WO2004046739A1 - 電気的プローブシステム - Google Patents
電気的プローブシステム Download PDFInfo
- Publication number
- WO2004046739A1 WO2004046739A1 PCT/JP2003/014717 JP0314717W WO2004046739A1 WO 2004046739 A1 WO2004046739 A1 WO 2004046739A1 JP 0314717 W JP0314717 W JP 0314717W WO 2004046739 A1 WO2004046739 A1 WO 2004046739A1
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- WO
- WIPO (PCT)
- Prior art keywords
- probe
- substrate
- group
- probe unit
- board
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
- G01R1/07364—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card with provisions for altering position, number or connection of probe tips; Adapting to differences in pitch
- G01R1/07371—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card with provisions for altering position, number or connection of probe tips; Adapting to differences in pitch using an intermediate card or back card with apertures through which the probes pass
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06716—Elastic
- G01R1/06722—Spring-loaded
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
- G01R1/07314—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card the body of the probe being perpendicular to test object, e.g. bed of nails or probe with bump contacts on a rigid support
Definitions
- the present invention relates to an electrical probe system, and in particular, to a plurality of electrical contacts (hereinafter referred to as “pads”) of a circuit board to be inspected, which individually make contact with an electrical contact (hereinafter referred to as a “pad”) to form a conductive path for inspection. It relates to an electrical probe system equipped with a pulsive contact probe (spring type conductive contact, hereinafter simply referred to as “probe”).
- pulsive contact probe spring type conductive contact
- the electric probe system generally includes a substrate holding mechanism for holding a test substrate, and a probe unit capable of three-dimensionally positioning the holding mechanism with a robot or the like.
- the conventional probe unit has a configuration in which a plurality of probes are implanted on one surface of a probe holder under the same conditions.
- the contact pressure between the probe and the pad be equal. Measurement accuracy can be obtained and inspection can be performed smoothly.
- the substrate holding mechanism has been devised so as to prevent deformation of the test substrate and maintain desired measurement accuracy.
- An object of the present invention is to provide an electric probe system that does not impair the smoothness of inspection for preventing deformation even when the substrate size becomes large. Disclosure of the invention
- the present inventors have found that an electric probe system that makes a probe elastically contact a pad has a good contact performance with the probe, and therefore, the stroke (that is, the tip of the probe due to the expansion and contraction of the probe) is reduced. (Displacement) within an appropriate width, it is possible to obtain a contact pressure that can maintain the measurement accuracy at a given location. Therefore, even if the planting conditions of the probe are changed, the stroke By controlling the area, the contact pressure can be adjusted within a range in which a desired measurement accuracy can be maintained.
- the present invention includes a holding mechanism for holding a test substrate, and a pro-unit which can be positioned with respect to the holding mechanism, wherein the pro-unit has a first pad group of m substrates, Within the stroke domain, the first probe group that can be contacted by a predetermined range of contact pressure and the second group of pads on the IJ substrate are blinded by the first stroke.
- a second probe group that can be elastically contacted by the predetermined range of contact pressure in a second stroke variation region different from the variation region;
- An electrical probe system including a probe holder on which first and second probe groups are implanted.
- the first stroke domain in which the first probe group can be in contact with the first pad group by a predetermined range of contact pressure is the same as the second probe group.
- the second stroke domain that can be in contact with the second pad group differs depending on the contact pressure in the range.
- the top envelope of the first pad group is included in the first stroke domain, and the top envelope of the second pad group is the second envelope.
- the contact pressure of the first and second probe groups Is within a predetermined range, and a desired measurement degree is maintained.
- the deformation of the test substrate held by the holding mechanism is predicted, and the envelope surface at the top of the pad, which is displaced accordingly, is divided stepwise, and the pad corresponding to one of the descending divided surfaces is divided.
- the first pad group the pad corresponding to the other is the second pad group, and a probe unit having a probe group capable of dealing with those pad groups is prepared.
- the inspection can be performed with a desired measurement accuracy without preventing the substrate from being deformed, and even when the substrate size becomes large, the smoothness of the inspection is not impaired to prevent the deformation.
- FIG. 1 is a schematic diagram of an i-mode according to the first embodiment of the present invention.
- Figure 2 shows a cross section of the probe of the electrical probe system of Figure 1.
- FIG. 3 is a sectional view showing a modification of the probe of FIG.
- FIG. 4 is a cross-sectional view showing another modification of the probe of FIG. 2
- FIG. 5 is a plan view of a board to be inspected by the electrical probe system of FIG.
- FIG. 6 is a plan view of the substrate holding mechanism for holding the substrate of FIG. 5;
- FIG. 7 is a plan view showing a modification of the substrate holding mechanism of FIG. 6;
- Figure 9 predicts the deformation of the substrate held by the substrate holding mechanism in Figure 6.
- FIG. 10 is a diagram illustrating the principle of the present invention.
- FIG. 11 is a side view of an electric probe system according to a second embodiment of the present invention.
- Figure 12 is a bottom view of the probe unit of the electrical probe system of Figure 11;
- Figure 13 is a cross-sectional view of the probe unit of Figure 12 taken along line XII-I-XIII.
- FIG. 14 is a bottom view of a port unit of the electric probe system according to the third embodiment of the present invention.
- FIG. 15 is a sectional view taken along the line XV-XV of the probe unit of FIG. 14;
- FIG. 16 is a side view of an electric probe system according to the fourth embodiment of the present invention.
- Figure 17 is a perspective view of the lower unit of the electrical probe system of Figure 16.
- FIG. 18 is a cross-sectional view of a main part of an electric probe system according to a fifth embodiment of the present invention.
- FIG. 19 is a cross-sectional view of a main part of an electric probe system according to a sixth embodiment of the present invention.
- FIG. 20 is a sectional view of a main part of an electric probe system according to a seventh embodiment of the present invention.
- FIG. 6 is a plan view of a substrate holding mechanism 2 for holding the substrate 10
- FIG. 7 is a plan view showing a modification example 12 of the substrate holding mechanism 2. is there.
- the electric probe system PS 1 has a substrate holding mechanism 2 for holding a substrate 10 horizontally, and a tertiary robot arm RA for the holding mechanism 2. And a probe unit 3 that can be originally positioned.
- the probe unit 3 is configured as a probe module supported by an arm RA of a computer-assisted multi-axis positioning robot called a “tester”, and has a substantially flat insulating housing MH and It consists of the center and left and right probe blocks 5a, 5b and 5a arranged exclusively for the substrate 10 to be inspected.
- Each pro Buburo click 5 a, 5 b, 5 a, the probe 5 n hundreds or thousands, ra Are planted in the central area 3b on the bottom surface (3a, 3b, 3a) of the module housing MH, and the lower end of each contact is exposed at a predetermined design distance and configured as a matrix.
- the left and right regions 3a on the bottom surface (3a, 3b, 3a) of the module housing MH are lifted up via the step 3c to avoid hitting due to deformation of the substrate 10.
- 6 and 8 are mounting screws
- 7 is a positioning pin insertion hole.
- the module MH has a plate-shaped lower probe holder 3 d, a plate-shaped intermediate probe holder 3 e stacked on the lower probe holder 3 d, and A plate-shaped upper probe holder 3f laminated on the intermediate probe holder 3e; and an insulating substrate laminated on the upper probe holder 3f and formed with the lead conductor W1.
- Each support hole SH has a lower support hole SH1 passing through the lower holder 3d, an intermediate support hole SH2 passing through the intermediate holder 3e, and an upper support hole SH3 passing through the upper holder 3f. And power.
- the lower support hole SH1 is provided with an inward step to reduce the diameter of the lower SH4, and the upper support hole SH3 is also provided with an inward step to reduce the upper end SH5.
- the upper end of the upper support hole SH3 At the upper end of the upper support hole SH3, the lower end of the corresponding lead conductor W1 is exposed inward.
- Each probe 5 n ⁇ is a resilient conductive contact CP1 having upper and lower plungers PL1 and PL2, which are conductive needle members, and a conductive coil spring SP1 interposed therebetween. Be composed.
- the upper plunger PL1 extends from the intermediate support hole SH2 to the upper support hole
- Relatively long shaft PL11 extending to SH3 and upper support hole It has a relatively short needle head PL12 slidably fitted to the reduced diameter portion of SH3 and an intermediate flange PL13 slidably fitted to the large diameter portion of the upper support hole SH3.
- the lower plunger PL2 is slidably fitted to the relatively short shaft PL21 extending into the large diameter portion of the lower support hole SH1 and to the reduced diameter portion of the lower support hole SH1. It has a relatively long needle head PL22 protruding from the bottom surface 3b, and a middle flange PL23 slidably fitted to the large diameter portion of the lower support hole SH1.
- the coil spring SP1 includes a pitch-wound spiral SP11 extending along the shaft PL11 from the boss below the flange PL13 of the upper plunger PL1, and a flange PL23 above the lower plunger PL2 from the lower end of the coaxial PL11. And a tightly wound spiral portion SP12 extending over the boss portion.
- the coil spring SP1 is in an extended state in which the needle head PL12 of the upper plunger PL1 is in contact with the lower end of the lead wire W1 and the flange PL23 of the lower plunger PL2 is engaged with the step of the lower support hole SH1 (hereinafter referred to as " The needle head PL12 of the upper plunger PL1 abuts on the lower end of the lead wire W1 and the needle head PL22 of the lower plunger PL2 points to the holder lower surface 3b. It expands and contracts to a degenerate state (hereafter, often referred to as a “compression state”), which is almost flush.
- a degenerate state hereafter, often referred to as a “compression state”
- the upper and lower plungers PL1 and PL2 are constantly urged in the opposite direction by the spring SP1, and the lower plunger PL2 is pressed against the step of the lower support hole SH1 by the flange PL23, thereby being prevented from falling off.
- the tip of the needle head PL12 is pressed against the lower end of the lead conductor W1.
- Needle head PL22 lower plunger PL2 of each probe 5 n, m is off the infested from the support hole SH in response to expansion and contraction of the coil spring SP1, the apex end corresponds to the full rie state of the coil spring SP 1 Release stroke position PS1, force, etc., to compression stroke position PS2 corresponding to the compression state of coil spring SP1 (hereinafter referred to as “full stroke”) Displacement within distance h I do.
- the top (more precisely, the upper surface) of the pad 1 lk corresponding to the probe 5 n , m is positioned at a distance d from the holder mask 3 b within the inspection area 11 ′ of the substrate 10. Place, the distance d of this if short Ri by full-collected by filtration chromatography click h, the probe 5 n, the lower end of the m (this means that the tip of the lower bra Nja needle head PL22) is, from the full lease door stroke position PS1
- the contact pressure Pn , m With the contact pressure Pn , m corresponding to the compression amount (h-d) of the contact, it comes into contact with the top of the node Ilk.
- the contact pressure P n , m becomes almost zero at the free stroke position PS1, and reaches the maximum Pmax at the compression stroke position PS2.
- the accuracy (ie, the number of significant digits) of the measurement with each probe 5 n , m is determined by the pressure threshold width (upper pressure-lower pressure) defined by the specific upper and lower limits (0 ⁇ lower pressure, upper pressure ⁇ Pmax). ) Continuously depends on the contact pressures P n , B , so that the accuracy of the measurement by the probe unit 3 overlaps with the pressure threshold width of all the probes 5 (by adoption of a good coil spring).
- the contact pressure P n , n can be made to depend continuously on the absolute value within the overlap, and the individual probe 5 ⁇ , ⁇ implantation conditions (member specifications and mounting (Including specifications).
- a reference value of the contact pressure corresponding to the theoretical measurement accuracy (that is, a theoretical equal pressure value) is set within the overlap of the above-mentioned pressure threshold width, and above and below this reference value (for all probes 5). ) If a common differential area is set and measurement is performed with the contact pressure within that area, the accuracy of the measurement will be It means that it is included in the mathematical neighborhood of the physical precision (that is, the range of the desired precision).
- the reference value of the stroke displacement that is ideal for obtaining the desired accuracy is determined “locally”, and the difference region ⁇ having a common width (for all the probes 5) above and below this reference value is defined. If ⁇ is set and measurement is performed with a stroke within the setting range (2 ⁇ Z), the desired measurement accuracy can be maintained.
- the stroke ( h_d) of the individual probe 5 n , ffl is the lower surface of the holder at the site corresponding to the substrate area 1 to be measured.
- the probe system psi can inspect the pad array on the back surface of the substrate 10 by holding the substrate 10 upside down by the holding mechanism 2.
- the probe unit V3 may be moved to the back side of the substrate 10 by the rod arm RA, in which case the probe 5 n , As m , the conductive contact CP2 for upward inspection shown in FIG. 3 or the full-spring conductive contact CP3 shown in FIG. 4 can be used.
- the conductive contact CP2 in FIG. 3 includes a center coil spring member SP2, and an upper conductive needle PL3 and a lower conductive needle PL4 connected to both ends of the spring member SP2.
- the upper needle-shaped body PL3 has a large-diameter body PL31 and a small-diameter shaft PL33 having a claw PL32 formed at the tip, and a retaining step PL34 is defined therebetween. It is.
- the claw portion PL32 elastically contacts a solder ball HB as a pad element provided on the back surface of the substrate area 11 ⁇ to be inspected.
- the position of the step PL34 of the needle-shaped body PL3 may be raised so that the contact CP2 can be pulled out together with the movable member.
- the lower needle-like body PL4 has a flange PL43 between a small-diameter shaft PL41 and a conical base PL42 in contact with the conductor of the wiring plate.
- the spring member SP2 is fitted to the tightly wound spiral part SP21 fitted to the lower boss of the body PL31 of the upper needle-like body PL3 and the upper boss of the flange PL43 of the lower needle-like body PL4. And a pitch winding spiral part SP22.
- the conductive contact CP3 shown in FIG. 4 is entirely composed of a coil spring member, and includes upper and lower tightly wound spiral portions SP3 and SP5 for providing a required rigidity and a pitch wound spiral portion SP4 for connecting them to provide a spring force. Yes.
- the upper and lower closely wound spiral portions SP3 and SP5 are formed with steps SP33 and SP53 at the boundary between the large-diameter koinole sounds SP31 and SP51 and the / J ⁇ -diameter koinole sounds SP32 and SP52. It is prevented from slipping out.
- FIG. 5 shows a total of IxJ semiconductor substrates 11 ⁇ ⁇ (hereinafter, generically referred to as 11) of the test substrate 10 cut and separated in the post-process of the inspection by the probe system PS1. As shown, it is composed of a main part 10a packaged in a matrix shape and four edges 10b surrounding the main part 10a.
- Each semiconductor substrate 11 has a size of length L / 3 ⁇ width W, and a large number of pads 1 lk are formed at predetermined positions on the front and back surfaces.
- the probe unit 3 is composed of three continuous semiconductor substrates 11 ′, ll i + 1 , j, ll i + 2 , j (for example, a region of length Lx width W shown by projection in the figure). Inspect at the same time.
- the substrate holding mechanism 2 for holding the test substrate 10 includes a rectangular outer frame 2a with one corner missing, and three corners 2d, 2e, 2f and four sides 2g, 2h. , 2i, 2j, an inner edge 2b extending along As shown in Fig. 1, a pressing member 2m slidably fitted in the corner 2c of the outer frame 2a and a pressing spring 2k for urging the pressing member 2m inward of the outer frame 2a.
- a holding frame FR that supports the outer frame 2a from the outside, and conveys and positions as necessary.
- the substrate 10 to be tested falls on the inner edge 2b while leaving a slight pressing margin, the notch 2n of the pressing member 2m is applied to one corner of the substrate 10, and the other three corners are pushed by the push spring 2k. It is positioned with respect to the outer frame 2a by pressing it into the three corners 2p, 2q, 2r of the inner edge 2b.
- the test substrate 10 may be held by the substrate holding mechanism 12 shown in FIG. 7 instead of the substrate holding mechanism 2 of FIG.
- the holding mechanism 12 includes a pair of corner members I2a and 12f and a holding frame (not shown) for holding the corner members I2a and 12f.
- Each corner member 12a and 12f has a small dimension defining right angles 12b and 12g.
- the board 10 is provided with outer frames 12c, 12d and 12h, 12i and corresponding inner edges 12e, 12j, and the substrate 10 is positioned with its diagonal portions at corners 12p, 12q of the inner edges 12e, 12j. .
- FIG. 8 is an explanatory view of a comparative example in which a conventional deformation prevention method is applied to the substrate holding mechanism 2
- FIG. 9 is an explanatory view for predicting deformation of the substrate 10 held by the substrate holding mechanism 2
- FIG. 3 is an explanatory view of the principle of the invention.
- the contact pressure PoxNxM (and the weight of the substrate 10) by the NxM probes 5 is negated, and the deflection of the substrate 10 is corrected by adding the reaction force Pc.
- the surface surrounding the top of the pad 1 lk of the target area 11., ll i +1 , j5 ll i +2 , j was parallel to the holder lower surface 3b. That is, in order to obtain a desired inspection accuracy, the isocontact pressure (Po) surface of the probe 5 (hereinafter referred to as “inspection reference surface”) was changed to a flat inspection reference surface RS0 for inspection.
- This reference plane RS0 is A single setting for all probes 5 matches the envelope at the top of the pad Ilk.
- the inspection is performed without performing the radius correction by the reaction force Fc, and the labor of the deflection correction is omitted. Therefore, considering the conventional method, as shown in Fig. 9, the iso-contact pressure (P1) surface of the probe 5 becomes the inspection reference surface RS1 that is bent downward, making it difficult to realize easily. ,.
- This reference plane RS 1 also coincides with the envelope surface at the top of the pad Ilk.
- the inspection reference plane RS1 is defined by a reference plane RS covered by a finite number (in this case, three) of spatial regions VI, V2, and V3 shown in Table 1 below. -11, RS-12, and RS-13, and a flat reference corresponding to the respective stroke displacement reference value (that is, the midpoint of the corresponding stroke domain 2 ⁇ ).
- the inspection is performed based on the new inspection reference plane RS2, which is replaced with the planes RS-21, RS-22, and RS-23, and these reference planes are combined, so that a smooth inspection is possible.
- the pitch of the 1 lk of the test substrate 10 has become smaller year by year, and at present, the pitch of about 0.2 mm is common.
- the pitch of the probe 5 becomes smaller, and the stroke of the probe is about 0.5 mm, which is commonly used, and the substrate tends to be thinner than 10 force S i .O mm.
- the size of the substrate 10 is increased (for example, 30 mm or more on each side), and the warpage due to the load of the probe unit 3 is also increased.
- the probe stroke becomes shorter, about 0.5 mm, and becomes closer, so the outer peripheral edge of the lower part of the upper probe unit and the substrate It is necessary to prevent interference with the surface to be inspected.
- Another object of the present invention is to make it possible to easily stabilize the contact of the probe with the substrate at the time of inspection.
- the surface of the probe unit 3 facing the substrate 10 to be tested is allowed to warp the substrate 10 caused by the load caused by the contact of the probe 5 with the node Ilk. There is a difference 3c.
- FIGS. 11 to 13 a second embodiment of the present invention and a third embodiment corresponding to a modified example thereof will be described with reference to FIGS. 11 to 13.
- the same elements as those in the first embodiment are indicated by the numbers of the embodiments before the reference numbers.
- FIG. 11 is a side view of the electric probe system PS2 according to the second embodiment
- FIG. 12 is a bottom view of the probe unit 23 of the probe system PS2
- FIG. 13 is a cross-sectional view taken along line XIII-XIII of FIG.
- FIG. 14 is a bottom view of the probe unit 33 of the electric probe system PS3 according to the third embodiment
- FIG. 15 is a cross-sectional view taken along the line XV-XV of FIG.
- the probe unit 23 includes a plurality of probes 25 corresponding to a pad 1 lk of the test board 10, and has a surface B facing the board 10. It has a stepped portion 23c that allows the substrate 10 to warp due to a load caused by the contact of the probe 5 with the pad.
- the probe unit 23 is located above the substrate 10 in the case of a one-sided inspection.
- the probe unit 23 is configured such that each probe 5 is elastically contacted with a corresponding pad Ilk by driving a cylinder or the like from above the substrate 10 whose peripheral edge is supported by the substrate holding chuck 22. Perform ⁇ . At this time, due to the load of the probe unit 23, the substrate 10 warps in a direction in which a portion corresponding to the center of the opposing surface B of the probe unit 23 becomes a valley.
- the probe unit 23 relieves the warpage of the substrate 10 at the step 23a formed on the facing surface B, and inspects the substrate 10 of the probe unit 3 for inspection. Avoid contact of the edge portion A with the surface C, and reduce the gap d between the facing surface B and the valley of the surface C to be inspected due to warpage.
- the probe unit 23 receives the substrate 10 without correcting the warpage of the substrate 10. For example, stress concentration does not occur even in the support portion of chuck 22.
- the center edge E of the step 23c which is the boundary of the step 23a, also has a sufficient distance D from the chuck 22 compared to the similar distance of the edge A. Due to the length, the contact load at the center edge E is much smaller than that at the edge A.
- the gap d resulting from the warpage of the substrate 10 can be reduced, the stroke of the probe 25 can be increased, and the contact stability due to the increase in the contact load of the probe can be achieved.
- the step is formed on the side of the higher portions 23b and 33b formed in the center of the facing surface B and formed on the facing surface B.
- the other parts are formed as lower parts 23a, 33a which are formed lower than the higher parts 23b, 33b.
- a high portion 23b is formed at the center of the opposing surface B so as to cross in the width direction, and the low portion 23a is a step 23c on both sides of the high portion 23b.
- the boundary is formed.
- a rectangular surface high portion 33b is formed at the center of the opposing surface B, and the low portion 33a encloses the high portion 33b and a step formed around the high portion 33b.
- Section 33c is the boundary.
- the warpage of the substrate 10 is released at the step formed as the lower portions 23a and 33a on the opposing surface B of the probe units 23 and 33, and the outer peripheral edges of the probe units 23 and 33 are exposed to the inspection surface C of the substrate 10.
- the gap d between the opposing surface B and the valley of the surface C to be inspected can be reduced because the central portion of the opposing surface B is set to the higher portions 23b and 33b.
- the surface C to be inspected is not damaged.
- the low part 23a, 33a is a probe of the height difference from the high part 23b, 33b.
- This height difference corresponds to the height H 1 of the steps 23c and 33c.
- the warp portion approaches the lower portions 23a, 33a, and the probes 25a, 35a there are higher portions.
- a larger stroke can be secured than the probes 25b and 35b of the 23b and 33b, and the contact load of the probes 25a and 35a in the lower portions 23a and 33a on the surface C to be measured is increased, and the contact stability of the probes is increased. Can be achieved.
- the difference in height between the lower portions 23a and 33a and the higher portions 23b and 33b is set to 15% or more of the full stroke h of the probes 25 and 35 because the probe has stable contact with the surface C to be inspected. This is to prevent interference with the outer wedges of the probe units 23 and 33.
- 23d, 23e, 23f and 33d, 33e, 33f are the lower holder, intermediate holder, and upper holder of the probe
- 23g and 33g are wiring plates
- L2, L21, L3, L31, and L32 are length dimensions.
- W2, W21, W3, W31, W32 and the width dimension, 26, 36, 27, 37 screws, 28a, 29a, 38a, 39a are ⁇ holes of the positioning pins 28b, 29b, 38b, 39b 0
- FIG. 16 is a side view of an electric probe system PS4 for simultaneous double-sided inspection according to the fourth embodiment
- FIG. 17 is a perspective view of a lower probe cut 44 of the probe system PS4.
- the probe system PS4 inspects the upper and lower probe units 43 and 44 that hold the board 10 from above and below by driving them with a cylinder, etc., and bringing the respective probes 45a and 45b and 45c and 45d into contact with the corresponding pads. I do.
- the upper probe unit 43 has a high portion 43b and a step portion (low portion) 43a that allows the substrate 10 to warp.
- the lower probe unit 44 also has a step portion (low portion) 44a and a high portion 44b. It is formed, and the warpage of the substrate 10 does not interfere.
- the probe 45c in the lower portion 44a of the lower probe unit 44 has a smaller stroke during inspection than the probe 45d in the higher portion 44b.
- the surface to be inspected by the lower probe unit 44 is on the side where the mother board is mounted, and the pads on the side where the mother board is mounted are arranged.
- the pitch is relatively wider than the tip mounting side, and the probes 45c and 45d of the lower probe unit 44 have a longer stroke than the probes 45a and 45b of the upper
- the size can be made large, and the number of pads on the motherboard mounting side is much smaller than that on the chip mounting side, and probe contact is stable.
- 44d, 44e, and 44f are the upper holder, intermediate holder, and lower holder of the probe, and 44g is the wiring plate.
- FIG. 18 is a cross-sectional view of a main part of an electric probe system PS5 according to a fifth embodiment
- FIG. 19 is a cross-sectional view of a main part of an electric probe system PS6 according to a sixth embodiment.
- the probe units 54 and 64 of the probe systems PS5 and PS6 are provided with probes 55 and 65 corresponding to the pads of the substrate 10, and the probe units 54 and 64 facing the surface to be inspected of the substrate 10 and the surface C thereof.
- the distance from the surface B differs from the warp of the substrate 10 caused by the elastic load of the probe 55.65.
- the probes 55 and 65 are grouped (55c, 55d, 55c; 65c, 65d, 65c) along the warp of the substrate 10, and the amount of protrusion is set for each group according to the above-mentioned separation distance.
- the probe portion resiliently contacts the surface to be inspected C on the concave side of the warp of the substrate 10, and the probe 55d corresponding to the concave valley of the substrate 10 is in the maximum protruding amount group G1.
- the probe 55c corresponding to the slope on both sides of the concave valley becomes the minimum protrusion amount group G2.
- the probe unit 65 the probe resiliently touches the surface C to be inspected on the convex side of the warpage of the substrate 10, and the probe 65d corresponding to the top of the convex surface of the substrate 10 becomes the minimum protrusion group G2, and the convex surface of the substrate 10
- the probe 65c corresponding to the slopes on both sides of the top is the maximum protrusion group G1.
- the probe unit 55 can be used as an upper probe unit for one-sided inspection, and the probe units 55 and 65 can be used as an upper probe unit and a lower probe unit for simultaneous double-sided inspection.
- the probes 55 and 65 of the probe units 55 and 65 are grouped along the curvature of the substrate 10, and the groups are determined according to the distance between the test surface C of the substrate 10 and the opposing surface B of the probe unit for each group. Because of the protruding amount, it makes stable contact with the entire inspection surface C despite the difference in the separation distance.
- the protrusion amount difference g between the maximum protrusion amount group G1 and the minimum protrusion amount group G2 is set to 20% or more of the maximum protrusion amount.
- the protrusion amount of the group G1 is 2 mm
- the protrusion amount of the group G2 is 1.5 mm.
- the probe of the maximum protruding amount group G1 comes into contact with the inspection surface C to cause the substrate 10 to warp and retreat into the probe units 54 and 64.
- the probe of the minimum protrusion group G2 contacts the surface C to be inspected, and then the maximum and The probes of the minimum protrusion groups Gl and G2 retreat together.
- the probe units 54 and 64 may include a group having an intermediate protrusion amount between the maximum protrusion amount group G1 and the minimum protrusion amount group G2.
- the contact of the probe with the inspection surface C is not stable.
- FIG. 20 is a cross-sectional view of a main part of an electric probe system PS7 according to the seventh embodiment.
- the maximum protrusion amount group G1 is constituted by a probe 75d provided in the high-order portion 74b of the surface facing the surface to be inspected of the probe unit 74, and the minimum protrusion amount
- the group G2 is constituted by the probe 75c provided in the lower portion 74a in the above-mentioned opposing surface.
- the warpage of the test board is released at the step formed on the facing surface of the probe unit, thereby preventing the outer peripheral edge of the probe unit from interfering with the test surface of the test board. It is possible to reduce the gap between the opposing surface of the probe unit due to the warp and the valley of the inspection surface of the inspection substrate, thereby easily stabilizing the contact of the probe with the substrate.
- the warpage of the test board is released at the step formed as a low part on the opposing surface of the probe unit, so that the probe unit It is possible to prevent the outer peripheral edge from interfering with the surface to be inspected of the substrate to be inspected. If the central portion of the opposing surface is formed at a higher position, the opposing surface of the professional unit and the substrate to be inspected due to warpage The gap with the valley of the surface to be inspected can be further reduced.
- the height difference between the lower part as the step part and the higher part is set as 15% or more of the full stroke of the probe.Pubs that can obtain contact stability are grouped along the warpage of the test board. In addition, since the amount of protrusion is given to each group in accordance with the distance between the test surface of the test substrate and the opposing surface of the probe unit, contact stability can be obtained over the entire test surface regardless of the difference in the separation distance. .
- This contact stability can be obtained without correcting the warpage of the test substrate, but with the warped state being substantially left, so that stress concentration in the contact state can be avoided.
- the contact stability can be improved by making the protrusion amount difference between the maximum protrusion amount group and the minimum protrusion amount group 20% or more of the large protrusion amount.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Measuring Leads Or Probes (AREA)
- Tests Of Electronic Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004553201A JP4486890B2 (ja) | 2002-11-19 | 2003-11-19 | 電気的プローブシステム |
CN2003801035864A CN1714297B (zh) | 2002-11-19 | 2003-11-19 | 电探针系统 |
AU2003284411A AU2003284411A1 (en) | 2002-11-19 | 2003-11-19 | Electric probe system |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002335656 | 2002-11-19 | ||
JP2002-335656 | 2002-11-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2004046739A1 true WO2004046739A1 (ja) | 2004-06-03 |
Family
ID=32321772
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2003/014717 WO2004046739A1 (ja) | 2002-11-19 | 2003-11-19 | 電気的プローブシステム |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP4486890B2 (ja) |
KR (1) | KR101067010B1 (ja) |
CN (1) | CN1714297B (ja) |
AU (1) | AU2003284411A1 (ja) |
TW (1) | TWI230796B (ja) |
WO (1) | WO2004046739A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014055818A (ja) * | 2012-09-12 | 2014-03-27 | Hioki Ee Corp | 基板検査装置および基板検査方法 |
JP2014119340A (ja) * | 2012-12-17 | 2014-06-30 | Micronics Japan Co Ltd | プローブカード、検査装置、及び検査方法 |
JP2014167411A (ja) * | 2013-02-28 | 2014-09-11 | Hioki Ee Corp | 基板検査装置 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5898243B2 (ja) * | 2014-01-09 | 2016-04-06 | 本田技研工業株式会社 | 電流印加装置及び半導体素子の製造方法 |
KR101845652B1 (ko) * | 2017-01-17 | 2018-04-04 | 주식회사 텝스 | 부품 실장된 웨이퍼 테스트를 위한 하이브리드 프로브 카드 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03245600A (ja) * | 1990-02-23 | 1991-11-01 | Nec Corp | プリント基板の検査方法および検査装置 |
JPH0915289A (ja) * | 1995-06-26 | 1997-01-17 | Ibiden Co Ltd | 多層プリント配線板の検査装置 |
JPH11153647A (ja) * | 1997-11-19 | 1999-06-08 | Nhk Spring Co Ltd | パッケージ基板検査装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58119766U (ja) * | 1982-02-08 | 1983-08-15 | 三洋電機株式会社 | プリント基板検査装置 |
JPS63293934A (ja) * | 1987-05-27 | 1988-11-30 | Hitachi Ltd | 半導体素子検査装置 |
JPS63293944A (ja) * | 1987-05-27 | 1988-11-30 | Nec Corp | 論理回路代替方式 |
JPH0943276A (ja) * | 1995-05-23 | 1997-02-14 | Tokyo Electron Ltd | プローブ装置に用いられるプローブカードデバイス |
JP2000340924A (ja) * | 1999-05-27 | 2000-12-08 | Nhk Spring Co Ltd | 半導体チップ搭載用基板の検査用プローブユニット |
-
2003
- 2003-11-19 WO PCT/JP2003/014717 patent/WO2004046739A1/ja active Application Filing
- 2003-11-19 CN CN2003801035864A patent/CN1714297B/zh not_active Expired - Fee Related
- 2003-11-19 KR KR1020057008957A patent/KR101067010B1/ko not_active IP Right Cessation
- 2003-11-19 AU AU2003284411A patent/AU2003284411A1/en not_active Abandoned
- 2003-11-19 JP JP2004553201A patent/JP4486890B2/ja not_active Expired - Fee Related
- 2003-11-19 TW TW092132377A patent/TWI230796B/zh not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03245600A (ja) * | 1990-02-23 | 1991-11-01 | Nec Corp | プリント基板の検査方法および検査装置 |
JPH0915289A (ja) * | 1995-06-26 | 1997-01-17 | Ibiden Co Ltd | 多層プリント配線板の検査装置 |
JPH11153647A (ja) * | 1997-11-19 | 1999-06-08 | Nhk Spring Co Ltd | パッケージ基板検査装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014055818A (ja) * | 2012-09-12 | 2014-03-27 | Hioki Ee Corp | 基板検査装置および基板検査方法 |
JP2014119340A (ja) * | 2012-12-17 | 2014-06-30 | Micronics Japan Co Ltd | プローブカード、検査装置、及び検査方法 |
JP2014167411A (ja) * | 2013-02-28 | 2014-09-11 | Hioki Ee Corp | 基板検査装置 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2004046739A1 (ja) | 2006-03-16 |
CN1714297B (zh) | 2011-01-19 |
CN1714297A (zh) | 2005-12-28 |
JP4486890B2 (ja) | 2010-06-23 |
KR101067010B1 (ko) | 2011-09-22 |
KR20050063811A (ko) | 2005-06-28 |
AU2003284411A1 (en) | 2004-06-15 |
TWI230796B (en) | 2005-04-11 |
TW200415364A (en) | 2004-08-16 |
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