid, ⁇ -butyric acid, iso-butyric acid, n-monovaleric acid, iso-valeric acid are used for fine adjustment of solubility in an alkali developing solution.
- Monocarboxylic acids such as benzoic acid, benzoic acid and cinnamic acid; lactic acid, 2-hydroxybutyric acid, 3-hydroxybutyric acid, salicylic acid, m-hydroxybenzoic acid, ⁇ -hydroxybenzoic acid, 2-hydroxycinnamic acid, 3-hydroxy Hydroxymonocarboxylic acids such as cinnamic acid, 4-hydroxycinnamic acid, 5-hydroxyisophthalic acid, and syringic acid; oxalic acid, succinic acid, daltaric acid, Pinic acid, maleic acid, itaconic acid, hexahydrophthalic acid, phthalic acid, isophthalic acid, terephthalic acid, 1,2-cyclohexanedicarboxylic acid, 1,2,4-cyclohexanetricarboxylic acid, trimellitic acid , Pyromellitic acid, cyclopentanetetracarboxylic acid, butanetetracarboxylic acid, polyvalent
- the photosensitive resin film of the present invention may contain a filler, a colorant, a viscosity modifier and the like as necessary.
- filler examples include silica, alumina, talc, bentonite, zirconium silicate, and powdered glass.
- Coloring agents include constitutional dermatology such as alumina white, clay, barium carbonate, and barium sulfate; zinc white, lead white, graphite, lead red, ultramarine, navy blue, titanium oxide, zinc chromate, red iron oxide, carbon black, etc.
- Organic pigments such as Brilliant Carmine 6B, Normal Red 6B, Normal Red R, Benzidine Yellow, Phthalocyanine Blue, Phthalocyanine Green; Basic Dyes such as Magenta and Rhodamine; Direct Scarlet, Direct Orange, etc. Direct dyes; acid dyes such as roserin and meta-niirou yellow.
- a viscosity modifier bentonite, silica gel, aluminum powder And the like.
- the amount of these additives used may be within the range that does not impair the object of the present invention, and is preferably 5% when the total amount of the components (A), (B) and (C) is 100% by weight. 0% by weight or less.
- the photosensitive resin film according to the present invention is formed using the above-described components.
- the above-described components are mixed to prepare a radiation-sensitive resin composition.
- the components (A), (B), and (C) described above, and if necessary, other components These components may be mixed and stirred by a method, and when the filler and the pigment are added, these components may be dispersed and mixed using a disperser such as a dissolver, a homogenizer, or a three-roll mill. Further, if necessary, each component or the obtained resin composition may be filtered using a mesh, a membrane filter, or the like.
- the photosensitive resin film according to the present invention is formed using the resin composition obtained in this manner.
- the resin composition is coated on a chip base material, and the solvent is removed by heating.
- the photosensitive resin film may be formed on a chip substrate, or the resin composition may be applied on a flexible base film in advance and dried to form a photosensitive resin film, and then used. In this case, the photosensitive resin film may be attached to the chip base material.
- the photosensitive resin film formed on the base film is preferably stored by laminating a force-sensitive film thereon when not in use.
- the base film for example, synthetic resin films such as polyethylene terephthalate, polyethylene, polypropylene, polycarbonate, polyether sulfone, and polychlorinated vinyl can be used.
- the thickness of the base film is preferably from 15 to: L2, preferably in the range of 5 ⁇ .
- an applicator, a bar coater, a mouth coater, a curtain flow coater, a die coater, a spin coater, screen printing, and the like are used.
- the thickness of the obtained photosensitive resin film is usually 50 ⁇ m or more, preferably 50 to 150 m, more preferably 50 to 100 ⁇ m, as a dry film thickness after removing the solvent. It is.
- the photosensitive resin film thus obtained has a dry film thickness of 50 ⁇ m or more, it is suitable for forming bumps by photoapplication.
- the drying conditions for forming the photosensitive resin film vary depending on the type of each component in the resin composition, the mixing ratio, the thickness of the coating film, and the like. It is preferably 80 to 150, and is about 5 to 20 minutes. If the drying time is too short, the adhesion during development will be poor, and if it is too long, the resolution may be reduced due to heat fogging.
- the surface of the chip substrate needs to be coated with a metal.
- the method of coating the surface of the chip base material with a metal is not particularly limited, and examples thereof include a method of depositing a metal and a method of sputtering.
- the photosensitive resin film provided on the chip base material is irradiated with ultraviolet light or visible light having a wavelength of 300 to 500 nm through a photomask having a predetermined pattern shape, thereby forming a bump.
- the cured film according to the present invention can be obtained by photo-curing the exposed portions other than the pattern and removing the non-exposed portions by alkali development.
- a low-pressure mercury lamp As a light source, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a metal halide lamp, an argon gas laser, or the like can be used.
- the amount of light irradiation varies depending on the type and blending amount of each component in the composition, the thickness of the coating film, and the like. For example, when a high-pressure mercury lamp is used, 100 to 150 0 111> / ⁇ ; 111 2
- the development method uses an alkaline aqueous solution as a developer, The exposed part is dissolved and removed, leaving only the exposed part to obtain a cured film of a predetermined pattern.
- the developing solution include sodium hydroxide, hydroxylating water, sodium carbonate, sodium silicate, sodium metasilicate, aqueous ammonia, ethylamine, n-propamine, getylamine, di- ⁇ -propylamine, triethylamine, Methyl getylamine, dimethylethanolamine, triethanolanolamine, tetramethinoleammonium hydroxide, tetraethizoleammonium hydroxide, pyrroline, piperidine, 1,8-diazabicyclo [5.4.0] Aqueous solutions of alcohols such as 7-ndecene and 1,5-diazabicyclo [4.3.0] -5-nonane can be used.
- an aqueous solution obtained by adding an appropriate amount of a water-soluble organic solvent such as methanol or ethanol to a surfactant to an aqueous solution of the above-mentioned alcohols can also be used as a developer.
- the development time varies depending on the type of each component in the resin composition, the compounding ratio, the thickness of the coating film, etc., but is usually 30 to 360 seconds.
- the development method is a puddle method, a diving method, or the like. Any of a paddle method, a spray method, a shadow developing method and the like may be used. After development, wash with running water for 30 to 90 seconds, and air dry using an air gun or heat under a hot plate or oven.
- the photosensitive resin film of the present invention can be sufficiently cured only by the above-mentioned light irradiation, but may be further cured by additional light irradiation (hereinafter, referred to as post-exposure) or heating depending on the application. Can be.
- the post-exposure can be carried out in the same manner as in the above-mentioned radiation irradiation method, and the amount of light irradiation is not particularly limited. However, when a high-pressure mercury lamp is used, 100 to 2000 mJZcm 2 is preferable.
- the method of heating is to use a heating device such as a hot plate or an oven at a predetermined temperature, for example, at 60 to 100 ° C for a predetermined time, for example, for 5 to 30 minutes on a hot plate.
- a heating device such as a hot plate or an oven at a predetermined temperature, for example, at 60 to 100 ° C for a predetermined time, for example, for 5 to 30 minutes on a hot plate.
- heat treatment should be performed for 5 to 60 minutes. After this By the treatment, a cured film having a predetermined pattern having more favorable characteristics can be obtained.
- the chip substrate having the patterned cured film is immersed in various plating liquids for electric plating, and the plating is performed by setting a current value and a conduction time so that a desired plating thickness is obtained.
- the base material is immersed in a stripping solution for 5 to 30 minutes in an agitating solution at ⁇ 80 ° C for 5 to 30 minutes to peel off the cured film. High bumps can be formed.
- stripping solution used here examples include an aqueous solution of a quaternary ammonium salt and a mixed solution of a quaternary ammonium salt, dimethyl sulfoxide and water.
- This composition solution was filtered through a capsule filter having a pore size of 10 ⁇ Hi to obtain a radiation-sensitive liquid resin composition.
- HI TACH IS pectrophotometer U—210 After forming a 7 ⁇ m-thick photosensitive resin film on a 1-mm-thick quartz substrate by the above method, use HI TACH IS pectrophotometer U—210 to apply the quartz substrate used for coating. The transmittance was measured at 365 nm and at 405 nm using as a reference.
- the photosensitive resin film was exposed to ultraviolet light of 100 mJ / cm 2 using an ultra-high pressure mercury lamp (HB0-1000WZD manufactured by OSRAM) through a pattern mask for resolution measurement. This was developed with a 2.38% by weight aqueous solution of tetramethylammonium hydroxide, washed with running water, and spin-dried to obtain a patterned cured film as a test sample. This was observed with a scanning electron microscope, and the resolution was measured.
- the resolution is determined by the resolution of a square pattern of 75 ⁇ 75 ⁇ , resolved without leaving any resist, and when the angle of the side wall is 85-95 °, it is ⁇ , and when it is out of this range, Indicated by “ ⁇ ”.
- the adhesion to the substrate is measured by observing the cross section of the cured resist film after development using a scanning electron microscope.If no lift of the resist is observed around the opening or at the edge of the wafer, the resist is lifted by AJ. The case where peeling of the resist or the resist was observed is indicated by “B”.
- the residual film ratio was determined by measuring the film thickness after development.
- the residual film ratio by dividing the film thickness after the development at a film thickness after pre-beta, multiplied by 1 00, which is another value.
- the value of the residual film ratio is indicated by “A” for 90% or more and “B” for less than 90%.
- Electrolytic copper plating is performed, and then using THB-S2 (manufactured by JSR) as a stripping solution, stirring at 40 ° C for 20 minutes The test object was obtained while immersing. Electrolytic plating is used as a plating solution for microfiber manufactured by Nippon Electroplating
- electrolytic plating was performed at 25 ° C., 3 A / dm 2 , for 40 minutes to form bumps 60 ⁇ m in height.
- the plating resistance was evaluated as follows: the peeled-off plating pattern transferred the resist pattern, that is, the bump width was within 103% of the resist pattern, and the plating leached out of the resist opening and precipitated. The criteria are that they do not meet the criteria, and "A” indicates that the conditions are satisfied, and "B” indicates that they do not.
- the peelability was evaluated by observing the specimen from which the cured film was peeled off by the above method using a scanning electron microscope, and ⁇ A '' when no residue was observed and ⁇ B '' when residue was observed. Was.
- a radiation-sensitive liquid resin composition was prepared in the same manner as in Example 1 except that the composition was changed, and the characteristics of the photosensitive resin film and the cured film were evaluated in the same manner as in Example 1. did.
- a radiation-sensitive liquid resin composition was prepared in the same manner as in Example 1 except that the composition was changed, and the characteristics of the photosensitive resin film and the cured film in the same manner as in Example 1 was evaluated.
- Comparative Example 1 A2 100 30 20 3.34 3.34 2.01 Comparative Example 12 A2 100 30 20 44 24
- B 2 Pentaerythritol triatarylate
- B 3 Trimethylolpropane triatalylate
- B 4 Dimethylol tricyclodecane diatalylate
- B 5 Dipentaerythritol monopentapentaacrylate
- the photosensitive resin film and the cured film of the present invention are suitable for forming a bump by photo application, and are useful for the semiconductor industry.
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Materials For Photolithography (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Polymerisation Methods In General (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04723323A EP1610177B1 (en) | 2003-04-01 | 2004-03-25 | Photosensitive resin film and cured film made therefrom |
US10/551,447 US7214471B2 (en) | 2003-04-01 | 2004-03-25 | Photosensitive resin film and cured film made therefrom |
DE602004031718T DE602004031718D1 (de) | 2003-04-01 | 2004-03-25 | Lichtempfindlicher harzfilm und daraus hergestellter ausgehärteter film |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003098392A JP4300847B2 (ja) | 2003-04-01 | 2003-04-01 | 感光性樹脂膜およびこれからなる硬化膜 |
JP2003-098392 | 2003-04-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2004090637A1 true WO2004090637A1 (ja) | 2004-10-21 |
Family
ID=33156670
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/004155 WO2004090637A1 (ja) | 2003-04-01 | 2004-03-25 | 感光性樹脂膜およびこれからなる硬化膜 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7214471B2 (ja) |
EP (1) | EP1610177B1 (ja) |
JP (1) | JP4300847B2 (ja) |
KR (1) | KR101042777B1 (ja) |
CN (1) | CN100589032C (ja) |
DE (1) | DE602004031718D1 (ja) |
TW (1) | TW200500796A (ja) |
WO (1) | WO2004090637A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101258169B (zh) * | 2005-09-08 | 2011-01-19 | Jsr株式会社 | 放射线敏感性树脂组合物和滤色片 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7927778B2 (en) * | 2004-12-29 | 2011-04-19 | Tokyo Ohka Kogyo Co., Ltd. | Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
US7951522B2 (en) * | 2004-12-29 | 2011-05-31 | Tokyo Ohka Kogyo Co., Ltd. | Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
WO2007026520A1 (ja) * | 2005-08-30 | 2007-03-08 | Jsr Corporation | 感放射線性樹脂組成物およびメッキ造形物の製造方法 |
JP4765974B2 (ja) * | 2006-03-30 | 2011-09-07 | Jsr株式会社 | ネガ型感放射線性樹脂組成物 |
KR20070098654A (ko) | 2006-03-30 | 2007-10-05 | 제이에스알 가부시끼가이샤 | 네가티브형 감방사선성 수지 조성물 |
CN101600694A (zh) | 2007-01-29 | 2009-12-09 | 卫材R&D管理有限公司 | 未分化型胃癌治疗用组合物 |
JP5093226B2 (ja) * | 2007-03-20 | 2012-12-12 | Jsr株式会社 | 感放射線性樹脂組成物 |
TW200919085A (en) * | 2007-09-18 | 2009-05-01 | Asahi Kasei Emd Corp | Photosensitive resin composition and laminate thereof |
JP5076945B2 (ja) * | 2008-02-12 | 2012-11-21 | Jsr株式会社 | ネガ型感放射線性樹脂組成物 |
JP2011132349A (ja) * | 2009-12-24 | 2011-07-07 | Jnc Corp | インクジェット用インク |
KR102027756B1 (ko) | 2012-01-19 | 2019-10-02 | 닛산 가가쿠 가부시키가이샤 | 네가티브형 감광성 수지 조성물 |
JP5968007B2 (ja) * | 2012-03-30 | 2016-08-10 | 太陽インキ製造株式会社 | 光硬化性樹脂組成物、ドライフィルムおよびプリント配線板 |
JP6315204B2 (ja) | 2012-10-02 | 2018-04-25 | 日産化学工業株式会社 | ネガ型感光性樹脂組成物 |
CN105765458B (zh) | 2013-10-21 | 2020-12-29 | 日产化学工业株式会社 | 负型感光性树脂组合物 |
JP6524972B2 (ja) * | 2015-09-28 | 2019-06-05 | Jsr株式会社 | 対象物の処理方法、仮固定用組成物、半導体装置及びその製造方法 |
JP7067470B2 (ja) * | 2016-03-31 | 2022-05-16 | 昭和電工マテリアルズ株式会社 | 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品 |
JP6897667B2 (ja) * | 2016-03-31 | 2021-07-07 | 昭和電工マテリアルズ株式会社 | 感光性樹脂組成物、感光性樹脂フィルム、硬化物及びその製造方法、積層体、並びに、電子部品 |
JP2016139150A (ja) * | 2016-04-04 | 2016-08-04 | 太陽インキ製造株式会社 | 光硬化性樹脂組成物、ドライフィルムおよびプリント配線板 |
US20200012191A1 (en) * | 2017-03-28 | 2020-01-09 | Toray Industries, Inc. | Photosensitive resin composition, cured film, element equipped with cured film, organic el display device equipped with cured film, cured film production method, and organic el display device production method |
JP2020076945A (ja) * | 2018-09-21 | 2020-05-21 | 旭化成株式会社 | 感光性樹脂組成物 |
TWI791224B (zh) * | 2021-05-26 | 2023-02-01 | 達興材料股份有限公司 | 鹼可溶性樹脂、保護層組成物、保護層、積層體以及光阻圖案的形成方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03188150A (ja) * | 1989-10-25 | 1991-08-16 | Hercules Inc | ハンダ付けマスク用液状組成物 |
JPH11271974A (ja) * | 1998-03-23 | 1999-10-08 | Nippon Zeon Co Ltd | 新規アクリルモノマー、新規アクリルポリマー、レジスト組成物及びそれを用いたパターン形成方法 |
JP2000039709A (ja) * | 1998-07-24 | 2000-02-08 | Jsr Corp | 感放射線性樹脂組成物、バンプ形成用および配線形成用材料ならびにドライフィルムレジスト |
JP2000336121A (ja) * | 1998-11-02 | 2000-12-05 | Shin Etsu Chem Co Ltd | 新規なエステル化合物、高分子化合物、レジスト材料、及びパターン形成方法 |
JP2002182381A (ja) * | 2000-12-11 | 2002-06-26 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法 |
JP2003029604A (ja) * | 2001-07-19 | 2003-01-31 | National Institute Of Advanced Industrial & Technology | ホログラム記録材料用組成物、ホログラム記録媒体およびその製造方法 |
JP2003113174A (ja) * | 2001-07-30 | 2003-04-18 | Mitsubishi Chemicals Corp | ラクトン構造を有する多環式化合物 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4786569A (en) * | 1985-09-04 | 1988-11-22 | Ciba-Geigy Corporation | Adhesively bonded photostructurable polyimide film |
US5217847A (en) * | 1989-10-25 | 1993-06-08 | Hercules Incorporated | Liquid solder mask composition |
JPH0878318A (ja) * | 1994-09-08 | 1996-03-22 | Japan Synthetic Rubber Co Ltd | アルカリ現像型フォトレジスト組成物 |
JP3011864B2 (ja) * | 1994-12-09 | 2000-02-21 | 日本ペイント株式会社 | 水現像性感光性樹脂組成物 |
JPH10161310A (ja) * | 1996-12-04 | 1998-06-19 | Jsr Corp | 感放射線性樹脂組成物 |
US6338936B1 (en) * | 1998-02-02 | 2002-01-15 | Taiyo Ink Manufacturing Co., Ltd. | Photosensitive resin composition and method for formation of resist pattern by use thereof |
US6312867B1 (en) * | 1998-11-02 | 2001-11-06 | Shin-Etsu Chemical Co., Ltd. | Ester compounds, polymers, resist compositions and patterning process |
JP2002303973A (ja) * | 2001-04-06 | 2002-10-18 | Asahi Kasei Corp | 厚膜導体回路用液状感光性樹脂組成物 |
JP4048791B2 (ja) * | 2002-02-18 | 2008-02-20 | Jsr株式会社 | 感放射線性樹脂組成物 |
-
2003
- 2003-04-01 JP JP2003098392A patent/JP4300847B2/ja not_active Expired - Lifetime
-
2004
- 2004-03-25 US US10/551,447 patent/US7214471B2/en not_active Expired - Lifetime
- 2004-03-25 WO PCT/JP2004/004155 patent/WO2004090637A1/ja active Application Filing
- 2004-03-25 DE DE602004031718T patent/DE602004031718D1/de not_active Expired - Lifetime
- 2004-03-25 EP EP04723323A patent/EP1610177B1/en not_active Expired - Lifetime
- 2004-03-25 KR KR1020057018706A patent/KR101042777B1/ko active IP Right Grant
- 2004-03-25 CN CN200480008907A patent/CN100589032C/zh not_active Expired - Fee Related
- 2004-04-01 TW TW093109115A patent/TW200500796A/zh not_active IP Right Cessation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03188150A (ja) * | 1989-10-25 | 1991-08-16 | Hercules Inc | ハンダ付けマスク用液状組成物 |
JPH11271974A (ja) * | 1998-03-23 | 1999-10-08 | Nippon Zeon Co Ltd | 新規アクリルモノマー、新規アクリルポリマー、レジスト組成物及びそれを用いたパターン形成方法 |
JP2000039709A (ja) * | 1998-07-24 | 2000-02-08 | Jsr Corp | 感放射線性樹脂組成物、バンプ形成用および配線形成用材料ならびにドライフィルムレジスト |
JP2000336121A (ja) * | 1998-11-02 | 2000-12-05 | Shin Etsu Chem Co Ltd | 新規なエステル化合物、高分子化合物、レジスト材料、及びパターン形成方法 |
JP2002182381A (ja) * | 2000-12-11 | 2002-06-26 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法 |
JP2003029604A (ja) * | 2001-07-19 | 2003-01-31 | National Institute Of Advanced Industrial & Technology | ホログラム記録材料用組成物、ホログラム記録媒体およびその製造方法 |
JP2003113174A (ja) * | 2001-07-30 | 2003-04-18 | Mitsubishi Chemicals Corp | ラクトン構造を有する多環式化合物 |
Non-Patent Citations (1)
Title |
---|
See also references of EP1610177A4 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101258169B (zh) * | 2005-09-08 | 2011-01-19 | Jsr株式会社 | 放射线敏感性树脂组合物和滤色片 |
Also Published As
Publication number | Publication date |
---|---|
TW200500796A (en) | 2005-01-01 |
DE602004031718D1 (de) | 2011-04-21 |
EP1610177A1 (en) | 2005-12-28 |
KR20050120771A (ko) | 2005-12-23 |
TWI336813B (ja) | 2011-02-01 |
US20060210912A1 (en) | 2006-09-21 |
EP1610177A4 (en) | 2010-07-07 |
JP4300847B2 (ja) | 2009-07-22 |
US7214471B2 (en) | 2007-05-08 |
EP1610177B1 (en) | 2011-03-09 |
CN1768304A (zh) | 2006-05-03 |
CN100589032C (zh) | 2010-02-10 |
KR101042777B1 (ko) | 2011-06-20 |
JP2004302389A (ja) | 2004-10-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7482111B2 (en) | Negative radiation-sensitive resin composition | |
WO2004090637A1 (ja) | 感光性樹脂膜およびこれからなる硬化膜 | |
JP4048791B2 (ja) | 感放射線性樹脂組成物 | |
JP4677967B2 (ja) | ガラスエッチング用放射線硬化性レジスト樹脂組成物およびこれを用いたガラス基板の製造方法 | |
JP4655726B2 (ja) | ネガ型感放射線性樹脂組成物 | |
JP4765974B2 (ja) | ネガ型感放射線性樹脂組成物 | |
JP3832099B2 (ja) | バンプ形成用材料および配線形成用材料 | |
JP3575109B2 (ja) | バンプ形成用材料 | |
JP2000039709A5 (ja) | ||
JP5360059B2 (ja) | ネガ型感放射線性樹脂組成物 | |
JP5093226B2 (ja) | 感放射線性樹脂組成物 | |
JP2009163080A (ja) | ガラスエッチング用放射線硬化性レジスト樹脂組成物およびこれを用いたガラス基板の製造方法 | |
KR20070098654A (ko) | 네가티브형 감방사선성 수지 조성물 | |
JP2006091490A (ja) | 層間絶縁膜形成用感放射線性樹脂組成物および層間絶縁膜 | |
JPH10319592A (ja) | 感放射線性樹脂組成物 | |
JP2001290265A (ja) | 感放射線性樹脂組成物及びこれを用いたフォトリソグラフィ | |
JP2009244295A (ja) | プリント配線基板用感放射線性樹脂組成物 | |
JPH10161310A (ja) | 感放射線性樹脂組成物 | |
JPH0829980A (ja) | 回路基板形成用アルカリ現像型フォトレジスト組成物 | |
JPH10161307A (ja) | 感放射線性樹脂組成物 | |
JP2010026431A (ja) | ネガ型感放射線性樹脂組成物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2004723323 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 20048089077 Country of ref document: CN Ref document number: 10551447 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020057018706 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 1020057018706 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 2004723323 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 10551447 Country of ref document: US |